Gas absorption device
By designing a gas absorption device that utilizes alkaline substances to react with harmful acidic gases to generate harmless salt and water, the problem of the inability to absorb harmful gases in the kiln in a timely manner is solved, achieving the effect of effectively protecting the kiln structure and reducing environmental pollution.
Patent Information
- Application Number
- CN202423253779.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-28
- Publication Date
- 2025-12-12
- Estimated Expiration
- 2034-12-28
AI Technical Summary
Existing kiln gas treatment devices cannot absorb and neutralize harmful gases in a timely manner, nor can they effectively protect the internal structure and heating devices of the kiln, resulting in short service life of the kiln and serious environmental pollution.
Design a gas absorption device including a shell, a reaction chamber and a loading chamber. It utilizes alkaline substances such as CaO, CaCO3, and Ca(OH)2 to react with harmful acidic gases to generate harmless salt and water. The gas flow path is optimized through the structure of through holes and air inlets to improve absorption efficiency.
It effectively absorbs and neutralizes harmful acidic gases produced by the kiln, protects the internal structure of the kiln, extends the service life of the kiln, and reduces environmental pollution. It also has good high temperature resistance and corrosion resistance.
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Figure CN223654742U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of waste gas treatment, in particular to a gas absorption device. BACKGROUND
[0002] In current industrial production, process kilns such as box furnaces, bell furnaces and mesh belt furnaces will produce harmful gases with acidity and corrosiveness during high-temperature sintering process. For example, a large amount of SO2 gas will be produced during the calcination process of steel, and HF gas will be released when materials containing PVDF and other organic substances are calcined. These harmful and corrosive gases not only can cause serious corrosion to the internal structure of the kiln, the heating device and the sintered materials themselves, thereby affecting the service life of the kiln and the quality of the sintered products, but also can pose a significant threat to the environment, leading to air pollution.
[0003] Currently, some kiln environmental protection treatment devices are commonly used in the exhaust section of the kiln, including gas washing bottle tail gas treatment device (commonly used in laboratory environment), activated carbon adsorption device and alkali liquor spraying tower. Although these devices can treat harmful waste gas to some extent and reduce its emission pollution to the environment, they are all treated after the harmful and corrosive gases leave the kiln, so they cannot effectively protect the internal structure of the kiln and the heating device from corrosion.
[0004] In summary, the existing kiln gas treatment device has the problems of being unable to timely absorb and neutralize harmful gases, being unable to effectively protect the internal structure of the kiln and the heating device, and resulting in short service life of the kiln. CONTENT OF THE INVENTION
[0005] Therefore, it is necessary to provide a gas absorption device in view of the problem that the existing gas treatment device cannot timely absorb harmful gases, resulting in pollution.
[0006] A gas absorption device, comprising:
[0007] a shell, an outer portion of the shell being provided with a through hole;
[0008] a reaction chamber, provided in the shell, for loading a reaction medium, an outer periphery of the reaction chamber being provided with an air inlet hole, and a gap being present between the air inlet hole and the through hole;
[0009] a charging cavity, provided at a top portion of the shell and above the reaction chamber, the charging cavity being in communication with the reaction chamber.
[0010] In one embodiment, a reaction bin is included, the reaction bin including a feeding end and a storage end, the feeding end being in communication with the charging cavity, and the storage end being longitudinally provided below the feeding end and in communication with the feeding end, and the reaction chamber being provided in the storage end.
[0011] In one of the embodiments, the storage end is a cylindrical structure, and an opening is arranged on the top of the storage end, which is communicated with the feeding end.
[0012] In one of the embodiments, a plurality of air inlet holes are arranged on the outer periphery of the storage end in an interval manner, which are communicated with the reaction chamber.
[0013] In one of the embodiments, the storage end is a cylindrical filter screen, which is made of stainless steel.
[0014] In one of the embodiments, the feeding end is a bowl-shaped structure, and the opening diameter of the feeding end near the charging cavity is smaller than that of the feeding end near the reaction chamber.
[0015] In one of the embodiments, the charging cavity comprises a first side wall and a first bottom wall, the first bottom wall is a circular structure formed by the inward recess of the top of the housing, the first bottom wall is communicated with the feeding end, and the first side wall extends in a direction inclined to the first bottom wall.
[0016] In one of the embodiments, the opening diameter of the first side wall away from the first bottom wall is greater than that of the first bottom wall.
[0017] In one of the embodiments, a charging flap is arranged between the charging cavity and the feeding end, and the charging flap rotates to open or close the opening of the feeding end near the charging cavity.
[0018] In one of the embodiments, the housing is a cylindrical structure, and a plurality of through holes are arranged on the outer periphery of the housing in an interval manner, and the opening area of the through holes is greater than that of the air inlet holes.
[0019] The harmful acidic gas can enter the reaction chamber through the through holes of the housing and the air inlet holes of the reaction chamber, and fully contact and react with the reaction medium filled in the reaction chamber to achieve the effect of removing the acidic gas, thereby improving the efficiency of gas absorption and neutralization and reducing environmental pollution. Moreover, the device has simple structure, convenient operation and high neutralization efficiency. BRIEF DESCRIPTION OF DRAWINGS
[0020] Figure 1 It is a structural schematic diagram of the gas absorption device.
[0021] Figure 2 It is a bottom schematic diagram of the gas absorption device.
[0022] Figure 3 It is a sectional schematic diagram of the gas absorption device.
[0023] In the diagram: 1. Shell; 11. Through hole;
[0024] 2. Reaction chamber; 20. Reaction cavity; 21. Air inlet; 22. Feed inlet; 23. Storage end;
[0025] 3. Loading chamber; 31. First side wall; 32. First bottom wall; 33. Loading flap. Detailed Implementation
[0026] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.
[0027] In the description of this application, it should be understood that if terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" appear, these terms indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0028] Furthermore, where the terms "first" and "second" appear, these terms are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, where the term "multiple" appears, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0029] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.
[0030] In this application, unless otherwise expressly specified and limited, the use of descriptions such as "above" or "below" the second feature indicates that the first and second features are in direct contact or indirect contact via an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. Similarly, "below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.
[0031] It should be noted that if an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. If an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. If so, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used in this application are for illustrative purposes only and do not represent the only possible implementation.
[0032] See Figures 1 to 3 As shown, Figures 1 to 3 A schematic diagram and a cross-sectional view of the gas absorption device according to one embodiment of this application are shown respectively.
[0033] See Figure 3 An embodiment of this application provides a gas absorption device, comprising: a housing 1, a reaction chamber 20, and a loading chamber 3.
[0034] Specifically, the outer surface of the housing 1 is provided with a through hole 11. The reaction chamber 20 is disposed inside the housing 1 and is used to fill the reaction medium, such as an alkaline substance. An air inlet 21 is provided on the outer periphery of the reaction chamber 20, and there is a gap between the air inlet 21 and the through hole 11. The loading chamber 3 is disposed at the top of the housing 1 and above the reaction chamber 20, and one end of the loading chamber 3 is connected to the reaction chamber 20.
[0035] In the specific implementation process, an appropriate amount of alkaline substance is first loaded into the reaction chamber 20. Then, a gas absorption device is placed inside the kiln to ensure that the harmful acidic gas generated in the kiln can flow into the air inlet 21 through the through hole 11 and gaps. The harmful acidic gas enters the reaction chamber 20 through the air inlet 21 and reacts with the alkaline substance to produce harmless salt and water.
[0036] Furthermore, in order to maintain the continuous and effective operation of the device, it is necessary to periodically check the pH value of the alkaline substance in the reaction chamber 20. When the pH value drops to neutral or weakly acidic, it indicates that the absorption capacity of the alkaline substance is close to saturation, and the alkaline substance in the reaction chamber 20 should be replaced in time.
[0037] In one embodiment, the shell 1 is made of a high-temperature and corrosion-resistant material to ensure stability and durability even in high-temperature and corrosive gas environments. The shape and size of the shell 1 can be customized according to the specifications and needs of the specific kiln.
[0038] In one embodiment, the reaction chamber 20 is disposed within the shell 1 and is used to fill alkaline substances such as CaO, CaCO3, and Ca(OH)2. These alkaline substances can react with harmful acidic gases generated in the kiln, such as HF and SO2, to produce harmless salt and water. In this embodiment, taking the filling of CaO to absorb HF as an example, the chemical reaction equation is: CaO + 2HF → CaF2 + H2O. This reaction consumes the HF gas in the kiln and generates harmless CaF2 and H2O. Similarly, other alkaline substances (such as CaCO3, Ca(OH)2, etc.) can also react with different acidic gases to produce corresponding salts and water.
[0039] In one embodiment, the loading chamber 3 is located on the top of the housing 1 above the reaction chamber 20. One end of the loading chamber 3 is connected to the reaction chamber 20 and is used to add new alkaline substances into the reaction chamber 20. The loading chamber 3 and the reaction chamber 20 need to be sealed to ensure that the sealing of the reaction chamber 20 is not compromised when adding alkaline substances, and to prevent the leakage of unreacted harmful acidic gases.
[0040] In one embodiment, the reaction chamber 20 is provided with an air inlet 21 on its outer periphery for introducing harmful acidic gases generated in the kiln. The shell 1 is provided with a through-hole 11, through which the acidic gases flow into the reaction chamber 20, thus increasing the contact area between the acidic gases and the reaction chamber 20 and improving the absorption and neutralization efficiency. Furthermore, the shell 1 prevents alkaline substances inside the reaction chamber 20 from directly contacting the sintered materials, ensuring the absorption effect within the reaction chamber 20.
[0041] In one embodiment, there is a gap between the air inlet 21 and the through hole 11. The gap design can extend the gas flow path, slow down the gas flow rate into the reaction chamber 20, and ensure that the gas entering the reaction chamber 20 can be fully absorbed and neutralized by the alkaline substance, thereby improving the absorption efficiency.
[0042] As described above, the gas absorption device can effectively absorb and neutralize harmful acidic gases generated in the kiln, thereby protecting the internal structure of the kiln, extending its service life, and reducing environmental pollution. Simultaneously, the device also possesses excellent high-temperature resistance and corrosion resistance, enabling stable operation under harsh conditions. Furthermore, the device has a simple structure, is easy to operate, and has high absorption efficiency.
[0043] Combination Figure 2 As shown, Figure 2 This is a bottom schematic diagram of a gas absorption device provided in one embodiment of this application. In some embodiments, the gas absorption device includes a reaction chamber 2, which is used to fill an alkaline substance to react with a harmful acidic gas.
[0044] Combination Figure 3 As shown, Figure 3 This is a bottom schematic diagram of a gas absorption device provided in one embodiment of this application. In some embodiments, the reaction chamber 2 includes a feed end 22 and a storage end 23. The feed end 22 is connected to the loading chamber 3, and the storage end 23 is longitudinally disposed below the feed end 22 and connected to the feed end 22. The reaction chamber 20 is disposed inside the storage end 23.
[0045] Specifically, the storage end 23 is longitudinally positioned below and connected to the feed end 22. A reaction chamber 20 is provided within the storage end 23, where the alkaline substance filled in the reaction chamber 20 comes into full contact with and reacts with the incoming harmful acidic gas. The loading chamber 3 is located above the reaction chamber 2 and is connected to the feed end 22 of the reaction chamber 2. The loading chamber 3 is used to add new alkaline substances to the reaction chamber 2. The design of the loading chamber 3 should facilitate operation while ensuring that the sealing of the reaction chamber 2 is not compromised when adding alkaline substances.
[0046] As described above, by configuring the reaction chamber 2 with a feed end 22 and a storage end 23, and connecting it to the loading chamber 3, the addition and replacement of alkaline substances become more convenient. Simultaneously, the design of the reaction chamber 20 ensures that the alkaline substances can fully contact and react with harmful acidic gases, thereby improving absorption efficiency.
[0047] Combination Figure 3 As shown, Figure 3 This is a cross-sectional schematic diagram of a gas absorption device provided in one embodiment of this application. In some embodiments, the storage end 23 has a cylindrical structure.
[0048] Specifically, the storage end 23 is used to store the reaction medium, such as an alkaline substance. In this embodiment, the storage end 23 is configured as a cylindrical structure, which not only facilitates processing and manufacturing but also ensures sufficient contact between the gas and the reaction medium.
[0049] In one embodiment, the top of the storage end 23 is provided with an opening, which communicates with the feed end 22.
[0050] Specifically, the top of the storage end 23 is provided with an opening that is connected to the feed end 22, so that alkaline substances can smoothly enter the storage end 23 through the feed end 22 to realize the filling process of alkaline substances.
[0051] In one embodiment, the outer periphery of the storage end 23 is provided with a plurality of spaced air inlets 21, which are connected to the reaction chamber 20.
[0052] Specifically, multiple spaced air inlets 21 are provided on the outer periphery of the storage end 23. These air inlets 21 are connected to the reaction chamber 20, allowing the gas to be treated to enter the reaction chamber 20 uniformly and react with the alkaline substance.
[0053] In one embodiment, the storage end 23 is a cylindrical filter screen, and an air inlet 21 is provided on the outer periphery of the filter screen.
[0054] Specifically, the storage end 23 is equipped with a cylindrical filter screen. This filter screen is made of stainless steel, possessing excellent corrosion resistance and high-temperature resistance, enabling stable operation under harsh conditions for extended periods. Multiple spaced air inlets 21 are arranged around the outer periphery of the filter screen, which not only facilitates uniform gas distribution but also prevents alkaline particles from being carried away by the gas, thereby ensuring the reaction's effectiveness.
[0055] In one embodiment, the feed end 22 has a bowl-shaped structure, and the opening diameter of the feed end 22 on the side near the loading chamber 3 is smaller than the opening diameter of the feed end 22 on the side near the reaction chamber 20.
[0056] Specifically, the feed end 22 is configured with a bowl-shaped structure, which facilitates the smooth introduction and distribution of the reaction medium. In this embodiment, the opening diameter of the feed end 22 near the charging chamber 3 is smaller than the opening diameter near the reaction chamber 20, so that the reaction medium can gradually diffuse when entering the storage end 23 and come into more full contact with the incoming gas.
[0057] As shown above, the cylindrical storage end 23 and the bowl-shaped feed end 22 enable the reaction medium to be evenly distributed and fully contacted with the gas; the multiple spaced air inlets 21 ensure uniform gas entry; the stainless steel filter not only improves the corrosion resistance and high temperature resistance of the device, but also prevents the loss of reaction medium particles.
[0058] Combination Figure 3 As shown, Figure 3This is a cross-sectional schematic diagram of a gas absorption device provided in one embodiment of this application. In some embodiments, the loading chamber 3 includes a first sidewall 31 and a first bottom wall 32.
[0059] Specifically, the loading chamber 33 is located at the top of the gas absorption device and is the main channel for adding the reaction medium into the gas absorption device. In this embodiment, the first bottom wall 32 is a circular structure formed by the inward indentation of the top of the shell 1. The first bottom wall 32 is connected to the feed end 22, which not only facilitates the filling of the reaction medium, but also effectively prevents the reaction medium from splashing out during the addition process.
[0060] Furthermore, the first sidewall 31 extends obliquely toward the first bottom wall 32 to guide the flow of the reaction medium, allowing the reaction medium to slide smoothly into the feed end 22 along the first sidewall 31, which helps to improve the filling efficiency of the reaction medium.
[0061] In one embodiment, the opening diameter of the side of the first sidewall 31 away from the first bottom wall 32 is larger than the opening diameter of the first bottom wall 32.
[0062] Specifically, the opening diameter of the first sidewall 31 away from the first bottom wall 32 is larger than the opening diameter near the first bottom wall 32, so that the reaction medium can gradually decelerate and be evenly distributed in the shell 1 when it is poured into the loading chamber 33, thereby improving the contact efficiency between the reaction medium and the gas.
[0063] In one embodiment, a loading flap 33 is provided between the loading chamber 3 and the feed end 22. The loading flap 33 rotates to open or close the opening of the feed end 22 on the side near the loading chamber 3.
[0064] Specifically, a loading flap 33 is installed between the loading chamber 3 and the feed end 22. Rotating the loading flap 33 opens or closes the opening on the side of the feed end 22 closest to the loading chamber 3. When adding reaction medium to the device, the loading flap 33 can be easily opened for loading; while during device operation, the loading flap 33 can be closed to prevent gas leakage and loss of reaction medium.
[0065] In one embodiment, the housing 1 is a cylindrical structure.
[0066] Specifically, the housing 1 is the main body of the device, and is designed as a cylindrical structure to provide sufficient space for the reaction medium and gas to fully contact and react. In this embodiment, the housing 1 and the reaction chamber 2 are connected by a quick-release flange, which not only facilitates the replacement of materials and cleaning of the reaction chamber, but also ensures the sealing of the connection to prevent gas leakage.
[0067] In one embodiment, the outer periphery of the housing 1 is provided with a plurality of through holes 11 at intervals, and the opening area of the through holes 11 is larger than the opening area of the air inlet 21.
[0068] Specifically, multiple through holes 11 are spaced apart on the outer periphery of the housing 1. These through holes 11 are used for gas entry and exit, and also facilitate heat exchange between the inside and outside of the housing 1. Compared with the air inlet 21, the through holes 11 have a larger opening area, which can accommodate more gas and provide a larger contact area between the through holes 11 and the gas, thereby improving the gas absorption and neutralization efficiency.
[0069] In the specific implementation process, the opening of the feed end 22 is opened by the loading flap 33, and an appropriate amount of reaction medium, such as CaO, is poured into the loading chamber 3. As the kiln operates, the generated acidic corrosive gas will enter the reaction chamber 20 through the through hole 11 and the air inlet 21 on the protective shell 1, and react with the alkaline substance. The gas after the reaction is discharged to the outside of the device through the exhaust system. At the same time, the pH measuring device will monitor the acidity and alkalinity of the alkaline substance in the reaction hopper in real time. When it is found that the alkaline substance is exhausted or the reaction effect is weakened, an alarm will be issued to prompt the replacement of the alkaline substance.
[0070] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0071] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.
Claims
1. A gas absorption device, characterized in that, include: A housing (1) having a through hole (11) on its exterior; A reaction chamber (20) is disposed inside the shell (1) for filling the reaction medium. An air inlet (21) is provided on the outer periphery of the reaction chamber (20), and there is a gap between the air inlet (21) and the through hole (11). The loading chamber (3) is located at the top of the housing (1) and above the reaction chamber (20), and the loading chamber (3) is in communication with the reaction chamber (20).
2. The gas absorption device according to claim 1, characterized in that, The reaction chamber (2) includes a feed end (22) and a storage end (23). The feed end (22) is connected to the loading chamber (3). The storage end (23) is longitudinally arranged below the feed end (22) and connected to the feed end (22). The reaction chamber (20) is provided inside the storage end (23).
3. The gas absorption device according to claim 2, characterized in that, The storage end (23) is a cylindrical structure, and the top of the storage end (23) is provided with an opening, which is connected to the feed end (22).
4. The gas absorption device according to claim 3, characterized in that, The outer periphery of the storage end (23) is provided with a plurality of spaced air inlets (21), which are connected to the reaction chamber (20).
5. The gas absorption device according to any one of claims 2-4, characterized in that, The storage end (23) is a cylindrical filter screen made of stainless steel.
6. The gas absorption device according to any one of claims 2-4, characterized in that, The feed end (22) has a bowl-shaped structure, and the opening diameter of the feed end (22) near the loading chamber (3) is smaller than the opening diameter of the feed end (22) near the reaction chamber (20).
7. The gas absorption device according to any one of claims 2-4, characterized in that, The loading cavity (3) includes a first side wall (31) and a first bottom wall (32). The first bottom wall (32) is a circular structure formed by the inward indentation of the top of the shell (1). The first bottom wall (32) is connected to the feeding end (22). The first side wall (31) extends obliquely toward the direction close to the first bottom wall (32).
8. The gas absorption device according to claim 7, characterized in that, The opening diameter of the side of the first sidewall (31) away from the first bottom wall (32) is larger than the opening diameter of the first bottom wall (32).
9. The gas absorption device according to any one of claims 2-4, characterized in that, A loading flap (33) is provided between the loading chamber (3) and the feeding end (22). The loading flap (33) rotates to open or close the opening of the feeding end (22) on the side near the loading chamber (3).
10. The gas absorption device according to claim 1, characterized in that, The housing (1) is a cylindrical structure, and a plurality of through holes (11) are provided at intervals on the outer periphery of the housing (1). The opening area of the through holes (11) is larger than the opening area of the air inlet (21).