Device for removing crystalline deposition of polishing solution in polishing solution box and wax polishing machine

By designing an automated polishing fluid tank cleaning device, the problems of pipe blockage and product quality caused by crystal deposition in the polishing fluid tank were solved, achieving efficient cleaning and production continuity.

CN223670975UActive Publication Date: 2025-12-16ZHONGHUAN ADVANCED SEMICONDUCTOR TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202421553911.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-03
Publication Date
2025-12-16
Estimated Expiration
2034-07-03

AI Technical Summary

Technical Problem

Crystallization deposits in the polishing fluid tank cause pipe blockage and product quality abnormalities. Existing cleaning methods are not timely or thorough, resulting in wasted maintenance time and product loss.

Method used

Design a device for removing polishing fluid crystal deposits in a polishing fluid tank, including a water inlet pipe, a switching device, a cleaning device, and a liquid level detection device. By controlling the delivery and spraying of pure water, the device automatically cleans the crystals in the polishing fluid tank, avoiding blockage and quality issues.

Benefits of technology

It enables automated cleaning of the polishing liquid tank, reduces the risk of clogging, improves production efficiency and product quality, and is convenient and timely to operate.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model provides a device for removing crystal deposit of polishing liquid in a polishing liquid box and a wax polisher, which comprise a water inlet pipeline, a switch device arranged on the water inlet pipeline and a cleaning device communicated with the water inlet pipeline, the switch device controls the on-off of the water inlet pipeline, and the cleaning device is arranged in the polishing liquid box. And the cleaning device can rotate relative to the water inlet pipeline to wash the polishing liquid crystal in the polishing liquid box. The polishing solution tank has the advantages that all corners of the polishing solution tank can be flushed, the situation that the polishing solution tank cannot be flushed is reduced, pipeline blockage caused by the fact that polishing solution crystals enter a polishing machine is avoided, and the influence on the quality of products is also avoided; according to the device, crystal washing is automatically conducted every time liquid is replaced, the cleaning time is automatically controlled, the situation that washing is not conducted in time or washing is omitted is avoided, the purpose of keeping the interior of the polishing liquid box clean is achieved, and the automation degree is high.
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Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of polishing machine especially, it is a kind of device and wax polishing machine of removing polishing liquid crystallization deposition in polishing liquid tank. BACKGROUND

[0002] Polishing machine in the process of polishing the crystallization in the polishing liquid tank will be more and more accumulated with the passage of time, and the polishing liquid needs to be replaced after each cycle of use for several hours. The polishing liquid is automatically controlled to be emptied and new liquid is added after the service life of the tank. The traditional cleaning method is to use a water gun to flush the polishing liquid tank immediately after the polishing liquid tank is drained. If the flushing is not thorough or not timely, the crystallization in the polishing liquid tank will also be more and more accumulated with time. The crystallization can cause pipe blockage, reduce the service life of the filter element, and also cause product slide and other product abnormalities, resulting in waste of maintenance time and product loss in the production process. SUMMARY

[0003] In view of the above problems, the utility model provides a kind of device and wax polishing machine of removing polishing liquid crystallization deposition in polishing liquid tank to solve the above or other former problems existing in prior art.

[0004] To solve the above technical problems, the utility model adopts the technical scheme of a kind of device for removing polishing liquid crystallization deposition in polishing liquid tank, including water inlet pipeline, switch device on water inlet pipeline and cleaning device communicated with water inlet pipeline, switch device controls the on-off of water inlet pipeline, cleaning device is located in polishing liquid tank, and cleaning device can rotate relative to water inlet pipeline, and the polishing liquid crystallization in polishing liquid tank is flushed.

[0005] Further, the switch device is a valve.

[0006] Further, the switch device is a pneumatic valve.

[0007] Further, the cleaning device is a rotating spray head.

[0008] Further, it further includes at least one liquid level detection device, and multiple liquid level detection devices are arranged in the polishing liquid tank in sequence along the axial direction of the polishing liquid tank.

[0009] Further, at least one liquid level detection device is arranged at the bottom of the polishing liquid tank.

[0010] Further, it further includes a control device, which is connected with the switch device and the liquid level detection device respectively, receives the signal sent by the liquid level detection device, and controls the action of the switch device according to the signal.

[0011] Further, the water storage device and the pure water delivery power device connected with the water storage device are further included, the pure water delivery power device is connected with the water inlet pipeline, and the pure water delivery power device provides power for the delivery of the pure water.

[0012] Further, the pure water delivery power device is a pump.

[0013] A wax polishing machine comprises a polishing liquid tank and a device for removing the crystallization deposition of the polishing liquid in the polishing liquid tank.

[0014] According to the technical scheme, the device for removing the crystallization deposition of the polishing liquid in the polishing liquid tank is provided with a water inlet pipeline and a switch device arranged on the water inlet pipeline, the switch device controls the opening and closing of the water inlet pipeline, the water inlet pipeline is connected with a cleaning device, the cleaning device is arranged in the polishing liquid tank, the cleaning device is rotatable relative to the water inlet pipeline, pure water can be sprayed from the cleaning device to flush the crystallization of the polishing liquid in the polishing liquid tank, the flushing of each corner of the polishing liquid tank is realized, the situation that the flushing is not performed is reduced, the crystallization of the polishing liquid is prevented from entering the polishing machine to cause the pipeline blockage, and the influence on the quality of products is avoided; the liquid level detection device is arranged in the polishing liquid tank to detect whether the polishing liquid is in the polishing liquid tank, the pure water delivery is controlled by the switch device, the cleaning device is controlled to spray the pure water or not, the automatic flushing of the crystallization is performed every time when the liquid is replaced, the cleaning time is automatically controlled, the situation that the flushing is not performed in time or is missed is avoided, the purpose that the polishing liquid tank is kept clean is realized, the degree of automation is high, and the operation is convenient and timely. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 It is a structural schematic view of an embodiment of the utility model.

[0016] In the drawing:

[0017] 1, polishing liquid tank 2, cleaning device 3, water inlet pipeline

[0018] 4, switch device 5, liquid level detection device 6, liquid discharge port

[0019] 7, first switch device 8, liquid inlet pipeline DETAILED DESCRIPTION

[0020] The utility model will be further described below in combination with the drawings and specific embodiments.

[0021] Figure 1The utility model discloses a structure schematic diagram of one embodiment of the utility model, and the embodiment relates to a device for removing polishing liquid crystallization deposition in a polishing liquid tank and a wax polisher, which is used for removing the crystallization deposition of the polishing liquid in the polishing liquid tank of the wax polisher, and can determine whether to introduce pure water to clean the crystallization deposition in the polishing liquid tank according to the amount of the polishing liquid in the polishing liquid tank after the service life of the polishing liquid expires, so that the polishing liquid crystallization deposition can be flushed away, and the device has high automation degree, is convenient and fast to clean, and has high cleanliness.

[0022] A device for removing polishing liquid crystallization deposition in a polishing liquid tank, as shown in the figure, comprises a water inlet pipeline 3, a switch device 4 arranged on the water inlet pipeline 3, and a cleaning device 2 in communication with the water inlet pipeline 3. Figure 1 The water inlet pipeline 3 is arranged to realize the circulation of pure water, so that the pure water can flow along the water inlet pipeline 3 and be sprayed out through the cleaning device 2, so that the cleaning device 2 can clean the crystallization deposition in the polishing liquid tank 1. The cleaning device 2 is arranged in the polishing liquid tank 1 and can rotate relative to the water inlet pipeline 3 to flush the polishing liquid crystallization deposition in the polishing liquid tank 1. The switch device 4 controls the opening and closing of the water inlet pipeline 3. When the switch device 4 is closed, the water inlet pipeline 3 is closed, the pure water cannot flow along the water inlet pipeline 3, and cannot enter the cleaning device 2. At this time, it is not necessary to flush the crystallization deposition in the polishing liquid tank 1. In this case, the polishing liquid tank 1 contains polishing liquid or has completed the flushing of the polishing liquid tank 1. When the switch device 4 is opened, the water inlet pipeline 3 is opened, the pure water can flow along the water inlet pipeline 3 and enter the cleaning device 2, the cleaning device 2 operates, the pure water is sprayed out, and the crystallization deposition in the polishing liquid tank 1 is flushed. In this case, the polishing liquid in the polishing liquid tank 1 has been emptied. The arrangement of the device separates the injection and discharge of the polishing liquid from the entry and discharge of the cleaning pure water, and separately performs the liquid inlet of the polishing liquid and the liquid inlet of the pure water, so that they do not interfere with each other.

[0023] The device for removing polishing liquid crystallization deposition in the polishing liquid tank is installed on one side outside the polishing liquid tank 1, and the device is in communication with the polishing liquid tank 1. The cleaning device 2 is installed inside the polishing liquid tank 1, so that the external pure water can enter the polishing liquid tank 1 to flush the polishing liquid crystallization deposition in the polishing liquid tank 1, avoid the polishing liquid crystallization to block the pipeline, and avoid the polishing liquid crystallization to enter the polisher to affect the quality of the product.

[0024] The polishing liquid tank 1 is a box structure, used for containing polishing liquid, and is installed on a wax polisher to provide polishing liquid for the polisher when polishing products. The polishing liquid tank 1 is connected with a polishing liquid inlet device, which comprises a polishing liquid inlet pipeline 8 connected with and communicated with the polishing liquid tank 1, and a first switch device 7 arranged on the polishing liquid inlet pipeline 8. The other end of the polishing liquid inlet pipeline 8 is connected with and communicated with a polishing liquid storage device. The polishing liquid in the polishing liquid storage device can flow into the polishing liquid tank 1 along the polishing liquid inlet pipeline 8 to inject the polishing liquid into the polishing liquid tank 1, so as to realize the supply of the polishing liquid. The first switch device 7 controls the opening and closing of the polishing liquid inlet pipeline 8. When the polishing liquid tank 1 is cleaned and the polishing liquid needs to be injected into the polishing liquid tank 1, the first switch device 7 is opened, and the polishing liquid in the polishing liquid storage device flows along the polishing liquid inlet pipeline 8 and into the polishing liquid tank 1. When the total amount of the polishing liquid in the polishing liquid tank 1 reaches the maximum volume or the set total amount of the polishing liquid tank 1, the first switch device 7 is closed to stop the polishing liquid from being injected.

[0025] The polishing liquid storage device can be a polishing liquid storage tank / box. The outlet end of the polishing liquid storage device is connected with a power device (not shown) such as a pump to provide power for the delivery of the polishing liquid. Figure 1 The polishing liquid storage device can also be a polishing liquid delivery pipeline network or other structure capable of storing and delivering the polishing liquid, which is selected according to actual needs.

[0026] The polishing liquid tank 1 is provided with a liquid outlet 6. When the polishing liquid in the polishing liquid tank 1 reaches the service life, the polishing liquid needs to be discharged and new polishing liquid needs to be injected. The polishing liquid in the polishing liquid tank 1 is discharged from the liquid outlet 6. The liquid outlet 6 is provided with a valve to realize the opening and closing of the liquid outlet 6.

[0027] The first switch device 7 is a valve. In some embodiments, the first switch device 7 is preferably a pneumatic valve.

[0028] The switch device 4 is a valve. In some embodiments, the switch device 4 is preferably a pneumatic valve.

[0029] The cleaning device 2 is a rotary spray head, which can rotate to spray pure water at high speed while rotating to flush the inside of the polishing liquid tank 1. The cleaned liquid is discharged from the liquid outlet 6. Since the rotary spray head can rotate by 360°, it can clean the inside of the polishing liquid tank 1 without dead angle and can clean the polishing liquid crystals in the polishing liquid tank 1, so that the polishing liquid crystals in the polishing liquid tank 1 do not enter the polisher during use to cause pipeline blockage and affect the quality of products.

[0030] The rotating shower head described above is a commercially available product, which is selected according to actual needs, and no specific requirements are made here.

[0031] The device for removing the crystalline deposition of the polishing liquid in the polishing liquid tank further comprises a pure water storage device and a pure water conveying power device (not shown in the figure) connected with the pure water storage device. Figure 1 The pure water storage device is used to store pure water, and the pure water conveying power device is connected and communicated with the pure water storage device and the water inlet pipeline 3 through connecting pipelines, and provides power for the conveying of pure water.

[0032] In some implementable embodiments, preferably, the pure water conveying power device is a pump.

[0033] The pure water storage device described above can be a pure water storage tank or a pure water conveying pipe network, or other structures capable of storing and conveying pure water, which is selected according to actual needs, and no specific requirements are made here.

[0034] Further optimization scheme, the device for removing the crystalline deposition of the polishing liquid in the polishing liquid tank further comprises at least one liquid level detection device 5, a plurality of liquid level detection devices 5 are arranged in the polishing liquid tank 1, and the plurality of liquid level detection devices 5 are arranged in sequence along the axial direction of the polishing liquid tank 1.

[0035] The number of liquid level detection devices 5 is multiple, which are arranged in sequence on the inner wall of the polishing liquid tank 1 along the axial direction of the polishing liquid tank 1 from top to bottom. In order to facilitate the judgment of whether the polishing liquid in the polishing liquid tank 1 is empty, at least one liquid level detection device 5 is arranged at the bottom of the polishing liquid tank 1, and at least one liquid level detection device 5 is arranged at the highest position line of the polishing liquid tank 1. When the polishing liquid is injected into the polishing liquid tank 1, it is judged whether the total amount of the polishing liquid in the polishing liquid tank 1 reaches the maximum amount or the set total amount value. The number of liquid level detection devices 5 is selected according to actual needs, and no specific requirements are made here. In some implementable embodiments, the number of liquid level detection devices 5 is three, the first liquid level detection device 5 is arranged at the bottom of the interior of the polishing liquid tank 1, the second liquid level detection device 5 is arranged at the middle part of the interior of the polishing liquid tank 1, and the third liquid level detection device 5 is arranged at the highest position of the polishing liquid tank 1.

[0036] The liquid level detection device 5 described above is a liquid level sensor, which is a commercially available product, and no specific requirements are made here according to actual needs.

[0037] Further optimization of the scheme includes a control device for removing polishing fluid crystal deposits in the polishing fluid tank. Figure 1 (Not shown in the image) The control device is connected to the switch device 4 and the liquid level detection device 5 respectively. It receives the signal sent by the liquid level detection device 5 and controls the switch device 4 to operate according to the signal. The control device has a preset cleaning time. When the polishing liquid in the polishing liquid tank 1 reaches its service life, the control device controls the drain port 6 to open and discharge the polishing liquid, emptying the polishing liquid in the polishing liquid tank 1. When the liquid level detection device 5 at the bottom of the polishing liquid tank 1 does not detect polishing liquid, it means that the polishing liquid has been emptied. The control device controls the switch device 4 to open, and the water inlet pipe 3 is in a closed state. The pure water delivery power device is connected to the control device, and the control device controls the pure water delivery power device to operate and deliver pure water. The pure water flows along the water inlet pipe 3 and enters the cleaning device 2, driving the cleaning device 2 to operate. As the cleaning device 2 rotates, pure water flows from the cleaning device. The polishing liquid is sprayed out from outlet 2 to rinse the inside of the polishing liquid tank 1, washing away the crystallized deposits of the polishing liquid. The pure water used for rinsing is discharged from outlet 6. When the rinsing time is reached, the control device controls switch 4 to close and simultaneously controls the pure water delivery power unit to stop operating, thus stopping the pure water delivery. The control device controls outlet 6 to close, and the control device connects to the first switch 7 and the power unit. The control device controls the first switch 7 to open and simultaneously controls the power unit to inject polishing liquid, thus replenishing the polishing liquid. When the liquid level detection device 5 at the top of the polishing liquid tank 1 detects the polishing liquid, the control device controls the first switch 7 to close and simultaneously controls the power unit to stop operating, thus stopping the injection of polishing liquid, completing the replenishment of polishing liquid tank 1, and resuming production.

[0038] By adopting the above technical solution, the device for removing polishing fluid crystal deposits in the polishing fluid tank has a water inlet pipe and a switch device installed on the water inlet pipe. The switch device controls the opening and closing of the water inlet pipe. The water inlet pipe is connected to a cleaning device, which is installed inside the polishing fluid tank. The cleaning device can rotate relative to the water inlet pipe, and pure water can be sprayed out from the cleaning device to rinse the polishing fluid crystals in the polishing fluid tank, achieving rinsing of all corners of the polishing fluid tank, reducing situations where rinsing is not possible, preventing polishing fluid crystals from entering the polishing machine and causing pipe blockage, and also preventing any impact on product quality. The polishing fluid tank is equipped with a liquid level detection device to detect whether there is polishing fluid in the tank. The switch device controls whether pure water is supplied and whether pure water is sprayed out by the cleaning device, realizing automatic rinsing of crystals every time the liquid is changed, and automatically controlling the cleaning time to avoid untimely or missed rinsing, thus achieving the purpose of keeping the polishing fluid tank clean. It has a high degree of automation and is convenient and timely to operate.

[0039] The above detailed description of the embodiments of the present application is only a preferred embodiment of the present application, and cannot be considered as limiting the scope of the present application. Any equivalent changes and improvements made within the scope of the present application should still belong to the patent coverage of the present application.

Claims

1. An apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank, characterized by: The device for removing the polishing liquid crystal deposit in the polishing liquid tank comprises a water inlet pipeline, a switch device arranged on the water inlet pipeline, and a cleaning device communicated with the water inlet pipeline. The polishing liquid tank is connected with a polishing liquid inlet device, and the polishing liquid inlet device comprises a polishing liquid inlet pipeline connected with and communicated with the polishing liquid tank and a first switch device arranged on the polishing liquid inlet pipeline.

2. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to claim 1, wherein: The switch device is a valve.

3. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to claim 2, wherein: The switch device is a pneumatic valve.

4. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to any one of claims 1 to 3, characterized in that: The device further comprises at least one liquid level detection device, and a plurality of liquid level detection devices are arranged in the polishing liquid tank and sequentially arranged along the axial direction of the polishing liquid tank.

5. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to claim 4, wherein: At least one liquid level detection device is arranged at the bottom of the polishing liquid tank.

6. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to claim 4, wherein: The device further comprises a control device connected with the switch device and the liquid level detection device, receiving the signal sent by the liquid level detection device, and controlling the switch device to act according to the signal.

7. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to any one of claims 1 to 3 and 5 to 6, characterized by: The device further comprises a pure water storage device and a pure water conveying power device connected with the pure water storage device, wherein the pure water conveying power device is connected with the water inlet pipeline and provides power for the conveying of the pure water.

8. The apparatus for removing crystalline deposits of polishing liquid in a polishing liquid tank according to claim 7, wherein: The pure water conveying power device is a pump.

9. A wax polisher, characterized by: The device for removing the polishing liquid crystal deposit in the polishing liquid tank comprises a polishing liquid tank and the device for removing the polishing liquid crystal deposit in the polishing liquid tank according to any one of claims 1-8 connected with the polishing liquid tank.