Baffle-adjustable co-sputtering cathode

Abstract

The utility model provides a co-sputtering cathode with an adjustable baffle plate. The co-sputtering cathode comprises a magnetron sputtering chamber and more than one target cathode which is arranged in the magnetron sputtering chamber, each target cathode is correspondingly provided with a corresponding baffle plate; each baffle is connected with a corresponding adjusting assembly, each adjusting assembly comprises a guide column and a guide sleeve arranged on the guide column in a sleeving mode, one end of each guide column is connected with the corresponding baffle, the other end of each guide column is located outside the magnetron sputtering chamber, and the guide sleeves are fixed to the wall face of the magnetron sputtering chamber. When a single target needs to work independently, only the baffle corresponding to the target cathode needs to be lifted by the corresponding adjusting assembly so as to cancel the shielding of the target cathode, and meanwhile, other target cathodes are respectively shielded by the corresponding baffle pairs by the corresponding adjusting assembly so as to prevent the target cathode in a non-working state from being polluted by the working target cathode. The whole operation can be directly completed outside the magnetron sputtering chamber without stopping the operation, so that the working efficiency and the operation safety can be effectively improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to vacuum coating technology field, concretely relates to a baffle adjustable co -sputtering cathode. BACKGROUND

[0002] In thin film preparation technology, co -sputtering is an important method, it can form the thin film with multiple element composition on the substrate through the sputtering of multiple targets simultaneously, to realize the accurate control to the thin film performance. However, in the co -sputtering process, there is also the case of single target working alone, in this case, the target cathode in non -working state is easy to be polluted by the target cathode in working. CONTENT OF THE UTILITY MODEL

[0003] In order to solve the technical problem in the background art, the utility model provides a baffle adjustable co -sputtering cathode.

[0004] The utility model provides a baffle adjustable co -sputtering cathode, comprising: magnetron sputtering chamber and the target cathode of installing in magnetron sputtering chamber and the quantity is more than one;

[0005] Each target cathode is correspondingly provided with a corresponding baffle to shield and cover the target cathode;Each baffle is connected with a corresponding adjusting assembly, the adjusting assembly includes a guide column and a guide sleeve sleeved on the guide column, one end of the guide column is connected with the baffle, and the other end is located outside the magnetron sputtering chamber, and the guide sleeve is fixed to the wall surface of the magnetron sputtering chamber.

[0006] Preferably, the baffle has a bending structure.

[0007] Preferably, the guide column is sleeved with a telescopic sleeve, the telescopic sleeve is located inside the magnetron sputtering chamber, one end of the telescopic sleeve is fixed with the baffle, and the other end is fixed with the guide sleeve.

[0008] Preferably, the material of the telescopic sleeve is aluminum foil.

[0009] Preferably, the adjusting assembly further includes a limiting column, the limiting column is parallel with the guide column and is fixed outside the magnetron sputtering chamber, a slide seat that can slide up and down is installed on the limiting column, and a locking mechanism that can switch the slide seat between the slidable state and the non-slidable state is installed on the slide seat;One end of the guide column outside the magnetron sputtering chamber is connected with the slide seat through a connecting part.

[0010] Preferably, the locking mechanism includes a lock hole distributed on the limiting column along the height direction of the limiting column, a mounting hole arranged on the slide seat on the side of the lock hole and an axially movable locking piece installed in the mounting hole.

[0011] Preferably, the locking piece is a shaft piece or a strip-shaped block.

[0012] Preferably, each of the guide posts in the adjusting assembly is provided with a plurality of guide sleeves, each of the guide posts is matched with a corresponding guide sleeve, each of the guide posts in the adjusting assembly is connected with a corresponding baffle, and the guide posts are connected with each other by connecting components at one end outside the magnetron sputtering chamber to form a whole.

[0013] Preferably, the magnetron sputtering chamber comprises a cover plate constituting a top wall, the target cathode, the guide sleeves and the limiting posts are mounted on the cover plate, and the target cathode is mounted on the inner side of the cover plate and the limiting posts are mounted on the outer side of the cover plate.

[0014] Preferably, a gap is reserved between the guide post and the guide sleeve, a sealing member is arranged on the guide post to form a sliding seal, and the sealing member is fixed on the wall of the magnetron sputtering chamber.

[0015] Preferably, the target cathode comprises two target cathodes, one of which is a planar cathode and the other is a rotary cathode arranged on the side of the planar cathode, and the baffles comprise two baffles, one of which corresponds to the planar cathode to shield the planar cathode and the other of which corresponds to the rotary cathode to shield the rotary cathode.

[0016] In the utility model, one corresponding baffle is arranged at each target cathode to shield the corresponding target cathode by the baffle, each baffle is connected with a corresponding adjusting assembly, one end of the guide rod in each adjusting assembly is connected with the corresponding baffle and the other end is outside the magnetron sputtering chamber, in the co-sputtering process, when a single target needs to work alone, the baffle corresponding to the target cathode is lifted by the corresponding adjusting assembly to cancel the shielding of the target cathode, and the other target cathodes are shielded by the corresponding baffles by the corresponding adjusting assembly to prevent the target cathodes in the non-working state from being polluted by the target cathode in the working state. The whole operation can be completed directly outside the magnetron sputtering chamber without stopping work, thereby effectively improving the working efficiency and the operation safety. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 An assembly view of the baffles and the adjusting assemblies of the co-sputtering cathode with adjustable baffles;

[0018] Figure 2 An axonometric view of the co-sputtering cathode with adjustable baffles;

[0019] Figure 3 A front view of the co-sputtering cathode with adjustable baffles;

[0020] Figure 4 A Figure 3 A sectional view along the C-C direction;

[0021] Figure 5The utility model provides a kind of baffle adjustable co-sputtering cathode, including: magnetron sputtering chamber, and the number in more than one target cathode 1 being installed in magnetron sputtering chamber and the state schematic diagram of baffle 2 when the target cathode 1 is shielded.

[0022] Figure 6 The utility model provides a kind of baffle adjustable co-sputtering cathode, including: magnetron sputtering chamber, and the state schematic diagram of the assembly of guide column and guide sleeve in the baffle adjustable co-sputtering cathode. DETAILED DESCRIPTION

[0023] Referring to Figures 1-4 The utility model provides a kind of baffle adjustable co-sputtering cathode, including: magnetron sputtering chamber, and the number in more than one target cathode 1 being installed in magnetron sputtering chamber and the state schematic diagram of baffle 2 when the target cathode 1 is shielded.

[0024] Each target cathode 1 is correspondingly provided with one corresponding baffle 2 to shield and cover the target cathode 1.Each baffle 2 is connected with one corresponding adjusting assembly, the adjusting assembly includes guide column 3 and guide sleeve 4 sleeved on guide column 3, one end of guide column 3 is connected with baffle 2, and the other end is located outside magnetron sputtering chamber, and guide sleeve 4 is fixed on the wall surface of magnetron sputtering chamber, specifically, target cathode 1 is installed on cover plate 11 constituting the top wall of magnetron sputtering chamber.

[0025] Referring to Figures 4-5 In co-sputtering process, when single target needs to work alone or part of target cathode 1 needs to work alone, corresponding guide column 3 is pulled from outside magnetron sputtering chamber, baffle 2 corresponding to corresponding target cathode 1 is lifted, so that corresponding target cathode 1 is exposed in working environment (such as Figure 4 indicated).Meanwhile, the baffle 2 corresponding to other target cathode 1 is kept in the state of shielding and covering it (such as Figure 5 indicated), to prevent target cathode 1 in non-working state from being contaminated by target cathode 1 in working state.When all target cathodes 1 work simultaneously, the baffle 2 corresponding to each target cathode 1 can be directly lifted to expose each target cathode 1 in working environment.

[0026] And the baffle 2 in the embodiment has bending structure, to increase the structural strength of baffle 2, prevent it from overheating deformation.

[0027] In the embodiment, telescopic sleeve 5 is sleeved on the outside of guide column 3, telescopic sleeve 5 is located inside magnetron sputtering chamber, the material of telescopic sleeve 5 is aluminum foil, one end of telescopic sleeve 5 is fixed with baffle 2, and the other end is fixed with guide sleeve 4, to cover guide column 3 in telescopic sleeve 5, prevent guide column 3 from being contaminated during coating operation.

[0028] The adjusting assembly in the embodiment further comprises a limiting column 6 which is parallel to the guide column 3 and is fixed outside the magnetron sputtering chamber. Specifically, the limiting column 6 is also fixed on the cover plate 11. A sliding seat 7 which can slide up and down is installed on the limiting column 6, and a locking mechanism 8 which controls the sliding seat 7 to switch between the slidable state and the non-slidable state is installed on the sliding seat 7. The locking mechanism 8 comprises a locking hole which is distributed on the limiting column 6 along the height direction of the limiting column 6, a mounting hole which is located on the side of the locking hole and is arranged on the sliding seat 7, and a locking piece which can axially move and is installed in the mounting hole. The locking piece is a shaft piece or a strip-shaped block. When one end of the locking piece is inserted into the locking hole through the mounting hole, the locking mechanism 8 enters the locked state, and at this time, the sliding seat 7 is non-slidable. When one end of the locking piece is retracted into the mounting hole, the locking mechanism 8 enters the unlocked state, and at this time, the sliding seat 7 enters the slidable state. The end of the guide column 3 which is located outside the magnetron sputtering chamber is connected with the sliding seat 7 through a connecting component 9. When the baffle 2 is adjusted, the locking mechanism 8 unlocks the sliding seat 7, so that the sliding seat 7 enters the slidable state, and then the sliding seat 7 is slid up and down to pull the guide column 3 to move, thereby driving the baffle 2 to move up and down. When the baffle 2 is adjusted to the appropriate position, the locking mechanism 8 locks the sliding seat 7 again, so that the sliding seat 7 enters the non-slidable state.

[0029] In the adjusting assembly in the embodiment, a plurality of guide columns 3 are provided, and each guide column 3 is matched with a corresponding guide sleeve 4. Each guide column 3 in each adjusting assembly is connected with a corresponding baffle 2, and the ends of the guide columns 3 which are located outside the magnetron sputtering chamber are connected with each other through the connecting components 9 to form a whole.

[0030] With reference to Figure 6 In the embodiment, a gap is reserved between the guide column 3 and the guide sleeve 4, and the gap is controlled to be between 0.1-0.3 mm. A sealing piece 10 which forms a sliding seal with the guide column 3 is arranged on the guide column 3. The sealing piece 10 comprises a sealing ring and a sealing block which provides support for the sealing ring. The sealing block is fixed on the cover plate 11. The structure design can ensure that the baffle 2 moves stably and without jamming during the lifting process, and ensure the accuracy of the movement direction. The gap can avoid affecting the sealing effect due to scratches on the surface of the guide column 3.

[0031] In the embodiment, two target cathodes 1 are provided, one of which is a planar cathode, and the other is a rotating cathode arranged on the side of the planar cathode. Two baffles 2 are provided, one of which corresponds to the planar cathode to shield the planar cathode, and the other corresponds to the rotating cathode to shield the rotating cathode.

[0032] From above, the utility model discloses a corresponding baffle 2 is set up at each target cathode 1, to utilize baffle 2 to the corresponding target cathode 1 is shielded, and each baffle 2 is connected with a corresponding adjusting assembly, and the one end of the guide rod in each adjusting assembly is connected with the corresponding baffle 2, and the other end is all in the outside of magnetron sputtering chamber, when needing single target to work alone in the co-sputtering process, only need to utilize the corresponding adjusting assembly to lift the target cathode 1 corresponding baffle 2, to cancel the shielding of the target cathode 1, simultaneously by the corresponding adjusting assembly makes other target cathode 1 respectively by corresponding baffle 2 to shield, to prevent the target cathode 1 in non-working state from being contaminated by the target cathode 1 in working. The whole operation can be directly completed in the outside of magnetron sputtering chamber, need not to stop work, to improve work efficiency and operation safety effectively.

[0033] The above is only the preferred specific implementation of the utility model, but the protection scope of the utility model is not limited to this, any skilled person in the art in the technical range disclosed by the utility model, according to the technical scheme and the utility model concept of the utility model, equivalent replacement or change, should be covered in the protection scope of the utility model.

Claims

1. A baffle-adjustable co-sputtering cathode, characterized in that, include: A magnetron sputtering chamber and a number of target cathodes installed in the magnetron sputtering chamber (1); Each target cathode (1) is provided with a corresponding baffle (2) to cover the target cathode (1); each baffle (2) is connected to a corresponding adjustment component, the adjustment component includes a guide post (3) and a guide sleeve (4) fitted on the guide post (3), one end of the guide post (3) is connected to the baffle (2), and the other end is located outside the magnetron sputtering chamber, and the guide sleeve (4) is fixed to the wall of the magnetron sputtering chamber.

2. The baffle-adjustable co-sputtering cathode according to claim 1, characterized in that, The baffle (2) has a bent structure.

3. The baffle-adjustable co-sputtering cathode according to claim 1, characterized in that, The guide column (3) is covered with a telescopic sleeve (5). The telescopic sleeve (5) is located inside the magnetron sputtering chamber. One end of the sleeve is fixed to the baffle (2), and the other end is fixed to the guide sleeve (4).

4. The baffle-adjustable co-sputtering cathode according to claim 3, characterized in that, The material of the telescopic sleeve (5) is aluminum foil.

5. The baffle-adjustable co-sputtering cathode according to claim 1, characterized in that, The adjustment assembly also includes a limiting post (6), which is parallel to the guide post (3) and fixed outside the magnetron sputtering chamber. The limiting post (6) is equipped with a slide (7) that can slide up and down and a locking mechanism (8) that controls the slide (7) to switch between a slidable state and a non-slidable state. The end of the guide post (3) located outside the magnetron sputtering chamber is connected to the slide (7) through a connecting component (9).

6. The baffle-adjustable co-sputtering cathode according to claim 5, characterized in that, The locking mechanism (8) includes a locking hole distributed on the limiting post (6) along the height direction of the limiting post (6), a mounting hole located on the side of the locking hole and provided on the slide (7), and a locking member that can move axially and is installed in the mounting hole.

7. The baffle-adjustable co-sputtering cathode according to claim 5, characterized in that, The adjustment assembly has multiple guide posts (3), each guide post (3) is matched with a corresponding guide sleeve (4), each guide post (3) in each adjustment assembly is connected to the corresponding baffle (2), and the ends of each guide post (3) located outside the magnetron sputtering chamber are connected to each other through connecting parts (9) to form a whole.

8. The baffle-adjustable co-sputtering cathode according to claim 5, characterized in that, The magnetron sputtering chamber includes a cover plate (11) forming its top wall, a target cathode (1), a guide sleeve (4), and a limiting post (6) all mounted on the cover plate (11), with the target cathode (1) mounted inside the cover plate (11) and the limiting post (6) mounted outside the cover plate (11).

9. The baffle-adjustable co-sputtering cathode according to claim 1, characterized in that, A gap is reserved between the guide post (3) and the guide sleeve (4). The guide post (3) is provided with a sealing element (10) that forms a sliding seal with it. The sealing element (10) is fixed on the wall of the magnetron sputtering chamber.

10. The baffle-adjustable co-sputtering cathode according to any one of claims 1-9, characterized in that, Two target cathodes (1) are provided, one of which is a planar cathode and the other is a rotating cathode located on the side of the planar cathode. Two baffles (2) are provided, one of which corresponds to the planar cathode to block the planar cathode, and the other corresponds to the rotating cathode to block the rotating cathode.

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