Chemical vapor deposition reaction chamber structure and equipment

Abstract

The utility model provides a chemical vapor deposition reaction chamber structure and equipment, and relates to the technical field of chemical vapor deposition equipment. The chemical vapor deposition reaction chamber structure comprises a chamber body, a spray header, a tray, a temperature sensing device and a heating device. The spray header is arranged in the chamber body, and the bottom wall of the spray header is divided into a plurality of temperature control areas; the tray is arranged in the chamber body and is positioned below the spraying head; the temperature sensing device is used for respectively measuring the temperature of the plurality of temperature control areas; and the heating device is used for respectively heating the plurality of temperature control areas. According to the scheme, the consistency of the thickness of the film and the expected thickness is improved, meanwhile, the uniformity of the film is improved, the isolation effect, the heat stability, the mechanical strength and other performance of the film are improved, and the product quality is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to chemical vapor deposition equipment technical field, concretely relates to a chemical vapor deposition reaction chamber structure and equipment. BACKGROUND

[0002] Chemical vapor deposition equipment has wide application in semiconductor processing, and chemical vapor deposition is a technology for generating a solid film by chemical reaction of gaseous precursors on a substrate surface or between layers, and the thickness and uniformity of the film are usually required to be high in semiconductor products.

[0003] At present, the time from the instruction sending to the execution of the factory dispatching system is difficult to control, and the chemical vapor deposition machine table will be frequently idle for a short time, so that the temperature of the shower head is reduced, when the reaction gas passes through the shower head with reduced temperature, the decomposition speed of the reaction gas is slowed down, thereby causing the deposited film to be thin; in addition, different regions of the idle shower head have temperature non-uniformity, but since the film is sensitive to the environmental temperature during deposition, the uniformity of the film is also greatly deteriorated. These factors change the performance of the film, such as causing the insulation effect to decrease, the thermal stability to weaken, and the mechanical strength to decrease, etc. SUMMARY

[0004] In view of the problems existing in the prior art, the utility model provides a chemical vapor deposition reaction chamber structure and equipment to improve the problem that the existing chemical vapor deposition equipment is frequently idle for a short time, causing the temperature of the shower head to decrease, and thereby causing the deposited film to be thin and the uniformity of the film to be poor.

[0005] To achieve the above-mentioned purpose and other related purposes, the utility model provides a chemical vapor deposition reaction chamber structure in the first aspect, which comprises a chamber body, a shower head, a tray, a temperature sensing device and a heating device. The shower head is arranged in the chamber body, and the bottom wall of the shower head divides a plurality of temperature control zones; the tray is arranged in the chamber body and located below the shower head; the temperature sensing device is used for measuring the temperature of each temperature control zone; and the heating device is used for heating each temperature control zone.

[0006] In an embodiment of the utility model, the plurality of temperature control zones are coaxial temperature control zones.

[0007] In an embodiment of the utility model, the heating device comprises a plurality of heating parts corresponding to the temperature control zones respectively, and the heating part heats the temperature control zone corresponding thereto.

[0008] In an embodiment of the utility model, a plurality of heating zones corresponding one-to-one to the temperature control zones are arranged on the tray, and the heating part is arranged in the heating zone.

[0009] In an embodiment of the utility model, the heating part includes heating lamp, heating lamp is heating to the temperature control area of the shower head bottom wall.

[0010] In an embodiment of the utility model, the tray bottom is provided with support column, first drive mechanism is connected on the support column, first drive mechanism drives the tray rotation.

[0011] In an embodiment of the utility model, the temperature sensing device is infrared temperature measuring device, infrared temperature measuring device is arranged on the chamber body;The chemical vapor deposition reaction chamber structure includes controller, the controller controls the temperature sensing device temperature measurement to the temperature control area, and according to the temperature measurement result controls the heating device and carries out heating to temperature control area respectively.

[0012] In an embodiment of the utility model, the outer wall of the chamber body is provided with recess, and the infrared temperature measuring device is arranged in the recess.

[0013] In an embodiment of the utility model, the temperature sensing device includes second drive mechanism, and the second drive mechanism drives the infrared temperature measuring device to measure the temperature of multiple points of the temperature control area respectively.

[0014] The second aspect of the utility model provides a kind of chemical vapor deposition equipment, including the chemical vapor deposition reaction chamber structure of any one of the above.

[0015] In combination with prior art, the beneficial effects of the utility model are as follows:

[0016] When the existing chemical vapor deposition forms film, because the idle of chemical vapor deposition machine platform in short time leads to the temperature drop of shower head, and the temperature of different regions of shower head is not uniform, thereby leading to the thickness of film is thin, and uniformity is poor.

[0017] The shower head bottom wall of the application is divided into several temperature control areas, and the temperature sensing device measures the temperature of each temperature control area respectively, and the heating device heats each temperature control area respectively, so that the temperature of the shower head is improved, and the temperature of the shower head is consistent with the preset temperature;The consistency of the temperature of different regions of the shower head is improved, and the problem of uneven temperature of different regions of the shower head is improved.The scheme of the application improves the consistency of the thickness of the film with the expected thickness, improves the uniformity of the film, improves the performance of the film such as insulation effect, thermal stability and mechanical strength, and improves the product quality. BRIEF DESCRIPTION OF DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained from these drawings without creative labor.

[0019] Figure 1 An example chemical vapor deposition reaction chamber structure schematic diagram of the present application;

[0020] Figure 2 An example tray schematic diagram in the chemical vapor deposition reaction chamber structure of the present application;

[0021] Figure 3 An example temperature sensing device schematic diagram of the present application.

[0022] Element number explanation:

[0023] 100, chamber body; 200, shower head; 210, temperature control area; 300, tray; 310, heating area; 400, temperature sensing device; 410, first motor; 420, first support seat; 430, second motor; 440, second support seat; 450, infrared temperature measuring device; 500, heating device; 510, heating part; 600, support column; 700, first driving mechanism. DETAILED DESCRIPTION

[0024] The embodiments of the present application will be described below through specific concrete examples. Those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in the present specification. The present application can also be implemented or applied through other different specific embodiments, and each detail in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that the following embodiments and features in the embodiments can be combined with each other without conflict. It should also be understood that the terms used in the embodiments of the present application are for describing specific specific embodiments, and are not intended to limit the protection scope of the present application. The test methods in the following embodiments are not specified, and are usually performed according to conventional conditions or according to the conditions recommended by each manufacturer.

[0025] When the embodiments give a numerical range, it should be understood that, unless the utility model otherwise specifies, both ends of each numerical range and any one numerical between the two ends can be selected. Unless otherwise defined, all technical and scientific terms used in the utility model are used in the same meaning as the skilled in the art of the present technology and the description of the utility model, and any method, equipment and material of the prior art similar or equivalent to the method, equipment and material in the embodiments of the utility model can be used to realize the utility model.

[0026] It should be understood that the terms such as "upper", "lower", "left", "right", "middle" and "one" cited in the specification are only for the convenience of clear description, and are not used to limit the scope of the utility model which can be implemented, and the change or adjustment of the relative relationship is also regarded as the scope of the utility model which can be implemented without substantial change of technical content.

[0027] The carbon-doped silicon oxide film as the interlayer dielectric can reduce the capacitance between metal wires well and plays an indispensable role in advanced semiconductor integrated circuits. The carbon-doped silicon oxide film is made by chemical vapor deposition technology, which has high requirements for temperature. At present, the time from the issuance of the factory scheduling system to the execution is difficult to control, which leads to frequent short-time idling of the chemical vapor deposition machine. When idling, the temperature of the shower head decreases, and the temperature of the reaction gas decreases when passing through the shower head, which slows down the decomposition rate of the reaction gas, thereby causing the thickness of the deposited film to be thin. At the same time, the temperature of each region of the shower head decreases at different speeds when idling, which leads to the non-uniformity of the temperature of each region of the shower head. The carbon-doped silicon oxide film is sensitive to the ambient temperature during deposition, which will cause the uniformity of the film to be poor, thereby weakening the performance of the film, such as reducing the insulation effect, weakening the thermal stability, reducing the mechanical strength, etc., increasing the risk of circuit leakage and breakdown. In view of this, the utility model provides a chemical vapor deposition reaction chamber structure and a chemical vapor deposition equipment to improve the uniformity of the film.

[0028] Please refer to Figures 1 to 3The utility model provides a chemical vapor deposition reaction chamber structure, including chamber body 100, shower head 200, tray 300, temperature sensing device 400 and heating device 500. Chamber body 100 encloses reaction chamber, to provide deposition environment for thin film deposition. Shower head 200 sets up in chamber body 100, and reaction gas spreads to chamber body 100 evenly via shower head 200, the bottom wall of shower head 200 divides several temperature control area 210, and the temperature of each area of shower head 200 has inhomogeneity, by dividing temperature control area 210 in shower head 200 bottom wall, carries out temperature measurement, heating respectively to different temperature control area 210, improves the accuracy of temperature control of each area of shower head 200. Tray 300 sets up in chamber body 100 and is located the below of shower head 200, and tray 300 is used for placing substrate and other workpieces. Temperature sensing device 400 is used for measuring the temperature of several temperature control area 210 respectively, so as to can obtain the current temperature of each temperature control area 210. Heating device 500 is used for heating several temperature control area 210 respectively, and heating device 500 can heat each temperature control area 210 respectively according to the temperature of each temperature control area 210 measured by temperature sensing device 400, improves the temperature of shower head 200, and carries out temperature control respectively to each area of shower head 200, so that the temperature of each area of shower head 200 is consistent with the expected temperature.

[0029] The utility model discloses temperature sensing device 400 to each temperature control area 210 temperature measurement, heating device 500 to each temperature control area 210 heating, to each area of shower head 200 carries out temperature control respectively, can improve the existing machine short -term idle, and the reaction gas decomposition speed of shower head 200 temperature reduction leads to slow, leads to the problem of thin film thickness partial thin, improves the problem of the film thickness uniformity of poor because of the temperature of each area of shower head 200 is not even simultaneously.

[0030] In an embodiment, the several temperature control zones 210 are coaxial temperature control zones 210, the axis of the temperature control zone 210 is collinear with the axis of the showerhead 200. The gas inlet of the showerhead 200 is usually arranged on the axis of the showerhead 200, and the reaction gas diffuses to the outer periphery of the showerhead 200 after entering the showerhead 200 through the gas inlet, and the temperature at each point on the circumference of the outer periphery circle around the axis of the gas inlet is basically uniform, so the temperature control zone 210 is divided with the axis of the showerhead 200 as the center, the temperature in the same temperature control zone 210 is basically uniform, the temperature to be raised is uniform, and the energy required for temperature rise is uniform, which facilitates the temperature control of the heating device 500 in the temperature control zone 210, improves the uniformity of the temperature of each region of the bottom wall of the showerhead 200, and is of great significance to improve the uniformity of the film. The number of temperature control zones 210 is selected according to actual needs, such as 2 temperature control zones 210, 3 temperature control zones 210, 4 temperature control zones 210, 5 temperature control zones 210 or more temperature control zones 210, according to the actual control accuracy and other production needs.

[0031] In an embodiment, the chemical vapor deposition reaction chamber structure includes a controller, which controls the temperature sensing device 400 to measure the temperature of each temperature control zone 210, and controls the heating device 500 to heat each temperature control zone 210 according to the temperature measured by the temperature sensing device 400. For example, when the machine is idle for a certain period of time, the controller controls the temperature sensing device 400 to measure the temperature of each temperature control zone 210, and the idle time can be set according to actual needs, such as 5S, 8S, 10S, etc. When measuring the temperature of each temperature control zone 210, the number of temperature measurement points is selected according to the area of each temperature control zone 210 and the required control accuracy, and the number of temperature measurement points is set according to actual needs, as described in the following examples. For example, the temperature control zone 210 close to the center of the showerhead 200 has a small range, and a small number of temperature measurement points can be selected, such as 1-2 temperature measurement points; the temperature control zone 210 far from the center of the showerhead 200 has a large range, and a large number of temperature measurement points can be selected, such as 3-4 temperature measurement points, and the average temperature of the multiple temperature measurement points in the temperature control zone 210 is taken as the temperature of the temperature control zone 210, to improve the accuracy of temperature measurement of the temperature control zone 210. The deviation of the measured temperature of the temperature control zone 210 from the set temperature of the temperature control zone 210 is determined, and the controller determines whether the heating device 500 heats the temperature control zone 210 and the power and time required for heating according to the deviation, and then controls the heating device 500 to heat the temperature control zone 210, to realize the individual control of the temperature of each temperature control zone 210, improve the temperature of the showerhead 200, and at the same time improve the non-uniformity of the temperature of each region of the showerhead 200.

[0032] Please refer to Figure 2In an embodiment, the heating device 500 comprises a plurality of heating portions 510 corresponding to the temperature control zones 210 respectively, and the heating portions 510 respectively heat the temperature control zones 210 corresponding thereto. By arranging the heating portions 510 corresponding to the temperature control zones 210 respectively, the control accuracy of the temperature control zones 210 can be improved, and the heating effect of the temperature control zones 210 can be ensured.

[0033] Please refer to Figure 1 and Figure 2 In an embodiment, the tray 300 is provided with a plurality of heating zones 310 corresponding to the temperature control zones 210 respectively, and the heating portions 510 are arranged in the heating zones 310. The tray 300 is arranged below and corresponding to the shower head 200. The heating zones 310 arranged on the tray 300 are more convenient to correspond to the temperature control zones 210. The heating portions 510 arranged on the tray 300 are convenient for the heating portions 510 to heat the temperature control zones 210 on the shower head 200, and the heating efficiency is improved.

[0034] In an embodiment, the heating zone 310 is a coaxial heating zone 310, and the axis of the coaxial heating zone 310 coincides with the axis of the coaxial temperature control zone 210. The plurality of heating zones 310 correspond to the plurality of temperature control zones 210 respectively, so that the heating zone 310 is convenient to heat the temperature control zone 210 corresponding thereto, and the interference of the heating zone 310 to other temperature control zones 210 is reduced.

[0035] In an embodiment, the heating portion 510 comprises a heating lamp, and the heating lamp heats the temperature control zone 210 at the bottom of the shower head 200. The light irradiation range of the heating lamp is the heating range of the heating lamp. By controlling the power and heating time of the heating lamp, the heating effect of the temperature control zone 210 can be controlled, and the deviation between the actual temperature and the set temperature of the temperature control zone 210 can be compensated, the deviation between the actual temperature and the set temperature of the temperature control zone 210 is reduced, and the accurate temperature control of the temperature control zone 210 is improved.

[0036] In an embodiment, the specific number of heating lamps in the heating zone 310 includes but is not limited to one, two, three, four, five or other numbers. The more the number of heating lamps and heating zones 310, the more flexible the adjustment and control mode can be realized, the temperature control of different temperature control zones 210 on the bottom wall of the shower head 200 can be met, and the uniformity of the film thickness is improved.

[0037] In an embodiment, the number of heating lamps is set according to the range of the temperature control area 210. For example, the temperature control area 210 close to the center area has a small range, and a small number of heating lamps, such as 1-2 groups of heating lamps, can be set to balance the heating efficiency and reduce the number of heating lamps, thereby saving the installation space of the heating lamps and improving the utilization rate of the tray 300 space. The temperature control area 210 far from the center area has a large range, and a large number of heating lamps, such as 2-4 groups of heating lamps, can be set to improve the heating efficiency of the temperature control area 210 and meet the application requirements. The actual number of heating lamps is selected according to actual needs, and the above number is only illustrative.

[0038] In an embodiment, the heating lamps are arranged at equal intervals in the heating area 310, and the angles between the heating lamps in the heating area 310 are equal. Of course, as some optional solutions, the plurality of heating lamps can also be arranged at unequal intervals, which is flexibly adjusted and set according to actual needs.

[0039] In an embodiment, the tray 300 is provided with a plurality of grooves for placing the substrates, and the heating lamps are arranged between the grooves, thereby facilitating the arrangement of the heating lamps and reducing the influence of the heating lamps on the substrates.

[0040] In an embodiment, the heating lamps are electrically connected to the controller, and the controller controls the heating power and heating time of each heating lamp according to the temperature measurement result of the temperature sensing device 400, thereby realizing the heating of each heating lamp corresponding to the temperature control area 210, improving the heating efficiency and the accuracy of temperature control, making the actual temperature of each temperature control area 210 close to or equal to the preset temperature, and thereby improving the uniformity and quality of the thin film.

[0041] In an embodiment, the tray 300 is provided with a support column 600, and the support column 600 is connected to a first driving mechanism 700. The first driving mechanism 700 drives the rotation of the tray 300, thereby driving the rotation of the heating part 510, so that the heating part 510 uniformly heats the temperature control area 210, and the temperature in the temperature control area 210 remains consistent, thereby playing a role in temperature control of the temperature control area 210. For example, when the heating part 510 is a heating lamp, the first driving mechanism 700 drives the rotation of the tray 300, thereby driving the rotation of the heating lamp. The rotation of the heating lamp makes the light irradiation range of the heating lamp cover different positions of the temperature control area 210 corresponding to the heating lamp, thereby realizing the overall heating of the temperature control area 210. After heating, the heating lamp is turned off, and the tray 300 is rotated to the initial position.

[0042] In an embodiment, the first driving mechanism 700 is located outside the reaction chamber, and a driving part of the first driving mechanism 700 is connected with the support column 600, so as to drive the support column 600 to rotate, and further drive the tray 300 to rotate. The first driving mechanism 700 is arranged outside the reaction chamber, so as not to occupy the internal space of the reaction chamber, and does not affect various devices inside the reaction chamber.

[0043] Of course, as some optional solutions, the first driving mechanism 700 can also be directly arranged inside the reaction chamber. It should be noted that the specific structure of the first driving mechanism 700 is flexible, as long as it can drive the tray 300 to rotate around the center. For example, the first driving mechanism 700 is a motor, the output shaft of the motor is directly connected with the support column 600, or the output shaft of the motor is connected with the input shaft of a speed reducer, and the output shaft of the speed reducer is connected with the support column 600.

[0044] In an embodiment, the first driving mechanism 700 is electrically connected with a controller, and after obtaining the actual temperature of each temperature control area 210, the controller controls the rotating speed of the first driving mechanism 700 according to a heating strategy, so as to drive the heating device 500 to rotate and heat the shower head 200.

[0045] In an embodiment, the temperature sensing device 400 is an infrared temperature measuring device 450, the infrared temperature measuring device 450 is arranged on the chamber body 100, and the infrared temperature measuring device 450 has radiation energy based on the infrared rays emitted by the bottom wall of the shower head 200, so as to obtain the temperature of the bottom wall of the shower head 200.

[0046] In an embodiment, the infrared temperature measuring device 450 is arranged on the outer wall of the chamber body 100, and the chamber body 100 is made of transparent material. By arranging the infrared temperature measuring device 450 on the outer wall of the chamber body 100, the temperature of the temperature control area 210 of the bottom wall of the shower head 200 can be measured, and the space inside the reaction chamber is not occupied, the various devices inside the reaction chamber are not affected, and the reaction gas is also prevented from being deposited on the infrared temperature measuring device 450.

[0047] Of course, as some optional solutions, the infrared temperature measuring device 450 can also be directly arranged inside the reaction chamber.

[0048] In an embodiment, the infrared temperature measuring device 450 is provided in plurality, and the plurality of infrared temperature measuring devices 450 measure the temperature of the temperature measurement points corresponding to the temperature control areas 210, so as to realize simultaneous temperature measurement of multiple points, reduce the temperature measurement time, improve the accuracy of temperature measurement and the timeliness of temperature, obtain a heating scheme according to the temperature measurement result, and further heat the temperature control areas 210.

[0049] In an embodiment, the plurality of infrared temperature measuring devices 450 are arranged at equal intervals on the outer wall of the chamber body 100, so that the temperature of multiple points can be measured synchronously, and the accuracy of the temperature measurement of multiple points can be improved.

[0050] Of course, as an optional solution, the plurality of infrared temperature measuring devices 450 can also be arranged at unequal intervals on the outer wall of the chamber body 100. The arrangement of the plurality of infrared temperature measuring devices 450 can be flexibly selected.

[0051] In an embodiment, the temperature sensing device 400 comprises a second driving mechanism, which drives the infrared temperature measuring devices 450 to measure the temperature of multiple points of the temperature control area 210, respectively. The angle of the infrared temperature measuring devices 450 is adjusted by the second driving mechanism, so that the temperature of multiple points of the temperature control area 210 can be measured, the number of infrared temperature measuring devices 450 is reduced, and the cost is reduced.

[0052] In an embodiment, the second driving mechanism comprises two driving components, which drive the infrared temperature measuring devices 450 to measure the temperature of different temperature control areas 210 of the bottom wall of the shower head 200. The two driving components can be the same components, for example, two motors are used to drive the infrared temperature measuring devices 450 to rotate in two directions, so that the two-axis movement of the infrared temperature measuring devices 450 is realized, and the temperature of multiple temperature control areas 210 of the bottom wall of the shower head 200 is measured. The two driving components can also be two telescopic rods, which drive the infrared temperature measuring devices 450 to rotate in two directions, so that the two-axis movement of the infrared temperature measuring devices 450 is realized. The two driving components can also be different components, for example, one motor is used to drive the infrared temperature measuring devices 450 to rotate, and a telescopic rod is used to drive the infrared temperature measuring devices 450 to rotate in another direction, so that the infrared temperature measuring devices 450 rotate in two directions, and the temperature of multiple temperature control areas 210 of the bottom wall of the shower head 200 is measured.

[0053] Of course, as an optional solution, the second driving mechanism can also comprise a combination of a motor and a lead screw, a combination of a motor and a gear, etc. The second driving mechanism can be flexibly selected according to actual needs, the infrared temperature measuring devices 450 are driven to move by the second driving mechanism, and then the temperature of multiple temperature measuring points of multiple temperature control areas 210 of the bottom wall of the shower head 200 is measured.

[0054] Please refer to Figure 3In an embodiment, the two driving components are respectively a first motor 410 and a second motor 430, wherein an output shaft of the first motor 410 is connected with a first support base 420, and the first motor 410 drives the first support base 420 to rotate. The second motor 430 is arranged on the first support base 420, an output shaft of the second motor 430 is connected with a second support base 440, and an infrared temperature measuring device 450 is arranged on the second support base 440; the output shaft of the first motor 410 is not parallel to the output shaft of the second motor 430, and preferably, the output shaft of the first motor 410 is parallel to the output shaft of the second motor 430. The first motor 410 drives the first support base 420 to rotate, and drives the infrared temperature measuring device 450 to rotate along the output shaft of the first motor 410; the second motor 430 drives the second support base 440 to rotate, and drives the infrared temperature measuring device 450 to rotate along the output shaft of the second motor 430, so that the infrared temperature measuring device 450 realizes rotation in two directions, and then the plurality of temperature measuring points of the plurality of temperature control areas 210 of the bottom wall of the spray head 200 can be measured.

[0055] In an embodiment, one end of the second support base 440 is fixed with the output shaft of the second motor 430, and the other end of the second support base 440 is rotationally connected with the first support base 420, so as to reduce the radial force received by the output shaft of the second motor 430.

[0056] In an embodiment, the second driving mechanism is electrically connected with the controller, when the machine is idle for a certain time, the controller controls the second driving mechanism to move, and the infrared temperature measuring device 450 measures the temperature of the multiple points of the shower head 200. For example, the controller controls the second driving mechanism to drive the infrared temperature measuring device 450 to measure the temperature of the temperature control area 210 close to the center of the shower head 200, and the values of one or more temperature measuring points of the first temperature control area close to the center of the shower head 200 can be collected, if the values of multiple temperature measuring points are collected, the average value of the multiple temperature measuring points is taken as the actual temperature of the first temperature control area. After measuring the temperature of the first temperature control area close to the center of the shower head 200, the second driving mechanism is controlled to drive the infrared temperature measuring device 450 to deflect by a certain angle, so that the infrared temperature measuring device 450 measures the temperature of the second temperature control area adjacent to the first temperature control area, and the second temperature control area can be provided with one or more temperature measuring points, when the second temperature control area has multiple temperature measuring points, the infrared temperature measuring device 450 obtains the temperature of one temperature measuring point, and then the second driving mechanism drives the infrared temperature measuring device 450 to deflect to other temperature measuring points in the second temperature control area, and after obtaining the temperatures of the multiple temperature measuring points in the second temperature control area, the average value of the temperatures of the multiple temperature measuring points is taken as the actual temperature in the second temperature control area. According to the number of temperature control areas 210, the second driving mechanism drives the infrared temperature measuring device 450 to measure the temperature of the temperature control area 210. After the controller obtains the actual temperature of the temperature control area 210, the actual temperature of the temperature control area 210 is compared with the preset temperature, so as to obtain the deviation degree of the actual temperature and the preset temperature, and whether the temperature control area 210 needs to be heated and the temperature of the heating required are determined according to the deviation degree, so as to determine the heating strategy of the heating device 500, and the heating strategy includes but is not limited to heating power and heating time.

[0057] In an embodiment, a groove is arranged on the outer wall of the chamber body 100, and the infrared temperature measuring device 450 is arranged in the groove, so as to facilitate the installation of the infrared temperature measuring device 450.

[0058] The second aspect of the utility model provides a chemical vapor deposition equipment, including any one of the chemical vapor deposition reaction chamber structure, the chemical vapor deposition equipment still includes other structure, please refer to the existing chemical vapor deposition equipment, this application does not make superfluous repetition here.

[0059] Therefore, the utility model effectively overcomes some practical problems in the prior art, thereby having high utilization value and use significance.

[0060] The chemical vapor deposition reaction chamber structure and the chemical vapor deposition equipment of the application, by measuring the temperature of different temperature control zones 210 of the shower head 200, and then adjusting the temperature of different temperature control zones 210 of the shower head 200 through the heating device, so that the reaction gas can maintain a relatively ideal temperature range after passing through each region of the shower head 200, so that the film thickness is ideal or close to the ideal thickness, and the deposition is more uniform, the uniformity of the film is improved, and the stability of the device is finally improved.

[0061] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.

Claims

1. A chemical vapor deposition reaction chamber structure, characterized in that, include: chamber body; A spray head is disposed within the chamber body, and the bottom wall of the spray head is divided into several temperature control zones; A tray is disposed within the chamber body and located below the spray head; A temperature sensing device is used to measure the temperature of the several temperature control zones respectively; A heating device is used to heat the several temperature-controlled zones respectively.

2. The chemical vapor deposition reaction chamber structure according to claim 1, characterized in that, Some of the temperature control zones are coaxial temperature control zones.

3. The chemical vapor deposition reaction chamber structure according to claim 1, characterized in that, The heating device includes several heating sections corresponding to the temperature control zones, and the heating sections heat the temperature control zones corresponding to them.

4. The chemical vapor deposition reaction chamber structure according to claim 3, characterized in that, The tray is provided with several heating zones that correspond one-to-one with the temperature control zone, and the heating element is located in the heating zone.

5. The chemical vapor deposition reaction chamber structure according to claim 4, characterized in that, The heating element includes a heating lamp that heats the temperature control zone on the bottom wall of the spray head.

6. The chemical vapor deposition reaction chamber structure according to claim 4, characterized in that, The bottom of the tray is provided with a support column, and a first drive mechanism is connected to the support column. The first drive mechanism drives the tray to rotate.

7. The chemical vapor deposition reaction chamber structure according to claim 1, characterized in that, The temperature sensing device is an infrared thermometer, which is mounted on the chamber body. The chemical vapor deposition reaction chamber structure includes a controller, which controls the temperature sensing device to measure the temperature of the temperature control zone and controls the heating device to heat the temperature control zone separately based on the temperature measurement results.

8. The chemical vapor deposition reaction chamber structure according to claim 7, characterized in that, A groove is provided on the outer wall of the chamber body, and the infrared temperature measuring device is disposed in the groove.

9. The chemical vapor deposition reaction chamber structure according to claim 7, characterized in that, The temperature sensing device includes a second driving mechanism, which drives the infrared thermometer to measure the temperature at multiple points in the temperature control zone.

10. A chemical vapor deposition apparatus, characterized in that, The chemical vapor deposition reaction chamber structure includes any one of claims 1 to 9.

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