Online ozone water liquid supply pipeline system

By using micro-nano bubble devices and gas-liquid separation and mixing devices in the ozone water supply pipeline system, the problems of low ozone water concentration and poor stability were solved, and the online preparation of stable high-concentration ozone water was realized, meeting the cleaning needs of the semiconductor industry.

CN223570451UActive Publication Date: 2025-11-21PNC PROCESS SYSTEMS CO LTD +1
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Patent Information

Application Number
CN202423185370.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-23
Publication Date
2025-11-21
Estimated Expiration
2034-12-23

AI Technical Summary

Technical Problem

Existing ozone water production equipment produces ozone water with low concentration and poor stability, which is difficult to meet the cleaning needs of the semiconductor industry.

Method used

Ozone gas is mixed into ultrapure water in the form of micro-nano bubbles using a micro-nano bubble device, and the bubbles are broken by a gas-liquid separation and mixing device, so that the ozone dissolves into the water to form stable high-concentration ozone water.

Benefits of technology

It enables the online preparation of stable, high-concentration ozone water, ensuring wafer cleaning effectiveness and product quality, and improving the stability of ozone in water.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an on-line ozone water liquid supply pipeline system which comprises an ozone generator, a water supply pipeline, a micro-nano bubble device, a gas-liquid separation mixing device and a liquid supply pipeline, the micro-nano bubble device sprays high-pressure ultrapure water in a jet mode to suck ozone gas, a gas-liquid mixture containing micro-nano ozone bubbles is formed, and the liquid supply pipeline is used for supplying liquid to the gas-liquid separation mixing device. And a mixing unit for breaking ozone bubbles to promote ozone to be dissolved in the super water unit is mounted in the gas-liquid separation mixing device. The ozone water supply system provided by the utility model can prepare stable high-concentration ozone water on line, and provides a powerful guarantee for ensuring the cleaning effect of wafers and the product quality.
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Description

TECHNICAL FIELD

[0001] The utility model belongs to ozone water preparation technical field, especially relate to an on-line ozone water liquid supply pipeline system. BACKGROUND

[0002] In the semiconductor industry, traditional chemical cleaning agents, such as sulfuric acid, hydrochloric acid, sodium hydroxide, potassium hydroxide, hydrogen peroxide, potassium permanganate, etc., not only have high cost, operation risk, but also have environmental pollution, which is a "natural disadvantage". Ozone water is more environmentally friendly, safe and has no secondary pollution. It is used for cleaning and surface treatment in the semiconductor industry, with high efficiency of oxidation and no residue.

[0003] Ozone water is rapidly reacted with organic matter through its strong oxidizing property, effectively removing pollutants on the wafer surface. Therefore, accurate control of the concentration of ozone water is the key to ensuring cleaning effect and product quality. However, the main problem of ozone water produced by the ozone water manufacturing equipment is that the stable ozone water has low concentration, and the high-concentration ozone water has poor stability. UTILITY MODEL CONTENTS

[0004] The utility model solves the technical problem to provide a kind of ozone water liquid supply pipeline system, to realize the stable high concentration ozone water that can be provided for semiconductor cleaning equipment, to overcome the deficiencies of prior art

[0005] To solve the above technical problems, the utility model adopts the following technical solutions.

[0006] An on-line ozone water liquid supply pipeline system, comprising:

[0007] Ozone generator for generating ozone gas;

[0008] Water supply pipeline with booster pump for generating high-pressure ultrapure water;

[0009] Micro-nano bubble device, its gas inlet is connected with the ozone outlet of the ozone generator, and its liquid inlet is connected with the water supply pipeline;It sprays high-pressure ultrapure water by jet method to suck ozone gas, forming a gas-liquid mixture containing micro-nano ozone bubbles;

[0010] Gas-liquid separation mixing device, its liquid inlet is connected with the jet outlet of the micro-nano bubble device, and a mixing unit for breaking ozone bubbles to promote ozone dissolution into ultrapure water is installed inside;

[0011] Liquid supply pipeline connected to the liquid outlet of the gas-liquid separation mixing device.

[0012] By employing the above technical solution, this utility model uses a micro-nano bubble device to jet high-pressure ultrapure water to draw in ozone gas, allowing the ozone gas to mix into the ultrapure water in the form of micro-nano bubbles. This maximizes the amount of ozone gas mixed into the ultrapure water, significantly increasing the concentration of ozone water. Then, a gas-liquid separation and mixing device breaks down the micro-nano bubbles in the gas-liquid mixture, causing the ozone gas to dissolve directly into the ultrapure water. This improves the stability of ozone gas in ultrapure water, making it less prone to ozone precipitation.

[0013] Therefore, this invention has the advantage of being able to prepare stable, high-concentration ozone water online, providing a strong guarantee for ensuring the cleaning effect and product quality of wafers. Attached Figure Description

[0014] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments:

[0015] Figure 1 This is a system piping diagram of this utility model.

[0016] Figure 2 This is a schematic diagram of a gas-liquid separation and mixing device. Detailed Implementation

[0017] like Figure 1 As shown, the online ozone water supply pipeline system of this utility model includes an oxygen supply pipeline 100, an ozone generator 200, an ozone delivery pipeline 300, a water supply pipeline 400, a micro-nano bubble device 500, a gas-liquid separation and mixing device 600, a liquid supply pipeline 700, and an exhaust pipeline 800.

[0018] Oxygen supply line 100 supplies oxygen to ozone generator 200. In this embodiment, two oxygen supply lines 100 are connected in parallel to the oxygen inlet of ozone generator 200, with one line in use and the other as a backup. Each oxygen supply line 100 includes, in sequence, a first control valve 101, a first pressure sensor 102, a first pressure regulating valve 103, a first flow control valve 104, a first filter 105, and a first check valve 106. The first check valve 106 is then connected to the oxygen inlet of ozone generator 200. The first control valve 101 is used to control the supply of oxygen, the first pressure sensor 102 is used to monitor the pressure of oxygen supplied through the oxygen supply line 100, the first pressure regulating valve 103 is used to regulate the oxygen pressure in the oxygen supply line 100, the first flow control valve 104 is used to control the oxygen flow rate in the oxygen supply line 100, the first filter 105 is used to filter out impurities in the oxygen to provide pure oxygen to the oxygen generator 200, and the first check valve 106 is used to prevent gas from the ozone generator 200 from flowing back into the oxygen supply line 100.

[0019] The ozone generator 200 is used to make ozone from input oxygen. The ozone generator 200 is a mature product in the prior art and can be directly purchased in the market.

[0020] The ozone delivery pipeline 300 is used to deliver ozone gas to the micro-nano bubble device 500 and includes a second filter 301, a second pressure sensor 302, a first back pressure valve 303 and a second check valve 304 connected in sequence. The inlet of the second filter 301 is connected to the ozone outlet of the ozone generator 200, and the second check valve 304 is connected to the gas inlet of the micro-nano bubble device 500. The second filter 301 is used to filter ozone gas to supply pure ozone gas to the micro-nano bubble device 500, the second pressure sensor 302 is used to monitor the pressure of the ozone gas, the first back pressure valve 303 is used to ensure the pressure of the ozone gas in the ozone delivery pipeline 300, and the second check valve 304 is used to prevent the backflow of gas and liquid in the micro-nano bubble device 500 to the ozone generator 200.

[0021] The micro-nano bubble device 500 is a kind of jet mixing device, which is a mature product in the prior art and can be purchased in the market. It uses jet method to suck ozone gas, so that the ozone gas becomes micro-nano bubbles mixed in ultrapure water, which can make the ozone gas mixed in the ultrapure water as much as possible, thereby facilitating the improvement of the concentration of ozone water.

[0022] The water supply device 400 is used to supply high-pressure ultrapure water to the micro-nano bubble device 500 and includes a second control valve 401, a pressure stabilizing valve 402, a third pressure sensor 403, a second flow control valve 404, a booster pump 405, a third control valve 406 and a fourth pressure sensor 407 connected in sequence. The second control valve 401 is used to control the input of ultrapure water. The pressure stabilizing valve 402 is used to keep the water pressure in the pipeline stable. The third pressure sensor 403 is used to monitor the water pressure before entering the booster pump 405. The second flow control valve 404 is used to control the flow entering the booster pump. The booster pump 405 is used to pressurize the input ultrapure water to obtain the pressure required by the jet of the micro-nano bubble device 500. The third control valve 406 is connected to the liquid inlet of the micro-nano bubble device 500 through the fourth pressure sensor 407 and is used to control the opening and closing of the pipeline between the booster pump 405 and the micro-nano bubble device 500. The fourth pressure sensor 407 is used to monitor the water pressure entering the micro-nano bubble device 500.

[0023] In the present embodiment, the booster pump 405 adopts a magnetic suspension pump. The magnetic suspension pump is a kind of centrifugal pump, the impeller of the pump is suspended in a sealed shell without contact, is driven to rotate by a motor magnetic field, the impeller and the pump shell are made of high-purity fluoroplastic resistant to chemical corrosion, and together with the rotor magnet, the pump head is formed, the fluid flow rate and pressure are accurately controlled by adjusting the rotor speed through the electronic, and there is no bearing wear or seal failure. The utility model discloses a magnetic suspension pump, which has the advantages of no leakage, no pollution, no vibration, high efficiency, energy saving and high reliability.

[0024] The jet flow outlet of the micro-nano bubble device 500 is connected to the liquid inlet of the gas-liquid separation and mixing device 600. A fifth pressure sensor 501 is arranged at a position in front of the liquid inlet of the gas-liquid separation and mixing device 600, for monitoring the liquid pressure entering the gas-liquid separation and mixing device 600.

[0025] As shown in Figure 2 The gas-liquid separation and mixing device 600 is composed of a first mixing cylinder 601, a second mixing cylinder 602 and a gas-liquid separation tank 603 connected in sequence. The first mixing cylinder 601 and the second mixing cylinder 602 are both provided with a mixing unit. The mixing unit can be PTFE spiral, wave cross-stacked packing, PFA Paul ring packing or PTFE fiber foaming tissue, for increasing the gas-liquid contact area, and through the collision and extrusion of the mixing unit, the micro-nano ozone bubbles are broken, the ozone bubbles are eliminated, the ozone can be directly dissolved into the ultrapure water, the further mixing purpose is achieved, and the mixing efficiency is improved. The elimination of the ozone bubbles is beneficial to improving the stability of the ozone in the ultrapure water, and the ozone is not easy to precipitate. The gas-liquid separation tank 603 has a liquid inlet 603a and an exhaust port 603b at the top and a liquid outlet 603c at the bottom, and the lower 1 / 3 of the tank is provided with a mixing unit, and the upper 2 / 3 is a cavity. When the gas-liquid mixture after two-stage mixing enters the gas-liquid separation tank 603, the gas-liquid mixture is further mixed by the bottom mixing unit, so that the ozone bubbles are further eliminated, more ozone is dissolved into the ultrapure water, to obtain ozone water with higher concentration, and the ozone gas which cannot be dissolved into the ultrapure water floats to the upper cavity and is discharged through the exhaust port. The gas-liquid separation tank 603 is also provided with a liquid level sensor 604 on the side, for monitoring the liquid level in the gas-liquid separation tank 603. The liquid inlet of the first mixing cylinder 601 is connected to the jet flow outlet of the micro-nano bubble device 500, and the liquid outlet 603c of the gas-liquid separation tank 603 is connected to the liquid supply pipeline 700.

[0026] The liquid supply pipeline 700 is used for supplying the prepared stable high-concentration ozone water to an ozone cleaning device, and comprises a concentration detector 701, a third flow controller 702, a sixth pressure sensor 703 and a fourth control valve 704 connected in sequence. The concentration detector 701 is connected to a liquid outlet of the gas-liquid separation mixing device 600 (i.e. the liquid outlet 603c of the gas-liquid separation tank 603), and is used for detecting the concentration of the prepared ozone water. The third flow controller 702 is used for controlling the flow of the ozone water in the pipeline. The sixth pressure sensor 703 is used for monitoring the pressure of the ozone water in the pipeline, and the fourth control valve 704 is used for controlling the liquid supply to which ozone cleaning device.

[0027] The exhaust pipeline 800 is used for decomposing and exhausting the undissolved excess ozone gas, and comprises an electrostatic elimination pipe 801, a fifth control valve 802, a destroyer 803, a seventh pressure sensor 804 and a second back pressure valve 805 connected in sequence. The electrostatic elimination pipe 801 is grounded and connected to an exhaust port at the top of the gas-liquid separation tank 603, and is used for eliminating static electricity of the ozone gas flowing therethrough, so as to eliminate the safety hazard. The fifth control valve 802 is used for controlling the opening and closing of the pipeline between the destroyer 803 and the gas-liquid separation tank 603. The destroyer 803 is used for decomposing the ozone into oxygen to be discharged into the atmosphere. The seventh pressure sensor 804 is used for monitoring the gas pressure discharged from the destroyer. The second back pressure valve 805 forms back pressure for the pipeline, so that the pipeline has the pressure condition required for the operation of the destroyer 803 and the gas-liquid separation mixing device 600.

[0028] In the preferred embodiment of the utility model, the oxygen pressure in the oxygen supply pipeline 100 is 0.3-0.7 MPa, the flow is 3-20 L / min, the ozone gas pressure of the ozone delivery pipeline 300 is 0.1-0.3 MPa, the water pressure of the water supply pipeline 400 after being pressurized by the booster pump and supplied to the micro-nano bubble device 500 is 0.3-0.8 MPa, the pressure of the gas-liquid mixture entering the gas-liquid separation mixing device 600 is 0.2-0.5 MPa, and the back pressure of the exhaust pipeline 800 is 0.1-0.3 MPa. Through such a setting, the concentration of the prepared ozone water can reach 50-100 ppm.

[0029] It can be seen from the detailed description that the ozone water preparation method has the advantage of being capable of preparing stable high-concentration ozone water, and provides a strong guarantee for ensuring the cleaning effect of the wafer and the product quality.

[0030] It can be seen from the detailed description that the ozone water liquid supply pipeline system can prepare stable high-concentration ozone water on line, and provides a strong guarantee for ensuring the cleaning effect of the wafer and the product quality.

Claims

1. An on-line ozone water supply line system, characterized by, The ozone generator is connected to the gas inlet of the micro-nano bubble device through an ozone delivery pipeline. The exhaust pipeline is provided with a destaticizer for eliminating static electricity in the ozone gas and a destructor for decomposing the ozone gas. The oxygen supply pipeline comprises a first control valve, a first pressure sensor, a first pressure regulating valve, a first flow control valve, a first filter and a first check valve connected in sequence, and the first check valve is connected to the oxygen inlet of the ozone generator. The ozone delivery pipeline comprises a second filter, a second pressure sensor, a first back pressure valve and a second check valve connected in sequence, the inlet of the second filter is connected to the ozone outlet of the ozone generator, and the second check valve is connected to the gas inlet of the micro-nano bubble device. The water supply pipeline comprises a second control valve, a pressure stabilizing valve, a third pressure sensor, a second flow control valve, a booster pump, a third control valve and a fourth pressure sensor connected in sequence, and the fourth pressure sensor is connected to the liquid inlet of the micro-nano bubble device. The gas-liquid separation and mixing device comprises a first mixing cylinder, a second mixing cylinder and a gas-liquid separation tank connected in sequence, the mixing unit is arranged in each of the first mixing cylinder and the second mixing cylinder, the gas-liquid separation tank is provided with a liquid inlet connected to the second mixing cylinder and a gas outlet connected to the exhaust pipeline at the top, and is provided with a liquid outlet connected to the liquid supply pipeline at the bottom, the mixing unit is arranged in the lower part of the tank, and the upper part is a cavity.

2. The inline ozone water supply line system of claim 1, wherein: The mixing unit is a PTFE spiral, a wave-crossing stacked filler, a PFA Pall ring filler or a PTFE fiber foamed tissue.

3. The inline ozone water supply line system of claim 1, wherein: ​ 4. The inline ozone water supply line system of claim 1, wherein: ​ 5. The inline ozone water supply line system of claim 2, wherein: ​ 6. The inline ozone water supply line system of claim 3, wherein: ​ 7. The inline ozone water supply line system of claim 4, wherein: ​ 8. The inline ozone water supply line system of claim 1, wherein: ​ 9. The inline ozone water supply line system of claim 2, wherein: ​ 10. The inline ozone water supply line system of claim 1, wherein: ​