Radio frequency bias cleaning structure
By introducing a servo motor-driven upper electrode plate lifting and a gas equalization disk structure into the RF bias cleaning structure, the problems of uneven substrate cleaning and low equipment integration are solved, achieving uniform substrate cleaning and equipment compactness.
Patent Information
- Application Number
- CN202423302522.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2034-12-31
AI Technical Summary
Existing RF bias cleaning structures cannot achieve uniform cleaning of substrates, and the equipment has low integration, occupies a large space, and is inconvenient to maintain.
An RF bias cleaning structure including a vacuum chamber, an upper electrode plate, and a lower electrode plate was designed. A servo motor was used to drive the upper electrode plate to rise and fall. Combined with the upper and lower gas equalization plates, the process gas was made to flow in uniformly. The optimal cleaning position was found by adjusting the distance between the upper and lower electrodes.
It achieves uniform cleaning of the substrate, improves the integration of the equipment, reduces the space occupied by the equipment, and facilitates maintenance.
Smart Images
Figure CN223801113U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model mainly relates to the technical field of semiconductor processing, specifically relates to a radio frequency bias cleaning structure. BACKGROUND
[0002] At present, radio frequency bias cleaning is mainly based on a large number of active particles generated by plasma discharge, and under certain conditions, these active particles will react with the surface contaminants of the cleaned object, gradually activating and decomposing the dirt such as organic matter and oxide attached to the surface of the substrate, and finally evaporating or separating from the surface of the workpiece, to achieve the effect of cleaning.
[0003] However, the current plasma surface cleaning structure is mostly by directly introducing process gas into the cavity, which cannot achieve uniform cleaning of the substrate, and the whole cleaning mechanism occupies a large space, increasing the cost; at the same time, the integration is low, which is not conducive to the later maintenance, and on this basis, in order to meet the diversified development of the market, a radio frequency bias cleaning structure is proposed. UTILITY MODEL CONTENT
[0004] 1. The technical problem to be solved by the utility model is:
[0005] The utility model provides a radio frequency bias cleaning structure to solve the technical problems existing in the above background technology.
[0006] 2. Technical scheme:
[0007] In order to achieve the above purpose, the technical scheme of the utility model is:
[0008] A radio frequency bias cleaning structure, comprising a vacuum chamber, an upper electrode plate is arranged on the top surface of the inner wall of the vacuum chamber, a driving assembly for driving the upper electrode plate to ascend and descend is arranged on the surface of the vacuum chamber, and a substrate to be cleaned is detachably arranged on the bottom surface of the upper electrode plate.
[0009] A lower electrode plate is arranged on the bottom surface of the inner wall of the vacuum chamber, the lower electrode plate comprises, in sequence from top to bottom, a gas uniformizing upper disc, a gas uniformizing lower disc and an insulating plate, a gas shunt disc is arranged in the gas uniformizing lower disc, and a plurality of gas uniformizing holes are arranged on the gas uniformizing upper disc.
[0010] A radio frequency power source introduction device for supplying power to the lower electrode plate is arranged on the bottom surface of the vacuum chamber.
[0011] Further improvement lies in that the driving assembly comprises a servo motor arranged on the top surface of the vacuum chamber, an output rod extending into the interior of the vacuum chamber is arranged on the output end of the servo motor, an insulating connecting seat is arranged at the end of the output rod, and the upper electrode plate is mounted on the insulating connecting seat.
[0012] Further improvement lies in that a corrugated pipe is welded on the outer surface of the output rod.
[0013] Further improvement lies in that a plurality of telescopic slide rods are further included, one end of the telescopic slide rod is connected with the upper electrode plate, and the other end of the telescopic slide rod is connected with a pressing rod arranged on the top surface of the inner wall of the vacuum chamber.
[0014] Further improvement lies in that the insulating plate is connected with the vacuum chamber through a bolt insulating sleeve.
[0015] Further improvement lies in that a plurality of clamping strips are arranged on the bottom surface of the upper electrode plate, and a plurality of base plates are detachably arranged in the plurality of clamping strips.
[0016] Further improvement lies in that a process gas introduction pipe is further arranged on the bottom surface of the vacuum chamber.
[0017] Further improvement lies in that a sealing ring is arranged between the upper gas distribution disc and the lower gas distribution disc.
[0018] 3. Beneficial effects:
[0019] Compared with the prior art, the technical scheme has the following beneficial effects:
[0020] The radio frequency bias cleaning structure can not only make the process gas flow uniformly, so that the substrate is uniformly cleaned, but also can find the best cleaning position by adjusting the distance between the upper electrode and the lower electrode, and the integrated degree of the whole set of equipment is high, so that the equipment is more compact, and the space occupied by the equipment is reduced. BRIEF DESCRIPTION OF DRAWINGS
[0021] Figure 1 It is a schematic diagram of the overall structure of the utility model;
[0022] Figure 2 It is a schematic diagram of the utility model Figure 1 It is a schematic diagram of the structure in the section state;
[0023] Figure 3 It is a schematic diagram of the connection relationship of the upper electrode plate of the utility model;
[0024] Figure 4 It is a schematic diagram of the disassembled state of the lower electrode plate of the utility model.
[0025] DRAWINGS
[0026] 1 - servo motor;2 - welded corrugated pipe;3 - vacuum chamber;4 - upper electrode plate;5 - substrate;6 - lower electrode plate;7 - process gas introduction pipe;8 - radio frequency power supply introduction device;9 - insulating connecting seat;10 - upper gas distribution disc;11 - gas distribution disc;12 - insulating plate;13 - bolt insulating sleeve;14 - lower gas distribution disc;15 - sealing ring;16 - telescopic slide rod;17 - pressing rod;18 - clamping strip. DETAILED DESCRIPTION
[0027] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the accompanying drawings, in which several embodiments of the present application are given. However, the present application can be realized in many different forms and is not limited to the embodiments described herein, on the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.
[0028] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting", "fixing", "provided with" and the like should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication inside two elements. For ordinary skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0029] It should be noted that the structures not introduced in the present application are all adopted in the prior art, as they do not involve the design points and improvement direction of the present application.
[0030] With reference to Figures 1-4 The embodiment provides a radio frequency bias cleaning structure, which comprises a vacuum chamber 3, an upper electrode plate 4 is arranged on the top surface of the inner wall of the vacuum chamber 3, a driving assembly for driving the upper electrode plate 4 to ascend and descend is arranged on the surface of the vacuum chamber 3, and a substrate 5 to be cleaned is detachably arranged on the bottom surface of the upper electrode plate 4.
[0031] A lower electrode plate 6 is arranged on the bottom surface of the inner wall of the vacuum chamber 3, the lower electrode plate 6 comprises, in sequence from top to bottom, a gas uniformizing upper disc 10, a gas uniformizing lower disc 14 and an insulating plate 12, a gas shunt disc 11 is arranged in the gas uniformizing lower disc 14, and a plurality of gas uniformizing holes are arranged on the gas uniformizing upper disc 10.
[0032] The bottom surface of the vacuum chamber 3 is provided with a radio frequency power source introduction device 8 for supplying power to the lower electrode plate 6.
[0033] The radio frequency bias cleaning structure provided by the present application can not only achieve the effect that process gas flows uniformly, thereby achieving the effect that the substrate 5 is uniformly cleaned, but also can find the best cleaning position by adjusting the distance between the upper electrode and the lower electrode, and the whole set of equipment has high integration, so that the equipment is more compact and the space occupied by the equipment is reduced.
[0034] In view of the specific implementation of the driving assembly, the utility model provides a preferred implementation, the driving assembly includes the servo motor 1 (is fixed with the mounting frame) of setting in the top surface of vacuum chamber 3, the servo motor 1 output end is equipped with the output rod extending to the inside of vacuum chamber 3, the end of output rod is equipped with the insulating connector seat 9, and the upper electrode plate 4 is installed on the insulating connector seat 9.
[0035] In the preferred embodiment, the outer surface of the output rod is provided with a welded bellows 2, and the flange at the bottom of the welded bellows 2 realizes sealing with the vacuum chamber 3.
[0036] The embodiment also includes a plurality of telescopic slide rods 16, one end of the telescopic slide rod 16 is connected with the upper electrode plate 4, and the other end of the telescopic slide rod 16 is connected with a pressing rod 17 arranged on the top surface of the inner wall of the vacuum chamber 3. This arrangement is to improve the lifting stability of the upper electrode plate 4.
[0037] In the preferred embodiment, the insulating plate 12 is connected with the vacuum chamber 3 through a bolt insulating sleeve 13. Specifically, the insulating plate 12 is connected with the vacuum chamber through a bolt, and the outside of the bolt needs to pass through the bolt insulating sleeve 13 to realize the purpose of insulation with the vacuum chamber 3.
[0038] In the preferred embodiment, the bottom surface of the upper electrode plate 4 is provided with a plurality of clamping strips 18, and a substrate is detachably arranged in the plurality of clamping strips 18, so as to facilitate quick replacement of the substrate to be cleaned according to cleaning requirements.
[0039] In the preferred embodiment, a process gas introduction pipe 7 (preferably a stainless steel pipe) is arranged on the bottom surface of the vacuum chamber 3, and a radio frequency power supply introduction device 8 is a conventional technical means in the field, which will not be described here.
[0040] In the preferred embodiment, a sealing ring 15 is arranged between the gas distribution upper plate 10 and the gas distribution lower plate 14 to improve the sealing performance.
[0041] In the vacuum chamber 3, the upper electrode performs lifting action through a set of driving assembly (servo motor 1 + single shaft driver, i.e. output rod) to adjust the distance between the upper and lower electrodes. The lower electrode plate module is directly installed at the bottom of the vacuum chamber 3. The lowermost layer adopts an insulating plate 12 (the material is not limited to PEAK, ceramic and Teflon, etc.), the middle layer adopts a gas distribution plate 11, and the uppermost layer adopts a gas distribution upper plate 10. The sizes of the holes are 1mm, 2mm and 3mm.
[0042] The lower electrode adopts a "gas distribution + gas distribution" structure, and the uniform gas distribution upper plate with multiple holes enters the vacuum chamber 3, which is beneficial to obtain uniform plasma. The driving assembly 1 (servo motor + single shaft driver, i.e. output rod) is adopted to adjust the distance between the upper and lower electrodes, which greatly improves the uniform cleaning effect of the substrate 5.
[0043] In Figure 1 In the embodiment shown, the process gas is introduced into the entire lower electrode, and the RF power supply introduces the power to the lower electrode; the two electrodes are driven by the RF voltage source, and when the applied voltage is large enough, the gas can be broken down, so that the current can flow between the two electrodes, and the gas discharge between the two electrodes generates plasma, thereby achieving the cleaning of the substrate 5.
[0044] The above-described embodiments only express certain implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the patent scope of the present application; it should be pointed out that, for ordinary skilled persons in the art, without departing from the concept of the present application, a number of modifications and improvements can be made, which all belong to the protection scope of the present application; therefore, the protection scope of the present application patent should be subject to the appended claims.
Claims
1. A radio frequency bias cleaning structure comprising a vacuum chamber (3), characterized in that: The top surface of the inner wall of the vacuum chamber (3) is provided with an upper electrode plate (4), the surface of the vacuum chamber (3) is provided with a driving assembly for driving the upper electrode plate (4) to ascend and descend, and the bottom surface of the upper electrode plate (4) is detachably provided with a substrate (5) to be cleaned; The bottom surface of the inner wall of the vacuum chamber (3) is provided with a lower electrode plate (6), the lower electrode plate (6) sequentially comprises, from top to bottom, a gas uniformizing upper disc (10), a gas uniformizing lower disc (14) and an insulating plate (12), the gas uniformizing lower disc (14) is internally provided with a gas shunt disc (11), and the gas uniformizing upper disc (10) is provided with a plurality of gas uniformizing holes; The bottom surface of the vacuum chamber (3) is provided with a radio frequency power source introduction device (8) for supplying power to the lower electrode plate (6), and the bottom surface of the vacuum chamber (3) is provided with a process gas introduction pipe (7).
2. The RF bias cleaning structure of claim 1, wherein: The driving assembly comprises a servo motor (1) arranged on the top surface of the vacuum chamber (3), the output end of the servo motor (1) is provided with an output rod extending into the interior of the vacuum chamber (3), the distal end of the output rod is provided with an insulating connecting seat (9), and the insulating connecting seat (9) is mounted with the upper electrode plate (4).
3. The RF bias cleaning structure of claim 2, wherein: The outer surface of the output rod is provided with a welded bellows (2).
4. The RF bias cleaning structure of claim 1, wherein: Further comprising a plurality of telescopic slide rods (16), one end of the telescopic slide rod (16) is connected with the upper electrode plate (4), and the other end of the telescopic slide rod (16) is connected with a pressing rod (17) arranged on the top surface of the inner wall of the vacuum chamber (3).
5. The RF bias cleaning structure of claim 1, wherein: The insulating plate (12) is connected with the vacuum chamber (3) through a bolt insulating sleeve (13).
6. The RF bias cleaning structure of claim 1, wherein: The bottom surface of the upper electrode plate (4) is provided with a plurality of clamping strips (18), and the plurality of clamping strips (18) are detachably provided with the substrate (5).
7. The RF bias cleaning structure of claim 1, wherein: The gas uniformizing upper disc (10) and the gas uniformizing lower disc (14) are provided with a sealing ring (15).