Rotary table for grinding and polishing workshop

Abstract

The utility model discloses a rotary table for a grinding and polishing workshop. Relates to the technical field of wafer grinding and polishing. The rotary table is arranged on the assembly hole; and the slide holder is arranged on the rotary table, a clamping and plugging groove is formed in the slide holder, and an insertion hole is formed in the bottom of the slide holder. According to the utility model, the rotation of the spin-drying rack provided with the large-size wafer can be conveniently and quickly completed, and the water gun is matched to wash the wafer in the spin-drying rack, so that the time of the cleaning process can be shortened, the flushing process after ETCH and polishing of the large-size wafer is simplified, and the possibility of chemical defects caused by untimely flushing is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer grinding polishing technical field more specifically relates to a kind of rotary table for grinding, polishing workshop. BACKGROUND

[0002] For the problems existing in the overflow flushing process after the current grinding of large-size wafer (6&8 inch) ETCH and polishing, after wafer grinding, ETCH is completed and after wafer polishing, a step of overflow and water flushing process is connected, a water gun is used to flush the wafer in the spin-drying frame from multiple angles, and the direction of the spin-drying frame needs to be adjusted to achieve the best flushing effect.

[0003] The spin-drying frame loaded with large-size wafers is large in size and heavy when loaded with more wafers, and it is difficult to clean it comprehensively by holding the spin-drying frame and cooperating with the water gun as small-size wafers, and only the spin-drying frame can be placed on the cleaning table to realize the function of comprehensive multi-angle cleaning by rotating the spin-drying frame.

[0004] However, this operation is inconvenient, as there are a large number of holes with a certain size on the surface of the cleaning table, and the bottom corner of the spin-drying frame is easy to be stuck between the hole and the hole when rotating on the surface of the cleaning table, which causes the water flushing process to be time-consuming and inefficient, and the multi-angle water flushing of the wafer cannot be completed in a short time, which may cause the chemical medicine remaining on the wafer surface to be not cleaned completely in time, resulting in water mark, medicine mark and other chemical defects on the wafer surface,

[0005] Therefore, how to provide a rotary table for grinding and polishing workshop to improve the flushing efficiency and reduce the risk of fragments in the rotating process of spin-drying frame is a problem to be solved by those skilled in the art. UTILITY MODEL CONTENTS

[0006] Therefore, the utility model provides a rotary table for grinding and polishing workshop to improve the flushing efficiency and reduce the risk of fragments in the rotating process of spin-drying frame.

[0007] In order to achieve the above purpose, the utility model adopts the following technical scheme:

[0008] A rotary table for grinding and polishing workshop comprises:

[0009] A base is provided with an assembly hole;

[0010] A rotary table is arranged on the assembly hole;

[0011] A slide glass stage is arranged on the rotary table, and the slide glass stage is provided with a jamming slot, and the bottom of the slide glass stage is provided with a plug hole.

[0012] Further, the rotating table comprises a rotating shaft and a tray, the rotating shaft is arranged in the assembling hole, and the tray is arranged on the rotating shaft and rotatably arranged on the base through the rotating shaft.

[0013] Further, the tray is provided with a plurality of insertion pins, and the insertion pins are matched with the insertion holes.

[0014] Further, the clamping grooves are 6-inch clamping grooves and 8-inch clamping grooves.

[0015] Compared with the prior art, the rotating table for a grinding and polishing workshop provided by the utility model can rotatably arrange the rotating table and the wafer table on the base, can conveniently and quickly complete the rotation of the large-size wafer spin-drying frame, can reduce the time of the cleaning process, can simplify the water flushing process after the large-size wafer is etched and polished, and can reduce the possibility of chemical defects caused by untimely water flushing. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the utility model or the prior art, the following will briefly introduce the drawings needed to be used in the embodiment or the prior art description, and obviously, the drawings in the following description are only the embodiments of the utility model, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative labor.

[0017] Fig. 1 The utility model provides a rotating table for grinding, polishing workshop's stereoscopic assembly drawing;

[0018] Fig. 2 The utility model provides a rotating table for grinding, polishing workshop's mounting structure schematic view;

[0019] Fig. 3 The utility model provides a rotating table for grinding, polishing workshop's working schematic view.

[0020] Wherein: 1 is base;2 is assembling hole;3 is rotating table;4 is wafer table;5 is clamping groove;6 is rotating shaft;7 is tray;8 is insertion pin. DETAILED DESCRIPTION

[0021] Clearly and completely describe the technical scheme in the embodiments of the utility model with reference to the drawings in the embodiments of the utility model, obviously, the described embodiments are only a part of the embodiments of the utility model, and not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by the ordinary skill in the art without creative labor belong to the scope of the utility model protection.

[0022] Referring to Figs. 1-3 The utility model discloses a rotary table for grinding, polishing workshop, including:

[0023] Base 1 is equipped with assembly hole 2 on base 1;Assembly hole 2 can be matched with the rotating shaft 6 of rotary table 3, and the rotating shaft 6 is fixed, so that base 1 and rotary table 3 are connected and assembled into one, which is more stable and safe during use;

[0024] Rotary table 3, rotary table 3 is arranged on assembly hole 2;Rotating shaft 6 can be assembled with base 1 and integrated;

[0025] Slide glass stage 4, slide glass stage 4 is arranged on rotary table 3, and slide glass stage 4 is equipped with plug groove 5, and the bottom of slide glass stage 4 is equipped with jack plug;Through slide glass stage 4, large-size wafer spin-drying frame is fixed.

[0026] In the embodiment, the rotary table 3 includes the rotating shaft 6 and the tray 7, the rotating shaft 6 is arranged in the assembly hole 2, the tray 7 is arranged on the rotating shaft 6, and the tray 7 is rotatably arranged on the base 1 through the rotating shaft 6;The flushing of the wafer in the spin-drying frame can reduce the time of the cleaning process, simplify the water flushing process after the large-size wafer etching and polishing, and reduce the possibility of chemical defects caused by delayed water flushing.

[0027] In the embodiment, the tray 7 is equipped with a plurality of bayonets 8, and the bayonets 8 are matched with the jack plug;The bayonets 8 are arranged above the tray 7 to facilitate the combination with the jack plug of slide glass stage 4, and slide glass stage 4 is fixed.

[0028] In the embodiment, the plug groove 5 is 6-inch plug groove 5 and 8-inch plug groove 5;Two specifications of spin-drying frame can be carried.

[0029] Method for use: after base 1, rotary table 3 and slide glass stage 4 are combined into one, different models of spin-drying frame can be placed in the corresponding size plug groove 5, when the direction of spin-drying frame needs to be rotated, the direction of spin-drying frame can be directly adjusted, since the rotating shaft 6 has rotating function, through the rotating action of rotary table 3, 360 ° rotation can be made in horizontal direction in a short time, and the flushing of the water gun is completed, and the cleaning process is completed.

[0030] The various embodiments described in this specification are presented by way of example, and each embodiment is presented for the purpose of conveying the novelty and inventive aspects of the present patent application. For the embodiments disclosed, because they correspond to the methods disclosed in the embodiments, they are described more simply, and the relevant parts are referred to the method part description.

[0031] The above description of disclosed embodiments enables one of ordinary skill in the art to make and use the patent application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other embodiments without departing from the spirit or scope of the patent application. Thus, the present patent application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A rotary table for use in grinding and polishing workshops, characterized in that, include: The base has mounting holes. A turntable, wherein the turntable is disposed on the assembly hole; A slide carrier stage is provided on the turntable, the slide carrier stage is provided with a retainer groove, and the bottom of the slide carrier stage is provided with an insertion hole.

2. A rotary table for a grinding and polishing workshop according to claim 1, characterized in that, The turntable includes a rotating shaft and a tray. The rotating shaft is disposed in the mounting hole, and the tray is disposed on the rotating shaft. The tray is rotatably disposed on the base via the rotating shaft.

3. A rotary table for a grinding and polishing workshop according to claim 2, characterized in that, The tray is provided with several pins, which are adapted to the sockets.

4. A rotary table for a grinding and polishing workshop according to claim 1, characterized in that, The insert slots are configured as 6-inch insert slots and 8-inch insert slots.

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