Polycrystalline silicon tail gas absorption system capable of reducing cold energy wasted by light components
By designing a polycrystalline silicon tail gas absorption system, and utilizing multi-stage heat exchange and chemical reactions, the problem of wasted cooling capacity of light components was solved, achieving efficient utilization of material cooling capacity and reducing production costs.
Patent Information
- Application Number
- CN202520374530.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-04
- Publication Date
- 2026-01-20
- Estimated Expiration
- 2035-03-04
AI Technical Summary
In polysilicon production, the waste of cold energy from light components leads to poor gas-liquid separation, increases the load on downstream heat exchangers, raises production costs, and directly recovers the cold energy of cryogenic materials, resulting in waste.
Design a polycrystalline silicon tail gas absorption system, including a material heat exchanger, a scrubbing tower, a heat exchanger, a cooler, a chlorosilane separator, a compression system, a cold energy recovery heat exchanger, etc., to reduce the waste of cold energy of light components and improve material utilization through multi-stage heat exchange and chemical reaction.
Effectively utilize the cold energy of materials to reduce production costs, improve gas-liquid separation efficiency, reduce cold energy waste, and optimize the production process.
Smart Images
Figure CN223810939U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to polycrystal silicon production technical field especially relates to a polycrystal silicon tail gas absorption system that can reduce light component waste cold quantity. BACKGROUND
[0002] When polycrystal silicon product market competition is fierce, the optimization energy saving of production system becomes particularly important, can make the enterprise have lower production cost, creates more benefit for the enterprise, thereby has stronger market competitiveness.
[0003] At present, polycrystal silicon's production mostly adopts Siemens improved process;Tail gas treatment process is all first carries out deep cooling condensation, realizes gas-liquid separation, and then realizes the recycling of material. In order to save the leaching solution, reduce the processing capacity of later period, usually after deep cooling equipment deep condensation, the liquid phase material separated out is used to leach the tail gas, and the silicon powder in the tail gas is removed. Since the deep cooling material is used as the leaching solution, dichlorodihydrogen silicon, hydrogen chloride in the deep cooling material will change from liquid state to gaseous state under the environment of the leaching tower, causing dichlorodihydrogen silicon, hydrogen chloride and other light components to enter the deep cooling equipment again for deep cooling;Light component cycle cooling not only leads to poor gas-liquid separation effect, but also increases the load of the rear end heat exchanger, increasing the production cost;And the material after deep cooling has more cold quantity, and direct purification recovery will also cause cold quantity waste. UTILITARIAN CONTENT
[0004] Therefore, the utility model provides a polycrystal silicon tail gas absorption system that can reduce light component waste cold quantity, mainly aims at effectively utilizing material, reducing the cold quantity waste in material and reducing production cost.
[0005] To achieve the above purpose, the utility model mainly provides the following technical scheme:
[0006] The embodiment of the utility model provides a polycrystal silicon tail gas absorption system that can reduce light component waste cold quantity, comprising: material heat exchanger one, heat exchanger three, leaching tower, self heat exchanger, primary cooler, secondary cooler, chlorosilane separation tank, compression system, cold quantity recovery heat exchanger, material heat exchanger two, condenser, deep cooling tank, mixer and reverse disproportionation tower;
[0007] The material inlet of material heat exchanger one is used for tail gas to enter;The medium inlet of material heat exchanger one is used for hydrogen material to enter;
[0008] The material inlet of heat exchanger three is communicated with the material outlet of material heat exchanger one;
[0009] The material inlet of leaching tower is communicated with the material outlet of heat exchanger three and the material outlet of material heat exchanger one respectively;
[0010] The material inlet of the self-heat-exchanger is communicated with the gas phase outlet of the elution tower;
[0011] The material inlet of the first-stage cooler is communicated with the material outlet of the self-heat-exchanger;
[0012] The material inlet of the second-stage cooler is communicated with the material outlet of the first-stage cooler;
[0013] The material inlet of the chlorosilane separation tank is communicated with the material outlet of the second-stage cooler and the material outlet of the first-stage cooler respectively;
[0014] The elution liquid inlet of the elution tower is communicated with the liquid phase outlet of the chlorosilane separation tank; the liquid phase material in the chlorosilane separation tank is transported to the elution tower by a transport pump;
[0015] The medium inlet of the self-heat-exchanger is communicated with the gas phase outlet of the chlorosilane separation tank;
[0016] The inlet of the compression system is communicated with the medium outlet of the self-heat-exchanger;
[0017] The material inlet of the cold energy recovery heat-exchanger is communicated with the outlet of the compression system;
[0018] The material inlet of the second material heat-exchanger is communicated with the material outlet of the cold energy recovery heat-exchanger;
[0019] The material inlet of the condenser is communicated with the material outlet of the second material heat-exchanger;
[0020] The material inlet of the cryogenic tank is communicated with the liquid phase outlet of the condenser;
[0021] The gas phase outlet of the condenser is provided with a gas phase transport pipe;
[0022] The gas phase outlet of the cryogenic tank is communicated with the gas phase transport pipe, for outputting hydrogen material;
[0023] The medium inlet of the cold energy recovery heat-exchanger is communicated with the liquid phase outlet of the cryogenic tank;
[0024] The inlet one of the mixer is communicated with the medium outlet of the cold energy recovery heat-exchanger;
[0025] The inlet two of the mixer is used for inputting silicon tetrachloride material;
[0026] The material inlet of the reverse disproportionation tower is communicated with the outlet of the mixer;
[0027] The gas phase outlet of the reverse disproportionation tower is used for outputting trichlorotrihydrogen silicon material.
[0028] Further, the liquid phase outlet of the deep cooling tank is communicated with the inlet of the mixer through a temperature control pipeline for adjusting temperature.
[0029] Further, the gas phase conveying pipeline can be selectively communicated with the medium inlet of the material heat exchanger one;
[0030] The medium outlet of the material heat exchanger one is communicated with a hydrogen purification process area.
[0031] Further, the liquid phase outlet of the elution tower is communicated with a rectification process area.
[0032] Further, control valves are arranged on the communication pipelines between the material heat exchanger one, the heat exchanger three, the elution tower, the self heat exchanger, the primary cooler, the secondary cooler, the chlorosilane separation tank, the compression system, the cold energy recovery heat exchanger, the material heat exchanger two, the condenser, the deep cooling tank, the mixer and the anti-disproportionation tower.
[0033] Further, the heat exchanger three is heat-exchanged through circulating water.
[0034] By the above technical scheme, the polycrystalline silicon tail gas absorption system capable of reducing waste of light components and cold energy has at least the following advantages:
[0035] The material is effectively utilized, the waste of cold energy in the material is reduced, and the production cost is lowered.
[0036] The above description is only a summary of the technical scheme of the present application, in order to more clearly understand the technical means of the present application, and the content of the specification can be implemented, the following preferred embodiments of the present application are described in detail with the help of the drawings. BRIEF DESCRIPTION OF DRAWINGS
[0037] Figure 1 A polycrystalline silicon tail gas absorption system capable of reducing waste of light components and cold energy provided by the embodiments of the present application is shown in the figure.
[0038] The figure shows:
[0039] 1 is a material heat exchanger one, 2 is a heat exchanger three, 3 is an elution tower, 4 is a self heat exchanger, 5 is a primary cooler, 6 is a secondary cooler, 7 is a chlorosilane separation tank, 8 is a compression system, 9 is a cold energy recovery heat exchanger, 10 is a material heat exchanger two, 11 is a condenser, 12 is a deep cooling tank, 13 is a mixer, 14 is an anti-disproportionation tower, 15 is a temperature control pipeline, 16 is a gas phase conveying pipeline, and 17 is a conveying pump. DETAILED DESCRIPTION
[0040] To further illustrate the technical means and effects taken by the utility model to achieve the predetermined utility model purposes, the following will combine with the drawings and the preferred embodiments to specifically explain the specific implementation manners, structures, features and effects according to the utility model application. In the following description, different "an embodiment" or "embodiments" do not necessarily refer to the same embodiment. In addition, the specific features, structures or characteristics in one or more embodiments can be combined in any suitable form.
[0041] As shown in Figure 1 An embodiment of the utility model discloses a kind of polycrystalline silicon tail gas absorption systems capable of reducing light component waste cold, comprising: material heat exchanger one 1, heat exchanger three 2, shower tower 3, self heat exchanger 4, primary cooler 5, secondary cooler 6, chlorosilane separation tank 7, compression system 8, cold recovery heat exchanger 9, material heat exchanger two 10, condenser 11, deep cooling tank 12, mixer 13 and reverse disproportionation tower 14;Material inlet of material heat exchanger one 1 is used for tail gas to enter;The medium inlet of material heat exchanger one 1 is used for hydrogen material to enter, for carrying out temperature reduction to tail gas by hydrogen material;Material inlet of heat exchanger three 2 is communicated with the material outlet of material heat exchanger one 1, for further temperature adjustment to tail gas.
[0042] Material inlet of shower tower 3 is communicated with the material inlet of heat exchanger three 2 and the material outlet of material heat exchanger one 1 respectively;Material inlet of shower tower 3 can be selected to be communicated with the material outlet of heat exchanger three 2 or selected to be communicated with the material outlet of material heat exchanger one 1, to select the material meeting temperature requirement to enter shower tower 3. Material inlet of self heat exchanger 4 is communicated with gas phase outlet of shower tower 3, to carry out temperature reduction to the gas phase material output by shower tower 3 by the gas phase material output by chlorosilane separation tank 7;Material inlet of primary cooler 5 is communicated with the material outlet of self heat exchanger 4, to cool material;Material inlet of secondary cooler 6 is communicated with the material outlet of primary cooler 5, to further cool material. Material inlet of chlorosilane separation tank 7 is communicated with the material outlet of secondary cooler 6 and the material outlet of primary cooler 5 respectively, for receiving the material cooled by primary cooler 5 and secondary cooler 6.
[0043] Spray liquid inlet of shower tower 3 is communicated with liquid phase outlet of chlorosilane separation tank 7;Liquid phase material in chlorosilane separation tank 7 is transported to shower tower 3 by delivery pump 17, to spray and remove silicon powder to tail gas;Medium inlet of self heat exchanger 4 is communicated with gas phase outlet of chlorosilane separation tank 7, to carry out heat exchange to the gas phase material output by shower tower 3 by the gas phase material output by chlorosilane separation tank 7.
[0044] The inlet of the compression system 8 is communicated with the medium outlet of the self heat exchanger 4, for compressing and conveying the gas phase material of the chlorosilane separation tank 7; the material inlet of the cold energy recovery heat exchanger 9 is communicated with the outlet of the compression system 8, so as to cool the gas phase material of the chlorosilane separation tank 7 by the liquid phase material separated by the cryogenic system.
[0045] The material inlet of the material heat exchanger two 10 is communicated with the material outlet of the cold energy recovery heat exchanger 9, for further cooling the gas phase material of the chlorosilane separation tank 7. The material inlet of the condenser 11 is communicated with the material outlet of the material heat exchanger two 10; the condenser 11 is preferably an ultralow temperature condenser. The gas phase outlet of the condenser 11 is provided with a gas phase conveying pipe 16; the gas phase conveying pipe 16 can be communicated with a hydrogen purification process area for purification; the gas phase conveying pipe 16 can be selectively communicated with the medium inlet of the material heat exchanger one 1; the medium outlet of the material heat exchanger one 1 is communicated with the hydrogen purification process area, so as to utilize the cold energy. The material inlet of the cryogenic tank 12 is communicated with the liquid phase outlet of the condenser 11, so as to further separate the material; the gas phase outlet of the cryogenic tank 12 is communicated with the gas phase conveying pipe 16, for outputting the hydrogen material.
[0046] The medium inlet of the cold energy recovery heat exchanger 9 is communicated with the liquid phase outlet of the cryogenic tank 12; so as to cool the gas phase material of the chlorosilane separation tank 7 by the liquid phase material separated by the cryogenic tank 12.
[0047] The inlet one of the mixer 13 is communicated with the medium outlet of the cold energy recovery heat exchanger 9; the inlet two of the mixer 13 is used for inputting the silicon tetrachloride material; at this time, the components of the inlet one are mostly dichlorodihydrogen silicon, hydrogen chloride and the like light components, which are mixed with the high-purity silicon tetrachloride of the inlet two; the material inlet of the anti-disproportionation tower 14 is communicated with the outlet of the mixer 13; the gas phase outlet of the anti-disproportionation tower 14 is used for outputting the trichlorotrihydrogen silicon material; through the chemical reaction in the anti-disproportionation tower 14, the content of the light components is reduced, and the trichlorohydrogen silicon which is a useful reducing material is converted, so as to obtain the product required by the polysilicon production; the chemical reaction equation is: SiCl4+ SiH2Cl2 = 2SiHCl3.
[0048] One embodiment of the utility model discloses a polysilicon tail gas absorption system which can reduce the waste of light components and cold energy, effectively utilizes the material, reduces the waste of cold energy in the material and reduces the production cost.
[0049] Preferably, the liquid phase outlet of the cryogenic tank 12 is communicated with the inlet one of the mixer 13 through the temperature control pipeline 15, for adjusting the temperature.
[0050] Preferably, the liquid phase outlet of the elution tower 3 is communicated with a rectification process area, so as to rectify the liquid phase material output by the elution tower 3.
[0051] Preferably, control valves are arranged on the connecting pipelines between the material heat exchanger 1, the heat exchanger 3, the elution tower 3, the self heat exchanger 4, the first cooler 5, the second cooler 6, the chlorosilane separation tank 7, the compression system 8, the cold energy recovery heat exchanger 9, the material heat exchanger 10, the condenser 11, the cryogenic tank 12, the mixer 13 and the reverse disproportionation tower 14, so as to facilitate the control of the material flow according to the needs.
[0052] Preferably, the heat exchanger 3 exchanges heat through circulating water, so as to facilitate the control of the temperature of the material output by the heat exchanger 3.
[0053] It is further explained that the medium inlet, the material inlet, the medium outlet and the material outlet are only used to distinguish the different material inlets and corresponding outlets of the heat exchanger, and do not limit the connection mode of the heat exchanger. Although the terms first, second, etc. can be used herein to describe various elements, these terms should not limit these elements. These terms are only used to distinguish one element from another. For example, a first element can be termed a second element, and, similarly, a second element can be termed a first element, and these terms are only used to distinguish one element from another. This does not depart from the scope of the example embodiments. Similarly, element one and element two also do not represent the order of the elements, and these terms are only used to distinguish one element from another. As used herein, the term "and / or" includes any combination of one or more associated listed items and all combinations.
[0054] In the description of the utility model, unless there is definite and limited provision, the terms "mounting", "connection", "connecting", "fixing" should be understood in a broad sense, for example, it can be fixed connection, or detachable connection, or integrated; it can be mechanical connection, or electrical connection; it can be direct connection, or indirect connection through intermediate medium, it can be the communication inside two elements or the interaction relationship between two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.
[0055] The standard parts used in the utility model can be purchased from the market, and the special-shaped parts can be ordered according to the description and the drawings, and the specific connection mode of each part adopts the conventional means such as bolt, rivet and welding in the prior art, and the mechanical parts and equipment adopt the conventional type in the prior art, and the circuit connection adopts the conventional connection mode in the prior art, which will not be described in detail here.
[0056] The above is only a preferred embodiment of the utility model, and does not limit the utility model in any form, and any simple modification, equivalent change and modification made according to the technical essence of the utility model to the above embodiment still belongs to the scope of the technical scheme of the utility model.
Claims
1. A polysilicon tail gas absorption system capable of reducing light component waste cold, characterized in that, The system comprises a material heat exchanger 1, a heat exchanger 3, a shower tower, a self heat exchanger, a first cooler, a second cooler, a chlorosilane separation tank, a compression system, a cold energy recovery heat exchanger, a material heat exchanger 2, a condenser, a cryogenic tank, a mixer and a disproportionation tower. The material inlet of the material heat exchanger 1 is used for the tail gas to enter. The material inlet of the heat exchanger 3 is communicated with the material outlet of the material heat exchanger 1. The material inlet of the shower tower is communicated with the material outlet of the heat exchanger 3 and the material outlet of the material heat exchanger 1 respectively. The material inlet of the self heat exchanger is communicated with the gas phase outlet of the shower tower. The material inlet of the first cooler is communicated with the material outlet of the self heat exchanger. The material inlet of the second cooler is communicated with the material outlet of the first cooler. The material inlet of the chlorosilane separation tank is communicated with the material outlet of the second cooler and the material outlet of the first cooler respectively. The shower liquid inlet of the shower tower is communicated with the liquid phase outlet of the chlorosilane separation tank; the liquid phase material in the chlorosilane separation tank is transported to the shower tower by a transport pump. The medium inlet of the self heat exchanger is communicated with the gas phase outlet of the chlorosilane separation tank. The inlet of the compression system is communicated with the medium outlet of the self heat exchanger. The material inlet of the cold energy recovery heat exchanger is communicated with the outlet of the compression system. The material inlet of the material heat exchanger 2 is communicated with the material outlet of the cold energy recovery heat exchanger. The material inlet of the condenser is communicated with the material outlet of the material heat exchanger 2. The material inlet of the cryogenic tank is communicated with the liquid phase outlet of the condenser. The gas phase outlet of the condenser is provided with a gas phase transport pipe. The gas phase outlet of the cryogenic tank is communicated with the gas phase transport pipe and is used for outputting hydrogen material. The medium inlet of the cold energy recovery heat exchanger is communicated with the liquid phase outlet of the cryogenic tank. The inlet one of the mixer is communicated with the medium outlet of the cold energy recovery heat exchanger. The inlet two of the mixer is used for inputting silicon tetrachloride material. The material inlet of the disproportionation tower is communicated with the outlet of the mixer. The gas phase outlet of the disproportionation tower is used for outputting trichlorotrihydrogen silicon material.
2. The polysilicon tail gas absorption system capable of reducing waste cold energy of light components according to claim 1, wherein the liquid phase outlet of the cryogenic tank is communicated with the inlet one of the mixer through a temperature control pipeline, and is used for adjusting temperature.
3. The polysilicon tail gas absorption system capable of reducing waste cold energy of light components according to claim 1, wherein the gas phase transport pipe can be selected to be communicated with the medium inlet of the material heat exchanger 1; and the medium outlet of the material heat exchanger 1 is communicated with a hydrogen purification process area.
4. The polysilicon tail gas absorption system capable of reducing waste cold energy of light components according to claim 1, wherein the liquid phase outlet of the shower tower is communicated with a rectification process area.
5. The polysilicon tail gas absorption system capable of reducing waste cold energy of light components according to claim 1, wherein Control valves are arranged on the connecting pipelines between the material heat exchanger one, the heat exchanger three, the elution tower, the self heat exchanger, the first-stage cooler, the second-stage cooler, the chlorosilane separation tank, the compression system, the cold energy recovery heat exchanger, the material heat exchanger two, the condenser, the cryogenic tank, the mixer and the reverse disproportionation tower. 6.The polysilicon tail gas absorption system capable of reducing waste light component cold energy according to claim 1, wherein, The heat exchanger three exchanges heat through circulating water.