Quartz wafer cleaning device

Abstract

A quartz wafer cleaning device comprises a box body, a left supporting plate and a right supporting plate, the left supporting plate and the right supporting plate are arranged on the top of the box body, the top of the left supporting plate and the top of the right supporting plate are fixedly connected through a connecting plate, a telescopic oil cylinder is arranged on the connecting plate, and an output shaft of the telescopic oil cylinder penetrates through the connecting plate to be connected with a motor base. A motor base is arranged on the box body, a rotating motor is arranged on the motor base, an output shaft of the rotating motor penetrates through the motor base to be connected with a rotating shaft, the rotating shaft penetrates through the box body to be connected with a connecting base, a plurality of dewatering boxes are connected to the periphery of the connecting base, and cleaning boxes are arranged in the dewatering boxes; cleaning water is arranged in the box body, and the water level of the cleaning water is one half of that of the box body; therefore, through operation of the telescopic oil cylinder and the rotating motor, the dewatering box can be soaked in water to be rotationally cleaned, after cleaning, the dewatering box is located on the water level, and then through operation of the rotating motor, centrifugal movement is conducted to conduct dewatering and spin-drying on the dewatering box.

Description

Technical Field

[0001] This utility model relates to the field of quartz wafer processing technology, specifically to a quartz wafer cleaning device. Background Technology

[0002] Quartz wafers are widely used in electronic components, but their surfaces can become contaminated during the manufacturing process, necessitating cleaning.

[0003] Existing quartz wafer cleaning equipment typically uses multiple ultrasonic cleaning tanks to manually perform initial ultrasonic cleaning and subsequent cleaning 2-9 times on each wafer. After cleaning, the wafers are removed from the mesh cage and placed in an oven to dry for 2 hours. The entire cleaning process has a low degree of automation, takes a long time, and is often affected by human factors, resulting in low cleanliness of the quartz wafers after cleaning.

[0004] Furthermore, since quartz wafers need to be cleaned in high-purity water 2 to 9 times, and there is no dehydration process after each cleaning, a small amount of residual liquid from the previous cleaning is mixed into the next cleaning process, affecting the cleaning effect of the quartz wafers. Utility Model Content

[0005] The technical problem to be solved by this utility model is to provide a quartz wafer cleaning device.

[0006] The technical solution adopted by this utility model to solve its technical problem is:

[0007] A quartz wafer cleaning device includes a housing, a left support plate and a right support plate disposed on the top of the housing, the top of the left support plate and the right support plate being fixedly connected by a connecting plate, a telescopic hydraulic cylinder being provided on the connecting plate, the output shaft of the telescopic hydraulic cylinder passing through the connecting plate and connected to a motor base, a rotary motor being provided on the motor base, the output shaft of the rotary motor passing through the motor base and connected to a rotating shaft, the rotating shaft passing through the housing and connected to a connecting seat, a plurality of dehydration tanks being connected around the connecting seat, and each of the plurality of dehydration tanks being provided with a cleaning tank.

[0008] In one embodiment, the dehydration box is a mesh box with its opening facing forward, and the left and right side walls inside the dehydration box are provided with sliding grooves.

[0009] In one embodiment, the dehydration tank is provided with locking blocks at both the top and bottom of its front side.

[0010] In one embodiment, the cleaning box is an upward-facing mesh box, and the two sides of the outside of the cleaning box are provided with slide rails that match the slide groove.

[0011] In one embodiment, the cleaning tank has a complex array of symmetrical slots on both sides inside.

[0012] In one embodiment, the cleaning tank is provided with a handle on the outside.

[0013] In one embodiment, the chamber is filled with cleaning water, and the water level of the cleaning water is half of the chamber's volume.

[0014] In one embodiment, a drain valve is provided at the lower end of one side of the housing.

[0015] In one embodiment, the upper end of the box is provided with a door.

[0016] In one embodiment, the bottom of the housing is provided with support feet.

[0017] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0018] This invention utilizes a housing with a left and right support plate on top. The tops of the left and right support plates are fixedly connected by a connecting plate. A telescopic hydraulic cylinder is mounted on the connecting plate, and the output shaft of the telescopic hydraulic cylinder passes through the connecting plate and connects to a motor base. A rotating motor is mounted on the motor base, and the output shaft of the rotating motor passes through the motor base and connects to a rotating shaft. The rotating shaft passes through the housing and connects to a connecting seat. A plurality of dehydration tanks are connected around the connecting seat, and each of the dehydration tanks contains a washing tank. The tanks are filled with washing water, and the water level is half that of the tank. Thus, through the operation of the telescopic hydraulic cylinder and the rotating motor, the dehydration tanks can be immersed in water and rotated for washing. After washing, the dehydration tanks are positioned at the water level, and the rotation of the rotating motor further centrifuges the tanks to dehydrate them. Attached Figure Description

[0019] Figure 1 This is a front cross-sectional view of Embodiment 1 of the present invention;

[0020] Figure 2 This utility model Figure 1 A schematic diagram of the front structure;

[0021] Figure 3 This utility model Figure 1 A top view of the water tank structure;

[0022] Figure 4 This utility model Figure 1 A schematic diagram of the front structure of the water tank;

[0023] Figure 5 This utility model Figure 1 A schematic diagram of the front structure of the cleaning tank;

[0024] Figure 6 This utility model Figure 1 A top view of the cleaning tank;

[0025] In the diagram: 10. Box body, 11. Left support plate, 12. Right support plate, 13. Connecting plate, 14. Telescopic cylinder, 15. Motor base, 16. Rotating motor, 17. Rotating shaft, 18. Connecting seat, 19. Dehydration box, 20. Washing box, 21. Slide groove, 22. Locking block, 23. Slide rail, 24. Locking slot, 25. Locking slot, 26. Drain valve, 27. Box door, 28. Support leg. Detailed Implementation

[0026] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0027] Example 1

[0028] like Figure 1-6 As shown, this embodiment includes a housing 10, a left support plate 11 and a right support plate 12 disposed on the top of the housing 10. The tops of the left support plate 11 and the right support plate 12 are fixedly connected by a connecting plate 13. A telescopic cylinder 14 is provided on the connecting plate 13. The output shaft of the telescopic cylinder 14 passes through the connecting plate 13 and is connected to a motor base 15. In this embodiment, the motor base 15 is a housing structure, and both ends of the motor base 15 are provided with vertical slide rails. The corresponding sides of the left support plate 11 and the right support plate 12 are provided with vertical slide grooves that match the vertical slide rails. Thus, through the operation of the telescopic cylinder 14, the motor base 15 is driven to move up and down on the left support plate 11 and the right support plate 12.

[0029] A rotating motor 16 is mounted on the motor base 15. The output shaft of the rotating motor 16 passes through the motor base 15 and is connected to a rotating shaft 17. The rotating shaft 17 passes through the housing 10 and is connected to a connecting seat 18. A plurality of dehydration tanks 19 are connected around the connecting seat 18. Each of the plurality of dehydration tanks 19 is equipped with a washing tank 20. In this embodiment, the housing 10 is filled with washing water, and the water level of the washing water is half of the housing 10. Thus, by operating the telescopic cylinder 14, the dehydration tank 19 can be immersed in water or positioned above the water level.

[0030] The dehydration tank 19 is a mesh box with its opening facing forward. Slide grooves 21 are provided on both the left and right side walls inside the dehydration tank 19. Locking blocks 22 are provided at the top and bottom of the front of the dehydration tank 19. The washing tank 20 is a mesh box with its opening facing upward. Slide rails 23 matching the slide grooves 21 are provided on both sides of the outside of the washing tank 20, and handles 25 are provided on the outside of the washing tank 20. Thus, by holding the handles 25, the slide rails 23 on both sides of the washing tank 20 are matched with the slide grooves 21 inside the dehydration tank 19, and the washing tank 20 is slid into the dehydration tank 19. Then, through the locking blocks 22, the washing tank 20 is confined within the dehydration tank 19, thereby performing washing and dehydration.

[0031] The cleaning chamber 20 has multiple symmetrical slots 24 on both sides inside. The quartz wafers to be cleaned are placed on the slots 24 and fixed in place by the slots 24. In this embodiment, the slots are made of rubber to hold the damaged quartz wafers.

[0032] In one embodiment, the quartz wafer to be cleaned is placed in a coating fixture, which is then placed in a slot 24 and secured by the slot 24; this allows for subsequent cleaning and dehydration. (The coating fixture is commercially available.)

[0033] The upper end of the housing 10 is provided with a door 27; thus, the door 27 facilitates the removal and placement of the washing tank 20 from the dehydration tank 19.

[0034] In addition, a drain valve 26 is provided on the lower side of the box 10, and a support foot 28 is provided at the bottom of the box 10.

[0035] The working principle of this utility model is as follows:

[0036] First, open the door 27 and remove the cleaning box 20 from the dehydration box 19 by holding the handle 25. Then, place the quartz wafer to be cleaned into the slot 24 on the cleaning box 20 or place the quartz wafer into the coating fixture and then place the coating fixture into the slot 24. Next, hold the handle 25 to match the slide rails 23 on both sides of the cleaning box 20 with the slide grooves 21 in the dehydration box 19 and slide it into the dehydration box 19. Then, by rotating the locking block 22, the cleaning box 20 is confined within the dehydration box 19. Finally, close the door 27. The operation of the oil cylinder 14 causes the motor base 15 to descend on the left support plate 11 and the right support plate 12, immersing the dehydration tank 19 in the water inside the tank body 10. At the same time, the operation of the motor 16 causes the dehydration tank 19 to rotate and clean in the water. After cleaning, the operation of the oil cylinder 14 causes the motor base 15 to rise on the left support plate 11 and the right support plate 12, positioning the dehydration tank 19 above the water level. Then, the operation of the motor 16 causes the dehydration tank 19 to rotate to achieve dehydration. This process of cleaning and dehydration is thus achieved.

[0037] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although the technical solutions of this utility model have been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the various embodiments of this utility model.

Claims

1. A quartz wafer cleaning device, characterized in that: The device includes a housing (10), a left support plate (11) and a right support plate (12) on the top of the housing (10). The top of the left support plate (11) and the right support plate (12) are fixedly connected by a connecting plate (13). A telescopic cylinder (14) is provided on the connecting plate (13). The output shaft of the telescopic cylinder (14) passes through the connecting plate (13) and is connected to a motor base (15). A rotating motor (16) is provided on the motor base (15). The output shaft of the rotating motor (16) passes through the motor base (15) and is connected to a rotating shaft (17). The rotating shaft (17) passes through the housing (10) and is connected to a connecting seat (18). A plurality of dehydration tanks (19) are connected around the connecting seat (18). Each of the plurality of dehydration tanks (19) is provided with a washing tank (20).

2. The quartz wafer cleaning apparatus according to claim 1, characterized in that: The dehydration box (19) is a mesh box with the opening facing forward, and the left and right side walls inside the dehydration box (19) are provided with sliding grooves (21).

3. The quartz wafer cleaning apparatus according to claim 2, characterized in that: The dehydration tank (19) has locking blocks (22) at both the top and bottom of its front side.

4. The quartz wafer cleaning apparatus according to claim 3, characterized in that: The cleaning box (20) is a mesh box with the opening facing upwards, and the two sides of the outside of the cleaning box (20) are provided with slide rails (23) that match the slide groove (21).

5. The quartz wafer cleaning apparatus according to claim 4, characterized in that: The cleaning tank (20) has multiple symmetrical slots (24) on both sides inside.

6. The quartz wafer cleaning apparatus according to claim 5, characterized in that: The cleaning tank (20) is provided with a handle (25) on the outside.

7. The quartz wafer cleaning apparatus according to claim 1, characterized in that: The box (10) is equipped with cleaning water, and the water level of the cleaning water is half of that in the box (10).

8. The quartz wafer cleaning apparatus according to claim 7, characterized in that: A drain valve (26) is provided on the lower side of the box (10).

9. The quartz wafer cleaning apparatus according to claim 1, characterized in that: The upper end of the box (10) is provided with a box door (27).

10. The quartz wafer cleaning apparatus according to claim 1, characterized in that: The bottom of the box (10) is provided with support feet (28).

Images