Parylene coating device
By adding an auxiliary exhaust pipe and a nitrogen compensation unit to the Parylene coating device, the problem of particles entering the film-forming unit from the evaporation unit was solved, achieving high-quality coating results and a simple operation process.
Patent Information
- Application Number
- CN202520190450.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-07
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2035-02-07
AI Technical Summary
In existing Parylene coating equipment, during the vacuuming process, film particles from the evaporation unit will enter the film formation unit, causing particles to form on the substrate surface and affecting the coating quality.
An auxiliary gas extraction pipe is added to the device to perform pre-vacuuming, ensuring that the gas pressure of the evaporation unit and the film-forming unit is balanced before coating. The gas pressure is adjusted by a nitrogen compensation unit to reduce particle formation.
It effectively reduces the formation of particles on the substrate surface, improves the coating quality, and simplifies the operation process, making it suitable for large-scale promotion and use.
Smart Images
Figure CN223866758U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model belongs to the field of parylene coating encapsulation technology, especially relates to a parylene coating device. BACKGROUND
[0002] Parylene coating is an advanced surface treatment technology, which refers to heating and vaporizing powder parylene (a polymer of p-xylene) to crack and finally deposit a dense and pinhole-free thin film with uniform thickness on the surface of a substrate in a vacuum environment. The thin film formed by this process is uniform in thickness, dense and pinhole-free, and has good shape retention, can cover the surface of complex shapes and provide real airtight protection, and is widely used in many fields.
[0003] In the prior art, the device for parylene coating usually consists of an evaporation unit, a cracking unit, a film forming unit, a cooling unit and a vacuum unit. However, during the vacuumizing process of the device, the parylene film particles in the evaporation unit will come to the film forming unit with the initial vacuumizing process and fall on the surface of the substrate to be coated, thereby causing particles on the surface of the substrate and particle problems after coating.
[0004] Therefore, how to solve the particle problem during parylene coating is one of the problems to be solved by the technical personnel in the field. UTILITY MODEL CONTENTS
[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the utility model is to provide a parylene coating device, which can effectively reduce the generation of particles on the surface of the substrate and improve the coating quality when the device is used for parylene coating, so as to solve the particle problem during parylene coating in the prior art.
[0006] To achieve the above-mentioned purposes and other related purposes, the utility model provides a parylene coating device, which comprises a main pipeline and an auxiliary air pipe for vacuumizing.
[0007] The main pipeline is sequentially provided with an evaporation unit, a cracking unit, a film forming unit, a cooling unit and a vacuum unit in airflow communication, and the first end of the main pipeline is in communication with the gas outlet end of the evaporation unit.
[0008] The gas inlet of the auxiliary air pipe is in communication with the main pipeline between the evaporation unit and the film forming unit, and the gas outlet of the auxiliary air pipe is in communication with the main pipeline between the film forming unit and the cooling unit.
[0009] The auxiliary air pipe is provided with a second valve for controlling whether the gas passes through or not, and the main pipeline is provided with a first valve, which is located on the main pipeline between the film forming unit and the gas outlet of the auxiliary air pipe.
[0010] In one embodiment, the first valve is a first pneumatic valve.
[0011] In one embodiment, the second valve is a second pneumatic valve.
[0012] In one embodiment, the device further comprises a nitrogen compensation unit, which is in communication with the film forming unit pipeline, for adjusting the gas pressure of the film forming unit to be greater than or equal to the evaporation unit.
[0013] In one embodiment, a third valve is provided on the pipeline between the nitrogen compensation unit and the film forming unit, for controlling the flow of nitrogen to the film forming unit.
[0014] In one embodiment, the third valve is a third pneumatic valve.
[0015] In one embodiment, the device further comprises a first vacuum gauge and a second vacuum gauge; the first vacuum gauge is provided on the evaporation unit for real-time monitoring of the vacuum degree in the evaporation unit; the second vacuum gauge is provided on the film forming unit for real-time monitoring of the vacuum degree in the film forming unit.
[0016] In one embodiment, the evaporation unit is used to sublimate the parylene film material into a gaseous state.
[0017] In one embodiment, the cracking unit is used to crack the gaseous parylene film material into active monomers.
[0018] In one embodiment, the film forming unit is used to deposit parylene active monomers on the surface of the substrate to form a thin film.
[0019] In one embodiment, the cooling unit is used to capture the parylene active monomers that are not deposited, preventing them from entering the vacuum unit.
[0020] In one embodiment, the vacuum unit is used to maintain the vacuum environment of the device.
[0021] The parylene coating device provided by the utility model adds an auxiliary air exhaust pipe, uses the auxiliary air exhaust pipe to complete vacuumizing before coating, closes the auxiliary air exhaust pipe after vacuumizing is completed and the air pressure in each chamber of the device is balanced, and then performs film forming, so that the formation of particles on the surface of the substrate can be greatly reduced, and the final coating quality is improved.
[0022] As described above, the parylene coating device has the following beneficial effects:
[0023] 1) The parylene coating device adds an auxiliary air exhaust pipe, so that the formation of particles on the surface of the substrate during parylene coating is effectively reduced.
[0024] 2) The parylene coating device of the utility model, simple structure, easy operation, obvious effect, very suitable for large-scale promotion and use. BRIEF DESCRIPTION OF DRAWINGS
[0025] Figure 1 The structure diagram of the parylene coating device of the utility model is shown.
[0026] Figure 1 Explanation of reference numerals in the drawings
[0027] 1 main pipe
[0028] 11 evaporation unit
[0029] 12 cracking unit
[0030] 13 film forming unit
[0031] 14 cooling unit
[0032] 15 vacuum unit
[0033] 2 suction pipe auxiliary road
[0034] 31 first valve
[0035] 32 second valve
[0036] 33 third valve
[0037] 4 nitrogen compensation unit
[0038] 51 first vacuum gauge
[0039] 52 second vacuum gauge DETAILED DESCRIPTION
[0040] The implementation of the utility model is explained by specific embodiments below, and other advantages and effects of the utility model can be easily understood by those skilled in the art from the content disclosed in the specification.
[0041] Please refer to Figure 1It is to be understood that the structures, proportions, sizes, etc. shown in the drawings accompanying the present specification are merely intended to facilitate the understanding of the content disclosed in the present specification for those skilled in the art to understand and read, and are not intended to limit the implementation of the present application, and therefore do not have substantial technical significance. Any modification of the structure, change of the proportional relationship or adjustment of the size, without affecting the effects and purposes that can be achieved by the present application, should still fall within the scope of the technical content disclosed by the present application. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" used in the present specification are merely for the convenience of clear description, and are not intended to limit the scope of the present application, and the change or adjustment of the relative relationship, without substantially changing the technical content, is also considered as the scope of the present application.
[0042] As shown in Figure 1 The present embodiment provides a parylene coating device, which comprises a main pipeline 1 and an auxiliary pipeline 2 for vacuum pumping; the main pipeline 1 is sequentially provided with an evaporation unit 11, a cracking unit 12, a film forming unit 13, a cooling unit 14 and a vacuum unit 15 in gas flow communication, and the first end of the main pipeline 1 is in communication with the gas outlet end of the evaporation unit 11; the gas inlet of the auxiliary pipeline 2 is in communication with the main pipeline 1 between the evaporation unit 11 and the film forming unit 13, and the gas outlet of the auxiliary pipeline 2 is in communication with the main pipeline 1 between the film forming unit 13 and the cooling unit 14; the auxiliary pipeline 2 is provided with a second valve 32 for controlling whether the gas passes through; the main pipeline 1 is provided with a first valve 31, which is located on the main pipeline 1 between the film forming unit 13 and the gas outlet of the auxiliary pipeline 2.
[0043] As shown in Figure 1 In a specific embodiment, the first valve 31 is a first pneumatic valve.
[0044] As shown in Figure 1 In a specific embodiment, the second valve 32 is a second pneumatic valve.
[0045] In actual parylene coating of the surface of the substrate, the substrate is placed in the film forming unit 13, the first valve 31 is closed, the second valve 32 is opened, and then the vacuum unit 15 is opened to pump the entire device. Since the gas always flows from the high pressure area to the low pressure area, the gas flow in the evaporation unit 11 and the film forming unit 13 will flow into the gas inlet of the auxiliary pipeline 2, and then enter the vacuum unit 15 through the auxiliary pipeline 2 for exhaust, so that the air in the evaporation unit 11 can be prevented from flowing through the film forming unit 13 to form particles on the surface of the substrate while the device is being pumped. After the vacuum is completed, the first valve 31 is opened and the second valve 32 is closed, and the parylene film material is used to coat the surface of the substrate with parylene.
[0046] In one embodiment as shown in the figure, the device further comprises a nitrogen compensation unit 4, which is in pipeline communication with the film forming unit 13, for adjusting the air pressure of the film forming unit 13 to be greater than or equal to the evaporation unit 11. Figure 1
[0047] More specifically, as shown in the figure, a third valve 33 is arranged on the pipeline between the nitrogen compensation unit 4 and the film forming unit 13, for controlling the flow of nitrogen to the film forming unit 13. Figure 1
[0048] The nitrogen compensation unit 4 is used to provide nitrogen for the film forming unit 13, and the flow of nitrogen from the nitrogen compensation unit 4 to the film forming unit 13 is controlled by controlling the third valve 33.
[0049] As shown in the figure, in one embodiment, the device further comprises a first vacuum gauge 51 and a second vacuum gauge 52; the first vacuum gauge 51 is arranged on the evaporation unit 11, for real-time monitoring of the vacuum degree in the evaporation unit 11; the second vacuum gauge 52 is arranged on the film forming unit 13, for real-time monitoring of the vacuum degree in the film forming unit 13. Figure 1 In the actual vacuumizing process, in order to further avoid the film material in the evaporation unit 11 from entering the film forming unit 13 during the vacuumizing process, after rough vacuumizing of the device, it is necessary to ensure that the air pressures in the evaporation unit 11 and the film forming unit 13 are completely equal, so as to avoid the flow of air flow.
[0050] More specifically, after rough vacuumizing of the device, the first valve 31 is kept closed and the second valve 32 is kept open, then the air pressures in the evaporation unit 11 and the film forming unit 13 are judged according to the first vacuum gauge 51 and the second vacuum gauge 52, the air pressure in the film forming unit 13 is adjusted by the nitrogen compensation unit 4, until the air pressure in the film forming unit 13 is greater than or equal to the air pressure in the evaporation unit 11, then the first valve 31 is opened and the second valve 32 is closed, and the film forming of the Parylene is carried out through the main pipeline 1.
[0051] In one embodiment, the evaporation unit 11 is used to sublimate the Parylene film material into a gaseous state.
[0052] In the present application, the specific structure of the evaporation unit 11 is not limited, as long as it is a structure of Parylene in the prior art that can evaporate Parylene film material particles into a gaseous state, such as a chamber with a heating element. More specifically, in the evaporation unit 11, the temperature is 80-200°C. As an example, in the case of a chamber with a heating element, the temperature is 80-200°C.
[0053] Figure 1 In the embodiment shown, the evaporation unit 11 is a cuboid chamber with heating wires on the side walls, and the temperature in the evaporation unit 11 is 180°C. In actual use, the granular parylene film material is placed in the center of the cuboid chamber, and the heating wires on the side walls heat it to evaporate the parylene film material into gaseous parylene.
[0054] In one embodiment, the cracking unit 12 is used to crack the gaseous parylene film material into active monomers.
[0055] In the present application, the specific structure of the cracking unit 12 is not limited, as long as it is a structure in the prior art that can crack the gaseous parylene film material into active monomers. For example, the cracking unit 12 can be a chamber with a heating element. More specifically, in the cracking unit 12, the temperature is 650-750°C. As an example, in the embodiment shown, Figure 1 In the embodiment shown, the cracking unit 12 is a cylindrical chamber with heating wires on the side walls, and the temperature in the cracking unit 12 is 650°C. In actual use, the gaseous parylene that has passed through the evaporation unit 11 is cracked into active monomers by the high temperature in the cracking unit 12.
[0056] In one embodiment, the film-forming unit 13 is used to deposit the parylene active monomers on the surface of the substrate to form a thin film.
[0057] In the present application, the specific structure of the film-forming unit 13 is not limited, as long as it is a structure in the prior art that can deposit the parylene active monomers on the surface of the substrate to form a thin film. For example, the film-forming unit 13 can be a chamber with a jig rack. As an example, in the embodiment shown, Figure 1 In the embodiment shown, the film-forming unit 13 is a cylindrical chamber with a jig rack inside, and the jig rack is rotatable to hold the substrate. In actual use, the substrate is placed on the jig rack, and the parylene active monomers that have passed through the evaporation unit 11 and the cracking unit 12 are deposited on the surface of the substrate in the film-forming unit 13 to form a thin film.
[0058] In one embodiment, the cooling unit 14 is used to capture the parylene active monomers that have not been deposited to prevent them from entering the vacuum unit 15.
[0059] In the present application, the specific structure of the cooling unit 14 is not limited, as long as it is a structure in the prior art that can cool and deposit the parylene active monomers. For example, it can be a chamber with a refrigeration element. More specifically, in the cooling unit 14, the temperature is -80 to -90°C. As an example, in the embodiment shown, Figure 1In the specific embodiment shown, a cylindrical chamber with a refrigeration element is used as the cooling unit 14, and the temperature in the cooling unit 14 is -90°C. In actual use, a substrate is placed on the jig rack, and the active monomers of parylene pass through the evaporation unit 11 and the cracking unit 12, and are deposited on the surface of the substrate in the film forming unit 13 to form a thin film.
[0060] To sum up, the parylene film coating device provided by the present application adds an auxiliary air exhaust pipe, uses the auxiliary air exhaust pipe to complete the vacuumization before coating, closes the auxiliary air exhaust pipe after the vacuumization is completed and the air pressure in each chamber of the device is balanced, and then performs film forming, so that the formation of particles on the surface of the substrate can be greatly reduced. Therefore, the present application effectively overcomes various shortcomings in the prior art and has high industrial utilization value.
[0061] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.
Claims
1. A Pyrelin coating apparatus, characterized in that, The device includes a main pipeline (1) and an auxiliary pipeline (2) for vacuuming. The main pipeline (1) is provided with an evaporation unit (11), a pyrolysis unit (12), a film forming unit (13), a cooling unit (14), and a vacuum unit (15) connected by airflow in sequence. The first end of the main pipeline (1) is connected to the gas outlet end of the evaporation unit (11). The air inlet of the auxiliary air extraction pipe (2) is connected to the main pipeline (1) between the evaporation unit (11) and the film forming unit (13), and the air outlet of the auxiliary air extraction pipe (2) is connected to the main pipeline (1) between the film forming unit (13) and the cooling unit (14). The auxiliary gas extraction pipe (2) is provided with a second valve (32) for controlling whether gas passes through; the main pipeline (1) is provided with a first valve (31), which is located on the main pipeline (1) between the film forming unit (13) and the gas outlet of the auxiliary gas extraction pipe (2).
2. The apparatus according to claim 1, characterized in that, The first valve (31) is the first pneumatic valve.
3. The apparatus according to claim 1, characterized in that, The second valve (32) is the second pneumatic valve.
4. The apparatus according to claim 1, characterized in that, The device also includes a nitrogen compensation unit (4), which is connected to the film-forming unit (13) via a pipeline and is used to adjust the gas pressure of the film-forming unit (13) to be greater than or equal to that of the evaporation unit (11).
5. The apparatus according to claim 4, characterized in that, A third valve (33) is provided on the pipeline between the nitrogen compensation unit (4) and the film forming unit (13) to control the flow of nitrogen to the film forming unit (13).
6. The apparatus according to claim 1, characterized in that, The device also includes a first vacuum gauge (51) and a second vacuum gauge (52); the first vacuum gauge (51) is disposed on the evaporation unit (11) and is used to monitor the vacuum level in the evaporation unit (11) in real time; the second vacuum gauge (52) is disposed on the film forming unit (13) and is used to monitor the vacuum level in the film forming unit (13) in real time.
7. The apparatus according to claim 1, characterized in that, The evaporation unit (11) is used to sublimate the Pyrelin film material into a gaseous state.
8. The apparatus according to claim 1, characterized in that, The pyrolysis unit (12) is used to pyrolyze gaseous Pyrelin membrane material into active monomers.
9. The apparatus according to claim 1, characterized in that, The film-forming unit (13) is used to deposit the active monomer of phenelzine onto the surface of the substrate to form a thin film.
10. The apparatus according to claim 1, characterized in that, The cooling unit (14) is used to capture undeposited pyrelin active monomers and prevent them from entering the vacuum unit (15); And / or, the vacuum unit (15) is used to maintain the vacuum environment of the device.