Photoresist supply device

Abstract

The utility model provides a photoresist supply device which is characterized in that a pipeline structure mixes first photoresist in a first supply container and second photoresist in a second supply container into mixed photoresist, and the mixed photoresist is output to a to-be-processed structure through a photoresist output structure; the first supply amount control structure controls the output flow of the first supply container, and the second supply amount control structure controls the output flow of the second supply container. According to the utility model, the mixed photoresist of new and old batches is output to the to-be-processed structure, so that the risk that the product performance is obviously changed after the new photoresist is replaced due to the component difference of the new and old batches of photoresist is reduced; meanwhile, the mixing ratio of the new photoresist and the old photoresist in the mixed photoresist is controlled through the supply quantity control structure, so that the product performance consistency is further improved; in addition, the mixing container enables the mixed photoresist to have sufficient time to be mixed before being output to a to-be-processed structure, so that the mixing effect is improved; finally, an auxiliary mixing structure is arranged, so that the mixing effect is further optimized.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of semiconductor equipment, especially a photoresist supply device. BACKGROUND

[0002] With the continuous development of the semiconductor industry, the size of semiconductor devices is further reduced, which leads to the continuous reduction of line (line width) / space (line distance) of photoetching patterns, and the requirement for CD uniformity (critical dimension uniformity) of photoetching patterns is also higher and higher. This poses a challenge to the CD change requirement between different wafers / different photoresist batches.

[0003] However, in the prior art, photoresist is transported in bottles, and there are inevitable differences in the components of photoresist between different batches; and the difference in the components of photoresist will lead to differences in the performance of wafers after photoetching when directly replacing new photoresist on the coating and developing machine.

[0004] At present, when replacing photoresist of different batches, the photoresist bottle of the new batch is directly replaced on the coating and developing machine to provide new photoresist when the coating and developing machine uses the photoresist of the previous batch. However, the difference in the components or content between the photoresist of different batches directly affects the wafers after the photoetching process, resulting in significant changes in the performance of wafers after replacing the photoresist of the new batch, thereby seriously affecting the performance uniformity and reliability of the product.

[0005] Therefore, there is an urgent need for a structure that can reduce the significant difference in product performance caused by replacing new and old photoresist.

[0006] It should be noted that the above introduction to the technical background is only for the convenience of clearly and completely describing the technical solutions of the present application, and for the convenience of understanding by those skilled in the art, and the above technical solutions cannot be considered as known to those skilled in the art only because they are described in the background section of the present application. CONTENT OF THE UTILITY MODEL

[0007] In view of the above-mentioned shortcomings of the prior art, the purpose of the present application is to provide a photoresist supply device to solve the problem of significant difference in product performance caused by replacing new and old photoresist in the prior art.

[0008] To achieve the above-mentioned purposes and other related purposes, the present application provides the following technical solutions:

[0009] The utility model provides a photoresist supply device, the photoresist supply device includes: first supply container, second supply container, first supply amount control structure, second supply amount control structure, pipeline structure and photoresist output structure.

[0010] The pipeline structure is used for transmitting the first photoresist in the first supply container, the second photoresist in the second supply container, and the mixed photoresist obtained by mixing the first photoresist and the second photoresist, and the photoresist output structure is used for outputting the mixed photoresist to a structure to be processed.

[0011] The first supply amount control structure is used for controlling the output flow of the first supply container, and the second supply amount control structure is used for controlling the output flow of the second supply container.

[0012] Optionally, the photoresist supply device further comprises a mixing container, which is in communication with the output ports of the first supply container and the second supply container, and is used for mixing the first photoresist output by the first supply container and the second photoresist output by the second supply container and placing the mixed photoresist.

[0013] Optionally, the pipeline structure comprises a first three-way valve, a second three-way valve and a supply output pipeline; the first three-way valve comprises a first inlet, a first outlet and a second outlet, and the first three-way valve can control the opening and closing states of the first outlet and the second outlet; the second three-way valve comprises a second inlet, a third outlet and a fourth outlet, and the second three-way valve can control the opening and closing states of the third outlet and the fourth outlet; the first inlet is in communication with the output port of the first supply container, the first outlet is in communication with the input port of the second supply container, and the second outlet is in communication with the input port of the mixing container; the second inlet is in communication with the output port of the second supply container, the third outlet is in communication with the input port of the first supply container, and the fourth outlet is in communication with the input port of the mixing container; the output port of the mixing container is in communication with the photoresist output structure through the supply output pipeline.

[0014] Optionally, the pipeline structure comprises a first output pipeline, a second output pipeline and a supply output pipeline; the input port of the first supply container is in communication with the output port of the second supply container through the first output pipeline, the output port of the first supply container is in communication with the input port of the mixing container through the second output pipeline, and the output port of the mixing container is in communication with the photoresist output structure through the supply output pipeline.

[0015] The second supply amount control structure is used for controlling the output flow of the second supply container to the first supply container, and the first supply amount control structure is used for controlling the output flow of the first supply container to the mixing container.

[0016] Optionally, the pipeline structure is provided with an auxiliary mixing structure; and / or, when the photoresist supply device includes a mixing container, the pipeline structure communicating with the mixing container is provided with an auxiliary mixing structure; and / or, when the photoresist supply device includes a mixing container, the mixing container is provided with an auxiliary mixing structure.

[0017] Optionally, the auxiliary mixing structure is a stirring structure or an ultrasonic vibration structure.

[0018] Optionally, the photoresist output structure includes a filter, an extraction pump, and a nozzle. The inlet of the filter is connected to the output pipe of the mixed photoresist, the inlet of the extraction pump is connected to the output port of the filter, and the inlet of the nozzle is connected to the output port of the extraction pump. The filter is used to filter out impurity particles in the mixed photoresist, and the extraction pump is used to extract a preset amount of mixed photoresist from the mixing container and eject it from the nozzle.

[0019] Optionally, the photoresist supply device further includes a balance monitor, which is electrically connected to the first supply quantity control structure and the second supply quantity control structure; the balance monitor is used to monitor the remaining amount of the first photoresist in the first supply container and / or the remaining amount of the second photoresist in the second supply container, and to feed back the monitoring results to the first supply quantity control structure and the second supply quantity control structure.

[0020] Optionally, the pipeline structure further includes a first supply pipeline and a second supply pipeline; the first supply pipeline is connected to the inlet of the first supply container and is used to supply carrier gas into the first supply container; the second supply pipeline is connected to the inlet of the second supply container and is used to supply carrier gas into the second supply container.

[0021] Optionally, the first supply control structure is a first flow meter, which is disposed in the first supply pipeline and is used to control the flow rate of carrier gas supplied by the first supply pipeline to the first supply container; the second supply control structure is a second flow meter, which is disposed in the second supply pipeline and is used to control the flow rate of carrier gas supplied by the second supply pipeline to the second supply container.

[0022] As described above, the photoresist supply device of this invention has the following beneficial effects:

[0023] The utility model discloses a mixed photoresist output to the structure to be handled is set up to mix new and old batches, to neutralize the component and content difference of photoresist in two batches, thereby reduce the risk of the performance change of the same product line product of the new photoresist after replacing because of the component difference between new and old batches photoresist, can improve the consistency and reliability of product performance;

[0024] The utility model discloses a filter can be set up, can improve the purity of mixed photoresist provided to the structure to be handled, to improve the photoetch quality to the structure to be handled, improve product yield, simultaneously through setting up extraction pump and nozzle can the quantity and time interval of mixed photoresist spray are fixed setting, to improve the uniformity of mixed photoresist provided to the structure to be handled, further improve photoetch quality;

[0025] The utility model discloses a surplus detector can be set up, can real -time monitoring the photoresist supply container remaining amount of old batch, thereby control first supply amount control structure and second supply amount control structure mix new and old batches photoresist when the photoresist remaining amount of old batch reaches the preset threshold, to guarantee that the mixing ratio of new and old photoresist can make the difference of the photoetch effect of the mixed photoresist to the structure to be handled is in reasonable range;

[0026] The utility model discloses a first supply pipeline and second supply pipeline input carrier gas to realize the effect of the photoresist output in first supply container, second supply container, thereby can control the speed of first photoresist, second photoresist output through the flow of input carrier gas control, realize the accurate of first photoresist and second photoresist ratio in mixed photoresist;

[0027] The utility model discloses the setting of mixed container, can have sufficient time to mix before mixed photoresist output to the structure to be handled, thereby improve mixing effect, further reduce the product performance difference caused by photoresist batch difference;

[0028] The utility model discloses the setting of auxiliary mixing structure in mixed container, can further improve the mixing effect of first photoresist and second photoresist;

[0029] The utility model discloses a first three -way valve and second three -way valve can control the intercommunication relation between first supply container, second supply container and mixed container, thereby can realize the change of pipeline when the change of first supply container and second supply container corresponding to the photoresist bottle of new and old batches occurs, and need not change all pipeline connection mode through the control of three -way valve, thereby can improve the operation efficiency when replacing photoresist, and improve the continuity of mixed photoresist provided to the structure to be handled;

[0030] The utility model discloses a first supply container is directly communicated with the mixing container all the time through setting, thereby can directly replace the second supply container for new photoresist bottle to realize the replacement of new batch photoresin, and need not set the three-way valve in the embodiment 4 to change the pipeline for the different photoresist bottle of new and old batch, further reduce the complexity of structure, guarantee the operation efficiency of the replacement new batch photoresist bottle is faster simultaneously.

[0031] The utility model discloses a first photoresin and second photoresin's mixing effect can be improved by setting the auxiliary mixing structure in the pipeline structure, avoid the volume increase of photoresin supply device, improve the miniaturization possibility of photoresin supply device, and the difference of the influence on photoetching effect of new and old batch photoresin can be further reduced, thereby the product consistency can be further improved.

[0032] The utility model discloses a first photoresin and second photoresin's mixing effect can be improved by setting the auxiliary mixing structure in the pipeline structure, avoid the volume increase of photoresin supply device, improve the miniaturization possibility of photoresin supply device, and the difference of the influence on photoetching effect of new and old batch photoresin can be further reduced, thereby the product consistency can be further improved. BRIEF DESCRIPTION OF DRAWINGS

[0033] Figure 1 The structure schematic drawing of photoresin supply device in the utility model embodiment 1 is shown.

[0034] Figure 2 The structure schematic drawing of photoresin supply device in the utility model embodiment 2 is shown.

[0035] Figure 3 The structure schematic drawing of photoresin supply device in the utility model embodiment 3 is shown.

[0036] Figure 4 The structure schematic drawing presented in step 1 of the use method of photoresin supply device in the utility model embodiment 3 is shown.

[0037] Figure 5 The structure schematic drawing presented in step 2 of the use method of photoresin supply device in the utility model embodiment 3 is shown.

[0038] Figure 6 The structure schematic drawing presented in step 3 of the use method of photoresin supply device in the utility model embodiment 3 is shown.

[0039] Figure 7 The structure schematic drawing of photoresin supply device in the utility model embodiment 4 is shown.

[0040] ELEMENT NUMBER EXPLANATION

[0041] 11, first supply container; 12, second supply container; 13, first supply amount control structure; 14, second supply amount control structure; 15, first photoresist; 16, second photoresist; 17, mixed photoresist; 18, mixing container; 19, carrier gas;

[0042] 20, piping structure; 21, first supply piping; 22, second supply piping; 23, first three-way valve; 231, first inlet; 232, first outlet; 233, second outlet; 24, second three-way valve; 241, second inlet; 242, third outlet; 243, fourth outlet; 25, supply output piping; 261, first input pipe; 262, first output pipe; 263, second input pipe; 264, second output pipe; 265, third input pipe; 266, fourth input pipe;

[0043] 30, photoresist output structure; 31, filter; 32, suction pump; 33, nozzle; 34, structure to be processed. DETAILED DESCRIPTION

[0044] The embodiments of the present application will be described in detail with specific examples. Other advantages and effects of the present application will be easily understood by those skilled in the art from the description of the present application. The present application can also be implemented or applied in other different embodiments, and the details in the description can be modified or changed based on different viewpoints and applications without departing from the spirit of the present application.

[0045] In the detailed description of the embodiments of the present application, the schematic diagrams showing the structures of the devices can be partially enlarged without the general scale for the convenience of description, and the schematic diagrams are only examples which should not limit the scope of protection of the present application. In addition, the three-dimensional spatial dimensions including length, width and depth should be included in the actual manufacture.

[0046] For the convenience of description, spatial relationship words such as "under", "below", "lower", "underneath", "above", "upper" and the like can be used to describe the relationship between one element or feature and other elements or features shown in the drawings. It will be understood that these spatial relationship words are intended to include other orientations of the device in use or operation in addition to the orientations depicted in the drawings.

[0047] In the context of the present application, the structure in which the first feature is "on" the second feature can include the embodiment in which the first and second features are formed in direct contact, and can also include the embodiment in which another feature is formed between the first and second features, so that the first and second features can not be in direct contact.

[0048] It is to be noted that the diagram provided in the embodiment only schematically illustrates the basic concept of the present application, and thus only shows the components related to the present application in the diagram, rather than being drawn according to the number, shape and size of the components in actual implementation. The shape, number and proportion of the components in actual implementation can be changed at will, and the layout of the components can be more complex.

[0049] In the prior art, photoresist is transported in a bottle, and there are inevitable differences in components between different batches of photoresist. The difference in components of photoresist will cause differences in the performance of wafers after photoetching when a new batch of photoresist is directly replaced on a coating and developing machine. When replacing different batches of photoresist at present, a new batch of photoresist bottle is directly replaced on the coating and developing machine to provide new photoresist when the coating and developing machine uses the last batch of photoresist. However, the difference in components or content between different batches of photoresist directly affects the wafers after the photoetching process, thereby causing significant changes in the performance of wafers after replacing a new batch of photoresist, thereby seriously affecting the performance uniformity and reliability of products.

[0050] Embodiment 1:

[0051] The embodiment provides a photoresist supply device, as shown in the figure, the photoresist supply device comprises a first supply container 11, a second supply container 12, a first supply amount control structure 13, a second supply amount control structure 14, a pipeline structure 20 and a photoresist output structure 30. Figure 1 The pipeline structure 20 is used for transmitting the first photoresist 15 in the first supply container 11, the second photoresist 16 in the second supply container 12, and the mixed photoresist 17 obtained by mixing the first photoresist 15 and the second photoresist 16, and the photoresist output structure 30 is used for outputting the mixed photoresist 17 to a to-be-processed structure 34.

[0052] The first supply amount control structure 13 is used for controlling the output flow of the first supply container 11, and the second supply amount control structure 14 is used for controlling the output flow of the second supply container 12.

[0053] The first supply amount control structure 13 is used for controlling the output flow of the first supply container 11, and the second supply amount control structure 14 is used for controlling the output flow of the second supply container 12.

[0054] The present application outputs the mixed photoresist 17 of the new and old batches to the to-be-processed structure 34 to neutralize the difference in components and content of photoresist in the two batches, thereby reducing the risk of significant changes in the performance of products in the same product line after replacing new photoresist due to the difference in components between the new and old batches of photoresist, and improving the consistency and reliability of product performance.

[0055] Specifically, the first supply container 11 and the second supply container 12 in the utility model can directly fill or replace different batches of photoresist bottles; the first supply container 11 can be an old batch of photoresist bottles, and the second supply container 12 can be a new batch of photoresist bottles; or the first supply container 11 can be a new batch of photoresist bottles, and the second supply container 12 can be an old batch of photoresist bottles, which can be adjusted according to actual application requirements.

[0056] In one embodiment, as shown in Figure 1 The photoresist output structure 30 includes a filter 31, an extraction pump 32 and a nozzle 33, the input port of the filter 31 is communicated with the output pipeline port of the mixed photoresist 17, the input port of the extraction pump 32 is communicated with the output port of the filter 31, and the input port of the nozzle 33 is communicated with the output port of the extraction pump 32; the filter 31 is used for filtering impurity particles in the mixed photoresist 17, the extraction pump 32 is used for extracting a preset amount of mixed photoresist 17 from the mixed container 18 and spraying the mixed photoresist 17 from the nozzle 33.

[0057] The utility model discloses a filter 31 can improve the purity of the mixed photoresist 17 provided to the structure to be handled 34, to improve the photoetching quality to the structure to be handled 34, improve the product yield, and simultaneously through setting up extraction pump 32 and nozzle 33 can the amount and time interval of mixed photoresist 17 spray fixed setting, to improve the uniformity of mixed photoresist 17 provided to the structure to be handled 34, further improve the photoetching quality.

[0058] Specifically, the preset amount of mixed photoresist 17 is set according to the photoetching requirement of the structure to be handled 34.

[0059] Specifically, the extraction frequency and extraction amount of the extraction pump 32 and the nozzle 33 to the mixed photoresist 17 can be automatically set by program, so that the extraction frequency and extraction amount of the mixed photoresist 17 can be adjusted in time according to the photoetching requirement of different structures to be handled 34.

[0060] In one embodiment, the photoresist supply device further includes a residual amount monitor, the residual amount monitor is electrically connected with the first supply amount control structure 13 and the second supply amount control structure 14; the residual amount monitor is used for monitoring the residual amount of the first photoresist 15 in the first supply container 11 and / or the residual amount of the second photoresist 16 in the second supply container 12, and feeding back the monitoring result to the first supply amount control structure 13 and the second supply amount control structure 14.

[0061] The utility model discloses a residual amount detector is set up, can carry out real -time monitoring to the old batch photoresist supply container residual amount to control first supply amount control structure 13 and second supply amount control structure 14 when the old batch photoresist residual amount reaches the preset threshold amount and mix the new batch photoresist, to guarantee that the mixing ratio of old photoresist can make the difference of the photoetching effect of the mixed photoresist 17 to the processing structure 34 within the reasonable range.

[0062] Specifically, the residual amount of the old batch photoresist can be reasonably set according to experiments and process requirements to ensure that the difference in photoetching effect does not change significantly and meets the requirements of product consistency.

[0063] In one embodiment, as shown in Figure 1 The first supply pipeline 21 is in communication with the input port of the first supply container 11 for providing carrier gas 19 into the first supply container 11, and the second supply pipeline 22 is in communication with the input port of the second supply container 12 for providing carrier gas 19 into the second supply container 12.

[0064] The utility model discloses a first supply pipeline 21 and second supply pipeline 22 input carrier gas 19 to realize the effect of outputting photoresist in the first supply container 11 and the second supply container 12, so that the output speed of the first photoresist 15 and the second photoresist 16 can be controlled by controlling the flow of input carrier gas 19, and the proportion of the first photoresist 15 and the second photoresist 16 in the mixed photoresist 17 can be accurately controlled.

[0065] In one embodiment, the carrier gas 19 is nitrogen. Specifically, other suitable gases that do not react with photoresist can also be used as carrier gas 19 to realize the output of the first photoresist 15 and the second photoresist 16.

[0066] Specifically, other suitable structures can also be used to control the output speed of the first photoresist 15 and the second photoresist 16, which are within the protection scope of the utility model.

[0067] In one embodiment, the first supply amount control structure 13 is a first flow meter, which is arranged in the first supply pipeline 21 for controlling the flow of carrier gas 19 provided by the first supply pipeline 21 into the first supply container 11, and the second supply amount control structure 14 is a second flow meter, which is arranged in the second supply pipeline 22 for controlling the flow of carrier gas 19 provided by the second supply pipeline 22 into the second supply container 12.

[0068] Specifically, the first supply amount control structure 13 and the second supply amount control structure 14 can also be other suitable structures, all within the protection scope of the utility model.

[0069] Specifically, by collecting the information such as the critical dimension after development of the wafer coated with the old batch of photoresist alone or / and the defect after development of the wafer, as a control group, then by setting the experimental group variable as the mixed photoresist 17 with different mixing ratios of the new and old batches of photoresist (the new and old batch ratio can be 1:9 / 1:4 / 3:7 / 2:3 / 3:2 / 7:3 / 4:1 / 9:1, or other suitable ratios can be selected as the experimental group variable according to requirements), the wafer after development coated with the mixed photoresist 17 with different mixing ratios of the new and old batches of photoresist alone is taken as the experimental group, and the wafer after development coated with the old batch of photoresist alone is taken as the control group, the mixing ratio with the smallest size information change after development of the wafer and the most stable stability in the experimental group compared with the control group is taken as the ratio of the old batch of photoresist and the new batch of photoresist in the actual mixed photoresist 17. Embodiment 2:

[0070] The embodiment provides a photoresist supply device, and other characteristics of the photoresist supply device are basically the same as those of embodiment 1, and the difference lies in that:

[0071] In the embodiment, as shown in the figure, Figure 2 The photoresist supply device further comprises a mixing container 18, the mixing container 18 is in communication with the output ports of the first supply container 11 and the second supply container 12, and the mixing container 18 is used for mixing the first photoresist 15 output by the first supply container 11 and the second photoresist 16 output by the second supply container 12 and placing the mixed photoresist 17.

[0072] The photoresist supply device further comprises a mixing container 18, the mixing container 18 is in communication with the output ports of the first supply container 11 and the second supply container 12, and the mixing container 18 is used for mixing the first photoresist 15 output by the first supply container 11 and the second photoresist 16 output by the second supply container 12 and placing the mixed photoresist 17.

[0073] Specifically, the first supply container 11 and the second supply container 12 in the utility model can be directly filled or replaced with different batches of photoresist bottles according to the incoming materials; that is, the first supply container 11 is an old batch of photoresist bottle, and the second supply container 12 is a new batch of photoresist bottle; or the first supply container 11 is a new batch of photoresist bottle, and the second supply container 12 is an old batch of photoresist bottle, which can be adjusted according to actual application requirements.

[0074] In one embodiment, the mixing container 18 is provided with an auxiliary mixing structure.

[0075] The utility model discloses a auxiliary mixing structure is arranged in the mixed container 18, can further improve the mixing effect of first photoresist 15 and second photoresist 16.

[0076] In one embodiment, the photoresist output structure 30 comprises a filter 31, an extraction pump 32 and a nozzle 33, the input port of the filter 31 is communicated with the output port of the mixed container 18 outputting the mixed photoresist 17.

[0077] Embodiment 3:

[0078] The embodiment provides a photoresist supply device, and other features of the photoresist supply device are basically same to embodiment 2, and the difference is that:

[0079] In the embodiment, as shown in the figure, Figure 3 The pipeline structure 20 comprises a first three-way valve 23, a second three-way valve 24 and a supply output pipeline 25; the first three-way valve 23 comprises a first inlet 231, a first outlet 232 and a second outlet 233, the first three-way valve 23 can control the on-off state of the first outlet 232 and the second outlet 233; the second three-way valve 24 comprises a second inlet 241, a third outlet 242 and a fourth outlet 243, the second three-way valve 24 can control the on-off state of the third outlet 242 and the fourth outlet 243; the first inlet 231 is communicated with the output port of the first supply container 11, the first outlet 232 is communicated with the input port of the second supply container 12, and the second outlet 233 is communicated with the input port of the mixed container 18; the second inlet 241 is communicated with the output port of the second supply container 12, the third outlet 242 is communicated with the input port of the first supply container 11, and the fourth outlet 243 is communicated with the input port of the mixed container 18; the output port of the mixed container 18 is communicated with the photoresist output structure 30 through the supply output pipeline 25.

[0080] The first three-way valve 23 and the second three-way valve 24 can control the communication relationship between the first supply container 11, the second supply container 12 and the mixed container 18, so that when the first supply container 11 and the second supply container 12 corresponding to the photoresist bottles of new and old batches are changed, the pipeline can be changed through the control of the three-way valve, without changing all pipeline connection modes, so that the operation efficiency when replacing the photoresist can be improved, and the continuity of providing the mixed photoresist 17 to the structure to be treated 34 can be improved.

[0081] In the embodiment, the residual amount monitor is used for monitoring the residual amount of the first photoresist 15 in the first supply container 11 and the residual amount of the second photoresist 16 in the second supply container 12.

[0082] Specifically, the method of using the photoresist supply device is as follows:

[0083] Step 1: As Figure 4 As shown, in the initial state, when the first supply container 11 is the first batch of photoresist bottle and the second supply container 12 is the second batch of photoresist bottle, when the balance monitor does not detect that the remaining amount of the first batch of photoresist in the first supply container 11 is lower than the preset threshold, the first inlet 231 and the second outlet 233 of the first three-way valve 23 are opened, the first outlet 232 of the first three-way valve 23 is closed, and the second inlet 241, the third outlet 242 and the fourth outlet 243 of the second three-way valve 24 are all closed. The mixing container 18 receives the first batch of photoresist from the first supply container 11 only through the second outlet 233.

[0084] Step 2: As Figure 5 As shown, when the balance monitor detects that the remaining amount of the first batch of photoresist in the first supply container 11 is lower than the preset threshold, the first inlet 231 and the first outlet 232 of the first three-way valve 23 are opened, the second outlet 233 of the first three-way valve 23 is closed, the second inlet 241 and the fourth outlet 243 of the second three-way valve 24 are opened, and the third outlet 242 of the second three-way valve 24 is closed. The first batch of photoresist in the first supply container 11 is transferred to the second batch of photoresist in the second supply container 12 and mixed with the second batch of photoresist. The mixing container 18 receives the mixed photoresist 17 from the second supply container 12 only through the fourth outlet 243.

[0085] Step 3: As Figure 6 As shown, when the remaining amount of the second batch of photoresist in the second supply container 12 is lower than the preset threshold, the first supply container 11 is replaced with the third batch of photoresist bottle; the second inlet 241 and the third outlet 242 of the second three-way valve 24 are opened, the fourth outlet 243 of the second three-way valve 24 is closed, the first inlet 231 and the second outlet 233 of the first three-way valve 23 are opened, the first outlet 232 of the first three-way valve 23 is closed, and the second batch of photoresist in the second supply container 12 is transferred to the third batch of photoresist in the first supply container 11 and mixed with the third batch of photoresist. The mixing container 18 receives the mixed photoresist 17 from the first supply container 11 only through the second outlet 233.

[0086] Step 4: Repeat steps 2-3, replace the 1st batch of photoresist with the 3rd batch of photoresist, replace the 2nd batch of photoresist with the 4th batch of photoresist, replace the 3rd batch of photoresist with the 5th batch of photoresist, and so on, so that the mixing container 18 always receives the mixed photoresist 17 obtained by mixing the old batch of photoresist into the new batch of photoresist from the old batch of photoresist bottle (the old batch of photoresist refers to the photoresist that is about to be used up at the current operation, and the new batch of photoresist refers to the photoresist that has not started or has been used very little at the current operation).

[0087] Specifically, Figures 4-6 The "X" in the above formula indicates that the outlet at this position is closed.

[0088] Specifically, the first supply container 11 and the second supply container 12 in the utility model are different batches of photoresist bottles that can be directly filled or replaced; the first supply container 11 and the second supply container 12 are photoresist bottles corresponding to the old batch or the new batch according to the description in the above use method.

[0089] In one embodiment, as Figure 3 shown, the pipeline structure 20 further comprises a first input pipeline 261, a first output pipeline 262, a second input pipeline 263, a second output pipeline 264, a third input pipeline 265, and a fourth input pipeline 266; wherein the first input pipeline 261 is connected to the third outlet 242 of the second three-way valve 24 and the input port of the first supply container 11, the first output pipeline 262 is connected to the output port of the first supply container 11 and the first inlet 231 of the first three-way valve 23; the second input pipeline 263 is connected to the first outlet 232 of the first three-way valve 23 and the input port of the second supply container 12, the second output pipeline 264 is connected to the output port of the second supply container 12 and the second inlet 241 of the second three-way valve 24; the third input pipeline 265 is connected to the second outlet 233 of the first three-way valve 23 and the input port of the mixing container 18, and the fourth input pipeline 266 is connected to the fourth outlet 243 of the second three-way valve 24 and the input port of the mixing container 18.

[0090] Specifically, the pipeline structure 20 can also use other pipelines to connect the first inlet 231, the first outlet 232, and the second outlet 233 of the first three-way valve 23 to their respective input ports or output ports, and the specific arrangement of the pipelines can be arranged according to the needs, all within the scope of the utility model.

[0091] Example 4:

[0092] This embodiment provides a photoresist supply device, which has other features that are basically the same as those in Embodiment 2, except that:

[0093] In this embodiment, as Figure 7 As shown, the pipeline structure 20 includes a first output pipe 262, a second output pipe 264, and a supply output pipe 25; the input port of the first supply container 11 is connected to the output port of the second supply container 12 through the first output pipe 262, the output port of the first supply container 11 is connected to the input port of the mixing container 18 through the second output pipe 264, and the output port of the mixing container 18 is connected to the photoresist output structure 30 through the supply output pipe 25;

[0094] The second supply control structure 14 is used to control the output flow rate of the second photoresist 16 from the second supply container 12 to the first supply container 11, and the first supply control structure 13 is used to control the output flow rate of the mixed photoresist 17 from the first supply container 11 to the mixing container 18.

[0095] Specifically, in this utility model, the first supply container 11 and the second supply container 12 are photoresist bottles from different batches that can be directly filled or replaced upon arrival. In this embodiment, the first supply container 11 is always a photoresist bottle from the old batch, and the second supply container 12 is always a photoresist bottle from the new batch. When replacing a new photoresist bottle, simply replace the second supply container 12 with a photoresist bottle containing the new batch of photoresist.

[0096] This invention, by setting the first supply container 11 to always be in direct communication with the mixing container 18, allows for the replacement of a new batch of photoresist simply by replacing the second supply container 12 with a new photoresist bottle. This eliminates the need for the three-way valve in Embodiment 4, which requires changing the pipeline to accommodate the different photoresist bottles for the old and new batches. This further reduces the complexity of the structure while ensuring a faster operation for replacing the photoresist bottle with a new batch.

[0097] Example 5:

[0098] This embodiment provides a photoresist supply device, the other features of which are basically the same as any of the photoresist supply devices in embodiments 1-4, the difference being:

[0099] In this embodiment, an auxiliary mixing structure is provided inside the pipeline structure 20.

[0100] This invention improves the mixing effect of the first photoresist 15 and the second photoresist 16 by setting an auxiliary mixing structure inside the pipeline structure 20, utilizing the original volume and position of the pipeline structure 20. This avoids increasing the volume of the photoresist supply device, increases the possibility of miniaturization of the photoresist supply device, and can further reduce the difference in the impact of new and old batches of photoresist on the photolithography effect, thereby further improving product consistency.

[0101] In one embodiment, when the other features of the photoresist supply device are substantially the same as any of the photoresist supply devices in Embodiments 2-4, the photoresist supply device includes a mixing container 18, and an auxiliary mixing structure is provided in the pipe in which the pipeline structure 20 communicates with the mixing container 18.

[0102] This invention improves the mixing effect of the first photoresist 15 and the second photoresist 16 before they enter the mixing container 18 by setting an auxiliary mixing structure in the pipeline structure 20 connected to the mixing container 18, thereby improving the mixing uniformity of the resulting mixed photoresist 17 when it enters the structure to be processed 34.

[0103] In one embodiment, the auxiliary mixing structure is a stirring structure or an ultrasonic vibration structure.

[0104] In one embodiment, the auxiliary mixing structure is a double helical blade (pipe mixer).

[0105] Specifically, the auxiliary mixing structure can also be other suitable structures that can improve the mixing effect, all of which are within the protection scope of this utility model.

[0106] In summary, the photoresist supply device of this invention can neutralize the differences in composition and content between the two batches of photoresist by setting up a mixed photoresist output that combines new and old batches, thereby reducing the risk of significant performance changes in the same product line after replacing the photoresist due to compositional differences between the new and old batches, and improving the consistency and reliability of product performance. Simultaneously, by controlling the output flow through the supply control structure, the mixing ratio between the new and old photoresist in the mixed photoresist can be controlled, further improving the consistency of product performance obtained from the mixed photoresist. Furthermore, the mixing container allows sufficient time for mixing before the mixed photoresist is output to the structure to be processed, thereby improving the mixing effect and reducing product performance differences. Finally, the auxiliary mixing structure further optimizes the mixing effect.

[0107] Therefore, this utility model effectively overcomes the various shortcomings of the prior art and has high industrial application value.

[0108] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. A photoresist supply device, characterized in that, The photoresist supply device includes: a first supply container, a second supply container, a first supply quantity control structure, a second supply quantity control structure, a pipeline structure, and a photoresist output structure; The pipeline structure is used to transmit the first photoresist in the first supply container, the second photoresist in the second supply container, and the mixed photoresist obtained by mixing the first photoresist and the second photoresist. The photoresist output structure is used to output the mixed photoresist to the structure to be processed. The first supply control structure is used to control the output flow of the first supply container, and the second supply control structure is used to control the output flow of the second supply container.

2. The photoresist supply device according to claim 1, characterized in that: The photoresist supply device further includes a mixing container, which is connected to the output ports of both the first supply container and the second supply container. The mixing container is used to mix the first photoresist output from the first supply container and the second photoresist output from the second supply container and place the mixed photoresist thereon.

3. The photoresist supply device according to claim 2, characterized in that: The pipeline structure includes a first three-way valve, a second three-way valve, and supply and output pipelines; the first three-way valve includes a first inlet, a first outlet, and a second outlet, and the first three-way valve can control the on / off state of the first outlet and the second outlet; the second three-way valve includes a second inlet, a third outlet, and a fourth outlet, and the second three-way valve can control the on / off state of the third outlet and the fourth outlet; The first inlet is connected to the output port of the first supply container, the first outlet is connected to the input port of the second supply container, and the second outlet is connected to the input port of the mixing container; the second inlet is connected to the output port of the second supply container, the third outlet is connected to the input port of the first supply container, and the fourth outlet is connected to the input port of the mixing container; the output port of the mixing container is connected to the photoresist output structure through the supply output pipeline.

4. The photoresist supply device according to claim 2, characterized in that: The piping structure includes a first output pipe, a second output pipe, and a supply output pipe; the input port of the first supply container is connected to the output port of the second supply container through the first output pipe, the output port of the first supply container is connected to the input port of the mixing container through the second output pipe, and the output port of the mixing container is connected to the photoresist output structure through the supply output pipe. The second supply control structure is used to control the output flow rate of the second photoresist from the second supply container to the first supply container, and the first supply control structure is used to control the output flow rate of the mixed photoresist from the first supply container to the mixing container.

5. The photoresist supply device according to any one of claims 1-4, characterized in that: An auxiliary mixing structure is provided within the pipeline structure; and / or, when the photoresist supply device includes a mixing container, an auxiliary mixing structure is provided within the pipe connecting the pipeline structure to the mixing container; and / or, when the photoresist supply device includes a mixing container, an auxiliary mixing structure is provided within the mixing container.

6. The photoresist supply device according to claim 5, characterized in that: The auxiliary mixing structure is a stirring structure or an ultrasonic vibration structure.

7. The photoresist supply device according to claim 2, characterized in that: The photoresist output structure includes a filter, an extraction pump, and a nozzle. The input port of the filter is connected to the output pipe of the mixed photoresist, the input port of the extraction pump is connected to the output port of the filter, and the input port of the nozzle is connected to the output port of the extraction pump. The filter is used to filter out impurity particles in the mixed photoresist, and the extraction pump is used to extract a preset amount of mixed photoresist from the mixing container and eject it from the nozzle.

8. The photoresist supply device according to claim 1, characterized in that: The photoresist supply device further includes a balance monitor, which is electrically connected to the first supply quantity control structure and the second supply quantity control structure. The balance monitor is used to monitor the remaining amount of the first photoresist in the first supply container and / or the remaining amount of the second photoresist in the second supply container, and to feed back the monitoring results to the first supply quantity control structure and the second supply quantity control structure.

9. The photoresist supply device according to claim 1, characterized in that: The pipeline structure further includes a first supply pipeline and a second supply pipeline; the first supply pipeline is connected to the inlet of the first supply container and is used to supply carrier gas into the first supply container; the second supply pipeline is connected to the inlet of the second supply container and is used to supply carrier gas into the second supply container.

10. The photoresist supply device according to claim 9, characterized in that: The first supply control structure is a first flow meter, which is installed in the first supply pipeline and is used to control the flow rate of carrier gas supplied from the first supply pipeline to the first supply container; the second supply control structure is a second flow meter, which is installed in the second supply pipeline and is used to control the flow rate of carrier gas supplied from the second supply pipeline to the second supply container.

Images