Gluing developer cleaning device
By designing and installing a cleaning device consisting of a tank, cylinder, and scraper in the coating and developing machine, the problem of cleaning difficulties caused by different materials after different processes is solved, enabling rapid and efficient cleaning of the substrate positioning seat and ensuring stable operation and efficient production of the equipment.
Patent Information
- Application Number
- CN202423181308.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-23
- Publication Date
- 2025-12-16
- Estimated Expiration
- 2034-12-23
AI Technical Summary
Existing coating and developing machines require cleaning of different substances after different processes, making it difficult to remove dirt quickly and efficiently, especially the cleanliness of the substrate transport mechanism.
A cleaning device for a photoresist coating and developing machine was designed, comprising a mounting slot, a cylinder, a scraper, and a cleaning liquid pipe. The mounting slot and cylinder, which are inclined, drive the scraper to spray and scrape the substrate positioning seat for cleaning. Combined with a photoresist and chemical reagent removal liquid tank, the device can achieve specialized cleaning of the substrate positioning seat without affecting the normal operation of the equipment.
This enables rapid and efficient cleaning of the substrate positioning seat, ensuring the cleanliness of the substrate transfer mechanism, avoiding the need for long-term downtime for cleaning, and improving production efficiency and product quality.
Smart Images
Figure CN223669773U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the technical field of glue spreading developing machine, concretely to a glue spreading developing machine cleaning device. BACKGROUND
[0002] The glue spreading developing machine is one of the commonly used equipment in the precise technology such as semiconductor manufacturing, microelectronic processing and printed circuit board production, and is mainly used for the two key steps of glue spreading and developing. The cleaning device in the glue spreading developing machine can remove the photoresist, chemical reagent and other pollutants that may affect the process effect remaining in the machine interior, and is an important component for ensuring that the equipment can operate stably for a long time, maintaining high production efficiency and product quality.
[0003] The existing glue spreading developing machine cleaning device mainly cleans the glue spreading head, substrate transmission mechanism, developing tank, heating plate and cooling plate. The glue spreading head, developing tank, heating plate and cooling plate are usually cleaned after the equipment is stopped, and the substrate transmission mechanism needs to continuously process the transmission of the substrate. Therefore, the cleanliness of the substrate transmission mechanism needs to be ensured at all times to prevent the substrate from being contaminated. However, the substances required for cleaning after different processes are different, and if the dirt is to be completely cleaned, a long period of time is required. SUMMARY
[0004] The utility model aims at providing a glue spreading developing machine cleaning device to solve the problem that the substances required for cleaning after different processes are different, and the dirt cannot be quickly and efficiently removed when the glue spreading developing machine on the market is working.
[0005] To achieve the above-mentioned purpose, the utility model provides the following technical scheme: a glue spreading developing machine cleaning device, comprising a glue spreading developing machine and a cleaning device main body, an installation groove is arranged on the cleaning device main body, the bottom of the installation groove is inclined, a gas cylinder is fixedly arranged at the position below the bottom of the installation groove, a dirt scraping plate is connected to the upper end of the gas cylinder, a cleaning liquid pipe is arranged in the dirt scraping plate, a workbench is arranged in the glue spreading developing machine, first and second substrate transmission mechanisms are symmetrically arranged on the two sides of the inside of the glue spreading developing machine, positioning seat rotating mechanisms are uniformly and separately arranged on the first and second substrate transmission mechanisms, substrate positioning seats are rotatably connected to the positioning seat rotating mechanisms, and the positions of the substrate positioning seats and the dirt scraping plate correspond to each other.
[0006] Preferably, a glue spreading head is arranged on the side of the workbench close to the first substrate transmission mechanism, a glue spreading head protection seat is arranged on the cleaning device main body and is tightly fastened with the glue spreading head, and a heating mechanism is arranged in the glue spreading head protection seat.
[0007] Preferably, the cleaning device body is provided with a photoresist removing liquid tank and a chemical reagent removing liquid tank on both sides respectively, and the photoresist removing liquid tank and the chemical reagent removing liquid tank are in sealed communication with the cleaning liquid pipes on both sides respectively.
[0008] Preferably, a sewage tank is symmetrically arranged at a middle position below the cleaning device body, and the sewage tank is in plug-in communication with the sewage discharge pipe at the bottom end of the mounting groove.
[0009] Preferably, the part of the cleaning liquid pipe inserted into the scraping plate is inclined upward, and the cleaning liquid pipe is in sealed penetration with the side surface of the mounting groove.
[0010] Preferably, the length of the scraping plate is greater than the diameter of the substrate positioning seat, and the scraping plate is in clamping cooperation with the inner side of the substrate positioning seat.
[0011] Compared with the prior art, the coating developing machine cleaning device can clean the substrate positioning seat used for coating and developing respectively, can clean the photoresist and the chemical reagent specially, and can ensure the cleanliness of the substrate positioning seat through the spraying and scraping modes. The coating developing machine cleaning device can clean the substrate positioning seat when the substrate positioning seat moves to the position below the substrate transmission mechanism, does not affect the normal work of the coating developing machine, can perform the lifting treatment of the scraping plate, does not affect the conveying movement of the substrate positioning seat, can conveniently collect and treat the removing liquid, and the operation is more convenient. BRIEF DESCRIPTION OF DRAWINGS
[0012] Fig. 1 It is a position structure schematic view of the coating developing machine cleaning device body relative to the substrate transmission mechanism of the utility model;
[0013] Fig. 2 It is a side view of the coating developing machine cleaning device of the utility model;
[0014] Fig. 3 It is a position structure schematic view of the substrate positioning seat relative to the first substrate transmission mechanism and the second substrate transmission mechanism of the coating developing machine cleaning device of the utility model.
[0015] In the drawing: 1, coating developing machine; 101, coating head; 102, substrate positioning seat; 103, first substrate transmission mechanism; 104, workbench; 105, positioning seat rotating mechanism; 106, second substrate transmission mechanism; 2, cleaning device body; 3, photoresist removing liquid tank; 4, mounting groove; 5, coating head protection seat; 6, chemical reagent removing liquid tank; 7, cleaning liquid pipe; 8, sewage tank; 9, sewage discharge pipe; 10, air cylinder; 11, scraping plate. DETAILED DESCRIPTION
[0016] Clearly, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art without creative labor fall within the scope of protection of the present application.
[0017] Please refer to Figs. 1-3The utility model provides a technical scheme: a kind of gluing developing machine cleaning device, including gluing developing machine 1 and cleaning device main body 2, cleaning device main body 2 is equipped with mounting groove 4, and mounting groove 4 bottom is inclined to be arranged, and sewage bin 8 is symmetrically equipped in the middle position below cleaning device main body 2, and sewage bin 8 is inserted with sewage pipe 9 and is communicated with the bottom end of mounting groove 4, this structure can collect the sewage generated by cleaning by sewage bin 8, and sewage is separately collected and handled, by being designed into inclined structure to mounting groove 4 bottom, can be easily drained, and mounting groove 4 is completely placed below first base plate transmission mechanism 103 and second base plate transmission mechanism 106, can effectively avoid leakage, and sewage pipe 9 is fixed in the position below the bottom of mounting groove 4, and the upper end of cylinder 10 is connected with scraping plate 11, and scraping plate 11 is penetrated with cleaning liquid pipe 7, and photoresist cleaning liquid tank 3 and chemical reagent cleaning liquid tank 6 are equipped with on the both sides of cleaning device main body 2 respectively, and photoresist cleaning liquid tank 3 and chemical reagent cleaning liquid tank 6 are respectively sealed with both sides cleaning liquid pipe 7 communication, this structure makes photoresist cleaning liquid tank 3 and chemical reagent cleaning liquid tank 6 can be fixed respectively in the position of both sides of gluing developing machine 1, and the liquid handling of photoresist cleaning liquid tank 3 and chemical reagent cleaning liquid tank 6 is easy, and cleaning liquid pipe 7 can be transported by water pump The cleaning liquid of processing, so that cleaning liquid can act on base plate positioning seat 102, realize the cleaning processing of base plate positioning seat 102, base plate positioning seat 102 is rotated under the drive of positioning seat rotating mechanism 105, not only for the uniform gluing processing of photoresist, but also can be easily cleaned base plate positioning seat 102, workbench 104 is equipped with in gluing developing machine 1, and first base plate transmission mechanism 103 and second base plate transmission mechanism 106 are symmetrically arranged in the inside both sides of gluing developing machine 1, and gluing head 101 is installed on the side of workbench 104 upper end near first base plate transmission mechanism 103, and gluing head protection seat 5 is equipped with on cleaning device main body 2 and is tightly fastened with gluing head 101, and heating mechanism is built-in gluing head protection seat 5, this structure is handled by first base plate transmission mechanism 103 and second base plate transmission mechanism 106 respectively when gluing and developing the base plate transmission, can be cleaned by the cleaning liquid of special use on the base plate positioning seat 102 of first base plate transmission mechanism 103 and second base plate transmission mechanism 106, ensure that no photoresist and chemical reagent are left on base plate positioning seat 102, gluing head protection seat 5 can avoid the solidification of photoresist in gluing head 101 by heating gluing head 101, to prevent the cleaning of gluing head 101 needs to spend long time, positioning seat rotating mechanism 105 is evenly spaced and installed on first base plate transmission mechanism 103 and second base plate transmission mechanism 106 respectively, and base plate positioning seat 102 is rotatably connected on positioning seat rotating mechanism 105, and base plate positioning seat 102 and scraping plate 11 position are respectively corresponding, the part of cleaning liquid pipe 7 is inserted in scraping plate 11 is inclined upwards, and cleaning liquid pipe 7 is sealed and penetrated with the side of mounting groove 4,The structure of the smudge scraping plate 11 can be lifted by the air cylinder 10, after the substrate positioning seat 102 to be cleaned is moved above the smudge scraping plate 11, the air cylinder 10 pushes the smudge scraping plate 11 to move upwards, the smudge scraping plate 11 is clamped into the substrate positioning seat 102, and the substrate positioning seat 102 in the cleaning process is rotated, so that the residual photoresist can be removed everywhere, the photoresist is removed in cooperation with the smudge scraping plate 11, the cleaning effect is better, the length of the smudge scraping plate 11 is greater than the diameter of the substrate positioning seat 102, and the smudge scraping plate 11 is clamped in cooperation with the inner side of the substrate positioning seat 102, so that the smudge scraping plate 11 can clean the inner side of the substrate positioning seat 102 in all directions.
[0018] Working principle: when the cleaning device of the coating and developing machine is used, firstly, in the working process of the coating and developing machine 1, the whole dustproof treatment is performed through the external box cover, the substrate is placed on the substrate positioning seat 102 on one side of the first substrate conveying mechanism 103, the substrate is pretreated, the photoresist is coated through the coating head 101, the substrate positioning seat 102 is driven to rotate by the positioning seat rotating mechanism 105, so that the photoresist is uniformly coated on the substrate, after baking and cooling, the substrate is transferred to an exposure machine by a mechanical hand, the substrate after exposure is sent into a developing tank by the mechanical hand, and then the substrate is moved to the substrate positioning seat 102 on one side of the second substrate conveying mechanism 106 by the mechanical hand to perform baking, cooling, developing and other operations, the workbench 104 performs conveying and positioning treatment on the first substrate conveying mechanism 103 and the second substrate conveying mechanism 106, after the substrate positioning seat 102 is conveyed to the position below the first substrate conveying mechanism 103 and the second substrate conveying mechanism 106, the air cylinder 10 drives the smudge scraping plate 11 to move upwards, the smudge scraping plate 11 is clamped into the substrate positioning seat 102, and the liquid in the photoresist removing liquid tank 3 and the chemical reagent removing liquid tank 6 is respectively sprayed out through the cleaning liquid pipe 7 and acts on the substrate positioning seat 102 below the first substrate conveying mechanism 103 and the second substrate conveying mechanism 106, and through the rotation of the substrate positioning seat 102, the spraying and scraping treatment is realized, so that the cleanliness of the substrate positioning seat 102 is ensured, the substrate positioning seat 102 can effectively reduce the residue of the liquid, so as to facilitate subsequent drying use, the cleaning liquid falls into the installation groove 4 and is then introduced into the sewage bin 8 through the sewage pipe 9, and the cleaning device main body 2 also heats the non-working coating head 101 through the coating head protection seat 5, so that the coating head 101 is prevented from being blocked and inconvenient to clean, and a series of work is completed.
[0019] Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments or make equivalent replacement to part of the technical features, and any modification, equivalent replacement, improvement and the like made within the spirit and principle of the utility model should be included in the protection scope of the utility model.
Claims
1. A gumming and developing machine cleaning device comprising a gumming and developing machine (1) and a cleaning device body (2), characterized in that: The cleaning device body (2) is provided with an installation groove (4), and the bottom of the installation groove (4) is inclinedly arranged, and a cylinder (10) is fixedly penetrated below the bottom of the installation groove (4), the upper end of the cylinder (10) is connected with a dirt scraping plate (11), and a cleaning liquid pipe (7) is penetrated in the dirt scraping plate (11), the photoresist developing machine (1) is provided with a workbench (104), and the photoresist developing machine (1) is provided with a first substrate transmission mechanism (103) and a second substrate transmission mechanism (106) on both sides of the inside, the first substrate transmission mechanism (103) and the second substrate transmission mechanism (106) are respectively and uniformly spaced, and the positioning seat rotating mechanism (105) is installed on the first substrate transmission mechanism (103) and the second substrate transmission mechanism (106), the positioning seat rotating mechanism (105) is rotatably connected with a substrate positioning seat (102), and the substrate positioning seat (102) and the dirt scraping plate (11) are respectively corresponding in position.
2. A cleaning device for a gluing and developing machine according to claim 1, characterized in that: The workbench (104) is provided with a glue applying head (101) on one side close to the first substrate transmission mechanism (103) of the upper end, the cleaning device body (2) is provided with a glue applying head protection seat (5) tightly fastened with the glue applying head (101), and the glue applying head protection seat (5) is provided with a heating mechanism.
3. The cleaning device for a gluing and developing machine according to claim 1, characterized in that: The cleaning device body (2) is provided with a photoresist removing liquid tank (3) and a chemical reagent removing liquid tank (6) on both sides, and the photoresist removing liquid tank (3) and the chemical reagent removing liquid tank (6) are respectively and sealingly communicated with the cleaning liquid pipes (7) on both sides.
4. The cleaning device for a gluing and developing machine according to claim 1, characterized in that: The cleaning device body (2) is provided with a sewage tank (8) symmetrically at the middle position below, and the sewage tank (8) is connected with a sewage discharge pipe (9) which is inserted and communicated with the bottom end of the installation groove (4).
5. The cleaning device for a gluing and developing machine according to claim 1, characterized in that: The part of the cleaning liquid pipe (7) inserted in the dirt scraping plate (11) is inclined upward, and the cleaning liquid pipe (7) is sealingly penetrated with the side of the installation groove (4).
6. A cleaning device for a gluing and developing machine according to claim 1, characterized in that: The length of the dirt scraping plate (11) is greater than the diameter of the substrate positioning seat (102), and the dirt scraping plate (11) is clamped and matched with the inner side of the substrate positioning seat (102).