PVD (Physical Vapor Deposition) coating uniformity compensation carrier plate

Abstract

The utility model discloses a PVD (Physical Vapor Deposition) coating uniformity compensation carrier plate which comprises a plane plate, a cell to-be-sputtered area is arranged on the plane plate, and the position of the cell to-be-sputtered area is set according to the position of the magnetic field center of a PVD coating target material, so that the center of the cell to-be-sputtered area is aligned with the magnetic field center. And the supporting plate is arranged on the surface plate in a non-centered manner along the width direction of the surface plate. According to the utility model, the problem of poor coating uniformity caused by non-uniform magnetic field distribution of the target material can be effectively solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of solar cell, especially a PVD coating uniformity compensation carrier. BACKGROUND

[0002] Heterojunction cells have high conversion efficiency, simple process flow, low temperature process and other characteristics, and have developed into one of the main technologies of solar cells. Due to the power generation and structural characteristics, a layer of TCO transparent conductive film needs to be deposited on both sides of the heterojunction cell. At present, the deposition of TCO transparent conductive film in industrialization generally adopts the method of PVD magnetron sputtering.

[0003] Excellent coating uniformity is one of the important indicators of PVD equipment, but there is a problem of poor coating uniformity when the PVD equipment is actually used. The poor coating uniformity is caused by uneven distribution of the target material magnetic field, which needs to be frequently adjusted. Not only will it affect the air tightness of the equipment, but also it is very inconvenient to operate. UTILITY MODEL CONTENTS

[0004] The utility model aims at overcoming the defects of the prior art, providing a PVD coating uniformity compensation carrier, which can effectively solve the problem of poor coating uniformity caused by uneven distribution of the target material magnetic field.

[0005] The purpose of the utility model can be achieved by adopting the following technical solutions:

[0006] A PVD coating uniformity compensation carrier, comprising a flat plate, a cell piece to be sputtered area is arranged on the flat plate, the position of the cell piece to be sputtered area is set according to the position of the magnetic field center of the PVD coating target material, so that the center of the cell piece to be sputtered area is aligned with the magnetic field center, and is arranged on the flat plate along the width direction of the flat plate.

[0007] Further, the distance between the one side edge of the cell piece to be sputtered area along the length direction and the one side edge of the flat plate is 80-100mm, and the distance between the other side edge of the cell piece to be sputtered area along the length direction and the other side edge of the flat plate is 140-160mm.

[0008] Further, the cell piece to be sputtered area comprises a plurality of hollow trays arranged in a matrix, each hollow tray is provided with a supporting frame for supporting the cell piece, and the shape of the supporting frame matches the shape of the cell piece.

[0009] Further, the number of hollow trays is 10-200, and the depth of each hollow tray is 2-5mm.

[0010] Further, the width of the supporting frame is 0.5-1.5mm.

[0011] Further, the flat plate is a stainless steel plate or an aluminum alloy plate, and a frosted layer is arranged on the surface of the flat plate.

[0012] Further, the flat plate has a thickness of 3-8mm, a width of 600-2000mm, and a length of 900-2300mm.

[0013] Compared with the prior art, the utility model has the following advantages and beneficial effects:

[0014] The utility model discloses a sputtering area centralization degree is adjusted to the difference rule of the sputtering area uniformity, makes it with the center alignment of PVD coating target material magnetic field, thereby reaches the purpose of uniformity compensation, avoids frequently opening cavity and adjusting magnetic field distribution position, guarantees the air tightness of equipment and improves operation efficiency, solves big problem through small improvement, easy to implement, is suitable for promotion. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 It is the structure schematic view of the utility model's carrier plate. DETAILED DESCRIPTION

[0016] In order to make the purpose, technical scheme and advantage of the utility model embodiment more clear, the technical scheme in the utility model embodiment will be described clearly and completely below in conjunction with the drawings in the utility model embodiment, obviously, the described embodiment is a part of the embodiment of the utility model, instead of all the embodiment, based on the embodiment in the utility model, all other embodiments obtained by the ordinary skill in the art without making the creative labor belong to the range of the utility model protection.

[0017] As Figure 1 The utility model discloses a PVD coating uniformity compensation carrier plate, including flat plate 1, the flat plate 1 is provided with battery piece sputtering area, and the position of battery piece sputtering area is set according to the position of the magnetic field center of PVD coating target material, thereby making the center of battery piece sputtering area with the center alignment of magnetic field, and being set on the flat plate along the non - centered of the width direction of flat plate, thereby reaching the purpose of uniformity compensation.

[0018] Specifically, the side edge 101 of battery piece sputtering area along the length direction and the side edge 102 of flat plate 1 distance is 80-100mm, and the other side edge 103 along the length direction and the other side edge 104 of flat plate 1 distance is 140-160mm.

[0019] Battery piece sputtering area includes a plurality of matrix type arrangement 1011, and the support frame 1012 for supporting battery piece is arranged in each 1011, and the shape of support frame 1012 is matched with the shape of battery piece.

[0020] The number of 1011 is 10-200, and the depth of each 1011 is 2-5mm. The width of the supporting frame 1012 is 0.5-1.5mm.

[0021] The plane plate 1 is a stainless steel plate or an aluminum alloy plate, and a frosted layer is arranged on the surface of the plane plate 1. The thickness of the plane plate 1 is 3-8mm, the width is 600-2000mm, and the length is 900-2300mm.

[0022] The battery piece PVD coating is carried out by using the carrier plate of the prior art and the carrier plate of the embodiment, and the comparison of the battery piece coating uniformity effect is shown in the following table 1.

[0023]

[0024] Table 1 Comparison of battery piece coating uniformity effect

[0025] Therefore, the battery piece PVD coating is carried out by using the carrier plate of the embodiment, which can greatly improve the battery piece coating uniformity, so as to achieve the purpose of uniformity compensation, solve the big problem by small improvement, and is easy to implement and suitable for promotion.

[0026] The above is only a preferred embodiment of the utility model patent, but the protection scope of the utility model patent is not limited to this. Any skilled person in the art can make equivalent replacement or change according to the technical scheme and the utility model patent concept of the utility model patent within the scope disclosed by the utility model patent, which belongs to the protection scope of the utility model patent.

Claims

1. A PVD coating uniformity compensation carrier, characterized by: The planar plate is provided with a sputtering area of a battery piece, and the sputtering area of the battery piece is arranged according to the position of the magnetic field center of a PVD coating target, so that the center of the sputtering area of the battery piece is aligned with the magnetic field center and arranged on the planar plate along the non-central direction of the width of the planar plate.

2. The PVD film uniformity compensation carrier of claim 1, wherein: The distance between the one side edge of the sputtering area of the battery piece along the length direction and the one side edge of the planar plate is 80-100 mm, and the distance between the other side edge of the sputtering area of the battery piece along the length direction and the other side edge of the planar plate is 140-160 mm.

3. The PVD film uniformity compensation carrier of claim 2, wherein: The sputtering area of the battery piece includes a plurality of hollow trays arranged in a matrix, and each hollow tray is provided with a supporting frame for supporting the battery piece, and the shape of the supporting frame matches the shape of the battery piece.

4. The PVD film uniformity compensation carrier of claim 3, wherein: The number of the hollow trays is 10-200, and the depth of each hollow tray is 2-5 mm.

5. The PVD film uniformity compensation carrier of claim 3, wherein: The width of the supporting frame is 0.5-1.5 mm.

6. The PVD film uniformity compensation carrier of claim 1, wherein: The planar plate is a stainless steel plate or an aluminum alloy plate, and the surface of the planar plate is provided with a frosted treatment layer.

7. The PVD film uniformity compensation carrier of claim 6, wherein: The thickness of the planar plate is 3-8 mm, the width is 600-2000 mm, and the length is 900-2300 mm.

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