Purifier and purification system

Abstract

The utility model relates to the technical field of argon purification, and particularly discloses a purifier and a purification system. Comprising a shell and a filter cavity, the filtering cavity comprises a first filtering cavity and a second filtering cavity; the first filtering cavity is connected with the second filtering cavity; the first filtering cavity and the second filtering cavity are provided with a first filtering part and a second filtering part; the first filtering part is longitudinally arranged; the second filtering part is transversely arranged; a first gas flowing cavity is formed between the first filtering part and the machine shell; a second gas circulation cavity is formed between the second filtering cavity and the machine shell; the first filtering part and the second filtering part are provided with filtering layers; argon enters the first gas flowing cavity through the gas inlet, is filtered through the first filtering part and the second filtering part, and then flows through the second gas flowing cavity to be exhausted through the gas outlet. According to the design, the contact area of gas and the filter material can be increased, the retention time of the gas in the filter is prolonged, impurities can be filtered more thoroughly, and the purification efficiency is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to argon purification technical field especially, relate to a kind of purifier and purification system. BACKGROUND

[0002] Argon is an inert gas, widely used in industrial production, scientific research and medical fields, especially in steelmaking, semiconductor manufacturing, optical fiber production, laser technology and metallurgical industry, the purity of argon is required higher. In today's modern steelmaking process, argon plays a crucial role, as an auxiliary gas is widely used in multiple key process links, including initial smelting, refining and casting. Argon, as an inert gas, its high-purity characteristics make it irreplaceable in the smelting process. Since argon does not react with metals, it can effectively control the impurity content and chemical composition in the smelting process, thereby significantly improving the quality and performance of steel. In recent years, with the increasing demand for high-purity argon in the industry, the application of purified argon in steelmaking has become an important means to improve steel quality. In the steelmaking process, any trace impurities can affect the chemical composition and physical properties of the molten steel. Especially under high-temperature smelting conditions, moisture, oil mist and solid particles can react with molten steel to form oxide and nitride inclusions, which seriously affect the ductility, corrosion resistance and strength of steel. Purifier can effectively remove moisture, oil and various solid particle impurities in argon through staged and hierarchical filtration, thereby improving the purity of argon, providing a clean argon protection environment for molten steel, preventing impurities from mixing into molten steel, and ensuring high-quality steel.

[0003] In the patent "an argon protection gas purification device" (publication number CN202297136U, hereinafter referred to as prior art 1) discloses a kind of purification device of argon protection gas, the main technical principle in prior art 1 is through argon protection gas purification device, harmful gas (including water vapor and oxygen) in Ar is adsorbed and reacted to play the effect of purifying Ar. The device includes a water vapor removal container, an argon inlet, a metal sieve plate, an impurity gas removal container, a connecting pipe, and a heater. Among them, weak water absorbent is anhydrous calcium chloride particles, anhydrous magnesium chloride particles or silica gel particles, strong water absorbent is P2O5, anhydrous CuSO4 or Ca scrap. Through these devices, harmful gas in Ar can be adsorbed and reacted to purify Ar gas.

[0004] Although in the prior art 1, by using the purification device can effectively adsorption treatment of harmful gas or impurity gas in argon, but the design of such purifier has some problems. Specifically, the purifier inside the metal sieve plate to carry out the adsorption operation, however, when argon into the purifier, it will directly impact the metal sieve plate. The impact not only will cause damage to the metal sieve plate, but also because the adsorption process depends only on the metal sieve plate, its adsorption effect is difficult to fully guaranteed. In addition, the continuous impact of argon will cause the metal sieve plate due to pressure fluctuation and damage or adsorption material off, thereby causing the filter layer blockage or failure. More serious, the filter area of the metal sieve plate is usually insufficient to meet the actual demand, which further reduces the filtering quality, so that the purification effect is greatly discounted. Utility model content

[0005] In view of this, the utility model embodiment provides a kind of purifier and purification system to solve the problem of single filter plate setting of prior art purifier, and the filtering quality is not good.

[0006] First, the utility model embodiment provides a kind of purifier, including shell and the filter cavity being arranged in the shell inside;The filter cavity includes first filter cavity and second filter cavity;The first filter cavity and second filter cavity are connected;First filter part and second filter part are respectively arranged in the first filter cavity and second filter cavity;The first filter part is vertically arranged;The second filter part is horizontally arranged;First gas flow cavity is further arranged between the first filter part and the shell;Second gas flow cavity is further arranged between the second filter cavity and the shell;First filter part and second filter part are both provided with multiple filter layers;Argon enters the first gas flow cavity through gas inlet, then is filtered by first filter part and second filter part, then flows through the second gas flow cavity and is discharged by gas outlet.

[0007] Preferably, the gas outlet is arranged at the top or side of the first gas flow cavity and communicates with the first gas flow cavity;The gas outlet is arranged at the side of the second gas flow cavity and communicates with the second gas flow cavity.

[0008] Preferably, the first filter part is composed of at least two filter units;The filter unit is provided with filter layers;The surface of the filter unit is provided with a plurality of first pores communicating with the filter layers.

[0009] Preferably, the filter layers in the filter unit of the first filter part are molecular sieve filter layers, and multiple layers are arranged from the outer layer to the inner layer of the filter layers.

[0010] Preferably, the second filter part is an alloy adsorption layer;The alloy adsorption layer is made of alloy adsorbent and is arranged in multiple layers with intervals.

[0011] Preferably, the alloy adsorption layer is provided with a plurality of adsorption grooves arranged alternately; and second gas holes arranged alternately are further arranged between two of the adsorption layers.

[0012] In a second aspect, a purification system is provided, comprising a purifier as described above; the purification system comprises at least two purification paths; and the purifier is arranged on each of the purification paths.

[0013] Preferably, the purifier is arranged before a refining ladle blowhole on the purification path, so as to complete argon purification of the purification system.

[0014] Preferably, the purification path comprises a first purification branch and a second purification branch; the first purification branch and the second purification branch are arranged in parallel; and a one-way valve is further arranged on the first purification branch.

[0015] Preferably, the first purification branch is provided with a one-way valve at a position before the first purification branch meets the second purification branch; the one-way valve controls the flow direction of the argon to be from the inlet end of the argon to the end of the refining ladle blowhole; and backflow of the argon at the end of the refining ladle blowhole is avoided.

[0016] The purifier and the purification system have the following beneficial effects:

[0017] The first gas flow cavity and the second gas flow cavity are arranged between the shell and the filter cavity, so as to provide a buffer space for gas flow. When the argon enters, the argon does not directly pass through the filter layer, so that the impact force of the gas flow is reduced, and the filter material is prevented from being damaged or falling off due to pressure fluctuation, so that the filter layer is prevented from being blocked, and the stability of the gas flow rate is ensured, and the continuity and efficiency of the purification process are maintained. The first filter part and the second filter part are arranged in a longitudinal direction and a transverse direction respectively, so as to form staggered filter paths, and the flow path of the argon is more complex. This design can increase the contact area of the gas and the filter material, prolong the residence time of the gas in the filter, and help to more thoroughly filter impurities and improve the purification efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0018] In order to more clearly illustrate the technical scheme of the embodiments of the present application, the drawings required to be used in the embodiments of the present application will be briefly introduced as follows, and other drawings can also be obtained by those skilled in the art without creative labor on the premise that these drawings are within the protection scope of the present application.

[0019] Figure 1 It is an internal structure schematic view of a purifier;

[0020] Figure 2 It is a cross-sectional structure schematic view of a purifier;

[0021] Figure 3 is a first filter part structure diagram of a purifier;

[0022] Figure 4 is a second filter part structure diagram of a purifier;

[0023] Figure 5 is a system diagram of a purification system;

[0024] Parts and numbers in the figure:

[0025] 100-purifier, 110-casing, 121-first filter cavity, 123-second filter cavity, 124-first filter part, 125-second filter part, 126-first gas flow cavity, 127-second gas flow cavity, 131-molecular sieve filter layer, 132-alloy adsorption layer, 133-adsorption groove, 134-first gas hole, 135-second gas hole;

[0026] 141-gas inlet, 142-gas outlet;

[0027] 210-refining ladle blowing port, 221-first purification branch, 222-second purification branch, 223-one-way valve, 224-pressure transmitter, 225-pressure reducing valve, 226-flow controller, 227-solenoid valve, 229-water and oil removal device, 230-high efficiency filter. DETAILED DESCRIPTION

[0028] For the purpose, technical scheme and advantages of the embodiments of the present application to be clearer, the technical scheme in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. It should be noted that in this document, relationship terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is any such actual relationship or order between these entities or operations. In the description of the present application, it should be understood that the orientation or positional relationship indicated by terms such as center, upper, lower, front, rear, left, right, vertical, horizontal, top, bottom, inner, outer, etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. Moreover, the terms "include", "contain" or any other variant thereof are intended to cover non-exclusive inclusion, so that the process, method, article or device including a series of elements not only includes those elements, but also includes other elements not explicitly listed or inherent to such process, method, article or device. Without more limitations, the elements defined by the statement "include" do not exclude the presence of other identical elements in the process, method, article or device including the elements. If there is no conflict, the embodiments of the present application and the various features in the embodiments can be combined with each other, and are all within the protection scope of the present application.

[0029] Please refer to Figure 1 The embodiments of the present application provide a kind of purification structure, the main function of this purifier 100 is in the purification path of argon, it is deeply purified, especially remove impurities in argon.The purifier 100 can effectively remove specific impurities (such as water vapor, oxygen, carbon dioxide, hydrocarbon, etc.) in argon, so as to improve the purity of gas.The purifier 100 can also remove variable impurities in argon, ensure the consistency of output argon quality, so as to meet the purification standard.It is crucial for the scene (such as steelmaking, precision machining) that needs high stability gas purity.

[0030] Please refer to Figure 1 And Figure 5In this embodiment, the purifier 100 is composed of a casing 110, inside which a high-efficiency filtering cavity is arranged. After entering the purifier 100, the gas will flow along a specific path, passing through the gas inlet 141, the filtering cavity, and finally the gas outlet 142. In the filtering cavity, impurities and catalysts in the gas will be effectively intercepted and removed, thereby ensuring that the discharged argon gas meets the required high-purity standard. The entire purification process includes three main operation steps of gas inlet, filtration, and discharge, ensuring the purity and use effect of argon gas.

[0031] The filtering cavity includes two main parts, namely the first filtering cavity 121 and the second filtering cavity 123. These two filtering cavities filter through two independent stages, thereby ensuring that the treated argon gas reaches a higher purity. Specifically, the argon gas first enters the first filtering cavity 121, where it is subjected to preliminary filtration treatment. After completing the first-stage filtration, the argon gas directly enters the second filtering cavity 123 connected to the first filtering cavity 121 for further purification treatment.

[0032] Please refer to Figure 2 Inside the first filtering cavity 121 and the second filtering cavity 123, there are special filtering parts, namely the first filtering part 124 and the second filtering part 125. The filtering materials used in these two filtering parts are different, to ensure that the argon gas can pass through different materials for multiple filtering. This different material and sequential filtering method can more effectively remove impurities and pollutants in the argon gas, thereby significantly improving the purification effect of the argon gas. Through the combined use of different filtering materials in different stages, the final argon gas will be more pure, meeting more stringent industrial and scientific research requirements. The first filtering part 124 and the second filtering part 125 both adopt a multi-layer filtering layer design, so that the argon gas can be purified by different filtering media multiple times when flowing through the filtering cavity, effectively removing impurities such as moisture, oil stains, and solid particles in the gas. This structure greatly improves the purification effect, ensuring that the argon gas has a relatively high purity before entering the subsequent deep purification device such as catalytic purification.

[0033] Please refer to Figure 2, the first filter part 124 is arranged in a longitudinal structure, so that the argon gas can initially enter this filter system. When the argon gas begins to enter the first filter part 124 arranged longitudinally, it will enter from the transverse direction and then gradually change direction so that it flows along the longitudinal direction to the second filter part 125. In this process, the argon gas will be subjected to pressure from all directions, and as more and more argon gas enters, the pressure will gradually increase. The increase in pressure and the amount of argon gas together cause the argon gas to begin to flow to the central region of the first filter part 124. The first filter part 124 and the second filter part 125 are arranged longitudinally and transversely, respectively, forming an interleaved filter path, making the flow path of the argon gas more complex. This design can increase the contact area between the gas and the filter material, prolong the residence time of the gas in the filter, and help to more thoroughly filter impurities and improve purification efficiency.

[0034] Furthermore, in order to ensure that the argon gas can pass through the filtering process more efficiently, the central part of the first filter part 124 is arranged as a cavity structure, and the argon gas passing through the first filter part 124. And this cavity structure provides a smooth channel for the argon gas to pass through the first filter part 124 smoothly. After being filtered by the first filter part 124, the argon gas will pass through this cavity part and then flow to the next filtering stage, i.e. the second filter part 125. Such a design not only improves the filtering efficiency, but also ensures that the argon gas can maintain stable and uniform flow when passing through each filtering stage.

[0035] Furthermore, the second filter part 125 is arranged transversely, which can ensure that after passing through the first filter part 124, the argon gas can directly contact the filtering part of the second filter part 125. The advantage of this transverse arrangement is that it can effectively prevent part of the gas from being discharged from the system without being filtered by the second filter part 125 after entering the second filter part 125. Through this transverse arrangement, the argon gas can be more evenly distributed in the entire filtering area, thereby improving the filtering efficiency and effect. At the same time, through the transverse arrangement of the second filter part 125, the gas can more smoothly contact the filtering material when passing through, further ensuring the efficiency and reliability of the filtering process.

[0036] Furthermore, in order to ensure the efficient operation of the filtering system, a first gas flow cavity 126 is specially arranged and increased between the first filter part 124 and the housing 110. The main function of this cavity is as an introduction channel for argon gas.

[0037] Please refer to Figure 2In the device, the first filtering cavity 121 and the first gas flow cavity are separated by the first filter part 124. This means that the first gas flow cavity completely surrounds the first filter part 124. Therefore, when the argon gas initially enters the first gas flow cavity, it will first completely wrap the first filter part 124. Then, the argon gas will enter uniformly from various positions of the first filter part 124, thereby ensuring that the argon gas can achieve more uniform and efficient filtering effect when passing through the first filter part 124. This design not only improves the uniformity of filtering, but also improves the efficiency of filtering, ensuring that the argon gas can achieve higher purity before entering the subsequent processing link. The segmented design of the first filtering cavity 121 and the second filtering cavity 123 facilitates separate maintenance, and the reasonable distribution of multiple filter layers in different filtering cavities makes the operation of replacing and cleaning the filter layers more simple, which helps to prolong the service life of the purifier and reduce maintenance costs.

[0038] The first gas flow cavity 126 can also ensure that the argon gas can smoothly enter the system, thereby improving the filtering effect. At the same time, a second gas flow cavity 127 is also provided between the second filtering cavity 123 and the shell 110. The main function of this cavity is to gather the gas filtered by the first and second filter parts 125 and provide a centralized exhaust channel for these gases, ensuring that the gas can be efficiently and smoothly discharged from the system. The first gas flow cavity 126 and the second gas flow cavity 127 are respectively provided between the shell 110 and the filtering cavities, providing a buffer space for gas flow. When the argon gas enters and exits, it will not directly pass through the filter layer, reducing the impact force of the gas flow, avoiding the blockage of the filter layer due to pressure fluctuations, and at the same time ensuring the stability of the gas flow rate, maintaining the continuity and efficiency of the purification process.

[0039] In addition, in order to further improve the filtering efficiency and filtering quality, the first filter part 124 and the second filter part 125 are both equipped with multiple layers of filter layers. The arrangement of these multiple layers of filter layers enables the gas to pass through multiple filtering procedures when passing through the filtering system, thereby achieving higher filtering efficiency and better filtering quality. Each layer of filter layer can also be optimized for different particle sizes and types of pollutants, ensuring that various impurities can be effectively removed, thereby providing more pure gas output. Through this multi-layer filtering design, the system can more comprehensively capture and remove harmful substances in the gas, ensuring that the final output gas reaches the highest purity standard.

[0040] Please refer to Figure 2The argon gas enters the first gas flow cavity 126 through the gas inlet 141, and then is filtered by the first filter part 124 and the second filter part 125 in sequence, and then flows through the second gas flow cavity 127 and is finally discharged by the gas outlet 142. In this process, the argon gas is thoroughly purified, ensuring its purity and use effect.

[0041] The gas outlet 142 is arranged at the top or side of the first gas flow cavity 126, ensuring its communication with the first gas flow cavity 126; similarly, the gas outlet 142 is also arranged at the side of the second gas flow cavity, and good communication is maintained with the second gas flow cavity. Such a design enables the argon gas to be smoothly discharged from each filter part, improving the efficiency of gas flow.

[0042] Please refer to Figure 3 The first filter part 124 is composed of at least two filter units, and the filter layer is arranged inside the filter units to ensure that the argon gas can be effectively filtered when passing through. The surface of the filter unit is provided with a plurality of first air holes 134 in communication with the filter layer, through which the argon gas enters the filter layer for preliminary purification treatment.

[0043] The filter layer in the filter unit of the first filter part 124 is arranged as a molecular sieve filter layer 131, which can effectively capture and separate the impurity molecules in the argon gas. Moreover, the molecular sieve filter layer 131 is arranged in multiple layers from the outer layer to the inner layer of the filter layer, so that the filtering effect is more significant, further improving the purity of the argon gas.

[0044] Please refer to Figure 4The second filter 125 is configured as an alloy adsorption layer 132, which is made of alloy adsorbent and is provided with multiple layers in an interval. The alloy adsorption layer 132 has a larger surface area and stronger adsorption capacity, which can effectively adsorb the residual impurities in the argon gas and further improve the purity of the gas. The alloy adsorption layer 132 is provided with a plurality of adsorption grooves 133 arranged in an alternating manner. The adsorption grooves 133 can increase the contact area between the gas and the adsorbent, thereby improving the adsorption efficiency. The second gas holes 135 arranged in an alternating manner are arranged between the two adsorption layers. The gas holes enable the argon gas to smoothly pass through each adsorption layer, ensuring the continuity and stability of the gas flow. Furthermore, the second gas holes 135 are arranged in an alternating manner to ensure that the argon gas passing through each layer is filtered. Furthermore, the alloy adsorption layers 132 are arranged at a certain interval to form an argon gas filtering space, which is conducive to the flow, filtration and discharge of argon gas in the cavity. The alloy adsorption layers 132 are installed by mounting columns. Furthermore, all the second gas holes 135 are arranged inside the adsorption grooves 133. When the gas flows through the adsorption grooves 133, the gas can be continuously adsorbed or filtered through the side wall of the adsorption grooves 133. Subsequently, the gas can be smoothly discharged through the second gas holes 135 into the next processing stage, thereby effectively avoiding the phenomenon of gas flow obstruction or slow flow in the adsorption grooves 133.

[0045] Please refer to Figure 2 In use, the gas enters the first gas flow passage through the gas inlet 141, and then passes through the first filter 124 and the second filter 125, and then enters the molecular sieve filter layer 131 and the alloy filter layer through the first gas holes 134 and the second gas holes 135, respectively, for further filtering treatment.

[0046] Example 2

[0047] Please refer to Figure 5 In this embodiment, a purification system is provided, which includes a purifier 100 as described in detail in embodiment 1. The design of this purification system aims to provide a more efficient and reliable argon gas purification process. To achieve this goal, the purification system is specially designed with at least two independent purification paths, each of which is equipped with the purifier 100.

[0048] The purifiers 100 are arranged at specific positions on the purification path, specifically, they are arranged in the upstream area of the refining ladle nozzle 210. Such a layout ensures that the necessary purification and filtration work can be completed by the purifier 100 before the argon gas is delivered to the refining ladle nozzle 210, achieving the purpose of purification, thereby ensuring the purity and quality of the argon gas.

[0049] The purification system includes two main purification branches in its path, namely the first purification branch 221 and the second purification branch 222. These two branches are arranged in parallel, which means they can work independently and also provide redundancy to the system, improving overall reliability and flexibility.

[0050] To further optimize the flow direction and purification efficiency of argon, a one-way valve 223 is specially added to the first purification branch 221. The one-way valve 223 controls the flow direction of argon, ensuring that argon can flow smoothly from the inlet end to the refining ladle blowhole 210 end. Further, the one-way valve 223 can effectively prevent the backflow of argon from the refining ladle blowhole 210 end to the purification path, thereby avoiding the reverse flow of argon in the system and ensuring the purity of argon and the stable operation of the system.

[0051] The purification principle of this argon purification system mainly revolves around multi-path parallel purification and fine control, and the core is to ensure an efficient and stable argon purification process through shunting, converging and multi-stage purification means. The specific purification principle is as follows:

[0052] The system uses the parallel first purification branch 221 and the second purification branch 222 for argon purification, and shunt purification not only improves purification efficiency, but also allows path switching and control according to demand, achieving continuous and stable argon purification. Argon first passes through the water and oil removal device 229 and the high-efficiency filter 230 to remove water and oil impurities in the gas, providing a clean gas environment for the subsequent purification process. The first purification branch 221 and the second purification branch 222 each have two paths. Each branch is equipped with a one-way valve 222, a pressure transmitter 224, a pressure reducing valve 225, a flow controller 226, an electromagnetic valve 227 and other control devices to ensure that the direction of argon flow in each branch is controlled and the pressure and flow are stable. After the two branches converge, a catalyst purification device is provided to further refine the argon. The catalyst device is responsible for removing trace impurities in the argon to ensure high-purity argon output. The one-way valve 222 in the branch prevents backflow of argon from the refining ladle blowhole end, ensuring the unidirectionality of gas flow and the safety of the system. A protection branch is provided on the purification branch to shunt argon in abnormal situations and prevent overpressure and other problems. The container on the protection branch can serve as a temporary storage or cooling device, and the pressure gauge allows real-time monitoring of argon pressure to ensure system safety. Through the electromagnetic valve and flow controller, the system can automatically adjust argon flow and distribution, achieving intelligent purification and efficient system operation. This system uses multi-stage filtration, branch purification and automated control means to ensure efficient, continuous and stable purification of argon, and can switch paths or perform safety protection operations according to usage requirements.

[0053] Finally, it should be noted that: the above embodiments are used to illustrate the technical solutions of the present application, but not limited to them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement to part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A purifier structure, characterized by, The device comprises a casing (110) and a filtering cavity arranged inside the casing (110); the filtering cavity comprises a first filtering cavity (121) and a second filtering cavity (123); the first filtering cavity (121) and the second filtering cavity (123) are connected; the first filtering cavity (121) and the second filtering cavity (123) are respectively provided with a first filtering part (124) and a second filtering part (125); The first filtering part (124) is arranged longitudinally; the second filtering part (125) is arranged transversely; the first filtering part (124) and the casing (110) are further provided with a first gas flow cavity (126); the second filtering cavity (123) and the casing (110) are further provided with a second gas flow cavity (127); The first filtering part (124) and the second filtering part (125) are both provided with multiple filtering layers; argon enters the first gas flow cavity through an air inlet (141), is filtered by the first filtering part (124) and the second filtering part (125), then flows through the second gas flow cavity and is discharged through an air outlet (142).

2. The purifier structure according to claim 1, wherein The air outlet (142) is arranged at the top or the side of the first gas flow cavity (126) and communicates with the first gas flow cavity (126); the air outlet (142) is arranged at the side of the second gas flow cavity and communicates with the second gas flow cavity.

3. The purifier structure of claim 1, wherein The first filtering part (124) is composed of at least two filtering units; the filtering units are provided with the filtering layers; the surfaces of the filtering units are provided with a plurality of first air holes (134) communicating with the filtering layers.

4. The purifier structure of claim 1, wherein The filtering layers in the filtering units of the first filtering part (124) are molecular sieve filtering layers (131) and are arranged in multiple layers from the outer layer to the inner layer of the filtering layers.

5. The purifier structure of claim 4, wherein The second filtering part (125) is an alloy adsorption layer (132); the alloy adsorption layer (132) is made of alloy adsorbent and is arranged in multiple layers with intervals.

6. A purifier structure according to claim 5, wherein The alloy adsorption layer (132) is provided with a plurality of adsorption grooves (133) arranged alternately; the alloy adsorption layers are further provided with second air holes (135) arranged alternately.

7. A purification system characterized by, The device comprises a purifier structure according to any one of claims 1 to 6; the purification system comprises at least two purification paths; each purification path is provided with the purifier (100).

8. A purification system according to claim 7, wherein, The purifier (100) is arranged before a refining ladle blowing port (210) on the purification path to complete the argon purification operation of the purification system.

9. A purification system according to claim 8, wherein, The purification path comprises a first purification branch (221) and a second purification branch (222); the first purification branch (221) and the second purification branch (222) are arranged in parallel; the first purification branch (221) is further provided with a one-way valve (223).

10. A purification system according to claim 9, wherein, The first purification branch (221) is provided with a one-way valve (223) at a position before the intersection with the second purification branch (222); the one-way valve (223) controls the flow direction of the argon gas to be from the inlet end of the argon gas to the end of the refining ladle blowhole (210); and backflow of the argon gas at the end of the refining ladle blowhole (210) is avoided.

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