Vacuum gauge protection structure for chemical vapor deposition equipment
By introducing heating and heat dissipation connecting pipes and filter structures into the vacuum gauge equipment, the problem of vacuum gauges being damaged by adsorption of deposited materials in low-temperature environments is solved, achieving multi-layer protection for the vacuum gauge and preventing probe damage.
Patent Information
- Application Number
- CN202423070444.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-12
- Publication Date
- 2025-12-26
- Estimated Expiration
- 2034-12-12
AI Technical Summary
Existing vacuum gauges are easily damaged by deposited materials in low-temperature environments, leading to probe damage.
The protective structure consists of heating and cooling connecting pipes. The heating coils raise the temperature to block the heat flow and prevent the material from decomposing. The cooling connecting pipes adsorb residual material, and the filter screen forms a multi-layered protection.
It effectively protects the vacuum gauge and prevents probe damage, achieving dual protection for the pyrolyzed material.
Smart Images

Figure CN223723218U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to chemical vapor deposition equipment technical field, especially a vacuum gauge protection structure for chemical vapor deposition equipment. BACKGROUND
[0002] The signal measured by the vacuum gauge is transmitted to the vacuum gauge, and the vacuum degree of the measured vacuum environment is displayed after amplification processing. It is mainly applied to the vacuum degree measurement field of the vacuum environment, such as vacuum coating, solar heat collecting tube manufacturing, vacuum smelting and the like.
[0003] CVD (Chemical Vapor Deposition) is a chemical reaction process. It is heated to decompose one or more gases (called precursors), produce polymerization reaction, and deposit on the substrate surface to form the required thin film. CVD has the characteristics of low deposition temperature, easy control of thin film composition, proportional relationship between film thickness and deposition time, good uniformity, good repeatability and excellent step coverage. The vacuum gauge is used to measure the vacuum degree in the deposition chamber. Since the deposition material is cracked, its nature is to adsorb at low temperature. The existing vacuum gauge is easy to be adsorbed by the film layer in the low temperature environment, causing the probe to be damaged.
[0004] Therefore, the utility model aims at providing a vacuum gauge protection structure for chemical vapor deposition equipment. By changing the contact temperature of the vacuum gauge, the cracked material can be blocked, and the vacuum gauge can be effectively protected to prevent the probe from being damaged. SUMMARY
[0005] In order to overcome the shortcomings and deficiencies in the prior art, the purpose of the utility model is to provide a vacuum gauge protection structure for chemical vapor deposition equipment. The utility model heats and warms the pipeline, which plays a blocking role. The heating and warming of the pipeline will form a heat flow, which can prevent the cracked material from passing through. The heat dissipation end of the rear section cools down the pipe fitting, adsorbs some residual materials that have passed through by chance, and forms a second protection. Each interface has a fine filter screen, which increases the protection function and forms a third protection. The vacuum gauge can be effectively protected to prevent the probe from being damaged.
[0006] The purpose of the utility model is realized by the following technical scheme: a vacuum gauge protection structure for chemical vapor deposition equipment, comprising a vacuum gauge pipe, a heating connection pipeline and a heat dissipation connection pipeline, one end of the heat dissipation connection pipeline is connected with the vacuum gauge pipe, the other end is connected with the heating connection pipeline, and the heating connection pipeline is provided with a heating ring. The heating connection pipeline is heated and warmed by the heating ring to form a heat flow to block the cracked material. The heat dissipation connection pipeline can reduce the temperature of the pipeline to adsorb some residual materials that have passed through by chance, and play a double protection role.
[0007] As a kind of improvement of the utility model chemical vapor deposition equipment vacuum gauge protection structure, the outer surface of the heat dissipation connecting pipeline is provided with multiple fins. The fins are in the form of round pieces, and the multiple fins are evenly spaced on the outer surface of the heat dissipation connecting pipeline, which can reduce the temperature of the heat dissipation connecting pipeline.
[0008] As a kind of improvement of the utility model chemical vapor deposition equipment vacuum gauge protection structure, the interface between the vacuum gauge tube and the heat dissipation connecting pipeline is provided with a first filter screen, and the interface between the heating connecting pipeline and the heat dissipation connecting pipeline is provided with a second filter screen. The interface positions of the vacuum gauge tube, the heating connecting pipeline and the heat dissipation connecting pipeline are all provided with fine mesh filter screens, which increases the protection function and forms the third protection.
[0009] As a kind of improvement of the utility model chemical vapor deposition equipment vacuum gauge protection structure, the heating ring is heated by a heating resistor.
[0010] As a kind of improvement of the utility model chemical vapor deposition equipment vacuum gauge protection structure, one end of the heat dissipation connecting pipeline is provided with a first flange, the other end is provided with a second flange, the end of the vacuum gauge tube is provided with a third flange, one end of the heating connecting pipeline is provided with a fourth flange, the other end is provided with a fifth flange, the first flange is fixedly connected with the third flange, and the second flange is fixedly connected with the fourth flange.
[0011] The beneficial effects of the utility model are that the heating connecting pipeline is heated by the heating ring to form a heat flow that can block the passage of cracked materials. The heat dissipation connecting pipeline can reduce the temperature of the pipeline and adsorb some residual materials that have passed by, playing a double protection role. BRIEF DESCRIPTION OF DRAWINGS
[0012] Figure 1 is the perspective view of the utility model;
[0013] Figure 2 is the exploded schematic view of the utility model;
[0014] The reference signs are: 1, vacuum gauge tube, 2, heating connecting pipeline, 3, heat dissipation connecting pipeline, 4, heating ring, 5, fin, 6, first filter screen, 7, second filter screen, 11, third flange, 21, fourth flange, 22, fifth flange, 31, first flange, 32, second flange. DETAILED DESCRIPTION
[0015] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.
[0016] It should be noted that all the directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present application are only used to explain the relative positional relationship and movement condition between components in a certain specific posture (as shown in the drawings), and if the specific posture changes, the directional indications will also change accordingly.
[0017] In addition, the description of "first", "second" and the like in the present application is only for the purpose of description, and cannot be understood as indicating or implying the relative importance of the indicated technical features or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first" and "second" can explicitly or implicitly include at least one of the features. In addition, the technical solutions of each embodiment can be combined with each other, but it must be based on the fact that a person skilled in the art can realize it, and when the combination of technical solutions appears contradictory or unachievable, it should be considered that the combination of technical solutions does not exist, and is not within the protection scope required by the present application.
[0018] As shown in Figure 1 and Figure 2 A vacuum gauge protection structure for chemical vapor deposition equipment, including vacuum gauge pipe 1, heating connection pipeline 2 and heat dissipation connection pipeline 3, one end of heat dissipation connection pipeline 3 is connected with vacuum gauge pipe 1, the other end is connected with heating connection pipeline 2, and heating connection pipeline 2 is provided with heating ring 4. The heating connection pipeline 2 is heated and warmed by the heating ring 4, and a heat flow is formed to block the passage of the cracked material. The heat dissipation connection pipeline can reduce the temperature of the pipeline, adsorb some residual materials that pass by, and play a double protection role.
[0019] Preferably, a plurality of heat dissipation fins 5 are arranged on the outer surface of the heat dissipation connection pipeline 3. The heat dissipation fins 5 are in the shape of a round piece, and the plurality of heat dissipation fins 5 are evenly arranged on the outer surface of the heat dissipation connection pipeline 3, so as to reduce the temperature of the heat dissipation connection pipeline.
[0020] Preferably, a first filter screen 6 is arranged at the interface between the vacuum gauge pipe 1 and the heat dissipation connection pipeline 3, and a second filter screen 7 is arranged at the interface between the heating connection pipeline 2 and the heat dissipation connection pipeline 3. The interface positions of the vacuum gauge pipe 1, the heating connection pipeline 2 and the heat dissipation connection pipeline 3 are all provided with fine mesh filter screens, so as to increase the protection function and form a third protection.
[0021] Preferably, the heating ring 4 is heated by a heating resistor.
[0022] Preferably, one end of the heat dissipation connecting pipe 3 is provided with a first flange plate 31, the other end is provided with a second flange plate 32, the end of the vacuum gauge tube 1 is provided with a third flange plate 11, one end of the heating connecting pipe 2 is provided with a fourth flange plate 21, the other end is provided with a fifth flange plate 22, the first flange plate 31 is fixedly connected with the third flange plate 11, and the second flange plate 32 is fixedly connected with the fourth flange plate 21.
[0023] Although the embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and the scope of the present application, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A vacuum gauge protection structure for a chemical vapor deposition apparatus, characterized by, The vacuum gauge pipe, the heating connecting pipe and the heat dissipation connecting pipe are provided, one end of the heat dissipation connecting pipe is connected with the vacuum gauge pipe, the other end is connected with the heating connecting pipe, and the heating connecting pipe is provided with a heating ring.
2. The vacuum gauge protection structure for a chemical vapor deposition apparatus according to claim 1, wherein The outer surface of the heat dissipation connecting pipe is provided with a plurality of heat dissipation fins.
3. The vacuum gauge protection structure for a chemical vapor deposition apparatus according to claim 1, wherein The interface between the vacuum gauge pipe and the heat dissipation connecting pipe is provided with a first filter screen, and the interface between the heating connecting pipe and the heat dissipation connecting pipe is provided with a second filter screen.
4. The vacuum gauge protection structure for a chemical vapor deposition apparatus according to claim 1, wherein The heating ring is heated by a heating resistor.
5. The vacuum gauge protection structure for a chemical vapor deposition apparatus according to claim 1, wherein One end of the heat dissipation connecting pipe is provided with a first flange plate, the other end is provided with a second flange plate, the end of the vacuum gauge pipe is provided with a third flange plate, one end of the heating connecting pipe is provided with a fourth flange plate, the other end is provided with a fifth flange plate, the first flange plate is fixedly connected with the third flange plate, and the second flange plate is fixedly connected with the fourth flange plate.