Wafer spin-drying fixing device
By combining the limiting device and the pressing device, the problems of scratches and rubber sleeve damage caused by gaps during the wafer spin-drying process are solved, achieving stable fixation and convenient loading and unloading, and improving the protection effect of the wafer.
Patent Information
- Application Number
- CN202520349414.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-03
- Publication Date
- 2026-02-10
- Estimated Expiration
- 2035-03-03
AI Technical Summary
In the prior art, the relative movement caused by gaps during the spin-drying process of wafers can lead to scratches or damage, and the rubber sleeve on the surface of the baffle is easily damaged and contaminates the wafers.
The device employs a limiting device and a pressing device, including a limiting post and a scissor lift driven by a double-headed stud. The distance between the pressure bar and the wafer is adjusted by the scissor lift, and a silicone sleeve is wrapped around the surface of the pressure bar to achieve a stable fixation.
This method achieves stable fixation of the wafers, avoiding scratches and damage to the rubber sleeves caused by relative movement, and improving the convenience of loading and unloading as well as the reliability of the fixing device.
Smart Images

Figure CN223899683U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to a wafer spin-drying fixing device and belongs to the field of semiconductor chip processing equipment. BACKGROUND
[0002] After polishing and cleaning, semiconductor wafers need to be treated by a spin-drying machine. The wafers are inserted horizontally into a spin-drying box, which is then fixed in the spin-drying cavity of a vertical spin-drying machine. The high-speed rotation of the spin-drying machine dries the water droplets on the wafer surface.
[0003] To prevent the wafers inserted into the spin-drying box from being thrown out during high-speed rotation, a utility model patent titled "Sleeve for shaft and semiconductor wafer rotary rinsing spin-drying machine comprising same" (CN208954948U) discloses a vertical wafer spin-drying machine fixing device. The technical solution is to use a stop rod fixed in the spin-drying cavity to press and fix the stacked wafers from the side. However, to facilitate the installation and removal of the spin-drying box, a gap of more than 1mm is generally reserved between the spin-drying box and the positioning element. On the other hand, to facilitate the loading and removal of the wafers, a certain gap is also required between the wafers and the spin-drying box positioning groove. Therefore, when the wafers are installed in the spin-drying cavity of the vertical spin-drying machine through the spin-drying box, the gap between the edges of the wafers and the stop rod will be larger (generally 2-3mm). During high-speed rotation, the wafers are prone to violent relative movement, which has the following defects:
[0004] 1) causing scratches or damage to the wafer surface;
[0005] 2) the edges of the wafers frequently collide with the stop rod at high speed, causing the rubber sleeve on the surface of the stop rod to break and contaminate the wafers. To prevent the rubber sleeve from breaking, it must be replaced frequently. SUMMARY
[0006] In view of the defects in the prior art, the utility model aims to provide a wafer spin-drying fixing device that is convenient and fast to assemble and disassemble, and stable and reliable in pressing and fixing.
[0007] To achieve the above-mentioned purpose, the utility model adopts the following technical solution: it includes a limiting device and a pressing device. The limiting device is composed of two front limiting columns, two side limiting columns, and two rear limiting columns fixedly connected between the top disc and the bottom disc. The top disc has a window. The pressing device is composed of a double-headed stud rotatably installed between the top disc and the bottom disc, two nuts installed on the double-headed stud, a scissor frame hinged to the two nuts, a stand column movably connected to the scissor frame, two mounting plates fixed to the stand column, and two pressing rods fixed to the two mounting plates. The two threads on the double-headed stud are in opposite directions.
[0008] The above technical solution also includes a guiding mechanism, which consists of a guide groove on the chassis, a lower slider located at the bottom of the column and adapted to the guide groove, a limiting block fixed on the top plate and having a guide cavity, and an upper slider located at the top of the column and adapted to the guide cavity.
[0009] A handwheel is fixed on the double-ended stud in the above technical solution.
[0010] The surface of the pressure rod in the above technical solution is covered with a silicone sleeve.
[0011] The chassis surface in the above technical solution is fixed with pads.
[0012] Compared with the prior art, this utility model has the following advantages due to the adoption of the above-mentioned technical solution:
[0013] 1) The top pressing device adopts a double-headed stud driven scissor frame, so the distance between the pressure bar and the wafer can be adjusted by the scissor frame. This ensures good contact between the pressure bar and the wafer, completely eliminating various defects caused by the relative movement of the wafer due to the gap, and also facilitates the loading and unloading of the spin dryer.
[0014] 2) The original single pressure bar was replaced with two pressure bars, so the wafer can be pressed and fixed from two directions, achieving a stable effect similar to a "V-shaped positioning block". Attached Figure Description
[0015] Figure 1 This is a three-dimensional structural schematic diagram of the present invention;
[0016] Figure 2 yes Figure 1 A schematic diagram of the three-dimensional structure after removing the top plate;
[0017] Figure 3 This is a three-dimensional structural diagram of the top-pressing device of this utility model;
[0018] Figure 4 yes Figure 3 View A in the middle;
[0019] Figure 5 This is a cross-sectional view of the present invention;
[0020] Figure 6 yes Figure 5 Top view;
[0021] Figure 7 yes Figure 5 Enlarged view of point I in the image;
[0022] Figure 8 This is a 3D structural diagram of the spin dryer box.
[0023] In the diagram: Limiting device 1, top plate 1-1, window 1-2, rear limiting post 1-3, pad block 1-4, base plate 1-5, side limiting post 1-6, front limiting post 1-7, guide groove 1-8;
[0024] Top pressing device 2, nut 2-1, double-ended stud 2-2, pressure rod 2-3, scissor fork bracket 2-4, column 2-5, mounting plate 2-6, limit block 2-7, handwheel 2-8, upper slider 2-9, slide groove 2-10, sliding pin 2-11, lower slider 2-12, guide cavity 2-13;
[0025] Spin-dry box 3, back ridge 3-1, side ridge 3-2, flange 3-3, wafer 4. Detailed Implementation
[0026] The present invention will be further described below with reference to the accompanying drawings and specific embodiments.
[0027] like Figures 1-7 As shown: This utility model includes a limiting device 1 and a pressing device 2. The limiting device 1 consists of a top plate 1-1 and a bottom plate 1-5 arranged horizontally in a vertical configuration, two front limiting posts 1-7, two side limiting posts 1-6, and two rear limiting posts 1-3 fixedly connected between the top plate 1-1 and the bottom plate 1-5. The top plate 1-1 has a window 1-2 for easy loading and unloading of the spin-drying box 3. The pressing device 2 consists of a double-ended stud 2-2 rotatably mounted between the top plate 1-1 and the bottom plate 1-5, two nuts 2-1 respectively engaged with two sections of thread on the double-ended stud, a scissor lift 2-4 hinged to the two nuts 2-1, a column 2-5 movably connected to the scissor lift, two mounting plates 2-6 fixed to the column, and two pressure rods 2-3 fixed to the two mounting plates 2-6. The two sections of thread on the double-ended stud 2-2 have opposite directions of rotation. The column 2-5 has a vertically oriented groove 2-10, and two sliding pins 2-11 located in the groove are respectively hinged to one end of the scissor lift 2-4.
[0028] To prevent the top pressing device 2 from rotating with the double-headed stud 2-2, this utility model also includes a guiding mechanism. The guiding mechanism consists of a guide groove 1-8 formed on the base plate 1-5, a lower slider 2-12 located at the bottom of the column 2-5 and adapted to the guide groove, a limiting block 2-7 fixed on the top plate 1-1 and having a guide cavity 2-13, and an upper slider 2-9 located at the top of the column 2-5 and adapted to the guide cavity 2-13.
[0029] To facilitate the rotation of the double-ended stud 2-2, a handwheel 2-8 is fixed by a square tenon.
[0030] To protect wafer 4 from damage due to compression, the surface of pressure bar 2-3 is covered with a silicone sleeve (not shown in the figure).
[0031] For ease of processing, pads 1-4 are fixed to the surface of the chassis 1-5.
[0032] In use, this utility model can be fixed to the turntable of a vertical spin dryer with screws. Its working principle is as follows: the spin dryer box 3, containing several wafers 4, is placed into the limiting device 1 through window 1-2, ensuring that the two back protrusions 3-1 of the spin dryer box 3 contact the two rear limiting posts 1-3, that the two side protrusions 3-2 of the spin dryer box 3 contact the side limiting post 1-6 on one side, and that the flanges 3-3 on both sides of the front of the spin dryer box 3 are correspondingly embedded in the grooves of the two front limiting posts 1-7 (see...). Figure 5 This completes the positioning of the spin dryer box 3.
[0033] Rotating the handwheel 2-8 forward causes the two nuts 2-1 to move relative to each other along the double-ended stud 2-2 under the action of the reverse thread. The scissor lift 2-4, through the column 2-5 and with the help of the mounting plate 2-6, pushes the two pressure rods 2-3 to contact the edges of each wafer 4 and press them firmly into the positioning slots of the spin dryer 3 (see...). Figures 5-6 Starting the motor of the spin dryer allows for centrifugal drying of the wafers.
[0034] After spin drying, turn the handwheel 2-8 in the opposite direction. Under the action of the reverse thread, the two nuts 2-1 move away from each other along the double-ended stud 2-2. The scissor lift 2-4 pulls the two pressure rods 2-3 through the column 2-5 with the help of the mounting plate 2-6, and disengages from each wafer 4. The spin drying box 3 containing several wafers 4 can then be taken out through the window 1-2.
Claims
1. A wafer spin-drying and fixing device, comprising a limiting device (1) and a pressing device (2); characterized in that: The limiting device (1) consists of two front limiting posts (1-7), two side limiting posts (1-6) and two rear limiting posts (1-3) fixedly connected between the top plate (1-1) and the base plate (1-5). A window (1-2) is provided on the top plate (1-1). The pressing device (2) consists of a double-headed stud (2-2) rotatably installed between the top plate (1-1) and the base plate (1-5), two nuts (2-1) installed on the double-headed stud, a scissor lift (2-4) hinged to the two nuts (2-1), a column (2-5) movably connected to the scissor lift, two mounting plates (2-6) fixed on the column, and two pressure rods (2-3) fixed on the two mounting plates (2-6). The two threads distributed on the double-headed stud (2-2) have opposite directions of rotation.
2. The wafer spin-drying and fixing device according to claim 1, characterized in that: It also includes a guiding mechanism, which consists of a guide groove (1-8) on the chassis (1-5), a lower slider (2-12) located at the bottom of the column (2-5) and adapted to the guide groove, a limiting block (2-7) fixed on the top plate (1-1) and having a guide cavity (2-13), and an upper slider (2-9) located at the top of the column (2-5) and adapted to the guide cavity (2-13).
3. The wafer spin-drying and fixing device according to claim 1, characterized in that: A handwheel (2-8) is fixed on the double-ended stud (2-2).
4. The wafer spin-drying and fixing device according to claim 1, characterized in that: The surface of the pressure rod (2-3) is covered with a silicone sleeve.
5. The wafer spin-drying and fixing device according to any one of claims 1 to 4, characterized in that: The chassis (1-5) surface is fixed with pads (1-4).
Citation Information
Patent Citations
Sleeve for shaft lever and semiconductor wafer rotary washing and spin-drying machine comprising same
CN208954948U