Gas path system, gas conveying device and process equipment system

Abstract

The utility model relates to the technical field of photovoltaics, in particular to a gas path system, a gas conveying device and a process equipment system, and solves the problem that a flow meter is damaged when a gas path system purges a valve. The gas path system comprises a first process gas conveying gas path, a second process gas conveying gas path and a purging gas path. The second process gas conveying gas path comprises a first sub-conveying gas path, and the first sub-conveying gas path comprises a first flow meter, a first valve and a second valve which are connected in sequence. The first end of the purging gas circuit communicates with a purging gas source, and the second end of the purging gas circuit communicates with a gas circuit, located between the first valve and the second valve, of the first sub-conveying gas circuit. And under the condition that the first valve is closed and the second valve is opened, blowing gas is introduced into the blowing gas path, and crystals in the second valve are blown away. Due to the fact that the first valve is closed, crystals can be intercepted by the first valve in the purging process, the crystals cannot flow back to the first flow meter, and the first flow meter cannot be damaged.

Description

Technical Field

[0001] This application relates to the field of photovoltaic technology, specifically to a gas path system, a gas conveying device, and a process equipment system. Background Technology

[0002] In the process of processing products, photovoltaic equipment requires precise control of the flow rate, pressure, and mixing ratio of various gases introduced into the equipment. Flow meters can precisely control and measure the gas flow rate; therefore, they are widely used in the gas path systems of photovoltaic equipment. Photovoltaic equipment includes low-pressure chemical vapor deposition (LPCVD) equipment and plasma-enhanced chemical vapor deposition (PECVD) equipment, among others.

[0003] LPCVD equipment primarily uses two process gases during product processing: a primary process gas and a secondary process gas. The gas supply system utilizes separate gas delivery paths to deliver these two process gases into the LPCVD equipment. The secondary process gas delivery path includes a flow meter and a valve connected to it. During the process, the primary process gas within the LPCVD equipment flows back into the secondary process gas delivery path, causing a reaction between the two gases to form crystals. To prevent crystallization from clogging the valve, a purge gas path is typically included in the gas supply system. This purge gas purges the valve; however, during the purge process, crystals can easily be blown into the flow meter connected to the valve, damaging it and necessitating frequent flow meter replacements. Utility Model Content

[0004] In view of this, embodiments of this application provide a gas path system, a gas delivery device, and a process equipment system, which solves the problem of flow meter damage during valve purging in the gas path system.

[0005] In a first aspect, embodiments of this application provide a gas path system configured to deliver a first process gas and a second process gas to a process device, wherein the first process gas and the second process gas can react to form crystals; wherein the gas path system includes: a first process gas delivery path, a first end of which is connected to a first gas source, and a second end of which is connected to the process device, the first process gas delivery path being configured to deliver the first process gas to the process device; and a second process gas delivery path, including at least one first sub-delivery path, the first end of which is connected to a second gas source ... the first process gas delivery path being configured to deliver the first process gas to the process device; and a second process gas delivery path, including at least one first sub-delivery path, the first end of which is connected to the second gas source, the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the first process gas to the process device; the first process gas delivery path being configured to deliver the The second end of the sub-feed gas path can be connected to the process equipment. The first sub-feed gas path is configured to deliver the second process gas to the process equipment. The first sub-feed gas path includes a first flow meter, a first valve, and a second valve connected in sequence. The second valve is close to the second end of the first sub-feed gas path. A purging gas path is also included. The first end of the purging gas path can be connected to a purging gas source. The second end of the purging gas path is connected to a gas path of the first sub-feed gas path located between the first valve and the second valve. The purging gas path is configured to introduce purging gas when the first valve is closed and the second valve is open, so that the purging gas purges the second valve.

[0006] In some embodiments, the number of the first sub-feed gas paths is multiple, and the second process gas feeding gas path further includes: a second sub-feed gas path, the first end of the second sub-feed gas path being able to communicate with the second gas source, the second end of the second sub-feed gas path being connected to the first end of the multiple first sub-feed gas paths, and the second sub-feed gas path including a fourth valve disposed at the first end of the second sub-feed gas path and the second end of the second sub-feed gas path.

[0007] In some embodiments, the purge air path includes: a first sub-purge air path, the first end of which is connected to the purge air source, the first sub-purge air path including a second flow meter disposed between the first end and the second end of the first sub-purge air path; and multiple second sub-purge air paths, the first ends of which are all connected to the second end of the first sub-purge air path, and the second ends of which are respectively connected to air paths of the multiple first sub-delivery air paths located between the first valve and the second valve, wherein the second sub-purge air path includes a third valve disposed between the first end and the second end of the second sub-purge air path.

[0008] In some embodiments, the purge air path further includes: a third sub-purge air path, the first end of which is connected to the purge air source, the second end of which is connected to the first end of the multiple first sub-delivery air paths, and the third sub-purge air path is configured to purge the first flow meter when the first flow meter is disconnected from the first valve.

[0009] In some embodiments, the purge gas path further includes a dilution gas path, a first end of which is connected to the purge gas source, and a second end of which is connected to the second end of at least one first sub-delivery gas path, wherein the dilution gas path includes a third flow meter and a fifth valve connected in sequence, and the fifth valve is located near the second end of the dilution gas path.

[0010] In some embodiments, the purge air path further includes a vacuum air path, a first end of which is connected to the purge air source, and a second end of which is connected to the second end of at least one first sub-delivery air path, wherein the vacuum air path includes a needle valve and a sixth valve connected in sequence, and the sixth valve is located near the second end of the vacuum air path.

[0011] In some embodiments, the first valve includes a first pneumatic diaphragm valve, and / or the second valve includes a second pneumatic diaphragm valve.

[0012] In some embodiments, the first process gas is oxygen and the second process gas is silane.

[0013] Secondly, embodiments of this application provide a gas delivery device, including: a gas path system as described in the first aspect; and a control module configured to control the first valve to close, control the second valve to open, and control the purge gas path to supply purge gas, so that the purge gas purges the second valve.

[0014] Thirdly, embodiments of this application provide a process equipment system, including: a process equipment configured to process a product; and a gas path system as described in the first aspect, connected to the process equipment and configured to deliver a first process gas and a second process gas to the process equipment, wherein the first process gas and the second process gas can react to form crystals.

[0015] The second end of the purging gas path of the gas path system provided in this application embodiment is connected to the gas path between the first valve and the second valve of the first sub-delivery gas path. When the first valve is closed and the second valve is open, the purging gas path is purged with purging gas, which purges the second valve and blows away the crystals in the second valve. Since the first valve is closed, both the first process gas and the crystals are intercepted by the first valve during the purging process, so that neither the first process gas nor the crystals can flow back to the first flow meter, thereby preventing damage to the first flow meter. Attached Figure Description

[0016] Figure 1 The diagram shown is a schematic representation of an application scenario of the gas path system provided in an embodiment of this application.

[0017] Figure 2 The diagram shown is an application scenario diagram of the second process gas delivery path and purging path provided in an embodiment of this application.

[0018] Figure 3 The diagram shown is an application scenario diagram of the second process gas delivery path and purging path provided in another embodiment of this application.

[0019] Figure 4 The diagram shown is an application scenario diagram of the second process gas delivery path and purging path provided in another embodiment of this application.

[0020] Figure 5 The diagram shown is an application scenario diagram of the second process gas delivery path and purging path provided in another embodiment of this application.

[0021] Figure 6 The diagram shown is a schematic representation of an application scenario for a gas path system provided in another embodiment of this application.

[0022] Figure 7 The diagram shown is a structural schematic of a gas conveying device provided in an embodiment of this application.

[0023] Figure 8 The diagram shown is a structural schematic of a process equipment system provided in an embodiment of this application.

[0024] Figure label:

[0025] 12. Gas conveying device; 13. Process equipment system; 10. Gas circuit system; 100. First process gas conveying circuit; 101. First end of the first process gas conveying circuit; 102. Second end of the first process gas conveying circuit; 110. Eighth valve; 120. Fourth flow meter; 130. Ninth valve; 140. First manual valve; 200. Second process gas conveying circuit; 210. First sub-conveying circuit; 2101. First end of the first sub-conveying circuit; 2102. Second end of the first sub-conveying circuit; 2110. First flow meter; 2120. First valve; 2130. Second valve; 220. Second sub-conveying circuit; 2 201. First end of the second sub-purge air path; 2202. Second end of the second sub-purge air path; 2210. Fourth valve; 2220. Second manual valve; 300. Purge air path; 301. First end of the purging air path; 302. Second end of the purging air path; 310. First sub-purge air path; 3101. First end of the first sub-purge air path; 3102. Second end of the first sub-purge air path; 3110. Second flow meter; 3120. Third manual valve; 320. Second sub-purge air path; 3201. First end of the second sub-purge air path; 3202. Second end of the second sub-purge air path; 3210. Third valve; 330. Third sub-purge air path Path; 3301, First end of the third sub-purge air path; 3302, Second end of the third sub-purge air path; 3310, Seventh valve; 340, Dilute air path; 3401, First end of the dilute air path; 3402, Second end of the dilute air path; 3410, Third flow meter; 3420, Fifth valve; 350, Vacuum breaker air path; 3501, First end of the vacuum breaker air path; 3502, Second end of the vacuum breaker air path; 3510, Needle valve; 3520, Sixth valve; 400, Vacuum extraction air path; 401, First end of the vacuum extraction air path; 402, Second end of the vacuum extraction air path; 410, First sub-vacuum extraction air path; 4101, First sub-vacuum extraction air path The first end of the circuit; 4102, the second end of the first sub-vacuum circuit; 4110, the tenth valve; 420, the second sub-vacuum circuit; 4201, the first end of the second sub-vacuum circuit; 4202, the second end of the second sub-vacuum circuit; 4210, the eleventh valve; 430, the third sub-vacuum circuit; 4301, the first end of the third sub-vacuum circuit; 4302, the second end of the third sub-vacuum circuit; 4310, the twelfth valve; 4320, the thirteenth valve; 30, process equipment; 3001, the first end of the process equipment; 3002, the second end of the process equipment; 40, the first air source; 50, the second air source; 60, the purging air source. Detailed Implementation

[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0027] Figure 1 The diagram shown is a schematic representation of an application scenario for a gas path system provided in an embodiment of this application. For example... Figure 1 As shown, the gas path system 10 is configured to supply a first process gas and a second process gas to the process equipment 30, wherein the first process gas and the second process gas can react to form crystals. The gas path system 10 includes a first process gas supply gas path 100, a second process gas supply gas path 200, and a purge gas path 300. A first end 101 of the first process gas supply gas path can be connected to a first gas source 40, and a second end 102 of the first process gas supply gas path can be connected to the process equipment 30. The first process gas supply gas path 100 is configured to supply the first process gas to the process equipment 30. The second process gas supply gas path 200 includes at least one first sub-supply gas path 210, a first end 2101 of the first sub-supply gas path can be connected to a second gas source 50, and a second end 2102 of the first sub-supply gas path can be connected to the process equipment 30. The first sub-supply gas path 210 is configured to supply the second process gas to the process equipment 30. The first sub-delivery gas path 210 includes a first flow meter 2110, a first valve 2120, and a second valve 2130 connected in sequence, with the second valve 2130 located near the second end 2102 of the first sub-delivery gas path. The first end 301 of the purge gas path can be connected to the purge gas source 60, and the second end 302 of the purge gas path is connected to the gas path of the first sub-delivery gas path 210 located between the first valve 2120 and the second valve 2130. The purge gas path 300 is configured to introduce purge gas when the first valve 2120 is closed and the second valve 2130 is open, so that the purge gas purges the second valve 2130.

[0028] By connecting the second end 302 of the purge gas path of the gas path system 10 with the gas path between the first valve 2120 and the second valve 2130, when the first valve 2120 is closed and the second valve 2130 is open, purge gas is introduced into the purge gas path 300, so that the purge gas purges the second valve 2130, blowing away the crystals in the second valve 2130. Since the first valve 2120 is closed, during the purge process, the first process gas and crystals will be intercepted by the first valve 2120, so that the first process gas and crystals cannot flow back to the first flow meter 2110, thereby preventing damage to the first flow meter 2110.

[0029] For example, the number of first sub-feed gas paths 210 can be one, two, three, or even more. The number of first sub-feed gas paths 210 can be set according to actual process requirements.

[0030] For example, the second end 102 of the first process gas delivery path can be connected to the first end 3001 of the process equipment, or the second end 102 of the first process gas delivery path can be connected to the second end 3002 of the process equipment, or the second end 102 of the first process gas delivery path can be connected to the portion of the process equipment 30 located between the first end 3001 and the second end 3002 of the process equipment. The position of the connection between the second end 102 of the first process gas delivery path and the process equipment 30 can be set according to actual process requirements. Figure 1 The second end 102 of the first process gas delivery path shown is connected to the first end 3001 of the process equipment.

[0031] For example, the second end 2102 of the first sub-conveying gas path can be connected to the first end 3001 of the process equipment, or the second end 2102 of the first sub-conveying gas path can be connected to the second end 3002 of the process equipment, or the second end 2102 of the first sub-conveying gas path can be connected to the portion of the process equipment 30 located between the first end 3001 and the second end 3002 of the process equipment. The position of the second end 2102 of the first sub-conveying gas path connected to the process equipment 30 can be set according to actual process requirements.

[0032] For example, such as Figure 1 As shown, the first process gas conveying gas path 100 includes an eighth valve 110, a fourth flow meter 120 and a ninth valve 130 connected in sequence, with the ninth valve 130 located near the second end 102 of the first process gas conveying gas path.

[0033] For example, the first process gas can be oxygen, and the second process gas can be silane. For example, the first process gas can be water vapor, and the second process gas can be silicon tetrachloride. For example, the first process gas and the second process gas can be any two gases that react to form crystals.

[0034] In some embodiments, the number of first sub-feed gas passages 210 is multiple, and the second process gas delivery gas passage 200 further includes a second sub-feed gas passage 220. The first end 2201 of the second sub-feed gas passage is connected to the second gas source 50, and the second end 2202 of the second sub-feed gas passage is connected to the first end 2101 of the multiple first sub-feed gas passages. The second sub-feed gas passage 220 includes a fourth valve 2210 disposed at the first end 2201 and the second end 2202 of the second sub-feed gas passage.

[0035] The second sub-feed gas path 220 is equipped with a fourth valve 2210, which controls the second sub-feed gas path 220 to simultaneously deliver the second process gas to multiple first sub-feed gas paths 210, thereby simplifying the structure of the second process gas delivery gas path 200.

[0036] For example, such as Figure 1 and Figure 2 As shown, there are three first sub-feed gas paths 210, and the second end 2202 of the second sub-feed gas path is connected to the first end 2101 of the three first sub-feed gas paths. For example, the second end 2102 of one first sub-feed gas path is connected to the first end 3001 of the process equipment, and the second ends 2102 of the two first sub-feed gas paths are both connected to the second end 3002 of the process equipment.

[0037] In some embodiments, the purge air path 300 includes a first sub-purge air path 310 and multiple second sub-purge air paths 320. A first end 3101 of the first sub-purge air path is connected to a purge air source 60, and the first sub-purge air path 310 includes a second flow meter 3110 disposed between the first end 3101 and the second end 3102 of the first sub-purge air path. The first ends 3201 of each of the multiple second sub-purge air paths are connected to the second end 3102 of the first sub-purge air path, and the second ends 3202 of each of the multiple second sub-purge air paths are respectively connected to air paths located between a first valve 2120 and a second valve 2130 in each of the multiple first sub-delivery air paths 210. Each second sub-purge air path 320 includes a third valve 3210 disposed between the first end 3201 and the second end 3202 of the second sub-purge air path.

[0038] The first sub-purge air path 310 is equipped with a second flow meter 3110 to simplify the structure of the purge air path 300.

[0039] For example, such as Figure 2 As shown, there are three second sub-purge gas paths 320. The first end 3201 of each of the three second sub-purge gas paths is connected to the second end 3102 of the first sub-purge gas path, and the second end 3202 of each of the three second sub-purge gas paths is connected to the gas path located between the first valve 2120 and the second valve 2130 of each of the three first sub-delivery gas paths 210. The purge gas delivered by the three second sub-purge gas paths 320 is used to purge the second valve 2130 of each of the three first sub-delivery gas paths 210.

[0040] In some embodiments, the purge air path 300 further includes a third sub-purge air path 330. A first end 3301 of the third sub-purge air path is connected to a purge air source 60, and a second end 3302 of the third sub-purge air path is connected to a first end 2101 of a multi-path first sub-delivery air path. The third sub-purge air path 330 is configured to purge the first flow meter 2110 when the first flow meter 2110 is disconnected from the first valve 2120.

[0041] Disconnecting the first flow meter 2110 from the first valve 2120 means disconnecting the air passage between the first flow meter 2110 and the first valve 2120 from the first flow meter 2110, so that one end of the first flow meter 2110 is connected to the outside.

[0042] When the first flow meter 2110 is disconnected from the first valve 2120, the first flow meter 2110 is purged with purging gas delivered by the third sub-purging gas path 330 to remove impurities from the first flow meter 2110, thereby performing maintenance on the first flow meter 2110.

[0043] For example, such as Figure 3 As shown, the second end 3302 of the third sub-purge gas path is connected to the first end 2101 of the three first sub-delivery gas paths. The purge gas delivered by the third sub-purge gas path 330 is used to purge the first flow meter 2110 of the three first sub-delivery gas paths 210 respectively.

[0044] For example, such as Figure 3 As shown, the first end 3301 of the third sub-purge air path is connected to the air path of the first sub-purge air path 310 located between the second flow meter 3110 and the purge air source 60. Compared with the first end 3301 of the third sub-purge air path being independently connected to the purge air source 60, the structure of the purge air path 300 is simplified.

[0045] For example, such as Figure 3 As shown, the third sub-purge air passage 330 includes a seventh valve 3310 disposed between the first end 3301 and the second end 3302 of the third sub-purge air passage.

[0046] In some embodiments, the purge gas path 300 further includes a dilution gas path 340. A first end 3401 of the dilution gas path is connected to the purge gas source 60, and a second end 3402 of the dilution gas path is connected to a second end 2102 of at least one first sub-delivery gas path. The dilution gas path 340 includes a third flow meter 3410 and a fifth valve 3420 connected in sequence, with the fifth valve 3420 located near the second end 3402 of the dilution gas path.

[0047] The purging gas source 60 supplies purging gas to the dilution gas path 340, and the purging gas is used to dilute the second process gas. Therefore, the purging gas supplied by the purging gas source 60 can both purge the second valve 2130 and dilute the second process gas, making it widely applicable.

[0048] The connection between the second end 3402 of the dilution gas path and the second end 2102 of one of the first sub-conveying gas paths can be set according to actual process requirements. For example, the second end 3402 of the dilution gas path can be connected to the second end 2102 of one first sub-conveying gas path. For example, the second end 3402 of the dilution gas path can be connected to the second ends 2102 of multiple first sub-conveying gas paths. Figure 4 As shown, the second end 3402 of the dilution gas path is connected to the second end 2102 of the first sub-delivery gas path.

[0049] For example, such as Figure 4 As shown, the first end 3401 of the dilution gas path is connected to the gas path of the first sub-purge gas path 310 located between the second flow meter 3110 and the purge gas source 60. Compared with the first end 3401 of the dilution gas path being independently connected to the purge gas source 60, the structure of the purge gas path 300 is simplified.

[0050] In some embodiments, the purge air path 300 further includes a vacuum path 350. A first end 3501 of the vacuum path is connected to the purge air source 60, and a second end 3502 of the vacuum path is connected to a second end 2102 of at least one first sub-delivery air path. The vacuum path 350 includes a needle valve 3510 and a sixth valve 3520 connected in sequence, with the sixth valve 3520 located near the second end 3502 of the vacuum path.

[0051] The process equipment 30 is devastated by using the purge gas source 60 to deliver purge gas to the vacuum breaking circuit 350. Therefore, the purge gas delivered by the purge gas source 60 can both purge the second valve 2130 and devastate the process equipment 30, making it widely applicable.

[0052] In addition, the needle valve 3510 can regulate the flow rate of the purge gas delivered by the vacuum circuit 350.

[0053] In addition, the second end 3502 of the vacuum breaking air path is connected to the air path of the first sub-conveying air path 210 located between the second valve 2130 and the process equipment 30. Compared with the second end 3502 of the vacuum breaking air path being independently connected to the process equipment 30, this simplifies the structure of the purging air path 300.

[0054] For example, such as Figure 5As shown, the first end 3501 of the vacuum breaking air path is connected to the air path of the first sub-purge air path 310 located between the second flow meter 3110 and the purge air source 60. Compared with the first end 3501 of the vacuum breaking air path being independently connected to the purge air source 60, the structure of the purge air path 300 is further simplified.

[0055] The connection between the second end 3502 of the ruptured vacuum path and the second end 2102 of one of the first sub-feed gas paths can be set according to actual process requirements. For example, the second end 3502 of the ruptured vacuum path can be connected to the second end 2102 of one first sub-feed gas path. For example, the second end 3502 of the ruptured vacuum path can be connected to the second ends 2102 of multiple first sub-feed gas paths. Figure 5 As shown, the second end 3502 of the broken vacuum air path is connected to the second end 2102 of the first sub-transmission air path.

[0056] In some embodiments, the first valve 2120 includes a first pneumatic diaphragm valve.

[0057] In some embodiments, the second valve 2130 includes a second pneumatic diaphragm valve.

[0058] In some embodiments, the first valve 2120 includes a first pneumatic diaphragm valve, and the second valve 2130 includes a second pneumatic diaphragm valve.

[0059] Since pneumatic diaphragm valves are prone to clogging, the air circuit system 10 has a better anti-clogging effect when it includes a pneumatic diaphragm valve.

[0060] For example, such as Figures 1 to 5 As shown, the first valve 2120, the second valve 2130, the third valve 3210, the fourth valve 2210, the fifth valve 3420, the sixth valve 3520, the seventh valve 3310, the eighth valve 110, and the ninth valve 130 are all pneumatic diaphragm valves, which facilitates the automatic control of opening or closing of each valve, and the pneumatic diaphragm valves have good sealing performance.

[0061] For example, the first valve 2120, the second valve 2130, the third valve 3210, the fourth valve 2210, the fifth valve 3420, the sixth valve 3520, the seventh valve 3310, the eighth valve 110, and the ninth valve 130 can also be manual valves, butterfly valves, etc.

[0062] In some embodiments, the first process gas is oxygen, and the second process gas is silane.

[0063] Oxygen and silane react more readily to form crystals upon contact, therefore, gas path system 10 is more suitable for transporting oxygen and silane.

[0064] The crystals formed when oxygen and silane come into contact are composed of silicon dioxide.

[0065] For example, the purging gas is an inert gas, which can be a gas such as nitrogen or argon that is chemically inert and difficult to react with other substances.

[0066] For example, such as Figure 6 As shown, the first process gas delivery path 100 also includes a first manual valve 140, which is located in the gas path between the eighth valve 110 and the first gas source 40. The second sub-delivery path 220 also includes a second manual valve 2220, which is located in the gas path between the fourth valve 2210 and the second gas source 50. The first sub-purge path 310 also includes a third manual valve 3120, which is located in the gas path between the second flow meter 3110 and the purge gas source 60. When components of the first process gas delivery path 100, the second process gas delivery path 200, and the purge path 300 need to be disassembled and maintained, closing the first manual valve 140, the second manual valve 2220, and the third manual valve 3120 cuts off the first process gas, the second process gas, and the purge gas, allowing for component disassembly and maintenance.

[0067] For example, such as Figure 6 As shown, the gas path system 10 also includes a vacuum path 400. The first end 401 of the vacuum path is connected to the second end 3002 of the process equipment, and the second end 402 of the vacuum path is connected to the vacuum assembly 70. The vacuum path 400 includes a first sub-vacuum path 410, a second sub-vacuum path 420, and a third sub-vacuum path 430. The first ends 4101 of the first sub-vacuum path and 4301 of the third sub-vacuum path are respectively connected to the second end 3002 of the process equipment. The second ends 4202 and 4302 of the second and third sub-vacuum paths are both connected to the vacuum assembly 70. The second end 4102 of the first sub-vacuum path is connected to the first ends 4201 of the second sub-vacuum path and 4301 of the third sub-vacuum path.

[0068] The first sub-vacuum passage 410 includes a tenth valve 4110 disposed between a first end 4101 and a second end 4102 of the first sub-vacuum passage. The second sub-vacuum passage 420 includes an eleventh valve 4210 disposed between a first end 4201 and a second end 4202 of the second sub-vacuum passage. The third sub-vacuum passage 430 includes a twelfth valve 4310 and a thirteenth valve 4320 disposed between the second end 4102 of the first sub-vacuum passage and the second end 4302 of the third sub-vacuum passage. For example, as... Figure 6 As shown, the tenth valve 4110 is a manual angle valve, the eleventh valve 4210 is a pneumatic angle valve, the twelfth valve 4310 is a pneumatic angle valve, and the thirteenth valve 4320 is a butterfly valve.

[0069] When it is necessary to evacuate the process equipment 30, the first sub-vacuum passage 410 and the second sub-vacuum passage 420 are opened to slowly extract the gas inside the process equipment 30, and then the third sub-vacuum passage 430 is opened to quickly extract the gas inside the process equipment 30.

[0070] Embodiments of this application provide a gas delivery device 12. For example... Figures 1 to 7 As shown, the gas delivery device 12 includes the gas path system 10 and the control module 20 mentioned in the above embodiments. The control module 20 is configured to control the first valve 2120 to close, control the second valve 2130 to open, and control the purge gas path 300 to supply purge gas, so that the purge gas purges the second valve 2130.

[0071] For example, the control module 20 is also configured to control the first process gas delivery path 100 to deliver the first process gas to the process equipment 30, and the second process gas delivery path 200 to deliver the second process gas to the process equipment 30, and the vacuum path 400 to extract gas from the process equipment 30.

[0072] Since the gas delivery device 12 includes the gas path system 10, the gas delivery device 12 possesses all the technical features and effects of the gas path system 10, which will not be described in detail here.

[0073] Embodiments of this application provide a process equipment system 13. For example... Figure 8 As shown, the process equipment system 13 includes a gas path system 10 and a process equipment 30 as mentioned in the above embodiments. The gas path system 10 is connected to the process equipment 30 and is configured to supply a first process gas and a second process gas to the process equipment 30, the first process gas and the second process gas being capable of reacting to form crystals. The process equipment 30 is configured to process a product.

[0074] Since the process equipment system 13 includes the gas path system 10, the process equipment system 13 possesses all the technical features and effects of the gas path system 10, which will not be described in detail here.

[0075] The terms "an embodiment" or "an embodiment" used in this specification indicate that the described embodiment may include a specific feature, structure, or characteristic, but not every embodiment necessarily includes that specific feature, structure, or characteristic. Furthermore, such phrases do not necessarily refer to the same embodiment. Additionally, when a specific feature, structure, or characteristic is described in connection with an embodiment, implementing such a feature, structure, or characteristic in conjunction with other embodiments, whether explicitly described or not, is within the knowledge scope of those skilled in the art.

[0076] It should be understood that “on,” “above,” and “on top of” in this disclosure should be interpreted in the broadest manner, such that “on” means not only “directly on something” but also “on something” with an intermediate feature or layer therebetween, and that “above” or “on top of” means not only “on top of something” but also “on top of something” without an intermediate feature or layer therebetween (i.e., directly on something).

[0077] Furthermore, for ease of explanation, spatial relative terms such as "below," "below," "under," "above," and "above" may be used to describe the relationship of a component or feature relative to other components or features as shown in the figures. Spatial relative terms are intended to encompass different orientations of components in use or operation other than those shown in the figures. Devices may have other orientations (rotated 90 degrees or in other orientations), and the spatial relative descriptive terms used herein may be interpreted accordingly.

[0078] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0079] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications or equivalent substitutions made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A gas path system, characterized in that, It is configured to deliver a first process gas and a second process gas to a process device, wherein the first process gas and the second process gas can react to form crystals; The gas path system includes: A first process gas delivery path, wherein a first end of the first process gas delivery path can be connected to a first gas source, and a second end of the first process gas delivery path can be connected to the process equipment, and the first process gas delivery path is configured to deliver the first process gas to the process equipment. The second process gas delivery path includes at least one first sub-delivery path. A first end of the first sub-delivery path can be connected to a second gas source, and a second end of the first sub-delivery path can be connected to the process equipment. The first sub-delivery path is configured to deliver the second process gas to the process equipment. The first sub-delivery path includes a first flow meter, a first valve, and a second valve connected in sequence. The second valve is located near the second end of the first sub-delivery path. The purge gas path has a first end that can be connected to a purge gas source, and a second end that is connected to a gas path of the first sub-delivery gas path located between the first valve and the second valve. The purge gas path is configured to introduce purge gas when the first valve is closed and the second valve is open, so that the purge gas purges the second valve.

2. The gas path system according to claim 1, characterized in that, The first sub-feed gas path has multiple paths, and the second process gas feeding path also includes: The second sub-gas delivery path has a first end that can be connected to the second gas source, and a second end that is connected to the first end of multiple first sub-gas delivery paths. The second sub-gas delivery path includes a fourth valve disposed at the first end of the second sub-gas delivery path and the second end of the second sub-gas delivery path.

3. The gas path system according to claim 2, characterized in that, The purging air path includes: The first sub-purge air path, the first end of the first sub-purge air path can be connected to the purge air source, and the first sub-purge air path includes a second flow meter disposed between the first end of the first sub-purge air path and the second end of the first sub-purge air path; The system includes multiple second sub-purge air paths, each with its first end connected to the second end of the first sub-purge air path. The second ends of each second sub-purge air path are connected to air paths located between the first valve and the second valve in each of the multiple first sub-delivery air paths. Each second sub-purge air path includes a third valve disposed between the first end of the second sub-purge air path and the second end of the second sub-purge air path.

4. The gas path system according to claim 3, characterized in that, The purging air path also includes: The third sub-purge air path has a first end that can be connected to the purge air source, and a second end that is connected to the first end of the multiple first sub-delivery air paths. The third sub-purge air path is configured to purge the first flow meter when the first flow meter is disconnected from the first valve.

5. The gas path system according to claim 3, characterized in that, The purging air path also includes: The dilution gas path has a first end that can be connected to the purge gas source, and a second end that is connected to the second end of at least one first sub-delivery gas path. The dilution gas path includes a third flow meter and a fifth valve connected in sequence, with the fifth valve located near the second end of the dilution gas path.

6. The gas path system according to claim 3, characterized in that, The purging air path also includes: The vacuum circuit is configured such that its first end is connected to the purge gas source, and its second end is connected to the second end of at least one first sub-delivery gas circuit. The vacuum circuit includes a needle valve and a sixth valve connected in sequence, with the sixth valve located near the second end of the vacuum circuit.

7. The gas path system according to any one of claims 1 to 6, characterized in that, The first valve includes a first pneumatic diaphragm valve, and / or the second valve includes a second pneumatic diaphragm valve.

8. The gas path system according to any one of claims 1 to 6, characterized in that, The first process gas is oxygen, and the second process gas is silane.

9. A gas conveying device, characterized in that, include: The gas path system as described in any one of claims 1 to 8; The control module is configured to control the first valve to close, control the second valve to open, and control the purge gas to enter the purge gas path so that the purge gas purges the second valve.

10. A process equipment system, characterized in that, include: Process equipment is configured to process products; The gas path system according to any one of claims 1 to 8, connected to the process equipment, is configured to deliver a first process gas and a second process gas to the process equipment, wherein the first process gas and the second process gas can react to form crystals.

Images