Slide glass disc of epitaxy equipment and epitaxy equipment

Abstract

The utility model discloses epitaxial equipment and a slide glass disc of the epitaxial equipment, the top of the slide glass disc comprises a slide glass platform, a support ring clamping groove and a peripheral wall from inside to outside in sequence, the support ring clamping groove is clamped between the slide glass platform and the peripheral wall, the height of the slide glass platform is higher than that of the peripheral wall, and the support ring clamping groove is clamped between the slide glass platform and the peripheral wall. At least three arc-shaped air guide grooves are formed in the bottom of the slide glass disc, and the arc-shaped air guide grooves are rotationally symmetrical around the rotating central axis of the slide glass disc. The top of the slide glass disc is provided with the slide glass platform, the supporting ring clamping groove and the peripheral wall, the supporting ring clamping groove is formed between the slide glass platform and the peripheral wall, so that a clamping ring can be conveniently fixed in the supporting ring clamping groove, the mounting is convenient, and meanwhile, the bottom of the slide glass disc is provided with at least three arc-shaped air guide grooves; the arc-shaped air guide grooves are rotationally symmetrical around the rotating central axis of the slide glass disc, so that the rotating capability of the slide glass disc is effectively enhanced, and the adaptability of the slide glass disc is also improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and more particularly to a wafer disk and epitaxial device for an epitaxial apparatus. Background Technology

[0002] In semiconductor epitaxial growth equipment, air suspension typically involves creating complex airflow channels on a graphite substrate relative to the wafer tray placement position to guide airflow, thus rotating the wafer tray. However, in actual production, this design is not only difficult to manufacture, but also suffers from wear and tear on the airflow channels due to the rotational friction of the wafer tray over time. This wear affects the airflow volume in the air channels, thus impacting the wafer tray's rotation and ultimately leading to decreased film uniformity. Simultaneously, the airflow channel structure increases the friction between the wafer tray and the graphite substrate, hindering rotation and generating more graphite particles, negatively affecting film deposition quality. Because traditional graphite substrates have sufficiently complex airflow designs, the wafer tray structure can be very simple, typically designed as a smooth plane. However, such a design lacks sufficient rotational strength and is unsuitable for graphite substrates with simple airflow structures. Conversely, overly complex airflow structures on graphite substrates increase manufacturing difficulty and shorten their lifespan. Utility Model Content

[0003] To address the aforementioned issues, a first aspect of this application provides a wafer tray for an epitaxial device. The top of the wafer tray, from the inside out, includes a wafer platform, a retaining ring groove, and a peripheral wall. The retaining ring groove is sandwiched between the wafer platform and the peripheral wall. The height of the wafer platform is greater than the height of the peripheral wall. The bottom of the wafer tray includes at least three arc-shaped air guide grooves, which are rotationally symmetrical about the rotational axis of the wafer tray.

[0004] Optionally, the bottom center of the slide disk is further provided with a rotation limiting hole or a rotation limiting post.

[0005] Optionally, the first end of the air guide groove at the bottom of the slide tray is spaced apart from the center of the slide tray, and the tail end of the arc-shaped air guide groove extends to the edge of the slide tray.

[0006] Optionally, the slide disk is made of graphite.

[0007] Optionally, the bottom of the slide plate has nine arc-shaped air guide grooves, and the included angle between the arc-shaped air guide grooves is 40°.

[0008] Optionally, the bottom of the slide plate has eight arc-shaped air guide grooves, and the included angle between the arc-shaped air guide grooves is 45°.

[0009] Optionally, the distance from the first end of the arc-shaped air guide groove at the bottom of the slide tray to the rotation center axis of the slide tray is 10-100mm.

[0010] Optionally, the diameter of the slide disk is 100-300 mm.

[0011] Optionally, the depth of the arc-shaped air guide groove is 1-3 mm.

[0012] The second aspect of this utility model provides an epitaxial apparatus, including a wafer tray of the epitaxial apparatus described in any of the first aspects above.

[0013] At least some of the beneficial effects of this utility model are as follows:

[0014] The slide tray of this application has a slide platform, a retaining ring groove, and a peripheral wall on its top. The retaining ring groove between the slide platform and the peripheral wall allows for easy fixing of the retaining ring, making installation convenient. At the same time, the bottom of the slide tray is provided with at least three arc-shaped air guide grooves. The arc-shaped air guide grooves are rotationally symmetrical around the rotation center axis of the slide tray, which effectively enhances the rotation capability of the slide tray. It can also be used with bases with simple airflow structures, thereby simplifying the structure of the base, reducing the processing difficulty, extending the service life of the base, and improving the adaptability of the slide tray. Attached Figure Description

[0015] To make the contents of this utility model easier to understand, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0016] Figure 1 This is a schematic diagram of the structure of a substrate disk according to an embodiment of this application;

[0017] Figure 2 This is another structural schematic diagram of a substrate disk according to an embodiment of this application;

[0018] Figure 3 This is a schematic diagram of the bottom surface of a substrate tray according to an embodiment of this application.

[0019] Figure 4 This is a cross-sectional view of a slide disk according to an embodiment of this application.

[0020] The labels in the attached diagram are:

[0021] 200. Slide tray; 1. Slide tray body; 2. Arc-shaped air guide groove; 3. Rotation limiting hole; 4. Slide platform; 5. Support ring groove; 6. Peripheral wall. Detailed Implementation

[0022] To better understand the technical content of this utility model, specific embodiments are provided below in conjunction with the accompanying drawings.

[0023] Various aspects of the present invention are described in this disclosure with reference to the accompanying drawings, which illustrate numerous illustrative embodiments. The embodiments disclosed herein are not necessarily intended to include all aspects of the present invention. It should be understood that the various concepts and embodiments described above, as well as those described in more detail below, can be implemented in any of many ways, because the concepts and embodiments disclosed herein are not limited to any particular implementation. Furthermore, some aspects of the present invention can be used alone or in any suitable combination with other aspects disclosed herein.

[0024] It should be noted that when a component is referred to as "connected to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0025] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0026] In the description of this utility model, it should be understood that the terms "center", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0027] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0028] Throughout this specification, reference to "an embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of this application. Therefore, the phrases "in one embodiment," "in some embodiments," or "in some of these embodiments" appear in various places throughout the specification, and not all refer to the same embodiment. Furthermore, in one or more embodiments, a particular feature, structure, or characteristic may be combined in any suitable manner.

[0029] The technical solutions provided by the various embodiments of this application are described in detail below with reference to the accompanying drawings.

[0030] This application provides an epitaxial device, which includes a wafer disk 200, as shown in the reference. Figures 1 to 4 The epitaxial device provided in this application embodiment has a wafer carrier 200, the top of which includes a wafer carrier platform 4, a support ring groove 5, and a peripheral wall 6 from the inside to the outside.

[0031] In some embodiments, the wafer carrier platform 4 is a horizontally extending plane, optionally circular or other suitable shape. The wafer carrier platform 4 is used to support disc-shaped workpieces such as semiconductor wafers.

[0032] In some embodiments, the peripheral wall 6 is annular and located on the outermost side of the slide disk 200.

[0033] In some embodiments, the retainer ring slot 5 is open at the top and is sandwiched between the wafer carrier platform 4 and the peripheral wall 6. The height of the wafer carrier platform 4 is higher than the height of the peripheral wall 6. When a part of the retainer ring is engaged in the retainer ring slot 5 for fixation, the retainer ring rests on and is supported by the peripheral wall 6. Furthermore, the height difference between the wafer carrier platform 4 and the peripheral wall 6 is equal to the thickness of the retainer ring. Thus, when the retainer ring is placed on the wafer carrier tray 200, the upper surface of the retainer ring is flush with the wafer carrier platform 4, allowing the wafer to be easily placed on the wafer carrier platform 4 and the retainer ring.

[0034] Please see Figure 1 , Figure 4 In some embodiments, the slide tray 200 includes a slide tray body 1, and the lower surface of the slide tray body 1 opposite to the slide platform 4 is a rotary transmission surface. The rotary transmission surface is provided with downward-opening arc-shaped air guide grooves 2. The portions between the arc-shaped air guide grooves 2 form a wall, which separates the arc-shaped air guide grooves 2 from each other. At least three arc-shaped air guide grooves 2 are evenly provided on the bottom of the slide tray body 1, and the arc-shaped air guide grooves 2 are rotationally symmetrical about the rotational central axis of the slide tray body 1.

[0035] In some embodiments, the distance from the first end of the arc-shaped air guide groove 2 at the bottom of each slide tray body 1 to the rotation center axis of the slide tray body 1 is equal to the distance from the air outlet (not shown) in the base (not shown) corresponding to the slide tray to the center of the base. It is understood that this arrangement ensures that when the slide tray 200 rotates, the first end of the air guide groove at the bottom of the slide tray 200 always passes through the air outlet, allowing airflow to flow from the first end to the tail end away from the first end, thus making it easier to rotate the slide tray 200.

[0036] The arc-shaped air guide groove 2 extends along the rotating transmission surface. That is, the arc-shaped air guide groove 2 extends along a plane perpendicular to the rotation center axis of the slide disk 200.

[0037] In some embodiments, the arc-shaped air guide groove 2 has a rectangular channel cross-section along its entire length.

[0038] In some implementations, the axial dimension of the gas flow channel is uniform along its entire length.

[0039] The arc-shaped air guide groove 2 has a spiral shape that expands radially outward relative to the rotation center axis of the slide disk 200.

[0040] In some embodiments, the arc-shaped air guide groove 2 extends at an arc angle greater than 45° around the rotational center axis of the slide disk 200.

[0041] An air cushion is generated by introducing gas between the bottom side of the wafer tray 200 and the surface section of the base of the epitaxial device, and the wafer tray 200 is suspended on the air cushion. The introduced airflow is rotated by the arc-shaped air guide groove 2 arranged spirally around the rotational central axis of the wafer tray 200, and this rotation of the airflow drives the wafer tray 200 to rotate.

[0042] In one embodiment, the bottom of the slide tray 200 includes at least nine arc-shaped air guide grooves 2, which are rotationally symmetrical about the rotation center axis of the slide tray body 1. A rotation limiting hole 3 or a rotation limiting post is also provided at the center of the bottom of the slide tray body 1. The rotation limiting hole 3 of the slide tray body 1 cooperates with the rotation limiting post of the base, or the rotation limiting post of the slide tray body 1 cooperates with the rotation limiting hole of the base. This effectively prevents the slide tray from flying off the base during rotation. It is understood that the number of arc-shaped air guide grooves 2 can also be 5, 6, 8, etc., and is not limited. It should be noted that the rotation center axis of the slide tray 200 coincides with the central axis of the rotation limiting hole 3.

[0043] In one embodiment, the first end of the arc-shaped air guide groove 2 at the bottom of the slide tray 200 is spaced apart from the center of the slide tray 200, and the tail end of the arc-shaped air guide groove 2 extends to the edge of the slide tray 200.

[0044] In one embodiment, the tail end of the arc-shaped air guide groove 2 extends to the edge of the tablet tray 200. When the air outlet sprays gas into the tablet tray 200, the tablet tray 200 can be suspended upward. At the same time, the gas flows in the arc-shaped air guide groove 202, causing the tablet tray 200 to rotate around the rotation center axis of the tablet tray 200.

[0045] In some embodiments, the slide tray 200 is made of graphite. In another embodiment, the slide tray 200 is made of a ceramic material, such as quartz, sapphire, silicon carbide, alumina, zirconium oxide, aluminum nitride, or boron nitride. In some embodiments, the slide tray 200 has a weight of 100-1000 grams and a diameter of 100-300 mm.

[0046] In one embodiment, a rotating limiting post is inserted into a rotating limiting hole to fix the center of the fixed slide plate 200 relative to the center of the base, and to ensure that the slide plate 200 does not fall out of position when rotating along the rotating limiting post.

[0047] In some embodiments, the distance from the first end of the air guide groove at the bottom of each slide tray 200 to the axis of rotation of the slide tray is 10-100 mm.

[0048] In some embodiments, the base and the substrate disk 6 are made of materials such as graphite and ceramic, and there is no limitation.

[0049] In some embodiments, the bottom of the slide plate 200 has nine arc-shaped air guide grooves 2, and the included angle between the arc-shaped air guide grooves 2 is 40°.

[0050] In some embodiments, the bottom of the slide plate 200 has eight arc-shaped air guide grooves 2, and the included angle between the arc-shaped air guide grooves 2 is 45°.

[0051] In some embodiments, the arc-shaped air guide groove 2 has a groove depth of 1-3mm, which improves the air guiding effect.

[0052] In some embodiments, the diameter of the slide disk 200 is 100-300 mm.

[0053] The slide tray of this application has a slide platform 4, a retaining ring groove 5, and a peripheral wall 6 on its top. The retaining ring groove 5 between the slide platform 4 and the peripheral wall 6 allows for easy fixing of the retaining ring, facilitating installation. The bottom of the slide tray 200 has at least three arc-shaped air guide grooves 2, which are rotationally symmetrical about the rotation center axis of the slide tray 200. A rotation limiting hole 3 or a rotation limiting post is also provided at the center of the bottom of the slide tray 200. This effectively enhances the rotational capability of the slide tray 200 and allows it to be used with bases that have simple airflow structures, thereby simplifying the base structure, reducing processing difficulty, extending the service life of the base, and improving the applicability of the slide tray 200.

[0054] The above description is merely a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model. Therefore, the protection scope of this utility model should be determined by the scope of the claims.

Claims

1. A wafer carrier disk for an epitaxial apparatus, characterized by: The top of the slide disc comprises, from inside to outside, a slide platform, a ring clamping slot, and a peripheral wall, the ring clamping slot is clamped between the slide platform and the peripheral wall, the height of the slide platform is higher than the height of the peripheral wall, the bottom of the slide disc comprises at least three arc-shaped air guide grooves, the arc-shaped air guide grooves are rotationally symmetrical around the central axis of the slide disc.

2. A wafer disk for an epitaxial apparatus as defined in claim 1, wherein The center of the bottom of the slide disc is further provided with a rotation limiting hole or a rotation limiting column.

3. A wafer disk for an epitaxial apparatus as defined in claim 1, wherein: The leading end of the arc-shaped air guide groove of the bottom of the slide disc is arranged at a distance from the center of the slide disc, and the trailing end of the arc-shaped air guide groove extends to the edge of the slide disc.

4. The wafer disk for epitaxial apparatus according to claim 1, wherein: The slide disc is made of graphite.

5. The wafer disk for epitaxial apparatus according to claim 1, wherein: The arc-shaped air guide grooves of the bottom of the slide disc are arranged in 9, and the included angle between the arc-shaped air guide grooves is 40°.

6. The wafer disk for epitaxial apparatus according to claim 1, wherein: The arc-shaped air guide grooves of the bottom of the slide disc are arranged in 8, and the included angle between the arc-shaped air guide grooves is 45°.

7. The wafer disk for epitaxial apparatus according to claim 1, wherein: The distance from the leading end of the arc-shaped air guide groove of the bottom of the slide disc to the central axis of the slide disc is 10-100 mm.

8. The wafer disk for epitaxial apparatus according to claim 1, wherein: The diameter of the slide disc is 100-300 mm.

9. The wafer disk for epitaxial apparatus according to claim 1, wherein: The depth of the arc-shaped air guide groove is 1-3 mm.

10. An epitaxial apparatus, comprising: The slide disc of the epitaxial device according to any one of claims 1-8. The slide disc of the epitaxial device according to any one of claims 1-8.

Images