Automatic photoresist recovery system

Abstract

The utility model provides an automatic photoresist recovery system which comprises a container used for receiving and storing photoresist from a first nitrogen pipeline; the photoresist storage middle box is used for receiving the photoresist from the container and is provided with a first discharge pipe for discharging the photoresist from the photoresist storage middle box; the filter is used for receiving the photoresist from the photoresist storage intermediate box and is provided with a second discharge pipe for discharging the photoresist from the filter; the photoresist recovery tank is used for receiving the photoresist of the photoresist storage intermediate box and / or the filter; the second nitrogen pipeline is connected with the photoresist recovery tank; a first port of the first three-way valve is connected with the first discharge pipe, and a second port of the first three-way valve is connected with the second discharge pipe; a first port of the second three-way valve is connected with the sixth discharge pipe, a second port of the second three-way valve is connected with the photoresist recovery tank, and a third port of the second three-way valve is connected with a third port of the first three-way valve. According to the utility model, the discharged photoresist can be recycled, the utilization rate of the photoresist is improved, and meanwhile, the production cost can be reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the photoresist recycling field, more particularly to a photoresist automatic recycling system in semiconductor process. BACKGROUND

[0002] Photoresist is a photosensitive substance with specific molecular structure, which changes under the action of incident light, and is a very important material in semiconductor manufacturing process. Generally, semiconductor manufacturing process usually includes multiple processes, wherein the layout of semiconductor external objects such as wafers needs to use photoresist and perform controlled exposure on the photoresist. Since most of the photoresist is in liquid state, the photoresist needs to be pushed from a storage photoresist container to a nozzle for coating on the wafer, and in the middle, the machine table is used to periodically remove bubbles in the photoresist and remove impurities in the photoresist by using a photoresist filter.

[0003] Figure 1 A conventional supply system for supplying photoresist in a semiconductor manufacturing process is shown. The system includes a container 2 for storing photoresist, which has a nitrogen gas inlet valve 1 and a first solenoid valve 3 (photoresist discharge valve); a photoresist storage intermediate tank 4, which has a sensor for detecting whether photoresist exists in the photoresist storage intermediate tank 4 (intermediate tank) and a second solenoid valve 5 for removing bubbles in the photoresist from the photoresist storage intermediate tank 4 and a first discharge pipe 6; a photoresist filter 8 for removing particulate impurities in the photoresist, which has a third solenoid valve 7 before the photoresist enters the filter, a second discharge pipe 10 for removing photoresist with bubbles and a fourth solenoid valve 9; a photoresist storage tank 11, which has a third discharge pipe 13 for removing photoresist with bubbles and a fifth solenoid valve 12; a pump 14 for pumping photoresist from the photoresist storage tank 11, which has an eighth solenoid valve 20 before the photoresist enters the pump, a pump pressure control solenoid valve 21, a fourth discharge pipe 16 for removing photoresist with bubbles and a sixth solenoid valve 15, a photoresist flow meter 17 for recording the flow at the time; a seventh solenoid valve 18 for controlling the output flow of the photoresist; and a nozzle 19 for uniformly coating the photoresist on the wafer.

[0004] In the above system, when the new photoresist is introduced, nitrogen (N2) is introduced into the container 2 storing the photoresist via the nitrogen inlet valve 1 to push the photoresist into the photoresist storage intermediate tank 4. 200ml of photoresist is discharged from the discharge pipe 6 of the photoresist storage intermediate tank 4, which can remove the bubbles in the photoresist. If the bubbles remain in the photoresist, coating defects will be generated on the semiconductor wafer. The discharged photoresist is usually directly discharged to the factory for disposal. Similarly, after the photoresist is pressed from the photoresist storage intermediate tank 4 to the photoresist filter 8, 200ml of photoresist is discharged from the second discharge pipe 10 of the photoresist filter 8 to the fifth discharge pipe 22. Similarly, after the photoresist is pressed from the photoresist filter 8 to the photoresist storage tank 11, 500ml of photoresist is discharged from the discharge pipe 13 of the photoresist storage tank 11. Similarly, after the photoresist is pumped from the photoresist storage tank 11 to the nozzle 19 by the pump 14, 500ml of photoresist is discharged from the fourth discharge pipe 16 (photoresist discharge pipe) to the photoresist storage tank 11, and the photoresist is discharged from the third discharge pipe 13 of the photoresist storage tank 11 to the fifth discharge pipe 22. Similarly, during the regular coating, regular replacement of the photoresist filter 8 and the photoresist bubble removal process, 300-500ml of photoresist is washed away from the entire photoresist supply system. During normal production every day, the photoresist filter 8 and the photoresist storage tank 11 are at least 200ml of photoresist due to the prevention of photoresist crystallization and bubbles, which are discharged due to regular maintenance. The above three cases inevitably waste photoresist, and in large-scale production, the wasted photoresist can cause serious capital loss and increase production costs.

[0005] Therefore, the photoresist automatic recycling system is provided. SUMMARY

[0006] The photoresist automatic recycling system of the present application overcomes the difficulties of the prior art, can recycle the discharged photoresist, improve the utilization rate of photoresist, and reduce the production cost

[0007] The embodiment of the present application provides a photoresist automatic recycling system, which comprises:

[0008] A container is used for receiving and storing photoresist from a first nitrogen pipe;

[0009] A photoresist storage intermediate tank is used for receiving photoresist from the container and has a first discharge pipe for discharging photoresist from the photoresist storage intermediate tank;

[0010] A filter is used for receiving photoresist from the photoresist storage intermediate tank and has a second discharge pipe for discharging photoresist from the filter;

[0011] A photoresist recycling tank is used for receiving photoresist from the photoresist storage intermediate tank and / or the filter;

[0012] a second nitrogen pipeline connected to the photoresist recovery tank;

[0013] a first three-way valve, a first port of the first three-way valve connected to the first discharge pipeline, a second port connected to the second discharge pipeline; and

[0014] a second three-way valve, a first port of the second three-way valve connected to the sixth discharge pipeline, a second port connected to the photoresist recovery tank, and a third port connected to the third port of the first three-way valve.

[0015] Preferably, further comprising a return pipeline connecting the photoresist storage intermediate tank to the photoresist recovery tank, one end of the return pipeline inserted into the upper portion of the photoresist recovery tank, and the other end inserted into the bottom portion of the photoresist recovery tank, the return pipeline provided with a twelfth electromagnetic valve.

[0016] Preferably, the second nitrogen pipeline is provided with a second nitrogen inlet valve;

[0017] the pipeline connecting the second port of the second three-way valve to the photoresist recovery tank is provided with an eleventh electromagnetic valve;

[0018] the sixth discharge pipeline is provided with a tenth electromagnetic valve.

[0019] Preferably, the first nitrogen pipeline is provided with a first nitrogen inlet valve;

[0020] the pipeline connecting the container to the photoresist storage intermediate tank is provided with a first electromagnetic valve

[0021] the first discharge pipeline is provided with a second electromagnetic valve;

[0022] the pipeline connecting the photoresist storage intermediate tank to the filter is provided with a third electromagnetic valve;

[0023] the second discharge pipeline is provided with a fourth electromagnetic valve.

[0024] Preferably, further comprising a photoresist storage tank for receiving the photoresist of the filter, the photoresist storage tank provided with a third discharge pipeline with a fifth electromagnetic valve, the second discharge pipeline and the third discharge pipeline merged into a fifth discharge pipeline, and the fifth discharge pipeline connected to the second port of the first three-way valve.

[0025] Preferably, further comprising a nozzle;

[0026] a pump connected between the photoresist storage tank and the nozzle, and configured to draw the photoresist in the photoresist storage tank to the nozzle.

[0027] Preferably, further comprising a photoresist flow meter, a first end of the photoresist flow meter connected to the pump through a ninth electromagnetic valve;

[0028] A seventh solenoid valve, a first end of the seventh solenoid valve is connected with a second end of the photoresist flow meter, and a second end of the seventh solenoid valve is connected with the nozzle.

[0029] Preferably, further comprising: a fourth discharge pipe connected between the pump and the photoresist storage tank, and the fourth discharge pipe is provided with a sixth solenoid valve.

[0030] Preferably, further comprising: an eighth solenoid valve arranged in a pipeline between the photoresist storage tank and the pump.

[0031] Preferably, further comprising: a pressure solenoid valve connected with the pump.

[0032] The photoresist automatic recycling system of the utility model can recycle and utilize the discharged photoresist, improve the utilization rate of photoresist, and reduce production cost. BRIEF DESCRIPTION OF DRAWINGS

[0033] Other features, objects and advantages of the utility model will become more apparent through reading the detailed description of the non-restrictive embodiments with reference to the following drawings.

[0034] Figure 1 It is a schematic view of a photoresist automatic recycling system of prior art.

[0035] Figure 2 It is a schematic view of a photoresist automatic recycling system of the utility model.

[0036] REFERENCE NUMERALS

[0037] 1 first nitrogen inlet valve

[0038] 2 container

[0039] 3 first solenoid valve

[0040] 4 photoresist storage intermediate tank

[0041] 5 second solenoid valve

[0042] 6 first discharge pipe

[0043] 7 third solenoid valve

[0044] 8 filter

[0045] 9 fourth solenoid valve

[0046] 10 second discharge pipe

[0047] 11 photoresist storage tank

[0048] 12 fifth solenoid valve

[0049] 13 third discharge pipe

[0050] 14 pump

[0051] 15 sixth solenoid valve

[0052] 16 fourth discharge pipe

[0053] 17 light resistance flow meter

[0054] 18 seventh solenoid valve

[0055] 19 nozzle

[0056] 20 eighth solenoid valve

[0057] 21 pressure solenoid valve

[0058] 22 fifth discharge pipe

[0059] 23 ninth solenoid valve

[0060] 31 tenth solenoid valve

[0061] 32 eleventh solenoid valve

[0062] 33 second nitrogen inlet valve

[0063] 34 twelfth solenoid valve

[0064] 35 light resistance recovery tank

[0065] 36 first three-way valve

[0066] 37 second three-way valve

[0067] 38 first nitrogen pipe

[0068] 39 second nitrogen pipe

[0069] 40 sixth discharge pipe

[0070] 41 return pipe

[0071] 42 first liquid level sensor

[0072] 43 second liquid level sensor DETAILED DESCRIPTION

[0073] The present application is herein described, by way of example only, with the

[0074] The embodiments of the present application will be described in detail with reference to the drawings, so as to be easily carried out by a person skilled in the art to which the present application pertains. The present application can be embodied in various ways, and is not limited to the embodiments described herein.

[0075] In the present application, the expressions of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" mean that the specific features, structures, materials or characteristics represented in connection with the embodiment or example are included in at least one embodiment or example of the present application. Also, the specific features, structures, materials or characteristics represented can be combined in an appropriate manner in any one or more embodiments or examples. In addition, the person skilled in the art can combine and combine the different embodiments or examples represented in the present application and the features of the different embodiments or examples, without contradiction.

[0076] In addition, the terms "first", "second" are used only for the purpose of representation, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, the features limited with "first", "second" can explicitly or implicitly include at least one of the features. In the present application, the meaning of "a plurality of" is two or more, unless otherwise specifically limited.

[0077] In order to clearly explain the present application, the devices irrelevant to the description are omitted, and the same reference numerals are given to the same or similar constituent elements throughout the specification.

[0078] In the entire specification, when it is said that a device is "connected" to another device, it includes not only the case of "directly connected", but also the case of "indirectly connected" in which other elements are interposed therebetween. In addition, when it is said that a device "includes" a certain constituent element, unless otherwise specifically stated, other constituent elements are not excluded, but it means that other constituent elements can also be included.

[0079] When it is said that a device is "on" another device, it can be directly on the other device, but can also be accompanied by other devices therebetween. When it is said that a device is "directly" on another device, there is no other device therebetween.

[0080] Although the terms first, second, etc. can be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first interface and a second interface, etc. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises", "comprising", "includes" and / or "including", when used herein, specify the presence of stated features, steps, operations, elements, components, items, and / or groups but do not preclude the presence or addition of one or more other features, steps, operations, elements, components, items, and / or groups thereof. As used herein, the terms "or" and "and / or" are construed to be inclusive, or mean either one or any combination thereof. Thus, "A, B or C" or "A, B and / or C" means any of the following: A; B; C; A and B; A and C; B and C; A, B and C. This definition applies regardless of the lack of any occurring a, an, and / or the.

[0081] The professional terms used herein are only used to refer to specific embodiments and are not intended to limit the present application. The singular form used herein, unless the context clearly indicates otherwise, also includes the plural form. The meaning of "comprising" used in the specification is to specify the particular characteristics, regions, integers, steps, operations, elements and / or components, and not to exclude the presence or addition of other characteristics, regions, integers, steps, operations, elements and / or components.

[0082] Although not differently defined, all terms used herein including technical and scientific terms have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. Terms defined in commonly used dictionaries are to be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and should not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0083] Figure 2 is a schematic diagram of the photoresist automatic recycling system of the present application. As Figure 2As shown, the photoresist automatic recycling system comprises a container 2, a photoresist storage intermediate tank 4, a filter 8, a photoresist recycling tank 35, a second nitrogen pipeline 39, a first three-way valve 36 and a second three-way valve 37. The container 2 is used for receiving and storing photoresist from the first nitrogen pipeline 38. The photoresist storage intermediate tank 4 is used for receiving photoresist from the container 2 and has a first discharge pipe 6 connected to the photoresist storage intermediate tank 4. The filter 8 is used for receiving photoresist from the photoresist storage intermediate tank 4 and has a second discharge pipe 10 connected to the filter. The photoresist recycling tank 35 is used for receiving photoresist from the photoresist storage intermediate tank 4 and / or the filter 8. The second nitrogen pipeline 39 is connected to the photoresist recycling tank 35. The first port of the first three-way valve 36 is connected to the first discharge pipe 6, and the second port is connected to the second discharge pipe 10. The first port of the second three-way valve 37 is connected to the sixth discharge pipe 40, the second port is connected to the photoresist recycling tank 35, and the third port is connected to the third port of the first three-way valve 36. The automatic photoresist recycling system provided by the present application recycles the discharged photoresist, improves the utilization rate of photoresist, and reduces production costs

[0084] In a preferred embodiment, it further comprises a backflow pipeline 41 connecting the photoresist storage intermediate tank 4 to the photoresist recycling tank 35. One end of the backflow pipeline 41 is inserted into the upper part of the photoresist recycling tank 35, and the other end is inserted into the bottom of the photoresist recycling tank 35. The backflow pipeline 41 is provided with a twelfth electromagnetic valve 34, but is not limited thereto.

[0085] In a preferred embodiment, the second nitrogen pipeline 39 is provided with a second nitrogen inlet valve 33. The pipeline connecting the second port of the second three-way valve 37 to the photoresist recycling tank 35 is provided with an eleventh electromagnetic valve 32. The sixth discharge pipe 40 is provided with a tenth electromagnetic valve 31, but is not limited thereto.

[0086] In a preferred embodiment, the first nitrogen pipeline 38 is provided with a first nitrogen inlet valve 1. The pipeline connecting the container 2 to the photoresist storage intermediate tank 4 is provided with a first electromagnetic valve 3. The first discharge pipe 6 is provided with a second electromagnetic valve 5. The pipeline connecting the photoresist storage intermediate tank 4 to the filter 8 is provided with a third electromagnetic valve 7. The second discharge pipe 10 is provided with a fourth electromagnetic valve 9, but is not limited thereto.

[0087] In a preferred embodiment, it further comprises a photoresist storage tank 11 for receiving photoresist from the filter 8. The photoresist storage tank 11 is provided with a third discharge pipe 13 connected to a fifth electromagnetic valve 12. The second discharge pipe 10 and the third discharge pipe 13 converge into a fifth discharge pipe 22, and the fifth discharge pipe 22 is connected to the second port of the first three-way valve 36, but is not limited thereto.

[0088] In a preferred embodiment, it further comprises a nozzle 19. In a preferred embodiment, it further comprises a nozzle 19.

[0089] A pump 14 is connected between the photoresist storage tank 11 and the nozzle 19, and draws the photoresist in the photoresist storage tank 11 to the nozzle 19, but not limited to.

[0090] In a preferred embodiment, further comprising: a photoresist flow meter 17, the first end of the photoresist flow meter 17 is connected to the pump 14 through a ninth electromagnetic valve 23.

[0091] A seventh electromagnetic valve 18, the first end of the seventh electromagnetic valve 18 is connected to the second end of the photoresist flow meter 17, and the second end of the seventh electromagnetic valve 18 is connected to the nozzle 19, but not limited to.

[0092] In a preferred embodiment, further comprising: a fourth drain pipe 16 connected between the pump 14 and the photoresist storage tank 11, and the fourth drain pipe 16 is provided with a sixth electromagnetic valve 15, but not limited to.

[0093] In a preferred embodiment, further comprising: an eighth electromagnetic valve 20 arranged in the pipeline between the photoresist storage tank 11 and the pump 14, but not limited to.

[0094] In a preferred embodiment, further comprising: a pressure electromagnetic valve 21 connected to the pump 14, but not limited to.

[0095] The utility model discloses a photoresist storage middle box 4, filter 8, the drain pipe of photoresist storage tank 11 is connected to the recovery pipe, and two electromagnetic valves are added on the recovery pipeline, and the tenth electromagnetic valve 31 (electromagnetic valve A) of recovery pipe opens, and the eleventh electromagnetic valve 32 (electromagnetic valve B) of recovery pipe closes, can make to directly drain to the factory when using the cleaning agent to clean the pipeline, and the tenth electromagnetic valve 31 (electromagnetic valve A) of recovery pipe closes, and the eleventh electromagnetic valve 32 (electromagnetic valve B) of recovery pipe opens, and can make photoresist recovery when not using the cleaning agent to clean the pipeline.

[0096] The specific implementation manner of the utility model is as follows:

[0097] As Figure 2The automatic photoresist recycling system shown comprises: a container 2 for storing photoresist, which has a first nitrogen inlet valve 1 and a first electromagnetic valve 3 (photoresist discharge valve); a photoresist storage intermediate tank 4, which has a sensor for detecting whether photoresist exists in the photoresist storage intermediate tank 4 and an electromagnetic valve 5 and a discharge pipe 6 for discharging air bubbles from the intermediate tank 4; a photoresist filter 8 for removing particulate impurities of photoresist, which has a third electromagnetic valve 7 before photoresist enters the filter, a second discharge pipe 10 and a fourth electromagnetic valve 9 for discharging photoresist with air bubbles; a photoresist storage tank 11, which has a third discharge pipe 13 and a fifth electromagnetic valve 12 for discharging photoresist with air bubbles; a pump 14 for pumping photoresist from the photoresist storage tank 11, which has an electromagnetic valve 20 before photoresist enters the pump, a pump pressure electromagnetic valve 21, a fourth discharge pipe 16 and a sixth electromagnetic valve 15 for discharging photoresist with air bubbles, a photoresist flow meter 17 for recording the flow at the time; a seventh electromagnetic valve 18 for controlling the output flow of photoresist; a nozzle 19 for uniformly coating photoresist on a wafer; the first discharge pipe 6 and the fifth discharge pipe 22 are connected to a recycling pipe through a first three-way valve 36, the recycling pipe is connected to a second three-way valve 37, one way of which is connected to the sixth discharge pipe 40 through a tenth electromagnetic valve 31 (electromagnetic valve A), and the other way is connected to a photoresist recycling tank 35 through an eleventh electromagnetic valve 32 (electromagnetic valve B); the photoresist recycling tank 35 is provided with a first liquid level sensor 42, a second liquid level sensor 43, a N2 pipe and a second nitrogen inlet valve 33 (electromagnetic valve C); the photoresist recycling tank 35 is further provided with a backflow pipe 41 to the photoresist storage intermediate tank 4, and the backflow pipe 41 is provided with a twelfth electromagnetic valve 34 (electromagnetic valve D). In a variant, the photoresist recycling system electromagnetic valves and liquid level sensor control can be added to the machine software through program design to realize the photoresist recycling action.

[0098] The working principle of the photoresist recycling system of the utility model is as follows:

[0099] During normal operation, the tenth solenoid valve 31 (sole valve A) is closed, and the eleventh solenoid valve 32 (sole valve B) is open. Nitrogen (N2) from the first nitrogen pipeline 38 is injected into the photoresist storage container 2 via the first nitrogen inlet valve 1. The first solenoid valve 3 is opened, pushing the photoresist through the conduit into the photoresist storage intermediate tank 4. The third solenoid valve 7 is opened, drawing the photoresist from the photoresist storage intermediate tank 4 to the filter 8 and then to the photoresist storage tank 11. The eighth solenoid valve 20 is opened, drawing the photoresist from the photoresist storage tank 11 to the pump 14. The ninth solenoid valve 23 is opened, drawing the photoresist from the pump 14 to the nozzle 19 for spraying. Photoresist containing air bubbles is discharged from the photoresist storage intermediate tank 4, the filter 8, and the photoresist storage tank 11 through the discharge pipes and the fifth discharge pipe 22, and then introduced into the photoresist recovery tank 35 through a three-way valve. When the first level sensor 42 of the photoresist recovery tank 35 illuminates, the second nitrogen inlet valve 33 (solenoid valve C) and the twelfth solenoid valve (solenoid valve D) open, while the eleventh solenoid valve 32 (solenoid valve B) closes. The nitrogen (N2) from the second nitrogen pipeline 39 then pressurizes the photoresist in the photoresist recovery tank 35 into the photoresist storage intermediate box 4 for normal use. When the photoresist level in the photoresist recovery tank 35 drops to the level indicated by the sensor L, the second nitrogen inlet valve 33 (solenoid valve C) and the twelfth solenoid valve (solenoid valve D) automatically close, while the eleventh solenoid valve 32 (solenoid valve B) opens. Automatic recovery control is achieved by controlling the solenoid valves and the level sensor. The core control logic is as follows: when the first liquid level sensor 42 is lit, the second nitrogen inlet valve 33 (solenoid valve C) and the twelfth solenoid valve (solenoid valve D) automatically open, and the eleventh solenoid valve 32 (solenoid valve B) closes. When the second liquid level sensor 43 is lit, the second nitrogen inlet valve 33 (solenoid valve C) and the twelfth solenoid valve (solenoid valve D) automatically close, and the eleventh solenoid valve 32 (solenoid valve B) opens.

[0100] During normal pipeline cleaning with detergent, the eleventh solenoid valve 32 (sole valve B) is closed, and the tenth solenoid valve 31 (sole valve A) is open. Nitrogen (N2) is injected into the photoresist storage container 2 via the first nitrogen inlet valve 1. Detergent is pushed through the conduit into the photoresist storage intermediate tank 4 via the solenoid valve 3. The third solenoid valve 7 is opened, and detergent is drawn from the photoresist storage intermediate tank 4 to the filter 8 and then to the photoresist storage tank 11. The eighth solenoid valve 20 is opened, and detergent is drawn from the photoresist storage tank 11 to the pump 14. The ninth solenoid valve 23 is opened, and detergent is drawn from the pump 14 to the nozzle 19 for pipeline cleaning. Part of the detergent is discharged from the discharge pipes 6 and 22 of the photoresist storage intermediate tank 4, filter 8, and photoresist storage tank 11 through the three-way valve. Since the eleventh solenoid valve 32 (sole valve B) is closed and the tenth solenoid valve 31 (sole valve A) is open, detergent is discharged directly from the tenth solenoid valve 31 (sole valve A) to the sixth discharge pipe 40. When cleaning the recovery optical path with detergent, the tenth solenoid valve 31 (soleoid valve A) is closed, and the eleventh solenoid valve 32 (soleoid valve B) / the twelfth solenoid valve (soleoid valve D) is opened, so as to clean the recovery pipeline and the photoresist recovery tank 35.

[0101] The utility model discloses a light resistance automatic recovery system, including the light resistance recovery tank, the light resistance storage intermediate tank, the light resistance recovery tank is connected with the light resistance storage intermediate tank, the light resistance recovery tank is added with two liquid level sensors and one second nitrogen pipeline 39, and one second nitrogen inlet valve 33 (solenoid valve C) is added on N2 pipeline, and one pipeline is added between the light resistance recovery tank and the light resistance storage intermediate tank, and the pipeline is put into the light resistance storage intermediate tank, and one twelfth solenoid valve (solenoid valve D) is additionally installed, when the liquid surface of the recovered light resistance reaches the position of the first liquid level sensor 42, the solenoid valve of N2 pipeline opens, the solenoid valve of the recovery pipe 2 closes, the solenoid valve of the pipeline between the light resistance recovery tank and the light resistance storage intermediate tank opens, and the light resistance is automatically transferred from the light resistance recovery tank to the light resistance storage intermediate tank until the liquid surface of the light resistance drops to the position of the second liquid level sensor 43, the solenoid valve between the light resistance recovery tank and the light resistance storage intermediate tank closes, the solenoid valve of the second nitrogen pipeline 39 closes, and the solenoid valve of the recovery pipe opens and continues to recover the light resistance.

[0102] The utility model discloses a light resistance automatic recovery system, including the light resistance recovery tank, the light resistance storage intermediate tank, the light resistance recovery tank is connected with the light resistance storage intermediate tank, the light resistance recovery tank is added with two liquid level sensors and one second nitrogen pipeline 39, and one second nitrogen inlet valve 33 (solenoid valve C) is added on N2 pipeline, and one pipeline is added between the light resistance recovery tank and the light resistance storage intermediate tank, and the pipeline is put into the light resistance storage intermediate tank, and one twelfth solenoid valve (solenoid valve D) is additionally installed, when the liquid surface of the recovered light resistance reaches the position of the first liquid level sensor 42, the solenoid valve of N2 pipeline opens, the solenoid valve of the recovery pipe 2 closes, the solenoid valve of the pipeline between the light resistance recovery tank and the light resistance storage intermediate tank opens, and the light resistance is automatically transferred from the light resistance recovery tank to the light resistance storage intermediate tank until the liquid surface of the light resistance drops to the position of the second liquid level sensor 43, the solenoid valve between the light resistance recovery tank and the light resistance storage intermediate tank closes, the solenoid valve of the second nitrogen pipeline 39 closes, and the solenoid valve of the recovery pipe opens and continues to recover the light resistance.

[0103] (1) automatically recycling light resistance, avoid the waste of light resistance material, save production cost.

[0104] (2) reduce the bubble production in light resistance, improve the utilization of light resistance.

[0105] (3) the light resistance recovery system cost is lower, and the recycling rate is high, and the recovery storage light resistance container is about 10% when the machine table is regularly maintained and the machine table has a problem.

[0106] (4) through the control solenoid valve, can achieve the free switching of light resistance recovery and pipeline cleaning, avoid pipeline pollution.

[0107] Summarizing, the light resistance automatic recovery system of the utility model can recycle the discharged light resistance, improve the light resistance utilization rate, and reduce the production cost.

[0108] The above content is further detailed description of the utility model in combination with specific preferred embodiments, and the specific implementation of the utility model cannot be limited to these descriptions. For ordinary skilled person in the art to which the utility model belongs, on the premise of not departing from the concept of the utility model, a plurality of simple deductions or replacements can be made, which should be regarded as belonging to the protection scope of the utility model.

Claims

1. An automatic photoresist recycling system, characterized in that, include: A container (2) is used to receive and store photoresist from the first nitrogen line (38); A photoresist storage intermediate box (4) for receiving photoresist from the container (2) and having a first discharge pipe (6) that discharges from the photoresist storage intermediate box (4); A filter (8) for receiving photoresist from the photoresist storage intermediate box (4) and having a second discharge pipe (10) from the filter; A photoresist recycling tank (35) is used to receive the photoresist from the photoresist storage intermediate box (4) and / or filter (8); A second nitrogen pipeline (39) is connected to the photoresist recovery tank (35); A first three-way valve (36) is provided, with its first port connected to a first discharge pipe (6) and its second port connected to a second discharge pipe (10). as well as A second three-way valve (37) is provided. The first port of the second three-way valve (37) is connected to the sixth discharge pipe (40), the second port is connected to the light resistance recovery tank (35), and the third port is connected to the third port of the first three-way valve (36).

2. The automatic photoresist recycling system as described in claim 1, characterized in that, Also includes: A return pipe (41) is connected to the photoresist storage intermediate box (4) and the photoresist recycling tank (35). One end of the return pipe (41) is inserted into the upper part of the photoresist recycling tank (35), and the other end is inserted into the bottom of the photoresist recycling tank (35). The return pipe (41) is equipped with a twelfth solenoid valve (34).

3. The automatic photoresist recycling system as described in claim 2, characterized in that, The second nitrogen pipeline (39) is equipped with a second nitrogen inlet valve (33); The pipeline connecting the second port of the second three-way valve (37) to the photoresist recovery tank (35) is equipped with an eleventh solenoid valve (32); The sixth discharge pipe (40) is equipped with a tenth solenoid valve (31).

4. The automatic photoresist recycling system as described in claim 2, characterized in that, The first nitrogen pipeline (38) is equipped with a first nitrogen inlet valve (1); The container (2) is connected to the photoresist storage intermediate box (4) by a first solenoid valve (3); The first discharge pipe (6) is equipped with a second solenoid valve (5); The pipeline connecting the photoresist storage intermediate box (4) to the filter (8) is equipped with a third solenoid valve (7); The second discharge pipe (10) is equipped with a fourth solenoid valve (9).

5. The automatic photoresist recycling system as described in claim 2, characterized in that, Also includes: A photoresist storage tank (11) is used to receive the photoresist from the filter (8). The photoresist storage tank (11) has a third discharge pipe (13) with a fifth solenoid valve (12). The second discharge pipe (10) and the third discharge pipe (13) merge to form a fifth discharge pipe (22). The fifth discharge pipe (22) is connected to the second port of the first three-way valve (36).

6. The automatic photoresist recycling system as described in claim 5, characterized in that, It also includes: a nozzle (19); A pump (14) is connected between the photoresist storage tank (11) and the nozzle (19) to draw the photoresist in the photoresist storage tank (11) to the nozzle (19).

7. The automatic photoresist recycling system as described in claim 6, characterized in that, Also includes: A light-blocking flow meter (17) is provided, the first end of which is connected to the pump (14) via a ninth solenoid valve (23). A seventh solenoid valve (18) is provided, the first end of which is connected to the second end of the light-blocking flow meter (17), and the second end of which is connected to the nozzle (19).

8. The automatic photoresist recycling system as described in claim 6, characterized in that, Also includes: A fourth discharge pipe (16) is connected between the pump (14) and the photoresist storage tank (11), and the fourth discharge pipe (16) is equipped with a sixth solenoid valve (15).

9. The automatic photoresist recycling system as described in claim 6, characterized in that, Also includes: An eighth solenoid valve (20) is installed in the pipeline between the photoresist storage tank (11) and the pump (14).

10. The automatic photoresist recycling system as described in claim 6, characterized in that, Also includes: A pressure solenoid valve (21) is connected to the pump (14).

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