Anti-interference mechanism for exposure system
By setting up support components and shielding components around the optical platform of the exposure system, the problem of airflow interference with the exposure beam in the operating room was solved, thereby improving the stability and accuracy of the exposure system.
Patent Information
- Application Number
- CN202520238801.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-14
- Publication Date
- 2025-11-25
- Estimated Expiration
- 2035-02-14
AI Technical Summary
The constantly circulating airflow in the operating room interferes with the exposure beam generated by the exposure system, causing the interference fringes to drift and affecting the interference exposure operation of the exposure system.
Supports and shields are arranged around the optical platform of the exposure system. The supports include support columns, support rods and shields. The shields include first and second shields. The surface of the shields is coated with a black paint layer to prevent reflection. Shields are arranged on the top and sides of the supports to block airflow interference.
It effectively blocks the airflow in the operating room from interfering with the exposure beam, avoids the drifting of interference fringes, and ensures the stability and accuracy of the exposure system.
Smart Images
Figure CN223598106U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to exposure technical field, concretely relates to a kind of anti-interference mechanism for exposure system. BACKGROUND
[0002] Semiconductor laser is with semiconductor material as working substance, it is usually by a semiconductor material with positive feedback structure, such as P-N junction, by injecting current in these structures, excitation and amplification photon, finally generates laser output, semiconductor laser working principle schematic diagram as shown in Figure 1
[0003] Semiconductor laser is generally divided into two categories according to the light-emitting direction, edge emitting laser (Edge Emitting Laser, EEL) and vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL). Semiconductor laser has low cost, easy to integrate, and has higher electro-optical conversion efficiency, and at present semiconductor laser has become one of the key light sources with wide application field, such as communication, medical treatment, industrial processing and other fields have been widely used.
[0004] Semiconductor laser is made of tiny semiconductor material, so the volume is small, can be made into small device or integrated in equipment. In addition, semiconductor laser is mostly composed of direct bandgap material, in this material, the energy gap of carrier is very close to the energy gap of photon, so the recombination between electron and hole is more easily, so it has higher photon generation efficiency, which makes semiconductor laser have higher electro-optical conversion efficiency.
[0005] Semiconductor laser belongs to temperature sensitive device. In the process of electro-optical conversion, part of driving current will be converted into heat, resulting in temperature rise, research finds that, whenever temperature changes 1℃, the center wavelength of semiconductor laser will shift 0.1-0.2nm. At the same time, with the temperature rise of semiconductor laser, its threshold current will increase, and output power will drop. This is because the increase of temperature will change the conductivity and pumping efficiency of semiconductor laser material, thereby affecting the working state of semiconductor laser. In addition, too high or too low temperature will shorten the service life of semiconductor laser, affect the stability and reliability of device.
[0006] The traditional method for temperature control of semiconductor laser usually adopts a system composed of thermoelectric cooler and thermistor inside the laser to realize temperature control. As a kind of semiconductor material, the thermoelectric cooler generates a large amount of heat at one end when cooling, which is usually conducted to the metal shell of the laser for heat dissipation. However, this way has low heat dissipation efficiency. For the case of controlling the temperature of the laser far below room temperature, the heat generated by the thermoelectric cooler cannot be dissipated in time, which will lead to the reduction of the cooling efficiency of the thermoelectric cooler, and at the same time, the large amount of heat accumulation will cause the temperature of the laser to be unable to reach the set temperature or have a large error with the set temperature. Therefore, in addition to the temperature control system inside the laser, an environmental temperature control system is often introduced in the operating room to assist in temperature control.
[0007] The environmental temperature control system is mainly composed of water system and air system. The water system controls the air temperature of the air system to realize auxiliary temperature control of the semiconductor laser, and the air system ensures the cleanliness requirement in the operating room. The cold source of the water system often adopts water-cooled chiller, and the heat source usually adopts gas boiler or municipal heating, which is no different from public buildings; the air system usually relies on high frequency air change and multi-stage filter to ensure the cleanliness of the production environment due to the need to purify indoor air to remove pollution particles.
[0008] The air system continuously delivers clean air to the operating room, which has two functions. One is to remove the dirty air in the operating room contaminated by dust, bacteria or other pollutants, and the other is to dilute the contaminated air in the operating room. At the same time, the exhaust system in the operating room can remove the pollutants to the outside. The air system continuously sends clean air into the operating room, and different air outlets in the operating room send clean air to the required position, and through the removal of contaminated air in the operating room, a dynamic balance is achieved to maintain the environment in the operating room at the required environment of the process equipment, and the operating room is in a positive pressure state. According to the principle of osmosis, the air pressure in the operating room is higher than that outside the operating room, so it is difficult for the air outside the operating room to enter the operating room. The positive pressure environment can ensure that the dirty air outside the operating room cannot easily enter the operating room through gaps such as doors, windows and transfer cabinets, and ensure the clean environment in the operating room.
[0009] The airflow pattern in the operating room is divided into three categories according to different airflow directions, namely non-unidirectional flow, unidirectional flow and radial flow, and the unidirectional flow is divided into vertical unidirectional flow and horizontal unidirectional flow.
[0010] The air flow organization form used in the operation room is related to the clean level, and for the operation room with a clean level higher than 1000, the commonly used air flow organization form is unidirectional flow; the unidirectional flow operation room has uniform air flow, and the operation room has high purification capacity and short time required for completing air exchange and purification.
[0011] The operation room with a clean level lower than 1000 generally uses non-unidirectional flow; the non-unidirectional flow means that the air flow is changeable, that is, the air flow organization section is irregular, and the situation from the air outlet to the air return is non-uniform, scattered and non-directional. Due to the uncertainty of the air flow, the air flow collides with each other, and more serious phenomenon is large vortex, lateral flow and collision backflow. The highest level of the operation room is 1000, and the level is generally lower than 1000.
[0012] Radial flow is also called vector flow, and its principle is similar to that of non-unidirectional flow. The vortex phenomenon of the radial flow is less than that of the non-unidirectional flow, and the clean level of the operation room can be improved to 100 under the condition of reducing the equipment ensuring the direction of flow line. Compared with the unidirectional flow operation room, the cost of the radial flow operation room is low, and both can reach 100.
[0013] In summary, in order to meet the corresponding clean level requirement, the operation room needs to keep a high frequency of air exchange, but the continuous circulating air flow in the operation room will interfere with the exposure beam generated by the exposure system in the operation room, so that the interference fringes formed by the exposure beam interference will appear floating, thereby affecting the interference exposure operation of the exposure system. Practical new type content
[0014] In order to overcome the defects of the prior art, the utility model provides an anti-interference mechanism for exposure system.
[0015] The utility model discloses a technical scheme as follows:
[0016] The utility model provides an anti-interference mechanism for exposure system, including support piece and shelter piece, the shelter piece includes first shelter piece and second shelter piece;
[0017] The support piece is arranged around the optical platform where the exposure system is placed;
[0018] The top surface of the support piece is provided with the first shelter piece, and the side surface of the support piece is provided with the second shelter piece.
[0019] Further, the support piece includes a support column, a first support rod and a second support rod, and each of the support column, the first support rod and the second support rod comprises a plurality of support columns, first support rods and second support rods.
[0020] A plurality of support columns are vertically arranged around the optical platform, and the bottom ends of the support columns are in contact with the ground.
[0021] The top ends of adjacent support columns are connected by a first support rod, and the adjacent support columns are connected by a second support rod at the mesa position close to the optical platform.
[0022] Further, the adjacent support columns are connected by the second support rod at the lower mesa position of the optical platform.
[0023] Further, the bottom edge of the first shielding piece is connected to the top surface of the first support rod.
[0024] Further, an exhaust fan is arranged at the central position of the first shielding piece.
[0025] Further, the top end of the second shielding piece is connected to the bottom surface of the first support rod, and the bottom end of the second shielding piece is connected to the top surface of the second support rod.
[0026] Further, the bottom surface of the first support rod is provided with a first sliding rail, and the top surface of the second support rod is provided with a second sliding rail.
[0027] The top end of the second shielding piece is slidably connected to the first sliding rail, and the bottom end of the second shielding piece is slidably connected to the second sliding rail.
[0028] Further, a plurality of second shielding pieces are arranged on each side surface of the support piece.
[0029] The top end of each second shielding piece is slidably connected to the first sliding rail, and the bottom end of each second shielding piece is slidably connected to the second sliding rail.
[0030] Further, the surfaces of the first shielding piece and the second shielding piece are provided with a black paint layer.
[0031] Compared with the prior art, the technical scheme of the utility model has the following beneficial effects:
[0032] The utility model provides a kind of anti-interference mechanism for exposure system, including support piece and shielding piece, shielding piece includes first shielding piece and second shielding piece.Support piece is arranged around the optical platform of exposure system, and the top surface of support piece is provided with first shielding piece, and the side surface of support piece is provided with second shielding piece.By being arranged support piece on the optical platform of exposure system, first shielding piece and second shielding piece are respectively arranged on the top surface and side surface of support piece, and the air flow in operation room is blocked to cause interference to exposure light beam generated by exposure system, to avoid the situation that interference fringe formed by exposure light beam interference floats. BRIEF DESCRIPTION OF DRAWINGS
[0033] In order to more clearly illustrate the technical solutions of the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings described below are only some of the embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor on the basis of these drawings.
[0034] Figure 1 It is a schematic diagram of working principle of semiconductor laser;
[0035] Figure 2 It is a schematic diagram of double-beam exposure system;
[0036] Figure 3 It is a schematic diagram of structure of example support;
[0037] Figure 4 It is a schematic diagram of structure of example support provided with shielding member;
[0038] Figure 5 It is a top view schematic diagram of connection structure of example second sliding rail and second shielding member.
[0039] Wherein, 1-semiconductor laser, 2-first wave plate, 3-beam splitter prism, 4-second wave plate, 5-first mirror, 6-second mirror, 7-third mirror, 8-first microscope objective, 9-second microscope objective, 10-first pinhole, 11-second pinhole, 12-first collimating lens, 13-second collimating lens, 14-supporting column, 15-first supporting rod, 16-second supporting rod, 17-first shielding member, 18-second shielding member, 19-exhaust fan, 20-second sliding rail, 21-second sliding track. DETAILED DESCRIPTION
[0040] The technical solutions of the present application will be described clearly and completely below by combining the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative labor are within the protection scope of the present application.
[0041] In the present description, the terms "first", "second", and other similar words are not intended to imply any order, number, and importance, but are merely used to distinguish different elements. In the present description, the terms "one", "a", and other similar words are not intended to mean that there is only one of the mentioned things, but that the description is only directed to one of the mentioned things, which can have one or more. In the present description, the terms "include", "comprise", and other similar words are intended to mean logical relationships, and cannot be regarded as indicating spatial structural relationships. For example, "A includes B" is intended to mean that B logically belongs to A, and does not mean that B is located inside A in space. In addition, the meaning of the terms "include", "comprise", and other similar words should be regarded as open, rather than closed. For example, "A includes B" is intended to mean that B belongs to A, but B does not necessarily constitute all of A, and A can also include C, D, E, and other elements.
[0042] In the present description, the terms "embodiment", "the present embodiment", "preferred embodiment", "one embodiment" do not mean that the description is only applicable to one specific embodiment, but also means that the description can also be applicable to another one or more embodiments. Those skilled in the art should understand that any description made in the present description for a certain embodiment can be replaced, combined, or otherwise combined with the description in another one or more embodiments, and the new embodiments generated by the replacement, combination, or other combination are easily thought by those skilled in the art and belong to the protection scope of the present application.
[0043] In the present description, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise explicitly and specifically limited.
[0044] The holographic grating is made by forming periodic grooves on the base material through exposure, development, etching, and other processes.
[0045] Among them, the exposure operation is completed by an exposure system, and the commonly used exposure systems include a double-beam exposure system and a Lloyd mirror exposure system. For example, Figure 2As shown, it is a structural schematic diagram of an existing double-beam exposure system, the incident light beam emitted by the semiconductor laser 1 enters the first wave plate 2, the polarization state is adjusted by the first wave plate, and then enters the beam splitter prism 3, the beam splitter prism 3 divides the light beam into two beams, the first light beam is reflected by the third mirror 7 and enters the first microscope objective 8, is focused by the first microscope objective 8, enters the first pinhole 10, is filtered by the first pinhole 10, enters the first collimating lens 12, and becomes a first parallel light beam after collimation by the first collimating lens 12; the second light beam passes through the second wave plate 4 to adjust the polarization state, and then enters the second microscope objective 9 through the first mirror 5 and the second mirror 6 in sequence, is focused by the second microscope objective 9, enters the second pinhole 11, is filtered by the second pinhole 11, and becomes a second parallel light beam after collimation by the second collimating lens 13; the first parallel light beam and the second parallel light beam interfere on the surface of the substrate (exposed sample) provided with a photoresist mask to form an exposure field. Wherein, the direction along the grating vector is taken as the x direction, the direction along the grating line is taken as the y direction, and the direction along the normal line of the substrate is taken as the z direction.
[0046] The above exposure operation needs to be carried out in an operation room with corresponding cleanliness requirements. An optical platform is arranged in the operation room, and the exposure system is arranged on the optical platform to perform the exposure operation.
[0047] The semiconductor laser is a temperature-sensitive device, and the semiconductor laser needs to be temperature-controlled. The existing operation is to introduce an environmental temperature control system into the operation room to assist in temperature control on the basis of arranging a temperature control system in the laser. The environmental temperature control system mainly consists of a water system and an air system, and the water system controls the air temperature of the air system to achieve auxiliary temperature control of the semiconductor laser, and the air system ensures the cleanliness requirement in the operation room.
[0048] In order to meet the corresponding cleanliness requirement, the operation room needs to maintain a high frequency of air exchange, and the continuous circulation of air flow in the operation room will interfere with the exposure beam generated by the exposure system, so that the interference fringes formed by the exposure beam will appear to be floating, thereby affecting the interference exposure operation of the exposure system.
[0049] In order to solve the above problems, the utility model provides an anti-interference mechanism for exposure system, the anti-interference mechanism for exposure system includes support and shelter piece, shelter piece includes first shelter piece and second shelter piece.
[0050] The support is arranged around the optical platform in the operation room, and the optical platform is used for arranging the exposure system. Here, the exposure system can be a double-beam exposure system or a Lloyd mirror exposure system.
[0051] As shown in the example, Figure 3 As shown, the support includes a support column 14, a first support rod 15 and a second support rod 16.
[0052] The support columns 14, the first support rods 15 and the second support rods 16 are respectively adopted by a plurality of.
[0053] The plurality of support columns 14 are vertically arranged around the optical platform, the bottom ends of the support columns 14 are in contact with the ground, the top ends of adjacent support columns 14 are connected by the first support rods 15, and adjacent support columns 14 are connected by the second support rods 16 at the position of the table surface close to the optical platform.
[0054] More specifically, as shown in Figure 3 For example, the support member is adopted by four support columns, four first support rods and four second support rods.
[0055] The four support columns are vertically arranged around the optical platform, the bottom ends of the four support columns are respectively in contact with the ground, the top ends of adjacent support columns are connected by the first support rods to realize that the top ends of the four support columns are connected by the four first support rods, and adjacent support columns are connected by the second support rods at the position of the lower table surface of the optical platform to realize that the four support columns are connected by the four second support rods at the position of the lower table surface of the optical platform.
[0056] The top surface of the support member is provided with a first shielding member, and the side surface of the support member is provided with a second shielding member.
[0057] For example, the support member includes a plurality of support columns, first support rods and second support rods, the plurality of support columns are vertically arranged around the optical platform, the bottom ends of the support columns are in contact with the ground, the top ends of adjacent support columns are connected by the first support rods, and adjacent support columns are connected by the second support rods at the position of the table surface close to the optical platform, as shown in Figure 4 The bottom edge of the first shielding member 17 is connected with the top surface of the first support rod 15, the top end of the second shielding member 18 is connected with the bottom surface of the first support rod 15, and the bottom end of the second shielding member 18 is connected with the top surface of the second support rod 16. For example, the bottom edge of the first shielding member is provided with a first fixing hole, the top surface of the first support rod is provided with a second fixing hole, the connection between the bottom edge of the first shielding member and the top surface of the first support rod is realized through the first fixing hole and the second fixing hole. The top surface of the second shielding member is provided with a third fixing hole, the bottom surface of the first support rod is provided with a fourth fixing hole, the connection between the top end of the second shielding member and the bottom surface of the first support rod is realized through the third fixing hole and the fourth fixing hole, the bottom end of the second shielding member is provided with a fifth fixing hole, the top surface of the second support rod is provided with a sixth fixing hole, and the connection between the bottom end of the second shielding member and the top surface of the second support rod is realized through the fifth fixing hole and the sixth fixing hole.
[0058] For example, the first shielding member can be adopted by a first baffle, the second shielding member can be adopted by a second baffle, and the materials of the first baffle and the second baffle can be adopted by acrylic material or metal material.
[0059] In order to prevent the first and second shielding members from reflecting the stray light emitted by the laser multiple times to affect the interference operation of the exposure light beam generated by the exposure system, a black paint layer is arranged on the surface of the first and second shielding members.
[0060] The utility model discloses a support is arranged on the optical platform of placing exposure system, and the top surface and the side of support are arranged shielding member respectively, and the air flow in the operation room is blocked to the exposure light beam generated by the exposure system to cause the interference, thereby avoiding the interference fringe of exposure light beam interference to appear the condition of floating.
[0061] In order to prevent the contamination particles above the optical platform from affecting the interference exposure operation of the exposure system, as a preferred embodiment, as shown in Figure 4 The center position of the first shielding member 17 is provided with an exhaust fan 19, and the contamination particles above the optical platform are removed by the exhaust fan.
[0062] In order to facilitate the manual adjustment of the exposure system on the optical platform in the second shielding member, the above-mentioned support includes a plurality of support columns, a first support rod and a second support rod, a plurality of support columns are vertically arranged around the optical platform, the bottom end of the support column is in contact with the ground, the top end of the adjacent support column is connected by the first support rod, and the adjacent support column is connected by the second support rod at the table position close to the optical platform, as a preferred embodiment, the bottom surface of the first support rod is provided with a first sliding rail, the top surface of the second support rod is provided with a second sliding rail, the top end of the second shielding member is slidably connected with the first sliding rail, and the bottom end of the second shielding member is slidably connected with the second sliding rail.
[0063] Each side of the support preferably sets up a plurality of second shielding members, and the top end of each second shielding member is slidably connected with the first sliding rail, and the bottom end of each second shielding member is slidably connected with the second sliding rail.
[0064] Further preferably, the first sliding rail is composed of a plurality of first sliding tracks, and the second sliding rail is composed of a plurality of second sliding tracks. For the plurality of second shielding members arranged on each side of the support, the top end of each second shielding member is connected with the first sliding track, and the bottom end of each second shielding member is connected with the second sliding track. At least one second shielding member is arranged on each first sliding track, and at least one second shielding member is arranged on each second sliding track.
[0065] Exemplarily, Figure 5 As shown in the connection structure of the second sliding rail and the second shielding member, Figure 5The second sliding rail 20 is composed of three layers of second sliding tracks 21, and the second shielding members 18 are connected to each layer of the second sliding tracks 21.
[0066] The above embodiments are only used to illustrate the technical solutions of the present application and not to limit it, and although the present application has been described in detail with reference to the above embodiments, the ordinary skilled in the art can still modify or equivalently replace the specific embodiments of the present application, and any modification or equivalent replacement without departing from the spirit and scope of the present application is within the protection scope of the claims of the present application.
Claims
1. An anti-jamming mechanism for an exposure system, characterized by, The support and the shielding member, the shielding member includes a first shielding member and a second shielding member; The support is arranged around an optical platform of an exposure system; The top surface of the support is provided with the first shielding member, and the side surface of the support is provided with the second shielding member.
2. The anti-jamming mechanism for an exposure system of claim 1, wherein, The support includes support columns, first support rods and second support rods; the support columns, the first support rods and the second support rods are respectively provided with a plurality of The plurality of support columns are vertically arranged around the optical platform, and the bottom ends of the support columns are in contact with the ground. The top ends of adjacent support columns are connected by the first support rods, and the adjacent support columns are connected by the second support rods at the mesa positions close to the optical platform.
3. The anti-jamming mechanism for an exposure system of claim 2, wherein, The adjacent support columns are connected by the second support rods at the mesa positions below the optical platform.
4. The anti-jamming mechanism for an exposure system of claim 2, wherein, The bottom surface edge of the first shielding member is connected with the top surface of the first support rod.
5. The anti-jamming mechanism for an exposure system of claim 1, wherein, An exhaust fan is arranged at the central position of the first shielding member.
6. The anti-interference mechanism for an exposure system according to claim 2, wherein The top end of the second shielding member is connected with the bottom surface of the first support rod, and the bottom end of the second shielding member is connected with the top surface of the second support rod.
7. The anti-interference mechanism for an exposure system according to claim 6, wherein The bottom surface of the first support rod is provided with a first sliding rail, and the top surface of the second support rod is provided with a second sliding rail; The top end of the second shielding member is slidably connected with the first sliding rail, and the bottom end of the second shielding member is slidably connected with the second sliding rail.
8. The anti-jamming mechanism for an exposure system of claim 7, wherein, The support is provided with a plurality of second shielding members at each side surface; The top end of each second shielding member is slidably connected with the first sliding rail, and the bottom end of each second shielding member is slidably connected with the second sliding rail.
9. The anti-jamming mechanism for an exposure system of claim 1, wherein, The surfaces of the first shielding member and the second shielding member are provided with a black paint layer.