Automatic polishing solution adjusting device

Abstract

The utility model relates to the technical field of polishing solution supplement, in particular to an automatic polishing solution adjusting device. The device comprises a water tank, a support is installed on the upper portion of the water tank, a storage box is arranged above the support, and a liquid outlet pipe is arranged at the lower end of the storage box. The liquid supply pipeline is mounted on the position, corresponding to the bracket, of the water tank in a communicating manner; the supply pipeline is mounted at one end of the water tank in a communicating manner, and a supply pump is mounted on the supply pipeline; and an adjusting device; the adjusting device is arranged on the liquid supply pipeline; wherein the adjusting device comprises a first manual valve and a first pneumatic valve, the first manual valve and the first pneumatic valve are both installed on the liquid supply pipeline, the first manual valve is located below the first pneumatic valve, the upper end of the liquid supply pipeline is communicated with a corrugated pipe, and the corrugated pipe is connected with a liquid outlet pipe below the storage box through threads. The problems that at present, the polishing solution is mostly added manually, the working efficiency is low, and real-time monitoring and adjusting cannot be conducted in the production process are solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of polishing liquid supplement, in particular to a polishing liquid automatic adjusting device. BACKGROUND

[0002] Polishing liquid supplement refers to a technical means of supplementing polishing liquid during product polishing in some process production, and surface grinding and polishing is an indispensable production link in the production process of semiconductor wafers, sapphire substrates and other substrates. The concentration and stability of the polishing liquid in the polishing process are important process factors.

[0003] In the prior art, such as the utility model with the announcement number CN218801545U, a polishing liquid supply device is specifically disclosed, which comprises: storage tanks, the storage tanks have multiple, the multiple storage tanks are linearly arranged, each storage tank comprises: a tank body, the tank body is used for storing polishing liquid; an inlet and outlet liquid assembly, the inlet and outlet liquid assembly comprises: an inlet pipe, the inlet pipe is located at the top of the tank body, the inlet pipe is in communication with the tank body, and is used for supplementing polishing liquid into the tank body, and an inlet valve is connected to the inlet pipe. The technical problem of relatively single and imperfect function of the polishing liquid supply device is solved, and the technical effect of perfecting the function of the polishing liquid supply device is achieved.

[0004] The above technical content has the following defects: at present, the addition of polishing liquid is mostly manual, the work efficiency is low, and the production process cannot be monitored and adjusted in real time, which has a great influence on production efficiency and process quality, so it is an urgent technical problem to research a method for real-time monitoring and automatic adjustment of the concentration of polishing liquid. UTILITY MODEL CONTENT

[0005] One of the technical problems to be solved by the present application is that the addition of polishing liquid is mostly manual at present, the work efficiency is low, and the production process cannot be monitored and adjusted in real time.

[0006] To solve the above technical problems, the present application provides a polishing liquid automatic adjusting device, which comprises:

[0007] A water tank, a support is installed on the upper part of the water tank, a storage tank is arranged above the support, and a liquid outlet pipe is arranged at the lower end of the storage tank;

[0008] A liquid supply pipeline is installed in communication at the position corresponding to the support of the water tank;

[0009] A supply pipeline is installed in communication at one end of the water tank, and a supply pump is installed on the supply pipeline; and

[0010] An adjusting device is arranged on the liquid supply pipeline;

[0011] The adjusting device comprises a first manual valve and a first pneumatic valve, both of which are installed on the liquid supply pipeline, and the first manual valve is below the first pneumatic valve, the upper end of the liquid supply pipeline is communicated with a bellows, the bellows is connected with the liquid outlet pipe below the storage tank through threads, a Baume meter is inserted in the water tank, one end of the Baume meter is provided with a display screen, the upper end of the water tank is communicated with a water supply pipeline, a second manual valve and a second pneumatic valve are installed on the water supply pipeline, and the second manual valve is below the second pneumatic valve.

[0012] The above-mentioned components achieve the effect that the polishing liquid in the storage tank can be input into the water tank, water is injected into the water tank through the water supply pipeline to adjust the concentration, and finally the concentration inside the water tank is monitored in real time by the Baume meter, and when the appropriate concentration is monitored, the first pneumatic valve and the second pneumatic valve can be directly closed.

[0013] In some embodiments, a servo motor is fixedly installed at the upper end of the water tank, the output end of the servo motor penetrates the water tank, and a stirring rod is installed at the lower end of the servo motor and located inside the water tank.

[0014] The above-mentioned components achieve the effect that after water and polishing liquid are injected into the water tank, the stirring rod can be used for stirring, so that the polishing liquid can be fully diluted and mixed.

[0015] In some embodiments, a limiting structure is arranged above the support, the limiting structure comprises a spring, the lower end of the spring is fixedly connected to the lower surface of the upper end of the support, the lower end of the spring is fixedly connected to a supporting plate, the upper surface of the supporting plate is uniformly fixedly connected to a plurality of positioning plates, the upper end of the positioning plate penetrates the support in a sliding manner, and the support is provided with a clamping groove at the upper end, and the liquid outlet pipe below the storage tank penetrates the clamping groove of the support.

[0016] The above-mentioned components achieve the effect that when the liquid outlet pipe of the storage tank is connected with the liquid supply pipeline and is inverted on the support, the storage tank can be quickly limited by the positioning plate.

[0017] In some embodiments, a limiting rod is inserted into the spring, the upper end of the limiting rod is fixedly connected to the support, and the lower end of the limiting rod penetrates the supporting plate in a sliding manner.

[0018] The above-mentioned components achieve the effect of limiting the spring force direction.

[0019] In some embodiments, a handle is fixedly connected to the lower surface of the supporting plate, and the arc surface of the handle is fixedly connected to an anti-skid sleeve.

[0020] The above-mentioned components achieve the effect that the handle can be conveniently pulled to drive the supporting plate to move downward, so that the positioning plate moves below the supporting plate, after the storage tank is buckled on the support, the handle is released, and the positioning plate is buckled around the storage tank again by the spring force.

[0021] In some embodiments, the upper surface of the supporting plate is fixedly connected with a fixing frame, a rotating shaft is rotatably connected in the fixing frame, the rotating shaft of the fixing frame is fixedly connected with a supporting plate, and one end of the supporting plate is fixedly connected with a rubber pad. When the supporting plate is rotated to be perpendicular to the supporting plate and the rubber pad at the upper end is abutted against the support, the positioning plate is located below the storage box at this time.

[0022] The above-mentioned components achieve the effect that when the handle is pulled downward and the storage box is prepared to be replaced, the supporting plate can be temporarily supported between the supporting plate and the support, facilitating temporary limiting of the position of the positioning plate.

[0023] In some embodiments, a coil spring is sleeved on the rotating shaft of the fixing frame, and the two ends of the coil spring are fixedly connected with the rotating shaft and the fixing frame, respectively.

[0024] The above-mentioned components achieve the effect that the torsional force can be applied to the rotating shaft of the fixing frame, facilitating adjustment of the position of the supporting plate.

[0025] Through the above technical solution, the storage box can be placed on the support, and then the storage box is limited by the limiting structure. Then, the liquid supply pipeline is controlled by the first pneumatic valve and the first manual valve, the water supply pipeline is controlled by the second pneumatic valve and the second manual valve, the concentration of the polishing liquid in the water tank is monitored by the Baume meter, and finally the polishing liquid is output from the supply pipeline to provide the polishing liquid for polishing work, so that the real-time and accurate control of the concentration of the polishing liquid is realized, and the production efficiency and process stability of polishing are greatly improved. BRIEF DESCRIPTION OF DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0027] Figure 1 is a schematic diagram of the three-dimensional structure disclosed by the embodiments of the present application;

[0028] Figure 2 is a schematic diagram of the internal structure of the water tank disclosed by the embodiments of the present application;

[0029] Figure 3 is a schematic diagram of the limiting structure disclosed by the embodiments of the present application;

[0030] Figure 4 is a schematic diagram of part of the structure of the polishing liquid supply device disclosed by the embodiments of the present application; Figure 3

[0031] ​Figure 5 is a structural schematic diagram of the liquid supply pipeline disclosed by the embodiment of the present application.

[0032] Explanation of reference signs:

[0033] 1, water tank; 2, support; 3, liquid supply pipeline; 4, first manual valve; 5, first pneumatic valve; 6, corrugated pipe; 7, storage tank; 8, servo motor; 9, stirring rod; 10, Baume scale; 11, display screen; 12, water supply pipeline; 13, second manual valve; 14, second pneumatic valve; 15, supply pipeline; 16, supply pump; 17, limiting structure; 1701, spring; 1702, supporting plate; 1703, positioning plate; 1704, limiting rod; 1705, handle; 1706, anti-skid sleeve; 1707, fixing frame; 1708, supporting plate; 1709, coil spring; 1710, rubber pad; 1711, clamping groove. DETAILED DESCRIPTION

[0034] The embodiments of the present application will be further described in detail below with reference to the accompanying drawings and examples. The detailed description and the accompanying drawings of the following examples are used to exemplarily illustrate the principles of the present application, but cannot be used to limit the scope of the present application, and the present application can be implemented in many different forms, and is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

[0035] The present application provides these embodiments in order to make the present application thorough and complete, and fully express the scope of the present application to those skilled in the art. It should be noted that: unless otherwise specified, the relative arrangement of components and steps, the composition of materials, numerical expressions and values set forth in these embodiments should be interpreted as merely exemplary, and not as a limitation.

[0036] It should be noted that, in the description of the present application, unless otherwise specified, the meaning of "a plurality of" is greater than or equal to two; the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", "inner", "outer" and the like is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0037] In addition, the "first", "second" and similar words used in the present application do not represent any order, quantity or importance, but are only used to distinguish different parts. "Vertical" is not strictly vertical, but within the allowable range of error. "Parallel" is not strictly parallel, but within the allowable range of error. "Include" or "contain" and similar words mean that the elements before the word cover the elements listed after the word, and do not exclude the possibility of also covering other elements.

[0038] It should be further noted that in the description of the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be directly connected, or indirectly connected through an intermediate medium. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances. When it is described that a specific device is located between the first device and the second device, there can be an intermediate device between the specific device and the first device or the second device, or there can be no intermediate device.

[0039] All terms used in the present application have the same meaning as understood by those skilled in the art to which the present application belongs, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries should be interpreted to have meanings consistent with their meanings in the context of the relevant technology, and should not be interpreted in an idealized or excessively formalized sense, unless otherwise defined herein.

[0040] Techniques, methods and devices known to those skilled in the relevant art can not be discussed in detail, but in appropriate cases, the techniques, methods and devices should be considered as part of the specification.

[0041] Referring to Figure 1 and Figure 2 The utility model provides a kind of technical scheme: a kind of polishing solution automatic regulating device, including water tank 1, the upper portion of water tank 1 is equipped with support 2, support 2 is equipped with storage tank 7 in the top, the lower end of storage tank 7 is equipped with liquid outlet pipe;Liquid supply line 3, liquid supply line 3 is connected and installed in the position of water tank 1 corresponding support 2;Supply line 15, supply line 15 is connected and installed in one end of water tank 1, and supply pump 16 is installed on supply line 15;And regulating device;Regulating device is arranged on liquid supply line 3, the top of support 2 is equipped with limiting structure 17.

[0042] The specific setting and role of regulating device and limiting structure 17 are described below.

[0043] Referring to Figure 2As shown, in the embodiment: the adjusting device comprises a first manual valve 4 and a first pneumatic valve 5, both of which are installed on the liquid supply pipeline 3, and the first manual valve 4 is below the first pneumatic valve 5, the upper end of the liquid supply pipeline 3 is communicated with a bellows 6, the bellows 6 is connected with the liquid outlet pipe below the storage tank 7 through screw thread, a hydrometer 10 is inserted in the water tank 1, one end of the hydrometer 10 is installed with a display screen 11, the upper end of the water tank 1 is communicated with a water supply pipeline 12, a second manual valve 13 and a second pneumatic valve 14 are installed on the water supply pipeline 12, and the second manual valve 13 is below the second pneumatic valve 14. The polishing liquid in the storage tank 7 can be input into the water tank 1, water is injected into the water tank 1 through the water supply pipeline 12 to adjust the concentration, and finally the hydrometer 10 is used to monitor the concentration in the water tank 1 in real time, when the appropriate concentration is monitored, the first pneumatic valve 5 and the second pneumatic valve 14 can be directly closed. The upper end of the water tank 1 is fixedly installed with a servo motor 8, the output end of the servo motor 8 penetrates through the water tank 1, the lower end of the servo motor 8 is installed with a stirring rod 9, and the stirring rod 9 is located in the interior of the water tank 1. After water and polishing liquid are injected into the water tank 1, the stirring rod 9 can be used for stirring, so that the polishing liquid stock solution can be fully diluted and mixed.

[0044] Referring to Figure 3 , Figure 4 and Figure 5As shown, in the embodiment: the limiting structure 17 includes a spring 1701, the spring 1701 is fixedly connected to the lower surface of the upper end of the support 2, the lower end of the spring 1701 is fixedly connected with a supporting plate 1702, the upper surface of the supporting plate 1702 is uniformly fixedly connected with a plurality of positioning plates 1703, the upper end of the positioning plate 1703 is slidingly penetrated through the support 2, the upper end of the support 2 is provided with a clamping groove 1711, and the liquid outlet pipe below the storage box 7 penetrates through the clamping groove 1711 of the support 2. After the liquid outlet pipe of the storage box 7 is connected with the liquid supply pipe 3 and is invertedly buckled on the support 2, the positioning plate 1703 can be used to quickly limit the storage box 7. The inside of the spring 1701 is provided with a limiting rod 1704, the upper end of the limiting rod 1704 is fixedly connected with the support 2, and the lower end of the limiting rod 1704 is slidingly penetrated through the supporting plate 1702. The spring 1701 is limited in the direction of the elastic force. The lower surface of the supporting plate 1702 is fixedly connected with a handle 1705, the circular surface of the handle 1705 is fixedly connected with an anti-skid sleeve 1706. The handle 1705 can be pulled down to move the supporting plate 1702, so that the positioning plate 1703 moves below the supporting plate 1702. After the storage box 7 is buckled on the support 2, the handle 1705 is loosened, and the positioning plate 1703 is re-clamped around the storage box 7 by the spring 1701. The upper surface of the supporting plate 1702 is fixedly connected with a fixing frame 1707, the inside of the fixing frame 1707 is rotatably connected with a rotating shaft, the circular surface of the rotating shaft of the fixing frame 1707 is fixedly connected with a supporting plate 1708, one end of the supporting plate 1708 is fixedly connected with a rubber pad 1710, and when the supporting plate 1708 is rotated to be perpendicular to the supporting plate 1702 and the rubber pad 1710 at the upper end is abutted against the support 2, the positioning plate 1703 is located below the storage box 7. When the handle 1705 is pulled down to prepare to replace the storage box 7, the supporting plate 1708 can be temporarily supported between the supporting plate 1702 and the support 2, so that the position of the positioning plate 1703 is temporarily limited. The rotating shaft of the fixing frame 1707 is sleeved with a coil spring 1709, and the two ends of the coil spring 1709 are fixedly connected with the rotating shaft and the fixing frame 1707. The rotating shaft of the fixing frame 1707 can be twisted to facilitate the adjustment of the position of the supporting plate 1708.

[0045] Working principle: first, the water supply pipeline 12 and the external water pipe connected, then pull down the handle 1705, the handle 1705 driven by the supporting plate 1702 to move down, the handle 1705 will drive the positioning plate 1703 to move down, then rotate the supporting plate 1708, the supporting plate 1708 is rotated to the vertical state with the supporting plate 1702, then the supporting plate 1708 upper support under the bracket 2, the positioning plate 1703 at this time all the way to the bracket 2 under, then the storage tank 7 under the liquid outlet pipe and the liquid supply pipeline 3 corrugated pipe 6 connected, then the storage tank 7 under the liquid outlet pipe from the bracket 2 of the card slot 1711 into, then pull down the handle 1705, wherein the anti-skid sleeve 1706 played the effect of increasing the surface friction of the handle 1705, at this time the coil spring 1709 will give the supporting plate 1708 torsional force, the supporting plate 1708 re turn to the original position, the spring 1701 will give the supporting plate 1702 tension, the supporting plate 1702 to move up, the positioning plate 1703 will be stored in the bracket 2 on the tank 7, wherein the limiting rod 1704 played the effect of limiting the spring 1701 elastic force.

[0046] Then start the first pneumatic valve 5, the first manual valve 4, the second pneumatic valve 14, the second manual valve 13, at this time the storage tank 7 in the polishing liquid stock solution will enter into the water tank 1 through the liquid supply pipeline 3, the external water pipe will help the water supply pipeline 12 into the water tank 1, at this time start the servo motor 8, the servo motor 8 driven by the stirring rod 9 rotation, the polishing liquid in the water tank 1 is stirred, wherein the Baumé meter 10 real-time monitoring of the polishing liquid in the water tank 1 and the data displayed on the display screen 11, when the concentration reaches the appropriate, directly close the first manual valve 4 and the second manual valve 13, finally from the supply pipe 15 by the supply pump 16, for polishing work to provide precise concentration of polishing liquid.

[0047] Thus, the embodiments of the present application have been described in detail. In order to avoid obscuring the concept of the present application, some details known in the art are not described. Those skilled in the art can fully understand how to implement the technical solutions disclosed herein according to the above description.

[0048] Although some specific embodiments of the present application have been described in detail through examples, those skilled in the art should understand that the above examples are only for illustration, not for limiting the scope of the present application. Those skilled in the art should understand that the above embodiments can be modified or some technical features can be replaced equivalently without departing from the scope and spirit of the present application. Especially, as long as there is no structural conflict, the technical features mentioned in each embodiment can be combined in any way.

Claims

1. An automatic polishing liquid adjusting device characterized by comprising: Include: Water tank (1), the upper part of the water tank (1) is provided with a support (2), the upper part of the support (2) is provided with a storage tank (7), the lower end of the storage tank (7) is provided with a liquid outlet pipe; Liquid supply pipeline (3), the liquid supply pipeline (3) is communicated and installed at the position corresponding to the support (2) of the water tank (1); Supply pipeline (15), the supply pipeline (15) is communicated and installed at one end of the water tank (1), and the supply pipeline (15) is provided with a supply pump (16); and Adjusting device; the adjusting device is arranged on the liquid supply pipeline (3); Wherein, the adjusting device comprises a first manual valve (4) and a first pneumatic valve (5), the first manual valve (4) and the first pneumatic valve (5) are both arranged on the liquid supply pipeline (3), and the first manual valve (4) is below the first pneumatic valve (5), the upper end of the liquid supply pipeline (3) is communicated with a bellows (6), the bellows (6) is connected with the liquid outlet pipe below the storage tank (7) through threads, a Baumé meter (10) is arranged in the water tank (1), one end of the Baumé meter (10) is provided with a display screen (11), the upper end of the water tank (1) is communicated with a water supply pipeline (12), the water supply pipeline (12) is provided with a second manual valve (13) and a second pneumatic valve (14), and the second manual valve (13) is below the second pneumatic valve (14).

2. The polishing solution automatic adjusting apparatus according to claim 1, wherein The upper end of the water tank (1) is fixedly provided with a servo motor (8), the output end of the servo motor (8) penetrates the water tank (1), and the lower end of the servo motor (8) is provided with a stirring rod (9), and the stirring rod (9) is located in the water tank (1).

3. The automatic polishing solution adjusting apparatus according to claim 1, wherein The upper part of the support (2) is provided with a limiting structure (17), the limiting structure (17) comprises a spring (1701), the spring (1701) is fixedly connected to the lower surface of the upper end of the support (2), the lower end of the spring (1701) is fixedly connected with a supporting plate (1702), the upper surface of the supporting plate (1702) is uniformly fixedly connected with a plurality of positioning plates (1703), the upper end of the positioning plate (1703) slides through the support (2), and the upper end of the support (2) is provided with a clamping groove (1711), and the liquid outlet pipe below the storage tank (7) penetrates the clamping groove (1711) of the support (2).

4. The automatic polishing solution adjusting apparatus according to claim 3, wherein The inside of the spring (1701) is provided with a limiting rod (1704), the upper end of the limiting rod (1704) is fixedly connected with the support (2), and the lower end of the limiting rod (1704) slides through the supporting plate (1702).

5. The automatic polishing solution adjusting apparatus according to claim 3, wherein The lower surface of the supporting plate (1702) is fixedly connected with a handle (1705), and the circular arc surface of the handle (1705) is fixedly connected with an anti-skid sleeve (1706).

6. The automatic polishing solution adjusting apparatus according to claim 3, wherein The upper surface of the supporting plate (1702) is fixedly connected with a fixing frame (1707), a rotating shaft is rotatably connected in the fixing frame (1707), the rotating shaft arc surface of the fixing frame (1707) is fixedly connected with a supporting plate (1708), one end of the supporting plate (1708) is fixedly connected with a rubber pad (1710), when the supporting plate (1708) is rotated to be perpendicular to the supporting plate (1702) and the upper end rubber pad (1710) is abutted against the support (2), at this time, the positioning plate (1703) is all located below the storage box (7).

7. The automatic polishing solution adjusting apparatus according to claim 6, wherein The rotating shaft of the fixing frame (1707) is sleeved with a coil spring (1709), and the two ends of the coil spring (1709) are fixedly connected with the rotating shaft and the fixing frame (1707) respectively.

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