Moving structure of wafer processing cleaning device

By using a gas-electric isolation positive and negative airway cleaning device, which utilizes negative and positive pressure fans for intelligent cleaning, the problem of dust on the carrier surface affecting product yield is solved, achieving efficient and safe cleaning results.

CN223786450UActive Publication Date: 2026-01-09DONGGUAN VILLO ENVIRONMENTAL PROTECTION INC
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Patent Information

Application Number
CN202520064639.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-01-10
Publication Date
2026-01-09
Estimated Expiration
2035-01-10

AI Technical Summary

Technical Problem

In existing semiconductor manufacturing processes, dust on the surface of the carrier affects product yield, and existing cleaning methods are inefficient and pose risks of scratches and static electricity.

Method used

The device employs a positive and negative airway cleaning system with air-electric isolation. It utilizes negative and positive pressure fans to provide air supply and performs cleaning through a suspended dust removal head. The fans and dust removal head move together to avoid collisions. It is battery powered and achieves intelligent cleaning.

Benefits of technology

It improves the cleaning efficiency and stability of the carrier, reduces the risk of static electricity, and increases product yield.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a moving structure of a wafer processing and cleaning device, which comprises a bottom frame, four corners of the bottom frame are provided with upright columns extending upwards, one end of each upright column far away from the bottom frame is provided with an upper frame body, and the bottom frame, the upright columns and the upper frame body form a mounting frame; a mounting plate is arranged in the mounting frame, a moving mechanism is arranged on the mounting plate, a dust removal mechanism is arranged below the moving mechanism, an air pressure assembly is arranged on the moving mechanism, the dust removal mechanism is connected with the air pressure assembly through a guide pipe, and the dust removal mechanism, the moving mechanism and the air pressure assembly are arranged in the mounting frame; the moving mechanism comprises a first mounting sliding rail, a first rack seat and a first rack seat, the first mounting sliding rail is fixedly arranged below the mounting plate, the first mounting sliding rail and the first rack seat are arranged on the side, away from the stand column, of the mounting plate, and the first rack seat, the first mounting sliding rail and the mounting plate are arranged in parallel. The draught fan is connected with the dust removal head through the pipeline, the draught fan moves along with the dust removal head, and the situation that the draught fan collides with nearby plates and shafts is avoided.
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Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing technology, and in particular to a moving structure of a cleaning device for semiconductor chip manufacturing. Background Technology

[0002] A wafer is a silicon chip used in the fabrication of silicon semiconductor integrated circuits. Wafers are used to produce integrated circuit chips. In the semiconductor manufacturing process, wafers are placed in wafer cassettes and transported to carriers at different load ports via AMHS (Automated Material Handling System). After a period of time, dust will remain on the surface of the carriers, affecting the yield of wafer products.

[0003] To maintain the cleanliness of the carriers, the carriers of semiconductor processing equipment need to be cleaned regularly. Existing cleaning methods mostly use manual cleaning and brush cleaning. Manual cleaning can only be done during equipment maintenance, which is time-consuming, labor-intensive, inefficient, and not conducive to the overall working environment. It is also impossible to control the cleanliness. Brush cleaning is a contact method, which poses the risk of scratching the carriers and generating static electricity. Utility Model Content

[0004] In order to solve the problems existing in the prior art, the purpose of this utility model is to provide a moving structure for a cleaning device for semiconductor chip production, which adopts positive and negative air channels with gas-electric isolation for cleaning, thereby improving the stability and yield of product processing.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A movable structure for a wafer processing cleaning device includes a base frame, with upright columns extending upwards from the four corners of the base frame. An upper frame is located at the end of each column away from the base frame. The base frame, columns, and upper frame together form a mounting frame. A mounting plate is located within the mounting frame, and a movable mechanism is mounted on the mounting plate. A dust removal mechanism is located below the movable mechanism, and a pneumatic assembly is located above the movable mechanism. The dust removal mechanism is connected to the pneumatic assembly via a conduit. The dust removal mechanism, movable mechanism, and pneumatic assembly are all housed within the mounting frame.

[0007] The moving mechanism includes a first mounting slide rail and a first rack seat. The first rack seat and the first mounting slide rail are fixedly mounted under the mounting plate. The first mounting slide rail and the first rack seat are located on the side of the mounting plate away from the column. The first rack seat and the first mounting slide rail are arranged parallel to the mounting plate.

[0008] A first slidable hanging slide is mounted on the first mounting slide rail, and a first motor is fixed on the first hanging slide. The first motor is meshed with the first rack seat for transmission.

[0009] Furthermore, in some embodiments, a pneumatic seat is provided below the first hanging slide, the pneumatic seat is fixedly connected to the first hanging slide, the pneumatic seat is perpendicular to the first mounting slide rail, and one end of the pneumatic seat extends to the outside of the mounting plate; a bearing wheel is provided at the end of the pneumatic seat away from the mounting plate, the bearing wheel is mounted on the support beam, and the support beam is positioned between two adjacent columns.

[0010] Furthermore, in some embodiments, a second mounting slide rail and a second rack seat that are parallel to each other are fixed on the side of the gas component seat away from the first hanging slide seat, and the parallel second mounting slide rail and the second rack seat are arranged perpendicular to the first mounting slide rail;

[0011] A second slidable hanging slide is mounted on the second mounting slide, and a second motor is mounted on the second hanging slide. The second motor is meshed with the second rack seat for transmission.

[0012] Furthermore, in some embodiments, a pneumatic assembly is provided on the side of the gas holder away from the mounting plate, and the pneumatic assembly is disposed on the outside of the mounting plate;

[0013] The pneumatic assembly includes a negative pressure fan and a positive pressure fan. The negative pressure fan is equipped with a negative pressure high-efficiency filter chamber, and the exhaust port of the negative pressure high-efficiency filter chamber extends laterally and is located on the outside of the negative pressure fan.

[0014] The exhaust port of the negative pressure high-efficiency filter chamber is connected to the exhaust port of the dust removal mechanism through a duct, and the positive pressure fan is connected to the air inlet of the dust removal mechanism through another duct.

[0015] Furthermore, in some embodiments, a silencer box is provided on one side of the negative pressure fan, and the air outlet of the negative pressure fan is connected to the silencer box through a duct.

[0016] The silencer box is equipped with a square honeycomb tube. Several through holes are opened on the square tube plate of the frame of the square honeycomb tube. The square honeycomb tube is equipped with oblique honeycomb baffles that intersect left and right.

[0017] Furthermore, in some embodiments, the inclined honeycomb baffles extend upward from the inner wall of the square honeycomb tube at an angle, and the inclined honeycomb baffles on both sides are arranged alternately, with the inclined honeycomb baffles on both sides intersecting each other. The top parts of the inclined honeycomb baffles on both sides overlap vertically, and the intersecting inclined honeycomb baffles on both sides form an S-shaped air duct inside the square honeycomb tube.

[0018] Furthermore, in some embodiments, the negative pressure fan is provided with a side air outlet, which is connected to a silencer box via a duct.

[0019] Furthermore, in some embodiments, the mounting plate is disposed in the middle of the mounting frame, one end of the mounting plate is fixedly disposed in the middle of two adjacent columns, and the other end of the mounting plate away from the column is connected to the upper frame through a vertical plate; a vertical frame is provided between the end of the mounting plate near the column and the bottom frame, and a supporting beam is provided between the two columns away from the mounting plate.

[0020] The mounting plate contains a battery.

[0021] Furthermore, in some embodiments, the gear on the output shaft of the first motor is meshed with the first rack seat for transmission; the gear on the output shaft of the second motor is meshed with the second rack seat for transmission.

[0022] A dust removal mechanism is installed at the end of the second hanging slide away from the second hanging slide rail.

[0023] This application uses a suspended dust removal head (dust removal component) for cleaning the carrier. A high-efficiency filter is installed on the suction fan (negative pressure fan) to filter the dust. Two fans provide either positive or negative pressure air supply, eliminating the need for an external air source. Furthermore, it is battery powered, eliminating the need for an external power source. Both the fans and motors are 24 volts, and the entire device is isolated from external air and electricity.

[0024] Two fans are mounted on the mounting rail (transverse guide rail) and can move. The fans are connected to the dust removal head through pipes. The fans move together with the dust removal head. When the dust removal head (dust removal component) moves, the fans move with it. The distance between the fans and the dust removal head will not become too large, which helps to avoid hitting nearby plates and shafts and achieve intelligent cleaning. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the structure of an embodiment of the present utility model;

[0026] Figure 2 This is a schematic diagram illustrating the application of an embodiment of the present utility model;

[0027] Figure 3 This is a perspective view of an embodiment of the present utility model;

[0028] Figure 4 This is a bottom view of an embodiment of the present utility model;

[0029] Figure 5 This is a schematic diagram of the pneumatic component in an embodiment of the present invention;

[0030] Figure 6 This is a schematic diagram of the structure of the gas component seat in an embodiment of this utility model;

[0031] Figure 7 This is a schematic diagram of the negative pressure fan part in an embodiment of this utility model;

[0032] Figure 8 This is a schematic diagram of the moving mechanism in an embodiment of the present invention.

[0033] Explanation of markings in the diagram:

[0034] 11. Base frame, 12. Column, 13. Upper frame, 14. Mounting plate, 15. Support beam, 16. Vertical frame, 21. Moving mechanism, 22. Air component seat, 23. First motor, 24. Second motor, 25. Bearing wheel, 26. Second rack seat, 27. First rack seat, 28. First hanging slide rail, 29. Second hanging slide rail, 33. Second hanging slide, 34. Dust removal mechanism, 41. Battery, 58. Conduit, 59. Air pressure assembly, 61. Negative pressure fan, 62. Positive pressure fan, 63. Silencer box, 65. Negative pressure high-efficiency filter chamber, 66. Side air outlet, 68. Square honeycomb tube, 69. Slanted honeycomb baffle, 71. Carrier, 81. Detailed Implementation

[0035] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions of this utility model will be clearly and completely described below in conjunction with specific embodiments and corresponding drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0036] In the description of this utility model, it should be noted that the terms "lateral," "upper," "lower," "front," "rear," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used solely for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly defined.

[0037] Please refer to the attached drawings. This application includes a base frame 11, with upright columns 12 extending upwards from the four corners of the base frame 11. An upper frame 13 is located at the end of each column 12 away from the base frame 11. The base frame 11, columns 12, and upper frame 13 form an installation frame. An installation plate 14 is provided within the installation frame, positioned in the middle of the frame. One end of the installation plate 14 is fixedly located at the middle of two adjacent columns 12, and the other end of the installation plate 14 away from the columns 12 is connected to the upper frame 13 via a vertical plate. A vertical frame 16 is provided between the end of the installation plate 14 near the columns 12 and the base frame 11. A supporting beam 15 is provided between the two columns 12 away from the installation plate 14. A battery 58 is provided on the installation plate 14, and the base frame 11 is placed on a carrier 81.

[0038] A moving mechanism 21 is mounted on the mounting plate 14. A dust removal mechanism 41 is located below the moving mechanism 21. A pneumatic assembly 61 is located above the moving mechanism 21. The dust removal mechanism 41 is connected to the pneumatic assembly 61 through a conduit 59. The dust removal mechanism 41, the moving mechanism 21, and the pneumatic assembly 61 are arranged in the mounting frame.

[0039] Furthermore, in one embodiment, a battery 58 is provided on the mounting plate 14, and the battery 58 provides power to all power components. See Appendix Figure 8 As shown, attached Figure 8 The diagram illustrates the associated structure of the moving mechanism 21. The moving mechanism 21 includes a first mounting rail 28 and a first rack seat 27. The first rack seat 27 and the first mounting rail 28 are fixed below the mounting plate 14. The first mounting rail 28 and the first rack seat 27 are positioned on the side of the mounting plate 14 away from the column 12, and the first rack seat 27 and the first mounting rail 28 are arranged parallel to the mounting plate 14. A slidable first hanging slide 29 is mounted on the first mounting rail 28, and a first motor 23 is fixed on the first hanging slide 29. The first motor 23 is meshed with the first rack seat 27; specifically, the gear on the output shaft of the first motor 23 is meshed with the first rack seat 27.

[0040] The first motor 23 drives the first hanging slide 29 to move back and forth on the first mounting slide rail 28. The first motor 23 drives the first hanging slide 29 to move on the first rack seat 27 through gear meshing on the output shaft.

[0041] Furthermore, in one embodiment, a pneumatic support 22 is provided below the first hanging slide 29. The pneumatic support 22 is fixedly connected to the first hanging slide 29 and is perpendicular to the first mounting slide rail 28. One end of the pneumatic support 22 extends to the outside of the mounting plate 14. A bearing wheel 25 is provided at the end of the pneumatic support 22 away from the mounting plate 14. The bearing wheel 25 is mounted on the support beam 15, which is positioned between two adjacent columns 12. A second parallel mounting slide rail 33 and a second rack seat 26 are fixedly provided on the side of the pneumatic support 22 away from the first hanging slide 29. The parallel second mounting slide rail 33 and the second rack seat 26 are perpendicular to the first mounting slide rail 28.

[0042] Furthermore, in one embodiment, a slidable second hanging slide 34 is hung on the second mounting slide rail 33, and a second motor 24 is provided on the second hanging slide 34. The second motor 24 is meshed with the second rack seat 26; specifically, the gear on the output shaft of the second motor 24 is meshed with the second rack seat 26.

[0043] Furthermore, in one embodiment, a dust removal mechanism 41 is suspended at the end of the second hanging slide 34 away from the second mounting slide rail 33. A second motor 24 drives the second hanging slide 34 to reciprocate on the second mounting slide rail 33. The second motor 24 drives the second hanging slide 34 to move on the second mounting slide rail 33 via gear engagement on its output shaft. The first motor 23 and the second motor 24 drive the dust removal mechanism 41 to move longitudinally, laterally, left-right, and longitudinally.

[0044] A pneumatic assembly 61 is provided on the side of the gas component seat 22 away from the mounting plate 14, and the pneumatic assembly 61 is located on the outside of the mounting plate 14.

[0045] Furthermore, in one embodiment, the air pressure assembly 61 includes a negative pressure fan 62 and a positive pressure fan 63. The negative pressure fan 62 is provided with a negative pressure high-efficiency filter chamber 66, and the exhaust port of the negative pressure high-efficiency filter chamber 66 extends laterally and is disposed outside the negative pressure fan 62.

[0046] Furthermore, in one embodiment, the exhaust port of the negative pressure high-efficiency filter chamber 66 is connected to the exhaust port of the dust removal mechanism 41 via a duct 59, and the positive pressure fan 63 is connected to the air inlet of the dust removal mechanism 41 via another duct 59.

[0047] The positive pressure fan 63 operates at a pressure of 5–12 kPa, and the negative pressure fan 62 operates at a pressure of -1.5–-6 kPa. The ratio of the air volume of the positive pressure fan 63 to that of the negative pressure fan 62 is 1:1.5–3. The positive pressure fan 63 and the negative pressure fan 62 are connected to the air inlet and exhaust port of the dust removal mechanism 41 via duct 59. During dust removal, they better trap the dust, keeping it within the clean space around the dust removal head (dust removal mechanism 41), forming an air curtain that completely closes off the entire dust removal working space.

[0048] A silencer box 65 is provided on one side of the negative pressure fan 62; specifically, the negative pressure fan 62 is provided with a side air outlet 68, which is connected to the silencer box 65 through a conduit 59; the silencer box 65 is provided with a square frame honeycomb tube 69, and several through holes are opened on the square frame plate of the square frame honeycomb tube 69, and the square frame honeycomb tube 69 is provided with oblique honeycomb baffles 71 that intersect left and right.

[0049] The inclined honeycomb baffle 71 extends upward from the inner wall of the square honeycomb tube 69. The inclined honeycomb baffles 71 on both sides are arranged alternately, and the inclined honeycomb baffles 71 on both sides intersect each other. The top parts of the inclined honeycomb baffles 71 on both sides overlap vertically (longitudinally) to form an S-shaped air duct inside the square honeycomb tube 69, reducing the impact effect of wind waves.

[0050] The above detailed description includes references to the accompanying drawings, which form part of the detailed description. The drawings illustrate, by way of illustration, specific embodiments that can implement the present invention. These embodiments are also referred to herein as "examples". These examples may include other elements besides those shown and described. The inventors also anticipate examples using any combination or arrangement of the shown or described elements, either with respect to a particular example (or one or more aspects thereof) or with respect to other examples shown or described herein (or one or more aspects thereof).

Claims

1. A movable structure for a wafer processing cleaning apparatus, comprising: A base frame (11) is provided with upright columns (12) extending upwards at the four corners of the base frame (11). An upper frame (13) is provided at the end of the column (12) away from the base frame (11). The base frame (11), the columns (12) and the upper frame (13) form an installation frame. The installation frame is characterized by having an installation plate (14) in the installation frame. A moving mechanism (21) is installed on the installation plate (14). A dust removal mechanism (41) is provided below the moving mechanism (21). A pneumatic assembly (61) is provided above the moving mechanism (21). The dust removal mechanism (41) is connected to the pneumatic assembly (61) through a conduit (59). The dust removal mechanism (41), the moving mechanism (21) and the pneumatic assembly (61) are arranged in the installation frame. The moving mechanism (21) includes a first mounting slide rail (28) and a first rack seat (27). The first rack seat (27) and the first mounting slide rail (28) are fixed under the mounting plate (14). The first mounting slide rail (28) and the first rack seat (27) are located on the side of the mounting plate (14) away from the column (12). The first rack seat (27) and the first mounting slide rail (28) are arranged parallel to the mounting plate (14). A first slidable first hanging slide (29) is mounted on the first mounting slide (28), and a first motor (23) is fixed on the first hanging slide (29). The first motor (23) is meshed with the first rack seat (27) for transmission.

2. The moving structure of the wafer processing cleaning device according to claim 1, characterized in that, The first hanging slide (29) is provided with a gas component seat (22) below it. The gas component seat (22) is fixedly connected to the first hanging slide (29). The gas component seat (22) is perpendicular to the first mounting slide rail (28). One end of the gas component seat (22) extends to the outside of the mounting plate (14). The end of the gas component seat (22) away from the mounting plate (14) is provided with a bearing wheel (25). The bearing wheel (25) is set on the support beam (15). The support beam (15) is set between two adjacent columns (12).

3. The moving structure of a wafer processing cleaning device according to claim 2, characterized in that, The side of the gas component seat (22) away from the first hanging slide (29) is fixed with a second hanging slide rail (33) and a second rack seat (26) that are parallel to each other. The parallel second hanging slide rail (33) and second rack seat (26) are perpendicular to the first hanging slide rail (28). A second slidable hanging slide (34) is mounted on the second mounting slide (33). A second motor (24) is mounted on the second hanging slide (34). The second motor (24) is meshed with the second rack seat (26) for transmission.

4. The moving structure of a wafer processing cleaning device according to claim 2, characterized in that, The gas component seat (22) is provided with a pneumatic assembly (61) on the side away from the mounting plate (14), and the pneumatic assembly (61) is located on the outside of the mounting plate (14); The pneumatic assembly (61) includes a negative pressure fan (62) and a positive pressure fan (63). The negative pressure fan (62) is provided with a negative pressure high-efficiency filter chamber (66). The exhaust port of the negative pressure high-efficiency filter chamber (66) extends laterally and is located outside the negative pressure fan (62). The exhaust port of the negative pressure high-efficiency filter chamber (66) is connected to the exhaust port of the dust removal mechanism (41) through a duct (59), and the positive pressure fan (63) is connected to the air inlet of the dust removal mechanism (41) through another duct (59).

5. The moving structure of a wafer processing cleaning device according to claim 4, characterized in that, The negative pressure fan (62) is provided with a silencer box (65) on one side, and the air outlet of the negative pressure fan (62) is connected to the silencer box (65) through a duct (59); The silencer box (65) is provided with a square honeycomb tube (69), and several through holes are opened on the square tube plate of the frame of the square honeycomb tube (69). The square honeycomb tube (69) is provided with oblique honeycomb baffles (71) that intersect each other on the left and right.

6. The moving structure of a wafer processing cleaning device according to claim 5, characterized in that, The inclined honeycomb baffle (71) extends upward from the inner wall of the square honeycomb tube (69). The inclined honeycomb baffles (71) on both sides are arranged in an alternating manner, and the inclined honeycomb baffles (71) on both sides intersect each other. The top parts of the inclined honeycomb baffles (71) on both sides overlap vertically. The intersecting inclined honeycomb baffles (71) on both sides form an S-shaped air duct inside the square honeycomb tube (69).

7. The moving structure of a wafer processing cleaning device according to claim 5, characterized in that, The negative pressure fan (62) is provided with a side air outlet (68), which is connected to the silencer box (65) through a duct (59).

8. The moving structure of a wafer processing cleaning device according to claim 1, characterized in that, The mounting plate (14) is located in the middle of the mounting frame. One end of the mounting plate (14) is fixedly located in the middle of two adjacent columns (12). The other end of the mounting plate (14) away from the column (12) is connected to the upper frame (13) through a vertical plate. A vertical frame (16) is provided between the end of the mounting plate (14) close to the column (12) and the bottom frame (11). A supporting beam (15) is provided between the two columns (12) away from the mounting plate (14). The mounting plate (14) is equipped with a battery (58).

9. The moving structure of a wafer processing cleaning device according to claim 3, characterized in that, The gear on the output shaft of the first motor (23) is meshed with the first rack seat (27); the gear on the output shaft of the second motor (24) is meshed with the second rack seat (26). A dust removal mechanism (41) is suspended at the end of the second hanging slide (34) away from the second hanging slide rail (33).