Polishing device for quartz substrate processing

By designing a polishing device that includes a base, a holding tank, a polishing roller, and a cleaning device, the problem of traditional devices being unable to clean and sanitize is solved, enabling the entire process of fixing and cleaning the quartz substrate and improving the polishing effect.

CN223656732UActive Publication Date: 2025-12-12HUBEI XIDA SEMICONDUCTOR TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202422893233.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-11-27
Publication Date
2025-12-12
Estimated Expiration
2034-11-27

AI Technical Summary

Technical Problem

Traditional polishing equipment is not convenient for cleaning quartz substrates before polishing, and cannot be effectively cleaned after polishing, which affects the polishing effect.

Method used

A polishing device is designed, which includes a base, a holding tank, a polishing roller, a suction cup, and a cleaning device. The quartz substrate is fixed by the suction cup, and the cleaning before and after polishing is achieved by using nozzles and conduits. The position of the polishing roller and nozzle is adjusted by a drive motor and a threaded rod to achieve cleaning and polishing throughout the process.

Benefits of technology

It achieves effective fixation of the quartz substrate and cleaning throughout the process, avoiding damage to the substrate caused by cleaning after polishing and improving the polishing effect.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model belongs to the field of polishing machines, and particularly relates to a polishing device for quartz substrate processing, which comprises a base, a containing groove is fixedly mounted at the top of the base, an arch-shaped mounting frame is arranged at the top of the base and positioned on the outer side of the containing groove, an L-shaped mounting frame is arranged on the inner side of the arch-shaped mounting frame, and the L-shaped mounting frame is fixedly mounted on the base. The inner side of the L-shaped mounting frame is rotationally connected with a polishing roller, and a mounting base is fixedly mounted in the containing groove. According to the quartz substrate polishing device, the containing groove is used for containing the mounting base, the mounting base and the suction cup are used for fixing a quartz substrate to be polished, follow-up polishing is facilitated, the polishing roller is used for polishing the quartz substrate, and the polishing efficiency is improved. And a connector, a guide pipe, a nozzle and a mounting rod are arranged for cleaning the quartz substrate before polishing and cleaning the quartz substrate after polishing, so that subsequent use is facilitated, and meanwhile, damage to the quartz substrate caused by subsequent cleaning is avoided.
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Description

TECHNICAL FIELD

[0001] The utility model relates to a polishing machine field, concretely is a kind of polishing device for quartz substrate processing. BACKGROUND

[0002] Quartz substrate is a kind of high-purity, high-temperature stable glass substrate, it has very good transparency to ultraviolet, therefore is widely used in laser, nanometer processing, biochip etc. field, this substrate is made of high-purity quartz glass, has excellent physical, chemical and electrical characteristics, so that it becomes ideal choice in specific application field, quartz substrate circuit board is a kind of electronic component assembly and connection technology that circuit pattern is printed on quartz substrate, further prove the importance and wide application of quartz substrate in electronic field.

[0003] Quartz substrate is often rough after production, to meet subsequent use, it is often polished, traditional polishing device is inconvenient to clean quartz substrate before polishing in actual polishing process, and it cannot be cleaned after polishing, thereby affecting polishing, cannot satisfy actual use needs. UTILITY MODEL CONTENT

[0004] In order to make up for the deficiency of prior art, the traditional polishing device is inconvenient to clean quartz substrate after polishing in actual polishing process, and it cannot be cleaned after polishing, thereby affecting polishing, the utility model provides a kind of polishing device for quartz substrate processing.

[0005] The utility model solves technical scheme that its technical problem adopts: a kind of polishing device for quartz substrate processing, including base, the top of the base is fixedly installed with containing groove, the top of the base and the outside of containing groove are provided with arcuate mounting bracket, the inside of arcuate mounting bracket is provided with L-shaped mounting bracket, the inside of L-shaped mounting bracket is rotatably connected with polishing roller, the inside of containing groove is fixedly installed with mounting seat, the top of mounting seat is fixedly installed with the suction disc of uniform distribution, the right side of the top of containing groove is provided with cleaning device, the right side of containing groove is communicated with drain pipe;

[0006] The cleaning device includes a mounting rod, the mounting rod is provided above the containing groove, the bottom of the mounting rod is communicated with the nozzle of uniform distribution, the front side of the containing groove is provided with a receiving cavity, the inside of the receiving cavity is communicated with a conduit, the top of the conduit is communicated with the bottom of the mounting rod, the left side of the conduit penetrates the containing groove and is communicated with a connector.

[0007] As preferred, the rear side of the top of the containing groove is provided with a second limiting groove, the second limiting groove is slidably connected with a second limiting block, the top of the second limiting block is fixedly connected with the bottom of the mounting rod.

[0008] Preferably, the right side of the containing groove is fixedly provided with a second driving motor, the output end of the second driving motor is fixedly provided with a second threaded rod, and the left side of the second threaded rod penetrates into the second limiting groove and is threadedly connected with the second limiting block.

[0009] Preferably, the top of the base is provided with two first limiting grooves, the first limiting grooves are slidably connected with first limiting blocks, and the top of the first limiting blocks is fixedly connected with the bottom of the arc-shaped mounting bracket.

[0010] Preferably, the right side of the base is fixedly provided with two first driving motors, the output end of the first driving motor is fixedly provided with a first threaded rod, and the left side of the first threaded rod penetrates into the first limiting groove and is threadedly connected with the first limiting block.

[0011] Preferably, the rear side of the bottom of the L-shaped mounting bracket is provided with a mounting plate, the inside of the mounting plate is fixedly provided with a positioning cylinder, and the rear side of the polishing roller penetrates into the inside of the positioning cylinder.

[0012] Preferably, the inside of the L-shaped mounting bracket is provided with two sliding grooves, the inside of the sliding grooves is slidably connected with two sliding blocks, and the bottom of the sliding blocks is fixedly connected with the top of the mounting plate.

[0013] Preferably, the rear side of the mounting plate is fixedly provided with a fixed plate, the inside of the fixed plate is provided with a bolt, the top of the bolt penetrates into the inside of the L-shaped mounting bracket and is threadedly connected with the L-shaped mounting bracket.

[0014] Preferably, the front side of the L-shaped mounting bracket is fixedly provided with a servo motor, the output end of the servo motor penetrates the L-shaped mounting bracket and is fixedly connected with the front side of the polishing roller, the top of the arc-shaped mounting bracket is fixedly provided with two electric push rods, and the output end of the electric push rods penetrates the arc-shaped mounting bracket and is fixedly connected with the top of the L-shaped mounting bracket.

[0015] The utility model discloses the beneficial effect lies in:

[0016] The utility model discloses the setting of containing groove is used for containing the mounting seat, and the setting of mounting seat and sucking disc is used for fixing the quartz substrate to be polished, and the subsequent polishing is convenient, and the setting of polishing roller is used for polishing the quartz substrate, and the setting of connecting head, pipeline, nozzle and mounting rod is used for the cleaning before polishing and the cleaning after polishing of quartz substrate, and subsequent use is convenient, and the subsequent cleaning is avoided to cause quartz substrate damage. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced. Obviously, the drawings described below are only some of the embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor on the basis of these drawings.

[0018] Figure 1 The structure schematic diagram of the present application;

[0019] Figure 2 The structure schematic diagram of the present application;

[0020] Figure 3 The structure schematic diagram of the present application;

[0021] Figure 4 The structure schematic diagram of the present application;

[0022] Figure 5 The structure schematic diagram of the present application.

[0023] In the drawings: 1, base; 2, first limiting groove; 3, sewage pipe; 4, first driving motor; 5, cleaning device; 501, second limiting groove; 502, connecting head; 503, storage cavity; 504, guide pipe; 505, second driving motor; 506, nozzle; 507, mounting rod; 508, second limiting block; 509, second threaded rod; 6, arched mounting frame; 7, electric push rod; 8, suction cup; 9, mounting seat; 10, holding tank; 11, first threaded rod; 12, polishing roller; 13, first limiting block; 14, servo motor; 15, L-shaped mounting frame; 16, sliding groove; 17, sliding block; 18, bolt; 19, fixed plate; 20, mounting plate; 21, positioning cylinder. DETAILED DESCRIPTION

[0024] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0025] The following will be described in detail Figures 1-5 The present application will be described in detail,

[0026] The present application discloses a polishing device for quartz substrate processing. Referring to Figure 1 、 Figure 3 、 Figure 4 andFigure 5 A polishing apparatus for processing quartz substrates includes a base 1, a holding tank 10 fixedly mounted on the top of the base 1, an arched mounting frame 6 disposed on the top of the base 1 and outside the holding tank 10, an L-shaped mounting frame 15 disposed on the inner side of the arched mounting frame 6, a polishing roller 12 rotatably connected to the inner side of the L-shaped mounting frame 15, a mounting seat 9 fixedly mounted inside the holding tank 10, a uniformly distributed suction cup 8 fixedly mounted on the top of the mounting seat 9, a cleaning device 5 disposed on the right side of the top of the holding tank 10, and a drain pipe 3 connected to the right side of the holding tank 10.

[0027] The cleaning device 5 includes a mounting rod 507, which is positioned above the holding tank 10. The bottom of the mounting rod 507 is connected to evenly distributed nozzles 506. A receiving cavity 503 is provided on the front side of the holding tank 10. A conduit 504 is connected inside the receiving cavity 503. The top of the conduit 504 is connected to the front side of the bottom of the mounting rod 507. The left side of the conduit 504 passes through the holding tank 10 and is connected to a connector 502.

[0028] Reference Figure 2 and Figure 4 A second limiting groove 501 is provided on the rear side of the top of the holding tank 10. A second limiting block 508 is slidably connected inside the second limiting groove 501. The top of the second limiting block 508 is fixedly connected to the bottom of the mounting rod 507. The second limiting groove 501 and the second limiting block 508 are used to fix the mounting rod 507.

[0029] Reference Figure 1 and Figure 4 A second drive motor 505 is fixedly installed on the right side of the holding tank 10. A second threaded rod 509 is fixedly installed on the output end of the second drive motor 505. The left side of the second threaded rod 509 extends into the interior of the second limiting groove 501 and is connected to the second limiting block 508 by a threaded rotation. The installation rod 507 is moved and adjusted by the cooperation between the second drive motor 505, the second limiting block 508, the second threaded rod 509 and the thread, thereby driving the nozzle 506 to move and clean the quartz substrate.

[0030] Reference Figure 1 and Figure 3 The base 1 has two first limiting grooves 2 on its top. A first limiting block 13 is slidably connected inside the first limiting groove 2. The top of the first limiting block 13 is fixedly connected to the bottom of the arched mounting frame 6. The first limiting grooves 2 and the first limiting block 13 are used to install and fix the arched mounting frame 6.

[0031] Reference Figure 1 , Figure 2 and Figure 3The right side of the base 1 is fixedly provided with two first driving motors 4, the output end of the first driving motor 4 is fixedly provided with a first threaded rod 11, the left side of the first threaded rod 11 penetrates into the inside of the first limiting groove 2 and is threadedly connected between the first limiting block 13, the cooperation between the first driving motor 4, the first threaded rod 11, the first limiting block 13 and the thread realizes the adjustment of the arch-shaped mounting frame 6, and then the movement of the polishing roller 12 is adjusted, and the quartz substrate is comprehensively polished.

[0032] With reference to Figure 1 and Figure 5 , the rear side of the bottom of the L-shaped mounting frame 15 is provided with a mounting plate 20, the inside of the mounting plate 20 is fixedly provided with a positioning cylinder 21, the rear side of the polishing roller 12 penetrates into the inside of the positioning cylinder 21, and the cooperation between the mounting plate 20 and the positioning cylinder 21 is used for limiting the front side of the polishing roller 12 to increase the stability of the polishing roller 12, and at the same time, the polishing roller 12 is convenient to maintain and replace through the dismounting.

[0033] With reference to Figure 1 and Figure 5 , the inside of the L-shaped mounting frame 15 is provided with two sliding grooves 16, the inside of the sliding groove 16 is slidably connected with two sliding blocks 17, the bottom of the sliding block 17 is fixedly connected with the top of the mounting plate 20, and the setting of the sliding groove 16 and the sliding block 17 is used for increasing the connection stability between the mounting plate 20 and the L-shaped mounting frame 15.

[0034] With reference to Figure 5 , the rear side of the mounting plate 20 is fixedly provided with a fixed plate 19, the inside of the fixed plate 19 is provided with a bolt 18, the top of the bolt 18 penetrates into the inside of the L-shaped mounting frame 15 and is threadedly connected between the L-shaped mounting frame 15, and the setting of the bolt 18 and the fixed plate 19 is used for realizing the fixation between the mounting plate 20 and the L-shaped mounting frame 15 and increasing the stability of the mounting plate 20.

[0035] With reference to Figure 1 and Figure 3 , the front side of the L-shaped mounting frame 15 is fixedly provided with a servo motor 14, the output end of the servo motor 14 penetrates the L-shaped mounting frame 15 and is fixedly connected with the front side of the polishing roller 12, the top of the arch-shaped mounting frame 6 is fixedly provided with two electric push rods 7, the output end of the electric push rod 7 penetrates the arch-shaped mounting frame 6 and is fixedly connected with the top of the L-shaped mounting frame 15, the setting of the servo motor 14 is used for driving the polishing roller 12 to rotate and realizing the polishing of the quartz substrate, and the setting of the electric push rod 7 is used for pushing the L-shaped mounting frame 15 to descend and then realizing the contact between the bottom of the polishing roller 12 and the quartz substrate and the polishing of the quartz substrate.

[0036] Working principle: the quartz substrate is placed on the top of the suction cup 8 and is adsorbed and fixed by the suction cup 8, after the placement is finished, the water supply main pipeline is connected with the connector 502, after the connection is finished, the second threaded rod 509 is driven to rotate by the second driving motor 505, under the action of the screw, the second limiting block 508 and the mounting rod 507 are moved, and then the nozzle 506 is moved, the water is sprayed out through the nozzle 506 to clean the quartz substrate, after cleaning, the first driving motor 4 is driven to drive the first threaded rod 11 to move the first limiting block 13 and the arcuate mounting frame 6, and then the polishing roller 12 is moved, the L-shaped mounting frame 15 is pushed by the electric push rod 7 to drive the polishing roller 12 to descend and make the bottom of the polishing roller 12 contact with the top of the quartz substrate, the polishing roller 12 is driven by the servo motor 14 to polish the quartz substrate, after polishing, the second threaded rod 509 is driven to rotate by the second driving motor 505, under the action of the screw, the second limiting block 508 and the mounting rod 507 are moved, and then the nozzle 506 is moved, the water is sprayed out through the nozzle 506 to clean the quartz substrate.

[0037] The basic principle, main features and advantages of the utility model are shown and described above. It should be understood by those skilled in the art that the utility model is not limited by the above-mentioned embodiments, and the above-mentioned embodiments and the description in the specification are only to illustrate the principle of the utility model, and various changes and improvements can be made to the utility model without departing from the spirit and scope of the utility model, and these changes and improvements all fall within the scope of the utility model claimed.

Claims

1. A polishing apparatus for processing quartz substrates, characterized in that: Includes a base (1), a holding trough (10) is fixedly installed on the top of the base (1), an arched mounting bracket (6) is provided on the top of the base (1) and outside the holding trough (10), an L-shaped mounting bracket (15) is provided on the inner side of the arched mounting bracket (6), a polishing roller (12) is rotatably connected to the inner side of the L-shaped mounting bracket (15), a mounting seat (9) is fixedly installed inside the holding trough (10), a uniformly distributed suction cup (8) is fixedly installed on the top of the mounting seat (9), a cleaning device (5) is provided on the right side of the top of the holding trough (10), and a drain pipe (3) is connected to the right side of the holding trough (10). The cleaning device (5) includes a mounting rod (507), which is positioned above a holding trough (10). The bottom of the mounting rod (507) is connected to evenly distributed nozzles (506). A receiving cavity (503) is formed on the front side of the holding trough (10). A conduit (504) is connected inside the receiving cavity (503). The top of the conduit (504) is connected to the front bottom of the mounting rod (507), and the left side of the conduit (504) passes through the holding trough. A trough (10) is connected to a connector (502); a second limiting groove (501) is provided on the rear side of the top of the trough (10), and a second limiting block (508) is slidably connected inside the second limiting groove (501). The top of the second limiting block (508) is fixedly connected to the bottom of the mounting rod (507); a second drive motor (505) is fixedly installed on the right side of the trough (10), and a second thread is fixedly installed on the output end of the second drive motor (505). The second threaded rod (509) extends through the left side of the second limiting groove (501) and is connected to the second limiting block (508) by a threaded rotation. The top of the base (1) has two first limiting grooves (2), and the first limiting block (13) is slidably connected inside the first limiting groove (2). The top of the first limiting block (13) is fixedly connected to the bottom of the arched mounting bracket (6). The right side of the base (1) is fixedly installed with two first drive motors (4). The output end of the first drive motor (4) is fixedly installed with a first threaded rod (11). The left side of the first threaded rod (11) extends through the first limiting groove (2) and is connected to the first limiting block (13) by a threaded rotation. The rear side of the bottom of the L-shaped mounting bracket (15) is provided with a mounting plate (20). The interior of the mounting plate (20) is fixedly installed with a positioning cylinder (21). The rear side of the polishing roller (12) extends through the interior of the positioning cylinder (21).

2. The polishing apparatus for processing a quartz substrate according to claim 1, wherein: The L-shaped mounting bracket (15) has two grooves (16) inside, and two sliders (17) are slidably connected inside the grooves (16). The bottom of the sliders (17) is fixedly connected to the top of the mounting plate (20).

3. The polishing apparatus for processing a quartz substrate according to claim 2, wherein: The rear side of the mounting plate (20) is fixedly installed with a fixed plate (19), the inside of the fixed plate (19) is provided with a bolt (18), the top of the bolt (18) penetrates into the inside of the L-shaped mounting rack (15) and is connected through screw thread rotation between the L-shaped mounting rack (15).

4. The polishing apparatus for processing a quartz substrate according to claim 3, wherein: The front side of the L-shaped mounting rack (15) is fixedly installed with a servo motor (14), the output end of the servo motor (14) penetrates the L-shaped mounting rack (15) and is fixedly connected with the front side of the polishing roller (12), the top of the arc-shaped mounting rack (6) is fixedly installed with two electric push rods (7), the output end of the electric push rod (7) penetrates the arc-shaped mounting rack (6) and is fixedly connected with the top of the L-shaped mounting rack (15).