Gluing developer cleaning device

Abstract

The utility model discloses a gluing developing machine cleaning device, and particularly relates to the technical field of cleaning devices, the gluing developing machine cleaning device comprises a box body, the left end and the right end of the outer surface of the box body are jointly and fixedly connected with a flushing assembly, the middle part of a mounting rack is fixedly connected with a driving assembly, and the middle part of the upper end of the outer surface of the box body is rotatably connected with a transmission mechanism; the lower side of the interior of the bearing mechanism is fixedly connected with a limiting mechanism, and the upper side of the interior of the bearing mechanism is fixedly connected with a clamping mechanism. According to the cleaning device for the gluing developing machine, the clamping mechanism can be conveniently flushed and cleaned through the flushing assembly, the bearing mechanism can be driven to rotate through the transmission mechanism, the position of a first gluing developing silicon wafer of the developing machine can be limited under the action of the limiting mechanism, and the gluing developing silicon wafer can be conveniently cleaned. And the first developing machine gluing and developing silicon wafer placed in the limiting mechanism can be clamped and fixed through the clamping mechanism, so that the practicability and the universality of the device are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to cleaning device technical field, especially in a kind of gluing developing machine cleaning device. BACKGROUND

[0002] Gluing developing machine is the machine used in photolithography process and matched with photoetching machine, mainly plays the role of gluing, baking and developing.Gluing developing equipment is indispensable equipment in integrated circuit production process, can directly influence the formation of exposure pattern in photolithography process.Gluing developing equipment is mainly applied in the front EUV photoetching in wafer production, and the back sealing and LED manufacturing, plays an important role in wafer production.

[0003] Developing refers to the process that latent image formed on film or printing plate after exposure is shown by reducing agent, and when the gluing developing silicon wafer on the upper cover of gluing developing machine is cleaned, it is usually sprayed with clean water on the front and back of the gluing developing silicon wafer by two groups of spray pipes to remove the developing products and excess developing solution attached to the gluing developing silicon wafer.

[0004] Chinese patent document CN220005156U discloses a gluing developing machine cleaning device, which comprises a cleaning box and a developing machine gluing developing silicon wafer. The developing machine gluing developing silicon wafer is arranged in the interior of the cleaning box. The interior of the cleaning box is provided with a cleaning mechanism and a positioning mechanism. The lower part of the left side of the cleaning box is provided with a drain port. The above-mentioned patent document can preliminarily limit the upper part and the bottom part of the developing machine gluing developing silicon wafer by arranging a fixed frame and a positioning frame. The upper part of the two sides of the developing machine gluing developing silicon wafer can be clamped between two clamping plates by the cooperation of a screw rod, a push plate, a clamping plate, an elastic air bag, a guide rod, a guide block and a limiting groove, thereby increasing the stability of the developing machine gluing developing silicon wafer during spray cleaning. The elasticity of the elastic air bag can reduce the force of clamping the developing machine gluing developing silicon wafer by the two clamping plates, thereby preventing the two clamping plates from clamping too hard and causing damage to the developing machine gluing developing silicon wafer.

[0005] The above-mentioned patent document can prevent the two clamping plates from clamping too hard and causing damage to the developing machine gluing developing silicon wafer during implementation, but it cannot rotate the cleaned silicon wafer to quickly spin dry. If the silicon wafer is taken off before it is completely dried, it may leave stains and marks on its surface, which requires a lot of time to dry after cleaning the silicon wafer, resulting in low work efficiency of the device. UTILITY MODEL CONTENTS

[0006] The main purpose of the utility model is to provide a gluing developing machine cleaning device, which can effectively solve the problem of not being able to rotate the cleaned silicon wafer to quickly spin dry.

[0007] In order to achieve the above object, the technical scheme adopted by the utility model is:

[0008] A cleaning device of a coating and developing machine, comprising a box, an annular groove is formed in the middle of the bottom wall of the inner cavity of the box, a flushing assembly is fixedly connected to the left end and the right end of the outer surface of the box, a mounting bracket is fixedly connected to the left part of the upper end of the outer surface of the box, a driving assembly is fixedly connected to the middle of the mounting bracket, a transmission mechanism is rotatably connected to the middle of the upper end of the outer surface of the box, the lower right side of the driving assembly is meshingly connected to the upper left side of the transmission mechanism, a bearing mechanism is rotatably connected to the middle of the bottom wall of the inner cavity of the box, the outer upper side of the bearing mechanism is fixedly connected to the lower part of the transmission mechanism, a limiting mechanism is fixedly connected to the inner lower side of the bearing mechanism, a clamping mechanism is fixedly connected to the inner upper side of the bearing mechanism, and the side, where the limiting mechanism and the clamping mechanism are close to each other, is movably connected to a developing machine coating and developing silicon wafer I.

[0009] Preferably, the flushing assembly comprises two groups of shunt pipes, a plurality of spray heads are fixedly connected to the side, where the outer surfaces of the two groups of shunt pipes are close to each other, in a spaced distribution manner, a water delivery pipe is fixedly connected to the middle of the side, where the outer surfaces of the two groups of shunt pipes are away from each other, and a water inlet pipe is fixedly connected to the rear side of the middle of the water delivery pipe.

[0010] Preferably, the driving assembly comprises a motor, a driving gear is fixedly connected to the output end of the lower part of the motor, and the outer surface of the motor is fixedly connected to the middle of the inner cavity of the mounting bracket.

[0011] Preferably, the transmission mechanism comprises a connecting column, a driven gear is fixedly connected to the upper part of the outer surface of the connecting column, a connecting disc is fixedly connected to the lower end of the outer surface of the connecting column, and the outer surface of the driven gear is meshingly connected to the outer surface of the driving gear.

[0012] Preferably, the bearing mechanism comprises a bearing frame, a through hole, which is in communication with the outside, is symmetrically formed in the left part and the right part of the outer surface of the bearing frame, a guide ring is fixedly connected to the lower end of the outer surface of the bearing frame, the upper end of the outer surface of the bearing frame is fixedly connected to the lower end of the outer surface of the connecting disc, and the lower part of the outer surface of the guide ring is rotatably connected to the inner cavity of the annular groove.

[0013] Preferably, the limiting mechanism comprises a bottom disc I, a limiting frame I is fixedly connected to the middle of the upper end of the outer surface of the bottom disc I, an arc-shaped groove is formed in the middle of the inner cavity of the limiting frame I, and the lower end of the outer surface of the bottom disc I is fixedly connected to the bottom wall of the inner cavity of the bearing frame.

[0014] Preferably, the clamping mechanism comprises a top disc two, the outer surface of the lower middle of the top disc two is fixedly connected with a limiting box two, the lower inner cavity of the limiting box two is slidably connected with a clamping box, the outer surface of the upper end of the clamping box is fixedly connected with a plurality of springs, and the upper part of the outer surface of the plurality of springs is fixedly connected with the lower middle of the outer surface of the top disc two, and the outer surface of the upper end of the top disc two is fixedly connected with the inner cavity top wall of the bearing frame.

[0015] Compared with the prior art, the utility model has the advantages of the following beneficial effects:

[0016] 1, the utility model discloses a washing assembly can realize the effect of being convenient for the clamping mechanism to wash, clean, through the driving assembly can realize the effect of driving transmission mechanism rotates, can drive the bearing mechanism to rotate through transmission mechanism's effect, improve the practicality of device, through the bearing mechanism can realize the effect of bearing to the limiting mechanism and clamping mechanism, under the action of limiting mechanism can realize the position of the position of the development machine rubber coating development silicon wafer one place is limited, and through the clamping mechanism can be clamped and fixed to the development machine rubber coating development silicon wafer one that is placed in the limiting mechanism inside, improve the practicality and universality of device.

[0017] 2, the utility model in the development machine rubber coating development silicon wafer one is pushed to the inside along the arc groove and the clamping box inner cavity front portion, when the development machine rubber coating development silicon wafer one is completely entered the limiting frame one and the clamping box inner cavity middle part, the upper portion of the development machine rubber coating development silicon wafer one will push the clamping box and move upwards and compress a plurality of springs, so that when the development machine rubber coating development silicon wafer one is completely entered the limiting frame one inner cavity and the clamping box inner cavity middle part, a plurality of compressed springs will push the clamping box and move downwards along the limiting frame two inner wall through the resilience of its generation, so that the development machine rubber coating development silicon wafer one is stably clamped between the limiting frame one and the clamping box inner cavity, further avoid the phenomenon that the development machine rubber coating development silicon wafer one shakes and shifts during cleaning and following the bearing frame rotates, improve the practicality and universality of device. ACCURACY OF DRAWINGS

[0018] Figure 1 It is the whole structure schematic diagram of the utility model;

[0019] Figure 2 It is the washing assembly, driving assembly, transmission mechanism schematic diagram of the utility model;

[0020] Figure 3 It is the bearing mechanism, limiting mechanism structure schematic diagram of the utility model;

[0021] Figure 4 It is the clamping mechanism structure schematic diagram of the utility model.

[0022] In the figure: 1, box; 11, annular groove; 2, flushing assembly; 21, shunt; 22, spray head; 23, water pipe; 24, water inlet pipe; 3, mounting bracket; 4, drive assembly; 41, motor; 42, driving gear; 5, transmission mechanism; 51, connecting column; 52, driven gear; 53, connecting disc; 6, bearing mechanism; 61, bearing frame; 62, through hole; 63, guide ring; 7, limiting mechanism; 71, bottom plate one; 72, limiting frame one; 73, arc-shaped groove; 8, clamping mechanism; 81, top plate two; 82, limiting frame two; 83, clamping frame; 84, spring; 9, developing machine rubber coating and developing silicon wafer one. DETAILED DESCRIPTION

[0023] In order to make the technical means, creative features, purposes and effects of the utility model easy to understand, the utility model is further described below in combination with specific embodiments.

[0024] As shown in Figure 1 , a cleaning device for rubber coating and developing machine includes a box 1, an annular groove 11 is formed in the middle of the bottom wall of the inner cavity of the box 1, a flushing assembly 2 is fixedly connected to the left and right ends of the outer surface of the box 1, which can facilitate the flushing and cleaning of the clamping mechanism 8, a mounting bracket 3 is fixedly connected to the left part of the upper end of the outer surface of the box 1, a drive assembly 4 is fixedly connected to the middle of the mounting bracket 3, which can drive the transmission mechanism 5 to rotate, a transmission mechanism 5 is rotatably connected to the middle of the upper end of the outer surface of the box 1, which can drive the bearing mechanism 6 to rotate, the lower right side of the drive assembly 4 is meshingly connected to the upper left side of the transmission mechanism 5, a bearing mechanism 6 is rotatably connected to the middle of the bottom wall of the inner cavity of the box 1, which can bear the limiting mechanism 7 and the clamping mechanism 8, the outer upper side of the bearing mechanism 6 is fixedly connected to the lower part of the transmission mechanism 5, the limiting mechanism 7 is fixedly connected to the inner lower side of the bearing mechanism 6, which can limit the position of the developing machine rubber coating and developing silicon wafer one 9, the clamping mechanism 8 is fixedly connected to the inner upper side of the bearing mechanism 6, which can clamp and fix the developing machine rubber coating and developing silicon wafer one 9 placed in the limiting mechanism 7, and the developing machine rubber coating and developing silicon wafer one 9 is movably connected to the side close to the clamping mechanism 8 of the limiting mechanism 7.

[0025] In order to achieve the purpose of facilitating the flushing and cleaning of the clamping mechanism 8, referring to Figure 2 , the flushing assembly 2 includes two groups of shunts 21, a plurality of spray heads 22 are fixedly connected to the side close to each other of the outer surface of the two groups of shunts 21 at intervals, a water pipe 23 is fixedly connected to the middle of the side away from each other of the outer surface of the two groups of shunts 21, and a water inlet pipe 24 is fixedly connected to the middle rear side of the water pipe 23.

[0026] When the surface of the developing machine coated and developed silicon wafer 9 clamped in the inner cavity of the limiting frame 72 and the clamping frame 83 needs to be cleaned, the water inlet pipe 24 is connected with the water source outside, then the water connected will be transported to the inner cavity of the two groups of shunt pipe 21 through the water pipe 23, and then sprayed out through a plurality of corresponding spray heads 22, so that the developing liquid and dust and other impurities attached to the surface of the developing machine coated and developed silicon wafer 9 can be fully cleaned.

[0027] In order to realize the rotating effect of the driving mechanism 5, referring to Figure 2 , the driving assembly 4 comprises a motor 41, and the lower output end of the motor 41 is fixedly connected with a driving gear 42, which can realize meshing with the driven gear 52 to drive the rotating of the connecting disc 53, and the outer surface of the motor 41 is fixedly connected with the inner cavity of the mounting frame 3.

[0028] In order to realize the rotating effect of the bearing mechanism 6, referring to Figure 2 , the driving mechanism 5 comprises a connecting column 51, the outer surface of the connecting column 51 is fixedly connected with a driven gear 52 at the upper part, the outer surface of the connecting column 51 is fixedly connected with a connecting disc 53 at the lower end, and the outer surface of the driven gear 52 is meshed with the outer surface of the driving gear 42.

[0029] When the motor 41 is driven, the driving gear 42 will start to rotate, so that the driven gear 52 is meshed with the driven gear 52 to drive the connecting disc 53 and the driven gear 52 to rotate synchronously, so as to drive the bearing frame 61 to rotate.

[0030] In order to realize the bearing effect of the limiting mechanism 7 and the clamping mechanism 8, referring to Figure 3 , the bearing mechanism 6 comprises a bearing frame 61, the outer surface of the bearing frame 61 is symmetrically provided with a through hole 62 communicated with the outside at the left and right parts, and the outer surface of the bearing frame 61 is fixedly connected with a guide ring 63 at the lower end, which can realize the guiding and bearing effect of the rotation of the bearing frame 61, and the outer surface of the bearing frame 61 is fixedly connected with the outer surface of the connecting disc 53 at the upper end, and the outer surface of the guide ring 63 is rotatably connected with the inner cavity of the annular groove 11 at the lower part.

[0031] In order to realize the limiting effect of the position of the developing machine coated and developed silicon wafer 9, referring to Figure 3 , the limiting mechanism 7 comprises a bottom plate 71, and the outer surface of the bottom plate 71 is fixedly connected with a limiting frame 72 at the upper end of the middle part, which can realize the limiting effect of the developing machine coated and developed silicon wafer 9 placed in the inner cavity, avoiding displacement, and the inner cavity of the limiting frame 72 is provided with an arc-shaped groove 73 at the middle part, which can realize the effect of placing the developing machine coated and developed silicon wafer 9 in the inner cavity of the limiting frame 72, and the developing machine coated and developed silicon wafer 9 is placed in the inner cavity of the limiting frame 72, and the outer surface of the bottom plate 71 is fixedly connected with the inner cavity bottom wall of the bearing frame 61 at the lower end.

[0032] In order to achieve the purpose of clamping and fixing the developing machine rubberized developing silicon wafer one 9 placed inside the limiting mechanism 7, referring to Figure 4 , the clamping mechanism 8 comprises a top disc two 81, the outer surface of the top disc two 81 is fixedly connected with a limiting frame two 82 at the middle of the lower end, the inner cavity of the limiting frame two 82 is slidably connected with a clamping frame 83, the outer surface of the clamping frame 83 is fixedly connected with a plurality of springs 84 at the upper end, and the outer surface of the plurality of springs 84 is fixedly connected with the outer surface of the top disc two 81 at the upper end, and the outer surface of the top disc two 81 is fixedly connected with the inner cavity top wall of the bearing frame 61.

[0033] When the developing machine rubberized developing silicon wafer one 9 is placed in the inner cavity of the limiting frame one 72 and the clamping frame 83, the developing machine rubberized developing silicon wafer one 9 will extrude the clamping frame 83 to move upward along the inner cavity of the limiting frame two 82, and when the developing machine rubberized developing silicon wafer one 9 is completely clamped into the inner cavity of the limiting frame one 72 and the clamping frame 83, the clamping frame 83 will be pushed downward by the elastic force of the plurality of springs 84 to press the developing machine rubberized developing silicon wafer one 9, so that the developing machine rubberized developing silicon wafer one 9 can be stably clamped between the inner cavities of the limiting frame one 72 and the clamping frame 83.

[0034] It should be noted that the model of the motor 41 in the utility model is yzs132s2-2, and the specific installation method, circuit connection mode and control method of the motor 41 all belong to conventional design, which will not be described in detail.

[0035] The working principle of the utility model is as follows: when it is necessary to clean the developing machine rubberized developing silicon wafer one 9, first, the developing machine rubberized developing silicon wafer one 9 is made to completely enter the inner cavity middle part of the limiting frame one 72 along the inner cavity front part of the arc-shaped groove 73, at this time, the elastic force generated by the compressed plurality of springs 84 will drive the clamping frame 83 to move downward, so that the clamping frame 83 and the limiting frame one 72 stably clamp the developing machine rubberized developing silicon wafer one 9 between the inner cavities, then the water inlet pipe 24 is connected with the water source outside, the connected water will be delivered to the inner cavities of the two groups of shunt pipes 21 through the water delivery pipe 23 and sprayed onto the surface of the developing machine rubberized developing silicon wafer one 9 through the plurality of spray heads 22, so that the residual developing solution and the attached dust and other impurities on the outer surface of the developing machine rubberized developing silicon wafer one 9 are fully cleaned, after the flushing is completed, the power supply of the driving motor 41 is turned on, the driven gear 52 is engaged with the driving gear 42 to drive and the bearing frame 61 is connected through the connecting disc 53, so that the bearing frame 61 can be driven to rotate, so that the developing machine rubberized developing silicon wafer one 9 clamped between the inner cavities of the limiting frame one 72 and the clamping frame 83 can rotate synchronously with the bearing frame 61, and then the air flow rate around the developing machine rubberized developing silicon wafer one 9 can be accelerated in the rotating process, so that the developing machine rubberized developing silicon wafer one 9 can be quickly spun dry by the bearing frame 61.

[0036] The basic principle and main features of the present application and the advantages of the present application are shown and described above. Those skilled in the art should understand that the present application is not limited by the above examples, and the above examples and descriptions in the specification are only to illustrate the principles of the present application. Without departing from the spirit and scope of the present application, various changes and improvements can be made to the present application, and these changes and improvements all fall within the scope of the present application. The scope of protection of the present application is defined by the appended claims and their equivalents.

Claims

1. A gumming and developing machine cleaning device comprising a cabinet (1), characterized in that: The middle part of the bottom wall of the inner cavity of the box (1) is provided with an annular groove (11), the left end and the right end of the outer surface of the box (1) are fixedly connected with a flushing assembly (2), the left part of the upper end of the outer surface of the box (1) is fixedly connected with a mounting bracket (3), the middle part of the mounting bracket (3) is fixedly connected with a driving assembly (4), the upper end of the outer surface of the box (1) is rotatably connected with a transmission mechanism (5), and the lower right side of the driving assembly (4) is meshingly connected with the upper left side of the transmission mechanism (5), the middle part of the bottom wall of the inner cavity of the box (1) is rotatably connected with a bearing mechanism (6), and the outer upper side of the bearing mechanism (6) is fixedly connected with the lower part of the transmission mechanism (5), the inner lower side of the bearing mechanism (6) is fixedly connected with a limiting mechanism (7), the inner upper side of the bearing mechanism (6) is fixedly connected with a clamping mechanism (8), and the side close to each other of the limiting mechanism (7) and the clamping mechanism (8) is movably connected with a developing machine rubber coating developing silicon wafer (9).

2. A cleaning device for a gluing and developing machine according to claim 1, characterized in that: The flushing assembly (2) comprises two groups of shunt pipes (21), a plurality of spray heads (22) are fixedly connected to the sides close to each other of the outer surfaces of the two groups of shunt pipes (21) at intervals, and a water delivery pipe (23) is fixedly connected to the middle parts of the sides away from each other of the outer surfaces of the two groups of shunt pipes (21), and the middle part of the rear side of the water delivery pipe (23) is fixedly connected with a water inlet pipe (24).

3. The cleaning device for a gluing and developing machine according to claim 1, characterized in that: The driving assembly (4) comprises a motor (41), and the lower output end of the motor (41) is fixedly connected with a driving gear (42), and the outer surface of the motor (41) is fixedly connected with the middle part of the inner cavity of the mounting bracket (3).

4. The cleaning device for a gluing and developing machine according to claim 2, characterized in that: The transmission mechanism (5) comprises a connecting column (51), the outer surface of the connecting column (51) is fixedly connected with a driven gear (52), the outer surface of the connecting column (51) is fixedly connected with a connecting disc (53), and the outer surface of the driven gear (52) is meshingly connected with the outer surface of the driving gear (42).

5. A cleaning device for a gluing and developing machine according to claim 4, characterized in that: The bearing mechanism (6) comprises a bearing frame (61), the outer surfaces of the left part and the right part of the bearing frame (61) are symmetrically provided with through holes (62) in communication with the outside, the outer surface of the lower end of the bearing frame (61) is fixedly connected with a guide ring (63), and the outer surface of the upper end of the bearing frame (61) is fixedly connected with the outer surface of the lower end of the connecting disc (53), and the outer surface of the lower part of the guide ring (63) is rotatably connected with the inner cavity of the annular groove (11).

6. A cleaning device for a gluing and developing machine according to claim 5, characterized in that: The limiting mechanism (7) comprises a bottom disc (71), the outer surface of the middle part of the upper end of the bottom disc (71) is fixedly connected with a limiting frame (72), the inner cavity of the limiting frame (72) is provided with an arc-shaped groove (73) in the middle part, and the outer surface of the lower end of the bottom disc (71) is fixedly connected with the inner cavity bottom wall of the bearing frame (61).

7. A cleaning device for a gluing and developing machine according to claim 5, characterized in that: The clamping mechanism (8) comprises a top disc two (81), the outer surface of the lower end of the middle of the top disc two (81) is fixedly connected with a limiting box two (82), the inner cavity of the limiting box two (82) is slidably connected with a clamping frame (83), the outer surface of the upper end of the clamping frame (83) is fixedly connected with a plurality of springs (84), and the outer surface of the upper end of the plurality of springs (84) is fixedly connected with the outer surface of the lower end of the middle of the top disc two (81), and the outer surface of the upper end of the top disc two (81) is fixedly connected with the inner cavity top wall of the bearing frame (61).

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