Fluorine etching equipment capable of preventing gas leakage

Abstract

The utility model discloses fluorine etching equipment capable of preventing gas leakage, which comprises a reaction cavity, the reaction cavity is provided with a reaction channel for reaction gas to enter and a gas outlet channel, a raw material transmission mechanism penetrates through the reaction cavity, and the reaction cavity is provided with a feed port and a discharge port which are matched with the transmission mechanism. Valves for sealing the reaction cavity to be communicated with the outside are arranged at the feeding / discharging hole and in the reaction channel; a purification channel for purified gas to enter is arranged in the reaction cavity, and the purified gas can form a gas curtain for preventing reaction gas from leaking; a locking mechanism for preventing the valve from being opened is arranged on the valve, and when any one of the air pressure in the reaction cavity or the input air pressure of the purified gas reaches a set value, the locking mechanism allows the valve to be opened, otherwise, the locking mechanism does not allow the valve to be opened; the device can realize continuous production, can prevent gas leakage, and is simple in structure and low in cost.

Description

Technical Field

[0001] This utility model relates to fluorine etching equipment, and more particularly to a fluorine etching equipment that can prevent gas leakage. Background Technology

[0002] Currently, photovoltaic cell production utilizes fluorine etching equipment, employing fluoride gases such as F2 and XeF2 as non-plasma-based silicon etchants. This allows for high etching rates of several μm / min on silicon materials at atmospheric pressure without requiring complex vacuum systems, demonstrating potential for mass production applications. However, fluoride gases exhibit high reactivity and extreme corrosivity, necessitating special safety and protective measures for industrial use. A fluoride gas leak would pose serious hazards to human health and the environment.

[0003] Chinese invention patent CN103594314B discloses a multi-cavity vapor phase etching apparatus, comprising a working cavity for etching an object using process gas and generating residual gas; a degassing cavity covering the working cavity, and a protective cavity further covering the degassing cavity; the working cavity having cavity pressure, the degassing cavity having degassing pressure, and the protective cavity having gas pressure, with the cavity pressure being greater than the degassing pressure to expel residual gas, and the gas pressure being greater than the degassing pressure to compress the degassing pressure, thereby ensuring that residual gas does not leak into the protective cavity, thus preventing residual gas from leaking into the atmosphere. According to this invention, etching can be performed using vapor phase etching equipment with different chemical vapor phase properties, achieving low cost, high etching rate, and excellent safety.

[0004] While the aforementioned equipment can prevent the leakage of gases used for fluorine etching, it cannot achieve continuous production while preventing gas leakage. After each etching is completed, it is necessary to open the layers of chambers to replace the raw materials to be etched, resulting in low production efficiency. Secondly, although setting up multiple chambers to wrap the innermost working chamber can prevent the leakage of etching gases, the structure of multiple chambers is complex and the manufacturing cost is high, making it inconvenient for widespread use. Summary of the Invention

[0005] Purpose of the invention: The main purpose of this utility model is to provide a fluorine etching device that can produce continuously and prevent gas leakage, and secondly, it has a simple structure and low cost that can prevent gas leakage.

[0006] Technical solution: The fluorine etching equipment that can prevent gas leakage according to this utility model includes a reaction chamber, which is provided with a reaction channel for the reaction gas to enter and a gas outlet channel. A raw material transmission mechanism passes through the reaction chamber. The reaction chamber is provided with a feed inlet and a discharge outlet that match the transmission mechanism. Valves for sealing the reaction chamber from the outside are provided at the feed inlet and discharge outlet and in the reaction channel.

[0007] Based on the above technical solution, the raw material conveying mechanism runs through the reaction chamber, which is equipped with inlet and outlet ports that match the conveying mechanism. This allows for the rapid transfer of the raw material to be etched into the reaction chamber. After etching is completed, the conveying mechanism sends it out through the outlet port, while simultaneously introducing new raw material to be etched into the reaction chamber. This enables rapid continuous production, eliminating the need to open multiple chambers to replace the raw material and repeat the etching process, significantly improving production efficiency. Furthermore, valves at the inlet and outlet ports are designed to seal the reaction chamber, ensuring that reaction gases do not leak and guaranteeing production safety.

[0008] Preferably, the reaction chamber is equipped with a purification channel for the entry of purified gas, which can form an air curtain to prevent the reaction gas from leaking out.

[0009] The purification channel in the reaction chamber allows purified gas to enter the reaction chamber and form an air curtain, which can prevent the reaction gas used for fluorine etching from leaking out.

[0010] Preferably, the valve is provided with a self-locking mechanism for keeping it in a closed state.

[0011] The self-locking mechanism ensures that the valve remains closed when no external force is applied, thus ensuring the sealing of the reaction chamber and preventing leakage of reaction gases.

[0012] Preferably, the valve is provided with a locking mechanism to prevent it from opening. When either the gas pressure in the reaction chamber or the input pressure of the purified gas reaches a set value, the locking mechanism connects the valve and the power device that drives it to open; otherwise, it separates the two.

[0013] Purified gas is introduced into the reaction chamber to form an air curtain, isolating the chamber from the outside and preventing gas leakage. This air curtain only forms stably when the input pressure of the purified gas reaches a set value. Alternatively, the pressure within the reaction chamber can also indicate whether a stable air curtain has formed. As the input pressure of the purified gas gradually increases, the pressure within the chamber reaches a constant value once a stable air curtain is formed. If this value exceeds the set value, a stable air curtain is considered to have been formed. Therefore, the locking mechanism can use either the pressure within the reaction chamber or the input pressure of the purified gas reaching the set value as a criterion to control whether the power device and valve can be connected and opened. This locking mechanism ensures that the valve is only allowed to open when a stable air curtain has formed, allowing the reaction chamber to connect to the outside. Otherwise, the valve is not allowed to open, keeping the reaction chamber isolated and effectively preventing gas leakage, thus ensuring the safety of the device. This design eliminates the need for multiple layers of enclosures to prevent gas leakage, resulting in a simpler structure and lower cost.

[0014] Preferably, the locking mechanism includes a transmission device and a pneumatically driven push-pull device, with the transmission device mounted on the valve. When either the gas pressure inside the reaction chamber or the input pressure of the purified gas reaches a set value, the push-pull device drives the transmission device to connect with the power device that drives the valve to open; otherwise, the two are separated.

[0015] Preferably, the push-pull device is driven by compressed gas, and the gas in the reaction chamber or the purified gas is used as the control gas for the pneumatic control valve to control whether the pneumatic control valve conducts compressed air and the push-pull device.

[0016] The gas in the reaction chamber or the purified gas is used as the control gas to control whether the compressed gas can enter the air inlet of the push-pull device. That is, the gas in the reaction chamber or the purified gas is not directly used as the driving gas of the push-pull device, but as the control gas of the pneumatic control valve. In this way, the gas in the reaction chamber and the purified gas do not need to have too much pressure to drive the push-pull device. As long as there is a relatively small pressure to switch the valve core position of the pneumatic control valve to allow compressed air with a larger pressure to enter the air inlet of the push-pull device, the push-pull device can be operated.

[0017] Preferably, the reaction chamber is equipped with a controller for controlling the gas pump and valves. The reaction chamber is equipped with a reaction gas concentration detection device connected to the controller at each of the outlets that are connected to the outside except for the reaction channel. When the reaction gas concentration at any point exceeds the set value, the controller shuts down the reaction gas input gas pump and valve.

[0018] A controller is installed on the reaction chamber, and a reaction gas concentration detection device is installed at the outlet that connects to the outside world except for the reaction channel. When the reaction gas concentration exceeds the standard at any point, the controller will stop the input of reaction gas and close the valve to prevent the reaction gas from leaking out.

[0019] Beneficial effects: Compared with the prior art, the beneficial effects of this utility model are as follows: By setting a through-through transmission mechanism in the reaction chamber and providing matching inlet and outlet ports, raw materials can be quickly transported, achieving continuous production with high production efficiency. The valves at the inlet and outlet ports can prevent etching gas from leaking out. Secondly, by setting a purification channel in the reaction chamber to input purified gas to form an air curtain to prevent reaction gas from leaking out, and setting a locking mechanism to ensure that the valve is not opened until the purified gas forms a stable air curtain, so that the reaction chamber can be connected to the outside, ensuring that the reaction gas will not leak out. Compared with the multi-layered cavity structure with multiple layers, this equipment has a simple structure and low manufacturing cost. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of the equipment;

[0021] Figure 2 This is a schematic diagram of the overall structure of the locking mechanism;

[0022] Figure 3 for Figure 2 A magnified view of a portion of point A in the middle;

[0023] Figure 4 This is a schematic diagram of the structure of the cylinder and the two-position three-way valve. Detailed Implementation

[0024] As shown in the figure, the fluorine etching equipment that can prevent gas leakage according to this utility model includes a reaction chamber 1. The reaction chamber 1 is provided with a reaction channel 1-1 for the reaction gas to enter and a gas outlet channel. The raw material transmission mechanism passes through the reaction chamber 1. The reaction chamber 1 is provided with an inlet and an outlet that match the transmission mechanism. Valves 2 for sealing the reaction chamber 1 from the outside are provided at the inlet and outlet and in the reaction channel 1-1.

[0025] The transmission mechanism runs through the left and right side walls of the reaction chamber 1. The reaction chamber 1 is provided with an inlet and an outlet that match the transmission mechanism. Raw materials enter and exit the reaction chamber 1 through the transmission mechanism. Valves 2 are provided at the inlet, outlet and reaction channel 1-1 to isolate the reaction chamber 1 from the outside.

[0026] The two ends of the transmission mechanism are respectively connected to the automatic feeding mechanism 1-3 and the unloading mechanism 1-4. The transmission mechanism can be a conveyor belt or other device. If it is a conveyor belt, the conveyor belt is closed on both sides in the transmission direction to form a sealed structure to prevent gas from leaking out of the conveyor belt. The transmission mechanism between the feeding mechanism 1-3 and the unloading mechanism 1-4 and the reaction chamber 1 is equipped with a sealing cover. The feeding mechanism 1-3 and the unloading mechanism 1-4 are also equipped with inlet and outlet ports, and valves 2 that isolate the outside are also provided at the inlet and outlet ports. When the valves 2 at the inlet and outlet ports are open, the reaction chamber 1 can be connected to the outside through the inlet and outlet ports. At the same time, the raw material to be etched can also enter and exit the reaction chamber 1 through the transmission mechanism. When the valves 2 are closed, the raw material cannot enter or exit.

[0027] The reaction chamber 1 is provided with a purification channel 1-2 for the entry of purified gas. The purified gas can form an air curtain to prevent the reaction gas from leaking out. A valve 2 can also be provided in the purification channel 1-2 to isolate the reaction chamber 1 from the outside. The feeding mechanism 1-3, the unloading mechanism 1-4 and the sealing cover can also be provided with purification channels 1-2 to input purified gas, thereby venting the gas inside and blowing the surface of the silicon material, so as to prevent gas or other solid or liquid substances from entering the reaction chamber 1 and reacting with the reaction gas.

[0028] The reaction chamber 1 has a reaction channel 1-1 and a purification channel 1-2 at the top and an exhaust channel at the bottom. In addition to the bottom, exhaust channels can also be set at the top and side walls of the reaction chamber 1 according to actual needs. The purification channel 1-2 is located near the side wall of the reaction chamber 1, and the reaction channel 1-1 is located inside the purification channel 1-2. The purified gas output from the purification channel 1-2, such as nitrogen or other inert gas, can form an air curtain on the side wall of the reaction chamber 1 to prevent the reaction gas inside from leaking out. The exhaust channel is equipped with an exhaust gas pump and several alternative gas pumps. When the gas pump that delivers the purified gas starts, the exhaust gas pump also starts simultaneously. The exhaust gas pump and the alternative gas pumps do not need to start simultaneously; either the exhaust gas pump or any one of the alternative gas pumps can run at the same time. If the exhaust gas pump stops running due to a malfunction, the other normal alternative gas pumps will take over its operation. The exhaust gas pump and the alternative gas pumps will not create excessive negative pressure; they only generate a small negative pressure to guide the gas in the reaction chamber 1 to be discharged from the exhaust channel in a timely manner, so as to maintain a relatively stable gas pressure environment in the reaction chamber 1.

[0029] The valve 2 can be designed in different shapes according to the set position. For example, the valve 2 set at the inlet and outlet can be used. Figure 2 The structure shown is a long strip that matches the transmission mechanism. The valves installed in reaction channel 1-1 can be of a shape that matches reaction channel 1-1, such as a circle or other corresponding shapes.

[0030] Valve 2 is equipped with a self-locking mechanism to keep it closed. The self-locking mechanism can be a spiral spring 9. Specifically, an output shaft 6 can be provided on one side of valve 2, and a spiral spring 9 can be provided on the output shaft. The spiral spring 9 keeps valve 2 closed. Valve 2 is also equipped with a locking mechanism to prevent it from opening. When the gas pressure in the reaction chamber 1 or the input gas pressure of the purified gas reaches a set value, the locking mechanism will allow valve 2 to open. Otherwise, it will not be allowed to open. Valve 2 is equipped with a dedicated power mechanism 5 to drive it to open, but the power mechanism 5 can only drive valve 2 to open if the locking mechanism allows it to open. The power mechanism 5 can be controlled by a PLC or other controller according to a set program, or it can be manually controlled.

[0031] The locking mechanism includes a transmission device 3 and a pneumatically driven push-pull device 4. The transmission device 3 is mounted on the valve 2. When either the gas pressure in the reaction chamber 1 or the input pressure of the purified gas reaches a set value, the push-pull device 4 drives the transmission device 3 to connect with the power device 5 that drives the valve 2 to open; otherwise, the two are separated.

[0032] The transmission device 3 is slidably connected to the valve 2 using annular friction plates, and the output end of the power device 5 is equipped with matching friction plates. The specific connection between the transmission device 3 and the valve 2 is that the output shaft 6 of the valve 2 is connected to the intermediate shaft 8 through an electromagnetic clutch 7, and the transmission device 3 is slidably connected to the intermediate shaft 8. It should be noted that the transmission device 3 can only slide axially on the intermediate shaft 8 but cannot rotate circumferentially. Specifically, the two can be connected by a spline. The electromagnetic clutch 7 is connected to the power supply line of other operating mechanisms such as the conveying mechanism, automatic loading and unloading mechanism, or the input pump of purified gas. This ensures that if the power supply of other operating equipment is abnormal, the electromagnetic clutch 7 will also be de-energized, disconnecting the connection between the intermediate shaft 8 and the output shaft 6, so that the power device 5 cannot open the valve 2 through the transmission device 3, keeping the reaction chamber 1 isolated from the outside world, and further ensuring that the reaction gas will not leak out. Alternatively, the electromagnetic clutch 7 and the intermediate shaft 8 can be omitted, and the transmission device 3 can be directly slidably connected to the output shaft 6.

[0033] The push-pull device 4 includes a single-acting cylinder 4-1 and a pneumatically controlled single-acting two-position three-way valve 4-2. Port B of the two-position three-way valve 4-2 is connected to the air port of the single-acting cylinder 4-1, serving as the inlet and outlet of the cylinder 4-1. Port P is connected to the outside environment; a silencer 4-6 can be added to port P. Port T is connected to the compressed air delivery channel. In its normal position, port T of the two-position three-way valve 4-2 is closed, while ports P and B are connected. After reversal, ports T and B are connected, and port P is closed. The pneumatically controlled port of the two-position three-way valve 4-2 is connected to the reaction chamber 1 or the input of purified gas. When the air pump is connected, the air pressure in the reaction chamber 1 or the input pressure of the purified gas reaches the set value, which drives the two-position three-way valve 4-2 to switch. The compressed air drives the output shaft of the cylinder 4-1 to extend outward against the spring force inside. The air control port of the two-position three-way valve 4-2 is also connected to the reaction chamber 1 by a back pressure valve 4-3. When the air pressure in the reaction chamber 1 or the input pressure of the purified gas is insufficient, the gas or purified gas in the reaction chamber 1 cannot enter the cylinder 4-1 through the back pressure valve 4-3. A one-way valve 4-4 is also connected between the air inlet and outlet of the back pressure valve 4-3.

[0034] The output shaft of the cylinder 4-1 is hinged to a fork 4-5, which is hinged in the middle to a fixed support. The end of the fork 4-5 away from the cylinder 4-1 is hinged to the transmission device 3. When the output shaft of the cylinder 4-1 extends, the fork 4-5 drives the transmission device 3 to move toward the power device 5. When the output shaft of the cylinder 4-1 retracts, it drives the transmission device 3 away from the power device 5. Only when the push-pull device 4 connects the transmission device 3 and the power device 5 can the power device 5 drive the valve 2 to open. Otherwise, even if the power device 5 outputs power, it cannot open the valve 2.

[0035] The reaction chamber 1 is equipped with a controller for controlling the air pumps and valves. The air pumps include a gas delivery pump and an exhaust gas pump. At each outlet of the reaction chamber 1 that connects to the outside, except for the reaction channel 1-1, a reaction gas concentration detection device is installed. This detection device is connected to the controller. When the reaction gas concentration at any point exceeds a set value, it is considered that a reaction gas leak has occurred. The controller then shuts down the reaction gas input pump and closes the valves, including all valves in the reaction chamber 1, the feeding mechanism 1-3, the discharging mechanism 1-4, and the sealing cover. The controller can also simultaneously shut down the exhaust gas pump. The presence of the controller and concentration detection devices further ensures that the reaction gas will not leak.

[0036] The reaction gases can be hydrogen fluoride (HF), tetrafluoromethane (CF4), trifluoromethane (CHF3), carbonyl fluoride (COF2), sulfur hexafluoride (SF6), nitrogen trifluoride (NF3), chlorine fluoride (ClF), chlorine trifluoride (ClF3), etc., and corresponding concentration detection devices are available on the market.

Claims

1. A fluorine etching device capable of preventing gas leakage, comprising a reaction cavity (1) provided with a reaction passage (1-1) for reaction gas to enter and a gas outlet passage, characterized in that: The transmission mechanism of raw materials runs through the reaction cavity (1), the reaction cavity (1) is provided with a feeding port and a discharging port matched with the transmission mechanism, and valves (2) for closing the reaction cavity (1) with the outside are arranged at the feeding and discharging ports and in the reaction channel (1-1).

2. The fluorine etching apparatus of claim 1, wherein: The reaction cavity (1) is provided with a purification channel (1-2) for the purified gas to enter, and the purified gas can form an air curtain to prevent the reaction gas from leaking out.

3. The fluorine etching apparatus of claim 2, wherein: The transmission mechanism is connected with the feeding mechanism (1-3) and the discharging mechanism (1-4) at two ends, respectively, and a sealing cover is arranged around the transmission mechanism between the feeding and discharging mechanisms and the reaction cavity (1), and the feeding and discharging mechanisms and the sealing cover are provided with the purification channel (1-2).

4. The fluorine etching apparatus of claim 3, wherein: The purification channel (1-2) is provided with the valve (2).

5. The fluorine etching apparatus of claim 4, wherein: The valve (2) is provided with a self-locking mechanism for keeping the valve (2) in a closed state.

6. The fluorine etching apparatus of claim 5, wherein: The valve (2) is provided with a locking mechanism for preventing the valve (2) from being opened, and when the gas pressure in the reaction cavity (1) or the input gas pressure of the purified gas reaches a set value, the locking mechanism connects the valve (2) and a power device (5) for driving the valve (2) to be opened, otherwise the two are separated.

7. The fluorine etching apparatus of claim 6, wherein: The locking mechanism comprises a transmission device (3) and a push-pull device (4) driven by gas pressure, and the transmission device (3) is arranged on the valve (2); when the gas pressure in the reaction cavity (1) or the input gas pressure of the purified gas reaches a set value, the push-pull device (4) drives the transmission device (3) to be connected with the power device (5), otherwise the two are separated.

8. The fluorine etching apparatus of claim 7, wherein: The push-pull device (4) is driven by compressed gas, and the gas in the reaction cavity (1) or the purified gas is used as the control gas of the gas control valve for controlling whether the gas control valve conducts the compressed gas and the push-pull device (4).

9. The fluorine etching apparatus of claim 7, wherein: The valve (2) is provided with an output shaft (6), the transmission device (3) is slidingly connected to the output shaft (6), and the output shaft (6) rotates with the transmission device (3).

10. The fluorine etching apparatus of claim 9, wherein: The output shaft (6) is connected with a transfer shaft (8) through an electromagnetic clutch (7), the transmission device (3) is slidingly connected to the transfer shaft (8), and the transfer shaft (8) rotates with the transmission device (3).

11. The fluorine etching apparatus of claim 7, wherein: The transmission device (3) is a ring-shaped friction plate, and the output end of the power device (5) is provided with a friction plate matched therewith.

12. The fluorine etching apparatus of claim 4, wherein: The reaction cavity (1) is provided with a controller for controlling the gas pump and the valve (2), and the reaction cavity (1) is provided with a reaction gas concentration detection device connected with the controller at the outlets communicating with the outside except the reaction channel (1-1); when the reaction gas concentration at any position is detected to exceed a set value, the controller stops the input gas pump and the valve (2).

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