Semi-elliptical punching device for western-style clothes pen bag

Abstract

The utility model discloses a half-oval punching device for western-style clothes and pen bags, which comprises a hollow closed half-oval ring iron structure which is integrally punched and formed, the wall thickness of the top of the ring iron structure is larger than that of the bottom of the ring iron structure, the top of the ring iron structure is of an arc-shaped transition structure, the inner wall of the bottom of the ring iron structure contracts inwards, and a cutting edge is chamfered. According to the punching device, precise cutting of western-style clothes pen bags is achieved through differential wall thickness design and a specialized cutting system, the problems that a traditional punching device is insufficient in precision and irregular in edge are effectively solved, stress concentration is reduced through special structural design, the service life of the device is prolonged, and production efficiency is improved. And the production efficiency and the finished product quality of western-style clothes manufacturing are obviously improved.

Description

Technical Field

[0001] This utility model relates to the field of garment manufacturing, and in particular to a punching device for a semi-elliptical pencil case for suits. Background Technology

[0002] The manufacturing process of a suit involves several key steps, among which the cutting and making of pencil cases is a crucial link in ensuring the quality of the finished product. Traditionally, the cutting of suit pencil cases relies mainly on manual operation or simple mechanical cutting devices, but these methods have certain technical limitations. For example, manual cutting is not only inefficient but also prone to errors, resulting in inconsistent sizes or uneven edges, affecting the quality of the finished product. Furthermore, some existing mechanical cutting devices typically use simple rectangular or round punches, which are insufficient to meet the specific semi-elliptical shape requirements of suit pencil cases.

[0003] Currently, punching devices on the market mainly include flat punching dies and traditional closed punching structures. While flat punching dies can better control the cutting shape, they suffer from insufficient precision when cutting complex shapes. Traditional closed punching structures, although providing more stable cutting support, mostly employ a uniform wall thickness design, which can easily lead to uneven punching force when dealing with fabrics of varying thicknesses, thus affecting the cutting effect. Utility Model Content

[0004] The technical problem to be solved by this utility model is: to address the problems of low efficiency of manual operation, insufficient precision of mechanical punching, and difficulty of achieving precise semi-elliptical shape cutting in existing suit pencil case cutting technology, and to provide a semi-elliptical punching device for suit pencil cases that can ensure cutting accuracy and improve production efficiency.

[0005] The technical solution adopted by this utility model to solve its technical problem is:

[0006] A semi-elliptical punching device for a suit pencil case includes a hollow ring iron structure integrally stamped, wherein the top wall thickness of the ring iron structure is greater than the bottom wall thickness, and the top has an arc-shaped transition structure; the bottom inner wall of the ring iron structure tapers inward.

[0007] Preferably, the top wall thickness of the ring structure is 1.5-2 times the bottom wall thickness.

[0008] Preferably, the contraction angle of the bottom inner wall is 2-5 degrees.

[0009] Preferably, the ring iron structure is made of high carbon steel and its surface is hardened.

[0010] Preferably, the outer surface of the ring iron structure is coated with an anti-rust coating.

[0011] Preferably, the cutting edge on the bottom inner wall is chamfered at an angle of 15-20 degrees.

[0012] Preferably, the overall height of the ring structure is 60-70 mm.

[0013] Preferably, the ratio of the major axis to the minor axis of the semi-elliptical profile of the ring iron structure is 1.5-2:1.

[0014] The beneficial effects of this utility model are:

[0015] 1. By designing a hollow, closed, semi-elliptical ring iron structure formed by integral stamping, and making the top wall thickness greater than the bottom wall thickness and the bottom inner wall shrinking inward, a differentiated wall thickness and directional cutting structure are formed, which effectively solves the problems of insufficient precision and uneven edges when cutting suit pencil cases, and significantly improves the stability and accuracy of cutting; the arc-shaped transition structure at the top reduces stress concentration, extends the service life of the device, and solves the problem of easy deformation and damage of traditional punching devices.

[0016] 2. By designing an inward-shrinking angle and chamfering edge on the bottom inner wall of the ring iron structure, precise cutting and edge shaping of the suit fabric are achieved, effectively solving the problem of difficult precise cutting of semi-elliptical shapes, ensuring the neatness and smoothness of the cut edges, avoiding fabric deformation and tearing, and greatly improving the quality and production efficiency of suit pencil case manufacturing. Attached Figure Description

[0017] Figure 1 This is a top view structural diagram of the semi-elliptical punching device for the suit pencil case in Example 1.

[0018] Figure 2 This is a schematic diagram of the bottom view of the semi-elliptical punching device in the suit pencil case in Example 1.

[0019] Figure 3 This is a partial view of the suit lining after the semi-elliptical perforation device of the suit pencil case in Example 1 has been cut.

[0020] Reference numerals: 1. Top; 2. Bottom; 3. Transition structure. Detailed Implementation

[0021] The present invention will be further described below with reference to the accompanying drawings and embodiments, but these specific embodiments do not limit the scope of protection of the present invention in any way.

[0022] Example 1

[0023] like Figure 1-3As shown, a punching device for a semi-elliptical pencil case is disclosed. This device employs a hollow, closed semi-elliptical ring structure designed through integral stamping. The thickness of the top wall 1 is greater than the bottom wall 2, and the top 1 has an arc-shaped transition structure; the inner wall of the bottom 2 of the ring structure tapers inward. This punching device is mainly used for the precise cutting of pencil cases during the suit manufacturing process. This device ensures cutting accuracy and improves production efficiency.

[0024] In this embodiment, the ring structure itself is made of high-carbon steel and undergoes professional quenching treatment to ensure the hardness and durability of the device. The overall height of the ring structure is 70 mm, and the ratio of its major axis to minor axis in its semi-elliptical profile is maintained within 2:1, which perfectly matches the standard size requirements of a suit pencil case.

[0025] In this embodiment, the thickness of the top 1 wall of the ring iron structure is greater than the thickness of the bottom 2 wall; the thickness of the top 1 wall is twice that of the bottom 2 wall. This enhances the stability of the top 1 wall of the ring iron structure during stamping and ensures uniform transmission of stamping force. Furthermore, the inclined transition structure at the edge of the top 1 wall of the ring iron structure effectively reduces stress concentration and extends the service life of the device.

[0026] In this embodiment, the inner wall of the bottom 2 of the ring iron structure adopts an inward-shrinking design, with the shrinkage angle controlled within a range of 2 degrees. The cutting edge of the inner wall of the bottom 2 undergoes precise chamfering treatment, with a chamfer angle of 15 degrees, which can improve the sharpness and accuracy of cutting. At the same time, in order to prevent the ring iron structure from rusting, its outer surface is coated with a professional anti-rust coating to ensure that the device maintains good performance during long-term use.

[0027] In this embodiment, the working principle and method of the semi-elliptical punching device for the suit pencil case are as follows:

[0028] The first step is for the operator to inspect the condition of the ring iron structure, ensuring that the cutting edge is sharp and free from deformation or damage. The suit fabric to be processed is then placed on the mold table, and its position is adjusted according to the design requirements to align it with the semi-elliptical outline of the ring iron structure.

[0029] The second step involves starting the stamping equipment, causing the ring structure to move downwards under pressure. The larger wall thickness at the top ensures stability during the pressing process, while the arc-shaped transition structure reduces vibration during stamping.

[0030] Thirdly, when the ring structure contacts the fabric, the inward-curving design of the bottom two inner walls produces a good cutting effect. The chamfered design of the bottom two cutting edges ensures a neat and smooth cutting edge, while also reducing fabric deformation and tearing.

[0031] Fourth, after stamping, the operator removes the cut fabric and checks whether the semi-elliptical outline meets the requirements (see...). Figure 3 (Shaded area). Due to the precise design of the ring structure, the cut edges can usually achieve a high degree of precision, requiring no additional trimming.

[0032] In the above embodiments, the differentiated wall thickness design of the ring iron structure improves stamping stability; the shrinkage design of the inner wall of the bottom 2 enhances cutting accuracy; the chamfered cutting edge ensures the smoothness of the cutting edge; and the anti-rust coating extends the service life of the device. The combination of these technical features ultimately achieves high efficiency and high quality in tailoring suit pencil cases, significantly improving the production efficiency of suit manufacturing.

[0033] Example 2

[0034] The difference from Embodiment 1 lies in the parameter adjustments made to accommodate different sizes of suit pencil cases. In this embodiment, the overall height of the ring iron structure is 60 mm, the ratio of the major axis to the minor axis of the semi-elliptical profile is maintained within the range of 1.5:1, the wall thickness of the top 1 is 1.5 times the wall thickness of the bottom 2, and the cutting edge of the inner wall of the bottom 2 is precisely chamfered at a chamfer angle of 20 degrees. The above parameter adjustments do not significantly alter the ring iron structure and will not be further illustrated with accompanying drawings.

[0035] The above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of protection of the present invention. Any innovative improvements or substitutions based on the present invention should fall within the scope of the claims of the present invention. Furthermore, the parameters, materials, and processes mentioned in the above embodiments are not unique. Without departing from the technical essence of the present invention, those skilled in the art can make various alternative choices, and these alternative solutions should also be considered to fall within the scope of protection of the present invention.

Claims

1. A punch for a semi-elliptical pen pocket of a suit, characterized in that, The ring iron structure is a hollow closed semi-elliptical ring structure formed by integral stamping, the top wall thickness of the ring iron structure is greater than the bottom wall thickness, and the top is an arc transition structure; the bottom inner wall of the ring iron structure is inwardly contracted.

2. The suit pencil pocket semi-elliptical punching device according to claim 1, characterized in that, The top wall thickness of the ring iron structure is 1.5-2 times of the bottom wall thickness.

3. The suit pencil pocket semi-elliptical punching device according to claim 1, wherein, The contraction angle of the bottom inner wall is 2-5 degrees.

4. The suit pencil pocket semi-elliptical punching device according to claim 1, wherein, The ring iron structure is made of carbon steel material, and the surface is subjected to heat treatment.

5. The suit pocket semi-elliptical punching apparatus of claim 1, wherein, The cutting edge of the bottom inner wall is subjected to chamfering treatment, and the chamfering angle is 15-20 degrees.

6. The suit pocket semi-elliptical punching apparatus of claim 1, wherein, The ratio of the major axis to the minor axis of the semi-elliptical profile of the ring iron structure is 1.5-2:1.

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