Atomic air chamber with chamfered air exhaust holes
By designing a beveled structure for the atomic gas chamber, the fluidity and discharge effect of the cleaning fluid were improved, solving the problems of high cleaning difficulty and low cleanliness of the atomic gas chamber, and achieving higher internal cleanliness and working performance.
Patent Information
- Application Number
- CN202520290443.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-09
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2036-01-09
AI Technical Summary
The existing atomic gas chamber is difficult to clean, has low internal cleanliness, and therefore its performance is reduced.
A chamfered atomic gas chamber with an extraction port is designed. The chamfered structure improves the flow channel of the cleaning fluid, and the cleaning fluid is discharged by combining gravity and centrifugal force, ensuring that the inside of the gas chamber is thoroughly cleaned.
It improves the cleanliness of the atomic gas chamber, enhances its working performance, ensures thorough cleaning of the inner wall of the gas chamber, and avoids cleaning fluid residue.
Smart Images

Figure CN223902557U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to quantum measurement and sensing technical field especially relates to a pumping hole chamfered atom gas chamber. BACKGROUND
[0002] The alkali metal atom (such as 133Cs, 87Rb, 85Rb, etc.) has only one valence electron outside the nucleus, and the energy level structure is simple, easy to adopt laser to regulate and measure its quantum state, therefore obtains the wide application in the quantum measurement and sensing field. The inert gas atom (such as 3He, 129Xe, 131Xe, etc.) has very long coherence time of atomic nucleus spin, can be used for the sensing of magnetic field, angular velocity and other physical quantities. The iodine molecule, acetylene molecule with stable energy level, its electronic transition energy level is relatively stable, can be used for laser frequency stabilization. The typical application of the above-mentioned atom or molecule has: (1) nuclear magnetic resonance gyro generally adopts alkali metal atom, utilizes spin exchange optical pumping technology to make alkali metal atom spin polarization, and the polarized alkali metal atom is used to make inert gas nucleus spin polarization on one hand, and is used to constitute the embedded magnetometer to detect nucleus spin movement information. This nuclear magnetic resonance gyro has the advantages of small size, high precision, etc., has great application potential in the inertial technology field. (2) atomic magnetometer utilizes the change of alkali metal atom precession frequency with external magnetic field to detect magnetic field, has very high sensitivity, and does not need refrigeration device, has obtained the wide application in the national defense, medical treatment, geology and other fields. (3) atomic clock utilizes the hyperfine energy level transition of alkali metal atom (such as 87Rb, 85Rb) to realize frequency standard, has important application in the positioning time service field. (4) utilizing the characteristics of large electric dipole moment of high energy level of alkali metal atom (such as 133Cs, 87Rb, 85Rb), can be used to realize the precision sensing or measurement of electric field, has good application value in the microwave precision measurement field. (5) utilizing iodine molecule, acetylene molecule can carry out laser frequency stabilization.
[0003] In the above-mentioned application, generally needs to seal the working gas (alkali metal atom or / and inert gas atom or stable energy level molecule) in the atom gas chamber formed by the light-transmitting medium (for example high borosilicate glass, quartz glass, light-transmitting ceramic and other materials). The atom or molecule in the atom gas chamber is in the violent thermal motion, and will collide with the inner wall of the atom gas chamber or other gas atoms and molecules in the gas chamber. When the atom or molecule collides with the inner wall of the atom gas chamber, the state of its electron or atomic nucleus will change to a certain extent, thereby affecting its use performance. For example, the collision of alkali metal atom and the inner wall of the atom gas chamber will cause the decoherence of electron spin state, and affect the sensitivity of atomic magnetometer. The inner wall of the atom gas chamber will generally adsorb some non-working gas, and if not cleaned, will also have certain influence on the quantum state of the working gas. For example, the Rydberg electric field meter used for microwave measurement requires that the inside of the atom gas chamber has very high vacuum degree, and needs to eliminate non-working impurity gas as much as possible.
[0004] In order to realize clean atom gas chamber inner wall, reduce the adsorption of non-working gas, generally can adopt cleaning liquid to clean the inside of the gas chamber, but due to the small outlet of the atom gas chamber, how to discharge the cleaning liquid is a difficult problem, which affects the use performance of the atom gas chamber. Practical new type content
[0005] In order to make up for the above shortcomings, the utility model provides a gas extraction hole chamfered atom gas chamber, aims at improving the atom gas chamber cleaning difficulty in prior art, the internal cleanliness is lower, the atom gas chamber inner wall is not cleaned and leads to the problem of working performance decline.
[0006] In order to realize the above purpose, the utility model adopts the following technical scheme: a gas extraction hole chamfered atom gas chamber, including atom gas chamber main casing, the atom gas chamber main casing lower part is fixedly connected with gas extraction pipe body, the atom gas chamber main casing inside is equipped with gas storage chamber, the gas storage chamber lower middle part is equipped with chamfered body, the chamfered body lower part is equipped with gas extraction hole body, the atom gas chamber main casing lower part is provided with light transmission sheet.
[0007] As a further description of the above technical scheme:
[0008] The chamfered body adopts laser or mechanical processing.
[0009] As a further description of the above technical scheme:
[0010] The atom gas chamber main casing inner wall adopts polishing process, and the atom gas chamber main casing inner wall is provided with a plating antireflection film.
[0011] As a further description of the above technical scheme:
[0012] The gas extraction pipe body is located directly below the gas extraction hole body, and the chamfered body is in the shape of a horn.
[0013] As a further description of the above technical scheme:
[0014] The atom gas chamber main casing inner cavity face bottom is provided with a concave surface.
[0015] The utility model has the advantages of the following beneficial effects:
[0016] In the utility model, by designing chamfer, the shape of the cleaning liquid flow channel is improved, the flow resistance is reduced, the cleaning liquid can be discharged better, the residual cleaning liquid in the gas chamber is avoided, better cleaning effect is achieved, the cleanliness of the atom gas chamber is improved, and the working performance of the atom gas chamber is improved. Accompanying drawing
[0017] Fig. 1A plane type schematic diagram of the atom gas chamber with the air exhaust hole chamfer is provided in the utility model.
[0018] Fig. 2 A concave type schematic diagram of the atom gas chamber with the air exhaust hole chamfer is provided in the utility model.
[0019] Fig. 3 An atom gas chamber main shell schematic diagram of the atom gas chamber with the air exhaust hole chamfer is provided in the utility model.
[0020] Legend:
[0021] 1, atom gas chamber main shell; 2, air exhaust pipe body; 3, air exhaust hole body; 4, glass sheet; 5, chamfer body; 6, gas storage chamber; 7, concave surface. Specific implementation
[0022] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.
[0023] Reference Figs. 1-3 An embodiment provided by the utility model: an atom gas chamber with air exhaust hole chamfer, including atom gas chamber main shell 1, atom gas chamber main shell 1 lower part fixedly connected with air exhaust pipe body 2, atom gas chamber main shell 1 inside is provided with gas storage chamber 6, and gas storage chamber 6 lower middle part is provided with chamfer body 5, and chamfer body 5 lower part is provided with air exhaust hole body 3, and atom gas chamber main shell 1 lower part is provided with light transmission sheet 4, chamfer body 5 adopts laser or mechanical processing, atom gas chamber main shell 1 inner wall adopts polishing process, atom gas chamber main shell 1 inner wall is provided with plating antireflection film, air exhaust pipe body 2 is located just below air exhaust hole body 3, chamfer body 5 is trumpet shape, and atom gas chamber main shell 1 inner cavity surface bottom is provided with concave surface 7.
[0024] By injecting the cleaning liquid into the atom gas chamber main shell 1 for cleaning, and on the basis of reasonably placing the atom gas chamber main shell 1, the cleaning liquid that needs to be discharged can flow out smoothly, the cleaning liquid can flow to the chamfer body 5 under the action of gravity, and is discharged smoothly through the air exhaust hole body 3, so that the residual cleaning liquid in the gas chamber is effectively avoided, the gas chamber is completely cleaned, and finally the atom gas chamber can be further placed in a centrifugal machine, the centrifugal force is utilized to further accelerate the discharge of the cleaning liquid, any potential residual cleaning liquid can be completely removed, the cleanliness of the atom gas chamber is enhanced, and the working performance of the atom gas chamber is effectively improved. The concave surface 7 can further improve the discharge effect of the cleaning liquid.
[0025] Working principle: by injecting cleaning liquid into the atomic gas chamber main shell 1, then by reasonable placement of the atomic gas chamber main shell 1, the cleaning liquid is smoothly discharged, due to the increase of the chamfer body 5, the cleaning liquid can be smoothly and naturally flowed to the chamfer body 5 under the action of gravity, and flowed out through the air extraction hole body 3, so as to avoid the residue of the cleaning liquid in the gas chamber, finally the atomic gas chamber is placed on the centrifuge to discharge the cleaning liquid by the centrifugal force, so as to achieve better cleaning effect, improve the cleanliness of the atomic gas chamber, and improve the working performance of the atomic gas chamber.
[0026] Finally, it should be pointed out that: the above only for the preferred embodiments of the present application, and is not intended to limit the present application, although the foregoing embodiments of the present application are described in detail, for those skilled in the art, it still can be modified, or part of the technical features of the equivalent replacement, within the spirit and principles of the present application, any modification, equivalent replacement, improvement, etc., should be included in the scope of protection of the present application.
Claims
1. A pumping aperture chamfered atomic gas cell comprising an atomic gas cell main housing (1), characterized in that: The lower part of the atom gas chamber main shell (1) is fixedly connected with the exhaust pipe body (2), the inside of the atom gas chamber main shell (1) is provided with a gas storage chamber (6), the lower middle part of the gas storage chamber (6) is provided with a chamfer body (5), the lower part of the chamfer body (5) is provided with an exhaust hole body (3), and the lower part of the atom gas chamber main shell (1) is provided with a light transmission sheet (4).
2. A pumped-liner atom chamber according to claim 1, wherein: The chamfer body (5) is processed by laser or machinery.
3. A pumped-liner atom chamber according to claim 1, wherein: The inner wall of the atom gas chamber main shell (1) is processed by polishing, and the inner wall of the atom gas chamber main shell (1) is provided with a plating anti-reflection film.
4. A pumped-liner atomica! cell according to claim 1, wherein: The exhaust pipe body (2) is located directly below the exhaust hole body (3), and the chamfer body (5) is in the shape of a horn.
5. A pumped-liner atomica! cell according to claim 1, wherein: The inner cavity surface of the atom gas chamber main shell (1) is provided with a concave surface (7) at the bottom.