Electrolytic nickel cleaning system

Abstract

The utility model discloses an electrolytic nickel cleaning system which comprises a cleaning pool, an electrolytic nickel cleaning device and a controller, the cleaning pool is provided with a containing groove which is open towards the upper side, and the containing groove is used for containing a cleaning medium; the receiving frame is used for receiving the materials; the driving device is installed on the installation support and connected with the receiving frame, and the driving device can be used for driving the receiving frame to rotate around the first axis and driving the receiving frame to ascend and descend in the vertical direction so that at least part of the receiving frame can be placed in the containing groove. Therefore, the receiving frame is used for receiving materials (such as a plurality of nickel plates which are arranged in a stacked mode), the driving device is used for driving the position adjustment of the receiving frame so that the receiving frame can be adjusted to the position where the materials can be immersed in the cleaning medium, and the receiving frame is further driven to rotate around the first axis so that swinging of the receiving frame can be achieved; therefore, the materials can make full contact with the flowing cleaning medium, the multiple nickel plates can be cleaned at the same time, and then the cleaning efficiency is improved while the nickel plate cleaning effect is improved.

Description

Technical Field

[0001] This application relates to the field of nickel electrowinning technology, and in particular to an electrolytic nickel cleaning system. Background Technology

[0002] Currently, after nickel plates are prepared by electrolysis, it is necessary to remove the residual electrolyte, crystals, and impurities on the surface of the nickel plates to ensure the quality of the finished electrolytic nickel product.

[0003] In related technologies, when nickel plates are cleaned by spraying, they are rinsed by vertically suspending them without removing the conductive rod pads. This results in insufficient cleaning of the area between the lifting lugs and the conductive rods, and the liquid remaining on the lifting lugs drips onto the plate, causing secondary contamination. If the nickel plates are horizontally arranged on a conveyor and cleaned by spraying, the horizontal rinsing method requires a large space, and the nickel plates stay in the spray area for a short time while ensuring equipment cleaning efficiency. This short rinsing time leads to poor cleaning results and fails to meet the cleaning requirements of nickel plates. When nickel plates are cleaned by placing them in a cleaning tank, the stationary nickel plates can only contact the cleaning liquid around them. As the concentration of the liquid around the nickel plates increases, the dissolving effect of the aqueous solution around the nickel plates on the residues weakens, affecting the cleaning effect. At the same time, the overlapping parts between closely arranged nickel plates do not have sufficient contact with the cleaning liquid, resulting in poor cleaning results. Utility Model Content

[0004] This application aims to at least solve one of the technical problems existing in the prior art. Therefore, one objective of this application is to provide an electrolytic nickel cleaning system that achieves good cleaning effect and high cleaning efficiency on nickel plates.

[0005] An electrolytic nickel cleaning system according to a first aspect of this application includes: a cleaning tank having an upwardly open receiving trough for containing a cleaning medium; a receiving rack for receiving materials; a mounting bracket and a driving device, the driving device being mounted on the mounting bracket and connected to the receiving rack, the driving device being able to drive the receiving rack to rotate about a first axis and drive the receiving rack to rise and fall in a vertical direction, so as to place at least a portion of the receiving rack in the receiving trough.

[0006] According to some embodiments of this application, the receiving rack includes: a first bracket having a support base and for receiving the material; a second bracket connected to the driving device and for mounting and fixing the first bracket; wherein, in the vertical projection, at least a portion of the projection of the first bracket falls within the projection of the open end of the receiving groove.

[0007] According to some embodiments of this application, the first bracket includes: a first limiting part, which is connected to the support base and is adapted to limit the material on both sides in a first direction; and a second limiting part, which is connected to the support base and is adapted to limit the material on both sides in a second direction; wherein the first direction and the second direction are perpendicular to each other.

[0008] According to some embodiments of this application, the first limiting portion and the second limiting portion are provided to protrude from the support surface of the support seat in the third direction, and the first bracket is adapted to receive the material in the third direction.

[0009] According to some embodiments of this application, the second bracket includes: a first mounting bracket, the first mounting bracket being U-shaped, and the opening of the U-shape facing the same direction as the first bracket receiving the material; and a second mounting bracket, the second mounting bracket being connected to the outside of the opening of the first mounting bracket and used to connect to the driving device.

[0010] According to some embodiments of this application, the second mounting bracket includes: a first connecting arm, which is spaced apart from the side wall of the first mounting bracket and forms a clearance portion between the first mounting bracket and the first connecting arm to avoid the cleaning pool, and the driving device is connected to the side of the first connecting arm away from the first bracket; and a second connecting arm, which is L-shaped with the first connecting arm and is connected between the first connecting arm and the first mounting bracket.

[0011] According to some embodiments of this application, the driving device includes: a rotating mechanism connected to the receiving frame, wherein the driving end of the rotating mechanism is connected to the receiving frame and is used to drive the receiving frame to rotate; and a lifting mechanism mounted on the mounting bracket, wherein the lifting end of the lifting mechanism is connected to the rotating mechanism and is used to drive the rotating mechanism to lift.

[0012] According to some embodiments of this application, the lifting mechanism includes: a drive seat and a drive rod, the drive seat being fixedly engaged with the mounting bracket, the drive rod being retractably mounted on the drive seat in a vertical direction, and the end of the drive rod located outside the drive seat being configured as the lifting end; and / or, the lifting mechanism includes: a guide rail and a guide seat, the guide rail being mounted on the mounting bracket, the guide seat being connected and engaged with the lifting end, and the guide rail being adapted to guide and engage with the guide seat.

[0013] According to some embodiments of this application, the rotating mechanism includes: a drive motor for outputting driving force; and a transmission mechanism that is poweredly connected between the drive motor and the receiving frame.

[0014] According to some embodiments of this application, the cleaning tank is provided with a heating device for heating the cleaning medium.

[0015] According to some embodiments of this application, the inner bottom wall of the cleaning tank is inclined downward to one side.

[0016] The electrolytic nickel cleaning system according to the embodiments of this application has at least the following advantages compared to the prior art:

[0017] (1) It can clean nickel stacks consisting of multiple nickel plates in the cleaning tank, which improves the cleaning effect of nickel plates and increases the cleaning efficiency of nickel plates. In addition, the electrolytic nickel cleaning system requires a small floor area when running, which makes it easy to arrange the electrolytic nickel cleaning system in the production line and improves the space utilization rate.

[0018] (2) In the cleaning tank, multiple nickel plates are immersed in the cleaning medium, and gaps are formed between two adjacent nickel plates by oscillation, allowing the cleaning medium to flow between the nickel plates and thus cleaning the overlapping parts between them. At the same time, the cleaning medium can be heated by a heating device to further improve the cleaning effect on the nickel plates.

[0019] (3) The bottom of the cleaning tank is inclined, which can effectively reduce the disturbance of the impurities deposited at the bottom of the cleaning tank during swinging and scalding and removing the nickel stack, and reduce the possibility of secondary contamination of the cleaned nickel plates.

[0020] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description

[0021] The above and / or additional aspects and advantages of this application will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0022] Figure 1 This is a schematic diagram of the structure of an electrolytic nickel cleaning system according to an embodiment of this application;

[0023] Figure 2 This is a schematic diagram of a receiving rack receiving materials according to an embodiment of this application;

[0024] Figure 3 This is a schematic diagram of a lifting mechanism according to an embodiment of this application;

[0025] Figure 4 This is a schematic diagram illustrating the interaction between the first support and the material according to an embodiment of this application;

[0026] Figure 5 This is a cross-sectional view of a cleaning tank according to an embodiment of this application;

[0027] Figure 6 This is a flowchart of an electrolytic nickel cleaning method according to an embodiment of this application.

[0028] Figure label:

[0029] Electrolytic nickel cleaning system 100; materials 200; nickel plate 201;

[0030] Cleaning tank 1; receiving tank 101; side wall 11; inner bottom wall 12;

[0031] Receiver frame 2; First bracket 21; Support base 211; First limiting part 212; First support arm 2121; Second limiting part 213; Second support arm 2131; Second bracket 22; First mounting frame 221; Second mounting frame 222; First connecting arm 2221; Second connecting arm 2222;

[0032] Mounting bracket 3;

[0033] Drive unit 4; rotating mechanism 41; lifting mechanism 42; drive seat 421; drive rod 422; guide rail 423; guide seat 424. Detailed Implementation

[0034] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0035] The following is for reference. Figures 1-5 The present application describes an electrolytic nickel cleaning system 100, which is used to clean nickel plates to remove residual electrolyte, crystals, and impurities from the surface of the nickel plates, thereby ensuring the cleanliness of the nickel plates.

[0036] Nickel plates can be prepared through electrolysis. Electrolytic nickel plates mainly consist of three parts: a conductive element (such as a conductive rod), the plate body, and two lifting lugs on the electrolytic conductive plate and plate body. During electrolysis, current is conducted through the conductive element and lifting lugs to the plate body. Under the action of direct current, nickel ions in the electrolyte gradually adhere to the plate body, thus completing the preparation of the nickel plate. Therefore, the surface of the electrolytically prepared nickel plate usually has electrolyte, crystals, and impurities adhering to it, which need to be removed.

[0037] Reference Figure 1 According to an embodiment of this application, the electrolytic nickel cleaning system 100 includes: a cleaning tank 1, a receiving rack 2, a mounting bracket 3, and a driving device 4.

[0038] like Figure 1 As shown, the cleaning tank 1 has an upward-opening receiving tank 101 for holding a cleaning medium, which can be used to clean the nickel plate. The "cleaning medium" can be a liquid medium such as water or an aqueous solution; no specific limitation is made here.

[0039] Combination Figure 1 and Figure 2 As shown, the receiving rack 2 is used to receive the material 200. The mounting bracket 3 is arranged on the outside of the cleaning tank 1, and the mounting bracket 3 can also serve as the mounting carrier for the receiving rack 2. The driving device 4 is mounted on the mounting bracket 3 and connected to the receiving rack 2. The driving device 4 can be used to drive the receiving rack 2 to rotate around the first axis and to drive the receiving rack 2 to rise and fall in the vertical direction, so that at least part of the receiving rack 2 is placed in the receiving tank 101, thereby allowing the material 200 arranged in the receiving rack 2 to be submerged below the liquid surface of the cleaning medium, so that the material 200 can be fully contacted with the cleaning medium, and the material 200 can be cleaned.

[0040] In this process, after the receiving frame 2 receives the material 200, the stacking arrangement of multiple nickel plates is perpendicular to the first axis. During the cleaning process of the material 200, the driving device 4 is adapted to drive the receiving frame 2 to move the material 200 back and forth around the first axis within a preset angle range to clean the material 200 and improve the cleaning effect of the material 200.

[0041] It should be noted that the mounting bracket 3 is arranged on the outside of the cleaning tank 1 so that the mounting bracket 3 can fully avoid the open end of the receiving tank 101, and the receiving rack 2 is arranged above the cleaning tank 1 so that the receiving rack 2 can receive the material 200 and enter the receiving tank 101 from the open end of the receiving tank 101.

[0042] The receiving rack 2 has multiple working positions in the electrolytic nickel cleaning system 100. When the receiving rack 2 needs to receive the material 200, it is placed above the cleaning tank 1, fully exposing the receiving rack 2 to facilitate receiving the material 200. When the material 200 needs to be cleaned, at least part of the receiving rack 2 extends into the receiving tank 101 through the open end, immersing the material 200 in the cleaning medium so that the material 200 can fully contact the cleaning medium.

[0043] It should be noted that "material 200" refers to the nickel plates that need to be cleaned. There can be multiple nickel plates in material 200, and these multiple nickel plates can be stacked on the receiving rack 2 so that the electrolytic nickel cleaning system 100 can clean the multiple stacked nickel plates, which helps to improve the cleaning efficiency of the electrolytic nickel cleaning system 100.

[0044] Reference Figure 4 As shown, the receiving frame 2 is driven to rotate around the first axis by the driving device 4, which can change the matching position between the material 200 and the receiving frame 2, so that the material 200 can fully contact the cleaning medium and improve the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200.

[0045] Specifically, during the swinging process of the receiving frame 2 driven by the driving device 4 around the first axis, gaps can be formed between the stacked nickel plates, allowing the liquid cleaning medium to fully contact the surface of the nickel plates and clean the crystals and impurities adhering to the surface of the nickel plates. Simultaneously, during the swinging process of the receiving frame 2 driven by the driving device 4, the cleaning medium flows relative to the surface of the material 200 (i.e., multiple nickel plates) arranged in the receiving position of the receiving frame 2, enabling the cleaning medium to effectively rinse the material 200 and reduce impurities adhering to the surface of the material 200.

[0046] It should be noted that currently, after nickel plates are prepared by electrolysis, it is necessary to remove residual electrolyte, crystals, and impurities from the surface of the nickel plates to ensure the quality of the finished electrolytic nickel product. Related technologies typically employ three methods to clean nickel plates: First, the nickel plates are vertically suspended on conductive bars of a conveyor belt using lifting lugs and fed into a spray area, where spray devices rinse the surface of the nickel plates from above and the sides; second, after removing the conductive bars, the nickel plates are stacked and transported in close proximity to a cleaning tank using a transfer trolley; third, after removing the conductive bars, the nickel plates are horizontally placed on a conveyor belt and fed into a spray area, where they are rinsed from multiple directions by spray devices.

[0047] In the first method of cleaning nickel plates, the plates are rinsed by vertically suspending them without removing the conductive rod pads. This results in insufficient cleaning of the area between the lifting lugs and the conductive rods, and the residual liquid on the lugs drips onto the plate, causing secondary contamination. In the second method, the stationary nickel plates can only contact the cleaning solution around them. As the concentration of the liquid around the nickel plates increases, the dissolving effect of the aqueous solution on the residues weakens, affecting the cleaning effect. At the same time, the overlapping parts between the closely arranged nickel plates do not have sufficient contact with the cleaning solution, resulting in poor cleaning. In the third method, the horizontal rinsing method requires a large space and, while ensuring the cleaning efficiency of the equipment, the nickel plates stay in the spray area for a short time. This short rinsing time leads to poor cleaning and fails to meet the cleaning requirements of nickel plates.

[0048] In this application, the electrolytic nickel cleaning system 100 receives material 200 (such as multiple stacked nickel plates) through a receiving frame 2, and drives the position adjustment of the receiving frame 2 through a driving device 4 to adjust the receiving frame 2 to a position where the material 200 can be immersed in the cleaning medium. Furthermore, the receiving frame 2 is driven to rotate around a first axis to realize the swing of the receiving frame 2, so that the material 200 can fully contact the flowing cleaning medium, and multiple nickel plates can be cleaned at the same time, thereby improving the cleaning effect of nickel plates and increasing cleaning efficiency.

[0049] Specifically, the drive device 4 selectively immerses the material 200 in the cleaning medium by driving the receiving frame 2 to rise and fall. After the receiving frame 2 receives the material 200, the drive device 4 can drive the receiving frame 2 to fall, so that the receiving frame 2 and the material 200 can be inserted from the open end of the receiving tank 101 and the material 200 can be immersed in the cleaning medium. After the material 200 has finished cleaning in the cleaning tank 1, the drive device 4 can drive the receiving frame 2 to rise, so that the material 200 can be removed from the cleaning medium to facilitate the draining of water adhering to the surface of the nickel plate.

[0050] Furthermore, the driving device 4 drives the receiving frame 2 to rotate around the first axis so that the receiving frame 2 drives the material 200 to swing, thereby making the cleaning medium flow relative to the material 200. This avoids the cleaning medium's dissolution effect on residues being affected by the excessively high liquid concentration around the material 200. It also enables the material 200 (i.e., multiple nickel plates) to change position on the receiving frame 2, so as to form gaps between the nickel plates, allowing the nickel plates to fully contact the cleaning medium and improve the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200.

[0051] It is understandable that the driving device 4 can drive the receiving frame 2 in a reciprocating manner within a preset angle range (e.g., -22.5° to 22.5°), such as rotating clockwise by 22.5° and then counterclockwise by 45°, so that the oscillating motion of the receiving frame 2 and the material 200 can drive the cleaning medium to flow, thereby improving the contact effect between the material 200 and the cleaning medium.

[0052] Reference Figure 1 As shown, in some embodiments of this application, the receiving frame 2 includes a first support 21 and a second support 22. The first support 21 has a support base 211 for receiving material 200. The second support 22 is connected to the driving device 4 and is used to install and fix the first support 21.

[0053] In the vertical projection, at least a portion of the projection of the first support 21 falls within the projection of the open end of the receiving tank 101, thereby ensuring that the first support 21 for receiving the material 200 can extend into or out of the receiving tank 101 through the open end of the receiving tank 101 in the vertical direction, so as to selectively immerse the material 200 in the cleaning medium.

[0054] Combination Figure 1 , Figure 2 and Figure 4 As shown, it can be understood that the first bracket 21 is used to receive the material 200, and when the receiving frame 2 swings, the support seat 211 is placed below the material 200 so as to support the material 200 through the support seat 211.

[0055] Specifically, the first support 21 is a receiving component for the material 200. The material 200 (e.g., multiple stacked nickel plates) can be transported to the first support 21 by a transfer device, and the second support 22 is a mounting carrier for the first support 21 and is connected to the drive device 4. When the drive device 4 drives the second support 22 to move, the second support 22 can drive the first support 21 to move synchronously.

[0056] like Figure 1 and Figure 2 As shown, in a further embodiment of this application, the first bracket 21 includes a first limiting part 212 and a second limiting part 213. The first limiting part 212 is connected to the support base 211 and can limit the material 200 on both sides in the first direction. The second limiting part 213 is connected to the support base 211 and can limit the material 200 on both sides in the second direction.

[0057] The first direction and the second direction are set perpendicular to each other, so that the material 200 can be limited from multiple directions by the first limiting part 212 and the second limiting part 213 respectively, thereby improving the constraint effect of the first support 21 on the material 200 and constraining the position change of the material 200 within the first support 21, so as to prevent the material 200 from falling out or falling during the swinging process of the first support 21.

[0058] Reference Figure 1 and Figure 2 As shown, in some embodiments of this application, the first limiting part 212 and the second limiting part 213 are provided to protrude from the support surface of the support seat 211 in a third-direction first side, and the first bracket 21 can receive the material 200 in a third-direction first side, so that the material 200 can enter the position that cooperates with the support seat 211 through the first bracket 21 in a third-direction first side.

[0059] The aforementioned "first direction" refers to the arrangement position of the first limiting part 212 relative to the support base 211, and the "second direction" refers to the arrangement position of the second limiting part 213 relative to the support base 211. In other words, the support base 211 serves as the reference point for the arrangement positions of the first limiting part 212 and the second limiting part 213. When the driving device 4 drives the receiving frame 2 to any position, the first direction is perpendicular to the first axis, and the second direction is parallel to the first axis.

[0060] It is understandable that, since both the first limiting part 212 and the second limiting part 213 protrude from the support surface, when the material 200 is placed on the first bracket 21, the first limiting part 212 is arranged opposite to at least a portion of the material 200 in the first direction, and the second limiting part 213 is arranged opposite to at least a portion of the material 200 in the second direction, so as to limit the material 200 by the first limiting part 212 and the second limiting part 213.

[0061] Reference Figure 2 In a further embodiment of this application, both the first limiting part 212 and the second limiting part 213 can be composed of a support arm structure. The length of the support arm structure constituting the first limiting part 212 protruding from the support surface in the third direction is not less than the length of the material 200 in the third direction after it is placed on the first bracket 21, so that the support arm can provide good support for the material 200.

[0062] Specifically, the first limiting part 212 is composed of two first arms 2121, which are respectively arranged on both sides of the support base 211 in the first direction, so as to limit the material 200 in the first direction through the two first arms 2121; the second limiting part 213 is composed of two second arms 2131, which are respectively arranged on both sides of the support base 211 in the second direction, so as to limit the material 200 in the second direction through the two second arms 2131.

[0063] It should be noted that material 200 consists of multiple stacked nickel plates. For example... Figure 2 and Figure 4 As shown, when material 200 is arranged on the first support 21, multiple nickel plates are arranged sequentially along the first direction, and the total thickness of the multiple nickel plates in the first direction is less than the distance between the two first supports 2121 in the first direction. This allows two adjacent nickel plates to separate when the first support 21 swings around the first axis, ensuring that the cleaning medium can fully contact the nickel plates and guaranteeing the cleaning effect of the cleaning medium on the impurities on the surface of the nickel plates. Figure 2 As shown, when the material 200 is arranged on the first support 21, the two second arms 2131 are respectively arranged on both sides of the material 200 in the second direction, and the length dimension of the nickel plate in the second direction is not greater than the distance between the two second arms 2131 in the second direction, so that the nickel plate can be inserted and arranged between the two second arms 2131 in the third direction.

[0064] Preferably, the distance between the two second arms 2131 in the second direction is slightly larger than the size of the nickel plate in the second direction, such as greater than 2mm, 3mm, 4mm, etc., so that the constraint effect of the second limiting part 213 (i.e. the two second arms 2131) on the material 200 in the second direction can be improved while the material 200 is arranged between the two second arms 2131.

[0065] Combination Figure 1 , Figure 2 and Figure 4 As shown, the drive device 4 is used to drive the receiving frame 2 to change its position relative to the mounting bracket 3 and the washing tank 1, so as to adjust the matching state between the receiving frame 2 and the material 200.

[0066] Reference Figure 4As shown in Figure a, the drive device 4 adjusts the first support 21 to a position that facilitates receiving the material 200, i.e., the end of the receiving frame 2 used for receiving the material 200 to enter is open to the horizontal direction. When the first support 21 is in the above position, the material 200 can be placed on one of the first arms 2121 in the first limiting part 212 by the transfer device, so that the material 200 can be received by the first arm 2121. The material 200 can also be removed from the first support 21 by the transfer device, so that the cleaned material 200 can be further transferred.

[0067] Reference Figure 4 As shown in Figure b, the drive device 4 adjusts the first support 21 to a vertical position, that is, the end of the receiving frame 2 for the material 200 to enter is open to the upward side. At this time, the material 200 can be supported by the support seat 211, and the material 200 can be limited by the first limiting part 212 and the second limiting part 213, thereby playing a good restraining role in the circumferential direction of the material 200, so that the drive device 4 can drive the first support 21 to perform lifting and lowering actions, so that the material 200 can be immersed in the cleaning medium or carried out from the cleaning medium through the first support 21.

[0068] Reference Figure 4 As shown in Figure c, the drive device 4 rotates the first bracket 21 clockwise by a certain angle so that multiple nickel plates are gradually separated, thereby enabling each nickel plate to fully contact the cleaning medium.

[0069] Reference Figure 4 As shown in Figure d, after the driving device 4 rotates the first bracket 21 clockwise to a preset angle, multiple stacked nickel plates are supported on a first support arm 2121 along the first direction; refer to Figure 4 As shown in Figure e, after the drive device 4 rotates the first bracket 21 counterclockwise to a preset angle, multiple stacked nickel plates are supported on another first support arm 2121 along the first direction.

[0070] Combination Figure 4 As shown in Figures a and b, the first support 21 and material 200 in Figure a are rotated counterclockwise to obtain the posture of the first support 21 and material 200 shown in Figure b. At this time, the first support 21 remains vertically positioned, that is, the third direction of the first support 21 is parallel to the vertical direction; combined with Figure 4 As shown in Figures b and c, the first support 21 and the material 200 in Figure b are rotated clockwise by a certain angle (e.g., 10°) to obtain the posture of the first support 21 and the material 200 shown in Figure c; combined with Figure 4As shown in Figures c and d, the first support 21 and material 200 in Figure c are further rotated clockwise to a preset angle (e.g., 22.5°) to obtain the posture of the first support 21 and material 200 shown in Figure d. During the above process, multiple nickel plates in material 200 are deflected to the right in sequence, thereby separating the two stacked nickel plates and allowing the contact surface between the two nickel plates to fully contact the cleaning medium; combined with Figure 4 As shown in Figures d and e, the first support 21 and the material 200 in Figure d rotate counterclockwise to a preset angle (e.g., -22.5°) to obtain the posture of the first support 21 and the material 200 shown in Figure e. During the above process, the multiple nickel plates in the material 200 deflect to the left in sequence, thereby achieving the separation of the multiple nickel plates in sequence again.

[0071] It should be noted that during the cleaning process of the material 200 by the electrolytic nickel cleaning system 100, the movement mode of the first support 21 (i.e., oscillation within a preset angle range) can be periodically repeated multiple times to improve the cleaning effect of the electrolytic nickel cleaning system 100 on the material 200. Therefore, by immersing the material 200 in the cleaning medium and driving the receiving frame 2 to oscillate so that multiple nickel plates in the material 200 are in full contact with the cleaning medium, the cleaning effect of the cleaning medium on the material 200 is improved, and multiple nickel plates can be cleaned simultaneously, which helps to improve the cleaning efficiency of the material 200.

[0072] Reference Figure 4 , combined Figure 4 As shown in Figures b, c, and d, it can be understood that when the material 200 swings from one side to the other within the first support 21, the nickel plates will sequentially open and close (open and close). The cleaning medium located between the nickel plates will create a pressure difference between the nickel plates and the surrounding cleaning medium as the gap size between the nickel plates changes. This pressure difference can promote the flow of the cleaning medium between the nickel plates, thereby improving the cleaning effect on the overlapping areas between the nickel plates.

[0073] like Figure 2 As shown, in some embodiments of this application, the second bracket 22 includes a first mounting bracket 221 and a second mounting bracket 222. The first mounting bracket 221 is U-shaped, and the opening of the U-shape faces the same direction as the material 200 received by the first bracket 21. This allows the first mounting bracket 221 to avoid the material 200 and the transfer device (such as a robotic arm or clamping mechanism) that transports the material 200, improving the operational reliability of the electrolytic nickel cleaning system 100. Meanwhile, the second mounting bracket 222 is connected to the outside of the opening of the first mounting bracket 221, and the second mounting bracket 222 is connected to the drive device 4, so that the drive device 4 can drive the second mounting bracket 222 to move the first mounting bracket 221.

[0074] The first mounting frame 221 serves as the mounting carrier for the first bracket 21. The first bracket 21 is arranged within the U-shaped first mounting frame 221 to further enhance the strength of the first bracket 21.

[0075] Combination Figure 1 and Figure 2 As shown, at least part of the second mounting bracket 222 is arranged on the outside of the cleaning tank 1, so as to facilitate the second mounting bracket 222 to avoid the cleaning tank 1 and prevent interference with the wall of the cleaning tank 1 during the position adjustment of the receiving bracket 2.

[0076] like Figure 2 As shown, in a further embodiment of this application, the second mounting bracket 222 includes a first connecting arm 2221 and a second connecting arm 2222. The first connecting arm 2221 is spaced apart from the side wall 11 of the first mounting bracket 221, and a clearance portion for the cleaning pool 1 is formed between the first mounting bracket 221 and the first connecting arm 2221. The driving device 4 is connected to the side of the first connecting arm 2221 away from the first bracket 21. The second connecting arm 2222 and the first connecting arm 2221 are arranged in an L-shape, and the second connecting arm 2222 is connected between the first connecting arm 2221 and the first mounting bracket 221.

[0077] Reference Figure 2 As shown, it can be understood that the first connecting arm 2221 and the first mounting frame 221 are arranged at intervals and connected and fixed by the second connecting arm 2222. This allows for a clearance space between the first connecting arm 2221 and the first mounting frame 221. During the adjustment of the position of the receiving frame 2 relative to the cleaning tank 1 by the driving device 4, this clearance space prevents interference between the receiving frame 2 and the cleaning tank 1, improving the operational reliability of the electrolytic nickel cleaning system 100. The gap between the first connecting arm 2221 and the first mounting frame 221 is larger than the wall thickness of the cleaning tank 1, allowing the wall to extend into the clearance space between the first connecting arm 2221 and the first mounting frame 221, preventing the cleaning tank 1 from interfering with the downward movement or swinging of the receiving frame 2.

[0078] like Figure 1As shown, in some embodiments of this application, the driving device 4 includes a rotating mechanism 41 and a lifting mechanism 42. The rotating mechanism 41 is connected to the receiving frame 2, and its driving end is connected to the receiving frame 2. The rotating mechanism 41 is used to drive the receiving frame 2 to rotate. The lifting mechanism 42 is mounted on the mounting bracket 3, and its lifting end is connected to the rotating mechanism 41. The lifting mechanism 42 is used to drive the rotating mechanism 41 to move up and down, and further drives the receiving frame 2 to move synchronously in the vertical direction through the rotating mechanism 41. Thus, the driving device 4 drives the receiving frame 2 to translate vertically and rotate around the first axis.

[0079] like Figure 1 As shown, in some embodiments of this application, the lifting mechanism 42 includes a drive seat 421 and a drive rod 422. The drive seat 421 is fixedly engaged with the mounting bracket 3. The drive rod 422 is telescopically mounted on the drive seat 421 in the vertical direction. The end of the drive rod 422 located outside the drive seat 421 is configured as a lifting end. The lifting end is used to connect to the receiving frame 2 so as to transmit the driving force to one side of the receiving frame 2 through the lifting end.

[0080] Understandably, the drive seat 421 is used to output driving force. Driven by the drive seat 421, the drive rod 422 can be raised and lowered vertically to realize the lifting function of the lifting mechanism 42. The driving cooperation between the drive seat 421 and the drive rod 422 can be constructed as hydraulic drive, lead screw, etc. For example, the drive seat 421 can be constructed as a hydraulic cylinder and the drive rod 422 can be constructed as a hydraulic rod. Driven by the hydraulic cylinder, the hydraulic rod can be driven to extend outward or retract inward. The driving method is simple and has good stability.

[0081] Combination Figure 1 and Figure 3 As shown, in some embodiments of this application, the lifting mechanism 42 further includes a guide rail 423 and a guide seat 424. The guide rail 423 is mounted on the mounting bracket 3, and the guide seat 424 is connected and cooperates with the lifting end. The guide rail 423 can cooperate with the guide seat 424 to guide the lifting action of the lifting end, thereby assisting in the position adjustment of the lifting end.

[0082] In some embodiments of this application, the rotating mechanism 41 includes a drive motor and a transmission mechanism. The drive motor outputs driving force, and the transmission mechanism is poweredly connected between the drive motor and the receiving frame 2 to transmit the driving force to the receiving frame 2. The transmission mechanism may consist of transmission gears, such as multiple gear pairs.

[0083] It is understandable that the transmission mechanism can be constructed as a speed reduction mechanism, thereby achieving speed reduction and torque increase, and improving the driving stability and reliability of the rotating mechanism 41 on the receiving frame 2.

[0084] In some embodiments of this application, a heating device is provided in the cleaning tank 1. The heating device is used to heat the cleaning medium to increase the temperature of the cleaning medium and improve the dissolution effect of the cleaning medium on the residues on the nickel plate surface. This enables the material 200 to be scalded and helps to improve the cleaning efficiency of the electrolytic nickel cleaning system 100.

[0085] The heating device can be configured as a steam heating device with the steam outlet facing the lifting lugs, thereby specifically increasing the temperature of the area near the lifting lugs on the nickel plate, allowing the cleaning medium to better clean the nickel plate.

[0086] like Figure 5 As shown, in some embodiments of this application, the side wall 11 of the cleaning tank 1 is provided with a discharge section for the cleaning medium to be discharged from the receiving tank 101, and the inner bottom wall 12 of the cleaning tank 1 is inclined downward towards the discharge section, thereby effectively reducing the agitation of the impurities and sediments at the bottom of the cleaning tank 1 during swinging scalding and removing the material 200, and reducing the risk of secondary contamination of the cleaned nickel plate.

[0087] It is understandable that during the cleaning process of material 200 (e.g., a nickel stack formed by multiple nickel plates), impurities that fall off the material 200 will sink to the bottom of the cleaning tank 1. The inclined inner bottom wall 12 can gather the impurities to the bottom side of the receiving tank 101, thereby reducing the impact of the moving receiving rack 2 and the material 200 on the impurities deposited at the bottom of the receiving tank 101 during the movement, and effectively preventing the cleaned material 200 from being secondary contaminated.

[0088] Reference Figure 5 In some embodiments of this application, the inner bottom wall 12 of the cleaning tank 1 is formed with a settling trough, which is located on the lower side of the inner bottom wall 12 and is used for the accumulation of impurities and other sediments to further enhance the restraint effect on the sediments deposited at the bottom of the cleaning tank 1.

[0089] In some embodiments of this application, the cleaning tank 1 is connected to a circulating filter device. The circulating filter device is used to purify and circulate the cleaning medium in the cleaning tank 1 to filter out impurities in the cleaning tank 1, thereby collecting impurities and reducing the risk of secondary pollution of the material 200 by impurities.

[0090] The electrolytic nickel cleaning system 100 according to the embodiments of this application has at least the following advantages over the prior art:

[0091] (1) It can clean nickel stacks consisting of multiple nickel plates in the cleaning tank 1, which improves the cleaning effect of nickel plates and increases the cleaning efficiency of nickel plates. In addition, the electrolytic nickel cleaning system 100 requires a small floor area when it is running, which makes it easy to arrange the electrolytic nickel cleaning system 100 in the production line and improves the space utilization rate.

[0092] (2) In the cleaning tank 1, multiple nickel plates are immersed in the cleaning medium, and gaps are formed between two adjacent nickel plates by oscillation, allowing the cleaning medium to flow between the nickel plates and thus cleaning the overlapping parts between them. At the same time, the cleaning medium can be heated by a heating device to further improve the cleaning effect on the nickel plates.

[0093] (3) The bottom of the cleaning tank 1 is inclined, which can effectively reduce the disturbance of the impurity deposits at the bottom of the cleaning tank 1 during swinging and scalding and removing the nickel stack, and reduce the possibility of secondary contamination of the cleaned nickel plates.

[0094] According to the electrolytic nickel cleaning method of this application embodiment, the electrolytic nickel cleaning method is applied in the above-mentioned electrolytic nickel cleaning system 100, and the electrolytic nickel cleaning method includes at least the following steps: Step 1: The receiving rack 2 receives the material 200; Step 2: The driving device 4 drives the receiving rack 2 to move to a first preset position, immersing the material 200 in the cleaning medium; Step 3: The driving device 4 drives the receiving rack 2 to periodically reciprocate between a second preset position and a third preset position; Step 4: The driving device 4 drives the receiving rack 2 to reset, moving the material 200 above the surface of the cleaning medium, and draining the material 200. Thus, the above-mentioned electrolytic nickel cleaning system 100 cleans the material 200 using the electrolytic nickel cleaning method, ensuring the cleaning effect while improving cleaning efficiency.

[0095] Understandably, the electrolytic nickel cleaning system 100 can perform the above steps to clean the material 200 (a nickel stack formed by stacking multiple nickel plates).

[0096] Before receiving material 200 via the receiving rack 2, the driving device 4 needs to adjust the receiving rack 2 to a suitable position for docking with the transfer device, such as maintaining... Figure 4 The posture is shown in Figure a. It should be noted that during the above adjustment process, the adjustment actions of the drive device 4 include the lifting and lowering adjustment of the height position of the receiving frame 2 and the rotation adjustment of the orientation of the receiving frame 2 (i.e., rotation around the first axis), so as to facilitate the receiving frame 2 in receiving the material 200.

[0097] After receiving material 200, receiving rack 2 can be adjusted to a first preset position by drive device 4, such as: maintaining Figure 4The posture shown in Figure b is such that the receiving interface of the first support 21 is open upwards, allowing the material 200 to be fully immersed below the surface of the cleaning medium, thus ensuring effective contact between the material 200 and the cleaning medium. It should be noted that during the above adjustment process, the adjustment actions of the drive device 4 include the lifting and lowering adjustment of the height position of the receiving frame 2 and the rotation adjustment of the orientation of the receiving frame 2 (i.e., rotation around the first axis).

[0098] Furthermore, the receiving frame 2 is driven by the driving device 4 so that the receiving frame 2 can be in a second preset position (e.g.: Figure 4 The posture shown in Figure d) and the third preset position ( Figure 4 The posture shown in Figure e) exhibits a periodic reciprocating oscillation. This ensures thorough cleaning of the material 200.

[0099] After the material 200 is cleaned, the receiving rack 2 is reset by the drive device 4, thereby adjusting the material 200 to a position higher than the surface of the cleaning medium to facilitate drainage. At the same time, the receiving rack 2 is located in a position that can dock with the transfer device, so that the material 200 can be further transferred by the transfer device, thereby facilitating further processing of the material 200, such as packaging and weighing.

[0100] It should be noted that during the draining process of material 200, auxiliary equipment such as air blowers and drying equipment can be used, and no specific limitations are made here. The completion of cleaning can be determined based on the cleaning time of the electrolytic nickel cleaning system 100, such as resetting the receiving rack 2 after the preset cleaning time is reached.

[0101] The advantages of the electrolytic nickel cleaning method according to the embodiments of this application compared to the prior art are the same as those of the electrolytic nickel cleaning system 100 described above, and will not be repeated here.

[0102] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0103] In the description of this application, "first feature" and "second feature" may include one or more of the features.

[0104] In the description of this application, "multiple" means two or more.

[0105] In the description of this application, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or it may include the first and second features not being in direct contact but being in contact through another feature between them.

[0106] In the description of this application, the terms "above," "over," and "on top" for the first feature and the second feature include the first feature being directly above or diagonally above the second feature, or simply indicate that the first feature is at a higher horizontal level than the second feature.

[0107] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0108] Although embodiments of this application have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the claims and their equivalents.

Claims

1. An electrolytic nickel cleaning system characterized by, The application relates to a cleaning device, comprising: a cleaning tank with an upwardly open containing groove for containing cleaning medium; a receiving frame for receiving materials; a mounting support and a driving device mounted on the mounting support and connected with the receiving frame, the driving device being used for driving the receiving frame to rotate around a first axis and driving the receiving frame to vertically ascend and descend so as to place at least part of the receiving frame in the containing groove.

2. The electrolytic nickel cleaning system of claim 1, wherein, The receiving frame comprises: a first support with a supporting seat and used for receiving the materials; a second support connected with the driving device and used for mounting and fixing the first support; wherein, in the vertical projection, the projection of at least part of the first support falls in the projection of the open end of the containing groove.

3. The electrolytic nickel cleaning system of claim 2, wherein, The first support comprises: a first limiting part connected with the supporting seat and adapted to limit both sides of the materials in a first direction; a second limiting part connected with the supporting seat and adapted to limit both sides of the materials in a second direction; wherein, the first direction and the second direction are arranged perpendicularly.

4. The electrolytic nickel cleaning system of claim 3, wherein, The first limiting part and the second limiting part protrude from the supporting surface of the supporting seat to the first side of a third direction, and the first support is adapted to receive the materials on the first side of the third direction.

5. The electrolytic nickel cleaning system of claim 2, wherein, The second support comprises: a first mounting frame arranged in a U shape, and the opening of the U shape is arranged in the same direction as the first support receiving the materials; a second mounting frame connected outside the opening of the first mounting frame and used for being connected with the driving device.

6. The electrolytic nickel cleaning system of claim 5, wherein, The second mounting frame comprises: a first connecting arm arranged in a space with the side wall of the first mounting frame, and a avoiding part for avoiding the cleaning tank is formed between the first mounting frame and the first connecting arm, and the driving device is connected to the the side of the first connecting arm away from the first support; a second connecting arm arranged in an L shape with the first connecting arm, and the second connecting arm is connected between the first connecting arm and the first mounting frame.

7. The electrolytic nickel cleaning system of claim 1, wherein, The driving device comprises: a rotating mechanism connected with the receiving frame, and a driving end of the rotating mechanism is connected with the receiving frame and used for driving the receiving frame to rotate; a lifting mechanism mounted on the mounting support, and a lifting end of the lifting mechanism is connected with the rotating mechanism and used for driving the rotating mechanism to lift.

8. The electrolytic nickel cleaning system of claim 7, wherein, The lifting mechanism comprises a driving seat fixedly matched with the mounting support and a driving rod telescopically mounted on the driving seat in the vertical direction, and one end of the driving rod outside the driving seat is configured as the lifting end; and / or, the lifting mechanism comprises a guide rail mounted on the mounting support and a guide seat connected and matched with the lifting end, and the guide rail is adapted to be guided and matched with the guide seat.

9. The electrolytic nickel cleaning system of claim 7, wherein, A heating device is arranged in the cleaning tank, and the heating device is used for heating the cleaning medium.

10. The electrolytic nickel cleaning system of claim 1, wherein, The inner bottom wall of the cleaning tank extends downwardly and obliquely to one side.

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