Intermediate structure in solar cell preparation process

Abstract

The utility model discloses an intermediate structure in a solar cell preparation process, which comprises a cell sheet main body, grid line grooves are etched on a light-in surface and a backlight surface of the cell sheet main body, and the grid line grooves of the light-in surface penetrate through a light-in surface photosensitive adhesive layer and a light-in surface copper seed layer of the cell sheet main body and are exposed out of a light-in surface TCO layer. The grid line groove of the backlight surface penetrates through the backlight surface photosensitive adhesive layer and the backlight surface copper seed layer of the battery piece main body and is exposed out of the backlight surface TCO layer, the light incident surface TCO layer and the light incident surface photosensitive adhesive layer are different in color, and the backlight surface TCO layer and the backlight surface photosensitive adhesive layer are different in color. According to the utility model, whether the solar cell is exposed and developed uncleanly can be rapidly and accurately detected, and the problem of large-batch line loosening after the grid line is electroplated and deposited is avoided.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic technology field especially is a kind of intermediate structure in solar cell preparation process. BACKGROUND

[0002] In order to further reduce the cost of solar cell electrode, while improving its conversion efficiency, the method for preparing solar cell metal electrode by using copper interconnection technology has been widely concerned. In the copper interconnection process, copper metal is often used instead of silver to reduce the cost of electrode. In addition, copper interconnection technology can prepare narrower grid lines, thereby reducing the shading area of the cell and improving the current of the cell, so as to improve the photoelectric conversion efficiency.

[0003] In the preparation process of the existing solar cell, whether the grid line groove after exposure and development is clean is particularly important, which determines whether the adhesion of the grid line is qualified and the line type appearance. In order to improve the photosensitivity of photoresist, most material suppliers on the market currently make photoresist into transparent color, so that the boundary color difference between the grid line groove and the non-groove after exposure and development is not obvious, and the 3D microscope cannot accurately collect the groove width, and the residual glue in the groove is not easy to observe. Usually, after the grid line is deposited by electroplating, it can be detected whether the adhesion of the grid line is qualified. UTILITY MODEL CONTENT

[0004] The utility model aims at overcoming the defects of prior art, providing an intermediate structure in the preparation process of solar cell, which can quickly and accurately detect whether the solar cell is not exposed and developed, and avoid causing a large number of disconnection problems after electroplating deposition of grid line.

[0005] The purpose of the utility model can be achieved by adopting the following technical solutions:

[0006] An intermediate structure in the preparation process of solar cell, comprising a cell piece main body, the light entrance surface and the back light surface of the cell piece main body are etched with grid line grooves, and the grid line groove of the light entrance surface penetrates the light entrance surface photosensitive glue layer and the light entrance surface copper seed layer of the cell piece main body and exposes the light entrance surface TCO layer, the grid line groove of the back light surface penetrates the back light surface photosensitive glue layer and the back light surface copper seed layer of the cell piece main body and exposes the back light surface TCO layer, the color of the light entrance surface TCO layer and the light entrance surface photosensitive glue layer is different, and the color of the back light surface TCO layer and the back light surface photosensitive glue layer is different.

[0007] Further, the battery piece body comprises a battery piece substrate, an intrinsic amorphous silicon layer on a light-incident surface of the battery piece substrate, an N-type doped microcrystalline silicon layer, a light-incident surface TCO layer and a light-incident surface copper seed layer which are sequentially arranged on the light-incident surface of the battery piece substrate, and an intrinsic amorphous silicon layer on a back light surface of the battery piece substrate, a P-type doped microcrystalline silicon layer, a back light surface TCO layer and a back light surface copper seed layer which are sequentially arranged on the back light surface of the battery piece substrate, a light-incident surface photosensitive adhesive layer is coated on the surface of the light-incident surface copper seed layer, and a back light surface photosensitive adhesive layer is coated on the surface of the back light surface copper seed layer.

[0008] Further, the battery piece substrate is an N-type silicon wafer.

[0009] Further, the light-incident surface TCO layer and the back light surface TCO layer are both blue TCO layers, and the light-incident surface photosensitive adhesive layer and the back light surface photosensitive adhesive layer are both transparent photosensitive adhesive layers.

[0010] Further, the grid line groove of the light-incident surface and the back light surface is asymmetrically arranged.

[0011] Compared with the prior art, the utility model has the advantages and beneficial effects that:

[0012] The intermediate structure can quickly and accurately detect the width of the grid line groove and whether there is residual glue in the groove after the battery is exposed and developed, so that whether the grid line bonding force is qualified can be detected and judged without waiting for the grid line to be deposited by electroplating, thereby avoiding the generation of a large number of defective products. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 It is a schematic view of the intermediate structure of the utility model.

[0014] Figure 2 It is a process schematic for preparing a solar cell Figure One .

[0015] Figure 3 It is a process schematic for preparing a solar cell Figure Two .

[0016] Figure 4 It is a process schematic for preparing a solar cell Figure Three . DETAILED DESCRIPTION

[0017] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be described clearly and completely below in combination with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0018] Embodiment 1:

[0019] As Figure 1 shown, the embodiment provides an intermediate structure of a solar cell preparation process, comprising a cell body, the light-incident surface and the back surface of the cell body are etched with grid line grooves 12, the grid line grooves 12 on the light-incident surface and the back surface are asymmetrically arranged, and the grid line grooves 12 on the light-incident surface penetrate the light-incident surface photosensitive adhesive layer 6 and the light-incident surface copper seed layer 5 of the cell body and expose the light-incident surface TCO layer 4, the grid line grooves 12 on the back surface penetrate the back surface photosensitive adhesive layer 11 and the back surface copper seed layer 10 of the cell body and expose the back surface TCO layer 9, the color of the light-incident surface TCO layer 4 is different from that of the light-incident surface photosensitive adhesive layer 6, and the color of the back surface TCO layer 9 is different from that of the back surface photosensitive adhesive layer 11, wherein the light-incident surface TCO layer 4 and the back surface TCO layer 9 are both blue TCO layers, and the light-incident surface photosensitive adhesive layer 6 and the back surface photosensitive adhesive layer 11 are both transparent photosensitive adhesive layers.

[0020] The cell body comprises a cell substrate 1 (N-type silicon wafer is adopted in the embodiment), a light-incident surface intrinsic amorphous silicon layer 2, an N-type doped microcrystalline silicon layer 3, a light-incident surface TCO layer 4 and a light-incident surface copper seed layer 5 which are sequentially arranged on the light-incident surface of the cell substrate 1, and a back surface intrinsic amorphous silicon layer 7, a P-type doped microcrystalline silicon layer 8, a back surface TCO layer 9 and a back surface copper seed layer 10 which are sequentially arranged on the back surface of the cell substrate 1, and the surface of the light-incident surface copper seed layer 5 is coated with a light-incident surface photosensitive adhesive layer 6, and the surface of the back surface copper seed layer 10 is coated with a back surface photosensitive adhesive layer 11.

[0021] The preparation process of the above intermediate structure is as follows:

[0022] S1, as Figure 2 shown, a cell substrate is provided, and a light-incident surface intrinsic amorphous silicon layer, an N-type doped microcrystalline silicon layer, a light-incident surface TCO layer and a light-incident surface copper seed layer are sequentially arranged on the light-incident surface of the cell substrate from near to far, and a back surface intrinsic amorphous silicon layer, a P-type doped microcrystalline silicon layer, a back surface TCO layer and a back surface copper seed layer are sequentially arranged on the back surface of the cell substrate from near to far;

[0023] S2, as Figure 3 shown, a light-incident surface photosensitive adhesive layer and a back surface photosensitive adhesive layer are coated on the light-incident surface copper seed layer and the back surface copper seed layer respectively and subjected to drying treatment;

[0024] S3, double-sided exposure and development are performed on the photosensitive adhesive layer to form grid line grooves;

[0025] S4, as Figure 4 shown, double-sided etching treatment is performed on the solar cell to etch away the copper seed layer in the grid line grooves and expose the TCO layer;

[0026] S5. Since the TCO layer area is blue, there is a significant color difference with the area protected by the transparent photosensitive emulsion layer. Therefore, a 3D microscope can be used to quickly and accurately detect whether the solar cell has been exposed and developed incompletely.

[0027] In the above preparation process, the developing solution is one or a mixture of sodium carbonate solution and potassium carbonate solution with a concentration of 5 g / L to 15 g / L, the temperature is 28℃ to 35℃, and the spraying pressure is 0.5 kg / cm². 2 ~3kg / cm 2 The development time is 15s to 120s. The etching solution is a solution containing sulfuric acid and hydrogen peroxide, with the proportion of sulfuric acid being 0.5% to 5% and the proportion of hydrogen peroxide being 5% to 10%. The temperature is 30℃ to 50℃, and the etching time is 10s to 60s.

[0028] The above description is only a preferred embodiment of this utility model patent, but the protection scope of this utility model patent is not limited thereto. Any equivalent substitutions or changes made by those skilled in the art within the scope disclosed in this utility model patent, based on the technical solution and utility model patent concept of this utility model patent, shall fall within the protection scope of this utility model patent.

Claims

1. An intermediate structure of a solar cell manufacturing process, characterized by: The battery piece body is etched with grid line grooves on both the light-incident surface and the back light surface, the grid line grooves on the light-incident surface penetrate the light-incident surface photosensitive glue layer and the light-incident surface copper seed layer of the battery piece body and expose the light-incident surface TCO layer, the grid line grooves on the back light surface penetrate the back light surface photosensitive glue layer and the back light surface copper seed layer of the battery piece body and expose the back light surface TCO layer, the color of the light-incident surface TCO layer is different from that of the light-incident surface photosensitive glue layer, and the color of the back light surface TCO layer is different from that of the back light surface photosensitive glue layer.

2. The intermediate structure of a process for the fabrication of a solar cell according to claim 1, characterized in that: The battery piece body comprises a battery piece substrate, a light-incident surface intrinsic amorphous silicon layer, an N-type doped microcrystalline silicon layer, a light-incident surface TCO layer and a light-incident surface copper seed layer which are sequentially arranged on the light-incident surface of the battery piece substrate, and a back light surface intrinsic amorphous silicon layer, a P-type doped microcrystalline silicon layer, a back light surface TCO layer and a back light surface copper seed layer which are sequentially arranged on the back light surface of the battery piece substrate, the surface of the light-incident surface copper seed layer is coated with a light-incident surface photosensitive glue layer, and the surface of the back light surface copper seed layer is coated with a back light surface photosensitive glue layer.

3. The intermediate structure of a solar cell fabrication process according to claim 2, wherein: The battery piece substrate is an N-type silicon wafer.

4. The intermediate structure of a solar cell fabrication process according to claim 1, wherein: The light-incident surface TCO layer and the back light surface TCO layer are both blue TCO layers, and the light-incident surface photosensitive glue layer and the back light surface photosensitive glue layer are both transparent photosensitive glue layers.

5. The intermediate structure of a solar cell fabrication process according to claim 1, wherein: The grid line grooves on the light-incident surface and the back light surface are asymmetrically arranged.

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