Auxiliary powder dispersing device of atomic layer deposition equipment
By employing electrostatic assisted dispersion technology and a dual-chamber atomic layer deposition equipment, the problems of powder residue and agglomeration in powder ALD equipment have been solved, achieving uniform powder dispersion and efficient reaction, thereby improving reaction efficiency and product consistency.
Patent Information
- Application Number
- CN202423198260.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-24
- Publication Date
- 2026-01-23
- Estimated Expiration
- 2034-12-24
AI Technical Summary
In existing powder ALD equipment, powder samples are prone to remain in the chamber, and the agglomeration phenomenon leads to low reaction efficiency, affecting product quality and production efficiency.
An atomic layer deposition device with electrostatic assisted dispersion technology and a dual-cavity design is used to assist in the dispersion of powders. By separating the electric field application chamber and the heating reaction chamber, uniform dispersion and reaction of powders are achieved, avoiding powder residue and improving reaction efficiency.
The increased contact area between powder and gas improves reaction efficiency, simplifies the sampling process, enhances equipment cleanliness and product consistency, and increases operational flexibility.
Smart Images

Figure CN223823697U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of atomic layer deposition technology, and in particular to an auxiliary powder dispersion device for atomic layer deposition equipment. Background Technology
[0002] In traditional atomic layer deposition (ALD) technology, the dispersion and reaction efficiency of powder samples are key factors affecting product quality and production efficiency.
[0003] Existing powder ALD equipment typically employs a single-chamber design, where the reaction process of the powder sample takes place directly within a fixed chamber. This leads to powder sample residue within the chamber, affecting the reaction results of subsequent batches. Furthermore, the agglomeration of the powder sample reduces its contact area with the gas, thus lowering reaction efficiency. Utility Model Content
[0004] In view of this, the present invention provides an auxiliary powder dispersion device for atomic layer deposition equipment.
[0005] Specifically, this utility model is achieved through the following technical solution:
[0006] According to a first aspect of the present invention, an auxiliary powder dispersion device for atomic layer deposition equipment is provided, comprising:
[0007] A cylindrical body, wherein an outlet is provided on the side wall of the cylindrical body, an inlet is provided on the bottom wall of the cylindrical body, and a receiving cavity is provided inside the cylindrical body, wherein the receiving cavity is connected to the outlet and the inlet respectively;
[0008] A partition is provided within the receiving cavity, dividing the receiving cavity into an electric field application cavity and a heating reaction cavity. The electric field application cavity is connected to the inlet, the electric field application cavity is connected to the outlet, and the electric field application cavity is connected to the heating reaction cavity.
[0009] Optionally, the partition is provided with a through hole, and the electric field application cavity and the heating reaction cavity are connected through the through hole.
[0010] Optionally, the inner wall of the cylinder is provided with a groove, and the edge of the partition is inserted into the groove.
[0011] Optionally, the outer wall surface of the cylinder protrudes outward to form a boss.
[0012] Optionally, the outer surface of the sidewall of the cylinder protrudes outward to form the boss, and the inner surface of the sidewall is recessed inward to form the groove.
[0013] Optionally, the partition is a filter screen, and the edge of the filter screen is connected to the inner wall of the receiving cavity.
[0014] Optionally, the top opening of the cylinder is covered with a top cover.
[0015] Optionally, an inner cylinder is detachably inserted into the receiving cavity, and the bottom of the inner cylinder is supported on the partition.
[0016] Optionally, the top cover is hinged to the top opening of the cylinder.
[0017] Optionally, the top cover is provided with a gripping part.
[0018] The technical solution provided by this utility model brings at least the following beneficial effects:
[0019] This application provides an atomic layer deposition (ALD) equipment-assisted powder dispersion device that utilizes electrostatic assisted dispersion technology to achieve more uniform dispersion of powder samples, reducing agglomeration and thus increasing the contact area between the powder and gas, thereby enhancing reaction efficiency. The dual-chamber design makes the sampling process more direct and convenient, avoiding powder residue in the reaction chamber, reducing the risk of cross-contamination, and improving equipment cleanliness and product consistency. The dual-chamber structure allows for the movement of the reaction chambers, improving operational flexibility and enabling adjustments to the working status of each chamber as needed, thus optimizing the production process. Attached Figure Description
[0020] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with the present invention and, together with the description, serve to explain the principles of the present invention.
[0021] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0022] Figure 1 A schematic diagram of the structure of an auxiliary powder dispersion device for an atomic layer deposition equipment provided in this embodiment of the present invention;
[0023] Figure 2 This is a schematic diagram of the internal structure of an auxiliary powder dispersion device for an atomic layer deposition equipment, provided as an embodiment of the present invention. Detailed Implementation
[0024] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0025] Figure 1 The illustration schematically depicts an auxiliary powder dispersion device for an atomic layer deposition apparatus applicable to an embodiment of the present invention.
[0026] Reference Figure 1-2 As shown, this application provides an auxiliary powder dispersion device for atomic layer deposition equipment, comprising:
[0027] A cylindrical body 10 is provided with an outlet 11 on its side wall and an inlet 12 on its bottom wall. A receiving cavity 13 is provided inside the cylindrical body 10, and the receiving cavity 13 is connected to the outlet 11 and the inlet 12 respectively.
[0028] A partition 20 is disposed within the receiving cavity 13 and divides the receiving cavity 13 into an electric field application cavity 14 and a heating reaction cavity 15. The electric field application cavity 14 is connected to the inlet 12, the electric field application cavity 14 is connected to the outlet 11, and the electric field application cavity 14 is connected to the heating reaction cavity 15.
[0029] In this embodiment, the powder is placed in the heating reaction chamber 15 of the cylinder 10. The two ends of the cylinder 10 are connected to the positive and negative terminals of a power source, respectively, creating an electric field within the electric field application chamber 14. This electric field acts on the powder in the heating reaction chamber 15 above the electric field application chamber 14, causing each powder particle to acquire the same charge and repel each other. Gas is then introduced into the inlet 12, and a vacuum pump is connected to the outlet 11. The gas flows from the inlet 12 through the electric field application chamber 14, the heating reaction chamber 15, and the outlet 11, driving the powder to move within the heating reaction chamber 15. Simultaneously, the heating reaction chamber 15 heats the internal material and passes through the reaction site. This atomic layer deposition equipment-assisted powder dispersion device, by combining electrostatic assisted dispersion technology and a dual-chamber design, exhibits significant technical advantages.
[0030] Cylindrical Design: The cylindrical body serves as the main body of the device, with an outlet and an inlet on its side and bottom walls, respectively. These two openings connect to the receiving cavity inside the cylinder. The receiving cavity is used to load the powder sample and serves as the main site for powder dispersion and reaction.
[0031] The partition is located within the receiving cavity, cleverly dividing it into two independent functional areas: an electric field application cavity and a heating reaction cavity. The electric field application cavity is directly connected to the inlet and is used to receive the powder sample, achieving uniform powder dispersion through the electrostatic field. The heating reaction cavity is connected to the electric field application cavity (through a channel or gap in the partition) and is used for the reaction between the powder and the gas.
[0032] Electrostatic Assisted Dispersion Technology: By applying an electrostatic field within the electric field application chamber, the powder sample is more uniformly dispersed under the influence of electrostatic forces. This technology significantly reduces powder particle agglomeration, thereby increasing the contact area between the powder and the gas. The increased contact area contributes to improved reaction efficiency, as more powder particles can react with the gas simultaneously. Dual-Cavity Design: The separate design of the electric field application chamber and the heating reaction chamber makes the sampling process more direct and convenient. After the powder is dispersed in the electric field application chamber, the dispersed powder can be directly fed into the heating reaction chamber for reaction. This design avoids powder residue within the reaction chamber, thereby improving equipment cleanliness and product consistency. Furthermore, the dual-cavity design facilitates segmented control of the powder and gas, further improving the accuracy and controllability of the reaction.
[0033] This atomic layer deposition (ALD)-assisted powder dispersion device has broad application prospects in materials science, nanotechnology, and semiconductor manufacturing. By improving powder dispersion uniformity and reaction efficiency, this device helps enhance the quality and performance of related products. Simultaneously, its dual-chamber design simplifies the sampling process, reduces operational complexity and maintenance costs, and provides researchers and enterprises with a more convenient and efficient experimental and production tool.
[0034] In summary, this atomic layer deposition equipment-assisted powder dispersion device, through its innovative technical design, achieves uniform powder dispersion and efficient reaction, providing strong support for scientific research and production in related fields.
[0035] For example, the partition 20 is provided with a through hole, and the electric field application cavity 14 and the heating reaction cavity 15 are connected through the through hole.
[0036] In this embodiment, the through hole is used to allow gas to enter the heating reaction chamber 15 from the electric field application chamber 14.
[0037] For example, the inner wall of the cylinder 10 is provided with a groove 16, and the edge of the partition 20 is inserted into the groove 16.
[0038] In this embodiment, the groove 16 is used to fasten the edge of the partition 20, making it easy to disassemble the partition 20.
[0039] For example, the outer wall surface of the cylinder 10 protrudes outward to form a boss 17.
[0040] In this embodiment, the boss 17 is used to be fitted and installed with an external structure (such as a fixing groove) to stably fix the cylinder 10.
[0041] For example, the outer surface of the sidewall of the cylinder 10 protrudes outward to form the boss 17, and the inner surface of the sidewall is recessed inward to form the groove 16.
[0042] In this embodiment, the inner surface of the same part of the sidewall on the cylinder 10 is recessed inward to form a groove 16, while the outer surface of the same part protrudes outward to form a boss 17.
[0043] For example, the partition 20 is a filter screen, and the edge of the filter screen is connected to the inner wall of the receiving cavity 13.
[0044] In this embodiment, the edge of the filter screen is fixed in the groove 16. Gas passes through the filter screen from the electric field application chamber 14 into the heating reaction chamber 15. At the same time, the filter screen can also prevent powder from entering the electric field application chamber 14 from the heating reaction chamber 15.
[0045] For example, the top opening of the cylinder 10 is covered with a top cover 18.
[0046] In this embodiment, the top cover 18 is rotatably mounted on the top opening of the cylinder 10 via a threaded structure, which facilitates opening the top cover 18 to add powder into the cylinder 10.
[0047] For example, an inner cylinder 19 is detachably inserted into the receiving cavity 13, and the bottom of the inner cylinder 19 is supported on the partition 20.
[0048] In this embodiment of the application, the bottom of the inner cylinder 19 is supported on the partition 20, so that it can be pulled out or inserted into the receiving cavity 13 as needed.
[0049] For example, the top cover 18 is hinged to the top opening of the cylinder 10.
[0050] In this embodiment of the application, the top cover 18 and the top opening edge of the cylinder 10 are hinged together.
[0051] For example, the top cover 18 is provided with a grip portion 110.
[0052] In this embodiment, the grip portion 110 is a protruding post, which facilitates the rotation and operation of the top cover 18.
[0053] The following is a further analysis of the auxiliary powder dispersion device for this atomic layer deposition equipment:
[0054] 1. Design of partition section
[0055] Through holes: Through holes are provided on the partition 20, which allow gas to pass through the electric field application cavity 14 and enter the heating reaction cavity 15. This is the key channel for realizing the effective reaction of powder and gas in the heating reaction cavity.
[0056] Groove and partition fixing: The groove 16 on the inner wall of the cylinder 10 is designed to fasten the edge of the partition 20. This design not only ensures the stability of the partition, but also facilitates the disassembly of the partition for cleaning or replacement.
[0057] Filter function: The separator 20 adopts a filter design, with its edges fixed in the groove 16. The filter not only allows gas to pass through, but also effectively prevents powder from flowing back from the heating reaction chamber 15 to the electric field application chamber 14, maintaining the independence and cleanliness of the two chambers.
[0058] 2. Cylinder design
[0059] Bosses and Fixing: Bosses 17 on the outer wall surface of the cylinder 10 are designed to fit and be installed with external structures (such as fixing slots) to stably fix the cylinder. This design ensures the stability and safety of the equipment during operation.
[0060] The combination of groove and boss: On the same part of the side wall of the cylinder 10, the inner surface is recessed inward to form a groove 16, and the outer surface protrudes outward to form a boss 17. This design makes full use of the space of the cylinder, satisfying both the need for fixing the partition and providing a connection point with the external structure.
[0061] Top cover design: The top opening of the cylinder 10 is provided with a top cover 18, which is rotatably mounted on the cylinder via a threaded structure. This design facilitates opening the top cover to add powder into the cylinder, while also ensuring the stability and sealing of the top cover.
[0062] Hinged Top Cover: In another design, the top cover 18 is hinged to the top opening edge of the cylinder 10 via a hinge. This design makes opening and closing the top cover more convenient while maintaining the overall integrity and aesthetics of the equipment.
[0063] Grip: A grip 110, such as a protrusion, is provided on the top cover 18 to facilitate rotation and operation of the top cover. This design improves the ease of use and user-friendliness of the device.
[0064] 3. Inner cylinder design
[0065] Removable inner cylinder: An inner cylinder 19 is removably inserted into the receiving cavity 13, with its bottom supported on the partition 20. This design allows the inner cylinder to be pulled out or inserted into the receiving cavity as needed, facilitating cleaning, replacement, or adjustment of the powder loading.
[0066] This atomic layer deposition (ALD) equipment-assisted powder dispersion device achieves uniform powder dispersion, effective gas introduction, stable equipment fixation, and convenient operation through ingenious partition, cylinder, top cover, and inner cylinder designs. These design features not only improve the equipment's reaction efficiency and product consistency but also reduce operational difficulty and maintenance costs, providing strong support for the application of ALD technology. The ALD equipment-assisted powder dispersion device provided in this application utilizes electrostatic assisted dispersion technology, enabling more uniform dispersion of powder samples, reducing agglomeration, thereby increasing the contact area between powder and gas and enhancing reaction efficiency. The dual-chamber design makes sampling more direct and convenient, avoiding powder residue in the reaction chambers, reducing the risk of cross-contamination, and improving equipment cleanliness and product consistency. The dual-chamber structure allows for the movement of the reaction chambers, improving operational flexibility and enabling adjustments to the working status of each chamber as needed, thus optimizing the production process.
[0067] It should be noted that in this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are mainly for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.
[0068] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.
[0069] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.
[0070] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.
[0071] The above description is merely a specific embodiment of the present invention, enabling those skilled in the art to understand or implement the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.
Claims
1. An auxiliary powder dispersion device for atomic layer deposition equipment, characterized in that, include: A cylindrical body, wherein an outlet is provided on the side wall of the cylindrical body, an inlet is provided on the bottom wall of the cylindrical body, and a receiving cavity is provided inside the cylindrical body, wherein the receiving cavity is connected to the outlet and the inlet respectively; A partition is provided within the receiving cavity, dividing the receiving cavity into an electric field application cavity and a heating reaction cavity. The electric field application cavity is connected to the inlet, the electric field application cavity is connected to the outlet, and the electric field application cavity is connected to the heating reaction cavity.
2. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 1, characterized in that, The partition is provided with a through hole, and the electric field application cavity and the heating reaction cavity are connected through the through hole.
3. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 1, characterized in that, The inner wall of the cylinder is provided with a groove, and the edge of the partition is inserted into the groove.
4. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 3, characterized in that, The outer wall surface of the cylinder protrudes outward to form a boss.
5. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 4, characterized in that, The outer surface of the sidewall of the cylinder protrudes outward to form the boss, and the inner surface of the sidewall is recessed inward to form the groove.
6. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 1, characterized in that, The partition is a filter screen, and the edge of the filter screen is connected to the inner wall of the receiving cavity.
7. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 1, characterized in that, The top opening of the cylinder is covered with a top cover.
8. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 7, characterized in that, An inner cylinder is detachably inserted into the receiving cavity, and the bottom of the inner cylinder is supported on the partition.
9. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 7, characterized in that, The top cover is hinged to the top opening of the cylinder.
10. The auxiliary powder dispersion device for atomic layer deposition equipment according to claim 7, characterized in that, The top cover is provided with a gripping part.