Semiconductor single crystal furnace

Abstract

The utility model discloses a semiconductor single crystal furnace which comprises a furnace body, a sealing cover is arranged on the furnace body, a pressure relief mechanism is arranged on the sealing cover, the pressure relief mechanism comprises a pressure relief sleeve, a pressure relief hole, a center rod, a sealing sleeve, a sliding hole, a sealing rod, a leakage hole, a pressure applying plate, a sealing ring, a fixing sleeve, a limiting sleeve and a pressure applying spring, and the pressure relief sleeve is installed on the sealing cover. The pressure relief holes are distributed in the top end of the pressure relief sleeve, the center rod is installed in the pressure relief sleeve, the sealing sleeve is installed at the bottom end of the center rod, the sliding holes are distributed in the sealing sleeve, the sealing rod slides in the sliding holes, when the pressure exceeds a set value, the sealing rod can rapidly slide in the sliding holes, and automatic pressure release is achieved through the leakage holes. The larger the pressure is, the higher the release speed is, and the self-adaptive pressure release design not only solves the problem that in the prior art, pressure release is not convenient, but also achieves accurate adjustment in the pressure release process.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor single crystal growth technology, and more specifically, it relates to a semiconductor single crystal furnace. Background Technology

[0002] In the process of semiconductor single crystal growth, the precise control of furnace pressure has a decisive impact on crystal quality. Most single crystal furnaces on the market at present adopt a simple sealing structure and lack an effective pressure regulation device. When the furnace pressure rises abnormally, it cannot release the pressure in time. This not only affects the stability of crystal growth, but may also cause equipment damage or even safety accidents. At the same time, traditional sealing structures are prone to deformation and aging under long-term high temperature environment, which further increases the risk of pressure runaway.

[0003] As the semiconductor industry continues to demand higher crystal quality, precise regulation of furnace pressure has become increasingly important. In the operation of existing single crystal furnaces, once an abnormal pressure occurs, it is often necessary to shut down the machine. This not only reduces production efficiency but may also lead to the scrapping of work-in-process. Especially in continuous production, due to the lack of a rapid-response pressure regulation mechanism, operators find it difficult to deal with the impact of pressure fluctuations in a timely manner, which seriously restricts the improvement of product quality and production efficiency. Utility Model Content

[0004] (a) Technical problems to be solved

[0005] To address the problems existing in the prior art, this utility model provides a semiconductor single crystal furnace to solve the technical problem mentioned in the background art that most single crystal furnaces on the market currently adopt a simple sealing structure and lack an effective pressure regulation device, and cannot release pressure in time when the pressure inside the furnace rises abnormally.

[0006] (II) Technical Solution

[0007] To achieve the above objectives, this utility model provides the following technical solution: a semiconductor single crystal furnace, comprising a furnace body, a cover on the furnace body, and a pressure relief mechanism on the cover. The pressure relief mechanism includes a pressure relief sleeve, pressure relief holes, a central rod, a sealing sleeve, sliding holes, a sealing rod, a leakage hole, a pressure plate, a sealing ring, a fixing sleeve, a limiting sleeve, and a pressure spring. The pressure relief sleeve is installed on the cover. Multiple sets of pressure relief holes are distributed at the top of the pressure relief sleeve. The central rod is installed inside the pressure relief sleeve. The sealing sleeve is installed at the bottom of the central rod. Multiple sets of sliding holes are distributed on the sealing sleeve. The sealing rod slides within the multiple sets of sliding holes. Multiple sets of leakage holes are distributed outside the multiple sets of sliding holes. The pressure plate is located on the top surface of the sealing sleeve. The sealing ring is installed inside the pressure relief sleeve. The fixing sleeve is installed on the inner wall of the pressure relief sleeve. The limiting sleeve is installed inside the fixing sleeve. Multiple sets of pressure springs are provided, with their two ends respectively connected to the pressure plate and the limiting sleeve.

[0008] The present invention is further configured such that a sliding sleeve is installed on the inner side of the pressure plate, and the sliding sleeve is slidably connected to the central rod. The sliding cooperation between the sliding sleeve and the central rod forms a stable guiding structure, ensuring that the pressure plate always maintains coaxial movement during the up and down movement, and avoiding eccentricity and jamming.

[0009] The present invention is further configured such that the pressure plate is provided with limiting rods, and multiple sets of limiting rods are provided, all of which are slidably connected to the limiting sleeve. The sliding movement of the multiple sets of limiting rods in the limiting sleeve forms a reliable guiding system. The evenly distributed arrangement ensures that the pressure plate remains horizontal when under pressure, preventing tilting and deformation.

[0010] The present invention is further configured such that the bottom end of each of the multiple sealing rods is provided with a groove. The design of the bottom groove enables the sealing rod to form a precise correspondence with the leakage hole, providing a reliable seal during normal operation, and quickly opening the channel when pressure relief is required, thereby achieving precise pressure control.

[0011] The present invention is further configured such that the bottom surface of the pressure plate is provided with a rubber ring, and multiple sets of rubber rings are provided and respectively fit with the sealing sleeve and the sealing ring. The multiple sets of rubber rings can adapt to different pressure states through elastic deformation, forming multiple seals between the sealing sleeve and the sealing ring, thereby improving the reliability of the seal.

[0012] The present invention is further configured such that each of the multiple sets of pressure springs is provided with an abutment ring at its bottom end. The abutment ring increases the contact area between the pressure spring and the pressure plate, making the pressure distribution more uniform, and at the same time preventing the pressure spring from shifting during operation.

[0013] The present invention is further configured such that the top surfaces of the sealing sleeve and the sealing ring are provided with annular grooves, and multiple sets of annular grooves respectively engage with multiple sets of rubber rings. The design of the annular grooves provides a stable installation space for the rubber rings, and the engaging structure prevents the rubber rings from falling off, while increasing the sealing area and improving the sealing effect.

[0014] The present invention is further configured such that a flipping mechanism is provided on the outside of the furnace body. The flipping mechanism includes a fixed ring, a connecting plate, a support frame, and a hydraulic cylinder. The fixed ring is located on the outside of the furnace body, the connecting plate is fixedly installed on the outside of the fixed ring, the support frame is rotatably connected to the connecting plate, and the hydraulic cylinder is installed on both sides of the support frame with its telescopic ends rotatably connected to the two sets of connecting plates respectively. This structural design provides stable support through the rigid connection between the fixed ring and the furnace body, the rotatable connection between the connecting plate and the support frame ensures flexible flipping, and the synchronous control of the hydraulic cylinders on both sides achieves smooth and precise position adjustment.

[0015] (III) Beneficial Effects

[0016] Compared with the prior art, the present invention provides a semiconductor single crystal furnace, which has the following beneficial effects:

[0017] 1. The pressure relief mechanism achieves precise pressure control by setting a combination of pressure relief sleeve and sealing sleeve on the cover, combined with the pre-pressure design of the pressure spring. When the pressure inside the furnace is normal, the sealing sleeve and sealing ring form a reliable seal under the action of the pressure plate, and multiple sets of rubber rings embedded in the ring groove further enhance the sealing effect.

[0018] 2. When the pressure exceeds the set value, the sealing rod can slide quickly in the sliding hole, and the pressure is automatically released through the leakage hole. The greater the pressure, the faster the release speed. This adaptive pressure relief design not only solves the problem of inconvenient pressure relief in the existing technology, but also realizes the precise adjustment of the pressure relief process. At the same time, the cooperation between the center rod and the sliding sleeve and the sliding connection between the limit rod and the limit sleeve ensure the stability and reliability of the entire pressure relief process, and prevent possible displacement and jamming during the pressure relief process.

[0019] 3. The flipping mechanism adopts a fixed connection design between the fixed ring and the connecting plate. Through the rotational connection of the support frame and the synchronous control of the hydraulic cylinders on both sides, the precise adjustment of the furnace position is realized. This design not only improves the flexibility of equipment operation, but also ensures the stability of the flipping process through the precise control of the hydraulic cylinders. It effectively avoids the impact and vibration that may be caused by traditional flipping methods, and provides a reliable equipment guarantee for the stable growth of semiconductor single crystals. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of a semiconductor single crystal furnace according to the present invention;

[0021] Figure 2 This is a cross-sectional view of the pressure relief mechanism in this utility model.

[0022] Figure 3 This is a cross-sectional view of the sealing sleeve in this utility model;

[0023] Figure 4 This is a cross-sectional view of the pressure plate and the limiting sleeve in this utility model;

[0024] Figure 5 This is a schematic diagram of the sealing sleeve and sealing ring in this utility model.

[0025] In the diagram: 1. Furnace body; 2. Cover; 3. Pressure relief sleeve; 4. Pressure relief hole; 5. Center rod; 6. Sealing sleeve; 7. Sliding hole; 8. Sealing rod; 9. Leakage hole; 10. Pressure plate; 11. Sealing ring; 12. Fixing sleeve; 13. Limiting sleeve; 14. Pressure spring; 15. Sliding sleeve; 16. Limiting rod; 17. Rubber ring; 18. Abutment ring; 19. Ring groove; 20. Fixing ring; 21. Connecting plate; 22. Support frame; 23. Hydraulic cylinder. Detailed Implementation

[0026] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0027] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0028] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0029] Please see Figures 1-5 A semiconductor single crystal furnace includes a furnace body 1, a cover 2 on the furnace body 1, and a pressure relief mechanism on the cover 2. The pressure relief mechanism includes a pressure relief sleeve 3, pressure relief holes 4, a central rod 5, a sealing sleeve 6, a sliding hole 7, a sealing rod 8, a leakage hole 9, a pressure plate 10, a sealing ring 11, a fixing sleeve 12, a limiting sleeve 13, and a pressure spring 14. The pressure relief sleeve 3 is installed on the cover 2. Multiple sets of pressure relief holes 4 are distributed at the top of the pressure relief sleeve 3. The central rod 5 is installed inside the pressure relief sleeve 3. The sealing sleeve 6 is installed at the bottom of the center rod 5. Multiple sets of sliding holes 7 are distributed on the sealing sleeve 6. The sealing rod 8 slides in the multiple sets of sliding holes 7. Multiple sets of leakage holes 9 are distributed on the outside of the multiple sets of sliding holes 7. The pressure plate 10 is set on the top surface of the sealing sleeve 6. The sealing ring 11 is installed on the inner side of the pressure relief sleeve 3. The fixing sleeve 12 is installed on the inner wall of the pressure relief sleeve 3. The limiting sleeve 13 is installed on the inner side of the fixing sleeve 12. Multiple sets of pressure springs 14 are provided, and their two ends are respectively connected to the pressure plate 10 and the limiting sleeve 13.

[0030] A sliding sleeve 15 is installed on the inner side of the pressure plate 10. The sliding sleeve 15 is slidably connected to the center rod 5. When the pressure plate 10 moves under pressure, the sliding sleeve 15 slides along the outer surface of the center rod 5. This sliding fit ensures that the pressure plate 10 always maintains coaxial movement and prevents eccentricity.

[0031] The pressure plate 10 is provided with a limiting rod 16. There are multiple sets of limiting rods 16, all of which are slidably connected to the limiting sleeve 13. The multiple sets of limiting rods 16 form a uniformly distributed sliding guide within the limiting sleeve 13. When the pressure plate 10 moves up and down, the sliding movement of the limiting rods 16 within the limiting sleeve 13 ensures the stability of the pressure plate 10.

[0032] The bottom of each of the multiple sealing rods 8 is provided with a groove. When the pressure inside the furnace is normal, the groove at the bottom of the sealing rod 8 corresponds precisely to the leakage hole 9 to form a seal. When the pressure exceeds the set value, the sealing rod 8 moves upward so that the groove is offset from the position of the leakage hole 9, forming a pressure relief channel.

[0033] The bottom surface of the pressure plate 10 is provided with rubber rings 17. Multiple sets of rubber rings 17 are provided and are respectively attached to the sealing sleeve 6 and the sealing ring 11. Under pressure, the multiple sets of rubber rings 17 undergo elastic deformation, increasing the contact area with the sealing sleeve 6 and the sealing ring 11, forming multiple sealing barriers.

[0034] Each of the multiple pressure springs 14 has an abutment ring 18 installed at its bottom end. When the pressure spring 14 is compressed, the abutment ring 18 can evenly transmit the elastic force to the pressure plate 10, while preventing the pressure spring 14 from lateral displacement during compression.

[0035] Both the sealing sleeve 6 and the sealing ring 11 have annular grooves 19 on their top surfaces. Multiple sets of annular grooves 19 engage with multiple sets of rubber rings 17. The annular grooves 19 provide a fixed installation position for the rubber rings 17. The engagement increases the sealing area and prevents the rubber rings 17 from shifting or falling off during operation.

[0036] In this embodiment, when the furnace pressure is normal, the pressure spring 14 applies pressure to the sealing sleeve 6 through the pressure plate 10, causing the sealing sleeve 6 to fit tightly against the sealing ring 11. Multiple sets of rubber rings 17 are embedded in the ring groove 19 to form a reliable seal. The sealing rod 8 remains fixed in the sliding hole 7, and the groove at the bottom corresponds to the leakage hole 9. The center rod 5 ensures the stability of the movement of the pressure plate 10 through the sliding sleeve 15. The sliding cooperation between multiple sets of limiting rods 16 and limiting sleeves 13 further ensures the reliability of the seal. When the pressure inside the furnace body 1 exceeds the pressure spring 14, the sealing pressure is reduced. When the preset force is applied, the pressure pushes the multiple sets of sealing rods 8 and the flue gas sliding holes 7 to slide. The multiple sets of sealing rods 8 push the pressure plate 10 to move upward, releasing the fit between the sealing sleeve 6 and the sealing ring 11, so that a flow space is formed between them. At the same time, the multiple sets of pressure springs 14 are squeezed. When the sealing rod 8 slides beyond the leakage hole 9, the pressure in the furnace body 1 is discharged through the leakage hole 9, and then passes through the gap between the sealing sleeve 6 and the pressure plate 10 and is discharged through the multiple sets of pressure relief holes 4. The greater the pressure, the longer the sliding distance of the sealing rod 8, the more leakage holes 9 are exposed, and the faster the pressure relief speed.

[0037] Please see Figure 1As one implementation of the flipping mechanism: a flipping mechanism is provided on the outside of the furnace body 1. The flipping mechanism includes a fixed ring 20, a connecting plate 21, a support frame 22 and a hydraulic cylinder 23. The fixed ring 20 is provided on the outside of the furnace body 1. The connecting plate 21 is fixedly installed on the outside of the fixed ring 20. The support frame 22 is rotatably connected to the connecting plate 21. The hydraulic cylinder 23 is installed on both sides of the support frame 22 and its telescopic ends are rotatably connected to the two sets of connecting plates 21 respectively.

[0038] More specifically, the hydraulic cylinder 23 drives the support frame 22 to move through the connecting plate 21. Since the fixed ring 20 is fixedly connected to the furnace body 1, when the hydraulic cylinder 23 extends or retracts, it can drive the entire furnace body 1 to flip. The synchronous movement of the hydraulic cylinders 23 on both sides ensures the stability of the flipping process, and the rotational connection design of the support frame 22 ensures the precise control of the flipping angle.

[0039] In summary, during use or operation of the overall equipment: when the furnace pressure is normal, the pressure spring 14 applies pressure to the sealing sleeve 6 through the pressure plate 10, causing the sealing sleeve 6 to fit tightly against the sealing ring 11. Multiple sets of rubber rings 17 are embedded in the ring groove 19 to form a reliable seal. The sealing rod 8 remains fixed in the sliding hole 7, and the groove at the bottom corresponds to the leakage hole 9. The central rod 5 ensures the stability of the movement of the pressure plate 10 through the sliding sleeve 15. The sliding cooperation between multiple sets of limiting rods 16 and the limiting sleeve 13 further ensures the reliability of the seal. When the pressure inside the furnace body 1 exceeds the pressure of the multiple sets of sealing springs 14, the sealing spring 14 applies pressure to the sealing sleeve 6 through the pressure plate 10, causing the sealing sleeve 6 to fit tightly against the sealing ring 11. Multiple sets of rubber rings 17 are embedded in the ring groove 19 to form a reliable seal. The sealing rod 8 remains fixed in the sliding hole 7, and the groove at the bottom corresponds to the leakage hole 9. The central rod 5 ensures the stability of the movement of the pressure plate 10 through the sliding sleeve 15. Multiple sets of limiting rods 16 and the sliding sleeve 13 further ensure the reliability of the seal. When the pressure spring 14 is at its preset force, the pressure pushes the multiple sets of sealing rods 8 and the smoke sliding holes 7 to slide. The multiple sets of sealing rods 8 push the pressure plate 10 to move upward, releasing the fit between the sealing sleeve 6 and the sealing ring 11, creating a flow space between them. At the same time, the multiple sets of pressure springs 14 are squeezed. When the sealing rod 8 slides beyond the leakage hole 9, the pressure inside the furnace body 1 is discharged through the leakage hole 9, and then passes through the gap between the sealing sleeve 6 and the pressure plate 10 and is discharged through the multiple sets of pressure relief holes 4. The greater the pressure, the longer the sliding distance of the sealing rod 8, the more leakage holes 9 are exposed, and the faster the pressure relief speed.

[0040] The hydraulic cylinder 23 drives the support frame 22 to move through the connecting plate 21. Since the fixed ring 20 is fixedly connected to the furnace body 1, when the hydraulic cylinder 23 extends or retracts, it can drive the entire furnace body 1 to flip. The synchronous movement of the hydraulic cylinders 23 on both sides ensures the stability of the flipping process. The rotating connection design of the support frame 22 ensures the precise control of the flipping angle.

[0041] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A semiconductor single crystal furnace, comprising a furnace body (1), characterized in that: The furnace body (1) is provided with a cover (2), and the cover (2) is provided with a pressure relief mechanism. The pressure relief mechanism includes a pressure relief sleeve (3), a pressure relief hole (4), a central rod (5), a sealing sleeve (6), a sliding hole (7), a sealing rod (8), a leakage hole (9), a pressure plate (10), a sealing ring (11), a fixing sleeve (12), a limiting sleeve (13), and a pressure spring (14). The pressure relief sleeve (3) is installed on the cover (2). The pressure relief hole (4) is provided with multiple sets distributed at the top of the pressure relief sleeve (3). The central rod (5) is installed inside the pressure relief sleeve (3). The sealing sleeve (6) is provided with a pressure relief hole (4), a central rod (5), a sealing sleeve (6), a sliding hole (7), a sealing rod (8), a leakage hole (9), a pressure plate (10), a sealing ring (11), a fixing sleeve (12), a limiting sleeve (13), and a pressure spring (14). 6) Installed at the bottom of the center rod (5), multiple sets of sliding holes (7) are distributed on the sealing sleeve (6), the sealing rod (8) slides in multiple sets of sliding holes (7), multiple sets of leakage holes (9) are distributed on the outside of multiple sets of sliding holes (7), the pressure plate (10) is set on the top surface of the sealing sleeve (6), the sealing ring (11) is installed on the inside of the pressure relief sleeve (3), the fixing sleeve (12) is installed on the inner wall of the pressure relief sleeve (3), the limiting sleeve (13) is installed on the inside of the fixing sleeve (12), and multiple sets of pressure springs (14) are provided, with both ends connected to the pressure plate (10) and the limiting sleeve (13) respectively.

2. A semiconductor single crystal furnace according to claim 1, characterized in that: A sliding sleeve (15) is installed on the inner side of the pressure plate (10), and the sliding sleeve (15) is slidably connected to the center rod (5).

3. A semiconductor single crystal furnace according to claim 2, characterized in that: The pressure plate (10) is provided with a limiting rod (16), and there are multiple sets of the limiting rod (16) and they are all slidably connected to the limiting sleeve (13).

4. A semiconductor single crystal furnace according to claim 3, characterized in that: The bottom of each of the multiple sealing rods (8) is provided with a groove.

5. A semiconductor single crystal furnace according to claim 4, characterized in that: The bottom surface of the pressure plate (10) is provided with a rubber ring (17), and multiple sets of the rubber ring (17) are provided and respectively attached to the sealing sleeve (6) and the sealing ring (11).

6. A semiconductor single crystal furnace according to claim 5, characterized in that: multiple sets Each of the pressure springs (14) has an abutment ring (18) installed at its bottom end.

7. A semiconductor single crystal furnace according to claim 6, characterized in that: The top surfaces of the sealing sleeve (6) and the sealing ring (11) are provided with ring grooves (19), and multiple sets of ring grooves (19) respectively engage with multiple sets of rubber rings (17).

8. A semiconductor single crystal furnace according to claim 7, characterized in that: A flipping mechanism is provided on the outside of the furnace body (1). The flipping mechanism includes a fixed ring (20), a connecting plate (21), a support frame (22), and a hydraulic cylinder (23). The fixed ring (20) is located on the outside of the furnace body (1). The connecting plate (21) is fixedly installed on the outside of the fixed ring (20). The support frame (22) is rotatably connected to the connecting plate (21). The hydraulic cylinder (23) is installed on both sides of the support frame (22), and its telescopic ends are rotatably connected to the two sets of connecting plates (21) respectively.

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