Quartz surface fine acid etching treatment device
By using a multi-mode immersion etching structure and an auxiliary oscillating immersion etching component, the problem of the single acid etching treatment in existing equipment has been solved, enabling refined processing of quartz raw materials and improving production efficiency and quality.
Patent Information
- Application Number
- CN202520301817.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-25
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2035-02-25
AI Technical Summary
Existing acid etching equipment for quartz materials has a single acid etching and immersion mode, which cannot achieve fine and detailed processing. As a result, multiple repeated processing is required when processing high-precision quartz materials, resulting in low production efficiency and poor results.
It adopts a multi-mode immersion etching structure and auxiliary oscillating immersion components, including a reciprocating power rotor, sliding column plugging, displacement turntable, electric telescopic column, etc., to realize the all-round and flexible treatment of quartz raw materials in the etching solution. Combined with the transverse stirring function of the etching solution, it can meet diverse etching needs.
It achieves refined acid etching treatment of quartz raw materials, improves processing efficiency and quality, ensures that each raw material is uniformly and deeply etched by acid, and meets the industry demand for high-quality quartz sand.
Smart Images
Figure CN223837296U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the technical field of quartz processing auxiliary equipment, specifically a device for fine acid etching treatment of quartz surface. Background Technology
[0002] Quartz is one of the major rock-forming minerals, generally referring to low-temperature quartz (α-quartz), which is the most widely distributed mineral in the quartz group. In a broader sense, quartz also includes high-temperature quartz (β-quartz) and coesite, etc. Quartz is one of the most widely distributed minerals, and its raw material, quartz blocks, is also known as silica, primarily used to produce quartz sand (also called silica sand), as well as quartz refractories and ferrosilicon. The main purpose of fine acid etching treatment (usually referred to as pickling) on the surface of quartz is to remove impurities to improve its purity and quality. However, quartz sand may contain iron oxides and other oxide impurities, which can affect its purity and stability. Qualitatively, through acid etching, the acid reacts with these oxides to form soluble salts, thereby removing these impurities from the quartz sand. Furthermore, the surface of quartz sand may be covered with impurities such as yellow patina, water stains, and organic pigments. These impurities not only affect the aesthetics of the quartz sand but may also pose health and environmental hazards. Acid etching can effectively remove these surface contaminants, improving the safety and environmental friendliness of the quartz sand. In certain industries, such as electronics and optics, the purity requirements for quartz sand are extremely high. Acid etching ensures that the stability, transparency, and hardness of the quartz sand are not affected by impurities, thus meeting the requirements of these industries. The industry demands high-quality quartz sand, and acid etching can remove harmful elements from the quartz crystal system, such as lead, chromium, and mercury. These harmful elements can negatively impact the performance of quartz sand. Removing these harmful elements can further improve the quality and stability of quartz sand. Acid etching is a crucial step in quartz sand processing, typically used to remove impurities and improve the purity and quality of quartz sand. In conclusion, quartz is an important mineral resource, and its refined surface acid etching is a key step in improving its purity and quality. Through acid etching, impurities and harmful elements in quartz can be removed. The elements ensure that the stability and performance of quartz are not affected, thereby meeting the demand for high-quality quartz in different industries. Currently, the equipment for acid etching of quartz materials on the market generally suffers from a relatively simple acid etching and washing mode, which cannot meet the requirements for fine and detailed washing of quartz raw materials. This leads to the need for multiple repeated acid etching processes when processing high-precision quartz materials, which not only greatly reduces production efficiency, but also often results in unsatisfactory final treatment results. There may be existing technical solutions to the above problems, but this case aims to provide an alternative or replacement technical solution. Utility Model Content
[0003] To achieve the above objectives, this utility model is implemented through the following technical solution: a device for fine acid etching treatment of quartz surface, comprising: a device housing, a bottom support housing and a motor protective housing, wherein the bottom support housing is installed inside the device housing, the motor protective housing is installed inside the device housing, a multi-mode immersion acid etching structure is installed inside the device housing, and an auxiliary vibration immersion component is installed on the bottom support housing;
[0004] The multi-mode immersion acid etching structure includes: a reciprocating power rotor, a sliding column plug, a displacement turntable, satellite columns on the turntable, a drive slide frame, a pair of electric telescopic columns, a structural support platform, a pair of connecting extension columns, a pair of guiding auxiliary columns, a housing cage, a liquid injection channel, and a liquid outlet channel.
[0005] The reciprocating power rotor is installed inside the motor protective housing, which is installed on the structural support platform. The sliding column plug is installed on the satellite column on the disk and is movably connected to the drive slide frame. The displacement turntable is connected to the reciprocating power rotor via a rotating shaft. A limiting slot is provided on the drive slide frame. The satellite column on the disk is installed on the displacement turntable and is inserted into the drive slide frame through the limiting slot. The drive slide frame is connected to a pair of connecting extension columns. A pair of electric telescopic columns are installed inside the device housing and are connected to the structural support platform. A pair of connecting extension columns are connected to a pair of guide auxiliary columns. A pair of limiting coupling slots are provided on the inner side of the device housing. A pair of guide auxiliary columns are movably inserted into the device housing through the pair of limiting coupling slots. The receiving mesh box is connected to a pair of connecting extension columns. The liquid injection channel is installed on the device housing. The liquid outlet channel is installed on the device housing.
[0006] It should be noted that, as described above, the quartz raw material to be acid-etched is placed in the carrier cage inside the device housing. Acid etching solution is injected through the injection channel to the designated level. A pair of electric telescopic columns are driven to extend and retract, so that the carrier cage is directly immersed in the acid etching solution for soaking. Alternatively, the reciprocating power rotor inside the protective housing can be driven by the motor, thereby moving the displacement turntable and the satellite column on it. This causes the drive slide frame to continuously rise or fall, thereby driving the connecting extension column and the guide auxiliary column in tandem, which in turn causes the carrier cage to continuously rise and fall. At this state, the carrier cage and the quartz raw material inside can continuously oscillate up and down in the acid etching solution. If the electric telescopic columns are operated to raise the structural support platform to its highest point, and then the reciprocating power rotor is operated, the state of the quartz raw material can be continuously switched between being in the acid etching solution and being detached from the liquid surface. After the acid etching is completed, the acid etching solution can be released through the outlet channel.
[0007] Preferably, the auxiliary oscillation immersion assembly includes: an internal support block, several disturbance plates, an auxiliary slide key, a reset reciprocating spring, an actuating magnet, and a driving electromagnet.
[0008] The inner support block is installed inside the bottom support housing. The bottom support housing has an extension slot. Several disturbance plates are respectively inserted into the bottom support housing through the extension slot, and several disturbance plates are respectively installed on the inner support block. The reset reciprocating spring is installed inside the bottom support housing and is connected to the inner support block. The auxiliary sliding key is installed on the inner support block. The bottom support housing has a fitting guide groove. The auxiliary sliding key is inserted into the bottom support housing through the fitting guide groove. The actuating magnet is installed on the inner support block. The driving electromagnet is installed inside the bottom support housing.
[0009] It should be noted that, as described above, when the cage is immersed in the etching solution inside the device housing, the driving electromagnet generates a magnetic field opposite to that of the activating magnet, which in turn pushes the activating magnet. This causes the bearing block inside the housing to slide within the bottom housing via an auxiliary sliding key, resulting in multiple disturbance plates moving accordingly. At this time, the reset reciprocating spring is pushed and compressed, causing the driving electromagnet to reverse the magnetic field. The reset reciprocating spring then returns to its original elastic deformation, resetting the bearing block inside the housing back into place within the bottom housing. This process is repeated, causing the multiple disturbance plates to continuously agitate the etching solution inside the device housing, thereby rinsing and etching the quartz raw material inside the cage. The anti-wear gaskets on the sliding block seal reduce wear and increase lubrication when the sliding block seal contacts the driving sliding frame, thus extending its service life. The injection valve on the injection channel and the outlet valve on the outlet channel facilitate the addition and rapid release of the etching solution.
[0010] Preferably, the sliding block is provided with an anti-wear gasket;
[0011] Preferably, the motor protective housing is provided with a maintenance and inspection port;
[0012] Preferably, an injection valve is provided on the injection channel;
[0013] Preferably, the liquid outlet channel is equipped with a liquid outlet valve. Beneficial effects
[0014] This invention provides a device for fine acid etching treatment of quartz surfaces. Compared with existing technologies, this refined acid etching device for quartz surfaces offers the following advantages: It innovatively employs a multi-mode immersion etching structure, cleverly achieving comprehensive and flexible acid etching treatment of quartz raw materials placed in a cage. It not only allows the quartz raw material to be fully immersed in the etching solution, enjoying a thorough chemical reaction, but also enables reciprocating immersion and partial immersion, thus meeting diverse acid etching needs. Furthermore, the device allows users to precisely control the immersion time of the quartz raw material in the etching solution according to actual needs, and even achieves up-and-down oscillating motion of the material within the liquid, further enriching the possibilities of acid etching treatment. In addition, with a carefully designed auxiliary oscillating immersion component, the etching solution at the bottom of the device is given a lateral reciprocating stirring function. This design not only enhances the fluidity of the etching solution but also effectively assists in rinsing the immersed quartz raw material, ensuring that each piece of material receives uniform and deep acid etching. As a result, the acid etching treatment of quartz raw materials becomes more refined, achieving a dual improvement in quality and efficiency. Attached Figure Description
[0015] Figure 1 This is a schematic diagram of the main cross-sectional structure of the quartz surface fine acid etching treatment device of this utility model.
[0016] Figure 2 This is a partial side view of the quartz surface fine acid etching treatment device of the present invention.
[0017] Figure 3 for Figure 1 A magnified view of the letter "A" in the diagram.
[0018] Figure 4 for Figure 1 A magnified view of a portion of the letter "B".
[0019] In the diagram: 1. Device housing; 2. Bottom support housing; 3. Motor protective housing; 4. Reciprocating power rotor; 5. Sliding column plug; 6. Positioning turntable; 7. Satellite column on the turntable; 8. Drive slide frame; 9. Electric telescopic column; 10. Structural support platform; 11. Connecting extension column; 12. Guide auxiliary column; 13. Loading cage; 14. Liquid injection channel; 15. Liquid discharge channel; 16. Inner support block; 17. Disturbance plate; 18. Auxiliary sliding key; 19. Reset reciprocating spring; 20. Actuating magnet; 21. Driving electromagnet. Detailed Implementation
[0020] Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.
[0021] Those skilled in the art should connect all electrical components and their compatible power supplies in this case via wires. Appropriate controllers and encoders should be selected according to the actual situation to meet control requirements. The specific connection and control sequence should refer to the working principle described below, where the electrical components are connected in sequence. The detailed connection methods are well-known in the art. The following mainly introduces the working principle and process, and will not describe the electrical control further. Example
[0022] The present invention will now be described in detail with reference to the accompanying drawings, such as... Figure 1-4As shown, a device for fine acid etching treatment of quartz surfaces includes: a device housing 1, a bottom support housing 2, and a motor protective housing 3. The bottom support housing 2 is installed inside the device housing 1, and the motor protective housing 3 is installed inside the device housing 1. A multi-mode immersion acid etching structure is installed inside the device housing 1, and an auxiliary oscillating immersion assembly is installed on the bottom support housing 2. The multi-mode immersion acid etching structure includes: a reciprocating power rotor 4, a sliding column plug 5, a displacement turntable 6, a satellite column on the turntable 7, a drive sliding frame 8, a pair of electric telescopic columns 9, a structural support platform 10, a pair of connecting extension columns 11, a pair of guide auxiliary columns 12, a supporting mesh box 13, a liquid injection channel 14, and a liquid outlet channel 15. The reciprocating power rotor 4... The rotor 4 is installed inside the motor protective housing 3, which is mounted on the structural support platform 10. The sliding column plug 5 is installed on the satellite column 7 on the disk, and the sliding column plug 5 is movably connected to the drive slide frame 8. The displacement turntable 6 is connected to the reciprocating power rotor 4 via a rotating shaft. A limiting slot is provided on the drive slide frame 8. The satellite column 7 on the disk is installed on the displacement turntable 6 and is inserted into the drive slide frame 8 through the limiting slot. The drive slide frame 8 is connected to a pair of connecting extension columns 11. A pair of electric telescopic columns 9 are installed inside the device housing 1, and the pair of electric telescopic columns 9 are connected to the structural support platform 10. A pair of connecting extension columns 11 are respectively connected to a pair of guiding auxiliary columns 12. A pair of limiting coupling grooves are respectively opened on the inner side of the device housing 1. The pair of guiding auxiliary columns 12 are respectively movably inserted into the device housing 1 through the pair of limiting coupling grooves. The receiving mesh box 13 is respectively connected to a pair of connecting extension columns 11. The liquid injection channel 14 is installed on the device housing 1. The liquid outlet channel 15 is installed on the device housing 1. The auxiliary vibration immersion assembly includes: an inner support block 16, several disturbance plates 17, an auxiliary sliding key 18, a reset reciprocating spring 19, an actuating magnet 20, and a driving electromagnet 21. The inner support block 16 is installed inside the bottom support housing 2 of the tank. An extension slot is provided on the bottom support housing 2. Several disturbance plates 17 are respectively inserted into the bottom support housing 2 through the extension slot, and several disturbance plates 17 are respectively installed on the inner support block 16. The reset reciprocating spring 19 is installed in the bottom support housing 2 and is connected to the inner support block 16. The auxiliary slide key 18 is installed on the inner support block 16. A fitting guide groove is provided in the bottom support housing 2. The auxiliary slide key 18 is inserted into the bottom support housing 2 through the fitting guide groove. The actuating magnet 20 is installed on the inner support block 16. The driving electromagnet 21 is installed in the bottom support housing 2.
[0023] According to the appendix Figure 1-4 The process involves placing the quartz raw material requiring acid etching into the mounting cage 13 within the device housing 1. Acid etching solution is injected through the injection channel 14 to the designated level. A pair of electric telescopic columns 9 are then driven to extend and retract, immersing the mounting cage 13 directly in the acid etching solution. Alternatively, the reciprocating rotor 4 within the motor-driven protective housing 3 can be activated, causing the displacement turntable 6 and its satellite columns 7 to move. This, in turn, causes the drive slide frame 8 to repeatedly rise and fall, coordinating the connecting extension column 11 and the guide auxiliary column 12, further raising and lowering the mounting cage 13. In this state, the mounting cage 13 and the quartz raw material within it continuously oscillate within the acid etching solution. If the electric telescopic columns 9 raise the structural support platform 10 to its highest point, and the reciprocating rotor 4 is then operated, the quartz raw material can continuously switch between being in the acid etching solution and being detached from the liquid surface. After etching is complete, the acid etching solution can be discharged through the outlet channel 15. When the 13 is immersed in the acid etching solution inside the device housing 1, the driving electromagnet 21 generates a magnetic field opposite to that of the activating magnet 20, thereby pushing the activating magnet 20. This causes the housing support block 16 to slide within the bottom support housing 2 via the auxiliary sliding key 18, causing multiple disturbance plates 17 to move accordingly. At this time, the reset reciprocating spring 19 is pushed and compressed. The driving electromagnet 21 reverses the magnetic field, and the reset reciprocating spring 19 restores its original elastic deformation, causing the housing support block 16 to reposition itself within the housing. The bottom support housing 2 is reset, and this operation is repeated, which will cause multiple disturbance plates 17 to continuously stir the acid etching solution in the device housing 1, thereby flushing and etching the quartz raw material in the cage 13. The anti-wear gaskets provided on the sliding column plug 5 can reduce wear and increase lubrication when the sliding column plug 5 contacts the drive sliding frame 8, thereby extending its service life. The injection valve provided on the injection channel 14 and the discharge valve provided on the discharge channel 15 can facilitate the injection and rapid release of the acid etching solution.
[0024] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A device for fine acid etching treatment of quartz surface, comprising: The device housing (1), the bottom support housing (2) and the motor protective housing (3) are characterized in that the bottom support housing (2) is installed inside the device housing (1), the motor protective housing (3) is installed inside the device housing (1), a multi-mode immersion acid etching structure is installed inside the device housing (1), and an auxiliary vibration immersion assembly is installed on the bottom support housing (2). The multi-mode immersion acid etching structure includes: a reciprocating power rotor (4), a sliding column plug (5), a displacement turntable (6), a satellite column on the turntable (7), a drive slide frame (8), a pair of electric telescopic columns (9), a structural support platform (10), a pair of connecting extension columns (11), a pair of guide auxiliary columns (12), a housing cage (13), an injection channel (14), and an outlet channel (15). The reciprocating rotor (4) is installed inside the motor protective housing (3), which is mounted on the structural support platform (10). The sliding block (5) is installed on the satellite column (7) on the disk, and the sliding block (5) is movably connected to the drive slide frame (8). The displacement turntable (6) is connected to the reciprocating rotor (4) via a rotating shaft. A limiting slot is provided on the drive slide frame (8). The satellite column (7) on the disk is mounted on the displacement turntable (6), and the satellite column (7) on the disk is inserted into the drive slide frame (8) via the limiting slot. The drive slide frame (8) is connected to a pair of connecting extension columns (11) respectively. The electric telescopic columns (9) are respectively installed inside the device housing (1), and a pair of electric telescopic columns (9) are respectively connected to the structural support platform (10). A pair of connecting extension columns (11) are respectively connected to a pair of guiding auxiliary columns (12). A pair of limiting coupling grooves are respectively opened on the inner side of the device housing (1). A pair of guiding auxiliary columns (12) are respectively movably inserted into the device housing (1) through a pair of limiting coupling grooves. The supporting net box (13) is respectively connected to a pair of connecting extension columns (11). The liquid injection channel (14) is installed on the device housing (1). The liquid outlet channel (15) is installed on the device housing (1).
2. The device for fine acid etching treatment of quartz surface according to claim 1, characterized in that, The auxiliary oscillation immersion assembly includes: an inner bearing block (16), several disturbance plates (17), an auxiliary slide key (18), a reset reciprocating spring (19), an actuating magnet (20), and a driving electromagnet (21). The inner support block (16) is installed inside the bottom support housing (2). An extension slot is provided on the bottom support housing (2). Several disturbance plates (17) are respectively inserted into the bottom support housing (2) through the extension slot. Several disturbance plates (17) are respectively installed on the inner support block (16). The reset reciprocating spring (19) is installed inside the bottom support housing (2) and is connected to the inner support block (16). The auxiliary slide key (18) is installed on the inner support block (16). A fitting guide groove is provided inside the bottom support housing (2). The auxiliary slide key (18) is inserted into the bottom support housing (2) through the fitting guide groove. The actuating magnet (20) is installed on the inner support block (16). The driving electromagnet (21) is installed inside the bottom support housing (2).
3. The device for fine acid etching treatment of quartz surface according to claim 2, characterized in that, The sliding block (5) is provided with a wear-resistant gasket.
4. The device for fine acid etching treatment of quartz surface according to claim 3, characterized in that, The motor protective housing (3) is provided with a maintenance and inspection port.
5. The device for fine acid etching treatment of quartz surface according to claim 4, characterized in that, An injection valve is provided on the injection channel (14).
6. The apparatus for fine acid etching treatment of quartz surface according to claim 5, characterized in that, The liquid outlet channel (15) is equipped with a liquid outlet valve.