Blocking structure and processing equipment

Abstract

The utility model provides a blocking structure and processing equipment, relates to the field of semiconductor or photovoltaic material processing, and solves the technical problem that the uniformity of process gas in a reaction cavity is affected due to the fact that a uniform flow structure in plasma enhanced chemical vapor deposition equipment is provided with a notch. The blocking structure comprises at least one magnetofluid assembly, each magnetofluid assembly comprises a fixed part and a rotating part which are connected with each other, the rotating part can rotate relative to the fixed part, and the fixed part is connected with the cover plate; the at least one flow uniformizing assembly is arranged in the reaction cavity, each flow uniformizing assembly is connected with the rotating part of the corresponding magnetic fluid assembly, each flow uniformizing assembly is configured to uniformize flow of the process gas in the reaction cavity, and each flow uniformizing assembly can be driven by the rotating part of the corresponding magnetic fluid assembly to rotate so as to shield or expose the observation window. Through the structure, the uniform flow assembly can make up the influence of the notch of the uniform flow structure in the reaction cavity on the uniformity of the process gas.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of semiconductor or photovoltaic material processing, in particular to a blocking structure and a processing device. BACKGROUND

[0002] Semiconductor or photovoltaic materials are widely used in electronic, new energy and other industries. Semiconductor and photovoltaic materials usually need to be chemically treated before they can be applied to products. Plasma enhanced chemical vapor deposition (PECVD) technology is one of the processing methods, that is, a silicon wafer is coated with a film by a plasma enhanced chemical vapor deposition device (referred to as a reaction furnace). Plasma enhanced chemical vapor deposition is a method of epitaxy in which a gas is excited to produce low-temperature plasma, enhancing the chemical activity of the reaction material. The methods of exciting glow discharge mainly include: radio frequency excitation, direct current high voltage excitation, pulse excitation and microwave excitation. Radio frequency excitation is a commonly used method. The radio frequency power is electrically connected to the graphite boat through a feed-in assembly. The radio frequency power source generates high-frequency discharge, and the electric field formed by the graphite boat ionizes the process gas in the high-temperature vacuum chamber.

[0003] An observation window is usually provided on the furnace tail flange cover plate of the reaction furnace. When installing and debugging the feed-in assembly, the observation window needs to be observed, and the position of the electrode rod in the feed-in assembly needs to be adjusted through the observation window, so that the electrode head of the electrode rod can better contact the graphite boat. In addition, during the process debugging stage, the real-time situation of the discharge in the furnace also needs to be checked from the observation window to troubleshoot and adjust the process formula. In addition, due to the increasing demand for production capacity, the length and size of the furnace tube of the production reaction furnace are becoming longer and larger, and accordingly, the length of the auxiliary heating sleeve and the inner matching sleeve in the reaction furnace is also becoming longer. The installation of the lengthened auxiliary heating sleeve and inner matching sleeve is more inconvenient, and needs to be assisted to install from the observation window into the reaction cavity of the reaction furnace.

[0004] In traditional PECVD equipment, in order to avoid blocking the observation window, an avoidance or notch is provided on the uniform flow structure at the corresponding position of the observation window. The notch on the uniform flow structure will affect the uniform flow of the process gas in the reaction cavity, increasing the difficulty of process debugging. Moreover, due to the above defects, the size of the observation window is usually designed to be small, and the size of the notch is correspondingly reduced, thereby reducing the influence of the notch of the uniform flow structure on the uniform flow. The small observation window is inconvenient to observe, and it is difficult to observe the butt joint condition of the electrode head and the graphite boat, and it is also difficult to stretch the hand into the observation window for installation. In addition, due to the notch on the uniform flow structure, the glass of the observation window is exposed, and the glass of the observation window will be coated with a thin film, which will not be clear in about six months, and the glass of the observation window needs to be replaced. CONTENT OF THE INVENTION

[0005] To solve at least one of the above technical problems, the present application is proposed. Embodiments of the present application provide a blocking structure and a processing device.

[0006] In a first aspect, an embodiment of the present application provides a blocking structure applied to a reaction furnace, the reaction furnace having a reaction chamber, a furnace tail of the reaction furnace having an opening and a cover plate for closing the opening, the cover plate having a viewing window, the blocking structure comprising: at least one magnetic fluid assembly, each magnetic fluid assembly comprising a fixed part and a rotating part connected to each other, the rotating part being capable of rotating relative to the fixed part, the fixed part being connected to the cover plate, a first end of each magnetic fluid assembly being located outside the reaction chamber, a second end of each magnetic fluid assembly being located inside the reaction chamber; at least one uniform flow assembly arranged in the reaction chamber, the at least one uniform flow assembly being arranged in one-to-one correspondence with the at least one magnetic fluid assembly, each uniform flow assembly being connected to the rotating part of the corresponding magnetic fluid assembly, each uniform flow assembly being configured to uniformly flow process gas in the reaction chamber, and each uniform flow assembly being capable of rotating under the driving of the rotating part of the corresponding magnetic fluid assembly to shield or expose the viewing window.

[0007] In some embodiments, the blocking structure further comprises: at least one reflection assembly arranged in the reaction chamber, the at least one reflection assembly being arranged in one-to-one correspondence with the at least one magnetic fluid assembly, each reflection assembly being connected to the rotating part of the corresponding magnetic fluid assembly, each reflection assembly being configured to reflect heat of the furnace tail to a middle part of the reaction chamber, and each reflection assembly being capable of rotating under the driving of the rotating part of the corresponding magnetic fluid assembly to shield or expose the viewing window.

[0008] In some embodiments, the blocking structure further comprises: at least one limiting part arranged in the reaction chamber, connected to the cover plate, and configured to limit the rotation angle of the at least one uniform flow assembly and / or the at least one reflection assembly.

[0009] In some embodiments, the number of limiting parts is at least two, each magnetic fluid assembly being arranged in correspondence with two limiting parts, for the two limiting parts corresponding to one magnetic fluid assembly, one of the two limiting parts being configured to limit the angle of rotation of the uniform flow assembly and / or the reflection assembly connected to the one magnetic fluid assembly in a clockwise direction, and the other of the two limiting parts being configured to limit the angle of rotation of the uniform flow assembly and / or the reflection assembly connected to the one magnetic fluid assembly in a counterclockwise direction.

[0010] In some embodiments, the shape of the cross section of the second end of the magnetic fluid assembly is non-circular; wherein the flow uniformizing assembly comprises at least one flow uniformizing plate, each flow uniformizing plate having a first mounting hole, the shape of the cross section of the first mounting hole being the same as the shape of the cross section of the second end of the magnetic fluid assembly; and the reflection assembly comprises at least one reflection plate, each reflection plate having a second mounting hole, the shape of the cross section of the second mounting hole being the same as the shape of the cross section of the second end of the magnetic fluid assembly.

[0011] In some embodiments, the blocking structure further comprises at least one spacer arranged between the flow uniformizing plates and / or between the flow uniformizing plates and the reflection plates and / or between the reflection plates.

[0012] In some embodiments, the blocking structure further comprises at least one handle, each handle being connected to the rotating member of the at least one magnetic fluid assembly in one-to-one correspondence, and each handle being located outside the reaction chamber.

[0013] In some embodiments, the magnetic fluid assembly is a flange type water-cooled solid shaft magnetic fluid.

[0014] In the second aspect, an embodiment of the present application provides a processing device, comprising: a reaction furnace having a reaction chamber, the furnace tail of the reaction furnace having an opening and a cover plate for closing the opening, the cover plate having an observation window; and the blocking structure of any one of the first aspect, connected to the cover plate, and the at least one flow uniformizing assembly of the blocking structure being located in the reaction chamber and configured to shield or expose the observation window.

[0015] In some embodiments, the number of observation windows is at least two, the at least two observation windows being symmetrically arranged relative to the vertical symmetry plane of the cover plate, and the number of blocking structures is at least two, each blocking structure being configured to shield or expose one observation window.

[0016] The blocking structure and the processing device provided by the embodiments of the present application can rotate the rotating member to expose the observation window by the at least one flow uniformizing assembly when installing and debugging components in the reaction furnace or observing the situation in the reaction furnace, and can rotate the rotating member to shield the observation window by the at least one flow uniformizing assembly when the observation window is not used, thereby uniformly flowing the process gas that is not uniformly flowed due to the gap of the flow uniformizing structure at the furnace tail, improving the flow uniformizing effect of the overall flow in the reaction chamber, reducing the process debugging difficulty, and improving the film uniformity.

[0017] In addition, shielding the observation window by the at least one flow uniformizing assembly can protect the quartz glass of the observation window, reduce the film plating of the quartz glass, and prolong the replacement cycle of the quartz glass.

[0018] In addition, the at least one uniform flow assembly can compensate for the influence of the gap in the uniform flow structure in the reaction cavity on the uniformity of the process gas and the influence on the coated observation window, so that the size of the observation window can be made larger, thereby improving the field of view of the staff observing the inside of the reaction cavity through the observation window, facilitating the observation of the docking of the electrode head and the graphite boat, reducing the installation and connection time of the electrode head and the graphite boat, and facilitating the staff to put their hands into the observation window to install structures such as auxiliary heating sleeves, inner matching sleeves, etc. BRIEF DESCRIPTION OF DRAWINGS

[0019] The above and other objects, features and advantages of the present application will become more apparent from the following detailed description of embodiments of the present application, taken in conjunction with the accompanying drawings. The drawings provided in the present application are used to provide further understanding of the embodiments of the present application, and constitute a part of the specification, and are used to explain the present application together with the embodiments of the present application, but do not constitute a limitation of the present application. In the drawings, the same reference numerals generally represent the same components or steps.

[0020] Figure 1 A structural schematic diagram of a blocking structure provided by an exemplary embodiment of the present application is shown.

[0021] Figure 2 A structural schematic diagram of a blocking structure and a cover plate provided by an exemplary embodiment of the present application is shown.

[0022] Figure 3 A schematic diagram of a blocking structure shielding an observation window provided by an exemplary embodiment of the present application is shown.

[0023] Figure 4 A schematic diagram of a blocking structure exposing an observation window provided by an exemplary embodiment of the present application is shown.

[0024] Figure 5 A structural schematic diagram of a magnetic fluid assembly provided by an exemplary embodiment of the present application is shown.

[0025] Figure 6 A structural schematic diagram of a uniform flow assembly and a reflection assembly provided by an exemplary embodiment of the present application is shown.

[0026] Figure 7 A front view of a processing device provided by an exemplary embodiment of the present application is shown.

[0027] Figure 8 A structural schematic diagram of a processing device provided by an exemplary embodiment of the present application is shown.

[0028] REFERENCE SIGNS:

[0029] 100, blocking structure; 110, magnetic fluid assembly; 111, fixed part; 112, rotating part; 113, first end of magnetic fluid assembly; 114, second end of magnetic fluid assembly; 120, flow uniformizing assembly; 121, flow uniformizing plate; 1211, first mounting hole; 130, reflecting assembly; 131, reflecting plate; 1311, second mounting hole; 140, limiting part; 150, spacer; 160, handle; 170, screwing part; 180, washer; 200, reaction furnace; 210, cover plate; 211, observation window; 220, flow uniformizing structure; 221, notch; 230, heat insulation structure; 240, radio frequency electrode feeding assembly; 250, auxiliary heating sleeve; 260, inner coupling assembly; 300, processing equipment. DETAILED DESCRIPTION

[0030] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without any creative work fall within the protection scope of the present application.

[0031] Figure 1 Fig. 1 shows a structural schematic diagram of a blocking structure provided by an exemplary embodiment of the present application, Figure 2 Fig. 2 shows a structural schematic diagram of a blocking structure and a cover plate provided by an exemplary embodiment of the present application, Figure 3 Fig. 3 shows a schematic diagram of a blocking structure shielding an observation window provided by an exemplary embodiment of the present application, Figure 4 Fig. 4 shows a schematic diagram of a blocking structure exposing an observation window provided by an exemplary embodiment of the present application, Figure 5 Fig. 5 shows a structural schematic diagram of a magnetic fluid assembly provided by an exemplary embodiment of the present application, Figure 6 Fig. 6 shows a structural schematic diagram of a flow uniformizing assembly and a reflecting assembly provided by an exemplary embodiment of the present application.

[0032] As shown in Fig. 1, Figures 1 to 6As shown, the embodiment of the present application provides a blocking structure 100 applied to a reaction furnace 200, the reaction furnace 200 has a reaction cavity, two ends of the reaction furnace 200 in the extension direction of the reaction furnace 200 are respectively a furnace head and a furnace tail, the furnace tail of the reaction furnace 200 has an opening and a cover plate 210 used for closing the opening, the cover plate 210 has an observation window 211, the blocking structure 100 comprises: at least one magnetic fluid assembly 110 and at least one uniform flow assembly 120. Each magnetic fluid assembly 110 comprises a fixed part 111 and a rotating part 112 connected with each other, the rotating part 112 can rotate relative to the fixed part 111, the fixed part 111 is connected with the cover plate 210, a first end 113 of each magnetic fluid assembly 110 is located outside the reaction cavity, a second end 114 of each magnetic fluid assembly 110 is located inside the reaction cavity (that is, the rotating part 112 is partially located inside the reaction cavity). At least one uniform flow assembly 120 is arranged in the reaction cavity, at least one uniform flow assembly 120 is arranged in one-to-one correspondence with at least one magnetic fluid assembly 110, each uniform flow assembly 120 is connected with the rotating part 112 of the corresponding magnetic fluid assembly 110, each uniform flow assembly 120 is configured to uniformly flow the process gas in the reaction cavity, and each uniform flow assembly 120 can be rotated under the driving of the rotating part 112 of the corresponding magnetic fluid assembly 110 to shield or expose the observation window 211.

[0033] Wherein, the fixed part 111 can be in airtight connection with the cover plate 210, so as to ensure the sealing property of the reaction furnace 200. The gap 221 of the uniform flow structure 220 in the reaction cavity can expose the observation window 211, the uniform flow assembly 120 can shield the gap 221 while shielding the observation window 211, and the uniform flow assembly 120 can expose the gap 221 while exposing the observation window 211.

[0034] In actual application, when installing and debugging components in the reaction furnace 200 or observing the situation in the reaction furnace 200, the rotating part 112 can be rotated to expose the observation window 211 (such as Figure 4 In actual application, when installing and debugging components in the reaction furnace 200 or observing the situation in the reaction furnace 200, the rotating part 112 can be rotated to expose the observation window 211 (such as Figure 3The at least one flow uniformization assembly 120 can compensate for the influence of the gap in the flow uniformization structure on the uniformity of the process gas and the influence of the gap on the deposition of the film on the observation window 211. Therefore, the size of the observation window 211 can be made larger, thereby improving the field of view of the worker when observing the inside of the reaction chamber through the observation window 211, facilitating the observation of the docking of the electrode head and the graphite boat, reducing the installation and connection time of the electrode head and the graphite boat, and also facilitating the worker to put his hand into the observation window 211 to install structures such as the auxiliary heating sleeve 250 and the inner matching sleeve.

[0035] In some embodiments, the blocking structure 100 further comprises at least one reflecting assembly 130. The at least one reflecting assembly 130 is provided in one-to-one correspondence with the at least one magnetorheological assembly 110. Each reflecting assembly 130 is connected to the rotating member 112 of the corresponding magnetorheological assembly 110. The reaction chamber has a head, a tail and a middle part between the head and the tail in the extension direction of the reaction furnace 200. Each reflecting assembly 130 is configured to reflect heat from the tail to the middle part of the reaction chamber, and each reflecting assembly 130 can be rotated under the driving of the rotating member 112 of the corresponding magnetorheological assembly 110 to shield or expose the observation window 211.

[0036] In the conventional PECVD equipment, a heat insulation structure 230 is provided, which is the same as the flow uniformization structure 220. The heat insulation structure 230 is also provided with an avoidance position or a gap at the corresponding position of the observation window, so that heat can be radiated from the gap of the heat insulation structure 230 to the tail flange cover plate, resulting in a higher temperature of the tail flange cover plate and affecting the service life of the sealing ring in each installed component on the tail flange cover plate.

[0037] Through the above structure, when installing and debugging components in the reaction furnace 200 or observing the inside of the reaction furnace 200, the rotating member 112 can be rotated to expose the observation window 211 to the at least one reflecting assembly 130 (as shown in FIG. 6A). Figure 4 When the observation window 211 is not used, the rotating member 112 can be rotated to shield the observation window 211 with the at least one reflecting assembly 130 (as shown in FIG. 6B). Figure 3The at least one reflecting assembly 130 is configured to reflect the heat at the gap of the heat insulation structure 230 back to the middle of the reaction chamber, so as to reduce the heat loss and the energy consumption of the reaction furnace 200. In addition, the reflecting assembly 130 can jointly shield the observation window 211 with the flow uniformizing assembly 120, so as to protect the quartz glass of the observation window 211, reduce the film deposition on the quartz glass, and prolong the replacement cycle of the quartz glass. Further, since the at least one reflecting assembly 130 can compensate the influence of the gap of the heat insulation structure 230 on the heat loss and the influence of the gap on the film deposition on the observation window 211, the size of the observation window 211 can be made larger, so as to improve the field of view of the worker when observing the situation in the reaction chamber through the observation window 211, facilitate the observation of the connection between the electrode head and the graphite boat, reduce the installation and connection time of the electrode head and the graphite boat, and facilitate the worker to put his hand into the observation window 211 to install structures such as the auxiliary heating sleeve and the inner matching sleeve.

[0038] In some embodiments, as shown in Figure 2 The blocking structure 100 further comprises at least one limiting piece 140. The at least one limiting piece 140 is arranged in the reaction chamber and connected with the cover plate 210, and is configured to limit the rotation angle of the at least one flow uniformizing assembly 120 and / or the at least one reflecting assembly 130.

[0039] For example, the limiting piece 140 can be a columnar structure, and the at least one limiting piece 140 can be arranged on the rotation movement path of the at least one flow uniformizing assembly 120 and / or the at least one reflecting assembly 130, so as to block the further rotation of the at least one flow uniformizing assembly 120 and / or the at least one reflecting assembly 130.

[0040] By arranging the limiting piece 140, the rotation angle of the at least one flow uniformizing assembly 120 and / or the at least one reflecting assembly 130 can be limited, so as to prevent the at least one flow uniformizing assembly 120 and / or the at least one reflecting assembly 130 from colliding with other structures, and in the case that there are at least two magnetic fluid assemblies 110, the flow uniformizing assemblies 120 and / or the reflecting assemblies 130 on different magnetic fluid assemblies 110 can also be prevented from colliding with each other.

[0041] In some embodiments, as shown in Figure 2 The number of the limiting pieces 140 is at least two, and each magnetic fluid assembly 110 is correspondingly arranged with two limiting pieces 140. For the two limiting pieces 140 corresponding to one magnetic fluid assembly 110, one of the two limiting pieces 140 is configured to limit the rotation angle of the flow uniformizing assembly 120 and / or the reflecting assembly 130 connected with the one magnetic fluid assembly 110 in the clockwise direction, and the other of the two limiting pieces 140 is configured to limit the rotation angle of the flow uniformizing assembly 120 and / or the reflecting assembly 130 connected with the one magnetic fluid assembly 110 in the counterclockwise direction.

[0042] By setting two limiting members for each magnetofluid component 110, the angles of clockwise and counterclockwise rotation of the flow equalization component 120 and / or reflection component 130 on each magnetofluid component 110 can be precisely limited, avoiding collisions between the flow equalization component 120 and / or reflection component 130 and other structures, or collisions between the flow equalization component 120 and / or reflection component 130 on other magnetofluid components 110.

[0043] In some embodiments, such as Figure 5 As shown, the cross-sectional shape of the second end 114 of the magnetofluid assembly 110 (such as the end where the rotating member 112 is located in the reaction chamber) is non-circular (the second end 114 of the magnetofluid assembly 110 can also be called a flat end). The non-circular shape can be a polygon, or a closed shape composed of arcs and straight lines. Figure 6 As shown, the flow equalization assembly 120 includes at least one flow equalization plate 121, each flow equalization plate 121 having a first mounting hole 1211, the cross-sectional shape of which is the same as the cross-sectional shape of the second end 114 of the magnetofluid assembly 110. The reflection assembly 130 includes at least one reflection plate 131, each reflection plate 131 having a second mounting hole 1311, the cross-sectional shape of which is the same as the cross-sectional shape of the second end 114 of the magnetofluid assembly 110. The material of the reflection plate 131 is, exemplarily, stainless steel, such as SUS304. With this structure, the flow equalization plate 121 and the reflection plate 131 can rotate following the rotation of the magnetofluid assembly 110.

[0044] In some embodiments, such as Figure 1 As shown, the blocking structure 100 further includes at least one spacer 150, which is disposed between the flow equalizer 121 and the flow equalizer 121, and / or between the flow equalizer 121 and the reflector 131, and / or between the reflector 131 and the reflector 131. Exemplarily, the spacer 150 has a first through hole through which the rotating member 112 can pass. By providing the spacer 150, the spacing between the flow equalizer 121 and the flow equalizer 121, and / or between the flow equalizer 121 and the reflector 131, and / or between the reflector 131 and the reflector 131 can be maintained, preventing collisions.

[0045] In some embodiments, such as Figure 1As shown, the second end 114 (e.g., the end of the rotating member 112 located in the reaction cavity) of the magnetic fluid assembly 110 has an internally threaded portion, the blocking structure 100 further comprises a threaded member 170 and a gasket 180, the threaded member 170 is screwed with the internally threaded portion, and the gasket 180 has a second through hole, the second end 114 (e.g., the rotating member 112) of the magnetic fluid assembly 110 passes through the second through hole, and the gasket 180 is arranged between the flow uniformizing assembly 120 and the threaded member 170. The threaded member 170 is exemplarily a bolt or a screw. Through the structure, the flow uniformizing assembly 120 and / or the reflecting assembly 130 can be fixed stably.

[0046] In some embodiments, as Figure 1 As shown, the blocking structure 100 further comprises at least one handle 160, the at least one handle 160 is connected with the rotating member 112 of the at least one magnetic fluid assembly 110 one by one, and each handle 160 is located outside the reaction cavity. The handle 160 can have a texture, so as to increase the friction between the handle 160 and the hands of the staff, and facilitate the staff to hold the handle 160. Through the handle 160, the staff can rotate the rotating member 112 from the outside of the reaction cavity, so as to shield or expose the observation window 211 by the flow uniformizing assembly 120 and / or the reflecting assembly 130.

[0047] In some embodiments, the magnetic fluid assembly 110 is a flange type water-cooled solid shaft magnetic fluid. The flange type water-cooled solid shaft magnetic fluid has cooling water inside, which can reduce the influence of high temperature on the magnetic fluid assembly 110 and prevent the magnetic fluid assembly 110 from being damaged by high temperature.

[0048] Figure 7 As shown in the front view of the processing equipment provided by an exemplary embodiment of the present application, Figure 8 As shown in the structural schematic view of the processing equipment provided by an exemplary embodiment of the present application.

[0049] Based on the same concept, as Figure 8 As shown, the present application further provides a processing equipment 300, which comprises the reaction furnace 200 and the blocking structure 100 in the above embodiments. The reaction furnace 200 has a reaction cavity, and the furnace tail of the reaction furnace 200 has an opening and a cover plate 210 for closing the opening, and the cover plate 210 has an observation window 211. The blocking structure 100 is connected with the cover plate 210, and at least one flow uniformizing assembly 120 of the blocking structure 100 is located in the reaction cavity and is configured to shield or expose the observation window 211.

[0050] In some embodiments, as Figure 7As shown, the reaction furnace 200 further comprises at least one RF electrode feed-in assembly 240, at least one auxiliary heating sleeve 250, at least one heating element, and at least one inner-junction assembly 260. The cover plate 210 further has at least one third through hole, at least one fourth through hole, and at least one fifth through hole. Each RF electrode feed-in assembly 240 extends into the reaction cavity through one third through hole from outside the reaction cavity, and is electrically connected to the graphite boat in the reaction cavity, and is configured to supply power to the graphite boat. Each auxiliary heating sleeve 250 extends into the reaction cavity through one fourth through hole from outside the reaction cavity, and each auxiliary heating sleeve 250 is provided with a heating element (such as an infrared lamp tube) therein, and the heating element is used to heat the reaction cavity. Each inner-junction assembly 260 extends into the reaction cavity through one fifth through hole from outside the reaction cavity, and the inner-junction assembly 260 comprises a thermocouple for measuring the temperature in the reaction cavity.

[0051] In some embodiments, as shown in FIG. 1, the number of observation windows 211 is at least two, the at least two observation windows 211 are symmetrically arranged with respect to the vertical symmetry plane of the cover plate 210, and the number of blocking structures 100 is at least two, each blocking structure 100 is configured to shield or expose one observation window 211. For example, the rotating member 112 of one of the two blocking structures 100 can be rotated in the clockwise direction, and the rotating member 112 of the other of the two blocking structures 100 can be rotated in the counterclockwise direction. Figure 2

[0052] With this structure, it is convenient for the staff to observe the structure in the reaction cavity through the two observation windows 211, such as observing the electrode head of the electrode rod of the RF electrode feed-in assembly 240 and the electrode port of the graphite boat, facilitating the insertion of the electrode head and the electrode port, and facilitating the extension of two hands into the two observation windows 211 respectively to assist in installing the auxiliary heating sleeve 250, the inner-junction sleeve of the inner-junction assembly 260, etc., and arranging one blocking structure 100 for each observation window 211 can more flexibly control each blocking structure 100 to expose the observation window 211 that needs to be used and shield the observation window 211 that does not need to be used.

[0053] The above describes the basic principles of the present application in combination with specific embodiments, but it should be pointed out that the advantages, advantages, effects, etc. mentioned in the present application are only examples and are not limiting, and these advantages, advantages, effects, etc. cannot be considered as the must-have of each embodiment of the present application. In addition, the above specific details are only for the purpose of example and for the purpose of understanding, and are not limiting, and the above details do not limit the present application to the above specific details.

[0054] ​The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0055] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0056] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0057] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A barrier structure, characterized by, The application is applied to a reaction furnace with a reaction cavity, a furnace tail of the reaction furnace has an opening and a cover plate for closing the opening, the cover plate has an observation window, the blocking structure comprises: At least one magnetic fluid assembly, each of the magnetic fluid assemblies comprises a fixed part and a rotating part connected with each other, the rotating part can rotate relative to the fixed part, the fixed part is connected with the cover plate, a first end of each of the magnetic fluid assemblies is located outside the reaction cavity, a second end of each of the magnetic fluid assemblies is located inside the reaction cavity; At least one uniform flow assembly arranged in the reaction cavity, at least one of the uniform flow assemblies is arranged in one-to-one correspondence with at least one of the magnetic fluid assemblies, each of the uniform flow assemblies is connected with the rotating part of the corresponding magnetic fluid assembly, each of the uniform flow assemblies is configured to uniformly flow process gas in the reaction cavity, and each of the uniform flow assemblies can rotate under the driving of the rotating part of the corresponding magnetic fluid assembly to shield or expose the observation window.

2. The barrier structure of claim 1, wherein, Further comprising: At least one reflection assembly arranged in the reaction cavity, at least one of the reflection assemblies is arranged in one-to-one correspondence with at least one of the magnetic fluid assemblies, each of the reflection assemblies is connected with the rotating part of the corresponding magnetic fluid assembly, each of the reflection assemblies is configured to reflect heat of the furnace tail to the middle part of the reaction cavity, and each of the reflection assemblies can rotate under the driving of the rotating part of the corresponding magnetic fluid assembly to shield or expose the observation window.

3. The barrier structure of claim 2, wherein, Further comprising: At least one limiting part arranged in the reaction cavity and connected with the cover plate and configured to limit the rotation angle of at least one of the uniform flow assemblies and / or at least one of the reflection assemblies.

4. The barrier structure of claim 3, wherein, The number of the limiting parts is at least two, each of the magnetic fluid assemblies is arranged in correspondence with two of the limiting parts, for the two of the limiting parts corresponding to one of the magnetic fluid assemblies, one of the two limiting parts is configured to limit the rotation angle of the uniform flow assembly and / or the reflection assembly connected with the one of the magnetic fluid assemblies in the clockwise direction, and the other of the two limiting parts is configured to limit the rotation angle of the uniform flow assembly and / or the reflection assembly connected with the one of the magnetic fluid assemblies in the counterclockwise direction.

5. A barrier structure according to any one of claims 2 to 4, characterised in that, The shape of the cross section of the second end of the magnetic fluid assembly is non-circular; The uniform flow assembly comprises: At least one uniform flow plate, each of the uniform flow plates has a first mounting hole, the shape of the cross section of the first mounting hole is the same as the shape of the cross section of the second end of the magnetic fluid assembly; The reflection assembly comprises: At least one reflection plate, each of the reflection plates has a second mounting hole, the shape of the cross section of the second mounting hole is the same as the shape of the cross section of the second end of the magnetic fluid assembly.

6. The barrier structure of claim 5, wherein, Further comprising: At least one spacer arranged between the uniform flow plates and / or between the uniform flow plates and the reflection plates and / or between the reflection plates.

7. The barrier structure according to any one of claims 1 to 4, characterized in that Further comprising: At least one handle, at least one of the handles is connected with the rotating member of at least one of the magnetic fluid assemblies one by one, and each of the handles is located outside the reaction cavity.

8. The barrier structure according to any one of claims 1 to 4, characterized in that The magnetic fluid assembly is a flange type water-cooled solid shaft magnetic fluid.

9. A processing apparatus characterized by comprising: Comprise: The reaction furnace has a reaction cavity, and the furnace tail of the reaction furnace has an opening and a cover plate for closing the opening, the cover plate has an observation window; The blocking structure of any one of claims 1-8 is connected with the cover plate, and at least one uniform flow assembly of the blocking structure is located in the reaction cavity and is configured to shield or expose the observation window.

10. The processing apparatus of claim 9, wherein, The number of observation windows is at least two, at least two of the observation windows are symmetrically arranged with respect to the vertical symmetry plane of the cover plate, and the number of blocking structures is at least two, and each of the blocking structures is configured to shield or expose one of the observation windows.

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