Supporting PIN column for cleaning mask
By designing adjustable support pins for mask cleaning, the problem of poor mask levelness on the CHUCK was solved, enabling rapid and precise adjustment of the support height, improving CD accuracy and cleaning effect, and reducing adjustment time and cost.
Patent Information
- Application Number
- CN202422894692.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-26
- Publication Date
- 2025-12-02
- Estimated Expiration
- 2034-11-26
AI Technical Summary
The existing large-size mask cleaning PIN column length is fixed and cannot be adjusted, resulting in poor mask levelness on the CHUCK, affecting CD accuracy and cleaning cleanliness, and the adjustment process is time-consuming.
Design a support pin post for mask cleaning, including a fixed post, an adjusting post, and a support block. The height of the mask support can be finely adjusted by the telescopic connection and threaded adjustment of the adjusting post.
It enables rapid and precise adjustment of the mask support height, saving adjustment time, improving CD accuracy and cleaning cleanliness, and reducing product scrap and cleaning costs.
Smart Images
Figure CN223616416U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of mask manufacturing technology, and in particular to a support PIN post for mask cleaning. Background Technology
[0002] Currently, the length of the PIN pillars for large-size photomasks is fixed and the height cannot be adjusted. When supporting the photomask, multiple PIN pillars are usually evenly distributed around the edges of the photomask. However, for large-size photomasks during development / etching / cleaning, the levelness of the photomask on the chuck is extremely important. Since operators have to step on the chuck when changing PIN pillars, the chuck inevitably deforms over time. In addition, errors in the manufacturing of the PIN pillars themselves and the thickness of the Teflon coating cause the levelness of the photomask on the chuck to deteriorate, affecting the CD accuracy and cleaning cleanliness of the product.
[0003] During the development / etching process, if the mask is not level, the developing / etching solution will flow in a lower direction, resulting in a significant CD deviation between the high and low positions. This causes the CD uniformity of the entire mask to exceed the standard, leading to product scrap.
[0004] During photomask cleaning, if the photomask is not level, the brush may not reach the mask at lower positions or apply insufficient pressure, affecting cleaning effectiveness. Conversely, if the brush applies too much pressure at higher positions, it can scratch the chrome surface, resulting in quality defects. During spin-drying, there may be more bright spots at lower positions, requiring re-cleaning and increasing cleaning costs.
[0005] The current method involves adding a 0.5mm or 1mm shim under the pin post. However, this method has several drawbacks. First, the shim itself is soft, limiting adjustment precision. Second, it is easily lost and can be carried by the pin post into other pin holes, leading to a larger deviation in the mask size. If adjustments are not made frequently, the flatness deviation may become even greater over time. Third, after confirming the deviation, a loader is needed to remove the mask, which takes about 20 minutes each time, wasting considerable time. Furthermore, after calculating the confirmed deviation, the shim is used for correction, and the deviation is checked again after mounting the mask. If the deviation is still too large, it needs to be corrected again. If it needs to be corrected again, the mounting and removal of the mask need to be repeated, further increasing the time wasted.
[0006] Therefore, it is necessary to propose a support pin post for mask cleaning to facilitate fine adjustment of the support height of the mask, thereby saving adjustment time. Utility Model Content
[0007] To address the aforementioned issues, this invention proposes a support pin for mask cleaning to facilitate precise adjustment of the mask's support height, thereby saving adjustment time.
[0008] This utility model is achieved through the following technical solution:
[0009] This utility model proposes a support pin post for mask cleaning, including a fixed post, an adjusting post, and a support block. One end of the fixed post is provided with an installation end for external fixation, and the other end of the fixed post is provided with an adjusting end. One end of the adjusting post and the adjusting end form an adjustable telescopic connection. The support block is rotatably connected to the other end of the adjusting post.
[0010] Furthermore, the adjusting end is provided with a connecting post, the adjusting post is provided with a connecting groove, the connecting post is received in the connecting groove and forms an adjustable telescopic connection with the connecting groove.
[0011] Furthermore, the connecting column is provided with a first external thread, and the groove wall of the connecting groove is provided with an internal thread, and the first external thread and the internal thread form a threaded connection.
[0012] Furthermore, one end of the adjusting column is provided with a connecting end, and the support block is rotatably connected to the connecting end.
[0013] Furthermore, the support block is provided with a rotating groove, and the connecting end is received in the rotating groove.
[0014] Furthermore, the outer periphery of the support block is provided with a support boss for supporting the mask plate.
[0015] Furthermore, the outer periphery of the support block is provided with a placement groove, which is located above the support boss.
[0016] Furthermore, the length of the adjusting end is greater than the length of the mounting end.
[0017] Furthermore, the mounting end is provided with a second external thread for connection with the external thread.
[0018] Furthermore, the fixed column is provided with a torsion column, which is located between the mounting end and the adjusting end.
[0019] The beneficial effects of this utility model are:
[0020] This invention uses a fixed column for external fixation and a support block for supporting the edge of the mask. By adjusting the column within a small range, the support height of the support block can be adjusted, thereby adjusting the support height of the mask, which is quick and convenient. In summary, this mask cleaning support pin column allows for precise adjustment of the mask's support height, saving adjustment time. Attached Figure Description
[0021] Figure 1 This is a schematic diagram of the support PIN pillars for mask cleaning of this utility model supporting the mask.
[0022] Figure 2 This is a cross-sectional view of the support PIN pillar for mask cleaning according to the present invention;
[0023] Figure 3 This is a schematic diagram of the fixing post of the support PIN post for mask cleaning according to the present invention;
[0024] Figure 4 This is a schematic diagram of the adjusting column of the support PIN column for mask cleaning according to the present invention;
[0025] Figure 5 This is a schematic diagram of the support block for the PIN pillars used in mask cleaning according to this utility model.
[0026] The attached figures are labeled as follows:
[0027] Fixed column 1, mounting end 11, second external thread 111, adjusting end 12, connecting column 121, first external thread 1211, torsion column 13;
[0028] Adjusting column 2, connecting groove 21, internal thread 211, connecting end 22;
[0029] Support block 3, rotating groove 31, support boss 32, placement groove 33;
[0030] Mask 4. Detailed Implementation
[0031] To more clearly and completely illustrate the technical solution of this utility model, the following description, in conjunction with the accompanying drawings, will further explain this utility model.
[0032] Please refer to Figures 1-5This utility model proposes a support pin column for mask cleaning, including a fixed column 1, an adjusting column 2, and a support block 3. One end of the fixed column 1 is provided with an installation end 11 for external fixation, and the other end of the fixed column 1 is provided with an adjusting end 12. One end of the adjusting column 2 and the adjusting end 12 form an adjustable telescopic connection. The support block 3 is rotatably connected to the other end of the adjusting column 2. The fixed column 1, adjusting column 2, and support block 3 can all be metal structures or structures of other materials. When installing this utility model, multiple support pin columns need to be evenly distributed around the circumference and installed on the chuck. Then, the mask 4 is placed on the multiple support pin columns. At this time, multiple support blocks 3 simultaneously support the edge of the mask.
[0033] In this embodiment, during installation, the mounting end 11 of the fixed column 1 is used to fix it to the outside, and the support block 3 supports the edge of the mask. By making a small range of extension and retraction adjustment of the adjusting column 2, the adjusting column 2 can be extended or shortened along the direction of the adjusting end 12 to adjust the support height of the support block 3, thereby adjusting the support height of the mask 4, which is quick and convenient.
[0034] In summary, the support pins for mask cleaning allow for precise adjustment of the mask's support height, saving adjustment time.
[0035] In this embodiment, the adjusting end 12 is provided with a connecting post 121, and the adjusting post 2 is provided with a connecting groove 21. The connecting post 121 is housed in the connecting groove 21 and forms an adjustable telescopic connection with the connecting groove 21. The connecting post 121 can form a tight sliding connection with the connecting groove 21 to form a telescopic connection, or it can form a telescopic connection through a threaded connection. During the adjustment process, it is necessary to turn the knob of the adjusting post 2 so that the connecting post 121 and the connecting groove 21 slide relative to each other to make adjustment.
[0036] In this embodiment, the connecting post 121 is provided with a first external thread 1211, and the groove wall of the connecting groove 21 is provided with an internal thread 211. The first external thread 1211 and the internal thread 211 form a threaded connection. Both the first external thread 1211 and the internal thread 211 are fine threads, which can be adjusted by fine thread rotation. When adjusting the height, the knob of the adjusting post 2 is turned so that the threaded connection between the first external thread 1211 and the internal thread 211 can be used to adjust the extension or retraction of the adjusting post 2.
[0037] In this embodiment, one end of the adjusting column 2 is provided with a connecting end 22. The friction coefficient of the connecting end 22 is small. The support block 3 is rotatably connected to the connecting end 22. The connecting end 22 is used to rotatably connect with the support block 3. When installing the support block 3, the support block 3 can be directly sleeved on the connecting end 22.
[0038] In this embodiment, the support block 3 is provided with a rotating groove 31, and the connecting end 22 is received in the rotating groove 31. When installing the support block 3, the rotating groove 31 is aligned with the connecting end 22 and then it is sleeved on. The diameter of the rotating groove 31 is slightly larger than the diameter of the connecting end 22.
[0039] In this embodiment, the outer periphery of the support block 3 is provided with a support boss 32 for supporting the mask. When supporting the mask, the multiple support bosses 32 of the multiple support blocks 3 are kept on the same horizontal plane, and then the edge of the mask is supported at the same time.
[0040] In this embodiment, the outer periphery of the support block 3 is provided with a placement groove 33, which is located above the support boss 32. The placement groove 33 provides a space for the edge of the mask to be placed, so that the edge of the mask can have enough space to contact the support boss 32.
[0041] In this embodiment, the length of the adjusting end 12 is greater than the length of the mounting end 11, which makes it easier to have enough length to adjust the height of the adjusting column 2.
[0042] In this embodiment, the mounting end 11 is provided with a second external thread 111 for external thread connection. When the fixing post 1 is installed externally, the mounting end 11 is tightened into the external threaded hole through the second external thread 111 to fix the fixing post 1.
[0043] In this embodiment, a torsion post 13 is provided on the fixed post 1. The torsion post 13 is located between the mounting end 11 and the adjusting end 12. The torsion post 13 can be a cylindrical structure or a polygonal structure, so as to facilitate the clamping or knob of the threaded installation of the fixed post 1.
[0044] Of course, there may be other implementations of this utility model. Based on this implementation, other implementations obtained by those skilled in the art without any creative effort are all within the scope of protection of this utility model.
Claims
1. A support pin pillar for mask cleaning, characterized in that, It includes a fixed column, an adjustable column, and a support block. One end of the fixed column is provided with an installation end for external fixation, and the other end of the fixed column is provided with an adjustable end. One end of the adjustable column and the adjustable end form an adjustable telescopic connection. The support block is rotatably connected to the other end of the adjustable column.
2. The support PIN pillar for mask cleaning according to claim 1, characterized in that, The adjusting end is provided with a connecting post, and the adjusting post is provided with a connecting groove. The connecting post is received in the connecting groove and forms an adjustable telescopic connection with the connecting groove.
3. The support PIN pillar for mask cleaning according to claim 2, characterized in that, The connecting column is provided with a first external thread, and the groove wall of the connecting groove is provided with an internal thread, and the first external thread and the internal thread form a threaded connection.
4. The support PIN pillar for mask cleaning according to claim 1, characterized in that, One end of the adjusting column is provided with a connecting end, and the support block is rotatably connected to the connecting end.
5. The support PIN pillar for mask cleaning according to claim 4, characterized in that, The support block is provided with a rotating groove, and the connecting end is received in the rotating groove.
6. The support PIN pillar for mask cleaning according to claim 1, characterized in that, The outer periphery of the support block is provided with a support boss for supporting the mask plate.
7. The support PIN pillar for mask cleaning according to claim 6, characterized in that, The outer periphery of the support block is provided with a placement groove, which is located above the support boss.
8. The support PIN pillar for mask cleaning according to claim 1, characterized in that, The length of the adjusting end is greater than the length of the mounting end.
9. The support PIN pillar for mask cleaning according to claim 1, characterized in that, The mounting end is provided with a second external thread for connection with the external thread.
10. The support PIN pillar for mask cleaning according to claim 1, characterized in that, The fixed column is provided with a torsion column, which is located between the mounting end and the adjusting end.