Wafer overflow cleaning water tank

Abstract

The utility model relates to a wafer overflow cleaning water tank which comprises a fixed bottom plate, and a water tank is arranged on the fixed bottom plate. A guide positioning mechanism and a quick discharge port are arranged at the bottom of the inner side of the water tank; rotary pressing arm mechanisms are arranged on the two sides of the interior of the water tank. A rotary driving mechanism is arranged on the outer side of the water tank; the rotary driving mechanism is connected with the rotary pressing arm mechanism; any side of the water tank is also provided with an overflow port and an RFID component; and a detection element is arranged in the rotary driving mechanism. The rotary pressing arm mechanism is adopted to be matched with the rotary driving mechanism, if Casset is not placed in place in the guiding and positioning mechanism of the water tank, the rotary pressing arm mechanism cannot press down in place, and then the working stroke of an air cylinder of the rotary driving mechanism cannot reach the preset standard. Therefore, a detection element arranged in the air cylinder can monitor and feed back the situation in time, it is prompted that the Casset placement posture is not standard, and the risk of equipment collision is effectively avoided.

Description

Technical Field

[0001] This utility model relates to a cleaning water tank, specifically a wafer overflow cleaning water tank, belonging to the field of wafer manufacturing technology. Background Technology

[0002] In the field of wafer manufacturing technology, a key process is double-sided grinding and polishing of the wafer surface. Currently, the grinding and polishing equipment production process is divided into manual loading and unloading and automatic loading and unloading. During manual loading, the incoming wafers are in a dry state. A worker directly removes the wafer from the wafer tray by hand and places it into the grinding and polishing tank of the equipment. After placement, the worker visually and tactilely inspects the wafer to ensure it is correctly positioned. Only after confirmation will the grinding and polishing equipment begin operation. During manual unloading, a special suction device is used to remove the wafer from the grinding and polishing tank. According to process requirements, after removing the wafer from the tank, it is immediately placed vertically into a wafer transfer tank filled with water. In the automatic loading and unloading process, wafers between grinding and polishing are placed in a cassette within the water tank to isolate them from air and prevent chemical crystallization on the wafer surface. The water tank is placed on a CV conveyor mechanism. After the cassette is full of wafers, the CV conveyor mechanism moves the water tank to the edge of the equipment to await manual transport to the next process. Current CV transport mechanisms such as Figure 1 As shown, the drawbacks of this CV (Continuous Vibration) water tank transfer method are: 1. The sensor has difficulty detecting the status of the Cassette in the tank, i.e., whether the Cassette is manually placed in the correct position, leading to a high false alarm rate and an increased risk of equipment collision. 2. The CV transfer mechanism mainly uses motors, lead screws, gears, and rollers, resulting in a complex structure and high manufacturing and maintenance costs.

[0003] Therefore, further improvements are needed. Utility Model Content

[0004] The purpose of this invention is to overcome the above-mentioned technical deficiencies and propose a wafer overflow cleaning water tank that effectively detects Cassette positioning, eliminates the risk of equipment collision, has a simple transmission method, ensures cleanliness, and has reliable spacing.

[0005] A wafer overflow cleaning water tank includes a fixed base plate on which a water tank is disposed; a guide positioning mechanism and a quick drain port are disposed on the inner bottom of the water tank; a rotating pressure arm mechanism is disposed on both sides of the inner side of the water tank; a rotating drive mechanism is disposed on the outer side of the water tank; the rotating drive mechanism is connected to the rotating pressure arm mechanism; and an overflow port and an RFID component are disposed on either side of the water tank.

[0006] Furthermore, the rotating pressure arm mechanism includes a pressure arm body and a rotating shaft; the pressure arm body is fixedly connected to the rotating shaft; one end of the rotating shaft is connected to a rotating connecting seat; the other end of the rotating shaft passes through the side wall of the water tank and is connected to a rotating drive mechanism; the side wall of the water tank has a rotating hole relative to the rotating shaft; a rotating shaft sealing assembly is provided in the rotating hole.

[0007] Furthermore, the rotary drive mechanism includes a cylinder; a hinge joint is provided at the upper end of the cylinder; a crankshaft is connected to the hinge joint; the crankshaft is connected to a rotating shaft; a micro-leakage plate is also provided on the outer side of the rotating shaft; a chamber is provided inside the micro-leakage plate; the chamber is connected to a rotating hole; and a micro-leakage outlet is provided on the outer side of the micro-leakage plate.

[0008] Furthermore, the guide positioning mechanism has four parts, evenly distributed at the bottom of the water tank; the guide positioning mechanism includes a positioning groove and a high-position guide plate.

[0009] Furthermore, the positioning groove is located at the bottom of the water tank; the high-position guide plate is fixedly mounted on the positioning groove; the high-position guide plate includes two arc-shaped plates and two inclined plates; the arc-shaped plates are located between the two inclined plates.

[0010] Furthermore, the quick-drain outlet is located at the center of the bottom of the water tank.

[0011] Furthermore, the RFID component includes a transparent cover; the transparent cover is disposed on the side wall of the water tank; and a reader / writer head is disposed inside the transparent cover.

[0012] This invention offers the following advantages: By employing a rotary pressure arm mechanism in conjunction with a rotary drive mechanism, if the Cassette is not properly positioned within the guide and positioning mechanism of the water tank, the rotary pressure arm mechanism cannot press down completely, thus preventing the cylinder stroke of the rotary drive mechanism from reaching the predetermined standard. Therefore, the built-in detection element in the cylinder can promptly monitor and report the aforementioned situation, indicating that the Cassette's placement posture is incorrect, effectively avoiding the risk of equipment collision.

[0013] Meanwhile, the rotary pressure arm mechanism is driven by a rotary drive mechanism, which uses a cylinder as its power source, eliminating the more complex screw drive method used in existing technologies and significantly reducing overall costs. Secondly, the shaft sealing assembly is not completely sealed, allowing for some micro-leakage; a small flow of pure water immerses in the friction area between the shaft and the rotating hole, acting as a lubricant. The leaked pure water then collects within the micro-leakage plate and is discharged through the micro-leakage drain. This not only reduces the precision required for machining and assembly but also increases the service life of the components. Attached Figure Description

[0014] Figure 1This refers to the water tank (CV conveyor mechanism) in the existing technology.

[0015] Figure 2 This is a structural diagram of the water tank and the fixed base plate.

[0016] Figure 3 This is a schematic diagram of the internal structure of the water tank.

[0017] Figure 4 This is a schematic diagram showing the state of Cassette placed within the guide and positioning mechanism.

[0018] Figure 5 A partial structural diagram of the guiding and positioning mechanism.

[0019] In the diagram: 1 is the fixed base plate, 2 is the water tank, 3 is the quick drain port, 4 is the overflow port, 5 is the RFID component, 6 is the main body of the pressure arm, 7 is the rotating shaft, 8 is the rotating connecting seat, 9 is the rotating shaft sealing component, 10 is the cylinder, 11 is the crankshaft, 12 is the micro-leak plate, 13 is the micro-leak drain port, 14 is the positioning groove, 15 is the high-position guide plate, 15-1 is the arc plate, 15-2 is the inclined plate, and 16 is the transparent cover. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0021] See Figures 2-5 This application discloses a wafer overflow cleaning water tank, including a fixed base plate 1, on which a water tank 2 is disposed; a guide positioning mechanism and a quick drain port 3 are disposed on the inner bottom of the water tank 2; a rotating pressure arm mechanism is disposed on both sides of the inner side of the water tank 2; a rotating drive mechanism is disposed on the outer side of the water tank 2; the rotating drive mechanism is connected to the rotating pressure arm mechanism; an overflow port 4 and an RFID component 5 are also disposed on either side of the water tank 2; and a detection element is disposed inside the rotating drive mechanism.

[0022] Furthermore, the rotating pressure arm mechanism includes a pressure arm body 6 and a rotating shaft 7; the pressure arm body 6 is fixedly connected to the rotating shaft 7; one end of the rotating shaft 7 is connected to the rotating connecting seat 8; the other end of the rotating shaft 7 passes through the side wall of the water tank 2 and is connected to the rotating drive mechanism; the side wall of the water tank 2 is provided with a rotating hole relative to the rotating shaft; a rotating shaft sealing assembly 9 is provided in the rotating hole.

[0023] Furthermore, the rotary drive mechanism includes a cylinder 10; a hinge joint is provided at the upper end of the cylinder 10; a crankshaft 11 is connected to the hinge joint; the crankshaft 11 is connected to the rotating shaft 7; a micro-leakage plate 12 is also provided on the outer side of the rotating shaft 7; a chamber is provided inside the micro-leakage plate 12; the chamber is connected to the rotation hole; a micro-leakage outlet 13 is provided on the outer side of the micro-leakage plate; the detection element is a stroke sensor; the stroke sensor is located inside the cylinder.

[0024] Specifically, by raising and lowering the piston of cylinder 10, the crankshaft 11 can rotate and change its angle, thereby driving the rotation of shaft 7 through crankshaft 11; when shaft 7 rotates, the pressure arm body 6 can be pressed down or flipped up. When pressed down, Cassette can be pressed down and clamped onto the guide positioning mechanism.

[0025] Meanwhile, if the main body 6 of the pressure arm cannot be pressed down to the correct position, the angles of the rotating shaft 7 and the crankshaft 11 will also be unable to rotate to the correct position, and further, the piston of the cylinder 10 will not be able to reach the preset stroke. At this time, the stroke sensor inside the cylinder can detect this situation and thus indicate that the Cassette is not placed in the water tank 2, and provide timely feedback.

[0026] Furthermore, the guide positioning mechanism has four parts, which are evenly distributed at the bottom of the water tank 2; the guide positioning mechanism includes a positioning groove 14 and a high-position guide plate 15.

[0027] Furthermore, the positioning groove 14 is disposed at the bottom of the water tank 2; the high-position guide plate 15 is fixedly disposed on the positioning groove 14; the high-position guide plate 15 includes two arc-shaped plates 15-1 and two inclined plates 15-2; the arc-shaped plates 15-1 are located between the two inclined plates 15-2.

[0028] The Cassette slides down along the two curved plates 15-1 and the two inclined plates 15-2 into the positioning groove 14, and is straightened and pressed by the pressure arm body 6. The overflow port 4 conforms to the semi-cleaning specifications.

[0029] Furthermore, the quick drain port 3 is located at the center of the bottom of the water tank 2.

[0030] Furthermore, the RFID component includes a transparent cover 16; the transparent cover 16 is disposed on the side wall of the water tank; and a reader / writer head is disposed inside the transparent cover.

[0031] The transparent cover 16 faces the label position on the Cassette, and the read / write head is built into the transparent cover, making it easy to observe and convenient for maintenance.

[0032] The specific embodiments of this utility model described above do not constitute a limitation on the scope of protection of this utility model. Any other corresponding changes and modifications made based on the technical concept of this utility model should be included within the scope of protection of the claims of this utility model.

Claims

1. A wafer overflow cleaning water tank, comprising a fixed base plate, characterized in that: A water tank is provided on the fixed base plate; a guide positioning mechanism and a quick drain port are provided on the inner bottom of the water tank; a rotating pressure arm mechanism is provided on both sides of the inside of the water tank; a rotating drive mechanism is provided on the outer side of the water tank; the rotating drive mechanism is connected to the rotating pressure arm mechanism; an overflow port and an RFID component are also provided on either side of the water tank; a detection element is provided inside the rotating drive mechanism.

2. The wafer overflow cleaning water tank according to claim 1, characterized in that: The rotating pressure arm mechanism includes a pressure arm body and a rotating shaft; the pressure arm body is fixedly connected to the rotating shaft; one end of the rotating shaft is connected to a rotating connecting seat; the other end of the rotating shaft passes through the side wall of the water tank and is connected to a rotating drive mechanism; the side wall of the water tank has a rotating hole relative to the rotating shaft; a rotating shaft sealing assembly is provided in the rotating hole.

3. The wafer overflow cleaning water tank according to claim 2, characterized in that: The rotary drive mechanism includes a cylinder; a hinge joint is provided at the upper end of the cylinder; a crankshaft is connected to the hinge joint; the crankshaft is connected to a rotating shaft; a micro-leak plate is also provided on the outer side of the rotating shaft; a chamber is provided inside the micro-leak plate; the chamber is connected to a rotating hole; a micro-leak outlet is provided on the outer side of the micro-leak plate; the detection element is a stroke sensor; the stroke sensor is located inside the cylinder.

4. The wafer overflow cleaning water tank according to claim 1, characterized in that: The guide positioning mechanism has four parts, which are evenly distributed at the bottom of the water tank; the guide positioning mechanism includes a positioning groove and a high-position guide plate.

5. A wafer overflow cleaning water tank according to claim 4, characterized in that: The positioning groove is located at the bottom of the water tank; the high-position guide plate is fixedly installed on the positioning groove; the high-position guide plate includes two arc-shaped plates and two inclined plates; the arc-shaped plates are located between the two inclined plates.

6. A wafer overflow cleaning water tank according to claim 5, characterized in that: The quick drain outlet is located at the center of the bottom of the water tank.

7. A wafer overflow cleaning water tank according to claim 1, characterized in that: The RFID component includes a transparent cover; the transparent cover is disposed on the side wall of the water tank; and a reader / writer head is disposed inside the transparent cover.

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