Wafer cleaning machine

Abstract

The utility model relates to a wafer cleaning machine. Comprising a box body, two water washing tanks, two acid washing tanks and two vibration cleaning structures, in the structure, feeding and discharging of flower baskets are achieved through a channel in the box body, a feeding station and a discharging station do not need to be arranged in the box body, the inner space of the box body can be saved, in addition, the two water washing tanks and the two acid washing tanks are distributed in a rectangular shape, and the space of the box body is saved. The adjacent washing tanks and pickling tanks form a cleaning line, compared with the prior art, the space occupation amount of the box body is further reduced, two vibration cleaning structures are arranged in the structure, a transferring structure is omitted, transferring time consumption is avoided, the number of the vibration cleaning structures assembled in the box body is reduced, and the production efficiency is improved. The cost of the cleaning machine can be reduced, meanwhile, the cleaning yield is increased, and then the market competitiveness of the cleaning machine is achieved. The lifting motor is additionally provided with the belt pulley and the belt, has good flexibility, can buffer slipping during impact and overload to prevent other parts from being damaged, and is simple in structure and low in cost.

Description

Technical Field

[0001] This utility model relates to the field of wafer processing technology, and in particular to a wafer cleaning machine. Background Technology

[0002] A wafer is a silicon wafer used to manufacture silicon semiconductor integrated circuits. Because of its circular shape, it is called a wafer. Various circuit element structures can be fabricated on silicon wafers to become IC products with specific electrical functions. The raw material of a wafer is silicon, while there is an inexhaustible supply of silicon dioxide on the surface of the earth's crust. Silica ore is refined in an electric arc furnace, chlorinated with hydrochloric acid, and distilled to produce high-purity polycrystalline silicon.

[0003] An existing wafer cleaning machine includes a long, narrow box with a loading station and a unloading station on both sides inside the box. Four cleaning stations are arranged in a straight line between the loading and unloading stations. Each cleaning station is equipped with an oscillating cleaning structure. This results in a large overall space occupation for the cleaning machine and a large number of oscillating cleaning structures. In addition, the wafers need to be transferred from the loading station to multiple cleaning stations for cleaning and then transferred to the unloading station for unloading using a transfer mechanism. The whole process is time-consuming, resulting in low wafer cleaning capacity. Utility Model Content

[0004] The technical problem to be solved by this utility model is to provide a wafer cleaning machine.

[0005] To solve the above-mentioned technical problems, the technical solution of this utility model is: a wafer cleaning machine, the innovation of which lies in: including

[0006] A box body, the box body is hollow inside, and a channel is provided in the middle of the front side of the box body to connect the inside of the box body. The channel is used for loading and unloading of baskets containing wafers.

[0007] Two water washing tanks are arranged adjacent to each other inside the front side of the box near the passage.

[0008] Two pickling tanks are arranged adjacent to each other inside the housing, located behind the two washing tanks; the two washing tanks and the two pickling tanks are arranged in a rectangular pattern, and the adjacent washing tanks and pickling tanks form a cleaning line.

[0009] The two oscillation cleaning structures are arranged on the top of the box body and correspond to the two cleaning lines respectively, and are vertically above the pickling tank and the water washing tank, the bottom side of the oscillation cleaning structure is provided with a carrier, and the top of the oscillation cleaning structure is provided with a rotating piece, the carrier of the oscillation cleaning structure is rotated to be vertically above the pickling tank or the water washing tank through the rotating piece, and the oscillation cleaning structure is further provided with a lifting piece, and the flower basket is lifted or lowered through the lifting piece.

[0010] Further, the oscillation cleaning structure comprises a lifting shaft, a lead screw and a support frame.

[0011] The lifting shaft and the lead screw are vertically arranged, the support frame comprises a back-shaped frame arranged vertically, and the lead screw is arranged in the middle of the support frame.

[0012] The lifting motor is vertically arranged outside the support frame, the output end of the lifting motor is vertically upwardly arranged and connected with the lead screw, the middle of the lifting shaft is connected with the lead screw through a connecting plate, and the carrier is arranged on the bottom side of the lifting shaft.

[0013] Further, the rotating piece comprises a servo motor, the servo motor is installed on the connecting plate through a mounting seat and is vertically above the lifting shaft, the bottom output end of the servo motor is connected with the top of the lifting shaft, and the lifting shaft is driven to rotate through the servo motor.

[0014] Further, the top of the lead screw extends out of the support frame and is provided with a second belt pulley, the output shaft of the lifting motor is vertically upwardly arranged and is provided with a first belt pulley, and a belt is arranged between the first belt pulley and the second belt pulley. The lifting motor is provided with a belt pulley and a belt, which has good flexibility, can moderate impact, absorb vibration, prevent damage to other parts when slipping under overload, and has the advantages of simple structure and low cost.

[0015] Further, vertical guide rails are arranged on both sides of the lead screw in the support frame, linear sliding blocks are arranged on the vertical guide rails, ball nuts are arranged on the lead screw, a connecting plate is fixedly arranged on the ball nuts, and the connecting plate is connected with the linear sliding blocks through the connecting plate.

[0016] The oscillation cleaning structure has the advantages that:

[0017] In this structure, the loading and unloading of flower baskets are achieved through channels on the box, eliminating the need for loading and unloading stations inside the box and saving internal space. In addition, the two water washing tanks and two acid washing tanks are arranged in a rectangular pattern, and adjacent water washing tanks and acid washing tanks form a cleaning line, which further reduces the space occupied by the box compared with the prior art. Moreover, this structure is equipped with two vibration cleaning structures inside, eliminating the need for a transfer structure, avoiding transfer time, and reducing the number of vibration cleaning structures assembled inside the box. This can reduce the cost of this cleaning machine while increasing cleaning output, thereby realizing the market competitiveness of this patent.

[0018] In this structure, the lifting motor is equipped with pulleys and belts, which have good flexibility, can mitigate impacts, absorb vibrations, and slip under overload to prevent damage to other components. The structure is simple and inexpensive.

[0019] A vertical guide rail and a linear slider are also provided between the lifting shaft and the support frame, which further improves the stability of the lifting shaft during the lifting process. Attached Figure Description

[0020] Figure 1 The three-dimensional representation of this utility model Figure 1 .

[0021] Figure 2 The three-dimensional representation of this utility model Figure 2 .

[0022] Figure 3 This is a partial structural schematic diagram of the present invention.

[0023] Figure 4 This is a CC cross-sectional view of the present invention.

[0024] Figure 5 This is a partial three-dimensional view of the structure of this utility model. Detailed Implementation

[0025] To further illustrate the technical means and effects adopted by this utility model in order to achieve the intended utility model purpose, the following detailed description of the specific implementation methods, structure, features and effects of this utility model is provided in conjunction with the accompanying drawings and preferred embodiments.

[0026] like Figures 1-5 The wafer cleaning machine shown includes a housing 1, two water washing tanks 2, two acid washing tanks 3, and two oscillating cleaning structures 4.

[0027] The box 1 is a rectangular box structure with a hollow interior. A channel 13 is provided in the middle of its front side, which connects to the interior of the box 1. The channel 13 is used for loading and unloading the basket 5 containing the wafers.

[0028] Two water washing tanks 2 are arranged adjacent to each other at the front side of the box body 1 near the passage 13.

[0029] Two acid washing tanks 3 are arranged adjacent to each other at the rear side of the two water washing tanks 2 in the box body 1. Then, the two water washing tanks 2 and the two acid washing tanks 3 are distributed in a rectangular shape, and the adjacent water washing tank 2 and acid washing tank 3 form a cleaning line.

[0030] Two shock cleaning structures 4 are arranged on the top of the box body 1 and correspond to the two cleaning lines respectively, and the shock cleaning structure 4 is vertically above the acid washing tank 3 and the water washing tank 2, one side of the bottom of the shock cleaning structure 4 is provided with a carrier, and the top of the shock cleaning structure 4 is provided with a rotating piece 45, which rotates the carrier of the shock cleaning structure 4 to be vertically above the acid washing tank 3 or the water washing tank 2, and the shock cleaning structure 4 is further provided with a lifting piece 44, which lifts or lowers the flower basket 5.

[0031] The shock cleaning structure 4 comprises a lifting shaft 41, a lead screw 42 and a support frame 43. The lifting piece 44 comprises a lifting motor.

[0032] The lifting shaft 41 and the lead screw 42 are vertically arranged, the support frame 43 comprises a vertically arranged back-shaped frame, a back plate 46 is further arranged on the inner wall of the back-shaped frame, and the lead screw 42 is arranged in the middle part of the support frame 43.

[0033] The lifting motor is vertically arranged outside the support frame 43, the output end thereof is vertically upwardly arranged and connected with the lead screw 42, the lifting shaft 41 is connected with a bottom plate 15 and a mounting plate 47 which are vertically arranged through a support seat 14 at the middle position of the lifting shaft 41, the mounting plate 47 is connected with the lead screw 42, and the carrier is arranged at the bottom side of the lifting shaft 41.

[0034] The rotating piece 45 comprises a servo motor which is installed on the mounting plate 47 through a transversely arranged mounting seat 48 and is above the lifting shaft 41, the bottom output end of the servo motor is connected with the top of the lifting shaft 41, and the lifting shaft 41 is driven to rotate through the servo motor.

[0035] The top of the lead screw 42 extends out of the support frame 43 and is provided with a second belt pulley 12, the output shaft of the lifting motor is vertically upwardly arranged and provided with a first belt pulley 11, and a belt is arranged between the first belt pulley 11 and the second belt pulley 12. Through the lifting motor, the belt pulley and the belt are added, which have good flexibility, can moderate impact, absorb vibration, prevent damage to other parts when slipping under overload, and have simple structure and low cost.

[0036] The vertical guide rails 49 are provided with linear sliding blocks 10, the lead screw 42 is provided with a ball nut, a connecting plate 9 is fixedly installed on the ball nut, the connecting plate 9 is connected with the linear sliding blocks 10, the other side of the connecting plate 9 is fixedly provided with the mounting plate 47, and the stability of the lifting shaft 41 in the lifting process is further improved.

[0037] The working principle of the patent is as follows:

[0038] In the structure, the feeding and discharging of the flower basket 5 are realized through the channel 13 on the box body 1, and the feeding station and the discharging station do not need to be arranged in the box body 1, so that the space in the box body 1 can be saved. In addition, the two water washing tanks 2 and the two pickling tanks 3 are distributed in a rectangular shape, and adjacent water washing tanks 2 and pickling tanks 3 form a cleaning line. When the flower basket 5 is placed on the carrier of the oscillation cleaning structure 4, the lifting shaft 41 is driven to rotate to the top of the pickling tank by the servo motor, and then the flower basket is lifted to realize the oscillation cleaning of the wafer by the lifting motor. The oscillation cleaning of the wafer can also be realized by driving the lifting shaft 41 to rotate to the top of the water washing tank by the servo motor, and then lifting the flower basket by the lifting motor. After the end, the flower basket can be taken out from the channel 13 and the next flower basket is placed. Compared with the prior art, the space occupation of the box body 1 is further reduced, and the two oscillation cleaning structures 4 are arranged in the structure. The transfer structure is omitted, the transfer time is avoided, the number of oscillation cleaning structures 4 arranged in the box body 1 is reduced, the cost of the cleaning machine is reduced, the cleaning yield is improved, and the market competitiveness of the patent is realized.

[0039] The above is only a preferred embodiment of the present application, and does not limit the present application in any form. Although the present application has been disclosed as above, it is not intended to limit the present application. Any person skilled in the art can make some changes or modifications to the above disclosed technical content to obtain equivalent embodiments with equivalent changes, without departing from the technical solution of the present application. Any modification, equivalent change and modification of the above embodiments, which does not depart from the technical solution of the present application, is still within the scope of the technical solution of the present application.

Claims

1. A wafer cleaning machine, characterized in that: include A box body, the box body is hollow inside, and a channel is provided in the middle of the front side of the box body to connect the inside of the box body. The channel is used for loading and unloading of baskets containing wafers. Two water washing tanks are arranged adjacent to each other inside the front side of the box near the passage. Two pickling tanks are arranged adjacent to each other inside the housing, located behind the two washing tanks; the two washing tanks and the two pickling tanks are arranged in a rectangular pattern, and the adjacent washing tanks and pickling tanks form a cleaning line. The system includes two oscillating cleaning structures located on the top of the housing, each corresponding to one of the two cleaning lines. These structures are positioned vertically above the pickling tank and the washing tank. Each oscillating cleaning structure has a carrier on one side of its bottom and a rotating component on its top. This rotating component allows the carrier to be rotated vertically above either the pickling tank or the washing tank. A lifting component is also provided on each oscillating cleaning structure to raise or lower the flower basket.

2. The wafer cleaning machine according to claim 1, characterized in that: The vibration cleaning structure includes a lifting shaft, a guide screw, and a support frame; the lifting component includes a lifting motor. The lifting shaft and guide screw are vertically arranged, and the support frame includes a vertically arranged return frame, with the guide screw located in the middle of the support frame; The lifting motor is vertically mounted on the outside of the support frame, with its output end vertically upward and connected to the guide screw. The middle part of the lifting shaft is connected to the guide screw through a connecting plate, and the carrier is mounted on the bottom side of the lifting shaft.

3. A wafer cleaning machine according to claim 2, characterized in that: The rotating component includes a servo motor, which is mounted on the connecting plate via a mounting base and positioned above the lifting shaft. The bottom output end of the servo motor is connected to the top of the lifting shaft, and the servo motor drives the lifting shaft to rotate.

4. A wafer cleaning machine according to claim 2, characterized in that: The top of the guide screw extends out of the support frame and is equipped with a second pulley. The output shaft of the lifting motor is vertically upward and is equipped with a first pulley. A belt is provided between the first pulley and the second pulley.

5. A wafer cleaning machine according to claim 2, characterized in that: The support frame is further provided with vertical guide rails on both sides of the lead screw, and a linear slider is provided on the vertical guide rail. A ball nut is installed on the lead screw, and a connecting plate is fixedly installed on the ball nut. The connecting plate is connected to the linear slider through the connecting plate.

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