Adjusting device of VUV parallel light source photoetching machine equipment
By employing a four-axis displacement stage and sealing ring design in the lithography machine, the circuit board alignment problem was solved, improving the exposure effect and product yield of the lithography machine.
Patent Information
- Application Number
- CN202520596310.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-01
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2035-04-01
AI Technical Summary
When the light source of a current lithography machine exposes a circuit board, the circuit board cannot be accurately aligned with the light source's illumination window, resulting in poor exposure and affecting lithography accuracy and product yield.
An adjustment device for a VUV parallel light source lithography machine was designed. A four-axis displacement stage was used to achieve four-dimensional adjustment of the carrier stage (XYZR) to ensure that the circuit board is accurately placed in the irradiation window. The airtightness was improved by the sealing ring to ensure the exposure effect.
This achieved precise alignment between the circuit board and the light source illumination window, improving exposure results and product yield.
Smart Images
Figure CN223808629U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model belongs to the technical field of photoetching machine, more specifically, it relates to a kind of adjusting device of VUV parallel light source photoetching machine equipment. BACKGROUND
[0002] In the semiconductor industry, the general photoetching process needs to go through the processes of silicon wafer surface cleaning and drying, coating, photoresist, soft baking, alignment exposure, post-baking, development, hard baking and etching. Among them, the photoetching process is a process of transferring the pattern on the mask to the photoresist (i.e., temporarily "copying" the device or circuit structure onto the silicon wafer) after uniformly coating the photoresist on the silicon wafer surface. In semiconductor equipment, the track machine is a process equipment that integrates different process machines. Its main function is to coat and develop the photoresist on the wafer surface. The photoetching machine is mainly responsible for the exposure of the photoresist.
[0003] In the prior art, when the light source of the photoetching machine exposes the circuit board, the circuit board cannot be accurately aligned with the position of the light source irradiation window, and the circuit board cannot be accurately placed in the irradiation window, resulting in poor exposure effect and affecting the precision of photoetching. CONTENT OF THE UTILITY MODEL
[0004] Therefore, in order to solve the above technical problems, the utility model provides a kind of VUV parallel light source photoetching machine equipment's adjusting device, including pedestal 10, the pedestal 10 top one side is connected with mounting seat 20, the top of mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is connected with the lower box 302, power supply component is equipped in the upper box 301, lamp source component is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source component is placed directly above the irradiation window 40, the top of the pedestal 10 is also equipped with first moving mechanism 50, the bottom of the first moving mechanism 50 both sides is connected with first slider 60, the top of the pedestal 10 is equipped with the first slide rail 70 matched with the first slider 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of the first moving mechanism 50 is connected with bearing seat 80, the top of bearing seat 80 is connected with bearing table 90, the top center of bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, adjusting device 220 is equipped in bearing seat 80, the adjusting device 220 includes four-axis displacement table 230, the bottom of the four-axis displacement table 230 is connected with the first moving mechanism 50, the top of the four-axis displacement table 230 is connected with adapter 240, the top of adapter 240 is connected with bearing table 90, the bottom of bearing table 90 is connected with clamping piece 310, the bottom of clamping piece 310 is clamped with the upper part of adapter 240, the four-axis displacement table 230 is realized the adjustment of bearing table 90 XYZR four dimensions, when needing to expose circuit board coated with photoresist, circuit board coated with photoresist is placed on the adsorption platform 100, the first moving mechanism 50 is sent to the lower side of irradiation window 40, first, adjust by the four-axis displacement table 230, so that the circuit board on the adsorption platform 100 is placed directly below the irradiation window 40, second, adjust by the four-axis displacement table 230, so that bearing table 90 is displaced to the lower box 302, so that the circuit board on the adsorption platform 100 is placed in the irradiation window 40, at this time, the top of bearing table 90 is in contact with the bottom of the lower box 302, then expose by the lamp source component, by being equipped with adjusting device, so that circuit board can be accurately aligned with the position of light source irradiation window, circuit board can be accurately placed in irradiation window, so that exposure effect is improved, improve the yield of product.
[0005] The utility model provides a kind of VUV parallel light source photoetcher device adjusting device, including pedestal 10, the top side of the pedestal 10 is connected with mounting seat 20, the top of the mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is connected with the lower box 302, power supply assembly is equipped in the upper box 301, lamp source assembly is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source assembly is placed directly above the irradiation window 40, the top of the pedestal 10 is further equipped with first moving mechanism 50, the bottom side of the first moving mechanism 50 is connected with first sliding block 60, the top of the pedestal 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of the first moving mechanism 50 is connected with bearing seat 80, the top of the bearing seat 80 is connected with bearing table 90, the top center of the bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, adjusting device 220 is equipped in the bearing seat 80, the adjusting device 220 includes four-axis displacement table 230, the bottom of the four-axis displacement table 230 is connected with the first moving mechanism 50, the top of the four-axis displacement table 230 is connected with adapter 240, the top of the adapter 240 is connected with the bearing table 90, the bottom of the bearing table 90 is connected with clamping piece 310, the bottom of the clamping piece 310 is clamped with the upper portion of adapter 240, the bearing table 90 XYZR four-dimensional adjustment is realized by the four-axis displacement table 230, when needing to expose circuit board coated with photoresist, circuit board coated with photoresist is placed on the adsorption platform 100, the first moving mechanism 50 is sent to the lower side of the irradiation window 40, first, adjust by the four-axis displacement table 230, so that the circuit board on the adsorption platform 100 is placed directly below the irradiation window 40, second, adjust by the four-axis displacement table 230, so that the bearing table 90 is displaced to the lower box 302, so that the circuit board on the adsorption platform 100 is placed in the irradiation window 40, at this time, the top of the bearing table 90 is abutted with the bottom of the lower box 302, then exposure is carried out by the lamp source assembly.
[0006] Further, the top of the bearing table 90 is equipped with sealing ring 320, for sealing the airtightness in the lower box 302 when the top of the bearing table 90 is abutted with the bottom of the lower box 302, improve the exposure effect of circuit board.
[0007] Further, the first moving mechanism 50 comprises a first moving plate 501 and a first handle 502, the bottom end of the first moving plate 501 is connected with the first sliding block 60 on both sides, the top end of the first moving plate 501 is connected with the bearing table 90, the side of the first moving plate 501 away from the mounting seat 20 is connected with an outwardly extending connecting block 150, the connecting block 150 is provided with a clamping groove 160, the bottom end of the first handle 502 is connected with a clamping column, and the clamping column is matched with the clamping groove 160.
[0008] Further, the bottom end of the first moving plate 501 is connected with a first electromagnet 170 on the side close to the lower box body 302, the top end of the base 10 is further connected with a first fixed block 180 and a second fixed block 190, the first fixed block 180 is arranged below the first moving plate 501, the second fixed block 190 is arranged below the lower box body 302, the first fixed block 180 is arranged on one side of the first electromagnet 170, the second fixed block 190 is arranged on the other side of the first electromagnet 170, and the first electromagnet 170, the first fixed block 180 and the second fixed block 190 are all arranged on the inner side of the first sliding rail 70, the lower part of the first fixed block 180 is connected with a first iron block 200, the second fixed block 190 is connected with a second iron block 210, and the first handle 502 is provided with a first electromagnetic switch, in the normal state, the first electromagnet 170 is magnetically attracted to the first iron block 200, for fixing the first moving plate 501, when the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 170 is magnetically separated from the first iron block 200, and the first moving plate 501 drives the circuit board to move, when the circuit board moves directly below the irradiation window 40, at this time, the first electromagnet 170 is magnetically attracted to the second iron block 210, so as to prevent the first moving plate 501 from moving back and forth when the circuit board is exposed, and the exposure effect is poor.
[0009] Further, the other side of the top end of the base 10 is provided with a second moving mechanism 110, the bottom end of the second moving mechanism 110 is connected with a second sliding block 120 on both sides, the top end of the base 10 is provided with a second sliding rail 130 matched with the second sliding block 120, the second moving mechanism 110 is slidably connected with the base 10, and the top end of the second moving mechanism 110 is connected with a detection camera 140.
[0010] Further, the second moving mechanism 110 comprises a second moving plate 1101, a second handle 1102 and a fixed rod 1103, both sides of the bottom end of the second moving plate 1101 are connected with the second sliding block 120, the top end of the second moving plate 1101 is connected with the fixed rod 1103, the fixed rod 1103 is connected with the second handle 1102 near the middle part of one side of the side wall of the base 10, when it is needed to detect the exposed circuit board, the detection camera 140 is moved by pushing and pulling the second handle 1102.
[0011] Further, the front end of the second moving plate 1101 is connected with a second electromagnet 250, the rear end is connected with a third electromagnet 260, one end of the second sliding rail 130 is provided with a third fixed block 270, the other end of the second sliding rail 130 is provided with a fourth fixed block 280, the bottom end of the third fixed block 270 and the fourth fixed block 280 are connected with the top end of the base 10, the second electromagnet 250, the third electromagnet 260, the third fixed block 270 and the fourth fixed block 280 are all arranged on the inner side of the second sliding rail 130, the lower part of the third fixed block 270 is connected with a third iron block 290, the lower part of the fourth fixed block 280 is connected with a fourth iron block 300, the second handle 1102 is provided with a second electromagnetic switch, under normal circumstances, the third electromagnet 260 is magnetically attracted to the third iron block 290, for fixing the second moving plate 1101, when it is needed to detect the exposed circuit board, the second electromagnetic switch is pressed, so that the third electromagnet 260 is magnetically separated from the third iron block 290, the second moving plate 1101 drives the detection camera 140 to move, when the detection camera 140 moves to the position directly above the circuit board, at this time, the second electromagnet 250 is magnetically attracted to the fourth iron block 300, preventing the second moving plate 1101 from moving back and forth when the detection camera 140 detects, so that the detection effect is poor.
[0012] Further, the base 10 is provided with a grating ruler 330 near the inner side wall of the second sliding rail 130, the grating ruler 330 is used for monitoring the moving distance of the detection camera, detecting whether the initial moving distance of the detection camera is equal to the subsequent moving distance.
[0013] Further, the top end of the base 10 is provided with a support rod 340 near one side of the mounting seat 20, the bottom end of the support rod 340 is connected with the top end of the base 10, the top end of the support rod 340 is connected with a display screen 350, which is used for observing the detection result of the detection camera.
[0014] Further, the top end of the base 10 is provided with a tank chain 360, the tank chain 360 is arranged below the lower box body 302, which is used for wiring.
[0015] The utility model discloses an advantageous effect: the utility model provides a kind of adjusting device of VUV parallel light source photoetching machine equipment, including pedestal 10, the top one side of pedestal 10 is connected with mounting seat 20, the top of mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is connected with the lower box 302, power supply assembly is equipped in the upper box 301, lamp source assembly is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source assembly is placed just above the irradiation window 40, the top of pedestal 10 is also equipped with first moving mechanism 50, the bottom two sides of first moving mechanism 50 are connected with first sliding block 60, the top of pedestal 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of first moving mechanism 50 is connected with bearing seat 80, the top of bearing seat 80 is connected with bearing table 90, the top center of bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, adjusting device 220 is equipped in bearing seat 80, the adjusting device 220 includes four-axis displacement table 230, the bottom of four-axis displacement table 230 is connected with the first moving mechanism 50, the top of four-axis displacement table 230 is connected with adapter 240, the top of adapter 240 is connected with bearing table 90, the bottom of bearing table 90 is connected with clamping piece 310, the bottom of clamping piece 310 is connected with the upper portion of adapter 240, the bearing table 90 XYZR four-dimensional adjustment is realized by the four-axis displacement table 230, when needing to expose circuit board coated with photoresist, circuit board coated with photoresist is placed on the adsorption platform 100, the first moving mechanism 50 is sent to the below of irradiation window 40, first, adjust by the four-axis displacement table 230, so that the circuit board on the adsorption platform 100 is placed just below the irradiation window 40, second, adjust by the four-axis displacement table 230, so that the bearing table 90 is displaced to the lower box 302, so that the circuit board on the adsorption platform 100 is placed in the irradiation window 40, at this time, the top of bearing table 90 is abutted with the bottom of lower box 302, then expose by the lamp source assembly, by being equipped with adjusting device, circuit board can be accurately aligned with the position of light source irradiation window, circuit board can be accurately placed in irradiation window, so that exposure effect is improved, improve the yield of product. BRIEF DESCRIPTION OF DRAWINGS
[0016] Figure 1 It is a kind of adjusting device of VUV parallel light source photoetching machine equipment of the utility model's structure schematic view.
[0017] Figure 2 It is a structure schematic view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0018] Figure 3 It is a structure schematic view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0019] Figure 4 It is a structure schematic view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0020] Figure 5 It is a partial enlarged view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0021] Figure 6 It is a partial enlarged view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0022] Figure 7 It is a partial enlarged view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0023] Figure 8 It is a top view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0024] Figure 9 It is a partial enlarged view of the adjusting device of the VUV parallel light source photoetching machine equipment.
[0025] Main element symbol explanation:
[0026] Base 10, mounting seat 20, light device 30, upper box body 301, lower box body 302, irradiation window 40, first moving mechanism 50, first moving plate 501, first handle 502, first sliding block 60, first sliding rail 70, bearing seat 80, bearing table 90, adsorption platform 100, second moving mechanism 110, second moving plate 1101, second handle 1102, fixed rod 1103, second sliding block 120, second sliding rail 130, detection camera 140, connecting block 150, clamping groove 160, first electromagnet 170, first fixed block 180, second fixed block 190, first iron block 200, second iron block 210, adjusting device 220, four-axis displacement table 230, adapter 240, second electromagnet 250, third electromagnet 260, third fixed block 270, fourth fixed block 280, third iron block 290, fourth iron block 300, clamping piece 310, sealing ring 320, grating ruler 330, supporting rod 340, display screen 350, tank chain 360.
[0027] The following specific embodiments will further illustrate the present application in conjunction with the above drawings. Detailed Implementation
[0028] The following embodiments are described to aid in understanding this application. These embodiments are not, and should not be, construed in any way as limiting the scope of protection of this application.
[0029] In the following description, those skilled in the art will recognize that throughout this discussion, components may be described as individual functional units (which may include subunits), but those skilled in the art will recognize that various components or portions thereof may be divided into individual components or may be integrated together (including integrated within a single system or component).
[0030] Furthermore, the connection between components or systems is not intended to be limited to a direct connection; on the contrary, data between these components may be modified, reformatted, or otherwise altered by intermediate components. Additionally, other or fewer connections may be used. It should also be noted that the terms "connection," "link," or "input" should be understood to include direct connections, indirect connections via one or more intermediate devices, and wireless connections.
[0031] Example 1
[0032] like Figure 1 The diagram shown is a structural schematic of the adjustment device for a VUV parallel light source lithography machine according to this utility model; Figure 2 The diagram shown is a structural schematic of the adjustment device for a VUV parallel light source lithography machine according to this utility model; Figure 3 The diagram shown is a structural schematic of the adjustment device for a VUV parallel light source lithography machine according to this utility model; Figure 4 The diagram shown is a structural schematic of the adjustment device for a VUV parallel light source lithography machine according to this utility model; Figure 5 The image shown is a partially enlarged view of the adjustment device of a VUV parallel light source lithography machine according to this utility model; as shown... Figure 6 The image shown is a partially enlarged view of the adjustment device of a VUV parallel light source lithography machine according to this utility model; as shown... Figure 7 The image shown is a partially enlarged view of the adjustment device of a VUV parallel light source lithography machine according to this utility model; as shown... Figure 8 The image shown is a top view of the adjustment device of a VUV parallel light source lithography machine according to this utility model; as shown... Figure 9 The image shown is a partial enlarged view of the adjustment device of a VUV parallel light source lithography machine according to this utility model.
[0033] The utility model provides a kind of VUV parallel light source photoetcher device adjusting device, including pedestal 10, the top side of the pedestal 10 is connected with mounting seat 20, the top of the mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is connected with the lower box 302, power supply assembly is equipped in the upper box 301, lamp source assembly is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source assembly is placed directly above the irradiation window 40, the top of the pedestal 10 is further equipped with first moving mechanism 50, the bottom side of the first moving mechanism 50 is connected with first sliding block 60, the top of the pedestal 10 is equipped with the first sliding rail 70 matched with the first sliding block 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of the first moving mechanism 50 is connected with bearing seat 80, the top of the bearing seat 80 is connected with bearing table 90, the top center of the bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, adjusting device 220 is equipped in the bearing seat 80, the adjusting device 220 includes four-axis displacement table 230, the bottom of the four-axis displacement table 230 is connected with the first moving mechanism 50, the top of the four-axis displacement table 230 is connected with adapter 240, the top of the adapter 240 is connected with the bearing table 90, the bottom of the bearing table 90 is connected with clamping piece 310, the bottom of the clamping piece 310 is clamped with the upper portion of adapter 240, the bearing table 90 XYZR four-dimensional adjustment is realized by the four-axis displacement table 230, when needing to expose circuit board coated with photoresist, circuit board coated with photoresist is placed on the adsorption platform 100, the first moving mechanism 50 is sent to the lower side of the irradiation window 40, first, adjust by the four-axis displacement table 230, so that the circuit board on the adsorption platform 100 is placed directly below the irradiation window 40, second, adjust by the four-axis displacement table 230, so that the bearing table 90 is displaced to the lower box 302, so that the circuit board on the adsorption platform 100 is placed in the irradiation window 40, at this time, the top of the bearing table 90 is abutted with the bottom of the lower box 302, then exposure is carried out by the lamp source assembly.
[0034] The top of the bearing table 90 is equipped with sealing ring 320, for sealing the airtightness in the lower box 302 when the top of the bearing table 90 is abutted with the bottom of the lower box 302, improve the exposure effect of circuit board.
[0035] The first moving mechanism 50 comprises a first moving plate 501 and a first handle 502, the bottom end of the first moving plate 501 is connected with the first sliding block 60 on both sides, the top end of the first moving plate 501 is connected with the bearing table 90, the side of the first moving plate 501 away from the mounting seat 20 is connected with an outwardly extending connecting block 150, the connecting block 150 is provided with a clamping groove 160, the bottom end of the first handle 502 is connected with a clamping column, and the clamping column is matched with the clamping groove 160.
[0036] The bottom end of the first moving plate 501 is connected with a first electromagnet 170 on the side close to the lower box body 302, the top end of the base 10 is further connected with a first fixed block 180 and a second fixed block 190, the first fixed block 180 is arranged below the first moving plate 501, the second fixed block 190 is arranged below the lower box body 302, the first fixed block 180 is arranged on one side of the first electromagnet 170, the second fixed block 190 is arranged on the other side of the first electromagnet 170, and the first electromagnet 170, the first fixed block 180 and the second fixed block 190 are all arranged on the inner side of the first sliding rail 70, the lower part of the first fixed block 180 is connected with a first iron block 200, the second fixed block 190 is connected with a second iron block 210, and the first handle 502 is provided with a first electromagnetic switch, in the normal state, the first electromagnet 170 is magnetically attracted to the first iron block 200, for fixing the first moving plate 501, when the circuit board needs to be exposed, the first electromagnetic switch is pressed, so that the first electromagnet 170 is magnetically separated from the first iron block 200, and the first moving plate 501 drives the circuit board to move, when the circuit board moves directly below the irradiation window 40, at this time, the first electromagnet 170 is magnetically attracted to the second iron block 210, preventing the first moving plate 501 from moving back and forth when the circuit board is exposed, and the exposure effect is poor.
[0037] The other side of the top end of the base 10 is provided with a second moving mechanism 110, the bottom end of the second moving mechanism 110 is connected with a second sliding block 120 on both sides, the top end of the base 10 is provided with a second sliding rail 130 matched with the second sliding block 120, the second moving mechanism 110 is slidably connected with the base 10, and the top end of the second moving mechanism 110 is connected with a detection camera 140.
[0038] The second moving mechanism 110 comprises a second moving plate 1101, a second handle 1102 and a fixed rod 1103, the bottom ends of the two sides of the second moving plate 1101 are connected with the second sliding block 120, the top end of the second moving plate 1101 is connected with the fixed rod 1103, the fixed rod 1103 is connected with the second handle 1102 near the middle part of one side of the side wall of the base 10, when it is needed to detect the circuit board after exposure, the detection camera 140 is moved by pushing and pulling the second handle 1102.
[0039] The front end of the second moving plate 1101 is connected with a second electromagnet 250, the rear end is connected with a third electromagnet 260, one end of the second sliding rail 130 is provided with a third fixed block 270, the other end of the second sliding rail 130 is provided with a fourth fixed block 280, the bottom ends of the third fixed block 270 and the fourth fixed block 280 are connected with the top end of the base 10, the second electromagnet 250, the third electromagnet 260, the third fixed block 270 and the fourth fixed block 280 are all arranged on the inner side of the second sliding rail 130, the lower part of the third fixed block 270 is connected with a third iron block 290, the lower part of the fourth fixed block 280 is connected with a fourth iron block 300, the second handle 1102 is provided with a second electromagnetic switch, in normal state, the third electromagnet 260 is magnetically attracted to the third iron block 290 for fixing the second moving plate 1101, when it is needed to detect the circuit board after exposure, the second electromagnetic switch is pressed to make the third electromagnet 260 and the third iron block 290 break the magnetism, the second moving plate 1101 drives the detection camera 140 to move, when the detection camera 140 moves to the position directly above the circuit board, at this time, the second electromagnet 250 is magnetically attracted to the fourth iron block 300 to prevent the second moving plate 1101 from moving back and forth when the detection camera 140 detects, so that the detection effect is poor.
[0040] The base 10 is provided with a grating ruler 330 near the inner side wall of the second sliding rail 130, the grating ruler 330 is used for monitoring the moving distance of the detection camera, and whether the initial moving distance of the detection camera is equal to the subsequent moving distance is detected.
[0041] The top end of the base 10 is provided with a support rod 340 near one side of the mounting seat 20, the bottom end of the support rod 340 is connected with the top end of the base 10, the top end of the support rod 340 is connected with a display screen 350 for observing the detection result of the detection camera.
[0042] The top end of the base 10 is connected with a tank chain 360, the tank chain 360 is arranged below the lower box body 302 and is used for wiring.
[0043] The utility model discloses an advantageous effect: the utility model provides a kind of VUV parallel light source photoetching machine equipment's adjusting device, including pedestal 10, the pedestal 10 top one side is connected with mounting seat 20, the top of mounting seat 20 is connected with illumination device 30, the illumination device 30 includes upper box 301 and lower box 302, the upper box 301 is connected with the lower box 302, power supply assembly is equipped in the upper box 301, lamp source assembly is equipped in the lower box 302, the bottom center of the lower box 302 is equipped with irradiation window 40, and the lamp source assembly is placed just above the irradiation window 40, the top of the pedestal 10 is also equipped with first moving mechanism 50, the bottom two sides of first moving mechanism 50 are connected with first slider 60, the top of the pedestal 10 is equipped with the first slide rail 70 matched with the first slider 60, the first moving mechanism 50 is slidably connected with the pedestal 10, the top of the first moving mechanism 50 is connected with bearing seat 80, the top of bearing seat 80 is connected with bearing table 90, the top center of bearing table 90 is connected with adsorption platform 100, the adsorption platform 100 is used to place circuit board coated with photoresist, adjusting device 220 is equipped in bearing seat 80, the adjusting device 220 includes four-axis displacement table 230, the bottom of four-axis displacement table 230 is connected with the first moving mechanism 50, the top of four-axis displacement table 230 is connected with adapter 240, the top of adapter 240 is connected with bearing table 90, the bottom of bearing table 90 is connected with clamping piece 310, the bottom of clamping piece 310 is clamped with the upper portion of adapter 240, the four-dimensional adjustment of bearing table 90 XYZR is realized by four-axis displacement table 230, when needing to expose circuit board coated with photoresist, circuit board coated with photoresist is placed on adsorption platform 100, the first moving mechanism 50 is sent to the below of irradiation window 40, first, adjust by four-axis displacement table 230, so that the circuit board on adsorption platform 100 is placed just below irradiation window 40, second, adjust by four-axis displacement table 230, so that bearing table 90 is displaced to lower box 302, so that the circuit board on adsorption platform 100 is placed in irradiation window 40, at this time, the top of bearing table 90 is abutted with the bottom of lower box 302, then expose by lamp source assembly, by being equipped with adjusting device, circuit board can be accurately aligned with the position of light source irradiation window, circuit board can be accurately placed in irradiation window, so that exposure effect is improved, improve the yield of product.
[0044] The above-described embodiments only express several implementation manners of the utility model, the description is more specific and detailed, but can not therefore be understood as the limitation of the utility model patent range. It should be pointed out that for ordinary skilled person in the art, without departing from the utility model concept, several deformations and improvements can be made, which belong to the protection range of the utility model. Therefore, the protection range of the utility model patent should be subject to the appended claims.
Claims
1. An adjusting device of a VUV parallel light source photoetching machine device, comprising a base (10), a mounting seat (20) is arranged on one side of the top end of the base (10), a light irradiation device (30) is arranged on the top end of the mounting seat (20), the light irradiation device (30) comprises an upper box body (301) and a lower box body (302), the upper box body (301) is connected with the lower box body (302), a power supply assembly is arranged in the upper box body (301), a lamp source assembly is arranged in the lower box body (302), a radiation window (40) is arranged at the bottom center of the lower box body (302), and the lamp source assembly is arranged directly above the radiation window (40), a first moving mechanism (50) is further arranged on the top end of the base (10), first sliding blocks (60) are arranged on the bottom end of the first moving mechanism (50), first sliding rails (70) matched with the first sliding blocks (60) are arranged on the top end of the base (10), the first moving mechanism (50) is slidingly connected with the base (10), a bearing seat (80) is arranged on the top end of the first moving mechanism (50), a bearing table (90) is arranged on the top end of the bearing seat (80), and an adsorption platform (100) is arranged at the top center of the bearing table (90), the adsorption platform (100) is used for placing a circuit board coated with photoresist, characterized in that: The bearing seat (80) is provided with an adjusting device (220), the adjusting device (220) includes a four-axis displacement table (230), the bottom end of the four-axis displacement table (230) is connected with the first moving mechanism (50), the top end of the four-axis displacement table (230) is connected with an adapter (240), the top end of the adapter (240) is connected with the bearing table (90), the bottom end of the bearing table (90) is connected with a clamping piece (310), the bottom of the clamping piece (310) is clamped with the upper part of the adapter (240), and the bearing table (90) is adjusted in four dimensions of XYZR through the four-axis displacement table (230).
2. The adjustment device for a VUV parallel light source lithography apparatus according to claim 1, characterized in that: The top end of the bearing table (90) is provided with a sealing ring (320), which is used to seal the air tightness in the lower box (302) when the top end of the bearing table (90) abuts with the bottom end of the lower box (302), and improve the exposure effect of the circuit board.
3. The adjustment device for a VUV parallel light source lithography apparatus according to claim 1, characterized in that: The first moving mechanism (50) includes a first moving plate (501) and a first handle (502), the bottom end of the first moving plate (501) is connected with the first sliding block (60) on both sides, the top end of the first moving plate (501) is connected with the bearing table (90), and the side, away from the mounting seat (20), of the first moving plate (501) is connected with an outwardly extending connecting block (150), the connecting block (150) is provided with a clamping groove (160), and the bottom end of the first handle (502) is connected with a clamping column, and the clamping column is matched with the clamping groove (160).
4. The adjustment device for a VUV parallel light source lithography apparatus according to claim 3, characterized in that: The bottom end of the first moving plate (501) is connected with a first electromagnet (170) on the side close to the lower box (302), the top end of the base (10) is further connected with a first fixed block (180) and a second fixed block (190), the first fixed block (180) is arranged below the first moving plate (501), the second fixed block (190) is arranged below the lower box (302), the first fixed block (180) is arranged on one side of the first electromagnet (170), the second fixed block (190) is arranged on the other side of the first electromagnet (170), and the first electromagnet (170), the first fixed block (180) and the second fixed block (190) are all arranged on the inner side of the first sliding rail (70), the lower part of the first fixed block (180) is connected with a first iron block (200), the second fixed block (190) is connected with a second iron block (210), and the first handle (502) is provided with a first electromagnetic switch.
5. The adjustment device for a VUV parallel light source lithography apparatus according to claim 1, characterized in that: The other side of the top end of the base (10) is provided with a second moving mechanism (110), the bottom end of the second moving mechanism (110) is connected with a second sliding block (120) on both sides, the top end of the base (10) is provided with a second sliding rail (130) matched with the second sliding block (120), the second moving mechanism (110) is connected with the base (10) in a sliding mode, and the top end of the second moving mechanism (110) is connected with a detection camera (140).
6. The adjustment device for a VUV parallel light source lithography apparatus according to claim 5, characterized in that: The second moving mechanism (110) comprises a second moving plate (1101), a second handle (1102) and a fixed rod (1103), both sides of the bottom end of the second moving plate (1101) are connected with the second sliding block (120), the top end of the second moving plate (1101) is connected with the fixed rod (1103), the fixed rod (1103) is connected with the second handle (1102) near the middle part of one side of the side wall of the base (10), when it is needed to detect the exposed circuit board, the detection camera (140) is moved by pushing and pulling the second handle (1102).
7. The adjustment device for a VUV parallel light source lithography apparatus according to claim 6, characterized in that: The front end of the second moving plate (1101) is connected with a second electromagnet (250), the rear end is connected with a third electromagnet (260), one end of the second sliding rail (130) is provided with a third fixed block (270), the other end of the second sliding rail (130) is provided with a fourth fixed block (280), the bottom end of the third fixed block (270) and the fourth fixed block (280) are connected with the top end of the base (10), the second electromagnet (250), the third electromagnet (260), the third fixed block (270) and the fourth fixed block (280) are all arranged on the inner side of the second sliding rail (130), the lower part of the third fixed block (270) is connected with a third iron block (290), the lower part of the fourth fixed block (280) is connected with a fourth iron block (300), and the second handle (1102) is provided with a second electromagnetic switch.
8. The adjustment device for a VUV parallel light source lithography apparatus according to claim 5, characterized in that: The inner side wall of the base (10) near the second sliding rail (130) is connected with a grating ruler (330), and the grating ruler (330) is used for monitoring the moving distance of the detection camera.
9. The adjustment device for a VUV parallel light source lithography apparatus according to claim 8, characterized in that: The top end of the base (10) near one side of the mounting seat (20) is provided with a supporting rod (340), the bottom end of the supporting rod (340) is connected with the top end of the base (10), and the top end of the supporting rod (340) is connected with a display screen (350) for observing the detection result of the detection camera.
10. The adjustment device for a VUV parallel light source lithography apparatus according to claim 9, characterized in that: The top end of the base (10) is connected with a tank chain (360), the tank chain (360) is arranged below the lower box body (302) and is used for wiring.