Silicon-based display panel

Abstract

The utility model discloses a silicon-based display panel which comprises a display area and a non-display area, the non-display area at least partially surrounds the display area, at least one retaining wall structure is arranged on one side of a substrate of the non-display area, and the surface appearance of the retaining wall structure is irregular wrinkles. Therefore, more uneven paths are generated when the packaging film layer is deposited on the packaging film layer, and the extension paths of cracks are cut off and cut, so that the occurrence of packaging failure can be effectively avoided.

Description

Technical Field

[0001] This utility model relates to the field of display technology, and in particular to a silicon-based display panel. Background Technology

[0002] Traditional OLED (Organic Light Emitting Diode Display) products are packaged using a full-surface encapsulation method, with no obstruction structure or a simple trapezoidal obstruction structure when cutting the display area. This can cause cracks generated at the edge during cutting to extend inward along the encapsulation layer, leading to the risk of encapsulation failure. Utility Model Content

[0003] This invention provides a silicon-based display panel. By setting a blocking structure on the non-display area and continuing photolithography on the surface of the blocking structure to form irregular wrinkles, more uneven paths are generated when the encapsulation film is deposited on it, blocking the cutting cracks from extending into the display area and effectively avoiding encapsulation failure.

[0004] This utility model embodiment provides a silicon-based display panel, including a display area and a non-display area, wherein the non-display area at least partially surrounds the display area;

[0005] Also includes:

[0006] Substrate;

[0007] At least one barrier structure is located on one side of the substrate in the non-display area; the surface morphology of the barrier structure is irregular wrinkles.

[0008] Optionally, the surface morphology of the retaining wall structure is concave.

[0009] Optionally, the surface morphology of the retaining wall structure is convex.

[0010] Optionally, the retaining wall structure includes a base layer and a top layer stacked together, wherein the thickness of the top layer is greater than or equal to the thickness of the base layer.

[0011] Optionally, the retaining wall structure is in the shape of an inverted trapezoid.

[0012] Optionally, multiple retaining wall structures are spaced apart along a direction away from the display area.

[0013] Optionally, multiple retaining wall structures are arranged adjacent to each other in a direction away from the display area.

[0014] Optionally, the retaining wall structure is composed of at least two stacked inorganic layers.

[0015] Optionally, it may also include an encapsulation layer that covers the display area and the non-display area, and also covers the barrier structure.

[0016] Optionally, it may also include a filler layer that covers the encapsulation layer and has a planar surface.

[0017] The silicon-based display panel provided in this embodiment includes a display area and a non-display area. The non-display area at least partially surrounds the display area. At least one barrier structure is provided on one side of the substrate of the non-display area. By continuing photolithography on the barrier structure to form irregular wrinkles on its surface, it is beneficial to generate more uneven paths when the encapsulation film is deposited on it. This can prevent cutting cracks from extending into the display area and avoid encapsulation failure. Attached Figure Description

[0018] Figure 1 This is a top view schematic diagram of a silicon-based display panel provided in this application;

[0019] Figure 2 yes Figure 1 A schematic cross-sectional view of a silicon-based display panel along the AA' direction;

[0020] Figure 3 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction;

[0021] Figure 4 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction;

[0022] Figure 5 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction;

[0023] Figure 6 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction. Detailed Implementation

[0024] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0025] In view of the above-mentioned technical problems, this utility model provides a silicon-based display panel. Figure 1 This is a top view schematic diagram of a silicon-based display panel provided in this application. Figure 2 yes Figure 1A schematic cross-sectional view of a silicon-based display panel along the AA' direction, for reference. Figures 1-2 The silicon-based display panel 200 provided in this application embodiment includes a display area AA and a non-display area NA, with the non-display area NA at least partially surrounding the display area AA. The silicon-based display panel also includes a substrate 20 and at least one barrier structure 30, located on one side of the substrate 20 of the non-display area NA. The surface morphology of the barrier structure 30 is irregular wrinkles.

[0026] For details, please refer to Figure 1 The display area AA is used for image display. The non-display area NA at least partially surrounds the display area AA, serving to route signal traces and encapsulate and protect the display area AA. During the encapsulation of silicon-based display panels, cuts are made along the periphery of the non-display area NA. This distance in the non-display area NA can prevent small cracks generated during cutting, but it cannot handle larger cracks, especially under high temperature and humidity conditions, which can easily lead to encapsulation failure. To prevent cracks generated at the edges during cutting from extending into the display area AA, refer to... Figure 2 In this application, at least one barrier structure 30 is provided on one side of the substrate 20 in the non-display area NA. The surface of the barrier structure 30 is photolithographically shaped to make its surface morphology irregular wrinkles. This can generate more uneven paths when the subsequent encapsulation layer 40 is deposited on it, thereby blocking the extension path of the crack generated at the edge during the cutting process to the display area, avoiding the occurrence of encapsulation failure, and thus ensuring the display effect of the silicon-based display panel.

[0027] Optional, see reference Figure 2 The silicon-based display panel 200 also includes an encapsulation layer 40, which covers the display area AA and the non-display area NA, and also covers the barrier structure 30. The materials of the encapsulation layer 40 include, but are not limited to, a glass substrate, photoresist, resin photoresist, photosensitive adhesive, alignment layer film, and edge-sealing UV adhesive.

[0028] Figure 3 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction, see reference. Figure 1 and Figure 3The silicon-based display panel 200 also includes an array substrate 01 located on one side of the substrate 20. The display area AA includes multiple light-emitting elements 02, which are located on one side of the array substrate 01. A pixel driving circuit is disposed in the array substrate 01. The pixel circuit can also be a 2T1C, 4T1C, 7T1C, 7T2C, 8T1C, 8T2C, etc. circuit structure. The pixel circuit includes multiple thin-film transistors (TFTs), storage capacitors, and metal traces, etc., which will not be described in detail here. The thin-film transistors (TFTs) are electrically connected to the light-emitting elements 02, and thus drive the light-emitting elements 02 to emit light through the pixel driving circuit. The barrier structure 30 can be located in one or more layers above the substrate 20 in the non-display area NA. That is, the barrier structure 30 can be disposed in the same layer or in different layers. It can prevent cracks from extending into the display area AA, avoiding cracks from extending to the pixel driving circuit, light-emitting elements 02, etc., and ensuring the stability of the device.

[0029] Optional, continue to refer to Figure 2 and Figure 3 The retaining wall structure 30 is composed of at least two stacked inorganic layers. Considering the longitudinal height of the retaining wall structure 30, it can be formed by using multiple inorganic layers through processes such as coating, exposure, etching, and development.

[0030] In some embodiments, reference Figure 2 and Figure 3 In the silicon-based display panel provided in this embodiment, the surface morphology of the barrier structure 30 is convex. To further improve the encapsulation effect, this application removes the two sides of the trapezoidal pillars of the barrier structure 30 through processes such as coating, exposure, etching, and development to form a convex surface. In this way, after the encapsulation layer 40 covers the barrier structure 30, the encapsulation layer 40 can have more folds and undulations in the area of ​​the barrier structure 30, so that cracks cannot cross the barrier structure 30, thereby preventing cracks from extending to the display area AA, and thus achieving a better encapsulation effect.

[0031] Optional, see reference Figure 2 When the retaining wall structure 30 is convex, the retaining wall structure 30 can be formed by stacking two inorganic layers. The retaining wall structure 30 includes a base layer 31 and a top layer 32 stacked together. The thickness of the top layer 32 is greater than or equal to the thickness of the base layer 31 to increase the longitudinal depth of the retaining wall structure 30, increase the difficulty of longitudinal crack extension, and longitudinally block cracks.

[0032] Figure 4 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction, in some embodiments, refer to Figure 4In the silicon-based display panel provided in this embodiment, the surface morphology of the barrier structure 30 is concave. To further improve the encapsulation effect, this application considers removing the middle part of the trapezoidal pillar of the barrier structure 30 through processes such as coating, exposure, etching, and development to form a concave surface. In this way, after the encapsulation layer 40 covers the barrier structure 30, there can be more folds and undulations, and cracks cannot cross the barrier structure 30, thereby preventing cracks from extending to the display area AA, thus achieving a better encapsulation effect.

[0033] Figure 5 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction, in some embodiments, refer to Figure 5 In the silicon-based display panel 200 provided in this embodiment of the present invention, the barrier structure 30 is in the shape of an inverted trapezoid. The crack is cut off at the bottom corner of the barrier structure 30, preventing it from extending into the display area AA, thus ensuring the performance of the devices within the display area AA.

[0034] One feasible implementation method, see reference Figures 2-5 Multiple barrier structures 30 are spaced apart along a direction away from the display area AA. In other words, the multiple barrier structures 30 can also be spaced apart along the direction of crack extension, thus blocking the path of crack extension in multiple ways.

[0035] Figure 6 yes Figure 1 Another cross-sectional schematic diagram of a silicon-based display panel along the AA' direction, representing a possible implementation, see reference. Figure 6 Multiple barrier structures 30 are arranged adjacently along the direction away from the display area AA. That is, multiple barrier structures 30 can also be arranged adjacently in sequence along the direction of crack extension, and the surfaces of adjacent barrier structures 30 form continuous irregular folds to block the path of larger crack extension and improve the packaging yield of silicon-based display panels.

[0036] Based on the above implementation, and referring to Figure 6 As shown, the silicon-based display panel 200 provided in this embodiment of the present invention further includes a filling layer 50, which covers the encapsulation layer 40 and has a planar surface. The filling layer 50 can fill in the uneven surfaces caused by the barrier structure 30, thereby achieving a smooth surface of the silicon-based display panel 200 and ensuring the display effect of the display panel 200.

[0037] It should be noted that, as in 2- Figure 5 In the process, the silicon-based display panel 200 also includes a filling layer 50, which covers the encapsulation layer 40 and has a planar surface, which is not shown in the embodiments of this application.

[0038] In summary, this application improves the packaging yield of silicon-based display panels by adding a barrier structure 30 with an irregular folded surface morphology to the non-display area, cutting off the extension path of the cracks, protecting the stability of the devices in the display area, and improving the overall packaging yield of the silicon-based display panel.

[0039] Note that the above description is merely a preferred embodiment and the technical principles employed in this application. Those skilled in the art will understand that this application is not limited to the specific embodiments described herein, and various obvious changes, readjustments, and substitutions can be made without departing from the scope of protection of this application. Therefore, although this application has been described in detail through the above embodiments, this application is not limited to the above embodiments, and may include many other equivalent embodiments without departing from the concept of this application, the scope of which is determined by the scope of the appended claims.

Claims

1. A silicon-based display panel, characterized by, It includes a display area and a non-display area, wherein the non-display area at least partially surrounds the display area; Also includes: Substrate; At least one barrier structure is located on one side of the substrate in the non-display area; the surface morphology of the barrier structure is irregular wrinkles.

2. The silicon-based display panel according to claim 1, characterized in that, The retaining wall structure has a convex surface.

3. The silicon-based display panel according to claim 2, characterized in that, The retaining wall structure includes a base layer and a top layer stacked together, wherein the thickness of the top layer is greater than or equal to the thickness of the base layer.

4. The silicon-based display panel according to claim 1, characterized in that, The retaining wall structure has a concave surface.

5. The silicon-based display panel according to claim 1, characterized in that, The retaining wall structure is in the shape of an inverted trapezoid.

6. The silicon-based display panel according to claim 1, characterized in that, Multiple retaining wall structures are spaced apart along a direction away from the display area.

7. The silicon-based display panel according to claim 1, characterized in that, Multiple retaining wall structures are arranged adjacent to each other along a direction away from the display area.

8. The silicon-based display panel according to claim 1, characterized in that, The retaining wall structure is composed of at least two inorganic layers stacked together.

9. The silicon-based display panel according to claim 1, characterized in that, It also includes an encapsulation layer that covers the display area and the non-display area, and also covers the barrier structure.

10. The silicon-based display panel according to claim 9, characterized in that, It also includes a filler layer that covers the encapsulation layer and has a planar surface.

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