Shielding correction mechanism for sputter coating and sputter coating device thereof

Abstract

The utility model discloses a sputter coating shielding correction mechanism and a sputter coating device thereof, the sputter coating shielding correction mechanism is arranged in a channel between a cathode column and a coating chamber, and the shielding correction mechanism comprises a mounting rack, a plurality of correction rulers and a plurality of shielding rulers; the correction rulers are adjustable and are arranged on the mounting frame at intervals, and a first gap is formed between every two adjacent correction rulers; the correction rulers are close to the cathode column, and the correction rulers are adjusted so that the shielding parts of the correction rulers can stretch into or retreat from the channels; the shielding rulers are adjustably arranged on the mounting frame and cover the corresponding first gaps, the shielding rulers are far away from the cathode column, and the shielding rulers are adjusted so that the shielding rulers can cover the areas of the corresponding first gaps. The width of the channel is reduced by adjusting the matching of the correction rulers and the shielding rulers, so that the number of plasmas passing through the specific position of the channel is limited, and the shielding rulers are used for shielding the gap between the two adjacent correction rulers, so that the shielded plasmas are prevented from leaking, and the coating precision of the target material is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to sputter coating equipment field technology especially is a kind of sputter coating shielding correction mechanism and its sputter coating device. BACKGROUND

[0002] Sputter coating technology is the phenomenon that the atom of target material is hit out by ion bombardment on target material surface, which is called sputtering. The atom generated by sputtering is deposited on the surface of substrate to form film, which is called sputter coating. Usually, gas ionization is generated by gas discharge, and the plasma is hit on cathode target at high speed under the action of electric field, and the atom or molecule of cathode target is hit out to fly to the surface of plated substrate to deposit thin film.

[0003] When the plate is sputter coated, the film layer on the surface of target material is thick or thin, at this time, the user needs to adjust the coating correction mechanism to correct the coating condition of target material. The traditional coating correction mechanism is basically adjusted manually. When adjusting, the inner cavity of coating equipment cannot maintain vacuum, so that the coating equipment needs to be vacuumed again when it is operated again, so that the workpiece can be coated again. The preparation time before processing is greatly increased. In addition, the correction ruler in the traditional coating correction mechanism is basically flat plate type, and there is a gap between each flat plate, which cannot completely shield the plasma, resulting in plasma leakage. UTILITY MODEL CONTENT

[0004] Therefore, the utility model provides a sputter coating correction equipment arranged on the door of chamber target seat, which solves the problems that the traditional coating correction mechanism is basically adjusted manually, the inner cavity of coating equipment cannot maintain vacuum when adjusting, the coating equipment needs to be vacuumed again when it is operated again, so that the workpiece can be coated again, the preparation time before processing is greatly increased, and the correction ruler in the traditional coating correction mechanism is basically flat plate type, and there is a gap between each flat plate, which cannot completely shield the plasma, resulting in plasma leakage.

[0005] To achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a shielding correction mechanism for sputter coating is arranged in the passage between the cathode column and the coating chamber, characterized in that: the shielding correction mechanism comprises a mounting frame, a plurality of correction rulers, a plurality of shielding rulers and an electric drive mechanism for pushing the correction rulers and the shielding rulers.

[0006] Each correction ruler is adjustably arranged in the mounting frame with a first gap a formed between the adjacent two correction rulers; the correction ruler is adjusted so that the shielding part of the correction ruler enters or exits the passage;

[0007] Each shielding ruler is adjustably arranged in the mounting frame and covers the corresponding first gap a, and the shielding ruler is adjusted so that the area of the first gap a covered by the shielding ruler.

[0008] Further, the electric driving mechanism comprises a first electric actuator corresponding to each of the correction scales, the first electric actuator driving the correction scale to adjust on the mounting frame.

[0009] Further, the electric driving mechanism comprises a second electric actuator corresponding to each of the shielding scales, the second electric actuator driving the shielding scale to adjust on the mounting frame.

[0010] Further, the mounting frame is further provided with a box body accommodating the first electric actuator and the second electric actuator, and the box body is provided with a baffle separating the output shafts of the first electric actuator and the second electric actuator.

[0011] Further, the correction scale comprises a first flat plate portion and a first protruding portion extending from the two side edges of the first flat plate portion to the direction of the coating chamber, and a second gap is formed between the corresponding two first protruding portions on the adjacent two correction scales.

[0012] Further, the shielding scale comprises a second flat plate portion and a second protruding portion extending from the two side edges of the second flat plate portion to the direction of the first flat plate portion, and the second flat plate portion shields the gap, and a third gap is formed between the corresponding second protruding portion and the first protruding portion.

[0013] A sputtering coating device comprises a target seat door, a gas inlet mechanism, a cathode column, and the shielding and correction mechanism of any one of the claims, the gas inlet mechanism is arranged on the target seat door, the cathode column is located beside the gas outlet end of the gas inlet mechanism, and the shielding and correction mechanism is located at the end of the airflow flowing to the coating chamber.

[0014] Further, the shielding and correction mechanism is at least two, and the two adjacent shielding and correction mechanisms are oppositely arranged to jointly control the size of the passage.

[0015] Further, a driving cylinder is arranged on the shielding and correction mechanism, and the driving cylinder drives the shielding and correction mechanism to approach or move away from the coating chamber.

[0016] Further, the shielding and correction mechanisms located on both sides of the target seat door are obliquely arranged on the output shaft of the driving cylinder.

[0017] The utility model discloses a compared with prior art has obvious advantage and beneficial effect, specifically speaking, by the technical scheme can know, through the cooperation of the electric drive mechanism to adjust the width of the channel of correction ruler and the blocking ruler, and further limit the number of plasma through the specific position of the channel, and the gap between two adjacent correction rulers is shielded through the blocking ruler, to avoid the leakage of the shielded plasma, and further improve the film coating precision of target material. In addition, the adjustment of electric drive mechanism can also ensure that the vacuum environment in the channel is not damaged, and the film coating preparation time of user is saved. And the electric drive mechanism drives the correction ruler and the blocking ruler to move, so that the shielding correction mechanism of the sputtering film coating can be adjusted without breaking the vacuum, so that the user can complete the adjustment during the preparation of the film coating workpiece. Reduce the film coating process preparation time.

[0018] In order to more clearly set forth the structural features and functions of the utility model, the utility model will be described in detail below in combination with the drawings and specific embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 It is the use state show diagram of embodiment 1 of the utility model.

[0020] Figure 2 It is the three-dimensional display diagram of embodiment 1 of the utility model.

[0021] Figure 3 It is the side view of the shielding correction mechanism of embodiment 1 of the utility model.

[0022] Figure 4 It is the front view of the shielding correction mechanism of embodiment 1 of the utility model.

[0023] Figure 5 It is the display diagram of the shielding correction mechanism of embodiment 1 of the utility model after the hiding of the adhering plate.

[0024] Figure 6 It is the sectional view of the shielding correction mechanism of embodiment 1 of the utility model.

[0025] Figure 7 It is the display diagram of the correction ruler and the blocking ruler of embodiment 1 of the utility model.

[0026] BRIEF DESCRIPTION OF DRAWINGS:

[0027] 1 shielding correction mechanism, 2 film coating chamber, 3 drive cylinder;

[0028] 10 target seat door, 101 channel;A first gap, b second gap, c curved gap;

[0029] 20 cathode column;

[0030] 31 mounting frame, 32 correction ruler, 321 shielding part, 322 first flat plate part, 323 first protruding part;

[0031] 33 shielding ruler, 331 second flat plate part, 332 second protruding part;

[0032] 34 first electric actuator, 35 second electric actuator, 36 box body, 361 baffle, 37 door lining, 371 L-shaped plate, 372 fitting plate, 373 through hole;

[0033] 40 air inlet mechanism;

[0034] 50 electric driving mechanism. DETAILED DESCRIPTION

[0035] Please refer to Figures 1-7 The figure shows the specific structure of the preferred first embodiment of the utility model, which is a sputtering coating shielding correction mechanism, which is arranged in the passage 101 between the cathode column 20 and the coating chamber 2, characterized in that: the shielding correction mechanism 1 comprises a mounting frame 31, a plurality of correction rulers 32, a plurality of shielding rulers 33 and an electric driving mechanism 50 for pushing the correction rulers 32 and the shielding rulers 33.

[0036] Each correction ruler 32 is adjustably and spacedly arranged on the mounting frame 31, and a first gap a is formed between the two adjacent correction rulers 32; the correction ruler 32 is adjusted so that the shielding part 321 of the correction ruler 32 extends into or exits the passage 101.

[0037] Each shielding ruler 33 is adjustably arranged on the mounting frame 31 and covers the corresponding first gap a, and the shielding ruler 33 is adjusted so that the area of the first gap a covered by the shielding ruler 33. Compared with the correction ruler 32 in the prior art sputtering coating shielding correction mechanism, which is flat and has a gap between two adjacent correction rulers 32, the present sputtering coating shielding correction mechanism avoids the leakage of plasma through the first gap a when shielding the plasma by shielding the first gap a between the two adjacent correction rulers 32. In addition, this automatic adjustment without breaking the vacuum can be completed within the time of preparing the coating workpiece. It does not occupy other time. The previous manual adjustment needs to break the vacuum, and then spend a lot of time to manually adjust, and then vacuum, which usually takes about 2 hours. And the adjustment is not successful at one time, and needs to be adjusted several times. The previous manual adjustment is very low in efficiency, and the equipment can usually run normally only after one or two working hours.

[0038] Specifically, under high vacuum conditions, inert gas is filled, and through the action of electric field and magnetic field, glow discharge is generated to form plasma. Electrons and ions in the plasma accelerate through the channel 101 into the film coating chamber 2 under the joint action of the electric field and the magnetic field and contact the target material in the film coating chamber 2. In this process, because the target material needs to be coated for multiple rounds, the target material coating condition is closely related to the distribution of the plasma. At this time, the width of the channel 101 is reduced by adjusting the correction ruler 32 and the shielding ruler 33, thereby limiting the number of plasmas passing through the specific position of the channel 101, so as to facilitate the user to control the target material coating condition.

[0039] As shown in Figure 5 , for example, the electric drive mechanism 50 includes a first electric actuator 34 corresponding to each correction ruler 32, which drives the correction ruler 32 to adjust on the mounting bracket 31. The first electric actuator 34 pushes the correction ruler 32 to move on the mounting bracket 31. With the outward extension of the output shaft of the first electric actuator 34, the correction ruler 32 extends into the channel 101 and shields the plasma passing through the channel 101. With the inward contraction of the output shaft of the first electric actuator 34, the correction ruler 32 does not shield the plasma in the channel 101.

[0040] As shown in Figure 5 , for example, the electric drive mechanism 50 includes a second electric actuator 35 corresponding to each shielding ruler 33, which drives the shielding ruler 33 to adjust on the mounting bracket 31. The principle of the second electric actuator 35 is consistent with that of the first electric actuator 34. When the output shaft of the second electric actuator 35 extends outward, the shielding ruler 33 enters the channel 101. When the output shaft of the second electric actuator 35 contracts inward, the shielding ruler 33 does not shield the plasma in the channel 101.

[0041] In addition, after a correction ruler 32 is pushed into the channel 101 by the first electric actuator 34, it should be a shielding ruler 33 adjacent to the correction ruler 32 that is pushed into the channel 101 again. This is true for the two adjacent correction rulers 32 to ensure that the first gap a between the two adjacent correction rulers 32 can be covered by the shielding ruler 33 to avoid plasma leakage when shielding.

[0042] It should be noted that the correction ruler 32 and the shielding ruler 33 can also be adjusted arbitrarily according to actual conditions to meet the needs in different situations.

[0043] As shown in Figure 5As shown, the mounting rack 31 is provided with a box body 36 for accommodating the first electric actuator 34 and the second electric actuator 35. The box body 36 is provided with a baffle plate 361 for separating the output shafts of the first electric actuator 34 and the second electric actuator 35. The baffle plate 361 separates the output shafts of the first electric actuator 34 and the second electric actuator 35 and limits the moving direction of the output shafts, so that the output shafts will not deviate when the first electric actuator 34 and the second electric actuator 35 are not fixed. In addition, the baffle plate 361 is provided in two, and the two baffle plates 361 are located on the two sides of the output shaft of the first electric actuator 34 or the second electric actuator 35.

[0044] As shown in Figure 6 As shown, the correction ruler 32 includes a first flat plate portion 322 and a first protruding portion 323 extending from the two side edges of the first flat plate portion 322 to the direction of the coating chamber. The second gap b is formed between the corresponding two first protruding portions 323 on the two adjacent correction rulers 32. Although the two adjacent correction rulers 32 are shielded by the shielding ruler 33, there is still a gap between the shielding ruler 33 and the correction ruler 32. When shielding, the plasma can still leak through the gap. Therefore, the first protruding portion 323 is provided on the two side edges of the correction ruler 32 opposite to the shielding ruler 33 and is integrally formed with the shielding ruler 33. The first protruding portion 323 is in the form of a strip, so that the correction ruler 32 is concave. The concave design of the correction ruler 32, in combination with the shielding ruler 33, can further prevent the plasma from leaking when shielding.

[0045] As shown in Figure 6 As shown, the shielding ruler 33 includes a second flat plate portion 331 and a second protruding portion 332 extending from the two side edges of the second flat plate portion 331 to the direction of the first flat plate portion 322. The second flat plate portion 331 shields the gap, and the corresponding second protruding portion 332 and the first protruding portion 323 form the curved gap c. In order to adapt to the first protruding portion 323 on the correction ruler 32, the second protruding portion 332 is provided on the two side edges of the shielding ruler 33 opposite to the correction ruler 32 and is integrally formed with the shielding ruler 33. The shielding ruler 33 is also designed to be concave. When the correction ruler 32 and the shielding ruler 33 shield the plasma, the curved gap c is generated by the cooperation of the first protruding portion 323 and the second protruding portion 323, so that it is more difficult for the plasma to leak when shielded by the correction ruler 32 and the shielding ruler 33.

[0046] A sputtering coating device, comprising a target seat door 10, an air inlet mechanism 40, a cathode column 20 and a shielding correction mechanism 1, the air inlet mechanism 40 is arranged on the target seat door 10, the cathode column 20 is located beside the air outlet end of the air inlet mechanism 40, and the shielding correction mechanism 1 is located at the end of the airflow flowing to the coating chamber 2. When the cathode column 20 operates, the air inlet mechanism 40 guides the gas into the cavity of the target seat door 10, so that the cathode column 20 contacts the gas, and the gas discharge generates gas ionization, and the plasma under the action of the electric field high-speed bombards the cathode target body, and the cathode target body atom or molecule is hit to fly to the surface of the coated substrate to deposit into a thin film.

[0047] The shielding correction mechanism 1 is at least two, and two adjacent shielding correction mechanisms 1 are oppositely arranged and jointly control the size of the channel 101. The size of the channel 101 is controlled by the shielding correction mechanism 1, so that the plasma is better shielded, and the quality of the target material coating is strengthened.

[0048] As shown in Figure 2 , for example, the driving air cylinder 3, the shielding correction mechanism 1 is arranged on the driving air cylinder 3, and the driving air cylinder 3 drives the shielding correction mechanism 1 to approach or move away from the coating chamber 2. The shielding correction mechanism 1 moves with the operation of the driving air cylinder 3, and at this time the shielding correction mechanism 1 has two states, one is that the output shaft of the driving air cylinder 3 is stretched to reduce the size of the channel 101, and the other is that the output shaft of the driving air cylinder 3 is retracted to expand the channel 101, increase the selectivity of the user during use, and improve the effect of the target material coating.

[0049] As shown in Figure 2 , for example, the shielding correction mechanism 1 located on both sides of the target seat door 10 is obliquely arranged on the output shaft of the driving air cylinder 3. When the cathode column 20 on the target seat door 10 contains two, the shielding correction mechanism 1 corresponding to the cathode column 20 contains four, and two by two oppositely, divided into located on both sides of the two cathode columns 20, at this time, in order to facilitate the shielding correction mechanism 1 to better adjust the size of the channel 101, the two shielding correction mechanisms 1 close to the two sides of the target seat door 10 are arranged in an inclined manner, so that when the driving air cylinder 3 drives the oblique shielding correction mechanism 1 to move, the size of the channel 101 can be reduced, so as to better control the target range.

[0050] The shielding correction mechanism 1 also includes a door lining plate 37 arranged in the cavity of the target seat door 10, and a mounting frame 31 arranged on the side of the door lining plate 37 away from the rotating cathode column 20. At least two opposite door lining plates 37 are arranged on both sides of a rotating cathode column 20, and the two opposite door lining plates 37 and the target seat door 10 form a channel 101 for the plasma to pass through.

[0051] Specifically, the door lining plate 37 includes an L-shaped plate 371 fixed to the inner wall of the target seat door 10, and a fitting plate 372 fitted to the short end of the L-shaped plate 371, and the mounting frame 31 is fixed to the side of the fitting plate 372 relative to the L-shaped plate 371.

[0052] As Figure 2 shown, exemplary, door lining plate 37 relative to one side of the rotating cathode column 20 is provided with a row of through holes 373, and a through hole 373 with a correction ruler 32 corresponding.

[0053] The above is only the preferred embodiment of the present application, not any limit on the technical scope of the present application, so any minor modification, equivalent change and modification of the above embodiments according to the technical essence of the present application, still belong to the scope of the technical scheme of the present application.

Claims

1. A sputtering film plating shielding correction mechanism, which is arranged in a passage (101) between a cathode column (20) and a film plating chamber (2), characterized in that: The shielding correction mechanism (1) comprises a mounting frame (31), a plurality of correction scales (32) and a plurality of shielding scales (33), and an electric drive mechanism (50) for driving the correction scales (32) and the shielding scales (33). Each of the correction scales (32) is adjustably and spacedly arranged on the mounting frame (31), and a first gap (a) is formed between two adjacent correction scales (32); the correction scale (32) is adjusted so that the shielding part (321) of the correction scale (32) extends into or exits the passage (101). Each of the shielding scales (33) is adjustably arranged on the mounting frame (31) and covers the corresponding first gap (a); the shielding scale (33) is adjusted so that the shielding scale (33) covers the area of the corresponding first gap (a).

2. The sputtering film deposition shield correction mechanism according to claim 1, characterized by: The electric drive mechanism (50) comprises a first electric actuator (34) corresponding to each of the correction scales (32), which drives the correction scale (32) to adjust on the mounting frame (31).

3. The sputter deposition shield correction mechanism of claim 2, wherein: The electric drive mechanism (50) comprises a second electric actuator (35) corresponding to each of the shielding scales (33), which drives the shielding scale (33) to adjust on the mounting frame (31).

4. The sputtering film formation shield correction mechanism according to claim 2, characterized by: The mounting frame (31) is further provided with a box body (36) accommodating the first electric actuator (34) and the second electric actuator (35), and the box body (36) is provided with a baffle (361) separating the output shafts of the first electric actuator (34) and the second electric actuator (35).

5. The sputter deposition shield correction mechanism of claim 1, wherein: The correction scale (32) comprises a first flat plate part (322) and a first protruding part (323) extending to the film coating chamber direction from the two side edges of the first flat plate part (322), and a second gap (b) is formed between the corresponding two first protruding parts (323) on two adjacent correction scales (32).

6. The sputter deposition shield correction mechanism of claim 5, wherein: The shielding scale (33) comprises a second flat plate part (331) and a second protruding part (332) extending to the first flat plate part (322) direction from the two side edges of the second flat plate part (331), and the second flat plate part (331) shields the gap, and a bending gap (c) is formed between the corresponding second protruding part (332) and the first protruding part (323).

7. A sputter coating device, characterized by: It comprises a target seat door (10), an air inlet mechanism (40), a cathode column (20), and the shielding correction mechanism (1) of any one of claims 1-6, the air inlet mechanism (40) is arranged on the target seat door (10), the cathode column (20) is located beside the air outlet end of the air inlet mechanism (40), and the shielding correction mechanism (1) is located at the end of the airflow flowing to the film coating chamber (2).

8. The sputter coating device of claim 7, wherein: There are at least two shielding correction mechanisms (1), and two adjacent shielding correction mechanisms (1) are oppositely arranged to jointly control the size of the passage (101).

9. The sputter coating device of claim 7, wherein: It further comprises a drive cylinder (3), and the shielding correction mechanism (1) is arranged on the drive cylinder (3), and the drive cylinder (3) drives the shielding correction mechanism (1) to approach or move away from the film coating chamber (2).

10. The sputter coating device of claim 9, wherein: The shielding correction mechanisms (1) located on both sides of the target seat door (10) are obliquely arranged on the output shaft of the drive cylinder (3).

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