CVD (Chemical Vapor Deposition) method reaction furnace capable of discharging at return section
By optimizing the structure and conveying device of the CVD reactor, continuous production of carbon nanotube arrays without separation from the substrate was achieved, solving the problem of array damage during discharge in existing technologies and realizing efficient and low-cost carbon nanotube production.
Patent Information
- Application Number
- CN202520299441.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-24
- Publication Date
- 2026-01-30
- Estimated Expiration
- 2035-02-24
AI Technical Summary
In existing carbon nanotube production lines, the substrate and forest-like carbon nanotube array are destroyed during the discharge process, making it difficult to generate large-area, microscopically consistent carbon nanotube products, resulting in high costs and low efficiency.
A CVD reactor with material discharge in the return section is designed. By optimizing the structure of the furnace inlet section, furnace body, furnace outlet section and return section, the carbon nanotube array is ensured to remain inseparable from the substrate. Continuous production is carried out using longitudinal and transverse conveyors, and material discharge is completed using a wire drawing device.
It has enabled the continuous production of large-area forest-like carbon nanotube arrays, reducing costs and improving efficiency.
Smart Images
Figure CN223852778U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of CVD production equipment technology, specifically a CVD reactor with material discharged from the return section. Background Technology
[0002] Currently, the carbon nanotube production lines that are in mass production on the market produce carbon nanotube products after they have been separated from the substrate. This production method causes the forest-like carbon nanotube array deposited on the substrate at the microscale to be destroyed into powdery raw materials at the macroscale during the discharge process. If you want to make a specific carbon nanotube product from the powdery raw materials at the macroscale and at the same time make it have the properties of carbon nanotubes at the microscale, this is a particularly difficult and costly task. Utility Model Content
[0003] In view of the problems existing in the prior art, the purpose of this utility model is to provide a CVD reactor with material discharge in the return section, so as to solve the problems mentioned in the background art.
[0004] To achieve the above objectives, this utility model provides the following technical solution: The workshop 1 for producing deposits using chemical vapor deposition includes a material tray 2 and a reactor 3. The reactor 3 includes an inlet section 4, a furnace body 5, an outlet section 6, a conveying device 7, and a return section 8. The material tray 2 is the substrate for the CVD-prepared deposits, and the return section 8 is located in the atmospheric environment within the workshop 1. The material tray 2 enters the furnace body 5 from the inlet chamber 4B via the conveying device 7. The deposits generated by the chemical reaction in the furnace body 5 are deposited on the material tray 2. The material tray 2 enters the outlet chamber 6B from the furnace body 5, and then enters the return section 8 from the outlet chamber 6B, where the deposits are discharged.
[0005] As a further embodiment of this invention: the deposit includes carbon nanotubes, and the reactor 3 includes a horizontal reactor for preparing carbon nanotubes.
[0006] As a further embodiment of this utility model: the furnace section 4 includes an inlet gate 4A, an inlet chamber 4B, and an outlet gate 4C. The inlet gate 4A is located between the return section 8 and the inlet chamber 4B, and the outlet gate 4C is located between the inlet chamber 4B and the furnace body 5. Both the inlet gate 4A and the outlet gate 4C are used to block the flow of gas.
[0007] When both the inlet gate 4A and the outlet gate 4C are closed, the inlet chamber 4B is completely isolated from the outside world. When the inlet gate 4A is opened, the material tray 2 can enter the inlet chamber 4B from the return section 8. When the outlet gate 4C is opened, the material tray 2 enters the furnace body 5 from the inlet chamber 4B through the conveying device 7 and undergoes a chemical reaction in the furnace body 5.
[0008] As a further embodiment of this utility model: the furnace exit section 6 includes an inlet / outlet gate 6A, an exit chamber 6B, and an outlet / outlet gate 6C. The inlet / outlet gate 6A is located between the furnace body 5 and the exit chamber 6B, and the outlet / outlet gate 6C is located between the exit chamber 6B and the return section 8. Both the inlet / outlet gate 6A and the outlet / outlet gate 6C are used to block the flow of gas.
[0009] When both the inlet / outlet gate 6A and the outlet gate 6C are closed, the outlet chamber 6B is completely isolated from the outside world. When the inlet / outlet gate 6A is opened, the material tray 2 enters the outlet chamber 6B from the furnace body 5 through the conveying device 7. When the outlet gate 6C is opened, the material tray 2 leaves the outlet chamber 6B and enters the return section 8, where the carbon nanotubes are discharged.
[0010] As a further embodiment of this utility model: the conveying device 7 includes a longitudinal conveyor 7A, the longitudinal conveyor 7A includes a chain longitudinal conveyor 7A1, and the chain longitudinal conveyor 7A1 includes a drive device 7A1A installed outside the furnace body of the reactor 3.
[0011] As a further embodiment of this utility model: the furnace inlet section 4 includes a straight furnace inlet section 41 and an L-shaped furnace inlet section 4L, and the furnace outlet section 6 includes a straight furnace outlet section 61 and an L-shaped furnace outlet section 6L.
[0012] As a further embodiment of this utility model: the reactor 3 includes a single reactor 3A and a double reactor 3B. The return section 8 in the single reactor 3A is parallel to the furnace body 5. The double reactor 3B includes a forward reactor 3B1 and a reverse reactor 3B2. The return section 8, which is adjacent to the furnace inlet section 4 and the furnace outlet section 6, is located at both ends of the double reactor 3B. The forward reactor 3B1 and the reverse reactor 3B2, which are arranged in parallel, are connected end to end.
[0013] As a further embodiment of this utility model: the conveying device 7 includes a transverse conveyor 7B, and the transverse conveyor 7B includes a chain transverse conveyor 7B1.
[0014] As a further embodiment of this utility model: the return section 8 includes a spinning device 8A capable of manufacturing carbon nanotube fibers, and the carbon nanotube array is discharged through the spinning device 8A.
[0015] In summary, compared with the prior art, this utility model provides a carbon nanotube production line that can be mass-produced. When the material is discharged, the forest-like carbon nanotube array is not separated from the substrate. It can not only generate a large area of forest-like carbon nanotube array, but also produce continuously, thus with low cost and high efficiency. Attached Figure Description
[0016] Figure 1It is a structural schematic diagram of the material tray 2 and the reactor 3 in workshop 1, and also a structural schematic diagram of the furnace section 4, furnace body 5, furnace discharge section 6, conveying device 7 and return section 8 that make up the reactor 3. It is also a structural schematic diagram of the furnace gate 4A, furnace chamber 4B and furnace gate 4C that make up the furnace section 4. It is also a structural schematic diagram of the furnace gate 6A, furnace chamber 6B and furnace gate 6C that make up the furnace discharge section 6. It is also a structural schematic diagram of the linear furnace section 41 and the linear furnace discharge section 61. It is also a structural schematic diagram of the single reactor 3A.
[0017] Figure 2 yes Figure 1 The top view is also a structural schematic diagram of the longitudinal conveyor 7A that makes up the conveying device 7, and a structural schematic diagram of the chain longitudinal conveyor 7A1 and the drive device 7A1A that make up the longitudinal conveyor 7A.
[0018] Figure 3 yes Figure 1 The AA cross-sectional view is also a schematic diagram of the structure of the material tray 2 and the conveying device 7 in the furnace body 5.
[0019] Figure 4 yes Figure 1 The BB cross-sectional view is also a structural schematic diagram of the material tray 2, conveying device 7 and drive device 7A1A in the furnace section 6.
[0020] Figure 5 This is a schematic diagram of the structure of material tray 2 as material box 2A;
[0021] Figure 6 yes Figure 5 The C-direction view;
[0022] Figure 7 This is a schematic diagram of the structure of material tray 2 as material plate 2B;
[0023] Figure 8 yes Figure 7 The D-direction view;
[0024] Figure 9 It is a structural schematic diagram of the dual reactor 3B, a structural schematic diagram of the L-shaped furnace inlet section 4L and the L-shaped furnace outlet section 6L, and a structural schematic diagram of the chain transverse conveyor 7B1 that makes up the transverse conveyor 7B.
[0025] Figure 10 This is a schematic diagram of the drawing device 8A located in the return section 8 or workshop 1.
[0026] Workshop 1, Material Tray 2, Material Box 2A, Material Plate 2B, Reactor 3, Single Reactor 3A, Double Reactor 3B, Forward Reactor 3B1, Reverse Reactor 3B2, Furnace Inlet Section 4, Inlet Gate 4A, Inlet Chamber 4B, Outlet Gate 4C, L-shaped Inlet Section 4L, Straight Inlet Section 41, Furnace Body 5, Furnace Outlet Section 6, Inlet / Outlet Gate 6A, Outlet Chamber 6B, Outlet Gate 6C, L-shaped Outlet Section 6L, Straight Outlet Section 61, Conveying Device 7, Longitudinal Conveyor 7A, Chain Longitudinal Conveyor 7A1, Drive Device 7A1A, Transverse Conveyor 7B, Chain Transverse Conveyor 7B1, Return Section 8, Wire Drawing Device 8A. Detailed Implementation
[0027] The technical solutions of the present utility model will be described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the protection scope of the present utility model.
[0028] Please see Figures 1-10 In this embodiment of the present invention, the workshop 1 for producing deposits using chemical vapor deposition includes a material tray 2 and a reactor 3. The reactor 3 includes an inlet section 4, a furnace body 5, an outlet section 6, a conveying device 7, and a return section 8. The material tray 2 is the substrate for the CVD-prepared deposits, and the return section 8 is located in the atmospheric environment within the workshop 1. The material tray 2 enters the furnace body 5 from the inlet chamber 4B via the conveying device 7. The deposits generated by the chemical reaction in the furnace body 5 are deposited on the material tray 2. The material tray 2 enters the outlet chamber 6B from the furnace body 5, and then enters the return section 8 from the outlet chamber 6B, where the deposits are discharged.
[0029] The deposits include carbon nanotubes, and the reactor 3 includes a horizontal reactor for preparing carbon nanotubes.
[0030] The furnace entry section 4 includes an inlet gate 4A, an inlet chamber 4B, and an outlet gate 4C. The inlet gate 4A is located between the return section 8 and the inlet chamber 4B, and the outlet gate 4C is located between the inlet chamber 4B and the furnace body 5. Both the inlet gate 4A and the outlet gate 4C are used to block the flow of gas.
[0031] When both the inlet gate 4A and the outlet gate 4C are closed, the inlet chamber 4B is completely isolated from the outside world. When the inlet gate 4A is opened, the material tray 2 can enter the inlet chamber 4B from the return section 8. When the outlet gate 4C is opened, the material tray 2 enters the furnace body 5 from the inlet chamber 4B through the conveying device 7 and undergoes a chemical reaction in the furnace body 5.
[0032] It should be noted that the catalyst can be inside the furnace chamber 4B or diffused to the material tray 2 via gas at the beginning of the furnace body 5.
[0033] The furnace exit section 6 includes an inlet / outlet gate 6A, an exit chamber 6B, and an outlet gate 6C. The inlet / outlet gate 6A is located between the furnace body 5 and the exit chamber 6B, and the outlet gate 6C is located between the exit chamber 6B and the return section 8. Both the inlet / outlet gate 6A and the outlet gate 6C are used to block the flow of gas.
[0034] When both the inlet / outlet gate 6A and the outlet gate 6C are closed, the outlet chamber 6B is completely isolated from the outside world. When the inlet / outlet gate 6A is opened, the material tray 2 enters the outlet chamber 6B from the furnace body 5 through the conveying device 7. When the outlet gate 6C is opened, the material tray 2 leaves the outlet chamber 6B and enters the return section 8, where the carbon nanotubes are discharged.
[0035] It should be noted that: the material tray 2 can be a material box 2A or a material plate 2B; the material tray 2 itself can also be a component of a chemical vapor deposition product.
[0036] The conveying device 7 includes a longitudinal conveyor 7A, which includes a chain longitudinal conveyor 7A1. The chain longitudinal conveyor 7A1 includes a drive device 7A1A installed outside the furnace body of the reactor 3.
[0037] It should be noted that the conveying device 7 can also be a push-type conveyor.
[0038] The furnace feeding section 4 includes a straight furnace feeding section 41 and an L-shaped furnace feeding section 4L, and the furnace discharge section 6 includes a straight furnace discharge section 61 and an L-shaped furnace discharge section 6L.
[0039] The reactor 3 includes a single reactor 3A and a double reactor 3B. The return section 8 in the single reactor 3A is parallel to the furnace body 5. The double reactor 3B includes a forward reactor 3B1 and a reverse reactor 3B2. The return section 8, which is adjacent to the furnace inlet section 4 and the furnace outlet section 6, is located at both ends of the double reactor 3B. The forward reactor 3B1 and the reverse reactor 3B2, which are arranged in parallel, are connected end to end.
[0040] The conveying device 7 includes a transverse conveyor 7B, which includes a chain transverse conveyor 7B1.
[0041] The return section 8 includes a spinning device 8A capable of producing carbon nanotube fibers, through which the carbon nanotube array is discharged.
[0042] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "front," and "rear," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In this utility model, it should also be noted that the terms "installation" and "connection" should be interpreted broadly. For example, they can refer to fixed connection, detachable connection, integral molding connection, mechanical connection, or indirect connection through an intermediate medium. The specific meaning of the terms in this utility model can be understood according to the specific circumstances.
[0043] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.
Claims
1. A CVD reactor for discharging in a return section, characterized in that The workshop (1) for producing deposits by chemical vapor deposition method comprises a tray (2) and a reaction furnace (3), the reaction furnace (3) comprises an inlet section (4), a furnace body (5), an outlet section (6), a conveying device (7) and a return section (8), the tray (2) is a base for preparing deposits by CVD method, and the return section (8) is in the atmospheric environment in the workshop (1); the tray (2) enters the furnace body (5) from the inlet chamber body (4B) through the conveying device (7), the deposits generated by chemical reaction in the furnace body (5) are deposited on the tray (2), the tray (2) enters the outlet chamber body (6B) from the furnace body (5), and then enters the return section (8) from the outlet chamber body (6B), and the discharging of the deposits is completed in the return section (8).
2. The reactor for CVD method according to claim 1, wherein The deposits comprise carbon nanotubes, and the reaction furnace (3) comprises a horizontal reaction furnace for preparing carbon nanotubes.
3. A reactor for CVD method according to claim 2, wherein The inlet section (4) comprises an inlet gate (4A), an inlet chamber body (4B) and an outlet gate (4C), the inlet gate (4A) is located between the return section (8) and the inlet chamber body (4B), the outlet gate (4C) is located between the inlet chamber body (4B) and the furnace body (5), and the inlet gate (4A) and the outlet gate (4C) are both used for cutting off the circulation of gas; When the inlet gate (4A) and the outlet gate (4C) are both closed, the inlet chamber body (4B) is completely cut off from the outside; when the inlet gate (4A) is opened, the tray (2) can enter the inlet chamber body (4B) from the return section (8); and when the outlet gate (4C) is opened, the tray (2) enters the furnace body (5) from the inlet chamber body (4B) through the conveying device (7) and performs chemical reaction in the furnace body (5).
4. The reactor for CVD method according to claim 2, wherein The outlet section (6) comprises an inlet and outlet gate (6A), an outlet chamber body (6B) and an outlet gate (6C), the inlet and outlet gate (6A) is located between the furnace body (5) and the outlet chamber body (6B), the outlet gate (6C) is located between the outlet chamber body (6B) and the return section (8), and the inlet and outlet gate (6A) and the outlet gate (6C) are both used for cutting off the circulation of gas; When the inlet and outlet gate (6A) and the outlet gate (6C) are both closed, the outlet chamber body (6B) is completely cut off from the outside; when the inlet and outlet gate (6A) is opened, the tray (2) enters the outlet chamber body (6B) from the furnace body (5) through the conveying device (7); when the outlet gate (6C) is opened, the tray (2) enters the return section (8) from the outlet chamber body (6B), and the discharging of the carbon nanotubes is completed in the return section (8).
5. A reactor for CVD method according to claim 3 or 4, characterized in that The conveying device (7) comprises a longitudinal conveyor (7A), and the longitudinal conveyor (7A) comprises a chain longitudinal conveyor (7A1), and the chain longitudinal conveyor (7A1) comprises a driving device (7A1A) installed outside the furnace body of the reaction furnace (3).
6. A reactor for CVD method according to claim 5, wherein The inlet section (4) comprises a straight inlet section (41) and an L-shaped inlet section (4L), and the outlet section (6) comprises a straight outlet section (61) and an L-shaped outlet section (6L).
7. A reactor for CVD method according to claim 6, wherein The reaction furnace (3) comprises a single reaction furnace (3A) and a double reaction furnace (3B), the return section (8) in the single reaction furnace (3A) is parallel to the furnace body (5), the double reaction furnace (3B) comprises a forward reaction furnace (3B1) and a reverse reaction furnace (3B2), the return section (8) next to the furnace inlet section (4) and the furnace outlet section (6) is located at two ends of the double reaction furnace (3B), and the forward reaction furnace (3B1) and the reverse reaction furnace (3B2) are connected head to tail in parallel and side by side.
8. The reactor for CVD method according to claim 7, wherein The conveying device (7) comprises a transverse conveyor (7B), and the transverse conveyor (7B) comprises a chain transverse conveyor (7B1).
9. The reactor for CVD method according to claim 2, wherein The return section (8) comprises a fiber drawing device (8A) capable of manufacturing carbon nanotube fibers, and the discharging of the carbon nanotube array is completed through the fiber drawing device (8A).