Single-side chemical treatment device for solar cell silicon wafer
By combining a chemical tank and a roller support device, a chemical solution is sprayed under the silicon wafer using a jetting mechanism, which solves the problem of liquid spillage on the upper surface of the silicon wafer in solar cells, improves the mass transfer rate and yield, and reduces costs.
Patent Information
- Application Number
- CN202423105242.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-16
- Publication Date
- 2025-11-21
- Estimated Expiration
- 2034-12-16
AI Technical Summary
In existing technologies, during the chemical processing of silicon wafers for solar cells, the chemical solution is prone to spilling onto the surface that does not need to be treated, resulting in substandard quality, low mass transfer rate, low yield, and high cost.
A combination device of chemical tank and roller support is used. The roller support is located below the chemical solution surface, which drives the silicon wafer to move. The spraying mechanism sprays the chemical solution below the silicon wafer. The spraying is controlled by photoelectric sensors to prevent liquid from overflowing on the upper surface and to ensure the treatment effect of the lower surface.
This improved the mass transfer rate on the lower surface of the silicon wafer in solar cells, enhanced the surface treatment effect, increased the yield, and reduced manufacturing costs.
Smart Images
Figure CN223584633U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the field of semiconductor technology, especially relates to a single surface chemical treatment device of solar cell silicon wafer. BACKGROUND
[0002] Solar cell silicon wafer (Photovoltaic Cell) is a kind of semiconductor device that converts solar energy into electrical energy directly by photoelectric effect, usually made of one or more layers of semiconductor material (such as silicon, copper indium gallium selenide, cadmium telluride, etc.), widely used in photovoltaic power generation system, to provide clean renewable energy for residential, commercial and industrial.
[0003] The single surface chemical treatment of solar cell silicon wafer refers to the chemical treatment of only one side of the cell piece (usually the front surface or back surface) to improve its performance and efficiency. This treatment method is very common in semiconductor manufacturing industry, which can significantly improve the photoelectric conversion efficiency of solar cell. In order to achieve the purpose of chemical treatment of only one side of solar cell silicon wafer, the common method in the prior art is to place the solar cell silicon wafer horizontally on the surface of the chemical solution in the chemical tank during the chemical treatment, so that only the lower surface of the solar cell silicon wafer is in contact with the liquid surface of the chemical solution, so as to achieve the purpose of single surface treatment of solar cell silicon wafer.
[0004] However, there are still many shortcomings and deficiencies in the actual operation of the above-mentioned single surface treatment of solar cell silicon wafer. Due to the influence of the environment, the liquid surface of the chemical solution will always have slight fluctuation. Because the solar cell silicon wafer used is getting thinner and thinner, when the solar cell silicon wafer is placed horizontally on the liquid surface of the chemical solution for treatment, the slight fluctuation of the liquid surface of the chemical solution will cause the chemical solution to wet the upper surface of the solar cell silicon wafer; secondly, when the solar cell silicon wafer is placed on the liquid surface of the chemical solution for treatment, the capillary phenomenon caused by the surface tension of the solution will also cause the chemical solution to be absorbed to the upper surface of the solar cell silicon wafer. The above two cases will cause chemical treatment to the upper surface part of the solar cell silicon wafer that does not need to be treated, so as to make the quality of the solar cell silicon wafer unqualified.
[0005] Therefore, there is an urgent need for a single surface chemical treatment device of solar cell silicon wafer, which can avoid the chemical solution from being turned over to the upper surface of the solar cell silicon wafer, improve the mass transfer rate of the lower surface of the solar cell silicon wafer, enhance the surface treatment effect, improve the yield, and reduce the manufacturing cost. SUMMARY
[0006] The utility model aims at providing a single surface chemical treatment device of solar cell silicon wafer to solve the problems existing in the prior art.
[0007] To achieve the above object, the utility model adopts the technical scheme that
[0008] A single surface chemical treatment device for solar cell silicon wafer, comprising:
[0009] A chemical tank, which contains chemical solution inside; and
[0010] A roller bracket, part of which is below the liquid level of the chemical solution and another part of which is above the liquid level of the chemical solution, for moving the solar cell silicon wafer in a first direction;
[0011] Wherein, the roller bracket comprises a treatment section within the range of the chemical tank, and an import section and an export section on both sides of the chemical tank; a spraying mechanism is arranged between every two adjacent rollers of the roller bracket in the treatment section; the spraying mechanism sprays when it is below the solar cell silicon wafer and stops spraying otherwise; a photoelectric sensor is installed on one side of the chemical tank for detecting the displacement information of the solar cell silicon wafer from the import section into the treatment section.
[0012] In a possible implementation, each spraying mechanism comprises:
[0013] A spraying port for spraying the chemical solution to the lower surface of the solar cell silicon wafer, thereby wetting the lower surface of the solar cell silicon wafer and chemically treating the lower surface of the solar cell silicon wafer; and
[0014] A drive control unit comprising a pump for driving the spraying port to spray and a control valve for controlling the pump to open and close.
[0015] In a possible implementation, an electric control box is further arranged on one side of the chemical tank, and the electric control box is electrically connected with the drive control unit, the roller bracket and the photoelectric sensor.
[0016] In a possible implementation, when the whole solar cell silicon wafer is within the range of the treatment section, at least two spraying mechanisms are covered at the same time.
[0017] In a possible implementation, the distance between the lower surface of the solar cell silicon wafer and the liquid level of the chemical solution is 1-5mm.
[0018] In a possible implementation, the thickness of the solar cell silicon wafer is 10-200μm.
[0019] In a possible implementation, the first direction is horizontal direction.
[0020] In a possible implementation, the spouting port sprays the chemical solution to the lower surface of the solar cell silicon wafer in a continuous spouting manner.
[0021] In a possible implementation, the height of the chemical solution sprayed by the spouting port is the distance between the lower surface of the solar cell silicon wafer and the spouting port.
[0022] In a possible implementation, the width of the spouting mechanism is less than or equal to the width of the solar cell silicon wafer.
[0023] The technical scheme provided by the utility model has at least the following beneficial effects:
[0024] The chemical tank containing the chemical solution and the roller bracket are arranged, and the roller bracket is partially below the liquid level of the chemical solution and partially above the liquid level of the chemical solution, and is used to drive the solar cell silicon wafer to move in the first direction; the roller bracket comprises a processing section within the range of the chemical tank, and an import section and an export section on both sides of the chemical tank; the spouting mechanism is arranged between the adjacent two rollers of the roller bracket in the processing section; the spouting mechanism sprays when being below the solar cell silicon wafer, and stops spraying when being above the solar cell silicon wafer; the photoelectric sensor is arranged on one side of the chemical tank and is used to detect the displacement information of the solar cell silicon wafer entering the processing section from the import section. In this case, the mass transfer rate of the lower surface of the solar cell silicon wafer can be improved, the surface treatment effect can be enhanced, the yield can be improved, and the manufacturing cost can be reduced on the basis of avoiding the chemical solution from being poured to the upper surface of the solar cell silicon wafer. BRIEF DESCRIPTION OF DRAWINGS
[0025] The accompanying drawings are used to provide a further understanding of the utility model, and constitute a part of the specification, and are used to explain the utility model together with embodiments of the utility model, and do not constitute a limitation to the utility model.
[0026] Figure 1 A structure schematic view of the solar cell silicon wafer starting to enter the chemical tank of the single surface chemical treatment device of the solar cell silicon wafer provided by an exemplary embodiment of the utility model is shown.
[0027] Figure 2 A structure schematic view of the solar cell silicon wafer moving into the chemical tank to cover the first spouting mechanism, and the first spouting mechanism starting to spray of the single surface chemical treatment device of the solar cell silicon wafer provided by an exemplary embodiment of the utility model is shown.
[0028] Figure 3 A structure schematic view of a part of the lower surface of the solar cell silicon wafer being gradually wetted, and the two spouting mechanisms spraying simultaneously of the single surface chemical treatment device of the solar cell silicon wafer provided by an exemplary embodiment of the utility model is shown.
[0029] Figure 4 The structure schematic diagram of the lower surface of the solar cell silicon wafer of the single-face chemical treatment device for solar cell silicon wafer provided by one exemplary embodiment of the utility model is shown.
[0030] Figure 5 The connection block diagram of the electric cabinet, the driving control unit, the roller bracket and the photoelectric sensor of the single-face chemical treatment device for solar cell silicon wafer provided by one exemplary embodiment of the utility model is shown.
[0031] In the figure: 1, roller bracket; 11, roller; 2, solar cell silicon wafer; 3, chemical tank; 4, chemical solution; 5, spouting mechanism; 51, spouting port; 52, driving control unit; 6, photoelectric sensor; 7, electric cabinet; A, import section; B, treatment section; C, export section. DETAILED DESCRIPTION
[0032] The technical solutions in the embodiments of the utility model will be apparently and completely described in combination with the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by the person skilled in the art without creative labor fall within the protection scope of the utility model.
[0033] Among them, same parts are indicated by same reference numerals. It should be noted that the words "front", "back", "left", "right", "up" and "down" used in the following description refer to the directions in the drawings of the utility model specification, and the words "bottom surface" and "top surface", "inner" and "outer" respectively refer to the directions towards or away from a specific part. In addition, the terms "first", "second" are only used for description purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include one or more features. In the description of the utility model specification, the meaning of "multiple" is two or more than two.
[0034] The utility model will be further described in combination with the drawings and embodiments.
[0035] Please refer to Figures 1 to 4 , Figure 1 The structure schematic diagram of the solar cell silicon wafer starting to enter the chemical tank of the single-face chemical treatment device for solar cell silicon wafer provided by one exemplary embodiment of the utility model is shown. Figure 2The structure schematic diagram of the single-side chemical treatment device for the solar cell silicon wafer provided by one example embodiment of the utility model shows that the solar cell silicon wafer moves into the chemical tank to cover the first spouting mechanism, and the first spouting mechanism starts to spout. Figure 3 The structure schematic diagram of the single-side chemical treatment device for the solar cell silicon wafer provided by one example embodiment of the utility model shows that the lower surface of the solar cell silicon wafer is gradually wetted, and the two spouting mechanisms spout simultaneously. Figure 4 The structure schematic diagram of the single-side chemical treatment device for the solar cell silicon wafer provided by one example embodiment of the utility model shows that the lower surface of the solar cell silicon wafer is completely wetted, and the three spouting mechanisms spout simultaneously.
[0036] In detail, the single-side chemical treatment device for the solar cell silicon wafer comprises a chemical tank 3 containing chemical solution 4 and a roller bracket 1; one part of the roller bracket 1 is below the liquid level of the chemical solution 4, and the other part is above the liquid level of the chemical solution 4, used for driving the solar cell silicon wafer 2 to move in the first direction; wherein the roller bracket 1 comprises a treatment section B within the range of the chemical tank 3, and an import section A and an export section C on both sides of the chemical tank 3; the adjacent two rollers 11 of the roller bracket 1 in the treatment section B are provided with a spouting mechanism 5; the spouting mechanism 5 spouts when it is below the solar cell silicon wafer 2, and stops spouting otherwise; a photoelectric sensor 6 is installed on one side of the chemical tank 3, used for detecting the displacement information of the solar cell silicon wafer 2 from the import section A into the treatment section B.
[0037] In the embodiment of the application, the import section A is used for guiding the untreated solar cell silicon wafer 2 to enter the treatment section B within the range of the chemical tank 3 in the first direction, and the export section C is used for guiding the treated solar cell silicon wafer 2 to leave the treatment section B in the first direction, and the first direction is preferably a horizontal direction. In one example, the distance between the lower surface of the solar cell silicon wafer 2 and the liquid level of the chemical solution 4 is 1mm. In another example, the distance between the lower surface of the solar cell silicon wafer 2 and the liquid level of the chemical solution 4 is 2mm. In another example, the distance between the lower surface of the solar cell silicon wafer 2 and the liquid level of the chemical solution 4 is 3mm. In another example, the distance between the lower surface of the solar cell silicon wafer 2 and the liquid level of the chemical solution 4 is 4mm. In another example, the distance between the lower surface of the solar cell silicon wafer 2 and the liquid level of the chemical solution 4 is 5mm. In one example, the thickness of the solar cell silicon wafer 2 is 10μm. In another example, the thickness of the solar cell silicon wafer 2 is 100μm. In another example, the thickness of the solar cell silicon wafer 2 is 200μm.
[0038] In the embodiment of the present application, the roller support 1 is a mechanical device for supporting and guiding the rolling component, which is composed of a fixed frame (not shown in the figure) and a rotatable roller 11. The rotatable roller 11 is driven by a motor (not shown in the figure) and can provide stable support while reducing friction.
[0039] In the embodiment of the present application, the chemical solution 4 is a single-component chemical solution or a multi-component chemical solution. In one example, the chemical solution 4 is a mixed solution of nitric acid and hydrofluoric acid. In another example, the chemical solution 4 is a nickel plating solution. In another example, the chemical solution 4 is a propanol solution.
[0040] In the embodiment of the present application, at least two spouting mechanisms 5 cover the solar cell silicon wafer 2 at the same time when the solar cell silicon wafer 2 is in the processing section B, so as to ensure the stability of the movement of the solar cell silicon wafer 2, prevent liquid overflow, and achieve the ideal mass transfer rate.
[0041] In the embodiment of the present application, the spouting mechanism 5 only spouts under the solar cell silicon wafer 2, and does not spout when it is not under the solar cell silicon wafer 2, so as to prevent liquid overflow to the upper surface of the solar cell silicon wafer 2. As can be seen from the figure, when the first spouting mechanism 5 starts spouting, the chemical solution 4 can continue to wet the lower surface of the solar cell silicon wafer 2 by means of the surface tension of the solution, Figure 3 The lower surface of the solar cell silicon wafer 2 is partially wetted, Figure 4 The lower surface of the solar cell silicon wafer 2 is completely wetted.
[0042] Further, each spouting mechanism 5 comprises a spouting port 51 for spouting the chemical solution 4 to the lower surface of the solar cell silicon wafer 2, so as to wet the lower surface of the solar cell silicon wafer 2 and perform chemical treatment on the lower surface of the solar cell silicon wafer 2, and a drive control unit 52 comprising a pump for driving the spouting of the spouting port 51 and a control valve for controlling the opening and closing of the pump.
[0043] In one example, when the entire solar cell silicon wafer 2 enters the chemical tank 3, the lower surface of the solar cell silicon wafer 2 covers at least one spouting mechanism 5. Preferably, when the entire solar cell silicon wafer 2 enters the chemical tank 3, the lower surface of the solar cell silicon wafer 2 covers at least two spouting mechanisms 5 at the same time, so as to ensure the stability of the movement of the solar cell silicon wafer 2, prevent liquid overflow, and achieve the ideal mass transfer rate.
[0044] In the embodiment of the present application, the spouting mechanism 5 is a mechanical device for spouting liquid, which is connected to the chemical tank 3 through a fixed support (not shown in the figure).
[0045] In the embodiment of the present application, the spouting port 51 sprays the chemical solution 4 to the lower surface of the solar cell silicon wafer 2 in a continuous spraying manner to achieve the optimal mass transfer effect. In addition, the height of the chemical solution 4 sprayed by the spouting port 51 is the distance between the lower surface of the solar cell silicon wafer 2 and the spouting port 51 to ensure the stability of the solar cell silicon wafer 2 during movement.
[0046] In an embodiment different from the above Figure 2 , Figure 3 and Figure 4 shown, the chemical solution 4 in the chemical tank 3 does not contact the lower surface of the solar cell silicon wafer 2, and the chemical reaction occurs after the lower surface of the solar cell silicon wafer 2 is completely wetted by the sprayed chemical solution 4 (i.e., without the help of the surface tension of the solution to continuously wet the lower surface of the solar cell silicon wafer 2). In this way, the use amount of the chemical solution 4 can be greatly reduced, and the equipment structure is simplified.
[0047] It is worth mentioning that the width of the spouting mechanism 5 is less than or equal to the width of the solar cell silicon wafer 2 to ensure that the spraying range is within the range of the lower surface of the solar cell silicon wafer 2, and the moving direction of the solar cell silicon wafer 2 is the length direction thereof.
[0048] It can be understood that the single-side chemical treatment device for solar cell silicon wafers further includes an electric control box 7 located at one side of the chemical tank 3, Figure 5 The connection block diagram of the electric control box, the driving control unit, the roller support, and the photoelectric sensor of the single-side chemical treatment device for solar cell silicon wafers provided by an exemplary embodiment of the present application is shown, and the electric control box 7 is electrically connected with the driving control unit 52, the roller support 1, and the photoelectric sensor 6 to make the components work cooperatively.
[0049] It should be noted that the time point at which the solar cell silicon wafer 2 enters the chemical tank 3 is detected by the photoelectric sensor 6 installed at the entrance of the chemical tank 3, and then the opening and closing time of each spouting mechanism 5 can be preset in combination with the size of the solar cell silicon wafer 2 and the moving speed of the solar cell silicon wafer 2 (i.e., the rotation speed of the roller support 1).
[0050] Next, the working principle of the single-side chemical treatment device for solar cell silicon wafers in the embodiment of the present application is described.
[0051] The electric control box sends a rolling signal to the roller support, and the roller support drives the solar cell silicon wafer to move along the horizontal direction from the leading-in section to the treatment section;
[0052] In response to the solar cell silicon wafer moving above the spouting mechanism of the processing section, the electric control box sends a spouting signal to the spouting mechanism, the spouting mechanism spouts the chemical solution to the lower surface of the solar cell silicon wafer, thereby wetting the lower surface of the solar cell silicon wafer and chemically processing the lower surface of the solar cell silicon wafer.
[0053] In response to the solar cell silicon wafer continuing to move in the first direction until leaving above the spouting mechanism, the electric control box sends a stop-spouting signal to the spouting mechanism, and the spouting mechanism stops spouting.
[0054] After sequentially passing through all the spouting mechanisms of the processing section, the solar cell silicon wafer moves from the processing section to the leading-out section, and the processing is completed.
[0055] In summary, by arranging the chemical tank containing the chemical solution and the roller bracket, part of the roller bracket is below the liquid level of the chemical solution, and the other part is above the liquid level of the chemical solution, for driving the solar cell silicon wafer to move in the first direction; wherein the roller bracket comprises the processing section within the range of the chemical tank, and the leading-in section and the leading-out section on both sides of the chemical tank; the spouting mechanism is arranged between the adjacent two rollers of the roller bracket in the processing section; the spouting mechanism spouts when being below the solar cell silicon wafer, and vice versa; the photoelectric sensor is arranged on one side of the chemical tank, for detecting the displacement information of the solar cell silicon wafer from the leading-in section to the processing section. In this case, the mass transfer rate of the lower surface of the solar cell silicon wafer can be improved, the surface treatment effect can be enhanced, the yield can be improved, and the manufacturing cost can be reduced, on the basis of avoiding the chemical solution from spilling to the upper surface of the solar cell silicon wafer.
[0056] In the embodiments disclosed in the present application, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood in a broad sense. For example, "connecting" can be fixed connection, or detachable connection, or integrally connected; "connecting" can be directly connected, or indirectly connected through an intermediate medium. For ordinary skilled in the art, the specific meaning of the above terms in the embodiments disclosed in the present application can be understood according to the specific circumstances.
[0057] The above is only the preferred embodiment of the present application, and it should be pointed out that for ordinary skilled in the art, without departing from the principle of the present application, a number of improvements and refinements can be made, which should also be regarded as the protection scope of the present application.
Claims
1. A single-sided chemical processing apparatus for silicon wafers used in solar cells, characterized in that, include: Chemical tank (3), which contains chemical solution (4); as well as A roller support (1), one part of which is located below the liquid surface of the chemical solution (4) and the other part is located above the liquid surface of the chemical solution (4), is used to drive the solar cell silicon wafer (2) to move along the first direction; The roller support (1) includes a processing section (B) located within the chemical tank (3) and an inlet section (A) and an outlet section (C) located on both sides of the chemical tank (3). A jetting mechanism (5) is provided between two adjacent rollers (11) of the roller support (1) in the processing section (B). The jetting mechanism (5) jets when it is below the solar cell silicon wafer (2) and stops jetting when it is away from it. A photoelectric sensor (6) is installed on one side of the chemical tank (3) to detect the displacement information of the solar cell silicon wafer (2) from the inlet section (A) into the processing section (B).
2. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 1, characterized in that, Each of the jetting mechanisms (5) includes: A jet nozzle (51) is used to spray the chemical solution (4) onto the lower surface of the solar cell silicon wafer (2), thereby wetting the lower surface of the solar cell silicon wafer (2) and chemically treating the lower surface of the solar cell silicon wafer (2); and The drive control unit (52) includes a pump for driving the jet (51) to gush forth, and a control valve for controlling the opening and closing of the pump.
3. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 2, characterized in that, It also includes an electrical control box (7) located on one side of the chemical tank (3), the electrical control box (7) being electrically connected to the drive control unit (52), the roller bracket (1), and the photoelectric sensor (6).
4. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 1, characterized in that, When the entire solar cell silicon wafer (2) is within the processing section (B), it covers at least two of the jetting mechanisms (5) simultaneously.
5. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 1, characterized in that, The distance between the lower surface of the solar cell silicon wafer (2) and the liquid surface of the chemical solution (4) is 1-5 mm.
6. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 1, characterized in that, The thickness of the solar cell silicon wafer (2) is 10-200 μm.
7. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 1, characterized in that, The first direction is the horizontal direction.
8. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 2, characterized in that, The jet nozzle (51) sprays the chemical solution (4) onto the lower surface of the solar cell silicon wafer (2) in a continuous jetting manner.
9. The single-sided chemical processing apparatus for solar cell silicon wafers according to claim 8, characterized in that, The height of the chemical solution (4) ejected from the gushing nozzle (51) is the distance between the lower surface of the solar cell silicon wafer (2) and the gushing nozzle (51).
10. The single-sided chemical processing apparatus for solar cell silicon wafers according to any one of claims 1 to 9, characterized in that, The width of the jetting mechanism (5) is less than or equal to the width of the solar cell silicon wafer (2).