Planar electrode hole etching device
By designing a planar electrode hole etching device with an etching solution circulation structure and a support structure, the problems of poor chemical solution selectivity and edge damage were solved, realizing the recycling of the chemical solution and reducing costs.
Patent Information
- Application Number
- CN202423115662.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-17
- Publication Date
- 2025-12-02
- Estimated Expiration
- 2034-12-17
AI Technical Summary
Existing planar electrode hole etching technology suffers from poor chemical selectivity, limited control precision, and the problem that excess chemical solution can easily cause edge damage, resulting in high production costs.
A planar electrode hole etching device was designed, comprising a housing, a support structure, and an etching solution circulation structure. The etching solution circulation structure avoids residue of the etching solution, the support structure reduces the contact area between the etching solution and the electrode, and a solenoid valve is used to control the etching solution circulation and cleaning process.
This enables the recycling of chemical solutions, avoids edge damage, reduces production costs, and improves the reliability and economy of the etching process.
Smart Images
Figure CN223624927U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of planar electrode hole etching, specifically, this utility model relates to a planar electrode hole etching device. Background Technology
[0002] Planar electrode hole etching is a common process in semiconductor manufacturing and microelectronics processing, used to form tiny holes on planar electrodes or substrates. These tiny holes can be used to connect circuits on different layers, form vias to achieve vertical interconnection, and also serve as channels for microfluidic systems. Planar electrode hole etching generally uses wet etching, which uses specific chemical solutions to dissolve materials to form tiny holes. It has the advantages of low cost and simple operation, but poor selectivity, limited control precision, and excess chemical solution can easily damage edges that do not need to be etched.
[0003] To address the aforementioned issues, patent document 210429732U discloses a planar electrode for PCB plasma processing. The electrode plate has a hollow box structure, consisting of a base and a top cover. Slender mounting grooves are evenly spaced on the base to house the gas distribution network. External gas enters the gas network through a gas inlet and is evenly distributed into two gas branches. Each gas branch is connected to a varying number of gas distribution pipes. Gas overflows from small holes below the gas distribution pipes into the plasma region between the electrodes. Continuous liquid coils are arranged in the gaps between the gas distribution networks. The liquid coils contain a heat-conducting liquid used for heating or cooling the electrodes. However, this method fails to solve the aforementioned problems. Utility Model Content
[0004] This utility model is designed to solve the aforementioned problems, and its purpose is to provide a planar electrode hole etching device that facilitates etching, avoids edge damage caused by excessive chemical solutions, and reduces production costs. To achieve the above objective, the technical solution adopted by this utility model is as follows:
[0005] This utility model provides a planar electrode hole etching device, which includes a housing, a support structure, and an etching solution circulation structure. The support structure is disposed inside the housing, and the etching solution circulation structure is disposed inside the housing.
[0006] The planar electrode hole etching device provided by this utility model may also have the following feature: the support structure includes a support plate, which is disposed inside the housing and has a leakage hole.
[0007] The planar electrode hole etching device provided by this utility model may also have the following feature: the support plate is provided with support protrusions, and the support protrusions are evenly distributed on the support plate.
[0008] The planar electrode hole etching device provided by this utility model may also have the following features: the etching solution circulation structure includes a collection tank, a circulation pipe, an etching solution discharge connector and a circulation pump. The bottom of the collection tank is provided with a discharge port, one end of the circulation pipe is connected to the discharge port, the other end of the circulation pipe is connected to the etching solution discharge connector, and the circulation pump is installed on the circulation pipe.
[0009] The planar electrode hole etching device provided by this utility model may also have the following features: a first solenoid valve is provided at the drain port, a buffer tank is provided at the bottom of the collection tank, the buffer tank is connected to the drain port, and one end of the circulation pipe is connected to the buffer tank.
[0010] The planar electrode hole etching device provided by this utility model may also have the following feature: a drain outlet is provided at the bottom of the collection box, and a second solenoid valve is provided inside the drain outlet.
[0011] The planar electrode hole etching device provided by this utility model may also have the following feature: the housing is also provided with a water outlet, which is located above the etching solution discharge connector.
[0012] The planar electrode hole etching device provided by this utility model may also have the following feature: an exhaust port is provided on the housing.
[0013] The technical effects of this utility model are as follows: The planar electrode hole etching device provided by this utility model includes a housing, a support structure and an etching solution circulation structure. The support structure is set inside the housing and is used to place the planar electrode. The etching solution circulation structure is set inside the housing, which can avoid excess chemical solution remaining on the surface of the planar electrode, and can recycle the chemical solution, thereby reducing production costs.
[0014] Therefore, the planar electrode hole etching device provided by this utility model facilitates the etching of planar electrode holes, avoids edge damage caused by excessive chemical solution, and reduces production costs. Attached Figure Description
[0015] This manual includes the following figures, which illustrate the following:
[0016] Figure 1 This is a schematic diagram of the planar electrode hole etching device in an embodiment of this utility model;
[0017] Figure 2 This is a schematic diagram of the support plate in an embodiment of this utility model;
[0018] The following are marked in the diagram: housing-10, water outlet-11, vent-12, support structure-20, support plate-21, leakage hole-22, support protrusion-23, etching solution circulation structure-30, collection tank-31, drain port-311, first solenoid valve-312, drain outlet-313, second solenoid valve-314, circulation pipe-32, etching solution discharge connector-33, circulation pump-34, buffer tank-35. Detailed Implementation
[0019] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, in order to help those skilled in the art to have a more complete, accurate and in-depth understanding of the inventive concept and technical solution of the present invention, and to facilitate its implementation.
[0020] Figure 1 This is a schematic diagram of the planar electrode hole etching device in an embodiment of this utility model.
[0021] like Figure 1 As shown, the planar electrode hole etching device provided by this utility model includes a housing 10, a support structure 20, and an etching solution circulation structure 30. The support structure 20 is disposed inside the housing 10 and is used to place the planar electrode. The etching solution circulation structure 30 is disposed inside the housing 10, which can prevent excess chemical solution from remaining on the surface of the planar electrode, and can recycle the chemical solution, thereby reducing production costs.
[0022] Figure 2 This is a schematic diagram of the support plate in an embodiment of this utility model.
[0023] like Figure 2 As shown, the support structure 20 includes a support plate 21, which is disposed inside the housing 10. The support plate 21 is provided with a leakage hole 22, which allows the chemical liquid to flow, preventing the chemical liquid from remaining on the support plate 21 and the planar electrode, thus avoiding excess chemical liquid residue and preventing excess chemical liquid from causing edge damage to the planar electrode.
[0024] The support plate 21 is provided with support protrusions 23, which are evenly distributed on the support plate 21. Multiple support protrusions 23 are evenly distributed around the leakage hole 22. The support protrusions 23 abut against the bottom of the planar electrode, thereby reducing the contact area between the planar electrode and the support plate 21, effectively preventing chemical liquid from remaining between the support plate 21 and the planar electrode, and allowing excess liquid to flow down through the leakage hole 22.
[0025] The etching solution circulation structure 30 includes a collection tank 31, a circulation pipe 32, an etching solution discharge connector 33, and a circulation pump 34. The collection tank 31 is located below the leakage hole 22 and can collect excess chemical solution leaking from the leakage hole 22. The bottom of the collection tank 31 is provided with a drain port 311. One end of the circulation pipe 32 is connected to the drain port 311, and the other end of the circulation pipe is connected to the etching solution discharge connector 33. The etching solution discharge connector 33 is set on the housing and located above the planar electrode. It can deliver the chemical solution to the area on the planar electrode that needs to be etched to achieve etching of the planar electrode hole. The circulation pump 34 is set on the circulation pipe 32 and can pump the chemical solution.
[0026] The drain port 311 is equipped with a first solenoid valve 312, and the bottom of the collection box 31 is equipped with a buffer box 35. When the first solenoid valve 3212 is opened, the buffer box 35 can buffer the chemical liquid collected from the collection box 31, and the chemical liquid flows into the buffer box 35 through the drain port 311.
[0027] The bottom of the collection box 31 is provided with a drain outlet 313, and a second solenoid valve 314 is provided inside the drain outlet 313. The drain outlet 313 is used to drain the water used to clean the planar electrode, and the second solenoid valve 314 can control the opening or closing of the drain outlet 313.
[0028] The housing 10 is also provided with a water outlet 11, which is used to connect to a cleaning water delivery structure, so as to facilitate the cleaning of the planar electrode after etching and avoid the continuous residue of chemical solution on the surface of the planar electrode. The water outlet 11 is located above the etching solution discharge connector 33, and the flow rate of the cleaning water should be slow to avoid splashing of residual chemical solution.
[0029] The housing 10 is provided with an exhaust port 12 for discharging the waste gas generated during the etching process.
[0030] When etching planar electrode holes using the planar electrode hole etching device provided by this invention, the circulation pump 34 is started, and the chemical solution is transported to the area to be etched on the planar electrode through the circulation pipe 32 and the etching solution discharge connector 33 to achieve etching of the planar electrode hole. After the chemical solution completes the etching of the planar electrode hole, it falls into the collection tank 31 through the etched small hole and the leakage hole 22. At this time, the first solenoid valve 312 is opened and the second solenoid valve 314 is closed, and the chemical solution falls into the buffer tank 35 for reuse. After etching, cleaning water is transported to the surface of the planar electrode through the water outlet 11 to clean the planar electrode. The first solenoid valve 312 is closed and the second solenoid valve 314 is opened, and the cleaning water is discharged, improving the reliability of the structure. The planar electrode hole etching device provided by this invention facilitates the etching of planar electrode holes, avoids edge damage caused by excessive chemical solution, and reduces production costs.
[0031] The role and effect of the embodiments
[0032] The planar electrode hole etching device provided by this utility model includes a housing 10, a support structure 20, and an etching solution circulation structure 30. The support structure 20 is disposed inside the housing 10 and is used to place the planar electrode. The etching solution circulation structure 30 is disposed inside the housing 10, which can avoid excess chemical solution residue on the surface of the planar electrode, and can recycle the chemical solution, thereby reducing production costs.
[0033] When etching planar electrode holes using the planar electrode hole etching device provided by this invention, the circulation pump 34 is started, and the chemical solution is transported to the area to be etched on the planar electrode through the circulation pipe 32 and the etching solution discharge connector 33 to achieve etching of the planar electrode hole. After the chemical solution completes the etching of the planar electrode hole, it falls into the collection tank 31 through the etched small hole and the leakage hole 22. At this time, the first solenoid valve 312 is opened and the second solenoid valve 314 is closed, and the chemical solution falls into the buffer tank 35 for reuse. After etching, cleaning water is transported to the surface of the planar electrode through the water outlet 11 to clean the planar electrode. The first solenoid valve 312 is closed and the second solenoid valve 314 is opened, and the cleaning water is discharged, improving the reliability of the structure. The planar electrode hole etching device provided by this invention facilitates the etching of planar electrode holes, avoids edge damage caused by excessive chemical solution, and reduces production costs.
[0034] The present invention has been described above by way of example with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvements made using the inventive concept and technical solution of the present invention; or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.
Claims
1. A planar electrode hole etching apparatus, characterized in that, It includes a housing (10), a support structure (20) and an etching solution circulation structure (30), wherein the support structure (20) is disposed within the housing (10) and the etching solution circulation structure (30) is disposed within the housing (10).
2. The planar electrode hole etching apparatus according to claim 1, characterized in that, The supporting structure (20) includes a supporting plate (21), which is disposed inside the housing (10) and has a leakage hole (22).
3. The planar electrode hole etching apparatus according to claim 2, characterized in that, The support plate (21) is provided with support protrusions (23), which are evenly distributed on the support plate (21).
4. The planar electrode hole etching apparatus according to claim 3, characterized in that, The etching solution circulation structure (30) includes a collection tank (31), a circulation pipe (32), an etching solution discharge connector (33), and a circulation pump (34). The collection tank (31) has a discharge port (311) at the bottom. One end of the circulation pipe (32) is connected to the discharge port (311), and the other end of the circulation pipe (32) is connected to the etching solution discharge connector (33). The circulation pump (34) is mounted on the circulation pipe (32).
5. The planar electrode hole etching apparatus according to claim 4, characterized in that, The drain port (311) is equipped with a first solenoid valve (312), and the bottom of the collection box (31) is equipped with a buffer box (35). The buffer box (35) is connected to the drain port (311), and one end of the circulation pipe (32) is connected to the buffer box (35).
6. The planar electrode hole etching apparatus according to claim 5, characterized in that, The bottom of the collection box (31) is provided with a drain outlet (313), and a second solenoid valve (314) is provided inside the drain outlet (313).
7. The planar electrode hole etching apparatus according to claim 4, characterized in that, The housing (10) is also provided with a water outlet (11), which is located above the etching solution discharge connector (33).
8. The planar electrode hole etching apparatus according to claim 1, characterized in that, The housing (10) is provided with an exhaust port (12).