Particle blocking device and monolithic epitaxy equipment
By using a particle blocking device in a single-wafer epitaxy device, along with a closed groove and a rotating concave hole, the problem of particle blockage and cleaning is solved, thereby improving product yield and equipment lifespan.
Patent Information
- Application Number
- CN202520400437.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-10
- Publication Date
- 2026-02-03
- Estimated Expiration
- 2035-03-10
AI Technical Summary
During the maintenance of existing single-wafer epitaxial equipment, particles are difficult to effectively block and clean, leading to surface defects and mechanical damage to the product, reducing yield and increasing maintenance costs.
The device employs a particle blocking mechanism, including a valve groove plug and a concave hole plug. The rounded corner design prevents damage to the equipment, and the connecting strip seals the groove and rotating concave hole to block and collect scattered particles.
It improves the cleanliness of the equipment's interior, reduces the risk of particles entering the mechanical structure, increases the yield of epitaxial products, and extends the equipment's service life.
Smart Images
Figure CN223866828U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor epitaxial auxiliary equipment technology, and in particular to a particle blocking device and a single-wafer epitaxial device. Background Technology
[0002] With the continuous improvement of integrated circuit integration and the shrinking of chip minimum linewidth, the requirements for surface cleanliness in epitaxial processing are becoming increasingly stringent. Under the same conditions, the higher the surface cleanliness of epitaxial products, the higher their yield. As epitaxial equipment operates continuously, a large number of byproduct particles from epitaxial chemical reactions accumulate inside the equipment cavity. If these particles are not completely cleaned during periodic maintenance, they will participate in the epitaxial chemical reaction process to varying degrees, leading to various surface defects in the products.
[0003] In actual production, single-wafer epitaxial wafers have various grooves designed for feeding, venting, and wafer transfer. However, during equipment maintenance, particles can easily diffuse from contaminated vents into these grooves and are difficult to clean completely. When the internal mechanical structure resumes operation, the particles hidden inside the grooves are re-introduced into the cavity environment, where they further deposit on the product surface through chemical reactions, reducing the product yield. Furthermore, fine particles can enter the mechanical structure, disrupting lubrication between bearings and other components, increasing maintenance costs and shortening the lifespan of the mechanical structure.
[0004] During the maintenance of existing equipment, the grooves are simply covered with a clean cloth. When cleaning with inert gas, the particles cannot be effectively blocked, and the scattered particles cannot be collected, increasing the risk of particles scattering. Utility Model Content
[0005] Purpose of the invention: In view of the shortcomings of existing technologies that cannot effectively prevent particles from entering the groove, this utility model provides a particle blocking device and a single-wafer epitaxial device.
[0006] Technical solution: To solve the above problems, this utility model adopts a particle blocking device for monolithic epitaxial equipment, including a valve groove stopper, a concave hole stopper, and a connecting strip. When the valve groove stopper is inserted into the valve groove, one side of the valve groove stopper completely blocks the valve groove. The concave hole stopper is open at the top and closed at the bottom, forming a funnel shape that is wider at the top and narrower at the bottom. One end of the connecting strip is connected to the valve groove stopper, and the other end is connected to the concave hole stopper.
[0007] Furthermore, the valve groove stopper includes a fan ring and a plug fixedly connected to the fan ring. The plug is used to insert into the valve groove. When the plug is inserted into the valve groove, one side of the fan ring abuts against the outside of the valve groove to block the valve groove.
[0008] Furthermore, both the fan ring and the plug are rounded.
[0009] Furthermore, the central angle of the fan ring is 72-88°, the radius is 16-18cm, the height is 3.5-4cm, and the thickness is 0.8-1.2cm.
[0010] Furthermore, the length of the plug is 18-24cm, the width is 9-11cm, and the height is 2-2.2cm.
[0011] Furthermore, the upper opening radius of the concave hole plug is 4.5–5.5 cm, the lower closed circular base radius is 1.8–2 cm, and the depth of the concave hole plug is 3–5 cm.
[0012] Furthermore, the connection point between the connecting band and the valve groove stop is located at the center of the lower end face of the valve groove stop, and the connection point between the connecting band and the concave hole stop is located on the upper opening of the concave hole stop.
[0013] Furthermore, the length of the connecting strip is 18–22 cm.
[0014] Beneficial effects: Compared with the prior art, the significant advantage of this utility model is that by blocking and collecting scattered particles through the valve groove plug and the concave hole plug, the particles are prevented from penetrating into the internal mechanical structure and groove and being difficult to clean completely, thereby improving the cleanliness of the internal production environment of the equipment and thus increasing the yield of the extended products. At the same time, it also reduces the risk of mechanical damage to the internal mechanical structure of the equipment caused by particle accumulation.
[0015] This utility model also provides a monolithic epitaxial device with the aforementioned particle blocking device, comprising a base ring and a quartz assembly. The base ring has an inlet groove, an outlet groove, and a valve groove. The quartz assembly has a rotating concave hole. The valve groove stopper is used to insert into the valve groove. When the valve groove stopper is inserted into the valve groove, one side of the valve groove stopper completely covers the valve groove. The concave hole stopper is used to insert into the rotating concave hole. When the concave hole stopper is inserted into the rotating concave hole, the upper end face of the concave hole stopper abuts against the quartz assembly. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the overall structure of the particle blocking device of this utility model;
[0017] Figure 2 This is a top view of the particle blocking device of this utility model;
[0018] Figure 3 This is a schematic diagram of the working state of the particle blocking device of this utility model. Detailed Implementation
[0019] like Figure 1 and Figure 2 As shown, this embodiment of a particle blocking device for a single-wafer epitaxial device includes a valve groove stopper 1, a recessed hole stopper 2, and a connecting strip 3. The valve groove stopper 1 has an axisymmetric structure, including a fan ring 11 and a plug 12 fixedly connected to the fan ring 11. Both the fan ring 11 and the plug 12 are rounded to avoid damage to the epitaxial device during use. One side of the plug 12 is straight, and the other side is arc-shaped, with the arc-shaped side connected to the fan ring 11. In this embodiment, the fan ring 11 has a central angle of 80 degrees, a radius of 16.75 cm, a thickness of 1 cm, and a height of 3.7 cm. The plug 12 has a length of 21 cm, a height of 2.1 cm, and a side width of 11 cm.
[0020] The concave stopper 2 is open at the top and closed at the bottom, forming a funnel shape that is wider at the top and narrower at the bottom. The top circular opening and the bottom circular closed base are smoothly connected by a curved surface. In this embodiment, the top of the concave stopper 2 is a circular opening with a radius of 10cm, the bottom circular closed base has a radius of 3.8cm, and the overall height is 4cm.
[0021] One end of the connecting strap 3 is connected to the valve groove stopper 1, with the connection point located at the center of the lower end face of the fan ring 11; the other end of the connecting strap 3 is connected to the recessed stopper 2, with the connection point located on the circular opening at the top of the recessed stopper 2. In this embodiment, the length of the connecting strap is 22cm.
[0022] like Figure 3 As shown, the reaction chamber of the existing monolithic epitaxial device includes a base ring 4 and a quartz component 5, both of which contain multiple grooved sections: arc-shaped grooves 6, 7, and 8 and a rotating concave hole 9. The arc-shaped grooves 6 and 7 are air inlet and exhaust channels, respectively. The deep part of groove 8 is a valve structure through which a robotic arm enters and exits the chamber. The lower end of the rotating concave hole 9 is a rotating lifting structure. After the equipment has been running stably for a period of time, a large amount of chemical reaction byproducts have accumulated on the inner wall of groove 7. During the cleaning process, the chemical reaction byproducts are dispersed into a large number of fine particles, which are scattered and spread to various grooves. The deep parts of groove 8 and the rotating concave hole 9 are other closed mechanical structures that are difficult to disassemble and clean. When the equipment restarts, the particles hidden deep inside return to the chamber with the movement of the mechanical structures, contaminating the reaction environment.
[0023] The usage process of this utility model is as follows: The plug 12 is fully embedded into the groove 8, and the outer surface of the fan ring 11 completely covers the outside of the valve groove, tightly fitting the inner wall of the base ring 4, thereby completely sealing the groove 8 and preventing fine particles from entering it. At the same time, the closed base at the lower end of the concave hole plug 2 is fully embedded into the rotating concave hole 9, and the outer wall of the circular opening at the upper end completely fits the arc-shaped inner wall of the quartz component 5. The particles are not only completely blocked, but scattered particles are also collected by the plug due to gravity as the quartz component 5 sinks. This not only facilitates centralized cleaning but also prevents further scattering of particles.
Claims
1. A particle blocking device, characterized in that, It includes a valve groove stopper (1), a concave hole stopper (2), and a connecting band (3). The concave hole stopper (2) is open at the top and closed at the bottom, forming a funnel shape that is wider at the top and narrower at the bottom. One end of the connecting band (3) is connected to the valve groove stopper (1), and the other end is connected to the concave hole stopper (2).
2. The particle blocking device as described in claim 1, characterized in that, The valve groove stopper (1) includes a fan ring (11) and a plug (12) fixedly connected to the fan ring (11). The plug (12) is used to insert into the valve groove. When the plug (12) is inserted into the valve groove, one side of the fan ring (11) abuts against the outside of the valve groove to block the valve groove.
3. The particle blocking device as described in claim 2, characterized in that, Both the fan ring (11) and the plug (12) are rounded.
4. The particle blocking device as described in claim 2, characterized in that, The fan ring (11) has a central angle of 72-88°, a radius of 16-18cm, a height of 3.5-4cm, and a thickness of 0.8-1.2cm.
5. The particle blocking device as described in claim 2, characterized in that, The plug (12) is 18-24cm long, 9-11cm wide, and 2-2.2cm high.
6. The particle blocking device as described in claim 1, characterized in that, The upper opening radius of the concave hole plug (2) is 4.5 to 5.5 cm, the lower closed circular base radius is 1.8 to 2 cm, and the depth of the concave hole plug (2) is 3 to 5 cm.
7. The particle blocking device as described in claim 1, characterized in that, The connection point between the connecting band (3) and the valve groove stop (1) is located at the center of the lower end face of the valve groove stop (1), and the connection point between the connecting band (3) and the concave hole stop (2) is located on the upper opening of the concave hole stop (2).
8. The particle blocking device as described in claim 1, characterized in that, The length of the connecting strip is 18-22cm.
9. A monolithic epitaxial device having a particle barrier as described in any one of claims 1 to 8, characterized in that, It has a base ring and a quartz assembly. The base ring has an air inlet groove, an air outlet groove and a valve groove. The quartz assembly has a rotating concave hole. The valve groove stopper (1) is used to insert into the valve groove. When the valve groove stopper (1) is inserted into the valve groove, one side of the valve groove stopper (1) completely covers the valve groove. The concave hole stopper (2) is used to insert into the rotating concave hole. When the concave hole stopper (2) is inserted into the rotating concave hole, the upper end face of the concave hole stopper (2) abuts against the quartz assembly.