Waste photoresist discharging device and gluing developing machine

Abstract

The waste photoresist discharging device comprises a funnel and a liquid discharging pipe, a lifting plate moving in the axial direction of the funnel is arranged on the funnel, one end of the lifting plate extends to the middle of the funnel, a telescopic pipe is fixedly installed at one end of the lifting plate, the bottom end of the telescopic pipe is fixedly communicated with a pressing plate with a built-in cavity, and the bottom end of the pressing plate is fixedly communicated with the liquid discharging pipe. A plurality of liquid outlet holes are formed in the pressing plate, and the free end of the telescopic pipe communicates with a booster pump. According to the utility model, the motor drives the transmission screw rod to rotate and drives the lifting plate to drive the outer tube of the telescopic tube and the pressing plate to descend into the funnel and move up and down in a reciprocating manner at the joint of the funnel and the liquid discharge tube, so as to dredge photoresist blocked at the joint; a photoresist dissolving agent is fed into the pressing plate through the telescopic pipe and is sprayed to the outer side through the liquid outlet hole, so that the photoresist is dissolved, the dredging effect of the photoresist is accelerated, and the problem of blockage at the joint of the funnel and the liquid discharge pipe is solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor manufacturing, especially to a waste photoresist discharging device and a glue coating and developing machine. BACKGROUND

[0002] In semiconductor device manufacturing and advanced packaging processes, the photoetching process is one of the key steps, which usually includes photoresist coating, exposure and development, etc. In the coating process, the photoresist is evenly applied to the surface of the high-speed rotating wafer, and the excess photoresist is thrown out and needs to be treated as waste liquid.

[0003] In the prior art, the patent "waste photoresist discharging device and glue coating and developing machine" with the publication number CN215729282U proposes a solution. According to the patent, the waste photoresist in the liquid accumulation box can rely on its own gravity or external force to enter the liquid discharge pipeline through the liquid discharge port, and finally be transported to the waste liquid collection station. During the liquid discharge process, the system will periodically or irregularly spray photoresist dissolving agent through several branch pipes to clean the inner wall of the liquid discharge pipeline to dissolve and remove the possible residual waste photoresist. However, in actual application, it is found that the diameter of the connection between the liquid accumulation box and the liquid discharge pipeline is small, which is easy to cause blockage due to the accumulation of waste photoresist. UTILITY MODEL CONTENT

[0004] The utility model aims to solve the technical problems mentioned in the background art and proposes a waste photoresist discharging device and a glue coating and developing machine.

[0005] To achieve the above-mentioned purpose, the utility model adopts the following technical solutions:

[0006] A waste photoresist discharging device and a glue coating and developing machine, comprising a funnel and a liquid discharge pipe, the funnel is provided with a lifting plate moving along its axial direction, one end of the lifting plate extends to the middle part of the funnel, a telescopic pipe is fixedly installed at one end of the lifting plate, a pressing plate with an internal cavity is fixedly connected to the bottom end of the telescopic pipe, a plurality of liquid outlet holes are formed in the pressing plate, and a booster pump is connected to the free end of the telescopic pipe.

[0007] Further description of the above technical solutions:

[0008] One side of the funnel is fixedly connected with a base, a guide column is fixedly connected to the base, a top seat is fixedly connected to the top of the guide column, a transmission screw is rotatably installed between the base and the top seat, the lifting plate is sleeved on the guide column transmission screw, an electric motor is fixedly installed on the base, and the output shaft of the electric motor is in transmission connection with the transmission screw.

[0009] Further description of the above technical solutions:

[0010] The pressing plate is fixedly connected with convex ridges arranged between the liquid outlet holes.

[0011] As a further description of the above technical solution:

[0012] The funnel is fixedly connected with a fixed seat located at the opening side of the baffle.

[0013] As a further description of the above technical solution:

[0014] The funnel is fixedly connected with a fixed seat located at the opening side of the baffle.

[0015] As a further description of the above technical solution:

[0016] The funnel liquid outlet and the liquid inlet of the drain pipe are connected through screw threads, and the drain pipe is fixedly connected with a plurality of branch pipes.

[0017] As described above, due to the adoption of the above technical solution, the beneficial effects of the present application are:

[0018] 1. In the present application, the motor drives the transmission screw rod to rotate, drives the lifting plate to drive the telescopic pipe outer tube and the pressing plate to descend to the inside of the funnel, and moves up and down at the connection between the funnel and the drain pipe to dredge the blocked photoresist at the connection, and under the action of the booster pump, the photoresist dissolving agent is sent into the pressing plate through the telescopic pipe and is sprayed outward through the liquid outlet hole to dissolve the photoresist and accelerate the dredging effect of the photoresist, thereby solving the blockage problem at the connection between the funnel and the drain pipe.

[0019] 2. In the present application, the pressing plate is fixedly connected with a plurality of convex ridges arranged between the liquid outlet holes, which has the effect of dispersing the photoresist squeezed together into a fine stream of colloidal state, and accelerating the outflow speed of the photoresist. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 A perspective structural schematic view of a waste photoresist discharge device and a glue coating developing machine according to an embodiment of the present application is shown;

[0021] Figure 2 An exploded schematic view of a waste photoresist discharge device and a glue coating developing machine according to an embodiment of the present application is shown;

[0022] Figure 3 A cross-sectional schematic view of a funnel according to an embodiment of the present application is shown;

[0023] Figure 4 A Figure 2 An enlarged schematic view at A.

[0024] LEGEND:

[0025] 1, funnel; 2, fixed seat; 3, baffle; 301, let go of the slot; 4, drain pipe; 5, branch pipe; 6, motor; 7, base; 8, transmission screw; 9, lifting plate; 10, guide column; 11, top seat; 12, booster pump; 13, telescopic pipe; 14, pressing plate; 141, convex ridge; 1401, liquid outlet hole. DETAILED DESCRIPTION

[0026] The technical scheme in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the present application.

[0027] Please refer to Figures 1-4 The present application provides a technical scheme: a waste photoresist discharging device and a glue coating and developing machine, which comprises a funnel 1 and a drain pipe 4. The funnel 1 is fixedly connected with a fixed seat 2 located at the opening side of the baffle 3. The funnel 1 is installed around the rotating device of the glue coating and developing machine through the fixed seat 2 and bolts, directly collects waste photoresist, and is provided with a lifting plate 9 movable along the axial direction thereof. One side of the funnel 1 is fixedly connected with a base 7. The base 7 is fixedly connected with a guide column 10. The top of the guide column 10 is fixedly connected with a top seat 11. The base 7 and the top seat 11 are rotatably installed with a transmission screw 8. The lifting plate 9 is sleeved on the guide column 10 and the transmission screw 8. The base 7 is fixedly installed with a motor 6. The output shaft of the motor 6 is in transmission connection with the transmission screw 8. One end of the lifting plate 9 extends to the middle part of the funnel 1. One end of the lifting plate 9 is fixedly installed with a telescopic pipe 13. The bottom end of the telescopic pipe 13 is fixedly connected with a pressing plate 14 with an inner cavity. The size of the pressing plate 14 is smaller than the caliber size of the connection part of the funnel 1 and the drain pipe 4. A plurality of liquid outlet holes 1401 are formed in the pressing plate 14. The free end of the telescopic pipe 13 is connected with a booster pump 12. The liquid outlet of the funnel 1 and the liquid inlet of the drain pipe 4 are connected through screw thread. A plurality of branch pipes 5 are fixedly connected with the drain pipe 4. The funnel 1 is used for collecting waste photoresist. Under the action of gravity, the waste photoresist is transported to a waste liquid collecting station after entering the drain pipe 4 along the funnel 1. When the photoresist is blocked at the liquid outlet of the funnel 1, the motor 6 drives the transmission screw 8 to rotate, drives the lifting plate 9 to drive the outer pipe of the telescopic pipe 13 and the pressing plate 14 to descend to the inside of the funnel 1, and moves up and down at the connection part of the funnel 1 and the drain pipe 4 to dredge the blocked photoresist. At the same time, under the action of the booster pump 12, the photoresist dissolving agent is sent into the pressing plate 14 through the telescopic pipe 13 and is sprayed outward through the liquid outlet holes 1401 to dissolve the photoresist and accelerate the dredging effect of the photoresist, thereby solving the blocking problem at the connection part of the funnel 1 and the drain pipe 4.

[0028] Specifically, as shown in Figure 4 Specifically, as shown in

[0029] Specifically, as shown in Figure 1 Specifically, as shown in

[0030] Working principle: when in use, the funnel 1 is used to collect waste photoresist, under the action of gravity, the waste photoresist enters the liquid outlet pipe 4 along the funnel 1 and is transported to the waste liquid collection station, when the photoresist is blocked in the liquid outlet of the funnel 1, the motor 6 drives the transmission screw 8 to rotate, drives the lifting plate 9 to drive the telescopic pipe 13 outer tube and the pressing plate 14 to descend to the inside of the funnel 1, and moves up and down at the connecting place of the funnel 1 and the liquid outlet pipe 4, and the photoresist blocked in the connecting place is dredged, and the convex ridge 141 can disperse the waste photoresist in the form of glue into the form of fine stream, and accelerates the outflow speed of the photoresist, at the same time, under the action of the booster pump 12, the photoresist dissolving agent is sent into the pressing plate 14 through the telescopic pipe 13 and is sprayed to the outside through the liquid outlet hole 1401, and the photoresist is dissolved, and the dredging effect of the photoresist is accelerated, so as to solve the blocking problem of the connecting place of the funnel 1 and the liquid outlet pipe 4.

[0031] The above is only the preferred specific implementation of the present application, but the protection scope of the present application is not limited to this, any skilled person in the art can make equivalent replacement or change according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.

Claims

1. A waste photoresist discharging device and a coating and developing machine comprising a hopper (1) and a liquid discharge pipe (4), characterized in that, The funnel (1) is provided with a lifting plate (9) moving along the axial direction of the funnel (1), one end of the lifting plate (9) extends to the middle of the funnel (1), a telescopic pipe (13) is fixedly installed at one end of the lifting plate (9), a pressing plate (14) with an internal cavity is fixedly connected to the bottom end of the telescopic pipe (13), a plurality of liquid outlet holes (1401) are formed in the pressing plate (14), and a booster pump (12) is communicated with the free end of the telescopic pipe (13).

2. The waste photoresist discharging device and the coating and developing machine according to claim 1, wherein The funnel (1) is fixedly connected with a base (7) on one side, the base (7) is fixedly connected with a guide column (10), the top of the guide column (10) is fixedly connected with a top base (11), a transmission screw rod (8) is rotatably installed between the base (7) and the top base (11), the lifting plate (9) is sleeved on the transmission screw rod (8) of the guide column (10), a motor (6) is fixedly installed on the base (7), and the output shaft of the motor (6) is in transmission connection with the transmission screw rod (8).

3. The waste photoresist discharging apparatus and the coating and developing machine according to claim 2, wherein A plurality of convex ribs (141) are fixedly connected to the pressing plate (14) and arranged between the liquid outlet holes (1401).

4. The waste photoresist discharging apparatus and the coating and developing machine according to claim 3, wherein The funnel (1) is fixedly connected with an open baffle (3) at the top, and a gap slot (301) for accommodating the lifting plate (9) is formed in one side of the baffle (3).

5. The waste photoresist discharging apparatus and the coating and developing machine according to claim 4, wherein The funnel (1) is fixedly connected with a fixed seat (2) on the opening side of the baffle (3).

6. The waste photoresist discharging apparatus and the coating and developing machine according to claim 5, wherein The liquid outlet of the funnel (1) and the liquid inlet of the drain pipe (4) are connected through thread rotation, and a plurality of branch pipes (5) are fixedly communicated with the drain pipe (4).

Images