Gas supply system of semiconductor film forming equipment

Abstract

The utility model provides a gas supply system of semiconductor film forming equipment, which comprises a gas source for providing required process gas for a reaction cavity of the equipment; one end of the gas supply pipeline is connected with the gas source, the other end of the gas supply pipeline is connected with the reaction cavity, and a switch valve and a mass flow controller are arranged on the gas supply pipeline; one end of the air exhaust pipeline is connected to the air supply pipeline, the other end of the air exhaust pipeline is connected with a vacuum generation device, and a manual switch valve and a safety protection device are arranged on the air exhaust pipeline. According to the system, the safety protection device is introduced to form complementation with the manual switching valve, so that the problem of gas leakage caused by misoperation or equipment failure is effectively prevented. The dual control mechanism remarkably improves the safety in the gas supply process and ensures that the process gas can be stably and accurately conveyed to the reaction cavity, so that the product rejection rate caused by the gas supply problem in the production process is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor processing especially relates to a kind of gas supply system of semiconductor film-forming equipment. BACKGROUND

[0002] In the current LamVectorExtreme equipment, there are significant deficiencies in the design of gas tank, which significantly hinders the effective transmission and efficient use of process gas. Specifically, the design flaws lead to the risk of accidental diversion of process gas to the gas tank exhaust line during the flow to the reaction chamber. This gas diversion phenomenon directly reduces the amount of reaction gas entering the reaction chamber, thereby causing the film thickness to not meet the standard requirements, and in severe cases, even causing the wafer to be scrapped, posing a serious challenge to production efficiency and product quality. Further investigation into its root cause, in the prior art, only a single manual valve is used as an isolation means between the exhaust line and the final valve, which has a great safety hazard. If the manual valve cannot be tightly closed due to operation errors, wear or aging, etc., the reaction gas will leak through these small gaps to the exhaust line, seriously affecting the process stability. In addition, during the calibration process of the mass flow controller, the error flow data generated by gas diversion is mistakenly considered normal, and the system cannot trigger an alarm, making it difficult to discover and correct the problem in a timely manner. SUMMARY

[0003] To solve all or part of the problems of the above prior art, the utility model provides a kind of gas supply system of semiconductor film-forming equipment, by introducing safety protection device, with manual switch valve forms double control mechanism, effectively avoid the gas leakage problem caused by manual switch valve operation error, wear or aging.

[0004] To achieve the above purpose, the utility model provides the following technical scheme:

[0005] A kind of gas supply system of semiconductor film-forming equipment, comprising:

[0006] Gas source, provides the required process gas for the reaction chamber of equipment;

[0007] Gas supply pipeline, one end is connected to the gas source, the other end is connected to the reaction chamber, and the gas supply pipeline is provided with a switch valve and a mass flow controller;

[0008] Exhaust line, one end is connected to the gas supply pipeline, the other end is connected to vacuum generating device, and the exhaust line is provided with a manual switch valve and a safety protection device.

[0009] The safety protection device is a pneumatic switch valve, and the gas reaches the vacuum generating device after passing through the manual switch valve and the pneumatic switch valve in sequence.

[0010] The pneumatic on-off valve comprises a valve body and a pneumatic actuator, the valve body is installed on the gas extraction pipeline, and the pneumatic actuator is used for opening and closing the valve body.

[0011] The safety protection device is an airflow monitoring device connected with a control system, and the airflow monitoring device sends a warning signal when detecting that gas passes through the gas extraction pipeline.

[0012] The gas source comprises at least one group of gas supply tanks, and the gas source provides combustible gas, non-combustible gas or a mixture of the two types of gas.

[0013] The gas source comprises a first group of gas supply tanks and a second group of gas supply tanks, the first group of gas supply tanks is connected with the reaction cavity through a first gas supply pipeline, and the second group of gas supply tanks is connected with the reaction cavity through a second gas supply pipeline.

[0014] The gas extraction pipeline is divided into a first gas extraction pipeline and a second gas extraction pipeline, one end of the first gas extraction pipeline is connected to the first gas supply pipeline, one end of the second gas extraction pipeline is connected to the second gas supply pipeline, and the other ends of the first gas extraction pipeline and the second gas extraction pipeline are merged into one gas extraction pipeline.

[0015] The first gas extraction pipeline and the second gas extraction pipeline are both provided with on-off valves.

[0016] The first gas supply pipeline is provided with a first mass flow controller at one end close to the first group of gas supply tanks, and on-off valves are arranged on the pipelines at both ends of the first mass flow controller; the second gas supply pipeline is provided with a second mass flow controller at one end close to the second group of gas supply tanks, and on-off valves are arranged on the pipelines at both ends of the second mass flow controller.

[0017] The pipeline connected with the reaction cavity is provided with a final valve at one end.

[0018] The utility model has at least the following beneficial effects:

[0019] 1) By introducing a pneumatic on-off valve as a safety protection device, and forming a double control mechanism with a manual on-off valve, the problem of gas leakage caused by operation error, wear or aging of the manual on-off valve is effectively avoided. This design significantly enhances the safety of the gas transmission process, ensuring the stable supply of process gas. At the same time, the precise control of the pneumatic on-off valve also reduces the risk of gas shunting, ensuring the amount of reaction gas entering the reaction cavity, thereby effectively avoiding the problem of non-standard film thickness and improving the product qualification rate.

[0020] 2) By integrating the gas flow monitoring device and control system connected, real-time monitoring of the gas flow state in the exhaust pipe, once detected abnormal gas flow, the system will immediately trigger the alarm mechanism to prevent the start of the reaction process, thereby effectively preventing potential safety risks. At the same time, the accuracy of the mass flow controller in the correction process is also guaranteed, avoiding the error flow data caused by gas shunt resulting in false positives. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to more clearly illustrate the technical scheme in the specific embodiments of the present application, the following will be a brief description of the drawings needed to be used in the embodiment description, obviously, the following described drawings are only some embodiments of the present application, for those skilled in the art, without creative labor, according to these drawings, other drawings can also be obtained.

[0022] Figure 1 For the structure diagram of the gas supply system of the semiconductor film forming equipment in the embodiment 1 of the present application.

[0023] Figure 2 For the structure diagram of the gas supply system of the semiconductor film forming equipment in the embodiment 2 of the present application.

[0024] The drawings are as follows: 1-gas source; 101-first group of gas supply tank; 102-second group of gas supply tank; 2-gas supply pipeline; 201-first gas supply pipeline; 2011-first mass flow controller; 202-second gas supply pipeline; 2021-second mass flow controller; 203-final valve; 3-exhaust pipe; 301-hand-operated switch valve; 302-safety protection device; 303-first exhaust pipe; 304-second exhaust pipe; 4-vacuum generating device; 5-reaction cavity. DETAILED DESCRIPTION

[0025] The technical scheme in the specific embodiments of the present application will be described clearly and completely below, obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of the present application.

[0026] The implementation of the present application will be described in detail below in combination with specific embodiments.

[0027] Embodiment 1

[0028] In the embodiment of the present application, combined with reference Figure 1As shown, a gas supply system of a semiconductor film forming equipment is provided, which is designed to optimize the supply and control of process gases, ensuring the efficiency and stability of the film forming process. The system mainly includes a gas source 1, a gas supply pipeline 2 and an exhaust pipeline 3. The gas source 1 serves as the power source of the entire system, responsible for continuously and stably providing the required various types of process gases for the reaction chamber 5 of the equipment, which is the basis to ensure the film forming quality. The gas supply pipeline 2 serves as the connecting bridge between the gas source 1 and the reaction chamber 5, with one end connected to the gas source 1 and the other end directly leading to the reaction chamber 5, ensuring that the process gas can be smoothly and unobstructedly delivered to the inside of the reaction chamber 5. On the gas supply pipeline 2, a switch valve and a mass flow controller are arranged. The switch valve is used to cut off the supply of gas when necessary, to realize flexible control of the system. The mass flow controller can accurately monitor and adjust the gas flow through the pipeline, ensuring that the reaction chamber 5 obtains the appropriate gas concentration and flow, which is crucial to improve the film forming efficiency and quality. The main function of the exhaust pipeline 3 is to empty the residual air in the gas supply pipeline 2, to ensure the purity of the process gas and the stability of the reaction environment. One end of the exhaust pipeline 3 is connected to the gas supply pipeline 2, and the other end is connected to a vacuum generating device 4. By means of vacuumizing, impurities and air in the pipeline are effectively removed. A manual switch valve 301 is installed on the exhaust pipeline 3, which is controlled by the operator according to the actual needs. In order to further enhance the safety and reliability of the system, the utility model also specially adds a safety protection device 302 on the exhaust pipeline 3, to prevent potential risks such as diversion of process gas to the exhaust pipeline 3.

[0029] In the present embodiment, the safety protection device 302 adopts a pneumatic on-off valve. The gas flow path first passes through the manual on-off valve 301, then through the pneumatic on-off valve, and finally reaches the vacuum generating device 4. The pneumatic on-off valve is composed of a valve body and a pneumatic actuator. The valve body is fixedly installed on the gas extraction pipeline 3, while the pneumatic actuator is responsible for controlling the opening and closing actions of the valve body to ensure accurate control and safety of gas flow. When the gas extraction or purging operation is required, the specific operation process is as follows: first, the operator needs to manually open the manual on-off valve 301, and then drive the valve body of the pneumatic on-off valve to open through the pneumatic actuator; after the operation is completed, the valve body of the pneumatic on-off valve is closed first by using the pneumatic actuator, and then the manual on-off valve 301 is closed. The design of this operation sequence significantly reduces the risk of operation errors caused by forgetting to close the manual on-off valve 301 or not removing the pneumatic actuator in time. In addition, in order to further improve the safety and convenience of the operation, an automatic monitoring and feedback mechanism can be integrated in the design of the pneumatic on-off valve. This mechanism can automatically send a signal to prompt the operator to close the manual on-off valve 301 after the operation of the pneumatic actuator is completed, thereby further reducing the possibility of human negligence. In other specific embodiments, the safety protection device 302 can have different configurations. For example, a gas flow monitoring device can be integrated, which is used to monitor the gas flow state in the gas extraction pipeline in real time. The gas flow monitoring device is connected to the control system. When the presence of gas flow in the pipeline is detected, the system will trigger an alarm mechanism to prevent the start of the reaction process. Only after the alarm is confirmed and eliminated, the reaction process can continue, thereby ensuring the safety of the operation.

[0030] The gas source 1 is used to provide a supply of gas including flammable gas, non-flammable gas or a mixture of the two types of gas and other gases. In this embodiment, the gas source 1 includes two independent groups of gas supply tanks: the first group of gas supply tanks 101 and the second group of gas supply tanks 102. The first group of gas supply tanks 101 is connected to the reaction chamber 5 through the first gas supply pipeline 201, and the second group of gas supply tanks 102 is connected to the reaction chamber 5 through the second gas supply pipeline 202. The gas extraction pipeline 3 is divided into two independent paths: the first gas extraction pipeline 303 and the second gas extraction pipeline 304. One end of the first gas extraction pipeline 303 is directly connected to the first gas supply pipeline 201, and the other end of the second gas extraction pipeline 304 is connected to the second gas supply pipeline 202. Such a layout allows each gas extraction pipeline 3 to handle gas from different gas supply pipelines 2, thereby achieving more precise gas control. Further, the other ends of the first gas extraction pipeline 303 and the second gas extraction pipeline 304 converge and merge into a common gas extraction pipeline 3. This merging design allows the gas from the two gas extraction pipelines 3 to be uniformly connected to the vacuum generating device 4 after the merging point, optimizing the gas exhaust process, reducing the complexity of the system, and improving the overall operating efficiency. Switching valves are provided on the first gas extraction pipeline 303 and the second gas extraction pipeline 304, and the main function of these switching valves is to control the gas flow in each pipeline to adapt to different process requirements or safety requirements.

[0031] In this embodiment, the first gas supply pipeline 201 and the second gas supply pipeline 202 are provided with mass flow controllers near the corresponding ends of the gas supply tanks. Specifically, the first gas supply pipeline 201 is provided with a first mass flow controller 2011 near the end of the first group of gas supply tanks 101, and the second gas supply pipeline 202 is provided with a second mass flow controller 2021 near the end of the second group of gas supply tanks 102. In order to ensure the safety and reliability of the system, switching valves are provided on both ends of the pipeline of these mass flow controllers, so that the gas flow can be quickly cut off when needed. The end of the gas supply pipeline 2 connected to the reaction chamber 5 is provided with a final valve 203, which ensures the final control of the gas flow. During the non-reaction process, the final valve 203 ensures that the process gas does not enter the reaction chamber 5, thereby avoiding unnecessary gas consumption and potential safety risks.

[0032] Embodiment 2

[0033] The difference from embodiment 1 is that in this embodiment, the gas source 1 is designed with six groups of gas supply tanks, in combination with reference to Figure 2As shown in the figure, three groups are dedicated to supply combustible gas, and the other three groups are dedicated to supply non-combustible gas. Such design allows the system to flexibly select and supply different types of gas according to different process requirements. Specifically, the gas supply pipes 2 of the three groups of combustible gas supply tanks are merged into one pipe through a merging point and connected to the reaction cavity 5; similarly, the gas supply pipes 2 of the three groups of non-combustible gas supply tanks are also merged into one pipe through a merging point and connected to the reaction cavity 5. In order to ensure the safety and accuracy of the operation of the system, each group of gas supply tanks is provided with an independent mass flow controller and a switch valve on the gas supply pipe 2.

[0034] The utility model discloses through the innovative structural design, the supply and control process of process gas have been optimized significantly, and then the efficiency and stability of film forming process have been ensured. Specifically, the system introduces pneumatic switch valve or airflow monitoring device as safety protection device 302, and forms double control mechanism with manual switch valve 301, and this design reduces the product scrappage and personnel operation error risk caused by improper operation (such as forgetting to close manual switch valve 301 or close not strictly) greatly, and the safety and operation reliability of system have been enhanced significantly. This design not only greatly improves the stability of gas transmission and gas utilization efficiency, but also further optimizes the control precision of wafer film thickness, realizes the high consistency. Meanwhile, through effectively preventing the leakage problem of reaction gas, the data accuracy of mass flow controller in the calibration process has been ensured, so as to improve the overall production efficiency and product quality comprehensively.

[0035] In summary, the design of the utility model revolutionarily improves the gas supply system of semiconductor film forming equipment, and provides solid guarantee for efficient and high-quality film forming process.

[0036] It should be noted that, for those skilled in the art, without departing from the principles of the utility model, the utility model can be improved and modified in several ways, and these improvements and modifications also fall within the scope of protection of the claims of the utility model.

Claims

1. A gas supply system for a semiconductor film forming apparatus, characterized by comprising: The utility model relates to a kind of safety protection device for gas supply pipeline, including: Gas source (1) provides required process gas for the reaction cavity (5) of equipment; Gas supply pipeline (2) is connected to the gas source (1) at one end, and is connected to the reaction cavity (5) at the other end, and the gas supply pipeline (2) is provided with on-off valve and mass flow controller; Exhaust pipe (3) is connected to the gas supply pipeline (2) at one end, and is connected to vacuum generating device (4) at the other end, and the exhaust pipe (3) is provided with manual on-off valve (301) and safety protection device (302).

2. The system of claim 1, wherein, The safety protection device (302) is pneumatic on-off valve, and gas reaches the vacuum generating device (4) after passing through the manual on-off valve (301) and the pneumatic on-off valve in sequence.

3. The system of claim 2, wherein, The pneumatic on-off valve includes valve body and pneumatic actuator, the valve body is installed on the exhaust pipe (3), and the pneumatic actuator is used to open and close the valve body.

4. The system of claim 1, wherein, The safety protection device (302) is gas flow monitoring device, and the gas flow monitoring device is connected with control system, and when detecting that gas passes through in the exhaust pipe (3), the gas flow monitoring device sends warning signal.

5. The system of claim 1, wherein, The gas source (1) includes at least one set of gas supply tank;The gas source (1) provides including flammable gas, non-flammable gas or the mixture of two kinds of gas.

6. The system of claim 5, wherein, The gas source (1) includes first group gas supply tank (101) and second group gas supply tank (102), and the first group gas supply tank (101) is connected with the reaction cavity (5) by first gas supply pipeline (201), and the second group gas supply tank (102) is connected with the reaction cavity (5) by second gas supply pipeline (202).

7. The system of claim 6, wherein, The exhaust pipe (3) is divided into first exhaust pipe (303) and second exhaust pipe (304), one end of the first exhaust pipe (303) is connected to the first gas supply pipeline (201), one end of the second exhaust pipe (304) is connected to the second gas supply pipeline (202), and the other end of the first exhaust pipe (303) and the second exhaust pipe (304) converges into an exhaust pipe (3).

8. The system of claim 7, wherein, The first exhaust pipe (303) and the second exhaust pipe (304) are provided with on-off valve.

9. The system of claim 6, wherein, The first gas supply pipeline (201) is provided with first mass flow controller (2011) near one end of the first group gas supply tank (101), and the pipeline of both ends of the first mass flow controller (2011) is provided with on-off valve;The second gas supply pipeline (202) is provided with second mass flow controller (2021) near one end of the second group gas supply tank (102), and the pipeline of both ends of the second mass flow controller (2021) is provided with on-off valve.

10. The system of claim 1, wherein, The gas supply pipeline (2) is provided with final valve (203) on the pipeline of one end connected with the reaction cavity (5).

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