Deviation rectifying mechanism, exposure mechanism and exposure equipment

By using a correction mechanism and a cross-movement mechanism, the precise position adjustment of the photomask is achieved, which solves the problems of high cost and low production efficiency of digital scanning lithography machines, reduces equipment costs, and improves the production efficiency of photovoltaic cell grid lines.

CN223566025UActive Publication Date: 2025-11-18SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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Patent Information

Application Number
CN202421587716.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Priority Date
2023-10-10
Filing Date
2024-07-06
Publication Date
2025-11-18
Estimated Expiration
2034-07-06

AI Technical Summary

Technical Problem

In the current production of photovoltaic cell grid lines, digital scanning lithography machines are costly and have low production efficiency, while the motion control of mask exposure machines in multi-stage mode is complex and costly.

Method used

The system employs a correction mechanism, including a mounting base plate, a drive adjustment mechanism, and an adjustment plate. Three drive devices enable the mask plate to move and rotate in the vertical and horizontal directions. Combined with a cross-movement mechanism and an auxiliary moving mechanism, motion control is simplified.

Benefits of technology

It reduces equipment costs, improves production efficiency and precision, simplifies motion control, and is suitable for exposure processes of photovoltaic cell grid lines in multi-stage mode.

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Abstract

The utility model relates to a deviation rectifying mechanism, exposure mechanism and exposure equipment, the deviation rectifying mechanism comprises a mounting bottom plate, a driving adjusting mechanism and an adjusting plate, the driving adjusting mechanism is mounted on the mounting bottom plate, the adjusting plate is connected with the driving adjusting mechanism, the deviation rectifying mechanism is vertically arranged, the driving adjusting mechanism comprises at least three driving devices, and the driving devices are connected with the adjusting plate. The driving devices are arranged on the two adjacent sides of the mounting bottom plate correspondingly and comprise the first driving device for driving the adjusting plate to move in the vertical direction and the second driving device for driving the adjusting plate to move in the horizontal direction, and at least the second driving device comprises a driving source, a cross moving mechanism and an auxiliary moving mechanism. The cross moving mechanism and the auxiliary moving mechanism are located on the two sides of the driving source. According to the deviation correcting mechanism, the mask plate can move and rotate in a determined plane in the vertical direction and the horizontal direction through three driving devices, and the precision of the deviation correcting mechanism is guaranteed through the arrangement of the cross moving mechanism and the auxiliary moving mechanism.
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Description

TECHNICAL FIELD

[0001] The utility model relates to mask exposure technical field especially is for the deviation rectifying mechanism, exposure mechanism and exposure equipment of mask plate position adjustment. BACKGROUND

[0002] At present, when making photovoltaic cell piece grid line, mainly adopts silver paste screen printing technology or copper electroplating process. Silver paste screen printing technology cost is high, and efficiency production capacity is low, and simultaneously the conductivity of grid line and battery energy conversion are relatively low, make copper electroplating process more attention.

[0003] Copper electroplating process includes four steps of seed layer deposition, patterning, copper electroplating and post-processing, and patterning is a more important link in copper electroplating process, and exposure process is used to generate pattern on substrate. In current exposure process, mainly includes digital scanning mode and mask projection mode, and digital scanning type photoetching machine can meet the process demand of copper electroplating grid line, but due to digital scanning mode, the light width of each optical lens is small, and many parts are needed, and when making more fine grid line, higher resolution configuration is needed, and the cost is high, and the scanning speed is limited in working process, and the processing efficiency is limited. Photovoltaic product substrate is relatively fixed in size compared with PCB, and the material number data is less changed, and basically the same size substrate is made into the same specification grid line, and the mask plate needed when patterning is relatively fixed, and digital scanning type photoetching machine is difficult to play the advantage that it can expose multiple patterns, and the production efficiency is limited.

[0004] Mask exposure machine is applied to photovoltaic cell piece, and due to production capacity requirement, usually needs to adopt the mode of multiple worktables working, in order to make mask and workpiece alignment, needs to set up multiple shaft operation mechanism in each worktable, and the motion control is complex, and the cost is high. SUMMARY

[0005] The utility model solves the technical problem that provides a kind of deviation rectifying mechanism, exposure mechanism and exposure equipment for adjusting mask plate position.

[0006] In order to solve the above problems, the present application provides a deviation rectifying mechanism, which comprises a mounting base plate, a driving adjusting mechanism and an adjusting plate, the driving adjusting mechanism is mounted on the mounting base plate, the adjusting plate is connected with the driving adjusting mechanism, the deviation rectifying mechanism is vertically arranged, the driving adjusting mechanism comprises at least three driving devices, the driving devices are arranged on two adjacent sides of the mounting base plate respectively, the first driving device drives the adjusting plate to move in the vertical direction, and the second driving device drives the adjusting plate to move in the horizontal direction perpendicular to the vertical direction, at least the second driving device comprises a driving source, a cross moving mechanism and an auxiliary moving mechanism, the cross moving mechanism and the auxiliary moving mechanism are located on two sides of the driving source, and the driving source drives the cross moving mechanism and the auxiliary moving mechanism to move.

[0007] Preferably, the cross moving mechanism comprises a first sliding member mounted on the base plate, a second sliding member mounted on the first sliding member, and a rotating bearing mounted on the second sliding member, the sliding directions of the first sliding member and the second sliding member are perpendicular, the sliding direction of the auxiliary moving mechanism is consistent with that of the first sliding member, and the adjusting plate is connected with the rotating bearing.

[0008] Preferably, the cross moving mechanism of the second driving device is located at the lower part, and the auxiliary moving mechanism is located at the upper part.

[0009] Preferably, the cross moving mechanism adopts a cross roller guide rail, the auxiliary moving mechanism comprises a guide rail and a sliding block, and the sliding block is connected with the driving source.

[0010] Preferably, the driving source adopts a servo lead screw, or the driving source adopts a linear motor, and the driving devices of the driving adjusting mechanism all comprise the cross moving mechanism and the auxiliary moving mechanism.

[0011] Preferably, the linear motor drives the cross moving mechanism and the auxiliary moving mechanism to move through a connecting member, the connecting member comprises a first connecting part, a second connecting part and a third connecting part, the first connecting part is connected with the side of the linear motor and slides along the side of the linear motor, the second connecting part is connected with the first sliding member of the cross moving mechanism laterally, and the third connecting part is connected with the top of the auxiliary moving mechanism, the first connecting part and the second connecting part are connected, and the second connecting part and the third connecting part are connected vertically.

[0012] Preferably, the mounting base plate and the adjusting plate of the deviation rectifying mechanism are provided with magnetic attraction devices.

[0013] Preferably, the deviation rectifying mechanism further comprises a mask mounting plate for mounting and fixing the mask, and the mask mounting plate is integrally mounted on the adjusting plate, four corners of the adjusting plate are respectively provided with adjusting members, the adjusting members abut against the mask mounting plate, the adjusting members comprise two push members respectively close to two adjacent sides of the adjusting plate, the position of the mask mounting plate is adjusted by pushing the mask mounting plate through adjusting the adjusting members, and the best image plane of the mask plate is obtained.

[0014] Preferably, the mask mounting plate comprises a base plate, a light passing hole located at the middle of the base plate, strip-shaped limiting members located around the light passing hole, two corner positioning members located at the lower part of the light passing hole, the corner positioning members cover the lower corner positions of the mask plate, the lower part of the mask mounting plate has at least two notches, the adjusting plate is provided with protrusions, the protrusions are accommodated in the notches, and the position of the mask mounting plate is supported and limited.

[0015] Preferably, the driving adjusting mechanism further comprises independently arranged rotating members, the rotating members and the three driving devices are symmetrically arranged and connected with the adjusting plate.

[0016] An exposure mechanism, the exposure mechanism comprises a mask plate, and the mask plate is mounted on the deviation rectifying mechanism.

[0017] An exposure device, the exposure device comprises a rotating table provided with a plurality of worktables, and the exposure device further comprises the exposure mechanism, and the exposure mechanism performs exposure operation on a workpiece placed on the rotating table.

[0018] Compared with the prior art, the deviation rectifying mechanism realizes the movement and rotation of the mask plate in the vertical direction and the horizontal direction to determine the plane through the three driving devices, and the precision of the deviation rectifying mechanism is ensured through the arrangement of the cross movement mechanism and the auxiliary movement mechanism. The exposure device does not need to be provided with a multi-axis operation mechanism on each worktable, movement control is simple, and the cost is low. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a schematic view of each processing station.

[0020] Figure 2 is a schematic view of an exposure device.

[0021] Figure 3 is a top view of a rotating platform.

[0022] Figure 4 is a sectional view of the rotating platform.

[0023] Figure 5 is a schematic view of an exposure mechanism.

[0024] Figure 6 is a schematic view of a deviation rectifying mechanism.

[0025] Figure 7 is a schematic diagram of an embodiment of the driving adjustment mechanism of the deviation rectifying mechanism.

[0026] Figure 8 is a cross-sectional view of the cross-moving mechanism.

[0027] Figure 9 is a schematic diagram of the adjustment plate and the mask mounting plate.

[0028] Figure 10 is a schematic diagram of the adjustment member mounted on the adjustment plate.

[0029] Figure 11 is a schematic diagram of the motion control principle.

[0030] Figure 12 is a schematic diagram of another embodiment of the driving adjustment mechanism of the deviation rectifying mechanism.

[0031] Figure 13 is a cross-sectional schematic diagram of another embodiment of the driving adjustment mechanism of the deviation rectifying mechanism

[0032] Figure 14 is a cross-sectional view of the driving device of another embodiment of the driving adjustment mechanism of the deviation rectifying mechanism.

[0033] Figure 15 is a cross-sectional view of the connecting member of another embodiment of the driving adjustment mechanism of the deviation rectifying mechanism. DETAILED DESCRIPTION

[0034] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be described below by means of specific embodiments shown in the drawings.

[0035] As shown in Figure 1 , it is an exposure method, which has a feeding station, a positioning station, an exposure station and a discharging station, at least one positioning buffer station is included between the feeding station and the positioning station, at least one exposure buffer station is included between the positioning station and the exposure station, at least one discharging buffer station is included between the exposure station and the discharging station, and at least one feeding buffer station is included between the discharging station and the feeding station.

[0036] Each station corresponds to a workbench, and a workpiece placed on the workbench is fed from the feeding station, positioned by the positioning station, exposed by the exposure station, and discharged by the discharging station. Each workbench moves back and forth in a cycle, and each workbench moves to the next station by one position, and each station works independently.

[0037] The feeding station is provided with a feeding device, and the workpiece is accurately placed on the workbench by the feeding device. When the workbench moves to the feeding station, the feeding device places the workpiece on the workbench. Alternatively, the feeding device is located between the feeding station and the feeding buffer station. When the workbench moves to the feeding buffer station, the feeding preparation work is performed. When the workbench moves to the feeding station and the next workbench moves to the feeding buffer station, two workpieces are placed on the respective workbenches at the same time.

[0038] The alignment station is provided with an alignment mechanism, and the alignment mechanism includes an image acquisition mechanism. The actual position of the workpiece is obtained by the image acquisition mechanism. Preferably, four image acquisition mechanisms are provided. The image acquisition mechanism includes a camera, a telecentric lens and a light source. The two ends of the telecentric lens are connected with the camera and the light source, respectively. The image acquisition unit simultaneously acquires pictures of four corners of the workpiece. In the alignment process, there is no distortion influence, and the alignment accuracy is higher. In addition, compared with acquiring the image of the entire workpiece by a panoramic camera, each image occupies less memory, and the data processing speed is faster.

[0039] The exposure station is provided with an exposure mechanism. The exposure mechanism includes a light source, a shaping unit, a mask, a deviation correction mechanism and a projection mechanism. The light emitted by the light source passes through the shaping unit, the mask and the projection mechanism in sequence and is projected onto the workpiece. The mask is installed on the deviation correction mechanism. The position of the mask is adjusted by the deviation correction mechanism so as to correspond to the position of the workpiece.

[0040] The unloading station is provided with an unloading mechanism. The workpiece is removed from the workbench by the unloading device. When the workbench moves to the unloading station, the unloading device removes the workpiece from the workbench. Alternatively, the unloading device is located between the unloading station and the unloading buffer station. When the workbench moves to the unloading buffer station, the unloading preparation work is performed. When the workbench moves to the unloading station and the next workbench moves to the unloading buffer station, two workpieces are removed from the respective workbenches at the same time.

[0041] Each station is arranged in a ring shape. The workbench is installed on a rotary driving device. The workbench is driven by the rotary driving device to reciprocate between the stations.

[0042] The number of stations of the exposure method is an integer multiple N of 4 stations. N is a positive integer not less than 2. The angle of rotation of the rotary driving device is 90 / N. According to the size of the exposure equipment and the inertia of the overall station, the larger the value of N is, the smaller the rotation angle of the rotary driving mechanism is. However, the number of workbenches increases, the overall weight of the rotary driving increases, and the required rotary inertia and diameter increase accordingly. Therefore, preferably, 8 stations are adopted. The rotation time is the shortest, and the exposure process required is not occupied.

[0043] When the exposure method adopts eight stations, the workpiece is placed on the workbench from the feeding station, the workbench drives the workpiece to move to the alignment buffer station, the workpiece feeding detection is performed, whether the workpiece is successfully fed and / or whether the workpiece has defects such as cracks is detected. The workbench moves to the alignment station for alignment, the exposure buffer station is used for alignment processing, moves to the exposure station for exposure operation, and moves to the unloading buffer station for unloading preparation. The unloading station completes the unloading operation. Each workbench circulates and reciprocates, and each station works independently. The buffer station of each station can be used to realize the preparation work before processing, reduce the processing time in the corresponding station, and improve the processing efficiency. At the same time, the workbench rotates by 45°, that is, one workpiece completes exposure, and the production interval time of the workpiece is shortened.

[0044] The exposure method will be described in detail below. The exposure device using the exposure method is as shown in Figures 2-15 The exposure device includes a base 1, a support frame 2 and a rotating table 3 arranged on the base, and an exposure mechanism 4 and an alignment mechanism 5 arranged on the support frame 2.

[0045] The rotating table 3 includes a rotating drive device and a workbench 30 arranged on the rotating drive device. The rotating drive device drives the workbench 30 to move to each station. The rotating drive device can be driven by a direct drive motor (DD motor) or a linear motor. The linear motor driving mode will be described in detail below. The rotating drive device includes a turntable 31, a linear motor, a cross roller bearing 32, a stator 33 and a rotor 34. The workbench 30 is installed on the turntable 31. The turntable 31 is installed on the cross roller bearing 32. The cross roller bearing 32 is connected to the rotor 34. The rotor 34 moves relative to the stator 33. By driving the cross roller bearing 32 to rotate, the workbench 30 installed on the turntable 31 is driven to move between different stations. The diameter of the rotor 34 of the rotating drive mechanism is greater than the diameter of the turntable 31, which solves the problem of end jump during driving of the larger diameter turntable and improves the repeat accuracy and positioning accuracy of the rotating drive mechanism. When the rotating drive device rotates, the movement position of each station is measured by a magnetic grating ruler, and real-time accuracy compensation is performed.

[0046] The number of workbenches 30 corresponds to the number of processing stations, including workbenches corresponding to the feeding station, the alignment station, the exposure station and the unloading station, and workbenches corresponding to at least one buffer station between each station. Preferably, eight workbenches are used. The rotating drive mechanism rotates by 45° to drive the workbench to move to the next station.

[0047] The exposure mechanism 4 comprises a light source, a shaping unit 40, a deviation rectifying mechanism 41, a projection lens 42 and a mask 43, the light source transmits light to the shaping unit 40 through an optical fiber, the mask and the deviation rectifying mechanism 41 are arranged between the shaping unit 40 and the projection lens 42, and the deviation rectifying mechanism 41 is fixedly connected with the projection lens 42. The mask 43 is installed on the deviation rectifying mechanism 41, the mask 43 is arranged vertically, divides the exposure lens into a front end and a rear end, avoids that the exposure lens is too long and occupies a small space, at the same time, the deviation rectifying mechanism 41 is arranged to adjust the positional relationship between the mask 43 and the workpiece, and an adjusting mechanism does not need to be arranged on a workbench for carrying the workpiece, especially in a mode of arranging multiple workbenches, the components of the workbench are greatly reduced, the workbench is simpler, the weight of the workbench is reduced, and control is facilitated. However, after the deviation rectifying mechanism 41 is arranged vertically, the moving precision is affected due to the action of force.

[0048] In order to improve the precision of the vertically arranged deviation rectifying mechanism, as shown in the deviation rectifying mechanism 41, Figures 5-15 The deviation rectifying mechanism 41 comprises a mounting base plate 400, an adjusting plate 500, a mask mounting plate 600 and a driving adjusting mechanism 700, the mounting base plate 400 is used for fixing the position of the deviation rectifying mechanism 41, the driving adjusting mechanism 700 is installed on the mounting base plate 400, the mounting base plate 400 and the adjusting plate 500 are connected through the driving adjusting mechanism 700, the driving adjusting mechanism pushes the adjusting plate 500 to move and is adjusted to a suitable position, and the mask mounting plate 600 is detachably installed on the adjusting plate 500. The mounting base plate 400, the adjusting plate 500 and the mask mounting plate 600 are all hollow.

[0049] The driving adjusting mechanism comprises at least three driving devices, the driving devices are arranged on adjacent two sides of the mounting base plate 400, the driving devices comprise a first driving device 701 for driving the adjusting plate 500 to move in a vertical direction and a second driving device 702 for driving the adjusting plate to move in a horizontal direction perpendicular to the vertical direction, the number of the first driving device 701 or the second driving device 702 is two, the rotation of the adjusting plate is realized by adjusting the different feeding amounts of the two first driving devices 701 or the two second driving devices 702. The three driving devices are controlled to drive the adjusting plate 500 to move linearly and rotate in a vertical plane. The driving adjusting mechanism 700 further comprises a rotating member 703 arranged independently and matched with the rotation of the adjusting plate. Preferably, the rotating member 703 and the three driving devices (701, 702) are symmetrically arranged and connected with the adjusting plate 500.

[0050] The second driving device located at least at the lower part of the mounting base comprises a driving source 710, a cross-moving mechanism 711 and an auxiliary moving mechanism 712, the cross-moving mechanism 711 and the auxiliary moving mechanism 712 are located at two sides of the driving source 710, the driving source 710 connects the cross-moving mechanism 711 and the auxiliary moving mechanism 712 through a connecting member, the adjusting plate 500 is connected with the cross-moving mechanism 711, the driving source 710 drives the cross-moving mechanism 711 to move the adjusting plate 500, the auxiliary moving mechanism 712 guides the movement to ensure the accuracy of the cross-moving mechanism 711 and avoid the accuracy influence caused by the vertical installation stress. The cross-moving mechanism 711 comprises a first sliding member 7110 mounted on the base plate, a second sliding member 7111 mounted on the first sliding member 7110, a rotating bearing 7112 mounted on the second sliding member 7111, the sliding directions of the first sliding member 7110 and the second sliding member 7111 are perpendicular, the auxiliary moving mechanism 712 is consistent with the sliding direction of the first sliding member 7110, and the adjusting plate 700 is connected with the rotating bearing 7112. The auxiliary moving mechanism 712 comprises a guide rail and a sliding block, the sliding block is connected with the driving source and adopts a linear guide rail. The first sliding member 7110 and the second sliding member 7111 can adopt a cross-roller guide rail. For the driving device located at the lower part of the mounting base, preferably, the auxiliary moving mechanism 712 is located at the upper side, the cross-moving mechanism 711 is located at the lower side, and the auxiliary moving mechanism 712 selects a moving mechanism capable of bearing a load greater than the load of the corresponding correction mechanism. In this way, the auxiliary moving mechanism 712 bears more longitudinal load, protects the cross-moving mechanism 711 from stress wear and deformation, and ensures the accuracy of the cross-moving mechanism 711.

[0051] Four corners of the adjusting plate 500 are respectively provided with adjusting members 501 abutting against the mask mounting plate 500, the position of the mask mounting plate 500 is adjusted by adjusting the adjusting members and pushing the mask mounting plate 500, and the best image plane of the mask plate is obtained. Preferably, the adjusting member 501 comprises two pushing members respectively close to two adjacent sides of the adjusting plate for multidirectional adjustment of the mask mounting plate 500. The adjusting member 501 can adopt a precision screw pair.

[0052] The mask mounting plate 600 comprises a substrate 601, a light hole in the middle of the substrate 601, a strip-shaped limiting piece 603 around the light hole, two corner positioning pieces 604 at the lower part of the light hole, the corner positioning pieces 604 covering the lower corner position of the mask plate 43. The strip-shaped limiting piece 603 fixes the four edges of the mask plate 43, and the two corner positioning pieces 604 and the lower strip-shaped limiting piece 603 support and limit the position of the mask plate 43. The lower part of the substrate 601 has two notches matched with the protrusions 502 on the adjusting plate 500 to support and limit the position of the mask mounting plate 600. The mask mounting plate 600 and the adjusting plate 500 are also positioned by the side fixing pieces 605. When the mask plate is replaced, the mask mounting plate 600 can be removed as a whole, and the optimal focal plane of the mask plate does not need to be adjusted again when it is installed again, which is simple and convenient to operate and shortens the debugging time.

[0053] When the mask plate is aligned and corrected with the workpiece, the feeding amount of the three driving devices is adjusted respectively to realize the movement and rotation of the mask plate in the vertical direction and the horizontal direction. Taking the setting of two first driving devices and one second driving device as an example.

[0054] As shown by the convex 11, a coordinate system is established with the vertical direction as the X direction and the horizontal direction as the Y direction.

[0055] The relative feeding amount d X1 of the first driving device A 701a corresponds to X1 Rcos(dθ+θ X1 +θ0)-Rcos(θ +θ0).

[0056] The relative feeding amount d X2 of the first driving device B 701b corresponds to X2 Rcos(dθ+θ X2 +θ0)-Rcos(θ +θ0).

[0057] The relative feeding amount d Y of the second driving device 702 corresponds to Y Rsin(dθ+θ Y +θ0)-Rsin(θ +θ0).

[0058] Wherein R is the virtual circle radius determined by the center of the rotating bearing of the initial first driving device A 701a, the first driving device B 701b and the second driving device 702, θ X1 is the angle position of the rotating bearing center of the first driving device A 701a, θ X2 is the angle position of the rotating bearing center of the first driving device B 701b, and θ Yθ0 is the angle position of the rotation bearing center of the second driving device 7002, θ0 is the angle of the adjusting plate before the calculation operation, and dθ is the rotation angle of the adjusting plate.

[0059] The deviation correction mechanism using different driving sources is described below through different embodiments.

[0060] As shown in Figures 6-10 , the first embodiment of the deviation correction mechanism uses a servo lead screw as the driving source. The driving adjusting mechanism includes three driving devices, namely the first driving device A 701a, the first driving device B 701b, and the second driving device 702.

[0061] The first driving device A 701a and the first driving device B 701b include a vertical servo lead screw 720 and a vertical cross-moving mechanism 721. The vertical servo lead screw 720 includes a servo motor and a lead screw 722 connected to the servo motor. The first sliding member of the vertical cross-moving mechanism 721 moves vertically, the second sliding member arranged on the upper part of the first sliding member moves horizontally perpendicular to the vertical direction, and the rotating bearing is arranged above the second sliding member. The vertical servo lead screw 720 is located on one side of the vertical cross-moving mechanism 721 and is connected to the first sliding member of the cross-moving mechanism 721. The servo motor drives the lead screw 722 to drive the cross-moving mechanism to move vertically.

[0062] The second driving device 702 includes a horizontal servo lead screw 710, a horizontal cross-moving mechanism 711, and an auxiliary moving mechanism 712. The horizontal servo lead screw 710 is located between the horizontal cross-moving mechanism 711 and the auxiliary moving mechanism 712 and drives the horizontal cross-moving mechanism 711 and the auxiliary moving mechanism 712 to move. The first sliding member of the horizontal cross-moving mechanism 711 moves horizontally, the second sliding member arranged on the upper part of the first sliding member moves vertically perpendicular to the horizontal direction, and the rotating bearing is arranged above the second sliding member. The auxiliary moving mechanism 712 moves in the same direction as the first sliding member, i.e., horizontally. The auxiliary moving mechanism bears the longitudinal load to ensure the accuracy of the cross-moving mechanism.

[0063] Preferably, a rotating member 703 is symmetrically arranged with the second driving device 702. The rotating member 703 includes a horizontal cross-moving mechanism 730 and an auxiliary moving mechanism 731, and the auxiliary moving mechanism 731 is connected to the first sliding member of the horizontal cross-moving mechanism 730.

[0064] As shown in Figures 12-15As shown, the second embodiment of the deviation rectifying mechanism adopts a linear motor as a driving source, and the driving adjustment mechanism includes three driving devices, i.e., a first driving device A 741a, a first driving device B 741b and a second driving device 742.

[0065] The first driving device A 741a, the first driving device B 741a and the second driving device 742 each include a linear motor 750, a cross-moving mechanism 751, an auxiliary moving mechanism 752 and a connecting piece 753. The linear motor 750 drives the cross-moving mechanism 751 and the auxiliary moving mechanism 752 to move through the connecting piece. The moving direction of the auxiliary moving mechanism 752 is the same as the moving direction of the first sliding piece 7510 of the cross-moving mechanism 751. The first sliding mechanism of the cross-moving device of the first driving device A 741a and the first driving device B 741a moves vertically, and the first sliding mechanism of the cross-moving device of the second driving device 742 moves horizontally. The connecting piece 753 includes a first connecting part 7530, a second connecting part 7531 and a third connecting part 7532. The first connecting part 7530 is connected to the side of the linear motor 750, the second connecting part 7531 is connected to the first sliding piece 7510 of the cross-moving mechanism 751, and the third connecting part 7532 is connected to the top of the auxiliary moving mechanism 752. The first connecting part 7530 and the second connecting part 7531 are connected, and the second connecting part 7531 and the third connecting part 7532 are connected vertically. The linear motor 750 drives the connecting piece 753 to move, and the connecting piece 753 drives the cross-moving mechanism 751 and the auxiliary moving mechanism 752 to move. The linear motor 750 is external, and drives the cross-moving mechanism 751 and the auxiliary moving mechanism 752 to move through the connecting piece 753. This facilitates the synchronous control of the cross-moving mechanism 752 and the auxiliary moving mechanism 753, better plays the guiding role of the auxiliary moving mechanism 752, avoids the stress abrasion and deformation of the cross-moving mechanism 751, and affects the precision of the system.

[0066] The mounting bottom plate of the deviation rectifying mechanism and the adjustment plate are provided with a magnetic attraction device 760. When power is off, the magnetic attraction device 760 fixes the positions of the mounting bottom plate and the adjustment plate, avoids losing the limiting device after power off, freely slides, is not conducive to transportation and fixing, and can also avoid damage after receiving external force after power off.

[0067] The linear motor driving mode can improve the moving speed and match a faster processing pace.

[0068] The alignment mechanism 5 comprises a plurality of image acquisition mechanisms 50 located at the oblique side of the exposure mechanism 4, the number of the image acquisition mechanisms 50 corresponds to the number of the top corners of the workpiece, for example, for a rectangular workpiece, the number of the image acquisition mechanisms 50 is four, which corresponds to the shape of the workpiece.

[0069] The exposure device adopts a mask alignment mode, reduces the load of each station, adopts a design of at least eight worktables, improves the overall beat of the device, increases the overall fault tolerance, and ensures the improvement of the overall production capacity.

Claims

1. A deviation rectifying mechanism comprising a mounting base plate, a driving adjustment mechanism mounted to the mounting base plate, and an adjustment plate connected to the driving adjustment mechanism, characterized in that: The deviation rectifying mechanism is vertically arranged, the driving adjusting mechanism comprises at least three driving devices, the driving devices are respectively arranged on two adjacent sides of the mounting bottom plate, the driving devices comprise a first driving device for driving the adjusting plate to move in the vertical direction and a second driving device for driving the adjusting plate to move in the horizontal direction perpendicular to the vertical direction, at least the second driving device comprises a driving source, a cross moving mechanism and an auxiliary moving mechanism, the cross moving mechanism and the auxiliary moving mechanism are located on two sides of the driving source, and the driving source drives the cross moving mechanism and the auxiliary moving mechanism to move.

2. The correction mechanism of claim 1, wherein: The cross moving mechanism comprises a first sliding member mounted on the mounting bottom plate, a second sliding member mounted on the first sliding member, and a rotating bearing mounted on the second sliding member, the sliding directions of the first sliding member and the second sliding member are perpendicular, the sliding direction of the auxiliary moving mechanism is consistent with that of the first sliding member, and the adjusting plate is connected with the rotating bearing.

3. The correction mechanism of claim 1, wherein: The cross moving mechanism of the second driving device is located at the lower part, and the auxiliary moving mechanism is located at the upper side.

4. The correction mechanism of claim 1, wherein: The cross moving mechanism adopts a cross roller guide rail, the auxiliary moving mechanism comprises a guide rail and a sliding block, and the sliding block is connected with the driving source.

5. The correction mechanism of claim 1, wherein: The driving source adopts a servo lead screw, or the driving source adopts a linear motor, and the driving devices of the driving adjusting mechanism all comprise the cross moving mechanism and the auxiliary moving mechanism.

6. The correction mechanism of claim 5, wherein: The linear motor drives the cross moving mechanism and the auxiliary moving mechanism to move through a connecting piece, the connecting piece comprises a first connecting part, a second connecting part and a third connecting part, the first connecting part is connected with and slides along the side of the linear motor, the second connecting part is connected with the first sliding member of the cross moving mechanism in the lateral direction, the third connecting part is connected with the top of the auxiliary moving mechanism, the first connecting part and the second connecting part are connected, and the second connecting part and the third connecting part are connected in the vertical direction.

7. The correction mechanism of claim 1, wherein: The mounting bottom plate and the adjusting plate of the deviation rectifying mechanism are provided with magnetic attraction devices.

8. The correction mechanism of claim 1, wherein: The deviation rectifying mechanism further comprises a mask mounting plate for mounting and fixing a mask, and the mask mounting plate is integrally mounted on the adjusting plate, four corners of the adjusting plate are respectively provided with adjusting members, the adjusting members abut against the mask mounting plate, the adjusting members comprise two pushing members which are respectively close to two adjacent sides of the adjusting plate, the position of the mask mounting plate is adjusted by pushing the mask mounting plate through adjusting the adjusting members, and the best image plane of the mask plate is obtained.

9. The correction mechanism of claim 8, wherein: The mask mounting plate comprises a base plate, a light passing hole located in the middle of the base plate, strip-shaped limiting members located around the light passing hole, and two corner positioning members located at the lower part of the light passing hole, the corner positioning members cover the corner positions of the mask plate at the lower part, the mask mounting plate has at least two notches at the lower part, the adjusting plate is provided with protrusions, the protrusions are accommodated in the notches, and the position of the mask mounting plate is supported and limited.

10. The correction mechanism of claim 1, wherein: The driving adjusting mechanism further comprises independently arranged rotating members, the rotating members and the three driving devices are symmetrically arranged and connected with the adjusting plate.

11. An exposure mechanism comprising a mask plate, characterized by: The mask plate is mounted on the deviation rectifying mechanism according to any one of claims 1-10.

12. An exposure apparatus comprising a rotary stage which provides a plurality of work tables, characterized by: The exposure device further comprises the exposure mechanism of claim 11, which exposes the workpiece placed on the rotating table.