Moving exposure workbench and exposure system with same

Abstract

The utility model discloses a motion exposure worktable and an exposure system with the same, the motion exposure worktable comprises a mounting seat, a lifting assembly, a first motion assembly, a second motion assembly and an exposure assembly, the second motion assembly is arranged on the first motion assembly and moves along a second direction, and the exposure assembly is arranged on the mounting seat. The first direction and the second direction are both in the horizontal direction, and the first direction is perpendicular to the second direction; the second movement assembly is further provided with a sensor, and the sensor is used for detecting the position of the base plate. According to the exposure device, the sensor is arranged to detect the position of the substrate so as to drive the first movement assembly and the second movement assembly to adjust the position of the exposure assembly according to the position of the substrate, so that the exposure assembly can better act the exposure effect on the substrate, and the exposure assembly can act the exposure effect on the substrate according to the design for exposure; and adjustment can be carried out according to the production process in the use process, so that the exposure assembly has higher precision in use.

Description

TECHNICAL FIELD

[0001] The utility model relates to exposure device technical field especially is related to a motion exposure workstation and have its exposure system. BACKGROUND

[0002] In prior art, the stepping positioning motion platform in the exposure system, the light path system of upper movement cantilever fixed installation, the light path system is installed in the side of light path installation bottom plate, the exposure center position of light path system is far away from the center position of stepping positioning motion platform, the dynamic characteristic of positioning motion platform, namely yaw, pitch, roll, repeatability, straightness etc. all bring important influence to the position precision of positioning motion platform, and because of the existence of abbe error, the farther the exposure center position of light path system is from the motion center position of precision positioning platform, the greater the abbe error value is, the greater the exposure precision error of laser direct imaging equipment is, reduces the exposure yield rate of whole machine equipment. Exposure device cantilever is in exposure fixed plate, and the structure rigidity is weak, and vibration is easily caused, and the positioning repeatability precision is influenced. SUMMARY

[0003] The utility model discloses at least solve one of the technical problems in prior art. For this reason, one purpose of the utility model lies in providing a motion exposure workstation, which is provided with a detection piece on the motion exposure workstation, so that the detection piece is suitable for detection, the use position of the exposure assembly is adjusted according to the position of the substrate, the exposure assembly can be arranged at a suitable position according to the design during use, the use of the exposure system has higher precision, higher yield rate can be achieved, and automatic control can also be realized.

[0004] Another purpose of the utility model lies in providing an exposure system, which is provided with the motion exposure workstation as described above.

[0005] The motion exposure workstation according to the utility model embodiment comprises a mounting seat, a lifting assembly, a first motion assembly, a second motion assembly and an exposure assembly, the mounting seat is provided with a workstation in the middle part, and the workstation is used for carrying a substrate; the lifting assembly is arranged on the mounting seat, and the output end of the lifting assembly is connected with the workstation; the lifting assembly is used for adjusting the vertical height of the workstation; the first motion assembly is arranged on the mounting seat, and the first motion assembly is arranged at intervals with the lifting assembly; the first motion assembly moves along a first direction; the second motion assembly is arranged on the first motion assembly, and the second motion assembly moves along a second direction; the first direction and the second direction are both in the horizontal direction, and the first direction is perpendicular to the second direction; wherein the second motion assembly is further provided with a sensor, and the sensor is used for detecting the position of the substrate.

[0006] According to the motion exposure workbench, the sensor is arranged to detect the position of the substrate, the position of the exposure assembly is adjusted according to the position of the substrate, the exposure assembly can better exert the exposure effect on the substrate, the exposure assembly can exert the exposure effect on the substrate according to the design to perform exposure, the exposure assembly can be adjusted according to the production process during use, the use of the exposure assembly has higher precision, the exposure effect of the substrate is better, the yield of the substrate is improved, and the automatic control of the motion exposure workbench is realized.

[0007] In some embodiments, the exposure assembly further comprises an exposure bottom plate and exposure pieces, the exposure bottom plate is arranged on the second motion assembly, the exposure pieces are arranged on the exposure bottom plate, and the exposure pieces are arranged on the same straight line.

[0008] In some embodiments, the second motion assembly comprises a stepping base, a stepping piece and a stepping mounting plate, the stepping base is arranged on the first motion assembly, the stepping piece is arranged on the stepping base, and the stepping mounting plate is arranged on the stepping piece.

[0009] In some embodiments, the stepping base is a marble base, and / or the stepping base is an integral part.

[0010] In some embodiments, the stepping piece comprises a stepping stator, a stepping rotor and a stepping guide rail, the stepping stator is arranged on the stepping base, the stepping rotor is arranged on the stepping mounting plate, the stepping rotor is arranged opposite to the stepping stator, and the stepping guide rail is parallel.

[0011] In some embodiments, the stepping piece further comprises a grating ruler, the grating ruler is arranged opposite to the stepping mounting plate, and the grating ruler is arranged opposite to the stepping mounting plate, and the grating ruler is used to detect the position of the stepping mounting plate.

[0012] In some embodiments, the grating ruler is two, and the two grating rulers are arranged opposite to the two stepping guide rails.

[0013] In some embodiments, the stepping guide rail is three parallel.

[0014] In some embodiments, the first motion assembly comprises a positioning shaft, the positioning shaft is two parallel, and the positioning shaft is arranged opposite to the workbench.

[0015] The exposure system according to the embodiment of the present application comprises the motion exposure workbench as described above.

[0016] The exposure system according to the embodiment of the present application is provided with the motion exposure workbench as described above in the exposure system, the sensor is arranged to detect the position of the substrate, the position of the exposure assembly is adjusted according to the position of the substrate to drive the first motion assembly and the second motion assembly, so that the exposure assembly can better exert the exposure effect on the substrate, and the exposure assembly can be adjusted according to the production process during use, so that the use of the exposure assembly has higher precision, so that the exposure assembly can exert the exposure effect on the substrate according to the design to perform exposure, so that the exposure effect of the substrate is better, the yield of the substrate is improved, and the automatic control of the exposure system is also realized.

[0017] Additional aspects and advantages of the present application will be described in part below and will become apparent from the following description, become apparent from the following description, or be learned by practice of the present application. BRIEF DESCRIPTION OF DRAWINGS

[0018] The above and / or additional aspects and advantages of the present application will become apparent and more readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:

[0019] Figure 1 is a structural schematic view of the motion exposure workbench according to the embodiment of the present application;

[0020] Figure 2 is a structural schematic view of the motion exposure workbench according to the embodiment of the present application;

[0021] Figure 3 is a structural schematic view of the motion exposure workbench according to the embodiment of the present application;

[0022] Figure 4 is a structural schematic view of the motion exposure workbench according to the embodiment of the present application;

[0023] Figure 5 is a structural schematic view of the motion exposure workbench according to the embodiment of the present application;

[0024] Reference signs:

[0025] The motion exposure workbench 10,

[0026] The mounting seat 100,

[0027] The workbench 200,

[0028] The lifting assembly 300,

[0029] The first motion assembly 400, the positioning shaft 410,

[0030] The second movement assembly 500, the stepping base 510, the stepping piece 520, the stepping stator 521, the stepping rotor 522, the stepping guide rail 523, the grating ruler 524, the stepping mounting plate 530,

[0031] The exposure assembly 600, the sensor 610, the exposure base plate 620, the exposure piece 630. DETAILED DESCRIPTION

[0032] The embodiments of the utility model are described in detail below, and the embodiments described with reference to the drawings are exemplary. The embodiments of the utility model are described in detail below.

[0033] The embodiments of the utility model are described in detail below, and the embodiments described with reference to the drawings are exemplary. The embodiments of the utility model are described in detail below. Figures 1-5 The movement exposure workbench 10 according to the embodiments of the utility model is described below, comprising: the mounting seat 100, the lifting assembly 300, the first movement assembly 400, the second movement assembly 500 and the exposure assembly 600.

[0034] Specifically, the middle part of the mounting seat 100 is provided with the workbench 200, and the workbench 200 is used for carrying the substrate; the lifting assembly 300 is arranged on the mounting seat, and the output end of the lifting assembly 300 is connected with the workbench 200, and the lifting assembly 300 is used for adjusting the vertical height of the workbench 200; the first movement assembly 400 is arranged on the mounting seat, and the first movement assembly 400 is arranged at intervals with the lifting assembly 300, and the first movement assembly 400 is used for determining the substrate position; the second movement assembly 500 is arranged on the first movement assembly 400, and the output end of the second movement assembly 500 is connected with the substrate, and the second movement assembly 500 is used for adjusting the position; the exposure assembly 600 is arranged on the upper side of the second movement assembly 500, and the exposure assembly 600 is arranged opposite at least part of the workbench 200, and the exposure assembly 600 is used for exposing the substrate; wherein the exposure assembly 600 comprises the sensor 610, and the sensor 610 is used for detecting the substrate position.

[0035] That is to say, in the use process of the exposure system, the movement exposure workbench 10 is suitable for carrying the substrate, so that the substrate can be controlled and adjusted in position under the control of the movement exposure workbench 10, so that the substrate can be transported to the designated position for exposure, so that the exposure assembly 600 can act on the substrate according to the design, so that the exposure effect of the substrate in the exposure system is better, thereby improving the production efficiency of the exposure system, and the substrate exposed by the exposure system has a high yield.

[0036] Specifically, the motion exposure workbench 10 is suitable to include a mounting base 100, a lifting assembly 300, a first motion assembly 400, a second motion assembly 500 and an exposure assembly 600. That is, the mounting base 100 is suitable to provide a carrying function to carry other components so that the motion exposure workbench 10 is suitable to be arranged to a suitable position for subsequent use according to a control arrangement. In some specific embodiments, the lifting assembly 300 is arranged on the mounting base 100, and a free end of the lifting assembly 300 is suitable to be constructed with a workbench 200 so that the lifting assembly 300 is suitable to adjust the vertical position of the workbench 200 according to a requirement so that the workbench 200 is suitable to adjust the position when carrying a substrate so that the exposure effect can better act on the substrate to improve the production efficiency and production effect of the substrate. Furthermore, the first motion assembly 400 is arranged, and the first motion assembly 400 is suitable to drive the exposure assembly 600 to move in a first direction to adjust the working position of the exposure assembly 600 so that the exposure effect can better act on the substrate for production to improve the exposure effect of the substrate. Similarly, after the position of the substrate is limited, the second motion assembly 500 is suitable to move, and since the second motion assembly 500 is suitable to drive the exposure assembly 600 to move, and since the moving direction of the first motion assembly 400 and the moving direction of the second motion assembly 500 are perpendicular to each other, the exposure position of the exposure assembly 600 can be better adjusted so that the use of the exposure assembly 600 is more reliable, and the exposure assembly 600 can act the exposure effect on the substrate according to the design so that the production of the substrate has a higher yield.

[0037] Specifically, the exposure assembly 600 is suitable to include a sensor 610, and the sensor 610 is suitable to detect the substrate. When the sensor 610 detects a corresponding signal, the position of the substrate is determined, and when the sensor 610 cannot detect the signal, the first motion assembly 400 is suitable to adjust the position of the substrate until the signal is detected for subsequent transportation and exposure production.

[0038] According to the motion exposure workbench 10 of the embodiment of the utility model, the sensor 610 is arranged to detect the position of the substrate, the first motion assembly 400 and the second motion assembly 500 are driven to adjust the position of the exposure assembly 600 according to the position of the substrate, the exposure assembly 600 can better act the exposure effect on the substrate, the exposure assembly 600 can act the exposure effect on the substrate according to the design for exposure, and the exposure assembly 600 can be adjusted according to the production process during use, the use of the exposure assembly 600 has higher precision, the exposure effect of the substrate is better, the yield of the substrate is improved, and the automatic control of the motion exposure workbench 10 is realized.

[0039] In some embodiments, the exposure assembly 600 comprises an exposure base plate 620 and exposure pieces 630, the exposure base plate 620 is arranged on the second movement assembly 500; the exposure pieces 630 are multiple and arranged on the exposure base plate 620, the multiple exposure pieces 630 are arranged on the same straight line, and the sensor 610 is arranged on one side of the straight line of the multiple exposure pieces 630.

[0040] It can be understood that the exposure assembly 600 is adapted to comprise the exposure base plate 620 and the exposure pieces 630, the exposure base plate 620 is adapted to provide a bearing capacity, so that the exposure base plate 620 is adapted to bear the above-mentioned sensor 610 and the exposure pieces 630, so that the exposure pieces 630 can be used according to the design, so that the exposure effect can directly act on the specified position of the substrate to meet the exposure production needs of the substrate, so that the production efficiency of the substrate is improved. Moreover, the sensor 610 is adapted to be constructed on one side of the exposure piece 630, so that the sensor 610 can better detect the position of the substrate during use, so that the sensor 610 can detect and judge the position of the substrate according to the design, so that the subsequent movement exposure workbench 10 can adjust the position of the exposure assembly 600 for use according to the design, so that the production performance of the exposure system is improved. In addition, multiple exposure pieces 630 are arranged to make the exposure assembly 600 have higher exposure efficiency during use, so that the production efficiency of the exposure system is improved.

[0041] In some embodiments, the second movement assembly 500 comprises a stepping base 510, a stepping piece 520 and a stepping mounting plate 530, the stepping base 510 is arranged on the first movement assembly 400; the stepping piece 520 is arranged on the stepping base 510; the stepping mounting plate 530 is arranged on the stepping piece 520, the middle part of the stepping mounting plate 530 is provided with a mounting groove, and the exposure base plate 620 is embedded in the mounting groove. It can be understood that the second movement assembly 500 is adapted to comprise the stepping base 510, the stepping piece 520 and the stepping mounting plate 530, the stepping base 510 is adapted to provide a bearing capacity to bear the remaining structures for use, and the stepping piece 520 is adapted to be arranged on the stepping base 510, the stepping piece 520 is adapted to step according to the control for use, to drive the substrate to step the position adjustment, and the stepping mounting plate 530 is adapted to improve the bearing capacity, and the middle part of the stepping mounting plate 530 is arranged with the exposure base plate 620, so that the exposure assembly 600 can be arranged on the second movement assembly 500, so that the position of the second movement assembly 500 is adapted to adjust the use position of the exposure assembly 600 according to the needs, so that the sensor 610 can better detect the position of the substrate for exposure, and the use performance of the exposure assembly 600 can also act on the substrate according to the design to realize the automatic processing.

[0042] In some embodiments, the stepping base 510 is a marble material base, and / or the stepping base 510 is an integral piece. It can be understood that the stepping base 510 is a marble material base, so that the stepping base 510 has higher structural strength to support other structures for use, so that the substrate can be used according to the design, so that the motion exposure workbench 10 can expose the substrate according to the design, so that the substrate after production is suitable for higher use performance to meet subsequent production. Similarly, the stepping base 510 is constructed in an integral manner to save the production steps of the stepping base 510, simplify the production process of the motion exposure workbench 10, and improve the connection strength of the stepping base 510 to increase the structural strength of the motion exposure workbench 10.

[0043] In some embodiments, the stepping piece 520 includes: a stepping stator 521, a stepping rotor 522, and a plurality of stepping guide rails 523, the stepping stator 521 is arranged on the stepping base 510; the stepping rotor 522 is arranged on the stepping mounting plate 530, and the stepping rotor 522 is arranged opposite to the stepping stator 521; the stepping guide rails 523 are arranged in parallel, and the stepping mounting plate 530 extends along the extension direction of the guide rail direction. It can be understood that the stepping guide rail 523, the stepping stator 521 and the stepping rotor 522 are suitable for use in the stepping piece 520, and the stepping guide rail 523 is suitable for providing a guiding function. Similarly, the stepping stator 521 and the stepping rotor 522 are also provided, so that the stepping rotor 522 is suitable for being arranged opposite to the stepping stator 521 to provide driving action to the specified position to meet the use. Specifically, the stepping piece 520 is suitable for providing driving action by the stepping rotor 522 to drive the stepping mounting plate 530 to move, so that the motion exposure workbench 10 can be used according to the design to adjust the position.

[0044] In some embodiments, the stepping piece 520 further includes: an optical grating ruler 524, the optical grating ruler 524 is arranged opposite to the stepping mounting plate 530, and the optical grating ruler 524 is used for detecting the position of the stepping mounting plate 530. It can be understood that by arranging the optical grating ruler 524 opposite to the stepping driving piece, the optical grating ruler 524 can detect the position of the stepping mounting plate 530, and also can adjust the exposure performance according to the use state, so that the output performance of the exposure assembly 600 can be more reliably acted on the substrate to improve the production efficiency.

[0045] In an example, the grating ruler 524 is two, and the two grating rulers 524 are arranged opposite to the two step guide rails 523. In this way, by arranging the two grating rulers 524, the two grating rulers 524 can be arranged on the two sides of the step guide rail 523 to detect the step mounting plate 530, so that the step mounting plate 530 can be adjusted according to the design, so that the second motion assembly 500 can be adjusted according to the design during use, so that the exposure assembly 600 can be arranged to the appropriate position for subsequent use, so that the exposure system can be adjusted according to the setting during the process of automatic production, so as to improve the yield rate of the product produced.

[0046] In some embodiments, the step guide rail 523 is three parallel arrangements. It can be understood that during the construction of the step guide rail 523, the step guide rail 523 is arranged in parallel to make the movement precision of the step mounting plate 530 higher during movement, so that the exposure assembly 600 can be more reliable to move to the appropriate position according to the design for subsequent exposure use, so that the product produced by the exposure system has higher production efficiency and production precision.

[0047] In some embodiments, the first motion assembly 400 includes a positioning shaft 410, and the positioning shaft 410 is two parallel arrangements and is arranged spaced apart from the workbench 200. In this way, during use of the first motion assembly 400, the position of the exposure assembly 600 is adjusted along the first direction by the positioning shaft 410, so that the position of the exposure assembly 600 in the first direction can be adjusted by the positioning shaft 410, thereby realizing the movement of the exposure system in the first direction.

[0048] According to the exposure system of the embodiment of the utility model, including: the motion exposure workbench 10 above. In this way, since the motion exposure workbench 10 is arranged in the exposure system, the sensor 610 is arranged to detect the position of the substrate, and the position of the exposure assembly 600 is adjusted according to the position of the substrate to drive the first motion assembly 400 and the second motion assembly 500, so that the exposure assembly 600 can better expose the substrate, so that the exposure assembly 600 can expose the substrate according to the design, and can be adjusted according to the production process during use, so that the use of the exposure assembly 600 has higher precision, so that the exposure effect of the substrate is better, the yield rate of the substrate is improved, and the automatic control of the exposure system is realized.

[0049] Other configurations and operations of the exposure system according to the embodiment of the utility model are known to those skilled in the art, and will not be described in detail here.

[0050] In the description of the present specification, the description referring to the terms "one embodiment", "some embodiments", "illustrative embodiment", "example", "specific example", or "some examples" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily mean the same embodiment or example.

[0051] Although the embodiments of the present application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made thereto without departing from the principles and spirit of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. A motion exposure stage, characterized by, The motion exposure workbench comprises: a mounting seat, a middle part of the mounting seat is provided with a workbench, the workbench is used for carrying a substrate; a lifting assembly, the lifting assembly is arranged on the mounting seat, and an output end of the lifting assembly is connected with the workbench, the lifting assembly is used for adjusting the vertical height of the workbench; a first motion assembly, the first motion assembly is arranged on the mounting seat, and the first motion assembly is arranged in a spaced manner with the lifting assembly, the first motion assembly moves along a first direction; a second motion assembly, the second motion assembly is arranged on the first motion assembly, the second motion assembly moves along a second direction, the first direction and the second direction are in a horizontal direction, and the first direction and the second direction are perpendicular to each other; an exposure assembly, the exposure assembly is arranged on the upper side of the second motion assembly, and the exposure assembly is arranged in a spaced manner with at least part of the workbench, the exposure assembly is used for exposing the substrate; wherein, a sensor is further arranged on the second motion assembly, and the sensor is used for detecting the position of the substrate.

2. The motion exposure stage of claim 1, wherein, The exposure assembly further comprises: an exposure bottom plate, the exposure bottom plate is arranged on the second motion assembly; a plurality of exposure pieces, the exposure pieces are arranged on the exposure bottom plate, and the exposure pieces are arranged in a spaced manner on the same straight line, and the sensor is arranged on one side of the straight line direction of the exposure pieces.

3. The motion exposure stage of claim 2, wherein, The second motion assembly comprises: a stepping base, the stepping base is arranged on the first motion assembly; a stepping piece, the stepping piece is arranged on the stepping base; a stepping mounting plate, the stepping mounting plate is arranged on the stepping piece, a middle part of the stepping mounting plate is provided with a mounting groove, and the exposure bottom plate is embedded in the mounting groove.

4. The motion exposure stage of claim 3, wherein, The stepping base is a marble material base; and / or the stepping base is an integral molding piece.

5. The motion exposure stage of claim 3, wherein, The stepping piece comprises: a stepping stator, the stepping stator is arranged on the stepping base; a stepping rotor, the stepping rotor is arranged on the stepping mounting plate, and the stepping rotor is arranged in a spaced manner with the stepping stator; a plurality of stepping guide rails arranged in parallel, the stepping mounting plate extends along the extension direction of the guide rails.

6. The motion exposure stage of claim 5, wherein, The stepping piece further comprises: an optical grating ruler, the optical grating ruler is arranged on the stepping base, and the optical grating ruler is arranged in a spaced manner with the stepping mounting plate, and the optical grating ruler is used for detecting the position of the stepping mounting plate.

7. The motion exposure stage of claim 6, wherein, There are two optical grating rulers, and the two optical grating rulers are arranged in a spaced manner with the two stepping guide rails.

8. The motion exposure stage of claim 5, wherein, The stepping guide rails are arranged in parallel in three.

9. The motion exposure stage of claim 1, wherein, The first motion assembly comprises: two positioning shafts arranged in parallel, and the positioning shafts are arranged in a spaced manner with the workbench.

10. An exposure system characterized by comprising: The motion exposure workbench comprises: any one of claims 1-9.

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