Plasma cleaning machine

Abstract

The utility model relates to the technical field of cleaning machines, in particular to a plasma cleaning machine which comprises a plasma main machine and a plasma head assembly, and the plasma main machine is electrically connected with an industrial personal computer used for managing the plasma main machine. The plasma head assembly is electrically connected to the plasma main machine and comprises a protective shell and a spray head, an adjusting groove is formed in one side of the protective shell, the spray head is slidably connected to the adjusting groove, a height limiting structure is arranged on the adjusting groove facing the spray head, a mounting cavity is formed in the side, close to the adjusting groove, of the protective shell, and the height limiting structure is arranged in the mounting cavity. The mounting cavity is provided with an open end in the extending direction of the nozzle, an image inspection structure is arranged in the open end, and the outer wall of the plasma head assembly is provided with a monitoring assembly in the direction of the nozzle. The utility model aims to improve the monitoring capability of the cleaning machine.

Description

Technical Field

[0001] This utility model relates to the field of cleaning machine technology, and in particular to a plasma cleaning machine. Background Technology

[0002] Plasma cleaners, also known as plasma cleaning machines, utilize plasma to achieve effects that conventional cleaning methods cannot. By applying sufficient energy to a gas, it is ionized into a plasma state. The "active" components of plasma include ions, electrons, atoms, active functional groups, excited-state nuclides (metastable states), photons, etc. Plasma cleaners utilize the properties of these active components to treat product surfaces, thereby achieving cleaning, coating, and other purposes.

[0003] Because plasma cleaning is highly efficient and difficult to reverse, it is necessary to improve the monitoring capabilities of the cleaning machine and ensure the stability of plasma output in order to avoid errors during cleaning. Utility Model Content

[0004] The main purpose of this invention is to provide a plasma cleaner that improves the monitoring capabilities of the cleaner.

[0005] To achieve the above objectives, this utility model proposes a plasma cleaning machine, comprising a plasma main unit and a plasma head assembly:

[0006] The plasma generator is electrically connected to an industrial control computer for managing the plasma generator; and

[0007] The plasma head assembly is electrically connected to the plasma host. The plasma head assembly includes a protective shell and a nozzle. An adjustment groove is provided on one side of the protective shell. The nozzle is slidably connected to the adjustment groove. The adjustment groove has a height limiting structure facing the nozzle. A mounting cavity is provided on the side of the protective shell near the adjustment groove. The mounting cavity has an open end facing the extension direction of the nozzle. An image inspection structure is provided inside the open end. A monitoring component is provided on the outer wall of the plasma head assembly facing the nozzle.

[0008] In one embodiment of this application, the protective shell is provided with a lifting assembly facing the height limiting structure, the lifting assembly is disposed facing the adjustment groove, the nozzle passes through the protective shell and is located below the height limiting structure, and the nozzle is driven and connected to the lifting assembly.

[0009] In one embodiment of this application, the monitoring component is electrically connected to the industrial control computer. The monitoring component is composed of one or more of a voltage monitoring probe, a laser rangefinder, an electrostatic detector, and an infrared temperature sensor, and the various monitoring components surround the periphery of the nozzle.

[0010] In one embodiment of this application, the voltage monitoring probe is connected to the end of the nozzle away from the mounting cavity and surrounds the nozzle; the laser rangefinder, electrostatic detector, and infrared temperature sensor are connected to the periphery of the image inspection structure and are spaced apart from the nozzle.

[0011] In one embodiment of this application, a rotating mechanism is provided at one end of the nozzle near the lifting assembly, and a speed monitoring sensor is provided on the rotating shaft of the rotating mechanism. The speed monitoring sensor is electrically connected to the plasma host.

[0012] By adopting the above technical solution, this utility model has the following advantages:

[0013] 1. The plasma main unit is used to manage and assist in the generation of plasma. The industrial control computer can be composed of computers to receive and process data collected from the monitoring components. This data can improve the monitoring capabilities of the cleaning machine and ensure the stability of the plasma cleaning machine and the accuracy of the cleaning.

[0014] 2. The protective shell can protect the nozzle, while the adjustment groove can further prevent damage to the nozzle's delicate structure. The height limiting component can prevent the nozzle from being too far from the product to be treated when adjusting its height at the adjustment groove, thus ensuring the cleaning effect.

[0015] 3. The installation cavity is located on the side of the adjustment groove, which allows the imaging inspection structure to monitor the cleaning structure. Users can optimize and adjust the cleaning strategy to improve the cleaning effect of the cleaning machine. Multiple monitoring components can be set. By wrapping around the nozzle, different monitoring components can monitor the status of the plasma cleaner in real time to avoid damage to the equipment. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the structure of a plasma cleaner according to this utility model from one direction;

[0018] Figure 2 This is a schematic diagram of another direction of the structure of a plasma cleaner according to this utility model;

[0019] Figure 3 This is a schematic diagram of the bottom structure of a plasma cleaner according to the present invention.

[0020] Explanation of icon numbers:

[0021] 1. Plasma head assembly; 2. Protective shell; 21. Adjustment groove; 22. Height limiting structure; 23. Mounting cavity; 3. Imaging inspection structure; 4. Lifting assembly; 5. Nozzle; 51. Rotation mechanism; 6. Monitoring assembly.

[0022] The realization of the purpose, functional features and advantages of this utility model will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0024] Reference Figures 1 to 3 To achieve the above objectives, this utility model proposes a plasma cleaning machine, including a plasma host and a plasma head assembly 1. The plasma host is electrically connected to an industrial control computer for managing the plasma host. The plasma head assembly 1 is electrically connected to the plasma host and includes a protective shell 2 and a nozzle 5. An adjustment groove 21 is provided on one side of the protective shell 2, and the nozzle 5 is slidably connected to the adjustment groove 21. The adjustment groove 21 is provided with a height limiting structure 22 facing the nozzle 5. The protective shell 2 is provided with a mounting cavity 23 on the side near the adjustment groove 21. The mounting cavity 23 is provided with an open end facing the extension direction of the nozzle 5. An image inspection structure 3 is provided inside the open end. A monitoring component 6 is provided on the outer wall of the plasma head assembly 1 facing the nozzle 5.

[0025] The plasma generator is used to manage and assist in the generation of plasma. The industrial control computer can be composed of a computer to receive and process the data collected from the monitoring component 6. This data can improve the monitoring capability of the cleaning machine and ensure the stability of the plasma cleaning machine and the accuracy of the cleaning process.

[0026] The protective shell 2 can protect the nozzle 5, while the adjustment groove 21 can further prevent damage to the precision structure of the nozzle 5. The height limiting component can prevent the nozzle 5 from being too far away from the product to be treated when adjusting the height at the adjustment groove 21, thus ensuring the cleaning effect.

[0027] The mounting cavity 23 is located on the side of the adjustment groove 21, which enables the image inspection structure 3 to monitor the cleaning structure. Users can optimize the cleaning strategy and make adjustments to improve the cleaning effect of the cleaning machine. Multiple monitoring components 6 can be set. By wrapping around the nozzle 5, different monitoring components 6 can monitor the status of the plasma cleaner in real time to avoid damage to the equipment.

[0028] See also Figure 1In one embodiment of this application, the protective shell 2 is provided with a lifting assembly 4 facing the height limiting structure 22, the lifting assembly 4 is provided facing the adjustment groove 21, the nozzle 5 passes through the protective shell 2 and is located below the height limiting structure 22, and the nozzle 5 is driven and connected to the lifting assembly 4.

[0029] The protective shell 2 is equipped with a lifting assembly 4 consisting of a lead screw, a motor, and a slider. This structure allows for more flexible control of the height of the nozzle 5. The height limiting structure 22, as part of the protective shell 2, surrounds part of the nozzle 5. When the lifting assembly 4 drives the nozzle 5 to rise to its highest point, it abuts against the height limiting structure 22. The height limiting structure 22 restricts the nozzle 5 from moving too high, preventing plasma from splashing everywhere.

[0030] See also Figures 1 to 3 In one embodiment of this application, the monitoring component 6 is electrically connected to the industrial control computer. The monitoring component 6 is composed of one or more of the following: voltage monitoring probe 61, laser rangefinder 62, electrostatic detector 63, and infrared temperature sensor 64. The various monitoring components 6 surround the periphery of the nozzle 5.

[0031] The monitoring component 6 can consist of one or more probes or sensors. Each monitoring component 6 can monitor one state of the cleaning machine. When multiple monitoring components 6 work simultaneously, the working status of the cleaning machine can be effectively guaranteed, and problems in its operation can be avoided from going undetected in time.

[0032] See also Figures 1 to 3 In one embodiment of this application, a voltage monitoring probe 61 is connected to the end of the nozzle 5 away from the mounting cavity 23 and surrounds the nozzle 5. A laser rangefinder 62, an electrostatic detector 63, and an infrared temperature sensor 64 are connected to the periphery of the image inspection structure 3 and are spaced apart from the nozzle 5.

[0033] A voltage monitoring probe 61 is installed on the plasma head assembly 1. This probe is generally connected to the nozzle 5 and wraps around the outlet of the nozzle 5. The probe is connected to a voltmeter via a cable, and the voltmeter is connected to the industrial control computer. When the voltage value monitored by the probe exceeds the set "deviation value", the system will output an alarm message. The voltage data can be displayed on the operation screen in real time, or it can be recorded in the log of the industrial control computer.

[0034] A laser rangefinder 62 is installed on the plasma head assembly 1. The sensor can be installed inside the mounting cavity 23 or on the outer wall of the mounting cavity 23, facing the image inspection structure 3. When the distance between the plasma head and the product surface exceeds the set "deviation value", the system will output an alarm message.

[0035] A non-contact electrostatic detector 63 is installed on the plasma head assembly 1. This detector can also be installed on the outer wall area of ​​the mounting cavity 23. When the detector detects that the electrostatic value on the product surface exceeds the set "deviation value", the system will output an alarm message.

[0036] The infrared temperature sensor 64 has a similar installation position and monitors the surface temperature of the product in real time through infrared sensing, ensuring cleaning effect and cleaning safety.

[0037] See also Figures 1 to 2 In one embodiment of this application, a rotating mechanism 51 is provided at one end of the nozzle 5 near the lifting assembly 4. A speed monitoring sensor 65 is provided on the rotating shaft of the rotating mechanism 51, and the speed monitoring sensor 65 is electrically connected to the plasma host.

[0038] The nozzle 5 can rotate through the rotating mechanism 51 to ensure the stability of plasma output. In order to avoid problems with rotation, a speed monitoring sensor 65 is set near the rotating shaft. By monitoring the speed, the speed can be controlled to ensure the working stability of the cleaning machine. Through the cooperation of these monitoring components 6, the working efficiency and effect of the cleaning machine can be improved.

[0039] In the accompanying drawings of this embodiment, the same or similar reference numerals correspond to the same or similar components. In the description of this application, it should be understood that if terms such as "upper," "lower," "left," and "right" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, they are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, the terms used to describe positional relationships in the accompanying drawings are only for illustrative purposes and should not be construed as limiting this patent. For those skilled in the art, the specific meaning of the above terms can be understood according to the specific circumstances.

[0040] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A plasma cleaner, characterized in that, include: A plasma control unit, wherein the plasma control unit is electrically connected to an industrial control computer for managing the plasma control unit; and A plasma head assembly is electrically connected to the plasma host. The plasma head assembly includes a protective shell and a nozzle. An adjustment groove is provided on one side of the protective shell, and the nozzle is slidably connected to the adjustment groove. The adjustment groove has a height limiting structure facing the nozzle. A mounting cavity is provided on the side of the protective shell near the adjustment groove. The mounting cavity has an open end facing the extension direction of the nozzle. An image inspection structure is provided inside the open end. A monitoring component is provided on the outer wall of the plasma head assembly facing the nozzle.

2. The plasma cleaner according to claim 1, characterized in that, The protective shell is provided with a lifting assembly facing the height limiting structure. The lifting assembly is positioned facing the adjustment groove. The nozzle passes through the protective shell and is located below the height limiting structure. The nozzle is driven and connected to the lifting assembly.

3. The plasma cleaner according to claim 1, characterized in that, The monitoring component is electrically connected to the industrial control computer. The monitoring component consists of one or more of the following: a voltage monitoring probe, a laser rangefinder, an electrostatic detector, and an infrared temperature sensor. The various monitoring components are arranged around the periphery of the nozzle.

4. A plasma cleaner according to claim 3, characterized in that, The voltage monitoring probe is connected to the end of the nozzle away from the mounting cavity and surrounds the nozzle. The laser rangefinder, electrostatic detector, and infrared temperature sensor are connected to the periphery of the image inspection structure and are spaced apart from the nozzle.

5. A plasma cleaner according to claim 2, characterized in that, The nozzle is equipped with a rotating mechanism at one end near the lifting assembly. A speed monitoring sensor is mounted on the rotating shaft of the rotating mechanism and is electrically connected to the plasma host.

Images