Coating auxiliary device and coating equipment

Abstract

The utility model provides a coating auxiliary device and coating equipment, the coating auxiliary device is used for assisting an evaporation source in coating, and the coating auxiliary device comprises an evaporation chamber and a barrier strip assembly. The evaporation chamber comprises an evaporation cavity used for containing an evaporation source, an evaporation opening is formed in the evaporation chamber, and the evaporation cavity is communicated with the coating cavity through the evaporation opening. The barrier strip assembly is arranged at the evaporation opening and used for shielding the evaporation opening so that an evaporation gap can be formed in the evaporation opening. The evaporation chamber is arranged, the evaporation chamber comprises the evaporation cavity used for containing the evaporation source, the movement range of steam molecules of the evaporation source in the film coating process can be limited in the evaporation cavity, and therefore the problem that the steam concentration distribution of different evaporation sources is not uniform is solved. And meanwhile, the bad disturbance of the coating steam caused by the movement of the workpiece can be reduced. And the evaporation gaps are beneficial to uniformly releasing the steam, so that the thickness difference of the steam on the surface of the workpiece is reduced, and the uniformity and consistency of the film layer are further improved.

Description

Technical Field

[0001] This application relates to the field of vacuum coating technology, specifically to coating auxiliary devices and coating equipment. Background Technology

[0002] When the coating equipment starts operating, the evaporated reagents deposit onto the workpiece to form a film. Due to the vapor thermal property of steam, it rises, resulting in a higher steam concentration at the top and a lower concentration at the bottom, thus leading to poor film uniformity. Furthermore, the uncontrollable concentration distribution and movement speed of the steam can cause significant differences in film uniformity and adhesion even with the same process, and also results in higher reagent consumption. Utility Model Content

[0003] Therefore, it is necessary to provide a coating auxiliary device that can solve at least one of the above problems and a coating equipment that uses the auxiliary device.

[0004] This application provides a coating auxiliary device for assisting in the coating of an evaporation source. The coating auxiliary device includes an evaporation chamber and a baffle assembly. The evaporation chamber includes an evaporation cavity for accommodating the evaporation source. An opening is provided on the evaporation chamber, and the evaporation cavity communicates with a coating cavity through the opening. The baffle assembly is disposed at the opening and is used to partially block the opening to form an evaporation gap.

[0005] This application, by incorporating an evaporation chamber including an evaporation cavity to accommodate the evaporation source, confines the movement of vapor molecules from the evaporation source within the evaporation cavity during the coating process, thereby reducing the problem of uneven vapor concentration distribution from different evaporation sources. Simultaneously, it also reduces undesirable disturbances to the coating vapor caused by workpiece movement. The evaporation gaps facilitate uniform vapor release, reducing thickness differences on the workpiece surface and thus improving the uniformity and consistency of the film. Due to the enhanced controllability of vapor concentration and movement, reagent consumption is reduced.

[0006] In some embodiments of this application, the stop bar assembly includes a first stop bar, a second stop bar, and fasteners, wherein the first stop bar and the second stop bar are disposed opposite to each other and are fixed to both sides of the opening by the fasteners.

[0007] In some embodiments of this application, the evaporation chamber has an extending direction, and the evaporation chamber has an upper end face and a lower end face that are opposite to each other in the extending direction, and the two ends of the evaporation gap extend toward the upper end face and the lower end face, respectively.

[0008] In some embodiments of this application, there is a first gap between the evaporation gap and the upper end face, and a second gap between the evaporation gap and the lower end face. Both the first gap and the second gap are less than or equal to 1 / 4 of the extension length of the evaporation chamber in its extension direction.

[0009] In some embodiments of this application, the width of the evaporation gap is less than or equal to 1 / 5 of the width of the evaporation chamber, and / or the evaporation gap is located in the middle region of the width direction of the evaporation chamber.

[0010] A coating apparatus includes an evaporation source and the coating apparatus further includes the aforementioned coating auxiliary device, wherein the evaporation source is disposed within the evaporation cavity of the coating auxiliary device.

[0011] In some embodiments of this application, at least two evaporation sources are provided, and the at least two evaporation sources are spaced apart along the extension direction of the evaporation gap.

[0012] In some embodiments of this application, the evaporation source is movably disposed within the evaporation cavity of the coating auxiliary device to adjust the distance between the evaporation source and the evaporation gap.

[0013] In some embodiments of this application, the distance between the evaporation source and the opening is 1 cm to 2 cm.

[0014] In some embodiments of this application, the coating apparatus further includes a fixing plate disposed on the side of the evaporation chamber near the evaporation source, and the fixing plate is used to detachably cover the evaporation chamber onto the inner wall of the coating chamber.

[0015] In some embodiments of this application, the evaporation chamber includes a bottom plate, a top plate disposed opposite to the bottom plate, and a plurality of side walls disposed around the bottom plate, each side wall having an opening, and a baffle assembly fixed to the side wall. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the coating auxiliary device of this application.

[0017] Figure 2 This is an exploded view of the coating auxiliary device of this application.

[0018] Figure 3 This is a cross-sectional view of the coating auxiliary device of this application.

[0019] Figure 4 yes Figure 2 Enlarged view of point A.

[0020] Figure 5 This is a cross-sectional view of the coating equipment of this application.

[0021] Figure 6 This is a color difference comparison diagram of the evaporation source in this application located at different positions in the evaporation chamber.

[0022] Figure 7 This is a comparison diagram of the uniformity after the coating auxiliary device is installed in this application.

[0023] Explanation of key component symbols:

[0024] Evaporation source 100; evaporation chamber 200; evaporation cavity 201; opening 202; evaporation gap 310; baffle assembly 300; first baffle 301; second baffle 302; fastener 303; socket 203; fixing plate 204; bottom plate 210; top plate 211; side wall 212; coating equipment 10; coating cavity 11.

[0025] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this application. Detailed Implementation

[0026] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0027] It should be noted that when a component is considered to be "connected" to another component, it can be directly connected to the other component or may also include a component that is centered on it. When a component is considered to be "set on" another component, it can be directly set on the other component or may also include a component that is centered on it.

[0028] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0029] Please see Figure 1 This application provides a coating auxiliary device for assisting an evaporation source 100 in coating. The coating auxiliary device includes an evaporation chamber 200 and a baffle assembly 300. The evaporation chamber 200 includes an evaporation cavity 201 for accommodating the evaporation source 100. A workpiece is placed on the evaporation source 100. An opening 202 is provided on the evaporation chamber 200, and the evaporation cavity 201 communicates with the coating chamber 11 through the opening 202. The baffle assembly 300 is disposed at the opening 202 and is used to partially block the opening 202 to form an evaporation gap 310.

[0030] This application provides a coating auxiliary device to assist in the coating process of an evaporation source 100. The workpiece is positioned on the evaporation source 100. By providing an evaporation chamber 200, which includes an evaporation cavity 201 for accommodating the evaporation source 100, the movement range of vapor molecules from the evaporation source 100 during the coating process is confined within the evaporation cavity 201, thereby reducing the problem of uneven vapor concentration distribution from different evaporation sources 100. Simultaneously, it also reduces undesirable disturbances to the coating vapor caused by workpiece movement. The evaporation gap 310 is a linear gap formed by the baffle assembly 300. The evaporation gap 310 helps to uniformly release vapor, reducing the thickness difference of vapor on the workpiece surface, thereby improving the uniformity and consistency of the film layer. Due to the enhanced controllability of vapor concentration and movement, the consumption of reagents is reduced.

[0031] Please see Figure 1 and Figure 2 In some embodiments of this application, the baffle assembly 300 includes a first baffle 301, a second baffle 302, and a fastener 303. The first baffle 301 and the second baffle 302 are disposed opposite to each other and fixed to both sides of the opening 202 by the fastener 303, thereby forming an evaporation gap 310 in the opening 202. The opposing first baffle 301 and the second baffle 302 effectively control the steam release area. The formation of the evaporation gap allows steam to be released uniformly along a linear direction when passing through the opening 202, thus ensuring more uniform steam deposition on the workpiece surface. By disposing the baffle assembly 300 on both sides of the opening 202, the uniformity and controllability of steam release are significantly improved, which helps to improve film quality and adhesion, and enhances the application flexibility and efficiency of the coating equipment.

[0032] Please see Figure 1 and Figure 2In some embodiments of this application, multiple fasteners 303 are provided, spaced apart along the length of the first stop bar 301 and the second stop bar 302. The use of multiple fasteners 303 enhances the fixing effect of the stop bars. By uniformly distributing the fasteners 303 along the length direction, displacement of the stop bars due to thermal expansion and contraction or vibration during use can be effectively prevented, thereby ensuring that the first stop bar 301 and the second stop bar 302 always maintain a relatively fixed position, thus maintaining the stability of the evaporation gap 310. In some embodiments, a groove can be provided on the stop bar, and the fasteners 303 are disposed within the groove, allowing the first stop bar 301 and the second stop bar 302 to move relative to the fasteners 303, thereby controlling the size of the evaporation gap 310. By adjusting the position of the fasteners 303 within the groove, the size of the evaporation gap can be precisely controlled. This refined control prevents excessive or insufficient steam release from areas of concentrated steam, ensuring uniform steam deposition on the workpiece surface. This helps improve the uniformity and quality of the film, especially in demanding coating applications. With adjustable evaporation seams, the coating system becomes more adaptable to workpieces of different materials, structures, and thicknesses. When dealing with multiple workpiece types or under different process conditions, users can quickly adjust the positions of the first stop 301 and the second stop 302 to achieve the best coating effect.

[0033] In one embodiment of this application, the evaporation chamber 200 has an extending direction, and the evaporation chamber 200 has an upper end face and a lower end face that are opposite to each other in the extending direction. The two ends of the evaporation gap 310 extend towards the upper end face and the lower end face, respectively. This makes the evaporation gap linear, ensuring uniform steam coverage, thereby improving the deposition effect of the film layer. It not only optimizes the uniformity and efficiency of steam release, but also enhances the stability and adaptability of the system.

[0034] In one embodiment of this application, a first distance is provided between the evaporation slot 310 and the upper end face, and a second distance is provided between the evaporation slot 310 and the lower end face. Both the first and second distances are less than or equal to 1 / 4 of the extension length of the evaporation chamber 200 in its extension direction. The fact that both the first and second distances are less than or equal to 1 / 4 of the extension length helps to ensure that steam is released more smoothly from the evaporation slot 310 into the evaporation chamber 200. This reduces eddies and non-uniformity that may exist during steam flow, resulting in more consistent steam contact with the workpiece and improving the uniformity and quality of the film layer.

[0035] In one embodiment of this application, the width of the evaporation gap 310 is less than or equal to 1 / 5 of the width of the evaporation chamber 200, and / or the evaporation gap is located in the middle region of the evaporation chamber 200 in the width direction. Limiting the width of the evaporation gap relative to the width of the evaporation chamber 200 makes steam release more controllable. By keeping the gap width below 1 / 5 of the total width, the diffusion range of steam can be effectively reduced, thereby concentrating the steam before it reaches the workpiece, ensuring the uniformity and effectiveness of the released steam deposition on the workpiece surface. The smaller evaporation gap design also helps reduce heat waste, ensuring that the steam maintains a relatively constant temperature before reaching the workpiece. The effective sealing design reduces heat diffusion within the evaporation chamber 200, concentrating more heat in the evaporation area and promoting improved evaporation efficiency.

[0036] Please see Figure 5 A coating apparatus includes an evaporation source 100 and a coating auxiliary device as described above. The evaporation source 100 is disposed within an evaporation cavity 201 of the coating auxiliary device. By using the coating auxiliary device including an evaporation chamber 200, which includes an evaporation cavity 201 for accommodating the evaporation source 100, the movement range of vapor molecules from the evaporation source 100 during the coating process can be confined within the evaporation cavity 201, thereby reducing the problem of uneven vapor concentration distribution from different evaporation sources 100. Simultaneously, it can also reduce undesirable disturbances to the coating vapor caused by workpiece movement. The linear opening 202 facilitates uniform vapor release, reduces thickness differences of vapor on the workpiece surface, and thus improves the uniformity and consistency of the film layer. Due to the enhanced controllability of vapor concentration and movement, the consumption of reagents is reduced.

[0037] In some embodiments of this application, at least two evaporation sources 100 are provided, spaced apart along the extension direction of the evaporation gap 310. The multiple evaporation sources 100 spaced along the evaporation gap 310 allow for more uniform steam release over a larger area. This arrangement helps reduce the problem of uneven local steam concentration caused by a single evaporation source 100, thereby enabling more uniform steam coverage of the workpiece surface and improving the uniformity and consistency of the film layer. With the design of multiple evaporation sources 100, the user can directly control the output power and steam release rate of each evaporation source 100. This allows for more precise film thickness control in different sections, meeting stringent requirements for film performance, especially in high-precision coating applications. The parallel operation of multiple evaporation sources 100 significantly improves evaporation efficiency, thereby shortening the coating time.

[0038] In one embodiment of this application, the evaporation source 100 is movably disposed within the evaporation cavity 201 to adjust the distance between the evaporation source 100 and the evaporation gap 310. In some embodiments, the evaporation source 100 can be inserted into a coating auxiliary device and movably connected to a socket. The movable connection includes snap-fit ​​and plug-in connections.

[0039] Please see Figure 3 In some embodiments of this application, the distance between the evaporation source 100 and the opening 202 is 1 cm to 2 cm. By setting the distance between the evaporation source 100 and the opening 202 to 1 cm to 2 cm, steam can be distributed more evenly to the surrounding area. When the agent evaporates, the hot gas diffuses upwards and outwards. The centrally located evaporation source 100 makes the direction and intensity of steam generation symmetrical in the vertical and horizontal directions, thereby helping to reduce uneven distribution of steam concentration. The centrally located evaporation source 100 can minimize the difference in distance required for steam to reach different positions of the workpiece. In the central region of the evaporation source 100 near the workpiece, the attenuation effect of steam during propagation is small, which allows the workpiece at different positions to receive steam from the evaporation source 100 more evenly, thereby ensuring the uniformity of film thickness. The evaporation source 100 in the middle of the evaporation chamber 200 helps to optimize heat distribution. During the coating process, temperature uniformity has an important impact on the evaporation rate and effect of the agent.

[0040] Please see Figure 3 In some embodiments of this application, the evaporation chamber 200 is provided with a port 203 corresponding to the evaporation source 100. The port 203 is used for the evaporation source 100 to pass through and be accommodated within the evaporation cavity 201. The design of the port 203 makes the installation and replacement of the evaporation source 100 more convenient. The position of the evaporation source 100 within the evaporation chamber 200 can also be adjusted. Users can adjust the depth or position of the evaporation source 100 according to the characteristics of the workpiece and the coating requirements to achieve more precise steam distribution and film deposition. For example, by changing the position of the evaporation source 100 in the port 203, the steam flow can be optimized and the uniformity of the film layer can be enhanced. The presence of the port 203 helps to improve the guidance and flow of steam. By rationally designing the shape and size of the port 203, eddies and backflow phenomena during the steam flow process can be minimized, promoting a smoother flow of steam towards the workpiece.

[0041] Please see Figure 1 and Figure 2In some embodiments of this application, a fixing plate 204 is also included. The fixing plate 204 is disposed on the side of the evaporation chamber 200 near the evaporation source 100, and is used to detachably mount the evaporation chamber 200 onto the inner wall of the coating chamber 11. The detachable structure allows operators to quickly view the evaporation source 100 and its surrounding environment, facilitating maintenance, cleaning, and reagent replacement. This not only improves the operability of the equipment but also reduces maintenance costs and downtime. By connecting the fixing plate 204 to the evaporation chamber 200 and the evaporation source 100, equipment movement due to vibration or thermal expansion during the coating process can be effectively prevented. This stable connection helps ensure the fixed position of the evaporation source 100 during operation, thereby maintaining the uniformity of steam release and improving the quality of the film layer. The fixing plate 204 can also optimize the control and distribution of steam during the coating process. By rationally designing the shape of the fixing plate 204 and the position of the opening 202, steam can be guided to be more evenly distributed within the evaporation chamber 200, which helps to improve the steam flow pattern and further enhance the uniformity and adhesion of the film layer.

[0042] Please see Figure 1 and Figure 4 In some embodiments of this application, the evaporation chamber 200 includes a base plate 210, a top plate 211 opposite to the base plate 210, and a plurality of side walls 212 disposed around the base plate 210. Each side wall 212 has an opening 202, and a baffle assembly 300 is fixed to the side wall 212. The opening 202 on each side wall 212 is an important channel for steam release. By fixing the baffle assembly 300 to the side wall 212, an evaporation gap 310 can be formed in the opening 202, ensuring that steam is released more uniformly. The design of the side wall 212 allows for free selection of the position of the opening 202 according to actual needs, thereby accommodating workpieces of different shapes and sizes and providing flexibility for the coating process. This flexibility enables the equipment to be compatible with a variety of different workpiece processing requirements.

[0043] Performance testing:

[0044] (1) Comparison of uniformity improvement effects:

[0045] Using the same batch of test pieces, the same equipment, and the same process, the distance from which the evaporation boat extended into the evaporator was varied: closer (0.3-0.5 cm), moderate (1-2 cm), and farther (3-4 cm). The difference between this distance and the coating thickness was determined by color difference shift. The test results are as follows: Figure 6 As shown, the optimal film uniformity is obtained when the distance between the evaporation source 100 and the opening 202 is 1cm to 2cm.

[0046] (2) Comparison of uniformity adjustment effects:

[0047] Using the same batch of test pieces, the same equipment, and the same process, normal coating was performed. Before coating, the material had uneven color difference, with the overall color difference distribution showing a "high at both ends" and "low in the middle" distribution curve. After one normal coating, the same process was used, but a baffle assembly was installed on the opening of the coating auxiliary device to block the light by about 2cm before coating again. The color difference between the two batches was compared. The test results are as follows: Figure 7 As shown, after installing the baffle assembly on the opening of the coating auxiliary device, the material film layer in the middle layer of the rod is thinner, and the L value decreases less. Compared with the material itself and the sample coated without the baffle assembly, the range of color difference variation is reduced, and the overall uniformity is improved.

[0048] (3) Comparison of adhesion improvement effects

[0049] Using the same batch of test blocks, the same equipment and process, AF agent was vapor-deposited under conditions with and without a coating auxiliary device, and the water droplet angle and Tx data of the test blocks were measured. The data are shown in Table 1 below.

[0050] Table 1

[0051]

[0052] According to the data in the table, the water droplet angle and Tx data after installing the coating auxiliary device are both OK, and the water droplet angle loss of Tx0~Tx6000 is less than that of the test block sample without the coating auxiliary device. It can be seen that the coating auxiliary device can improve the adhesion of the AF film.

[0053] The above embodiments are only used to illustrate the technical solutions of this application and are not intended to limit it. Although this application has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of this application without departing from the spirit and substance of the technical solutions of this application.

Claims

1. A coating auxiliary device for assisting evaporation source coating, characterized in that, The coating auxiliary device includes: An evaporation chamber, comprising an evaporation cavity for accommodating the evaporation source, the evaporation chamber having an opening through which the evaporation cavity communicates with a coating cavity; and A baffle assembly is disposed at the opening and is used to partially block the opening to form an evaporation gap.

2. The coating auxiliary device according to claim 1, characterized in that, The baffle assembly includes a first baffle, a second baffle, and fasteners. The first baffle and the second baffle are arranged opposite to each other to form an evaporation gap. The first baffle and the second baffle are fixed to both sides of the opening by the fasteners.

3. The coating auxiliary device according to claim 1, characterized in that, The evaporation chamber has an extending direction, and the evaporation chamber has an upper end face and a lower end face that are opposite to each other in the extending direction. The two ends of the evaporation gap extend toward the upper end face and the lower end face, respectively.

4. The coating auxiliary device according to claim 3, characterized in that, There is a first gap between the evaporation slit and the upper end face, and a second gap between the evaporation slit and the lower end face. Both the first gap and the second gap are less than or equal to 1 / 4 of the extension length of the evaporation chamber in its extension direction.

5. The coating auxiliary device according to claim 4, characterized in that, The width of the evaporation gap is less than or equal to 1 / 5 of the width of the evaporation chamber, and / or the evaporation gap is located in the middle region of the width direction of the evaporation chamber.

6. A coating apparatus, comprising a coating chamber and an evaporation source located within the coating chamber, characterized in that, The coating equipment further includes a coating auxiliary device as described in any one of claims 1-5, wherein the evaporation source is disposed within the evaporation cavity of the coating auxiliary device.

7. The coating equipment according to claim 6, characterized in that, At least two evaporation sources are provided, and the at least two evaporation sources are spaced apart along the extension direction of the evaporation gap.

8. The coating equipment according to claim 6, characterized in that, The evaporation source is movably disposed within the evaporation cavity to adjust the distance between the evaporation source and the evaporation gap.

9. The coating equipment according to claim 8, characterized in that, The distance between the evaporation source and the opening is 1cm to 2cm.

10. The coating equipment according to claim 6, characterized in that, It also includes a fixing plate, which is disposed on the side of the evaporation chamber near the evaporation source, and the fixing plate is used to detachably mount the evaporation chamber on the inner wall of the coating chamber.

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