Edge heating base and etching equipment
By using an edge heating base in the etching equipment, combined with a ring and edge heating elements, the problems of uneven heating and low heat transfer efficiency of the dielectric window are solved, achieving uniform heating and efficient conduction of the dielectric window and reducing the risk of particulate contamination.
Patent Information
- Application Number
- CN202422945373.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-29
- Publication Date
- 2025-11-07
- Estimated Expiration
- 2034-11-29
AI Technical Summary
In existing etching equipment, the heating method of the dielectric window has problems such as low heat transfer efficiency, uneven heating, and unresolved capacitive electric field effects, resulting in uneven plasma distribution and particulate contamination.
An edge heating base is used, including a ring and an edge heating element. Pressure is provided by the transverse groove and clamping element of the ring to make the edge heating element fit tightly against the edge of the medium window, so as to achieve uniform heating. The medium window is heated by the combination of the heating component and the edge heating element.
It improves the uniformity of medium window temperature and heating efficiency, reduces particulate contamination, simplifies the structure, and saves space.
Smart Images
Figure CN223527121U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the etching equipment technical field of semiconductor equipment, especially the technical field of edge heating of etching equipment. BACKGROUND
[0002] In the semiconductor chip processing process, etching equipment needs to be used, such as ICP or CCP, for etching grooves on the surface of a wafer.
[0003] Taking ICP etching equipment as an example, in the equipment, the coil couples the energy of the radio frequency power to the plasma in the vacuum chamber through electromagnetic induction mode through the dielectric window. The upper surface of the dielectric window is in the atmosphere, the lower surface of the dielectric window is in the chamber, and the joint surface of the dielectric window and the chamber is the generation and distribution area of the plasma. The temperature of the dielectric window affects the uniformity of the plasma distribution and the particle deposition. At the same time, the capacitive electric field of the planar coil is strong, which can form a thick capacitive radio frequency sheath layer under the dielectric window, accelerate the plasma to high energy, and then impact the surface of the dielectric window to cause sputtering, resulting in particle pollution and damage to the dielectric window.
[0004] In the prior art, the dielectric window is generally heated by a side heating band or hot air, but the side heating band method has low heat transfer efficiency due to structural limitations, and the hot air heating method has a complex air duct structure, and the influence of the coil capacitive electric field has not been improved, and the heating is uneven. UTILITY MODEL CONTENTS
[0005] The utility model aims to provide an edge heating base and etching equipment to solve the above problems.
[0006] In order to achieve the above purpose, the utility model realizes the following technical scheme:
[0007] The utility model provides an edge heating base for temperature control of the dielectric window of etching equipment, comprising:
[0008] A ring body comprising an upper surface, a lower surface, an outer sidewall and an inner sidewall, the outer sidewall of the ring body is provided with a transverse groove extending along the circumference of the ring body;
[0009] An edge heating member is arranged on the inner side of the transverse groove;
[0010] A pressing member is arranged on the outer side of the transverse groove, and the pressing member is configured to provide pressure to the edge heating member along the radial direction.
[0011] Optionally, the edge heating base further comprises a fastener configured to penetrate the upper surface of the ring body to the transverse groove to fix the pressing member.
[0012] Optionally, the lower end of the fastener is in the shape of a circular truncated cone, and the upper surface of the pressing member is provided with a circular truncated cone-shaped groove matched with the circular truncated cone-shaped lower end.
[0013] Optionally, the pressing member is at least two arc-shaped segments.
[0014] Optionally, the inner side wall of the pressing member is configured as an arc-shaped groove matched with the shape of the edge heating member.
[0015] Optionally, the edge heating member is a heating wire, and the heating wire surrounds the ring body.
[0016] Optionally, the cross section of the ring body is in the shape of a trapezoid.
[0017] Optionally, the cross section of the edge heating member is in the shape of a circle, and the arc-shaped groove of the inner side wall of the pressing member is in the shape of a semicircle.
[0018] The utility model also provides a kind of etching equipment, comprising:
[0019] Chamber;
[0020] Base, the base is set in the chamber;
[0021] Dielectric window, the dielectric window is set above the chamber;
[0022] Heating assembly, the heating assembly is set in the central region of the upper surface of the dielectric window, for heating the central region of dielectric window, and the heating assembly includes circular body, and the circular body includes multiple layers;
[0023] As above-mentioned edge heating base, the edge heating base is set between the dielectric window and the upper edge of chamber, and the edge heating base includes edge heating member, and the edge heating member is used to heat the edge region of the dielectric window.
[0024] Compared with prior art, the utility model has the following advantages:
[0025] 1, the utility model discloses on the dielectric window and set heating assembly and the edge of edge heating member, can evenly control the temperature of dielectric window.
[0026] 2, the electric heating wire of the edge heating base of the utility model is set in the horizontal groove in the inside, can realize better heat conduction, has improved the heating efficiency of the edge of dielectric window, simple structure, easy to install, saves space. BRIEF DESCRIPTION OF DRAWINGS
[0027] In order to more clearly illustrate the technical scheme of the present application, the drawings required to be used in the description will be briefly introduced as follows. Obviously, the drawings in the following description are one embodiment of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the premise of not paying creative labor.
[0028] Figure 1 The structure diagram of the etching equipment of the present application is shown.
[0029] Figure 2 The structure diagram of the upper part of the etching equipment of the present application is shown.
[0030] Figure 3 The structure diagram of the edge heating base of the present application is shown.
[0031] Figure 4 The cross section of the edge heating base of the present application is shown.
[0032] Figure 5 The top view of the pressing part of the present application is shown. DETAILED DESCRIPTION
[0033] The scheme of the present application will be further described in detail in combination with the drawings and specific embodiments. The advantages and features of the present application will be more clear according to the following description. It should be noted that the drawings are very simplified and all use non-precise proportions, only to facilitate, clear and assist the purpose of explaining the embodiments of the present application. In order to make the purpose, features and advantages of the present application more obvious and easy to understand, please refer to the drawings. It should be known that the structure, proportion, size and the like shown in the drawings of the present application are only used to cooperate with the content disclosed in the specification, so as to be understood and read by those skilled in the art, and not to limit the limited conditions of the implementation of the present application, so it does not have the technical essence, any modification of structure, change of proportion relationship or adjustment of size, as long as it does not affect the effect and purpose of the present application, it should still fall within the scope of the technical content disclosed by the present application.
[0034] Figure 1 The structure diagram of the etching equipment of the present application is shown. Taking ICP as an example, as shown in Figure 1As shown, the etching device comprises a chamber 201, a susceptor 202, a dielectric window 203, a heating assembly 100, a pressing plate 242 and an edge heating base 300. The chamber 201 is used for processing a wafer, and the wafer is processed by an etching process. The susceptor 202 is arranged in the chamber 201; the dielectric window 203 is arranged above the chamber 201; the heating assembly 100 is arranged on the upper surface of the dielectric window 203 and is used for controlling the temperature of the dielectric window 203; the pressing plate 242 is arranged above the heating assembly 100 and is used for fixing the heating assembly on the dielectric window 203; specifically, the heating assembly 100 is arranged in the central region of the upper surface of the dielectric window 203 and is used for heating the central region of the dielectric window; the heating assembly 100 comprises a circular main body, the circular main body comprises a plurality of layers, and a plurality of fan-shaped through holes 160 are arranged on the circular main body and are arranged in the circumferential direction of the circular main body. The circular main body is concentric with the dielectric window (i.e., concentric). Preferably, the fan-shaped through holes are fan ring-shaped, a plurality of fan-shaped through holes 160 are arranged in the circumferential direction to form a ring, and the interval of two adjacent fan-shaped through holes 160 in the circumferential direction is the same, i.e., the two fan-shaped through holes 160 are uniformly distributed in the circumferential direction. The side edges of the two adjacent fan-shaped through holes 160 are parallel.
[0035] The edge heating base 300 is arranged between the dielectric window 203 and the upper edge of the chamber 201, and the edge heating base is annular and comprises an edge heating member 320, which is used for heating the edge region of the dielectric window. The dielectric window can be uniformly controlled in temperature by the heating assembly 100 in the central region and the edge heating member 320 in the edge region.
[0036] The dielectric window 203 or the pressing plate 242 is provided with a support block 2033, which is configured to support the heating assembly through the fan-shaped through holes 160. Preferably, the support block 2033 is arranged on the upper surface of the dielectric window 203 or the lower surface of the pressing plate 242, and the support block 2033 is integrally formed with the dielectric window 203 or the pressing plate 242; the shape and size of the support block 2033 are matched with the shape and size of the fan-shaped through holes 160; further preferably, the number of the support blocks 2033 is the same as the number of the fan-shaped through holes 160, and the fan-shaped through holes 160 and the support blocks are uniformly distributed in the circumferential direction. Since the heating assembly 100 is very thin and has a certain flexibility, the compression resistance is poor. The support block 2033 of the utility model can well protect the heating assembly and prevent it from being squeezed by excessive force, and at the same time, the heating assembly can be well pressed on the upper surface of the dielectric window by the pressing plate, thereby improving the heat conduction efficiency.
[0037] The etching equipment also comprises a process gas source 208, a coil 241, a coil support 204, a first plasma source 205, a second plasma source 206, a matcher 207 and a controller 209. The process gas source 208 is connected with the dielectric window 203 through a pipeline, for delivering process gas into the chamber 201. The coil is arranged above the heating assembly 100, and is fixed above the chamber 201 through the coil support 204. The first plasma source 205 is connected with the coil 241 through the matcher, for delivering radio frequency signals to the coil, so as to generate plasma in the chamber 201 in the etching process. The second plasma source 206 is connected with an electrode in the pedestal through the matcher 207, and the controller 209 is connected with the first plasma source 205 and the second plasma source 206 respectively, for controlling the first plasma source 205 and the second plasma source 206.
[0038] Figure 2 The structure diagram of the upper part of the etching equipment of the utility model is shown as Figure 2 The coil support 204 is in the shape of a cross, and the coil support 204 is fixed on the edge heating pedestal 300 through vertically extended supports 244. The number of the supports can be four, which are arranged at the four ends of the cross. The upper end of the support 244 is connected with the end of the cross, and the lower end is connected with the outer edge of the upper surface of the edge heating pedestal 300. The dielectric window 203 comprises an upper dielectric window 2031 and a lower dielectric window 2032. The dielectric window 203 can be circular, and the upper dielectric window 2031 and the lower dielectric window 2032 are also circular. The upper dielectric window 2031 and the lower dielectric window 2032 are concentric and stacked vertically. The diameter of the upper dielectric window is smaller than that of the lower dielectric window. The center of the upper dielectric window is provided with an air inlet area, which is connected with the process gas source 208, for introducing process gas into the chamber 201.
[0039] The lower surface of the lower dielectric window 2032 is sealingly connected with the inner edge of the upper surface of the edge heating pedestal 300. The diameter of the circular main body of the heating assembly 100 is the same as that of the lower dielectric window 2032. The coil comprises an inner coil and an outer coil arranged on the same plane and concentrically. The centers of the inner coil and the outer coil are the center of the dielectric window. The inner coil is arranged in the center of the dielectric window, and the outer coil is arranged at the edge of the dielectric window. The fan-shaped through hole 160 is arranged between the inner coil and the outer coil. The diameter of the pressing plate 242 is slightly smaller than the minimum diameter of the outer coil. The diameter of the upper dielectric window is slightly smaller than that of the pressing plate. The pressing plate 242 is fixed on the lower dielectric window through the screws arranged at the edge thereof.
[0040] Figures 3-5 The structure diagram of the edge heating pedestal is shown as Figure 3As shown, the edge heating base 300 further comprises a ring body 310 and a pressing member 330. The ring body 310 comprises an upper surface, a lower surface, an inner sidewall and an outer sidewall. The outer sidewall of the ring body 310 is provided with a transverse groove extending along the circumference of the ring body 310. The edge heating member 320 is arranged inside the transverse groove. The pressing member 330 is arranged outside the transverse groove. The pressing member 330 is configured to provide a pressure to the edge heating member 320 along the radial direction, which can make the edge heating member 320 tightly contact with the transverse groove, thereby providing better heat conduction. Optionally, the edge heating member 320 is a heating wire, which surrounds the edge heating base 300.
[0041] As shown, Figure 4 The edge heating base 300 further comprises a fastener 340, which is configured to fix the pressing member 330 from the upper surface of the ring body 310 to the transverse groove. The lower end 341 of the fastener 340 is in the shape of a circular truncated cone, as shown. Figure 5 The upper surface of the pressing member 330 is provided with a reverse circular truncated cone groove 332 matched with the circular truncated cone-shaped lower end 341. The circular truncated cone-shaped lower end and the reverse circular truncated cone groove 332 can precisely position and adjust the pressing member 330, while providing a radial force.
[0042] Optionally, the fastener is a bolt, the lower end 341 of which is not provided with a thread, and the other positions of the screw rod of the bolt are provided with threads. The pressing member 330 comprises at least two arc-shaped segments, which are spliced into a complete annular shape. As shown, Figure 5 Preferably, the number of the pressing members 330 is two. The inner sidewall 331 of the pressing member 330 is configured as an arc-shaped groove matched with the shape of the edge heating member 320. Preferably, the cross section of the edge heating member 320 is circular, and the arc-shaped groove of the inner sidewall 331 of the pressing member 330 is a semicircular arc. The cross section of the edge heating base 300 is a substantially trapezoidal shape, the lower base of the trapezoidal shape is arranged on the upper surface, the upper base of the trapezoidal shape is arranged on the lower surface, and the height of the trapezoidal shape is arranged on the outer sidewall.
[0043] It is to be noted that, in the present document, relational terms such as first and second and the like can be used solely to distinguish one entity or action from another entity or action without necessarily implying any actual relationship or order between such entities or actions. Moreover, the terms "comprises", "comprising", or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can also include other elements not expressly listed or inherent to such process, method, article, or apparatus. An element proceeded by "comprises... a" does not, without more constraints, exclude the presence of additional identical elements in the process, method, article, or apparatus that comprises the element. Additionally, the term "coupled" is defined as connected, whether directly or indirectly, while the term "connected" is defined as directly or indirectly connected. In the document, the term "optional" means that the feature can or can not be present, and that the process, method, article, or apparatus can or can not include the feature.
[0044] Although the present application has been described in detail through the preferred embodiments, it should be understood that the above description is not to be considered as limiting the present application. Various modifications and alterations of the present application will become apparent to those skilled in the art from the above description without departing from the scope of the present application. Accordingly, the scope of the present application should be determined by the appended claims and their legal equivalents.
Claims
1. An edge heating pedestal for temperature control of an etching apparatus' s process window, comprising: The edge heating base comprises: a ring body comprising an upper surface, a lower surface, an outer sidewall and an inner sidewall, the outer sidewall of the ring body is provided with a transverse groove extending along the circumference of the ring body; an edge heating element provided inside the transverse groove; a pressing element provided outside the transverse groove, the pressing element is configured to provide pressure to the edge heating element along the radial direction.
2. The edge heating pedestal of claim 1, wherein, The edge heating base further comprises a fastener configured to fix the pressing element from the upper surface of the ring body to the transverse groove.
3. The edge heating pedestal of claim 2, wherein, The lower end of the fastener is in the shape of a circular truncated cone, and the upper surface of the pressing element is provided with a circular truncated groove matched with the circular truncated lower end.
4. The edge heating pedestal of claim 2, wherein, The pressing element comprises at least two arc-shaped segments.
5. The edge heating pedestal of claim 4, wherein, The inner sidewall of the pressing element is configured as an arc-shaped groove matched with the shape of the edge heating element.
6. The edge heating pedestal of claim 1, wherein, The edge heating element is a heating wire surrounding the ring body.
7. The edge heating susceptor of claim 6, wherein, The cross section of the ring body is in the shape of a trapezoid.
8. The edge heating pedestal of claim 5, wherein, The cross section of the edge heating element is in the shape of a circle, and the arc-shaped groove of the inner sidewall of the pressing element is in the shape of a semicircle.
9. An etching apparatus, characterized by, The edge heating base comprises: a chamber; a base provided inside the chamber; a media window provided above the chamber; a heating assembly provided at the central region of the upper surface of the media window for heating the central region of the media window, the heating assembly comprising a circular main body comprising a plurality of layers; The edge heating base as claimed in any one of claims 1-8 is provided between the media window and the upper edge of the chamber, and the edge heating base comprises an edge heating element for heating the edge region of the media window.